JPH0328363Y2 - - Google Patents
Info
- Publication number
- JPH0328363Y2 JPH0328363Y2 JP1984183662U JP18366284U JPH0328363Y2 JP H0328363 Y2 JPH0328363 Y2 JP H0328363Y2 JP 1984183662 U JP1984183662 U JP 1984183662U JP 18366284 U JP18366284 U JP 18366284U JP H0328363 Y2 JPH0328363 Y2 JP H0328363Y2
- Authority
- JP
- Japan
- Prior art keywords
- light
- forward scattered
- central part
- scattered light
- mask substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 15
- 238000007689 inspection Methods 0.000 claims description 8
- 230000007547 defect Effects 0.000 claims description 7
- 206010040925 Skin striae Diseases 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
【考案の詳細な説明】
〔産業上の利用分野〕
本考案は、調整容易、構造も簡単で場所をとら
ず、価格も低下できるマスク基板表面検査装置に
関する。[Detailed Description of the Invention] [Industrial Field of Application] The present invention relates to a mask substrate surface inspection device that is easy to adjust, has a simple structure, does not take up much space, and is inexpensive.
従来から、ガラス基板（以後サブストレートと
よぶ）や、サブストレート表面をクロム等の蒸着
膜で被覆したマスクブランクスを、レーザビーム
で垂直に照射、走査して、たとえば異物付着個所
では透過光強度が下がり、蒸着膜にピンホールが
あれば透過光強度が強くなるとか、傷や異物のあ
る個所では透過光の他に散乱光が生ずるなどの現
象を利用して表面欠陥を検出するマスク基板表面
検査装置が用いられていた。
Conventionally, glass substrates (hereinafter referred to as substrates) or mask blanks whose surfaces are coated with a vapor-deposited film of chromium, etc., are vertically irradiated and scanned with a laser beam to detect the intensity of transmitted light at locations where foreign matter has adhered. Mask substrate surface inspection that detects surface defects by utilizing phenomena such as the intensity of transmitted light increases if there are pinholes in the deposited film, or scattered light is generated in addition to transmitted light in areas with scratches or foreign objects. equipment was used.
サブストレートには、傷、付着異物、（表面と
は言えないが、）気泡、ガラス質が局部的に異な
り屈折率異常がある脈理などの欠陥があるが、こ
のような欠陥では、透過光強度の変化と共に、通
常、散乱光が生ずる。サブストレートの検査で
傷、異物、気泡、脈理などの欠陥のあるものを除
去しておけば、マスクブランクスの欠陥は、主と
してピンホール、異物付着、傷などとなる。 The substrate has defects such as scratches, attached foreign matter, bubbles (although not on the surface), and striae with locally different glass properties and abnormal refractive index. Scattered light usually occurs with changes in intensity. If defects such as scratches, foreign matter, bubbles, and striae are removed during substrate inspection, the defects in mask blanks will mainly be pinholes, foreign matter adhesion, and scratches.
従来のマスク基板表面検査装置では、透過光と
前方散乱光に対して夫々別に２種類の受光器を装
備して、検査対象がサブストレートか、マスクブ
ランクスかという基板の種類に応じて受光器を選
択して検査を行つていた。その場合、(a)２種類の
受光器を基板の下部にそれぞれ適当な角度に設置
しなければならず、(b)そのため構造が複雑とな
り、場所も余計に必要になる、(c)更に調整を行う
場合には、両方の受光器の相関をとらなければな
らない、など検査実行に際してはかなり厄介な問
題があつた。 Conventional mask substrate surface inspection equipment is equipped with two types of light receivers, one for transmitted light and one for forward scattered light. Selected and inspected. In that case, (a) two types of receivers must be installed at appropriate angles at the bottom of the board, (b) this complicates the structure and requires additional space, and (c) further adjustment is required. When performing this test, there were quite complicated problems such as the need to correlate both photoreceivers.
本考案は、上記のような問題のない、透過光と
前方散乱光に対して１個の受光器を装備するだけ
で済むようにした、構造が簡単で調整も単純なマ
スク基板表面検査装置を提供することを目的とす
る。
The present invention is a mask substrate surface inspection device that does not have the above-mentioned problems, only requires one receiver for transmitted light and forward scattered light, has a simple structure, and is simple to adjust. The purpose is to provide.
上記問題点を解決するために本考案において
は、検査試料を通つて来た走査光を反射させて受
光器に入射させる反射鏡を設置し、この反射鏡
を、中央部および両側部の３部分よりなり、反射
鏡全体としての位置、姿勢はそのままで、中央部
のみ取付け、取外し自在に構成し、中央部を取付
けた状態で透過光に前方散乱光を加えたものを反
射させ、中央部を取外した状態で前方散乱光だけ
を反射させるようにして、透過光と前方散乱光と
に対する受光器を１個で済ませられるようにし
た。反射鏡の中央部を取付けた状態での受光量か
ら、中央部を取外した状態での受光量を差し引く
ことにより、簡単に透過光量が判り、マスク基板
欠陥の種類判定に役立つ。なお、光源側への散乱
光を測定する後方散乱光受光器は従来同様装備し
ておくものとする。
In order to solve the above problems, the present invention installs a reflecting mirror that reflects the scanning light that has passed through the test sample and makes it enter the light receiver, and this reflecting mirror is divided into three parts: the center part and both sides. The mirror is configured so that only the central part can be attached and removed while the position and posture of the entire reflector remains the same.With the central part attached, the transmitted light plus forward scattered light is reflected, and the central part In the removed state, only the forward scattered light is reflected, so that only one light receiver is required for the transmitted light and the forward scattered light. By subtracting the amount of light received with the central portion of the reflecting mirror removed from the amount of light received with the central portion attached, the amount of transmitted light can be easily determined, which is useful for determining the type of mask substrate defect. Note that a backscattered light receiver for measuring scattered light towards the light source side shall be equipped as in the conventional case.
第１図ａは本考案一実施例の要部斜視図、第１
図ｂは本考案に係る３部分よりなる反射鏡の説明
用側面図（中央部を取外した状態）である。図
中、１はマスク基板、２はミラーａ、３はミラー
ｂ、４はミラーｃ、５はフレネル型集光レンズ、
６は受光器、７は投射レーザビーム、８はレーザ
ビームに照射されている走査点、９は走査点を単
純に透過した透過光、１０は前方散乱光、９ａは
ミラーｂ３で反射された透過光、１０ａは主とて
ミラーａ２とミラーｃ４で反射された前方散乱光
である。なお、レーザビーム７による走査は、マ
スク基板の四隅をくわえる手段によりマスク基板
を動かさせて行う。図から良く判るように、ミラ
ーｂ３が取付けてある状態では、透過光９と前方
散乱光１０の総和が反射され、反射前方散乱光１
０ａを含めて全てが面積の大きい集光レンズ５に
捕捉、集光されて受光器６に入射する。一方、ミ
ラーｂ３を取外した状態では、第１図ｂに示すよ
うに、透過光９はミラーｂ３が無いので其の個所
を反射されずに通り抜け、側方に散乱した前方散
乱光１０だけがミラーａ２やミラーｃ４によつて
反射され、反射前方散乱光１０ａとして大面積の
集光レンズ５に捕捉、集光されて受光器６に入射
する。前記のように、二つの状態に於ける受光量
の差から透過光量が判る。なお、このような構成
にすると、透過光は反射鏡を通り抜けてミラーａ
２、ミラーｃ４の裏側に出てしまうので、受光器
に来る迷光が減少し測定精度が向上する。なお、
本考案により、構造や調整などが簡単になること
は云うまでもない。
Figure 1a is a perspective view of essential parts of an embodiment of the present invention;
FIG. b is an explanatory side view (with the central portion removed) of a three-part reflecting mirror according to the present invention. In the figure, 1 is a mask substrate, 2 is a mirror a, 3 is a mirror b, 4 is a mirror c, 5 is a Fresnel type condenser lens,
6 is a light receiver, 7 is a projection laser beam, 8 is a scanning point irradiated by the laser beam, 9 is transmitted light that simply passes through the scanning point, 10 is forward scattered light, and 9a is transmitted light that is reflected by mirror b3. The light 10a is mainly forward scattered light reflected by the mirrors a2 and c4. Note that the scanning by the laser beam 7 is performed by moving the mask substrate by means of gripping the four corners of the mask substrate. As can be clearly seen from the figure, when the mirror b3 is attached, the sum of the transmitted light 9 and the forward scattered light 10 is reflected, and the reflected forward scattered light 1
All of the light, including 0a, is captured and focused by the large-area condenser lens 5 and enters the light receiver 6. On the other hand, when mirror b3 is removed, as shown in FIG. It is reflected by a2 and mirror c4, and is captured and condensed by a large-area condenser lens 5 as reflected forward scattered light 10a, and enters a light receiver 6. As mentioned above, the amount of transmitted light can be determined from the difference in the amount of received light in the two states. Note that with this configuration, the transmitted light passes through the reflecting mirror and returns to the mirror a.
2. Since the light comes out on the back side of the mirror c4, stray light coming to the light receiver is reduced and measurement accuracy is improved. In addition,
It goes without saying that the present invention simplifies the structure and adjustment.
以上説明したように本考案によれば、透過光受
光器と前方散乱光受光器とを１個で済ませること
が出来、構造が簡単となり、調整も単純となり、
価格も安くなる。
As explained above, according to the present invention, only one transmitted light receiver and one forward scattered light receiver are required, the structure is simple, and the adjustment is simple.
The price will also be lower.
第１図ａは本考案一実施例の要部斜視図、第１
図ｂは本考案に係る３部分よりなる反射鏡の説明
用側面図である。
１……マスク基板、２……ミラーａ、３……ミ
ラーｂ、４……ミラーｃ、５……集光レンズ、６
……受光器、７……投射レーザビーム、８……走
査点、９，９ａ……透過光、１０，１０ａ……前
方散乱光。
Figure 1a is a perspective view of essential parts of an embodiment of the present invention;
FIG. b is an explanatory side view of a three-part reflector according to the present invention. DESCRIPTION OF SYMBOLS 1...Mask substrate, 2...Mirror a, 3...Mirror b, 4...Mirror c, 5...Condensing lens, 6
... Light receiver, 7 ... Projection laser beam, 8 ... Scanning point, 9, 9a ... Transmitted light, 10, 10a ... Forward scattered light.
Claims (1)
被覆したマスクブランクスの、表面の傷、異物、
ピンホールなどの欠陥を、レーザビームの垂直照
射、走査により検査するマスク基板表面検査装置
において、検査試料を通つて来た光を反射させて
受光器に入射させる反射鏡を設け、この反射鏡
を、中央部および両側部の３部分よりなり、反射
鏡全体としての位置、姿勢はそのままで、中央部
のみ取付け、取外し自在に構成し、中央部を取付
けた状態で透過光に前方散乱光を加えたものを反
射させ、中央部を取外した状態で前方散乱光だけ
を反射させるようにして、透過光と前方散乱光と
に対する受光器を１個で済ませながら双方を分別
計測し、欠陥の種類の判定に役立たせたことを特
徴とするマスク基板表面検査装置。 Surface scratches, foreign matter,
In mask substrate surface inspection equipment that inspects defects such as pinholes by vertical irradiation and scanning with a laser beam, a reflecting mirror is installed to reflect the light that has passed through the inspection sample and make it enter a light receiver. , consists of three parts, the central part and both sides, and is configured so that only the central part can be attached and removed while the position and posture of the entire reflector remains the same.With the central part attached, forward scattered light is added to the transmitted light. By removing the central part and reflecting only the forward scattered light, only one receiver is required for the transmitted light and the forward scattered light, and both can be measured separately to determine the type of defect. A mask substrate surface inspection device characterized in that it is useful for determination.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984183662U JPH0328363Y2 (en) | 1984-12-05 | 1984-12-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1984183662U JPH0328363Y2 (en) | 1984-12-05 | 1984-12-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6199043U JPS6199043U (en) | 1986-06-25 |
| JPH0328363Y2 true JPH0328363Y2 (en) | 1991-06-18 |
Family
ID=30741160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1984183662U Expired JPH0328363Y2 (en) | 1984-12-05 | 1984-12-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0328363Y2 (en) |
-
1984
- 1984-12-05 JP JP1984183662U patent/JPH0328363Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6199043U (en) | 1986-06-25 |
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