JPH0330133A - Read-only optical disk - Google Patents
Read-only optical diskInfo
- Publication number
- JPH0330133A JPH0330133A JP1166080A JP16608089A JPH0330133A JP H0330133 A JPH0330133 A JP H0330133A JP 1166080 A JP1166080 A JP 1166080A JP 16608089 A JP16608089 A JP 16608089A JP H0330133 A JPH0330133 A JP H0330133A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- glass substrate
- film
- read
- optical disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000011521 glass Substances 0.000 claims abstract description 35
- 238000009792 diffusion process Methods 0.000 claims abstract description 14
- 230000001681 protective effect Effects 0.000 claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 10
- 239000002184 metal Substances 0.000 claims abstract description 10
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052718 tin Inorganic materials 0.000 claims abstract description 5
- 238000010030 laminating Methods 0.000 claims abstract description 3
- 229910052737 gold Inorganic materials 0.000 claims abstract 4
- 230000002265 prevention Effects 0.000 claims description 11
- 229910045601 alloy Inorganic materials 0.000 claims description 4
- 239000000956 alloy Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 230000007797 corrosion Effects 0.000 abstract description 6
- 238000005260 corrosion Methods 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 4
- 238000003980 solgel method Methods 0.000 abstract description 3
- 239000010410 layer Substances 0.000 abstract 6
- 229910001020 Au alloy Inorganic materials 0.000 abstract 2
- 238000001354 calcination Methods 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 description 15
- 239000011347 resin Substances 0.000 description 13
- 229920005989 resin Polymers 0.000 description 13
- 230000005856 abnormality Effects 0.000 description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- 150000002902 organometallic compounds Chemical class 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 239000005345 chemically strengthened glass Substances 0.000 description 9
- 230000003247 decreasing effect Effects 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 229910052681 coesite Inorganic materials 0.000 description 8
- 229910052906 cristobalite Inorganic materials 0.000 description 8
- 229910052682 stishovite Inorganic materials 0.000 description 8
- 229910052905 tridymite Inorganic materials 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 235000019441 ethanol Nutrition 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 5
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000004417 polycarbonate Substances 0.000 description 5
- 229920001223 polyethylene glycol Polymers 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- 229910017401 Au—Ge Inorganic materials 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 229910001362 Ta alloys Inorganic materials 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 229910052809 inorganic oxide Inorganic materials 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910000927 Ge alloy Inorganic materials 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 238000003426 chemical strengthening reaction Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000005300 metallic glass Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 235000017550 sodium carbonate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明はレーザーを用いて情報の読み出しを行う光ディ
スクに関し、特に信頼性、耐候性に優れた読み出し専用
の光ディスクに関するものである。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an optical disc from which information is read using a laser, and particularly to a read-only optical disc with excellent reliability and weather resistance.
（従来の技術）
読み出し専用の光ディスクとしてコンパクトディスク（
以下、ＣＤと呼ぶ。）が広く知られている。ＣＤはボリ
カーボネート基板（以下、ＰＣ基板と呼ぶ。）上にアル
ミニウムがらなる反射膜及びＵＶ硬化樹脂からなる保護
膜を設けた構或になっており、予めＰＣ基板上に形威さ
れた微小な凹凸（以下、ビットと呼ぶ。）による光の変
調を利用して、音声の再生を可能にするものである。(Prior technology) Compact discs (
Hereinafter, it will be referred to as CD. ) is widely known. A CD has a structure in which a reflective film made of aluminum and a protective film made of UV curing resin are provided on a polycarbonate substrate (hereinafter referred to as a PC board). This makes it possible to reproduce audio by utilizing light modulation caused by unevenness (hereinafter referred to as bits).
また、近年、上述した音声再生用のみならず、ＣＤ−Ｒ
ＯＭと呼ばれる各種データの読み出し専用光ディスクも
いろいろな分野に用いられつつある。In addition, in recent years, not only for audio playback mentioned above, but also for CD-R
Read-only optical disks for various data called OM are also being used in various fields.
例えば、パーソナルコンピュータ用のデータ媒体、電子
出版媒体などへ展開している。For example, it has been developed into data media for personal computers, electronic publishing media, etc.
（発明が解決しようとする課題）
ＣＤ−ＲＯＭは従来のＣＤ作製技術によりＰＣ基板を用
いて容易に作製できるが、読み出しの信頼性、データの
保存性（ＣＤ−ＲＯＭの耐候性）を強く要求される場合
はＰＣ基板では問題となる。即ち、ＰＣ基板が持つ吸水
性、透湿性のために反りあるいは反射膜の腐食、剥離な
どの劣化を生じ易い。更に、ＣＤにおいても、例えば車
両搭載などを考えると、その環境条件は苛酷なものであ
り、より高品質のものが求められる。(Problem to be solved by the invention) CD-ROMs can be easily manufactured using a PC board using conventional CD manufacturing techniques, but there are strong requirements for read reliability and data storage (weather resistance of CD-ROMs). If this occurs, it becomes a problem for PC boards. That is, due to the water absorption and moisture permeability of the PC board, deterioration such as warping or corrosion or peeling of the reflective film is likely to occur. Furthermore, when CDs are installed in vehicles, for example, the environmental conditions are harsh, and higher quality is required.
本発明の目的は高信頼性、高耐候性を有する読み出し専
用光ディスクを提供することにある。An object of the present invention is to provide a read-only optical disc having high reliability and high weather resistance.
（課題を解決するための手段）
以下、第１図を用いて本発明を説明する。第１図は、本
発明の概略断面図である。(Means for Solving the Problems) The present invention will be explained below using FIG. 1. FIG. 1 is a schematic cross-sectional view of the present invention.
本発明によれば、吸湿性、透湿性のないガラス基板１を
用い、まず、拡散防止層２を形成する。次に、その拡散
防止層２を付けた面と反対側のガラス基板面にいわゆる
ゾルゲル法と呼ばれる手法を用いて、有機金属化合物を
焼或することにより得られるガラス状のピットパターン
をもった焼成層３を形威し、次いで高耐食性の反射膜４
、保護膜５を順次積層することにより、高信頼性の読み
出し専用光ディスクが得られる。According to the present invention, first, a diffusion prevention layer 2 is formed using a glass substrate 1 that is neither hygroscopic nor moisture permeable. Next, a so-called sol-gel method is used on the surface of the glass substrate opposite to the surface on which the diffusion prevention layer 2 is attached to form a glass-like pit pattern obtained by baking an organometallic compound. layer 3, followed by highly corrosion resistant reflective coating 4
By sequentially laminating the protective films 5 and 5, a highly reliable read-only optical disc can be obtained.
ガラス基板１としては通常のソーダライムガラス、アル
ミノケイ酸ガラスなどが用いられるが、光ディスクとし
ての信頼性の賎点からみると、化学強化を施されたもの
が好ましい。As the glass substrate 1, ordinary soda lime glass, aluminosilicate glass, etc. can be used, but from the viewpoint of reliability as an optical disc, one that has been chemically strengthened is preferable.
しかしながら、通常の化学強化を行うためにはガラスが
Ｌｉ，Ｎａなとのアルカリ金属を含むことが必要になる
。このアルカリ金属は、ガラスを高温高湿下に置いた場
合、ガラス表面に拡散し、例えばＮａ２ＣＯ３のような
塩にすることが良く知られている。このような変化はレ
ーザ光を照射して読み出しを行う際の障害となり、光デ
ィスクとしての特性上好ましくない。そこで、拡散防止
層２が必要になる。この拡散防止層２の材料は各種無機
酸化物を用いることが出来るが、光ディスクとしての特
性を勘案すると、Ｓｉ，Ｔｉ，Ｔａ， Ｚｒ， ＡＩ，
Ｓｎ， Ｃｒの酸化物を単独もしくは組み合わせて使
用することが好ましい。また、Ｓｉ３Ｎ４も良好な特性
を示す。これらの酸化物あるいは窒化物はスパッタ法な
どにより容易に形戒することが出来る。However, in order to perform normal chemical strengthening, the glass needs to contain alkali metals such as Li and Na. It is well known that when the glass is placed under high temperature and high humidity, this alkali metal diffuses onto the glass surface and becomes a salt such as Na2CO3. Such a change becomes a hindrance when reading by irradiating with a laser beam, and is undesirable from the viewpoint of the characteristics of an optical disc. Therefore, a diffusion prevention layer 2 is required. Various inorganic oxides can be used as the material for the diffusion prevention layer 2, but considering the characteristics of the optical disc, Si, Ti, Ta, Zr, AI,
It is preferable to use oxides of Sn and Cr alone or in combination. Furthermore, Si3N4 also exhibits good characteristics. These oxides or nitrides can be easily formed by sputtering or the like.
所望のビットパターンをガラス基板の上に形成するには
、以下に示すようにゾルゲル法を用いて容易に行うこと
が出来る。A desired bit pattern can be easily formed on a glass substrate using a sol-gel method as described below.
まず、金属アルコレート、水、塩酸、アルコールなどか
ら或る塗布溶液を調製し、ガラス基板上に所定の厚さに
なるようにスピンコートする。次いで、所望のピットパ
ターンになるように設計された樹脂製の型を押し当て、
６０〜１２０８Ｃ程度の温度で一次焼或を行う。その後
、ガラス基板を離型し、２５０〜４００°Ｃで二次焼或
を行い、溶剤、添加剤などの有機成分を除去することに
より所望のピットパターンを有する非晶質、の金属酸化
物層３を形成できる。First, a coating solution is prepared from metal alcoholate, water, hydrochloric acid, alcohol, etc., and spin coated onto a glass substrate to a predetermined thickness. Next, a resin mold designed to create the desired pit pattern is pressed against it.
Primary firing is performed at a temperature of about 60 to 1208C. Thereafter, the glass substrate is released from the mold and subjected to secondary baking at 250 to 400°C to remove organic components such as solvents and additives, thereby forming an amorphous metal oxide layer with a desired pit pattern. 3 can be formed.
ここで用いられる金属アルコレートとしては各種の金属
アルコーレト、例えばＳｉ， Ｔｉ， Ｚｒ， ＡＩ，
Ｂなどのアルコレート、が使用できるが、光ディスク
としての特性、製造上の取り扱いやすさなどから、Ｓｉ
系アルコレートあるいはＳｉ系アルコレートとＴｉ系ア
ルコレートの混合系が好ましい。The metal alcoholates used here include various metal alcoholates, such as Si, Ti, Zr, AI,
Alcoholates such as B can be used, but Si
Preferably, the alcoholate is a mixture of a Si-based alcoholate and a Ti-based alcoholate.
このようにして所望のピットパターンを有する透明なガ
ラス基板を得ることが出来る。In this way, a transparent glass substrate having a desired pit pattern can be obtained.
次に、得られたピットパターンを持った焼成層の上に、
反射膜４をスパッタ法などにより付け、更に、保護膜５
をその上に被覆することにより読み出し専用光ディスク
が得られる。Next, on top of the fired layer with the resulting pit pattern,
A reflective film 4 is applied by sputtering or the like, and then a protective film 5 is applied.
A read-only optical disc is obtained by coating it on it.
反射膜４の材料としては、各種の金属、金属窒化物など
を用いることが出来るが、光ディスクとしての特性を満
足すると共に、高耐食性を示すものが好ましく、Ａｕ，
Ａｕ系合金、ＴｉＮを用いることが出来る。Various metals, metal nitrides, etc. can be used as the material for the reflective film 4, but it is preferable to use a material that satisfies the characteristics of an optical disc and exhibits high corrosion resistance.
Au-based alloys and TiN can be used.
保護膜５としては、Ｓｉ０２などの無機酸化物、Ｓｉ３
Ｎ４などの無機窒化物のような無機系のものあるいはＵ
Ｖ硬化樹脂などのような有機系のものが単独もしくは組
み合わせて使用できる。As the protective film 5, inorganic oxide such as Si02, Si3
Inorganic materials such as inorganic nitrides such as N4 or U
Organic materials such as V-curing resins can be used alone or in combination.
（作用）
本発明による読み出し専用光ディスクは、耐湿性に優れ
る拡散防止層付きのガラス基板及び耐食性に優れる反射
膜を有しているために、高い信頼性を実現できる。(Function) The read-only optical disk according to the present invention can achieve high reliability because it has a glass substrate with a diffusion prevention layer that has excellent moisture resistance and a reflective film that has excellent corrosion resistance.
（実施例） 以下、実施例に基づき詳細に説明する。(Example) Hereinafter, a detailed explanation will be given based on examples.
実施例１
化学強化されたガラス基板上に、拡散防止層としてスパ
ッタ法によりＳｉ０２膜をＩＯＯＯＡ形威した。次いで
、このＳｉ０２膜面と反対側のガラス基板面の上に、テ
トラエトキシシラン、塩酸、水、ポリエチレングリコー
ルを含むエチルアルコール溶液をスピンコートし、有機
金属化合物層を２０００〜３０００人形威した。次いで
、表面に所定のビットパターンを有する樹脂製の型を有
機金属化合物層に押し当て、ビットパターンを転写する
と共に１２０°Ｃで一次焼戊を行った。その後、ガラス
基板を離型し、３５０’Ｃで二次焼或を行った。Example 1 On a chemically strengthened glass substrate, a Si02 film was formed into an IOOOA shape by sputtering as a diffusion prevention layer. Next, an ethyl alcohol solution containing tetraethoxysilane, hydrochloric acid, water, and polyethylene glycol was spin-coated on the glass substrate surface opposite to the Si02 film surface to form an organometallic compound layer of 2,000 to 3,000 coats. Next, a resin mold having a predetermined bit pattern on its surface was pressed against the organometallic compound layer to transfer the bit pattern and perform primary baking at 120°C. Thereafter, the glass substrate was released from the mold and subjected to secondary baking at 350'C.
このようにして作製したビットパターンを有する焼成層
の上に、反射膜としてスバ？タ法でＡｕ−Ｔａ合金膜を
約１００ＯＡ、保護膜としてＳｉ０２膜を１０００人順
次或膜した。On the baked layer having the bit pattern thus prepared, a reflective film is applied. An Au--Ta alloy film of about 100 OA and a Si02 film as a protective film were successively deposited on 1,000 people using the Ta method.
得られた光ディスクを８０００、９０％ＲＨ下で耐候性
を評価したところ、初期値が２．４Ｘ１０−３であった
ブロックエラーレートが、５００時間後には２．９Ｘ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 8000℃ and 90%RH, the block error rate, which had an initial value of 2.4X10-3, decreased to 2.9X1 after 500 hours.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例２
化学強化されたガラス基板上に、拡散防止層としてスパ
ッタ法によりＳｉ０２−Ｔａ２０５膜を１ｏｏｏＡ形成
した。次いで、もう一方のガラス基板面の上に、テトラ
エトキシシラン、塩酸、水、ポリエチレングリコールを
含むエチルアルコール溶液をスビンコートし、有機金属
化合物層を２０００〜ａｏｏｏＡ形威した。次いで、表
面に所定のビットパターンを有する樹脂製の型を有機金
属化合物層に押し当て、ピットパターンを転写すると共
に１２０°Ｃで一次焼或を行った。その後、ガラス基板
を離型し、３５０８Ｃで二次焼戒を行った。Example 2 On a chemically strengthened glass substrate, a 100A Si02-Ta205 film was formed as a diffusion prevention layer by sputtering. Next, an ethyl alcohol solution containing tetraethoxysilane, hydrochloric acid, water, and polyethylene glycol was coated onto the surface of the other glass substrate to form an organometallic compound layer with a thickness of 2,000 to 2,000 aoooA. Next, a resin mold having a predetermined bit pattern on its surface was pressed against the organometallic compound layer, the pit pattern was transferred, and primary baking was performed at 120°C. Thereafter, the glass substrate was released from the mold and subjected to secondary firing at 3508C.
このようにして作製したピットパターンを有する焼戒層
の上に、スバツタ法でＡｕ−Ｔａ合金膜を約１００ＯＡ
， Ｓｉ０２膜をＩＯＯＯＡ順次戒膜した。Approximately 100 OA of Au-Ta alloy film is deposited on the shokai layer having the pit pattern prepared in this way using the subata method.
, The Si02 film was sequentially coated with IOOOA.
得られた光ディスクを８０°Ｃ，９０％ＲＨ下で耐候性
を評価したところ、初期値が２．４Ｘ１０−３であった
ブロックエラーレート．が、５００時間後には２．９Ｘ
１０−３にやや増加した。しかしながら、この程度の変
化は再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 80°C and 90% RH, the block error rate, which had an initial value of 2.4X10-3. However, after 500 hours, it is 2.9X
It increased slightly to 10-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間はと放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after leaving it for 1 hour under the conditions of 80° C. and 90% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例３
化学強化されたガラス基板上に、スバツタ法によりＳｉ
０２−Ｔｉ０２膜を１０００人形威した。次に、実施例
２と同様に、ガラス基板のもう一方の面に順次焼成層、
反射膜層、保護膜層を形威した。Example 3 Si was deposited on a chemically strengthened glass substrate by the subvert method.
02-Ti02 film was tested for 1000 dolls. Next, as in Example 2, a fired layer was sequentially formed on the other surface of the glass substrate.
A reflective film layer and a protective film layer have been added.
得られた光ディスクを８０°Ｃ、９０％ＲＨ下で耐候性
を評価したところ、初期値が２．３Ｘ１０＝であったブ
ロックエラーレートが、５００時間後には２．５Ｘ１０
−３にやや増加した。しかしながら、この程度の変化は
再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 80°C and 90% RH, the block error rate, which had an initial value of 2.3X10, decreased to 2.5X10 after 500 hours.
-3, a slight increase. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 190% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例４
化学強化されたガラス基板上に、スパツタ法によりＳｉ
０２−Ｚｒ０２膜を８００人形威した。次に、実施例２
と同様に、ガラス基板のもう一方の面に順次焼成層、反
射膜層、保護膜層を形戒した。Example 4 Si was deposited on a chemically strengthened glass substrate by a sputtering method.
02-Zr02 film was used for 800 dolls. Next, Example 2
Similarly, a fired layer, a reflective film layer, and a protective film layer were sequentially formed on the other surface of the glass substrate.
得られた光ディスクを８０°Ｃ、９０％ＲＨ下で耐候性
を評価したところ、初期値が２．７ Ｘ １０ であ
ったブロックエラーレートが、５００時間後には３．５
Ｘ１０＝にやや増加した。しかしながら、この程度の変
化は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 90% RH, the block error rate, which had an initial value of 2.7 x 10, decreased to 3.5 after 500 hours.
It increased slightly to X10=. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例５
化学強化されたガラス基板上に、スパツタ法によりＳｉ
０２−Ａ１２０２膜をｓｏｏＡ形成した。次に、実施例
２と同様に、ガラス基板のもう一方の面に順次焼成層、
反射膜層、保護膜層を形成した。Example 5 Si was deposited on a chemically strengthened glass substrate by a sputtering method.
02-A1202 film was formed sooA. Next, as in Example 2, a fired layer was sequentially formed on the other surface of the glass substrate.
A reflective film layer and a protective film layer were formed.
得られた光ディスクを８０’Ｃ、９０％ＲＨ下で耐候性
を評価したところ、初期値が２．ＩＸ１０−３であった
ブロックエラーレートが、５００時間後には２．６Ｘ１
０ −３にやや増加した。しかしながら、この程度の変
化は再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 80'C and 90% RH, the initial value was 2. The block error rate was IX10-3, but after 500 hours it was 2.6X1.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例６
化学強化されたガラス基板上に、スパツタ法によりＳｉ
０２−Ｓｎ０２膜をｔｏｏｏＡ形成した。次に、実施例
２と同様に、ガラス基板のもう一方の面に順次焼成層、
反射膜層、保護膜層を形成した。Example 6 Si was deposited on a chemically strengthened glass substrate by sputtering.
02-Sn02 film was formed tooA. Next, as in Example 2, a fired layer was sequentially formed on the other surface of the glass substrate.
A reflective film layer and a protective film layer were formed.
得られた光ディスクを８０°Ｃ１９０％ＲＨ下で耐候性
を評価したところ、初期値が２．４Ｘ１０−３であった
ブ白ツクエラーレートが、５００時間後には３．ＩＸ１
０ −３にやや増加した。しかしながら、この程度の変
化は再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 80°C and 190% RH, the blanking error rate, which had an initial value of 2.4X10-3, decreased to 3.5X after 500 hours. IX1
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例７
化学強化されたガラス基板上に、スパツタ法によりＳｉ
０２−Ｔａ２０５膜をＩＯＯＯＡ形威した。次いで、テ
トラエトキシシラン、テトラブトキシチタン、塩得られ
た光ディスクを８０’Ｃ， ９０％ＲＨ下で耐候性を評
価したところ、初期値が２．６×１０−３であったブロ
ックエラーレートが、５００時間後には３．ＩＸ１０
’にやや増加した。しかしながら、この程度の変化は再
生特性上、何ら問題となるレベルではない。Example 7 Si was deposited on a chemically strengthened glass substrate by a sputtering method.
02-Ta205 film was processed into IOOOA form. Next, the weather resistance of the optical disc obtained with tetraethoxysilane, tetrabutoxytitanium, and salt was evaluated at 80'C and 90%RH, and the block error rate, whose initial value was 2.6 x 10-3, was as follows. After 500 hours, 3. IX10
'There was a slight increase. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。酸、水、ポリエチレングリコールを含むエ
チルアルコール溶液をスビンコートし、有機金属化合物
層を２０００〜ａｏｏｏＡ形威した。次いで、表面に所
定のビットパターンを有する樹脂製の型を有機金属化合
物層に押し当て、ビットパターンを転写すると共に１０
０°Ｃで一次焼戒を行つた。その後、ガラス基板を離型
し、３５０°Ｃで二次焼戒を行った。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality. An ethyl alcohol solution containing acid, water, and polyethylene glycol was coated to give an organometallic compound layer of 2000~aoooA shape. Next, a resin mold having a predetermined bit pattern on the surface is pressed against the organometallic compound layer, the bit pattern is transferred, and 10
The first burning precept was performed at 0°C. Thereafter, the glass substrate was released from the mold and subjected to secondary baking at 350°C.
このようにして作製したビットパターンを有する焼成層
の上に、反射膜としてスバツタ法でＡｕ−Ｇｅ合金膜を
約１ｏｏｏＡ， Ｓｉ０２膜をＩＯＯＯＡ順次戒膜した
。On the fired layer having the bit pattern thus prepared, an Au--Ge alloy film was sequentially coated as a reflective film by a sputtering method at about 100A, and an Si02 film was sequentially coated at IOOOA.
更にその上をＵＶ硬化樹脂層で被覆した。Furthermore, a UV curable resin layer was coated thereon.
得られた光ディスクを８０°Ｃ、９０％ＲＨ下で耐候性
を評価したところ、初期値が１．３Ｘ１０＝であったブ
ロックエラーレートが、５００時間後には１．６Ｘ１０
−３にやや増加した。しかしながら、この程度の変化は
再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 90% RH, the block error rate, which had an initial value of 1.3X10, decreased to 1.6X10 after 500 hours.
-3, a slight increase. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例８
化学強化されたガラス基板上に、スパツタ法によりＳｉ
０２−Ｃｒ０２膜をｔｏｏｏＡ形成した。次いで、もう
一方のガラス基板面の上にテトラエトキシシラン、テト
ラブトキシチタン、塩酸、水、ポリエチレングリコール
を含むエチルアルコール溶液をスピンコートし、有機金
属化合物層を２０００〜ａｏｏｏＡ形威した。次いで、
表面に所定のピットパターンを有する樹脂製の型を有機
金属化合物層に押し当て、ピットパターンを転写すると
共に１００°Ｃで一次焼戒を行った。その後、ガラス基
板を離型し、３５０６Ｃで二次焼或を行った。Example 8 Si was deposited on a chemically strengthened glass substrate by a sputtering method.
02-Cr02 film was formed tooA. Next, an ethyl alcohol solution containing tetraethoxysilane, tetrabutoxytitanium, hydrochloric acid, water, and polyethylene glycol was spin-coated onto the other glass substrate surface to form an organometallic compound layer with a thickness of 2000 to 1000A. Then,
A resin mold having a predetermined pit pattern on the surface was pressed against the organometallic compound layer, the pit pattern was transferred, and primary burning was performed at 100°C. Thereafter, the glass substrate was released from the mold and subjected to secondary baking at 3506C.
このようにして作製したピットパターンを有する焼戒層
の上に、スパッタ法でＡｕ−Ｇｅ合金膜を約１００ＯＡ
， Ｓｉ０２膜をｘｏｏｏＡ＞＋＋ｉ次戒膜した。更に
その上をＵＶ硬化樹脂層で被覆した。An Au-Ge alloy film with a thickness of about 100 OA was deposited by sputtering on the shokai layer having the pit pattern thus prepared.
, the Si02 film was made into a xooooA>++i order film. Furthermore, a UV curable resin layer was coated thereon.
得られた光ディスクをｓｏ’ｃ、９０％ＲＨ下で耐候性
を評価したところ、初期値が１．８Ｘ１０−３であった
ブロックエラーレートが、５００時間後には２．ＩＸ１
０ ’にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated under SO'C and 90% RH, the initial value of the block error rate was 1.8X10-3, but after 500 hours, the block error rate decreased to 2. IX1
It increased slightly to 0'. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例９
化学強化されたガラス基板に、スバッタ法によりＳｉ３
Ｎ４膜を８００Ａ形威した。次いで、一方のガラス基板
面の上にテトラエトキシシラン、テトラブトキシチタン
、塩酸、水、ポリエチレングリコールを含むエチルアル
コール溶液をスビンコートし、有機金属化合物層を２０
００〜ａｏｏｏＡ形戊した。次いで、表面に所定のピッ
トパターンを有する樹脂製の型を有機金属化合物層に押
し当て、ビットパターンを転写すると共に１００°Ｃで
一次焼戒を行った。その後、ガラス基板を離型し、３５
０°Ｃで二次焼或を行った。Example 9 Si3 was applied to a chemically strengthened glass substrate by sputtering method.
An 800A type N4 membrane was used. Next, an ethyl alcohol solution containing tetraethoxysilane, tetrabutoxytitanium, hydrochloric acid, water, and polyethylene glycol was coated on one glass substrate surface, and an organometallic compound layer was formed for 20 minutes.
00~aoooA shape was omitted. Next, a resin mold having a predetermined pit pattern on the surface was pressed against the organometallic compound layer, the bit pattern was transferred, and primary baking was performed at 100°C. After that, the glass substrate was released from the mold, and
Secondary baking was performed at 0°C.
このようにして作製したビットパターンを有する焼成層
の上に、スパッタ法でＡｕ−Ｇｅ合金膜を約１００ＯＡ
、Ｓｉ０２膜をｔｏｏｏＡｉ頂次戊膜した。更にその上
をＵＶ硬化樹脂層で被覆した。On the baked layer having the bit pattern thus prepared, an Au-Ge alloy film with a thickness of about 100 OA is applied by sputtering.
, the SiO2 film was apically coated with tooAi. Furthermore, a UV curable resin layer was coated thereon.
得られた光ディスクを８０８Ｃ、９０％団下で耐候性を
評価したところ、初期値が２．９Ｘ１『３であったブロ
ックエラーレートが、５００時間後には３．ＩＸ１０−
３にやや増加した。しかしながら、こめ程度の変化は再
生特性上、何ら問題となるレベルではない。When the weather resistance of the obtained optical disc was evaluated at 808C and 90% temperature, the block error rate, which had an initial value of 2.9X1'3, decreased to 3.9X after 500 hours. IX10-
It increased slightly to 3. However, such a change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ、９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 90% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例１０
実施例２と同様にして作製したガラス基板のピットパタ
ーンを有する焼成層の上に、クラスターイオンビーム法
でＴｉＮ膜を約１００ＯＡ，スパッタ法でＳｉ３Ｎ４膜
を８００〜１０００人順次戒膜した。更にその上をＵＶ
硬化樹脂層で被覆した。Example 10 A TiN film of about 100 OA was deposited using a cluster ion beam method and a Si3N4 film was deposited using a sputtering method by 800 to 1000 people on the fired layer having a pit pattern on a glass substrate prepared in the same manner as in Example 2. . Furthermore, UV
Covered with a hardened resin layer.
得られた光ディスクを８０°Ｃ， ９０％ＲＨ下で耐候
性を評価したところ、初期値が１．７Ｘ１０−３であっ
たブロックエラーレートが、５００時間後には２．ＩＸ
１０−３にやや増加した。しかしながら、この程度の変
化は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°C and 90% RH, the initial block error rate was 1.7X10-3, but after 500 hours, the block error rate decreased to 2. IX
It increased slightly to 10-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ， ９０％ＲＨの条件下に１時間ほど放
置した後、取り出して再生を行ったところ、何ら異常な
く再生できた。Furthermore, after leaving it for about 1 hour under the conditions of 80° C. and 90% RH, it was taken out and regenerated, and it was regenerated without any abnormality.
実施例１１
実施例２と同様にして作製したガラス基板のピットパタ
ーンを有する焼成層の上に、スパッタ法を用いてＡｕ膜
を約１００ＯＡ， Ｓｉ３Ｎ４膜をｇｏｏ〜ｘｏｏｏＡ
ｊｌｉ次或膜した。更にその上をＵＶ硬化樹脂層で被覆
した。Example 11 On a fired layer having a pit pattern of a glass substrate prepared in the same manner as in Example 2, an Au film was deposited at a thickness of about 100 OA and a Si3N4 film was deposited at a thickness of goo to xoooo A using a sputtering method.
I made a film next time. Furthermore, a UV curable resin layer was coated thereon.
得られた光ディスクを８０°０１９０％ＲＨ下で耐候性
を評価したところ、初期値が１．５Ｘ１０−３であった
ブロックエラーレートが、５００時間後には２．２Ｘ１
０−３にやや増加した。しかしながら、この程度の変化
は再生特性上、何ら問題となるレベルではない。When the weather resistance of the resulting optical disc was evaluated at 80°0190%RH, the block error rate, which had an initial value of 1.5X10-3, decreased to 2.2X1 after 500 hours.
It increased slightly to 0-3. However, this degree of change is not at a level that poses any problem in terms of reproduction characteristics.
また、８０°Ｃ１９０％ＲＨの条件下に１時間ほど放置
した後、取り出して再生を行ったところ、何ら異常なく
再生できた。Further, after being left under conditions of 80° C. and 190% RH for about one hour, it was taken out and regenerated, and it was regenerated without any abnormality.
比較例
市販されている音楽用のＣＤディスクについて同様に耐
候性の評価を行ったところ、ブロックエラーレートは５
Ｘ １０−４（初期値）から著しく変化し、５００時
間後には測定不能になっていた。また、８０Ｃ， ９０
％ＲＨ条件下に１時間ほど放置した後、取り出して再生
を行ったところ、反りが大きいため再生不能であった。Comparative Example When we similarly evaluated the weather resistance of commercially available music CD discs, the block error rate was 5.
It changed significantly from X 10-4 (initial value) and became unmeasurable after 500 hours. Also, 80C, 90
After being left under conditions of %RH for about 1 hour, it was taken out and regenerated, but it was found that it could not be regenerated due to large warpage.
（発明の効果）
以上述べてきたように、本発明による読み出し専用光デ
ィスークは信頼性、耐候性に優れており、従来使用でき
なかった応用分野への展開を可能にするものである。(Effects of the Invention) As described above, the read-only optical disk according to the present invention has excellent reliability and weather resistance, and can be applied to fields of application that could not be used conventionally.
第１図は本発明による読み出し専用光ディスクの概略断
面図である。
１・・・ガラス基板、２・・・拡散防止層、３・．・金
属アルコレートの焼戒層、４・・・反射膜、５・・・保
護膜FIG. 1 is a schematic cross-sectional view of a read-only optical disc according to the present invention. DESCRIPTION OF SYMBOLS 1...Glass substrate, 2...Diffusion prevention layer, 3...・Metal alcoholate baking layer, 4... Reflective film, 5... Protective film
Claims (3)
拡散防止層を形成した面と対向するもう一方のガラス基
板上に、微小な凹凸を有する金属アルコレートの焼成層
、Ａｕ、Ａｕ合金もしくはＴｉＮからなる反射膜及び保
護膜とを順次積層したことを特徴とする読み出し専用光
ディスク。(1) A diffusion prevention layer is formed on a transparent glass substrate, and on the other glass substrate facing the surface on which this diffusion prevention layer is formed, a fired layer of metal alcoholate having minute irregularities, Au, Au, etc. A read-only optical disc characterized by sequentially laminating a reflective film and a protective film made of an alloy or TiN.
ｎ、Ｃｒの中から選ばれた少なくとも一種類以上の元素
からなる酸化物であることを特徴とする特許請求の範囲
第１項記載の読み出し専用光ディスク。(2) Diffusion prevention layer is Si, Ti, Ta, Al, Zr, S
2. The read-only optical disk according to claim 1, wherein the read-only optical disk is an oxide consisting of at least one element selected from n, Cr.
する特許請求の範囲第１項記載の読み出し専用光ディス
ク。(3) The read-only optical disk according to claim 1, wherein the anti-diffusion layer is made of Si_3N_4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1166080A JPH0762918B2 (en) | 1989-06-27 | 1989-06-27 | Read-only optical disc |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1166080A JPH0762918B2 (en) | 1989-06-27 | 1989-06-27 | Read-only optical disc |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0330133A true JPH0330133A (en) | 1991-02-08 |
| JPH0762918B2 JPH0762918B2 (en) | 1995-07-05 |
Family
ID=15824609
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1166080A Expired - Lifetime JPH0762918B2 (en) | 1989-06-27 | 1989-06-27 | Read-only optical disc |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0762918B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1324326A1 (en) * | 2001-12-18 | 2003-07-02 | Matsushita Electric Industrial Co., Ltd. | Information recording medium and method for producing the same |
| US6858278B2 (en) | 2001-12-18 | 2005-02-22 | Matsushita Electric Industrial Co., Ltd. | Information recording medium and method for producing the same |
| KR200447415Y1 (en) * | 2009-07-28 | 2010-01-25 | 웅진코웨이주식회사 | Sanitary Glove Holder |
-
1989
- 1989-06-27 JP JP1166080A patent/JPH0762918B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1324326A1 (en) * | 2001-12-18 | 2003-07-02 | Matsushita Electric Industrial Co., Ltd. | Information recording medium and method for producing the same |
| US6858278B2 (en) | 2001-12-18 | 2005-02-22 | Matsushita Electric Industrial Co., Ltd. | Information recording medium and method for producing the same |
| KR200447415Y1 (en) * | 2009-07-28 | 2010-01-25 | 웅진코웨이주식회사 | Sanitary Glove Holder |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0762918B2 (en) | 1995-07-05 |
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