JPH0337815A - Composite thin film magnetic head and its manufacturing method - Google Patents

Composite thin film magnetic head and its manufacturing method

Info

Publication number
JPH0337815A
JPH0337815A JP1172238A JP17223889A JPH0337815A JP H0337815 A JPH0337815 A JP H0337815A JP 1172238 A JP1172238 A JP 1172238A JP 17223889 A JP17223889 A JP 17223889A JP H0337815 A JPH0337815 A JP H0337815A
Authority
JP
Japan
Prior art keywords
magnetic pole
magnetic
thin film
magnetic head
head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1172238A
Other languages
Japanese (ja)
Inventor
Osamu Watanabe
修 渡辺
Satoru Mitani
覚 三谷
Terumi Yanagi
柳 照美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1172238A priority Critical patent/JPH0337815A/en
Publication of JPH0337815A publication Critical patent/JPH0337815A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3967Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read

Landscapes

  • Magnetic Heads (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 産業上の利用分野 本発明(よ 磁気ディスク装置等に用いられる磁気ヘッ
ドに関するもので、特に記録及び再生兼用であり高再生
出力 低記録電流をもつ高性能薄膜磁気ヘッドに関する
ものであも 従来の技術 従来の薄膜ヘッドを第3、4図及び第5図に基づき説明
すも 一般に薄膜磁気ヘッド(よ 例えば第3図に示す
ような断面構造を有していも すなわ板 基板ll上に
軟磁性体材料 例えばNi−Fe合金等からなる下部磁
性体磁極12が形成されも 次いでギャップとなる所定
膜厚の絶縁層13が形成されも さらに熱硬化されたフ
ォトレジスト層14および16に埋め込まれるようにし
て導体材粧 例え!;J:  Au、  AI、Cu等
からなる導電コイル15が形成されたあと、軟磁性体材
料からなる上部磁性体磁極17が形成され、次ぎにAl
2O3等の絶縁物からなる保護膜18が形成されて薄膜
磁気ヘッドが完成する。しかし第3図のごとき巻線型の
ヘッドにおいてはその再生出力を増大させるに(よ 記
録媒体19との相対速度を増加させるか巻線数を増加さ
せねばならず、その製造技術は限界に近づきつつあも 
第4図に磁気抵抗型のヘッドを示す。同図(よ 記録媒
体19と磁気抵抗効果素子20が接触しない磁気抵抗型
ヘッドであもこのような磁気抵抗型ヘッドで(上 再生
出力は巻線型に比べて約10倍大きい力曳 再生専用で
あり媒体上に記録することはできなL〜 この様な問題
を解決するために第5図に示すような巻線型と磁気抵抗
型を合わせた複合型ヘッドが提案されている(特開昭6
1−48116号公報)。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic head used in a magnetic disk device, etc., and particularly relates to a high-performance thin film magnetic head that can be used for both recording and reproduction, and has a high reproduction output and a low recording current. Although conventional thin-film heads will be explained based on FIGS. 3, 4, and 5, they are generally thin-film magnetic heads (for example, even if they have a cross-sectional structure as shown in FIG. 3). A lower magnetic pole 12 made of a soft magnetic material such as a Ni-Fe alloy is formed on the substrate 11, and then an insulating layer 13 with a predetermined thickness to form a gap is formed, and then a thermoset photoresist layer 14 and J: After the conductive coil 15 made of Au, AI, Cu, etc. is formed, the upper magnetic pole 17 made of a soft magnetic material is formed, and then the upper magnetic pole 17 made of a soft magnetic material is formed.
A protective film 18 made of an insulator such as 2O3 is formed to complete the thin film magnetic head. However, in order to increase the reproduction output of a wire-wound head as shown in Figure 3, it is necessary to either increase the relative speed with the recording medium 19 or increase the number of windings, and the manufacturing technology is approaching its limits. Amo
FIG. 4 shows a magnetoresistive head. The same figure (see above) shows that the recording medium 19 and the magnetoresistive element 20 do not come into contact with each other in a magnetoresistive head. In order to solve this problem, a composite type head combining a wire-wound type and a magnetoresistive type as shown in Fig.
1-48116).

発明が解決しようとする課題 前記従来例で示したような構造を有する複合型薄膜磁気
ヘッドにおいてζよ 熱硬化されたフォトレジスト16
上に上部磁性体磁極17が積層されるた吹 第5図に示
したように フロントギャップ部及びパックギャップ部
のなだらかな段差部(それぞ花 第5図中の矢印A及び
Bで示す)が形成されも このような段差部においてζ
上 上部磁性体磁極17を威す軟磁性体材料の磁気詩法
 例えば透磁率及び保磁力等が劣化し磁気ヘッドの記録
効率低下の要因となっている。まな 第5図で示したヨ
ーク型磁気抵抗型ヘッドで(上 ノンシールドを シー
ルド型タイプと違ってMR素子を記録媒体19から遠ざ
けて導磁路(フラックスガイド)を通して媒体からの磁
束を磁気抵抗効果素子に作用させるた吹 フロントギャ
ップ部の上部磁性体磁極に段差部があることにより、磁
気抵抗効果素子への磁束の流れの効率を悪化させる一つ
の要因となっていも さらに第5図の矢印Cに示したよ
うに 上部磁性体磁極の一部にスリットを形成する暇 
このスリット幅はヨーク型磁気抵抗効果型ヘッドの特性
に影響を与える重要なパラメータの一つで、このスリッ
ト幅を正確にコントロールする必要があり、上部磁性体
層を、スパッタ蒸着法で形at、、  これをイオンエ
ツチング処理することにより上部磁性体磁極を形成する
製造方法で(よ 磁気抵抗効果素子のリード線等に断線
が生じたり、又それを防ぐ為には工程が複雑になり量産
性に欠けていも 本発明ζよ このような従来技術の課題を解決すること
を目的とすも 課題を解決するための手段 本発明ζ友 下部磁性体磁極と上部磁性体磁極と導電コ
イルとの間を埋めている絶縁層の膜厚に等しい膜厚を持
つ下部ないしは上部磁性体磁極とは別個の磁性体磁極を
下部と上部磁性体磁極との接合部分であるフロントギャ
ップ舐 パックギャップ部に挿入したものであも また
 下部磁性体磁極をスパッタ蒸着法で形成し 上部磁性
体磁極をメッキ法で形成することによってなされも作用 この様な構造にすることにより、磁気ヘッドの磁気回路
となる軟磁性体層は全て平坦な上に形成され 導電コイ
ルにより発生した磁束(友 上部及び下部磁性体磁極及
び磁気抵抗効果素子を通り、損失なくギャップ部に集束
され 低記録電流化が可能になり、また再生時には記録
媒体からの漏れ磁束は段差部のない平坦な上部磁性体磁
極から効率よく磁気抵抗効果素子へ集束され高出力が得
られも また 上部磁性体磁極の一部にスリットを形成するとい
う薄膜プロセス上複雑な工程をメッキ法で形成すること
により高性能な薄膜磁気ヘッドを容易に製造できも 実施例 以下、本発明の実施例を、第1図及び第2図に基づいて
説明する。第1図は平面は 第2図は第1図のA−A断
面図であも 第1図及び第2図において、本実施例は非磁性基板l上
に軟磁性材料で下部磁性体磁極2を形成すa 次いで下
部磁性体磁極2と導電コイル4との電気的絶縁をとるた
めの第一の絶縁層3を形成し その上に導電コイル4を
形成すも 次いで上部磁性体磁極9と下部磁性体磁極2
との接合部であるフロントギャップ部5A及びバックギ
ャップ部5Bにリフトオフ等の手段により中間軟磁性体
を形成し 更に導電コイル4と磁気抵抗素子7及び上部
磁性体磁極9とを絶縁するために 絶縁膜をスパッタ真
空蒸着の手段により形成し 平坦化加工等の手段により
、中間軟磁性体層(5A、5B)の膜厚に等しい絶縁膜
で第二の絶縁層6が充填されも 次ぎに第二の絶縁層6
上に磁気抵抗材層を形成し エツチングにより磁気抵抗
効果素子7を形威すも 次ぎに軟磁性体層で形成したフ
ロントギャップ部5A上に所定厚のギャップ層8を形成
し またその絶縁層は磁気抵抗効果素子7と上部磁性体
磁極9を絶縁するための第三の絶縁層となa さらにそ
の上に上部磁性体磁極9は磁気抵抗効果素子7の上部で
磁気抵抗効果素子7と略同−形状に隙間を持つようにフ
ォトレジストでパターンニングされた部分にメッキ法に
よりアディティブメッキすも 以上の各薄膜プロセスに
おいて、下部及び中間磁性体磁極の軟磁性材料として(
よ パーマロイやアモルファスの真空蒸着膜もしくはス
パッタ膜が上部磁性体磁極の軟磁性体層はパーマロイや
F e −N i −Co系のメッキ膜カミ また導電
コイル層として(よ AL  CuやAuの真空蒸着膜
力交 絶縁層としては5iOzやAla○3のスパッタ
膜力丈 更に磁気抵抗効果素子としてUFe−Ni、N
i−Co系の真空蒸着膜等が用いられも第1図の実施例
によると上部磁性体磁極の一部に単一の磁気抵抗効果素
子を設けたカミ 複数個の磁気抵抗効果素子を設けるこ
とにより再生出力の増大及びS/Nの向上を果たすこと
ができも 通念 磁気抵抗効果素子の再生出力を増大す
るために バイアス磁界が必要であるカミ 本発明の場
合導電コイルに微少電流を流すことにより容易に達成で
きも 発明の詳細 な説明したように本発明によると、上部磁性体磁極(、
t、フロントギャップ部において段差部をほとんど経験
しないので、上部磁性体磁極の段差部における磁気特性
の劣化 すなわち透磁率および保持力等の劣化が抑制さ
れ 記録媒体からの漏れ磁束は効率よく上部磁性体磁極
から磁気抵抗効果素子へ集束されも また パックギャ
ップ部も段差部がなく中間軟磁性体の分だけ磁気ヘッド
を威す磁性体の量が増すので、パックギャップ部におけ
る磁気的な飽和が抑制されR/W効率も向上すム また
上部磁性体の一部に隙間を持つようなコア形状にするた
めの複雑な工程もメッキ法により容易に製造できも 以上をまとめると、記録効率のよい巻線型薄膜磁気ヘッ
ドと再生出力の大きな磁気抵抗効果型ヘッドが併設され
 記録及び再生が同一ヘッドで行われ さらに従来の再
生出力より約10倍大きい再生出力が得られる良好な特
性をもつ薄膜磁気ヘッドを容易に製造できも
Problems to be Solved by the Invention In a composite thin film magnetic head having a structure as shown in the conventional example, the thermally hardened photoresist 16
As shown in Fig. 5, the gentle stepped portions (indicated by arrows A and B in Fig. 5) of the front gap portion and the pack gap portion are Even if formed, ζ
Top Magnetic method of soft magnetic material that affects the upper magnetic pole 17 For example, magnetic permeability and coercive force are deteriorated, which causes a decrease in the recording efficiency of the magnetic head. Mana: With the yoke type magnetoresistive head shown in Figure 5 (above), unlike the non-shielded type, the MR element is moved away from the recording medium 19 and the magnetic flux from the medium is passed through a magnetic flux guide to produce a magnetoresistive effect. Even though the presence of a stepped portion in the upper magnetic pole of the front gap section is one of the factors that deteriorates the efficiency of the flow of magnetic flux to the magnetoresistive element. As shown in Figure 2, there is no time to form a slit in part of the upper magnetic pole
This slit width is one of the important parameters that affects the characteristics of the yoke type magnetoresistive head, and it is necessary to accurately control this slit width. This is a manufacturing method in which the upper magnetic pole is formed by ion etching (this may lead to breakage in the lead wires of the magnetoresistive element, and to prevent such breakage, the process becomes complicated and mass production becomes difficult. Although the present invention is lacking, it is an object of the present invention to solve the problems of the prior art, and a means for solving the problems. A magnetic pole separate from the lower or upper magnetic pole with a film thickness equal to the thickness of the buried insulating layer is inserted into the front gap, which is the joint between the lower and upper magnetic poles. However, it is also possible to form the lower magnetic pole by sputter deposition and the upper magnetic pole by plating.With this structure, a soft magnetic layer becomes the magnetic circuit of the magnetic head. The magnetic flux generated by the conductive coil passes through the upper and lower magnetic poles and the magnetoresistive element, and is focused at the gap without loss, making it possible to reduce the recording current, and during playback, the magnetic flux is The leakage magnetic flux from the medium is efficiently focused on the magnetoresistive element from the flat upper magnetic pole without any steps, and high output can be obtained. A high-performance thin film magnetic head can be easily manufactured by forming a high-performance thin-film magnetic head using a plating process. Figure 2 is a cross-sectional view taken along the line A-A in Figure 1. In Figures 1 and 2, the lower magnetic pole 2 is formed of a soft magnetic material on a non-magnetic substrate l. Next, a first insulating layer 3 is formed to provide electrical insulation between the lower magnetic pole 2 and the conductive coil 4, and the conductive coil 4 is formed thereon.Then, the upper magnetic pole 9 and the lower magnetic pole 2 are formed.
In order to further insulate the conductive coil 4 from the magnetoresistive element 7 and the upper magnetic pole 9, an intermediate soft magnetic material is formed by means such as lift-off at the front gap part 5A and the back gap part 5B, which are the joint parts with the conductive coil 4, the magnetoresistive element 7, and the upper magnetic pole 9. The second insulating layer 6 is filled with an insulating film having a thickness equal to that of the intermediate soft magnetic layers (5A, 5B) by forming a film by means of sputtering and vacuum evaporation, and by means of planarization or the like. Insulating layer 6
A magnetoresistive material layer is formed thereon, and the magnetoresistive effect element 7 is shaped by etching.Next, a gap layer 8 of a predetermined thickness is formed on the front gap portion 5A formed of the soft magnetic material layer, and the insulating layer is This is a third insulating layer for insulating the magnetoresistive element 7 and the upper magnetic pole 9. Furthermore, the upper magnetic pole 9 is formed above the magnetoresistive element 7 and is approximately the same as the magnetoresistive element 7. - Additive plating is applied to parts patterned with photoresist so that there are gaps in the shape. In each of the above thin film processes, (
The soft magnetic layer of the upper magnetic pole is a permalloy or amorphous vacuum deposited film or a sputtered film.The soft magnetic layer of the upper magnetic pole is a permalloy or Fe-Ni-Co plating film. Film force exchange As an insulating layer, sputtered film strength of 5iOz or Ala○3.Furthermore, as a magnetoresistive element, UFe-Ni, N
Although an i-Co-based vacuum-deposited film or the like is used, according to the embodiment shown in FIG. 1, a single magnetoresistive element is provided in a part of the upper magnetic pole. However, in order to increase the reproduction output of a magnetoresistive element, a bias magnetic field is necessary. According to the present invention, the upper magnetic pole (,
t, because there is almost no step part in the front gap, the deterioration of the magnetic properties at the step part of the upper magnetic pole, that is, deterioration of magnetic permeability and coercive force, etc., is suppressed, and leakage magnetic flux from the recording medium is efficiently transferred to the upper magnetic material. Even when the light is focused from the magnetic pole to the magnetoresistive element, there is no stepped part in the pack gap, and the amount of magnetic material that threatens the magnetic head increases by the amount of intermediate soft magnetic material, so magnetic saturation in the pack gap is suppressed. The R/W efficiency also improves. In addition, the complicated process of creating a core shape with a gap in a part of the upper magnetic body can be easily manufactured using the plating method. A thin-film magnetic head and a magnetoresistive head with a high reproduction output are installed together, and recording and reproduction are performed with the same head. Furthermore, it is easy to create a thin-film magnetic head with good characteristics that allows a reproduction output that is about 10 times greater than that of conventional reproduction output. can be manufactured in

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例にかかる薄膜磁気ヘッドを示
す平面は 第2図は同実施例のヘッドの断面は 第3,
4図及び5図は従来例の薄膜磁気ヘッドを示す断面図で
ある。 1、11・・・基板 2.12・・・下部磁性体磁極3
、 6. 14. 16・・・絶縁層 4.15・・・
導電コイ山 8. 13・・・ギヤツブ凰 5ん 5B
・・・中間磁性体磁!7.20・・・磁気抵抗効果素子
18・・・保護!9.17・・・上部磁性体磁極 10
、19・・・記a尾
FIG. 1 shows a plane showing a thin film magnetic head according to an embodiment of the present invention, FIG. 2 shows a cross section of the head according to the same embodiment, and FIG.
4 and 5 are cross-sectional views showing conventional thin film magnetic heads. 1, 11... Substrate 2.12... Lower magnetic pole 3
, 6. 14. 16... Insulating layer 4.15...
Conductive carp mountain 8. 13... Gear Tsubuo 5n 5B
...Intermediate magnetic material magnetism! 7.20...Magnetoresistive element 18...Protection! 9.17...Top magnetic pole 10
, 19...Note a tail

Claims (2)

【特許請求の範囲】[Claims] (1)下部磁性体磁極と上部磁性体磁極と導電コイルを
備える薄膜磁気ヘッドで前記上部磁性体磁極の一部に磁
気抵抗効果素子を挿入した複合型薄膜磁気ヘッドにおい
て、前記下部磁性体磁極と前記導電コイルとの間を埋め
ている絶縁層の膜厚に等しい膜厚を持つ前記下部ないし
は上部磁性体磁極とは別個の磁性体磁極が前記下部磁性
体磁極と上部磁性体磁極との接合部分であるフロントギ
ャップ部、バックギャップ部に挿入されたことを特徴と
する薄膜磁気ヘッド。
(1) In a composite thin film magnetic head comprising a lower magnetic pole, an upper magnetic pole, and a conductive coil, in which a magnetoresistive element is inserted into a part of the upper magnetic pole, the lower magnetic pole and A magnetic pole separate from the lower or upper magnetic pole having a thickness equal to the thickness of an insulating layer filling a space between the conductive coil and the conductive coil is a joining portion of the lower magnetic pole and the upper magnetic pole. A thin film magnetic head characterized in that it is inserted into a front gap portion and a back gap portion.
(2)請求項1記載の薄膜磁気ヘッドの製造方法であっ
て、上部磁性体磁極をメッキ法で形成することを特徴と
する薄膜磁気ヘッドの製造方法。
(2) A method of manufacturing a thin-film magnetic head according to claim 1, characterized in that the upper magnetic pole is formed by a plating method.
JP1172238A 1989-07-03 1989-07-03 Composite thin film magnetic head and its manufacturing method Pending JPH0337815A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1172238A JPH0337815A (en) 1989-07-03 1989-07-03 Composite thin film magnetic head and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1172238A JPH0337815A (en) 1989-07-03 1989-07-03 Composite thin film magnetic head and its manufacturing method

Publications (1)

Publication Number Publication Date
JPH0337815A true JPH0337815A (en) 1991-02-19

Family

ID=15938181

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1172238A Pending JPH0337815A (en) 1989-07-03 1989-07-03 Composite thin film magnetic head and its manufacturing method

Country Status (1)

Country Link
JP (1) JPH0337815A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5726839A (en) * 1993-12-08 1998-03-10 Fujitsu Limited Magnetic head having bypass magnetic path and set magnetic reluctance relationship

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5726839A (en) * 1993-12-08 1998-03-10 Fujitsu Limited Magnetic head having bypass magnetic path and set magnetic reluctance relationship

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