JPH0338750B2 - - Google Patents
Info
- Publication number
- JPH0338750B2 JPH0338750B2 JP57227429A JP22742982A JPH0338750B2 JP H0338750 B2 JPH0338750 B2 JP H0338750B2 JP 57227429 A JP57227429 A JP 57227429A JP 22742982 A JP22742982 A JP 22742982A JP H0338750 B2 JPH0338750 B2 JP H0338750B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- insulating film
- memory device
- junction
- semiconductor memory
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/60—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
- H10D89/601—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
- H10D89/611—Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using diodes as protective elements
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57227429A JPS59121869A (ja) | 1982-12-28 | 1982-12-28 | 半導体記憶装置及びその製造方法 |
| DE8383303603T DE3380582D1 (en) | 1982-06-30 | 1983-06-22 | Dynamic semiconductor memory and manufacturing method thereof |
| EP83303603A EP0102696B1 (de) | 1982-06-30 | 1983-06-22 | Dynamische Halbleiterspeicher und Verfahren zu seiner Herstellung |
| US06/506,593 US4543597A (en) | 1982-06-30 | 1983-06-22 | Dynamic semiconductor memory and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57227429A JPS59121869A (ja) | 1982-12-28 | 1982-12-28 | 半導体記憶装置及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59121869A JPS59121869A (ja) | 1984-07-14 |
| JPH0338750B2 true JPH0338750B2 (de) | 1991-06-11 |
Family
ID=16860710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57227429A Granted JPS59121869A (ja) | 1982-06-30 | 1982-12-28 | 半導体記憶装置及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59121869A (de) |
-
1982
- 1982-12-28 JP JP57227429A patent/JPS59121869A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59121869A (ja) | 1984-07-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0102696B1 (de) | Dynamische Halbleiterspeicher und Verfahren zu seiner Herstellung | |
| KR0163402B1 (ko) | 전기적 활성 트렌치 사용 병합 바이폴라/cmos 기술을 사용하는 반도체 구조물 및 그 제조 방법 | |
| US4822750A (en) | MOS floating gate memory cell containing tunneling diffusion region in contact with drain and extending under edges of field oxide | |
| US5248892A (en) | Semiconductor device provided with a protection circuit | |
| US6013927A (en) | Semiconductor structures for suppressing gate oxide plasma charging damage and methods for making the same | |
| US20020022328A1 (en) | Method of forming PID protection diode for SOI wafer | |
| US5691234A (en) | Buried contact method to release plasma-induced charging damage on device | |
| JP2007242950A (ja) | 半導体記憶装置 | |
| US8263472B2 (en) | Deep trench electrostatic discharge (ESD) protect diode for silicon-on-insulator (SOI) devices | |
| US6365939B1 (en) | Semiconductor protection device | |
| US5049514A (en) | Method of making a MOS device having a polycide gate | |
| JPH0586863B2 (de) | ||
| KR100214813B1 (ko) | 반도체 장치,마스크 롬 및 그의 제조방법 | |
| US20090078988A1 (en) | Semiconductor device and method for manufacturing the same | |
| US6410964B1 (en) | Semiconductor device capable of preventing gate oxide film from damage by plasma process and method of manufacturing the same | |
| US20070080404A1 (en) | Semiconductor device | |
| TW535280B (en) | Semiconductor device and method of manufacturing the same | |
| US5348907A (en) | Method of fabricating of semiconductor device by forming two electrically insulated wells of the same type electroconductivity on semiconductor substrate | |
| KR100628246B1 (ko) | 이에스디(esd) 보호 회로 및 그 제조 방법 | |
| JPH0338750B2 (de) | ||
| EP0110656B1 (de) | Halbleiteranordnung und Herstellungsverfahren | |
| JPH0450751B2 (de) | ||
| JPH11289056A (ja) | 入力保護回路及びその製造方法 | |
| JPH0338749B2 (de) | ||
| JP3114613B2 (ja) | 半導体装置およびその製造方法 |