JPH0327059B2 - - Google Patents
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- Publication number
- JPH0327059B2 JPH0327059B2 JP59237275A JP23727584A JPH0327059B2 JP H0327059 B2 JPH0327059 B2 JP H0327059B2 JP 59237275 A JP59237275 A JP 59237275A JP 23727584 A JP23727584 A JP 23727584A JP H0327059 B2 JPH0327059 B2 JP H0327059B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- flow path
- component
- dilution
- standard
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D11/00—Control of flow ratio
- G05D11/02—Controlling ratio of two or more flows of fluid or fluent material
- G05D11/13—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means
- G05D11/139—Controlling ratio of two or more flows of fluid or fluent material characterised by the use of electric means by measuring a value related to the quantity of the individual components and sensing at least one property of the mixture
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
- B01F23/191—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means characterised by the construction of the controlling means
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Sampling And Sample Adjustment (AREA)
Description
【発明の詳細な説明】
＜産業上の利用分野＞
本発明は、ガス分析装置の目盛校正等に用いる
標準ガスを調製する標準ガス発生機等のガス調製
装置に係り、特に、流量の自己診断機能を備えた
ガス調製装置に関する。Detailed Description of the Invention <Industrial Application Field> The present invention relates to a gas preparation device such as a standard gas generator for preparing a standard gas used for scale calibration of a gas analyzer, and in particular, to a self-diagnosis of flow rate. The present invention relates to a gas preparation device with functions.
＜従来の技術＞
従来、所定濃度の標準ガスを調製する標準ガス
発生機は、例えば第４図に示すように構成されて
いる。即ち、DLは図外の希釈ガス源に接続され
た希釈ガス流路、CLは図外の成分ガス源に接続
された成分ガス流路、６１，６２は電磁弁の如き
ストツプバルブ、６３，６４はマスフローメータ
とバルブとから成るマスフローコントローラで、
このようなマスフローコントローラは例えば特公
昭59−41126号公報に開示されるように、公知で
ある。Ｍは希釈ガス流路DLと成分ガス流路SLと
の接続点に形成される混合部で、希釈ガスDGと
成分ガスCGが混合される。SLはガス混合部Ｍの
下流側の標準ガス流路、Ｂは被試験装置としての
ガス分析装置である。そして、希釈ガス流路DC
の希釈ガス流量をQD、成分ガス流路CLの成分ガ
ス流量をQCとするとき、QC／QD＋QCに希釈された標
準ガスSGが標準ガス流路SLを介してガス分析装
置Ｂに供給される。<Prior Art> Conventionally, a standard gas generator for preparing a standard gas of a predetermined concentration is configured as shown in FIG. 4, for example. That is, DL is a dilution gas flow path connected to a dilution gas source (not shown), CL is a component gas flow path connected to a component gas source (not shown), 61 and 62 are stop valves such as solenoid valves, and 63 and 64 are stop valves such as solenoid valves. A mass flow controller consisting of a mass flow meter and a valve.
Such a mass flow controller is known, for example, as disclosed in Japanese Patent Publication No. 59-41126. M is a mixing part formed at the connection point between the diluent gas flow path DL and the component gas flow path SL, where the dilution gas DG and the component gas CG are mixed. SL is a standard gas flow path on the downstream side of the gas mixing section M, and B is a gas analyzer as a device under test. And dilution gas flow path DC
When the diluent gas flow rate of is Q D and the component gas flow rate of component gas flow path CL is Q C , the standard gas SG diluted to Q C /Q D +Q C passes through the standard gas flow path SL to the gas analyzer. B is supplied.
ところで、上記の如く調製される校正用標準ガ
スSGの濃度はガス分析装置Ｂに対して最適のも
のでなければならず、従つて精度よく濃度制御さ
れる必要があるが、各マスフローコントローラ６
３，６４が互いに独立して制御される従来装置に
あつては、経時変化に基づくマスフローコントロ
ーラ６３，６４の劣化等による性能の低下を自ら
検出できない。そのため、他の標準ガスと比較し
たり、標準ガス発生機内の各制御機器のレンジの
相関を比較するなどして性能チエツクが行なわれ
るが、前記チエツク法においてはガス分析装置Ｂ
を用いる必要があり、前記発生機内のみで対処で
きない欠点があつた。更に、ガス分析装置Ｂを用
いて行なうため、該分析装置Ｂの再現性精度も無
視しえず、誤差要因の１つになつていた。 By the way, the concentration of the calibration standard gas SG prepared as described above must be optimal for the gas analyzer B, and therefore the concentration must be controlled with accuracy.
In a conventional device in which mass flow controllers 63 and 64 are controlled independently of each other, it is not possible to detect a decrease in performance due to deterioration of the mass flow controllers 63 and 64 due to changes over time. Therefore, performance checks are performed by comparing with other standard gases or by comparing the correlation between the ranges of each control device in the standard gas generator.
It is necessary to use a generator, which has the disadvantage that it cannot be dealt with only within the generator. Furthermore, since the analysis was carried out using gas analyzer B, the reproducibility accuracy of analyzer B could not be ignored and became one of the sources of error.
＜発明が解決しようとする問題点＞
本発明は上述の点にあつて、ガス分析装置を介
在させなくても自らマスフローコントローラのチ
エツクを行うことができ、これによつて高精度に
制御されたガスを調製することができる信頼性の
高いガス調製装置を提供することを目的とする。<Problems to be Solved by the Invention> The present invention solves the above-mentioned problems by making it possible to check the mass flow controller by itself without using a gas analyzer, thereby achieving highly accurate control. An object of the present invention is to provide a highly reliable gas preparation device that can prepare gas.
＜問題点を解決するための手段＞
上述の目的を達成するため、本発明において
は、成分ガス流路と希釈ガス流路との接続点より
下流側のガス流路及び前記成分ガス流路に、それ
ぞれマスフローメータとバルブとから成るマスフ
ローコントローラを設けている。<Means for Solving the Problems> In order to achieve the above-mentioned object, in the present invention, a gas flow path downstream of the connection point between the component gas flow path and the dilution gas flow path and the component gas flow path are provided. , each equipped with a mass flow controller consisting of a mass flow meter and a valve.
＜実施例＞
以下、本発明の実施例を第１図乃至第３図に基
づいて説明する。<Example> Hereinafter, an example of the present invention will be described based on FIGS. 1 to 3.
第１図は所謂一段希釈を採用した標準ガス発生
機の構成例を示すもので、同図において、DLは
図外の希釈ガス源に接続され希釈ガスDGを流す
希釈ガス流路、CLは図外の成分ガス源に接続さ
れ成分ガスCGを流す成分ガス流路であり、Ｍは
前記両ガス流路DL，CLの接続点に設けられるガ
ス混合部である。SLは前記ガス混合物Ｍの下流
側のガス流路としての標準ガス流路で標準ガス
SGが流れる。Ｂはガス分析装置である。 Figure 1 shows an example of the configuration of a standard gas generator that employs so-called one-stage dilution. In the figure, DL is a dilution gas flow path connected to a dilution gas source (not shown) and through which dilution gas DG flows, and CL is a dilution gas flow path (not shown). This is a component gas flow path connected to an external component gas source and through which the component gas CG flows, and M is a gas mixing section provided at the connection point of both the gas flow paths DL and CL. SL is a standard gas flow path as a downstream gas flow path of the gas mixture M;
SG is playing. B is a gas analyzer.
１，２はそれぞれ希釈ガス流路DL、成分ガス
流路CLに設けられた電磁弁の如きストツプバル
ブ（以下、SVと表わす）ものである。そして、
１１，１２はそれぞれ成分ガス流路CL、標準ガ
ス流路SLに設けられた従来周知のマスフローコ
ントローラ（以下、SECと表わす）で、マスフロ
ーメータとバルブとを組み合わせて成り、流量計
測と流量制御とを行なうことができる。 Reference numerals 1 and 2 are stop valves (hereinafter referred to as SV) such as electromagnetic valves provided in the dilution gas flow path DL and component gas flow path CL, respectively. and,
Reference numerals 11 and 12 are conventionally well-known mass flow controllers (hereinafter referred to as SEC) installed in the component gas flow path CL and the standard gas flow path SL, respectively, which are composed of a mass flow meter and a valve, and are used for flow rate measurement and flow control. can be done.
上述のように構成した標準ガス発生機におい
て、成分ガスCGを５倍に希釈してガス分析装置
Ｂに供給するには、例えばSEC１１によつて成分
ガス流路CLの流量を200ml／分と設定し、他方、
SEC１２によつて標準ガス流路SLの流量を800
ml／分と設定すればよい。 In the standard gas generator configured as described above, in order to dilute the component gas CG five times and supply it to the gas analyzer B, for example, set the flow rate of the component gas flow path CL to 200 ml/min using SEC11. On the other hand,
The flow rate of the standard gas flow path SL is set to 800 by SEC12.
Just set it as ml/min.
そして、SEC１１，１２の計測又は制御に狂い
が生じてないかを相互にその性能チエツク（これ
をクロスチエツクという）するには、SV１のみ
を閉とした状態で成分ガスCGを、SV２−SEC１
１−ガス混合部Ｍ−SEC１２の順に流れるように
する。このとき両方のSEC１１，１２による流量
の計測値が一致しておれば前記SEC１１，１２は
いずれも正常であると判断できる。又、両方の
SEC１１，１２による計測値に無視し得ない差が
あるときはいずれか一方の、又は両方のSEC１
１，１２に狂いが生じたものと判断することがで
き、これに基づきSEC１１，１２の点検及び取換
えを行なえばよい。 In order to mutually check the performance of SEC11 and SEC12 to see if there is any error in their measurement or control (this is called a cross-check), with only SV1 closed, the component gas CG is transferred from SV2 to SEC1.
1-Gas mixing section M-SEC12 so as to flow in this order. At this time, if the measured values of the flow rates by both SECs 11 and 12 match, it can be determined that both the SECs 11 and 12 are normal. Also, both
If there is a non-negligible difference between the measured values of SEC11 and SEC12, either one or both SEC1
It can be determined that the SECs 1 and 12 are out of order, and based on this, the SECs 11 and 12 can be inspected and replaced.
上述の説明から判るように、上流側に位置する
SEC１１を流量制御素子並びに流量計測素子とし
て用い、下流側に位置するSEC１２を流量計測素
子として、各SEC１１，１２における流量を測定
することによつて、SEC１１，１２のクロスチエ
ツクを行なうようにしているので、ガス調製装置
内のみでSEC１１，１２の性能チエツクを行なう
ことができる。 As you can see from the above explanation, it is located on the upstream side.
SEC11 is used as a flow rate control element and a flow rate measuring element, SEC12 located on the downstream side is used as a flow rate measuring element, and the flow rate in each SEC11, 12 is measured, thereby cross-checking SEC11, 12. Therefore, the performance check of SEC11 and SEC12 can be performed only within the gas preparation device.
第２図は、本発明の他の実施例を示すもので、
成分ガス流路CLのSV２よりも上流側の点Ｐにお
いて分岐流路CL′，CL″が接続され、それぞれの
分岐流路CL′，CL″にSV３とSEC１３、SV４と
SEC１４を直列に設けて標準ガス発生機を構成し
ている。このように分岐流路CL′，CL″を設け、
SEC１１，１３，１４として流量レンジの異なる
ものを使用すれば、標準ガスSGとして種々の濃
度のものが得られる。なお、第２図において第１
図のものと同様の構成部材には同一符号を付して
その説明を省略する。 FIG. 2 shows another embodiment of the present invention,
Branch channels CL', CL'' are connected at a point P upstream of SV2 in component gas channel CL, and SV3, SEC13, SV4 and
A standard gas generator is configured by installing SEC14 in series. In this way, branch channels CL′ and CL″ are provided,
By using SECs 11, 13, and 14 with different flow rate ranges, standard gases SG of various concentrations can be obtained. In addition, in Figure 2, the first
Components similar to those in the drawings are given the same reference numerals and their explanations will be omitted.
このように構成した標準ガス発生機において各
SEC１１，１２，１３，１４のクロスチエツクを
行うには、次のようにすればよい。SV２を開き、
SV１，３，４を閉じ、成分ガスCGをSV２−
SEC１１−ガス混合部Ｍ−SEC１２の順に流れる
ようにすると、前記第１図の実施例において説明
したのと同様に、SEC１１，１２のクロスチエツ
クを行なうことができる。又、SV３を開き、SV
１，２，４を閉じ、成分ガスCGをSV３−SEC１
３−SEC１１の順に流れるようにすると、SEC１
１，１３のクロスチエツクができる。更に、SV
４を開き、SV１，２，３を閉じ、成分ガスCGを
SV４−SEC１４−SEC１３の順に流れるように
すると、SEC１３，１４のクロスチエツクがで
き、これら操作を行なうことにより、SEC１１，
１２，１３，１４の性能チエツクを行なうことが
できる。 In the standard gas generator configured in this way, each
To cross-check SECs 11, 12, 13, and 14, do as follows. Open SV2,
Close SV1, 3, and 4, and transfer component gas CG to SV2-
If the flow is made to flow in the order of SEC11-gas mixing section M-SEC12, cross-checking of SEC11 and SEC12 can be performed in the same manner as explained in the embodiment of FIG. Also, open SV3 and SV
Close 1, 2, and 4, and transfer the component gas CG to SV3-SEC1
If you make it flow in the order of 3-SEC11, SEC1
1, 13 cross-checks are possible. Furthermore, S.V.
4, close SV1, 2, and 3, and turn on the component gas CG.
By making the flow flow in the order of SV4-SEC14-SEC13, you can cross-check SEC13 and SEC14, and by performing these operations, SEC11,
12, 13, and 14 performance checks can be performed.
第３図は、本発明の更に他の実施例を示すもの
で、第１図、第２図に示したものと異なり、成分
ガスCGは２回の亘つて希釈される所謂二段希釈
を採用した標準ガス発生機の構成例を示してい
る。同図において、DLは希釈ガス流路で、その
上流側から順次、SV３１、SEC２１、流量計測
のみを行なうマスフローメータ（以下、SEFと表
わす）４１、ガス混合部（以下、第２混合部とい
う）M2が設けられている。そして、前記SV３１
とSEC２１との中間点P2と、第２混合部M2との
間にはガス側流路BLが設けられており、該ガス
側流路BL上には上流側から順に、レギユレータ
５１、圧力計５２、SV３４、SEF４２、ガス混
合部（以下、第１混合部という）M1、SEC２３
が設けられている。 FIG. 3 shows still another embodiment of the present invention, which differs from those shown in FIGS. 1 and 2 by employing so-called two-stage dilution in which the component gas CG is diluted twice. An example of the configuration of a standard gas generator is shown. In the figure, DL is a diluent gas flow path, and sequentially from the upstream side are SV31, SEC21, mass flow meter (hereinafter referred to as SEF) 41 that only measures flow rate, and gas mixing section (hereinafter referred to as second mixing section). M2 is provided. And the SV31
A gas side flow path BL is provided between the intermediate point P 2 between and SEC 21 and the second mixing section M 2 , and on the gas side flow path BL, a regulator 51, a pressure Total 52, SV34, SEF42, gas mixing section (hereinafter referred to as the first mixing section) M 1 , SEC23
is provided.
CLは成分ガス流路で、その上流側から順次、
SV３５、SEC２２、SV３６が設けられており、
該成分ガス流路CLの下流端は前記第１混合部M1
に接続されている。そして、前記希釈ガス流路
DLにおけるSV３１の上流側の点P1と、成分ガス
流路CLにおけるSV３５とSEC２２との中間点P3
との間に、SV３３を有するジヨイント流路JLが
設けられている。 CL is the component gas flow path, starting from the upstream side,
SV35, SEC22, SV36 are provided,
The downstream end of the component gas flow path CL is the first mixing section M 1
It is connected to the. and the diluent gas flow path
Point P 1 on the upstream side of SV31 in DL and midpoint P 3 between SV35 and SEC22 in component gas flow path CL
A joint flow path JL having SV33 is provided between the two.
SLは前記第２混合部M2の下流側に設けられる
標準ガス流路で、SV３２を備えるとともに、ガ
ス出口５３を有している。このガス出口５３は図
外のガス分析装置に接続されている。又、第１混
合部M1とSEC２３との中間点P4とガス排出口５
４との間にガス排出流路XLが設けられ、２４，
３７はそれぞれ該流路XL上に設けられるSEC，
SXである。 SL is a standard gas flow path provided on the downstream side of the second mixing section M2 , and includes an SV32 and a gas outlet 53. This gas outlet 53 is connected to a gas analyzer (not shown). Also, the intermediate point P 4 between the first mixing section M 1 and the SEC 23 and the gas discharge port 5
A gas exhaust flow path XL is provided between 24 and 4;
37 are SECs provided on the channel XL, respectively;
It is SX.
前記SV３２の下流側の点P5とSV３７の下流側
の点P6との間に、標準ガス流路SLにおける標準
ガスSGの圧力を検出し、これを制御するための
圧力制御流路KLが設けられてあり、５５は圧力
計、５６は背圧レギユレータである。 A pressure control flow path KL for detecting and controlling the pressure of the standard gas SG in the standard gas flow path SL is provided between a point P5 on the downstream side of the SV32 and a point P6 on the downstream side of the SV37. 55 is a pressure gauge, and 56 is a back pressure regulator.
なお、前記レギユレータ５１はSEC２３，２４
の圧力を制御するために設けられている。 Note that the regulator 51 has SECs 23 and 24.
is provided to control the pressure.
上述のように構成した標準ガス発生機におい
て、通常、希釈ガスDGはSV３１を経てSEC２１
において流量制御され、SEF４１で流量測定さ
れ、第２混合部M2に至るが、SV３４を開いてお
くと、希釈ガスDGの一部はレギユレータ５１、
SV３４、SEF４２を経て第１混合部M1に至る。 In the standard gas generator configured as described above, the diluent gas DG is normally passed through SV31 and then SEC21.
The flow rate is controlled in the SEF41, the flow rate is measured in the SEF41, and the flow reaches the second mixing part M2.However , if the SV34 is left open, a part of the diluent gas DG flows through the regulator 51,
It reaches the first mixing section M1 via SV34 and SEF42.
一方、成分ガスCGはSV３５を経てSEC２２に
おいて流量制御され、第１混合部M1において希
釈ガスDGと混合し、希釈される。この希釈され
た第１次希釈ガスはGEC２３，２４のバルブの
開度によつて定められる流量比に分流され、SEC
２３を経た前記第１次希釈ガスは第２混合部M2
において更に希釈ガスDGと合流し、ここでさら
に希釈された後所定濃度の標準ガスSGとしてガ
ス出口５３からガス分析装置に供給される。 On the other hand, the component gas CG passes through the SV 35 and is subjected to flow rate control in the SEC 22, and is mixed with the dilution gas DG in the first mixing section M1 to be diluted. This diluted primary dilution gas is divided into flow ratios determined by the opening degrees of the valves of GEC23 and 24, and the SEC
The first dilution gas that has passed through step 23 is transferred to the second mixing section M 2
It further joins with the diluent gas DG, and after being further diluted here, it is supplied to the gas analyzer from the gas outlet 53 as a standard gas SG of a predetermined concentration.
ここで、標準ガスSGの希釈率（D.R）は、
SEC２１，２２，２３，２４の制御流量をそれぞ
れQ1、Q2、Q3、Q4とすると、次式で表わされ
る。 Here, the dilution ratio (DR) of standard gas SG is
When the control flow rates of SECs 21, 22, 23, and 24 are respectively Q 1 , Q 2 , Q 3 , and Q 4 , they are expressed by the following equations.
D.R＝Q2×Q3／（Q1＋Q3）（Q3＋Q4）
そして、SEC２１〜２４、SEF４１，４２をク
ロスチエツクするには次のようにして行なう。 DR=Q 2 ×Q 3 /(Q 1 +Q 3 )(Q 3 +Q 4 ) Then, to cross-check SECs 21 to 24 and SEFs 41 and 42, proceed as follows.
SV３３，３４，３６，３７を閉じ、SV３
１，３２を開いた状態で、希釈ガスDGを流
し、SEC２１で流量制御し、SEF４１で流量測
定することにより、SEC２１とSEF４１のクロ
スチエツクができる。 Close SV33, 34, 36, 37, SV3
Cross-checking between SEC21 and SEF41 can be performed by flowing diluent gas DG with 1 and 32 open, controlling the flow rate with SEC21, and measuring the flow rate with SEF41.
SV３１，３４，３５，３７を閉じ、SV３
２，３３，３６を開いた状態で、希釈ガスDG
を流し、SEC２２で流量制御し、SEC２３で流
量測定することにより、SEC２２，２３のクロ
スチエツクができる。 Close SV31, 34, 35, 37, SV3
With 2, 33, and 36 open, diluent gas DG
A cross-check between SECs 22 and 23 can be performed by controlling the flow rate with SEC 22 and measuring the flow rate with SEC 23.
上記において、SV３２を閉じ、SV３７を
開いた状態で、希釈ガスDGを流し、SEC２２
で流量制御し、SEC２４で流量測定することに
より、SEC２２，２４のクロスチエツクができ
る。 In the above, with SV32 closed and SV37 open, diluent gas DG is flowed, and SEC22
By controlling the flow rate with SEC24 and measuring the flow rate with SEC24, cross-check of SEC22 and SEC24 can be performed.
SV３３，３６，３７を閉じ、SV３２，３４
を開いた状態で、希釈ガスDGを流し、SEC２
３で流量制御し、SEF４２で流量計測すること
により、SEC２３とSEF４２のクロスチエツク
ができる。 Close SV33, 36, 37, SV32, 34
With the door open, let the diluent gas DG flow through SEC2.
By controlling the flow rate with 3 and measuring the flow rate with SEF42, cross-check between SEC23 and SEF42 can be performed.
上記において、SV３２を閉じ、SV３７を
開いた状態で、希釈ガスDGを流し、SEC２４
で流量制御し、SEF４２で流量計測することに
より、SEC２４とSEF４２のクロスチエツクが
できる。 In the above, with SV32 closed and SV37 open, diluent gas DG is flowed, and SEC24
By controlling the flow rate with SEF42 and measuring the flow rate with SEF42, cross-check between SEC24 and SEF42 can be performed.
又、全てのSV３１〜３７を閉じた状態におけ
るSEC２１〜２４、SEF４１，４２における指示
値が「ゼロ」であるかどうか確認することによ
り、所謂ゼロ点校正をすることができ、これによ
つて高精度な標準ガス発生機を得ることができ
る。 Also, by checking whether the indicated values at SEC21-24 and SEF41, 42 with all SV31-37 closed are "zero", so-called zero point calibration can be performed. Accurate standard gas generator can be obtained.
なお、本発明は上述した標準ガス発生機のみに
限られるものではないことは勿論である。 Note that the present invention is of course not limited to the standard gas generator described above.
＜発明の効果＞
以上詳述したように、本発明によれば成分ガス
と希釈ガスとが混合されるガス混合部より下流側
のガス流路及び成分ガス流路にそれぞれマスフロ
ーメータとバルブとから成るマスフローコントロ
ーラを設けているので、前記マスフローコントロ
ーラ同士でクロスチエツクすることができる。従
つて、従来装置と異なりガス調製装置内のみで機
能チエツクすることができ、別途測定機器や比較
用の標準ガス等を用意しなくてもよい。又、任意
にクロスチエツクを行なうことができるので、こ
の種ガス調製装置の信頼性を向上させることがで
きる。<Effects of the Invention> As detailed above, according to the present invention, a mass flow meter and a valve are installed in the gas flow path and the component gas flow path downstream of the gas mixing section where the component gas and diluent gas are mixed. Since the mass flow controllers are provided, cross-checking can be performed between the mass flow controllers. Therefore, unlike conventional devices, functions can be checked only within the gas preparation device, and there is no need to prepare separate measuring equipment or standard gas for comparison. Further, since cross-checking can be performed arbitrarily, the reliability of this type of gas preparation apparatus can be improved.
第１図は本発明の一実施例を示す構成図、第２
図は他の実施例を示す構成図、第３図は更に他の
実施例を示す構成図、第４図は従来技術を説明す
るための構成図である。
１１，１２，１３，１４，２１，２２，２３，
２４……マスフローコントローラ（SEC）、DL…
…希釈ガス流路、CL……成分ガス流路、SL……
ガス流路、Ｍ，M1，M2……ガス混合部、DG…
…希釈ガス、CG……成分ガス。
FIG. 1 is a configuration diagram showing one embodiment of the present invention, and FIG.
FIG. 3 is a configuration diagram showing another embodiment, FIG. 3 is a configuration diagram showing still another embodiment, and FIG. 4 is a configuration diagram for explaining a conventional technique. 11, 12, 13, 14, 21, 22, 23,
24...Mass flow controller (SEC), DL...
...Dilution gas flow path, CL...Component gas flow path, SL...
Gas flow path, M, M 1 , M 2 ...Gas mixing section, DG...
...dilution gas, CG...component gas.
Claims (1)
ガスを希釈ガスで希釈して所定濃度のガスを発生
させるガス調製装置において、前記成分ガスと希
釈ガスとが混合されるガス混合部より下流側のガ
ス流路及び前記成分ガス流路に、それぞれマスフ
ローメータとバルブとから成るマスフローコント
ローラを設けたことを特徴とするガス調製装置。1. In a gas preparation device that includes a component gas flow path and a dilution gas flow path and generates a gas with a predetermined concentration by diluting the component gas with the dilution gas, from a gas mixing section where the component gas and the dilution gas are mixed. A gas preparation device characterized in that a mass flow controller comprising a mass flow meter and a valve is provided in the downstream gas flow path and the component gas flow path, respectively.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59237275A JPS61116638A (en) | 1984-11-09 | 1984-11-09 | Gas regulator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59237275A JPS61116638A (en) | 1984-11-09 | 1984-11-09 | Gas regulator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61116638A JPS61116638A (en) | 1986-06-04 |
| JPH0327059B2 true JPH0327059B2 (en) | 1991-04-12 |
Family
ID=17012974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59237275A Granted JPS61116638A (en) | 1984-11-09 | 1984-11-09 | Gas regulator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61116638A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2590385B2 (en) * | 1990-09-22 | 1997-03-12 | 株式会社島津製作所 | Sample gas sampling device |
| JPH0621174U (en) * | 1992-03-27 | 1994-03-18 | 中島通信機工業株式会社 | Coaxial cable connector |
| JPH0629063A (en) * | 1992-05-27 | 1994-02-04 | Nikou Denki Kogyo Kk | F-type connector |
| JP5192350B2 (en) * | 2008-10-30 | 2013-05-08 | 株式会社船井電機新応用技術研究所 | Sensor evaluation system |
| JP5855921B2 (en) * | 2010-12-17 | 2016-02-09 | 株式会社堀場エステック | Gas concentration adjustment device |
| KR101797637B1 (en) * | 2016-03-28 | 2017-11-20 | 주식회사아이센랩 | Calibration device and apparatus for analysing gas component having the same |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS537169Y2 (en) * | 1974-06-24 | 1978-02-23 | ||
| JPS601053B2 (en) * | 1979-05-04 | 1985-01-11 | 横河電機株式会社 | Fluid mixing ratio controller |
-
1984
- 1984-11-09 JP JP59237275A patent/JPS61116638A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61116638A (en) | 1986-06-04 |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |