JPH0338629U - - Google Patents
Info
- Publication number
- JPH0338629U JPH0338629U JP9980389U JP9980389U JPH0338629U JP H0338629 U JPH0338629 U JP H0338629U JP 9980389 U JP9980389 U JP 9980389U JP 9980389 U JP9980389 U JP 9980389U JP H0338629 U JPH0338629 U JP H0338629U
- Authority
- JP
- Japan
- Prior art keywords
- processing
- liquid
- carrier
- large number
- semiconductor wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims 2
Landscapes
- Weting (AREA)
Description
第１図は本考案に係る液処理装置の縦断面図、
第２図は同じく平面図、第３図は変形例を示す平
面図である。第４図は従来の液処理装置の縦断面
図である。
２……処理液、７……キヤリア、８……半導体
ウエーハ、１１……液槽、１４……駆動機構。
FIG. 1 is a longitudinal cross-sectional view of a liquid processing device according to the present invention;
FIG. 2 is a plan view, and FIG. 3 is a plan view showing a modified example. FIG. 4 is a longitudinal sectional view of a conventional liquid processing apparatus. 2... Processing liquid, 7... Carrier, 8... Semiconductor wafer, 11... Liquid tank, 14... Drive mechanism.
Claims (1)
液処理装置において、 縦断面形状を半円形にし、底部より処理液を供
給し表面よりオーバーフローさせて処理液を循還
させる液槽と、 多数枚の半導体ウエーハを整列収納して上記処
理液内に浸漬するキヤリアと、 上記キヤリアを処理液の内または内と外とに亘
り往復或いは回転運動させる駆動機構とを具備し
たことを特徴とする液処理装置。[Scope of Claim for Utility Model Registration] In a liquid processing device that immerses a large number of semiconductor wafers in a processing liquid, the vertical cross section is semicircular, and the processing liquid is supplied from the bottom and overflows from the surface to circulate the processing liquid. a carrier for storing a large number of semiconductor wafers in an array and immersing them in the processing solution; and a drive mechanism for reciprocating or rotating the carrier within the processing solution or within and outside the processing solution. A liquid processing device characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9980389U JPH0338629U (en) | 1989-08-25 | 1989-08-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9980389U JPH0338629U (en) | 1989-08-25 | 1989-08-25 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0338629U true JPH0338629U (en) | 1991-04-15 |
Family
ID=31648842
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9980389U Pending JPH0338629U (en) | 1989-08-25 | 1989-08-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0338629U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012064646A (en) * | 2010-09-14 | 2012-03-29 | Tokyo Electron Ltd | Substrate processing method, storage medium having program recorded therein for execution of substrate processing method and substrate processing apparatus |
-
1989
- 1989-08-25 JP JP9980389U patent/JPH0338629U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012064646A (en) * | 2010-09-14 | 2012-03-29 | Tokyo Electron Ltd | Substrate processing method, storage medium having program recorded therein for execution of substrate processing method and substrate processing apparatus |
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