JPH0334299A - High-frequency heating device - Google Patents

High-frequency heating device

Info

Publication number
JPH0334299A
JPH0334299A JP1166865A JP16686589A JPH0334299A JP H0334299 A JPH0334299 A JP H0334299A JP 1166865 A JP1166865 A JP 1166865A JP 16686589 A JP16686589 A JP 16686589A JP H0334299 A JPH0334299 A JP H0334299A
Authority
JP
Japan
Prior art keywords
waveguide
plasma
heating
heating device
module
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1166865A
Other languages
Japanese (ja)
Inventor
Koji Ito
孝治 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1166865A priority Critical patent/JPH0334299A/en
Publication of JPH0334299A publication Critical patent/JPH0334299A/en
Pending legal-status Critical Current

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  • Plasma Technology (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野〉 本発明は核融合(実験)装置等におけるプラズマ加熱用
高周波加熱装置に係り、特に低域ハイブリッド波帯高周
波加熱装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a high-frequency heating device for plasma heating in a nuclear fusion (experimental) device, etc., and particularly relates to a low-frequency hybrid wave band high-frequency heating device.

(従来の技術) 核融合(実験)装置におけるプラズマ加熱は、プラズマ
中に電流を通して加熱するジュール加熱の他に、第2段
加熱方法として中性粒子加熱法や高周波加熱等で行なわ
れている。ここで高周波加熱法は、高周波電磁波のエネ
ルギーをプラズマに吸収させてプラズマの温度を上げる
方法で、使用する周波数によって各種の方式がありその
1つに低域ハイブリッド波帯高周波加熱がある。その−
例を第2図に示す。
(Prior Art) Plasma heating in a nuclear fusion (experimental) device is performed by a neutral particle heating method, high frequency heating, etc. as a second stage heating method, in addition to Joule heating, which heats the plasma by passing an electric current through it. The high-frequency heating method is a method of increasing the temperature of the plasma by absorbing the energy of high-frequency electromagnetic waves into the plasma, and there are various methods depending on the frequency used, one of which is low-frequency hybrid wave band high-frequency heating. That-
An example is shown in FIG.

すなわち、高出力の電磁波を発振増幅する高周波発振器
1.この高周波発振器1で発生した電磁波を核融合(実
@)装置2まで伝送する高周波伝送系3.および伝送系
3に接続され電磁波をプラズマ4に放射する高周波結合
系5から構成される。
That is, a high-frequency oscillator that oscillates and amplifies high-power electromagnetic waves 1. A high frequency transmission system 3 that transmits the electromagnetic waves generated by this high frequency oscillator 1 to the nuclear fusion (real@) device 2. and a high frequency coupling system 5 connected to the transmission system 3 and radiating electromagnetic waves to the plasma 4.

なお6は真空気密封止板である。Note that 6 is a vacuum sealing plate.

中でも高周波結合系5は核融合(実験)装置2のポート
2aに押入されるので寸法制約もあり狭い空間に設けな
ければならない。
Among them, the high frequency coupling system 5 is inserted into the port 2a of the nuclear fusion (experiment) device 2, so it must be installed in a narrow space due to size constraints.

第3図は従来の高周波結合系5の一例を示すもので(特
公昭59−43002)、7は矩形状の導波管であり、
通常複数本の導波管7が格子状に配列され。
FIG. 3 shows an example of a conventional high-frequency coupling system 5 (Japanese Patent Publication No. 59-43002), in which 7 is a rectangular waveguide.
Usually, a plurality of waveguides 7 are arranged in a grid pattern.

導波管束8を形成している。A waveguide bundle 8 is formed.

電磁波はこの各々の導波管7の中を伝送され、プラズマ
4側の先端部からプラズマ4に放射される。これらの導
波管7は、導波管束容器9によって全体が覆われている
。導波管束容器9には流体用通路9a、9bが設けられ
、この通路9a、9bにはガス等の流体を流して導波管
7および導波管束容器9を冷却加熱できるようになって
いる。すなわち′Mk4前には導波管7からの放出ガス
を軽減させるために高温流体を流して加熱し、一方運転
時にはジュール発熱やプラズマ4からの照射熱を除去す
るために低温流体を流して冷却される。
Electromagnetic waves are transmitted through each waveguide 7 and radiated to the plasma 4 from the tip on the plasma 4 side. These waveguides 7 are entirely covered by a waveguide bundle container 9. The waveguide bundle container 9 is provided with fluid passages 9a and 9b, and the waveguide 7 and the waveguide bundle container 9 can be cooled and heated by flowing fluid such as gas through the passages 9a and 9b. . That is, before Mk4, high-temperature fluid is flown and heated in order to reduce the gas released from the waveguide 7, while during operation, low-temperature fluid is flown and cooled in order to remove Joule heat generation and irradiation heat from the plasma 4. be done.

(発明が解決しようとする課題) プラズマの加熱効率を高くするためには、導波管7同志
のピッチを小さくして多数本の導波管を用いた方がプラ
ズマ4中に効率よく電磁波を入射できる。またプラズマ
側先端部の電磁波放射部の開孔率が大きい程効率よく放
射出来るため、導波11?7の板厚は薄くする事が望ま
しい。しかし第3図の様に導波管7を導波管束容器9で
覆い、その空間に流体を流す方法では導波管7の内側は
真空、外側は流体圧になり、導波管7には少なくとも1
 kg/J以上の外圧が働くため、板厚をあまり薄くす
る事が出来なかった。なお冷却・加熱手段が無い場合に
は、真空下であり熱移動は熱伝導と熱ふく射だけとなる
ため、冷却不十分となり、高出力・ロングパルス運転に
耐える高周波加熱装置の実現が不可能になる。
(Problem to be Solved by the Invention) In order to increase the heating efficiency of the plasma, it is better to reduce the pitch between the waveguides 7 and use a large number of waveguides to efficiently transmit electromagnetic waves into the plasma 4. It can be input. Further, the larger the aperture ratio of the electromagnetic wave emitting section at the plasma side tip, the more efficiently the electromagnetic wave can be emitted, so it is desirable that the plate thickness of the waveguides 11 to 7 be made thinner. However, in the method of covering the waveguide 7 with a waveguide bundle container 9 and flowing fluid into the space as shown in FIG. 3, the inside of the waveguide 7 is vacuum and the outside is under fluid pressure, at least 1
Because of the external pressure of kg/J or more, it was not possible to reduce the plate thickness very much. Note that if there is no cooling/heating means, it is under vacuum and the only heat transfer is heat conduction and radiation, resulting in insufficient cooling and making it impossible to create a high-frequency heating device that can withstand high-output, long-pulse operation. Become.

本発明は上記事情に基づいてなされたもので、その目的
は低域ハイブリッド波帯の導波管束をコンパクトに形威
し、かつ効率よく冷却加熱できるようにして、高出力・
高効率でプラズマ加熱が可能な高周波加熱装置を提供す
ることにある。
The present invention has been made based on the above-mentioned circumstances, and its purpose is to make a waveguide bundle for the low hybrid wave band compact, and to enable efficient cooling and heating to achieve high output and high output.
An object of the present invention is to provide a high frequency heating device capable of plasma heating with high efficiency.

〔発明の構成〕[Structure of the invention]

(課題を解決するための手段) 上記目的を達成するために、本発明では、薄板の仕切り
で多数本の導波管を形成した導波管モジュールを使用し
、その外周部を厚内にし、かつ複数本の導波管モジュー
ルを導波管束容器で覆って流体流路を形成した構成とす
る。
(Means for Solving the Problems) In order to achieve the above object, the present invention uses a waveguide module in which a large number of waveguides are formed with thin plate partitions, and the outer periphery thereof is made within the thickness. In addition, a plurality of waveguide modules are covered with a waveguide bundle container to form a fluid flow path.

(作用) 導波管モジュールの外周部に流体が流れ加熱冷却できる
事は勿論、仕切板には外圧が働かないため、仕切板の板
厚を薄くでき、かつ導波管同志のピッチを狭くする事も
可能となり放射部間孔率が大となり加熱効率が格段に向
上する。
(Function) Not only can the fluid flow around the outer periphery of the waveguide module to heat and cool it, but because no external pressure acts on the partition plate, the thickness of the partition plate can be made thinner, and the pitch between the waveguides can be narrowed. This makes it possible to increase the porosity between the radiant parts and significantly improve heating efficiency.

(実施例) 以下本発明による高周波加熱装置の一実施例を第1図お
よび第2図を参照して説明する。
(Embodiment) An embodiment of the high frequency heating device according to the present invention will be described below with reference to FIGS. 1 and 2.

第■図は導波管束8の断面図で、10は多数本の導波管
7を一体形成した導波管モジュールである。
FIG. 3 is a sectional view of the waveguide bundle 8, and 10 is a waveguide module in which a large number of waveguides 7 are integrally formed.

複数本の導波管モジュール10は格子状に配列され、導
波管束容器9に包含されている。導波管モジュールIO
の上下面には流体流路9aが形成され加熱冷却ができる
ようになっている。
A plurality of waveguide modules 10 are arranged in a grid pattern and contained in a waveguide bundle container 9. Waveguide module IO
Fluid flow paths 9a are formed on the upper and lower surfaces of the housing to enable heating and cooling.

導波管モジュール10は外周が厚内で薄板の仕切板11
で多数本の導波管7に分割されている。導波管モジュー
ル10の外周10aは流体と真空のバウンダリーとなる
ため流体圧に耐えるように厚内で構成されている。なお
各導波管モジュールlOと導波管束容器9はプラズマ側
2反プラズマ側共真空気密に溶接されている。
The waveguide module 10 has a thin partition plate 11 with a thick outer circumference.
It is divided into a large number of waveguides 7. The outer periphery 10a of the waveguide module 10 forms a boundary between fluid and vacuum, and is therefore designed to be thick enough to withstand fluid pressure. Note that each waveguide module IO and the waveguide bundle container 9 are vacuum-tightly welded on both the plasma side and the anti-plasma side.

次に上記の如く構成された本実施例の作用について説明
する。
Next, the operation of this embodiment configured as described above will be explained.

導波管7には高周波電流が流れるのでジュール損失によ
る発熱が生じる。またプラズマ側先端部にはプラズマ4
からの照射熱が当る。これらの発熱は導波管モジュール
10と導波管束容器9とで形成された流体流路9aを流
れる流体によって除熱される。すなわち外部の図示しな
い加熱冷却系から供給管を介して供給された冷却流体は
、流路9aを貫流して導波管モジュール10を冷却し、
戻り流路9bを通って排出管を介して加熱冷却系に戻る
。また運転時には前記したように冷却流体を貫流させる
が、高温流体を貫流させて導波管モジュール10を加熱
する事も出来る。この加熱を運転前に行う事により導波
管モジュール10や導波管束容器9からの放出ガスを少
なくする事が可能でプラズマ4への不純物の流入を少な
くする。また導波管7内での放電をも防止できるので高
出力の電力を安定に伝送できる。
Since a high frequency current flows through the waveguide 7, heat generation occurs due to Joule loss. In addition, the tip of the plasma side has plasma 4
The irradiated heat from the This heat generation is removed by the fluid flowing through the fluid flow path 9a formed by the waveguide module 10 and the waveguide bundle container 9. That is, the cooling fluid supplied via the supply pipe from an external heating and cooling system (not shown) flows through the flow path 9a to cool the waveguide module 10,
It passes through the return flow path 9b and returns to the heating and cooling system via the discharge pipe. Furthermore, during operation, although the cooling fluid flows through the waveguide module 10 as described above, the waveguide module 10 can also be heated by flowing a high-temperature fluid through the waveguide module 10. By performing this heating before operation, it is possible to reduce the amount of gas released from the waveguide module 10 and the waveguide bundle container 9, thereby reducing the inflow of impurities into the plasma 4. Furthermore, since discharge within the waveguide 7 can be prevented, high-output power can be stably transmitted.

さらに導波管モジュールlOの外周10aには流体圧と
真空との差圧が働くが、導波管7を形成する仕切板11
には外圧が働かないため、板圧を薄くでき1波管7同志
のピッチを狭くする事ができるので放射部間孔率が大と
なり、加熱効率を格段に向上させる事ができる。
Further, a pressure difference between fluid pressure and vacuum acts on the outer periphery 10a of the waveguide module IO, but the partition plate 11 forming the waveguide 7
Since no external pressure acts on the tube, the plate thickness can be reduced and the pitch between the single-wave tubes 7 can be narrowed, increasing the porosity between the radiating parts and significantly improving the heating efficiency.

〔発明の効果〕〔Effect of the invention〕

以上詳述した様に本発明によれば、導波管の冷却加熱を
効率よく行えるので除熱能力が大で、かつ放出ガス量を
少なくでき、高出力の電力伝送が可能となる事は勿論、
導波管の仕切板には外圧が働かないので板厚を薄くでき
るため導波管モジュールをコンパクトに構成する事が可
能となる。
As detailed above, according to the present invention, since the waveguide can be cooled and heated efficiently, the heat removal capacity is large, the amount of released gas can be reduced, and high-output power transmission is of course possible. ,
Since no external pressure acts on the waveguide partition plate, the plate thickness can be made thinner, making it possible to configure the waveguide module compactly.

したがってプラズマ側の放射部の開孔率が大になり、プ
ラズマへの放射効率が向上する。よって本発明によれば
高出力・高効率でプラズマ加熱が可能な高周波加熱装置
を提供できる。
Therefore, the aperture ratio of the radiation section on the plasma side increases, and the radiation efficiency to the plasma improves. Therefore, according to the present invention, it is possible to provide a high frequency heating device capable of plasma heating with high output and high efficiency.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の高周波加熱装置の一実施例の高周波結
合系の要部を示す断面図、第2図は高周波加熱装置の構
成を示す説明図、第3図は従来の高周波結合系を示す図
である。 ■・・高周波発振器  2・・・核融合(実験)装置3
・・・高周波伝送系  4・・・プラズマ5・・高周波
結合系  6・・・真空気密封止板7・・・導波管  
   8・・・導波管束9・・・導波管束容器  10
・・・導波管モジュール11・・・仕切板
FIG. 1 is a cross-sectional view showing the main parts of a high-frequency coupling system of an embodiment of the high-frequency heating device of the present invention, FIG. 2 is an explanatory diagram showing the configuration of the high-frequency heating device, and FIG. 3 is a diagram showing a conventional high-frequency coupling system. FIG. ■... High frequency oscillator 2... Nuclear fusion (experimental) device 3
... High frequency transmission system 4 ... Plasma 5 ... High frequency coupling system 6 ... Vacuum sealing plate 7 ... Waveguide
8... Waveguide bundle 9... Waveguide bundle container 10
... Waveguide module 11 ... Partition plate

Claims (2)

【特許請求の範囲】[Claims] (1)内部に薄板の仕切板で多数本の導波管を形成した
導波管モジュールを複数本集合し、その外側を導波管束
容器で覆い、導波管モジュールの相互間および導波管モ
ジュールと導波管束容器とのあいだに冷却または加熱す
るための流体の流路を形成した事を特徴とする高周波加
熱装置。
(1) A plurality of waveguide modules each having a large number of waveguides formed inside with a thin partition plate are assembled, and the outside of the waveguide module is covered with a waveguide bundle container, and the waveguide modules are connected between each other and the waveguide A high-frequency heating device characterized in that a fluid flow path for cooling or heating is formed between a module and a waveguide bundle container.
(2)導波管モジュールの外周の板を仕切板よりも厚く
したことを特徴とする請求項(1)記載の高周波加熱装
置。
(2) The high-frequency heating device according to claim (1), wherein the outer peripheral plate of the waveguide module is made thicker than the partition plate.
JP1166865A 1989-06-30 1989-06-30 High-frequency heating device Pending JPH0334299A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1166865A JPH0334299A (en) 1989-06-30 1989-06-30 High-frequency heating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1166865A JPH0334299A (en) 1989-06-30 1989-06-30 High-frequency heating device

Publications (1)

Publication Number Publication Date
JPH0334299A true JPH0334299A (en) 1991-02-14

Family

ID=15839070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1166865A Pending JPH0334299A (en) 1989-06-30 1989-06-30 High-frequency heating device

Country Status (1)

Country Link
JP (1) JPH0334299A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6138890A (en) * 1997-10-30 2000-10-31 Nec Corporation Automatic soldering mechanism capable of improving a working efficiency with stabilizing a soldering quality

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6138890A (en) * 1997-10-30 2000-10-31 Nec Corporation Automatic soldering mechanism capable of improving a working efficiency with stabilizing a soldering quality

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