JPH0329357A - Semiconductor memory device - Google Patents
Semiconductor memory deviceInfo
- Publication number
- JPH0329357A JPH0329357A JP1163526A JP16352689A JPH0329357A JP H0329357 A JPH0329357 A JP H0329357A JP 1163526 A JP1163526 A JP 1163526A JP 16352689 A JP16352689 A JP 16352689A JP H0329357 A JPH0329357 A JP H0329357A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- semiconductor
- chip
- memory device
- input
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 33
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000000969 carrier Substances 0.000 abstract description 4
- 230000001681 protective effect Effects 0.000 abstract 3
- 239000010410 layer Substances 0.000 description 7
- 238000009792 diffusion process Methods 0.000 description 5
- 230000003071 parasitic effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明は.半導体記憶装置に関し、特に基板バイアスを
与える配線の形成場所に関する。[Detailed Description of the Invention] [Industrial Application Fields] [The present invention] The present invention relates to a semiconductor memory device, and particularly to a location where wiring for applying a substrate bias is formed.
[従来の技術]
従来、この種の半導体記憶装置は、多くのトランジスタ
を同一基板上に作るため、寄生的なpn接合ができてし
まう。これらのpn接合が回路動作に悪影響を及ぼすの
を防ぐために、常に逆方向電圧がかかるように基板にバ
イアスを印加する。[Prior Art] Conventionally, in this type of semiconductor memory device, many transistors are formed on the same substrate, resulting in the formation of parasitic pn junctions. In order to prevent these pn junctions from adversely affecting circuit operation, a bias is applied to the substrate so that a reverse voltage is always applied.
具体的な効果としては、寄生的なpn接合が順方向バイ
アスになることを防ぐことと、接合部の空乏層輻を拡げ
て寄生容量を小さくし回路動作を高速化することの2点
である。The two specific effects are to prevent the parasitic pn junction from becoming forward biased and to expand the depletion layer at the junction, reducing parasitic capacitance and speeding up circuit operation. .
この電位を与える配線23は、ボンディングバッド22
を含む回路24全体を囲むようにチップ2l最外周で基
板と接続される配置となっていたく第2図)。The wiring 23 giving this potential is connected to the bonding pad 22
The chip 2l is arranged to be connected to the substrate at its outermost periphery so as to surround the entire circuit 24 including the circuit 24 (FIG. 2).
[発明が解決しようとする課題コ
上述した従来の半導体記憶装置はチップ上最外周で基板
と接続されるためチップ中央部が最遠端となる。そのた
め中央部では外周に比べ抵抗が余分につくため、効果が
減少するという欠点がある。[Problems to be Solved by the Invention] The conventional semiconductor memory device described above is connected to the substrate at the outermost periphery of the chip, so that the center of the chip is the farthest end. Therefore, there is a drawback that the effect is reduced because there is more resistance at the center than at the outer periphery.
[発明の従来技術に対する相違点コ
上述した従来の半導体記憶装置に対し、本発明は基板に
バイアスを与える位置をボンデイングパッドおよびそれ
に付随する人力保護回路とアレイ領域との間で接続をす
るという相違点を有する。[Differences between the invention and the prior art] Compared to the conventional semiconductor memory device described above, the present invention has a difference in that the position for applying a bias to the substrate is connected between the bonding pad and the associated human power protection circuit and the array area. Has a point.
[課題を解決するための手段]
本発明の半導体記憶装置は、半導体基板に形成された半
導体集積回路と、この半導体集積回路を取り囲むように
半導体基板に配設された該半導体集積回路のための入出
力回路および入出力端子部と、
この半導体基板にバイアス電圧を印加するための配線と
、
を備えた半導体記憶装置において、
上記配線を、上記半導体集積回路と上記入出力回路およ
び入出力端子部との間に配置したことを特徴とする半導
体記憶装置である。[Means for Solving the Problems] A semiconductor memory device of the present invention includes a semiconductor integrated circuit formed on a semiconductor substrate, and a semiconductor integrated circuit for the semiconductor integrated circuit arranged on the semiconductor substrate so as to surround the semiconductor integrated circuit. In a semiconductor memory device comprising: an input/output circuit and an input/output terminal section; and wiring for applying a bias voltage to the semiconductor substrate, the wiring is connected to the semiconductor integrated circuit, the input/output circuit, and the input/output terminal section. This is a semiconductor memory device characterized in that it is disposed between.
[実施例コ
以下、本発明の実施例について図面を参照して説明する
。[Embodiments] Hereinafter, embodiments of the present invention will be described with reference to the drawings.
第1図および第2図は本発明の実施例を説明するための
半導体チップのレイアウトの略図および断面図である。1 and 2 are a schematic diagram and a cross-sectional view of the layout of a semiconductor chip for explaining an embodiment of the present invention.
まず、第1図に示すように基板電位を与える配線l3が
ボンディングパッド・人力保護回路l2の内側で基板と
接続されている。そのため従来の配置よりボンデイング
パツド12の長さ分10μm程度内側で基板と接続され
るため、より半導体チップ11の中部分との距離が短く
なるので遠端であるチップ中央までにつく抵抗が減る。First, as shown in FIG. 1, a wiring l3 for applying a substrate potential is connected to the substrate inside the bonding pad/manpower protection circuit l2. Therefore, since the bonding pad 12 is connected to the substrate about 10 μm inside the length of the bonding pad 12 compared to the conventional arrangement, the distance to the middle part of the semiconductor chip 11 is shortened, and the resistance that is built up to the far end (the center of the chip) is reduced. .
そのため寄生的なpn接合が順バイアスになることを防
ぎ、また接合部の空乏層幅を拡げて寄生容量をより小さ
くできる。さらに入力保護回路が拡散層抵抗15を利用
して作られている場合、ボンデイングバッド12に高電
圧が印加された場合、キャリアが拡散層抵抗l5を通っ
て半導体基板19中に放出され、それが基板中を移動し
てメモリ背に到達し電荷保持時間に影響を与えることが
ある。しかし第1図に示すように入力保護回路とメモリ
セル領域14との間に、基板電位が与えられているP型
拡散層18が存在する形となっているため、入力保護回
路から発生するキャリアに対するシールドの役割も同時
に持つという利点がある。Therefore, the parasitic pn junction can be prevented from becoming forward biased, and the width of the depletion layer at the junction can be expanded to further reduce the parasitic capacitance. Furthermore, when the input protection circuit is made using the diffusion layer resistor 15, when a high voltage is applied to the bonding pad 12, carriers are released into the semiconductor substrate 19 through the diffusion layer resistor 15, and It may move through the substrate and reach the back of the memory, affecting the charge retention time. However, as shown in FIG. 1, there is a P-type diffusion layer 18 to which a substrate potential is applied between the input protection circuit and the memory cell region 14, so carriers generated from the input protection circuit It has the advantage of also having the role of a shield against.
[発明の効果]
以上説明したように本発明は、基板電位を与える場所を
ボンディングパッド・入力保護回路の内側にとることに
より、安定した電位をチップ全体に与えることができ、
かつ人力保護回路から発生するキャリアをシールドでき
る効果がある。[Effects of the Invention] As explained above, the present invention makes it possible to apply a stable potential to the entire chip by placing the substrate potential inside the bonding pad/input protection circuit.
It also has the effect of shielding carriers generated from the human power protection circuit.
第1図は本発明の実施例を説明するための半導体チップ
の平面図、第2図は第1図の■一■線矢視断面図、第3
図は従来の半導体チップの平面図である。
1 l ●
1 2 ・
1 3 ◆
1 4 ・
1 5 ・
1 6 ・
17 ●
18 ・
1 9 ●
・半導体チップ、
・ボンディングパッド、
基板電位配線・サブコンタクト、
メモリセル・周辺回路領域、
入力保護抵抗(N+拡散層)、
基板電位配線、
層間絶縁膜、
P3拡散層、
P型半導体基板。FIG. 1 is a plan view of a semiconductor chip for explaining an embodiment of the present invention, FIG. 2 is a sectional view taken along the line
The figure is a plan view of a conventional semiconductor chip. 1 l ● 1 2 ・ 1 3 ◆ 1 4 ・ 1 5 ・ 1 6 ・ 17 ● 18 ・ 1 9 ● ・Semiconductor chip, ・Bonding pad, Substrate potential wiring/subcontact, Memory cell/peripheral circuit area, Input protection resistor (N+ diffusion layer), substrate potential wiring, interlayer insulation film, P3 diffusion layer, P-type semiconductor substrate.
Claims (1)
集積回路を取り囲むように半導体基板に配設された該半
導体集積回路のための入出力回路および入出力端子部と
、 この半導体基板にバイアス電圧を印加するための配線と
、 を備えた半導体記憶装置において、 上記配線を、上記半導体集積回路と上記入出力回路およ
び入出力端子部との間に配置したことを特徴とする半導
体記憶装置。[Scope of Claims] A semiconductor integrated circuit formed on a semiconductor substrate, an input/output circuit and an input/output terminal section for the semiconductor integrated circuit disposed on the semiconductor substrate so as to surround the semiconductor integrated circuit, and a wiring for applying a bias voltage to a semiconductor substrate; and a semiconductor memory device, characterized in that the wiring is arranged between the semiconductor integrated circuit, the input/output circuit, and the input/output terminal section. Semiconductor storage device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1163526A JP2978507B2 (en) | 1989-06-26 | 1989-06-26 | Semiconductor storage device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1163526A JP2978507B2 (en) | 1989-06-26 | 1989-06-26 | Semiconductor storage device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0329357A true JPH0329357A (en) | 1991-02-07 |
| JP2978507B2 JP2978507B2 (en) | 1999-11-15 |
Family
ID=15775547
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1163526A Expired - Lifetime JP2978507B2 (en) | 1989-06-26 | 1989-06-26 | Semiconductor storage device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2978507B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9727458B2 (en) | 2006-02-09 | 2017-08-08 | Google Inc. | Translating an address associated with a command communicated between a system and memory circuits |
| US10013371B2 (en) | 2005-06-24 | 2018-07-03 | Google Llc | Configurable memory circuit system and method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62261169A (en) * | 1986-05-07 | 1987-11-13 | Nec Corp | Semiconductor memory |
| JPS63153852A (en) * | 1986-12-17 | 1988-06-27 | Mitsubishi Electric Corp | Semiconductor storage device |
| JPH02294065A (en) * | 1989-05-08 | 1990-12-05 | Nec Ic Microcomput Syst Ltd | Semiconductor storage device |
-
1989
- 1989-06-26 JP JP1163526A patent/JP2978507B2/en not_active Expired - Lifetime
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62261169A (en) * | 1986-05-07 | 1987-11-13 | Nec Corp | Semiconductor memory |
| JPS63153852A (en) * | 1986-12-17 | 1988-06-27 | Mitsubishi Electric Corp | Semiconductor storage device |
| JPH02294065A (en) * | 1989-05-08 | 1990-12-05 | Nec Ic Microcomput Syst Ltd | Semiconductor storage device |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10013371B2 (en) | 2005-06-24 | 2018-07-03 | Google Llc | Configurable memory circuit system and method |
| US9727458B2 (en) | 2006-02-09 | 2017-08-08 | Google Inc. | Translating an address associated with a command communicated between a system and memory circuits |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2978507B2 (en) | 1999-11-15 |
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