JPH0332351U - - Google Patents

Info

Publication number
JPH0332351U
JPH0332351U JP9350189U JP9350189U JPH0332351U JP H0332351 U JPH0332351 U JP H0332351U JP 9350189 U JP9350189 U JP 9350189U JP 9350189 U JP9350189 U JP 9350189U JP H0332351 U JPH0332351 U JP H0332351U
Authority
JP
Japan
Prior art keywords
shaped thin
thin plate
skirt
front skirt
power source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9350189U
Other languages
Japanese (ja)
Other versions
JP2508590Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1989093501U priority Critical patent/JP2508590Y2/en
Publication of JPH0332351U publication Critical patent/JPH0332351U/ja
Application granted granted Critical
Publication of JP2508590Y2 publication Critical patent/JP2508590Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案の一実施例の概略図である。 1……電子ビーム、2……正イオン、3……正
電位、4……イオントラツプ電極、5……正イオ
ンの運動方向、6,7……イオン中和用のフイン
、8……電源、9……分子。
FIG. 1 is a schematic diagram of an embodiment of the present invention. 1... Electron beam, 2... Positive ions, 3... Positive potential, 4... Ion trap electrode, 5... Movement direction of positive ions, 6, 7... Fin for ion neutralization, 8... Power source, 9...Molecular.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 円錐体の底面を除いた表面部分の中心軸上に頂
点を含んだ同心円の穴があけられた導電体からな
る前部スカート形状薄板と、前記前部スカート形
状薄板とある一定距離を保持して平行に固定され
る前記前部スカート形状薄板と同形状の後部スカ
ート形状薄板と、前記前部及び後部スカート形状
薄板の両方に電位を与える電源とを有することを
特徴とするイオン中和構造。
A front skirt-shaped thin plate made of a conductor with a concentric hole including the apex on the central axis of the surface portion of the cone excluding the bottom surface, and a certain distance from the front skirt-shaped thin plate is maintained. An ion neutralization structure characterized by comprising: a rear skirt-shaped thin plate having the same shape as the front skirt-shaped thin plate fixed in parallel; and a power source that applies a potential to both the front and rear skirt-shaped thin plates.
JP1989093501U 1989-08-08 1989-08-08 Ion neutralization structure Expired - Lifetime JP2508590Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1989093501U JP2508590Y2 (en) 1989-08-08 1989-08-08 Ion neutralization structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1989093501U JP2508590Y2 (en) 1989-08-08 1989-08-08 Ion neutralization structure

Publications (2)

Publication Number Publication Date
JPH0332351U true JPH0332351U (en) 1991-03-28
JP2508590Y2 JP2508590Y2 (en) 1996-08-28

Family

ID=31642879

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1989093501U Expired - Lifetime JP2508590Y2 (en) 1989-08-08 1989-08-08 Ion neutralization structure

Country Status (1)

Country Link
JP (1) JP2508590Y2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63108700A (en) * 1986-10-27 1988-05-13 日本電信電話株式会社 Ion neutralizer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63108700A (en) * 1986-10-27 1988-05-13 日本電信電話株式会社 Ion neutralizer

Also Published As

Publication number Publication date
JP2508590Y2 (en) 1996-08-28

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