JPH0339965B2 - - Google Patents
Info
- Publication number
- JPH0339965B2 JPH0339965B2 JP60102766A JP10276685A JPH0339965B2 JP H0339965 B2 JPH0339965 B2 JP H0339965B2 JP 60102766 A JP60102766 A JP 60102766A JP 10276685 A JP10276685 A JP 10276685A JP H0339965 B2 JPH0339965 B2 JP H0339965B2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- iminium
- catalyst
- bis
- catalysts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003054 catalyst Substances 0.000 claims description 17
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims description 10
- 239000005046 Chlorosilane Substances 0.000 claims description 7
- 150000004756 silanes Chemical class 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 2
- 150000004703 alkoxides Chemical class 0.000 claims description 2
- 229920006395 saturated elastomer Polymers 0.000 claims description 2
- 238000006243 chemical reaction Methods 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- 239000000460 chlorine Substances 0.000 description 9
- 238000007323 disproportionation reaction Methods 0.000 description 9
- -1 monosilane Chemical compound 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 150000007975 iminium salts Chemical class 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 6
- 239000005052 trichlorosilane Substances 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- LVRCYPYRKNAAMX-UHFFFAOYSA-M bis(triphenylphosphine)iminium chloride Chemical compound [Cl-].C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)N=P(C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 LVRCYPYRKNAAMX-UHFFFAOYSA-M 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 239000007809 chemical reaction catalyst Substances 0.000 description 3
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000005995 Aluminium silicate Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- WTDHULULXKLSOZ-UHFFFAOYSA-N Hydroxylamine hydrochloride Chemical compound Cl.ON WTDHULULXKLSOZ-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 235000012211 aluminium silicate Nutrition 0.000 description 2
- 239000003957 anion exchange resin Substances 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- HUCQPHINKBNKRU-UHFFFAOYSA-N (4-methylphenyl)phosphane Chemical compound CC1=CC=C(P)C=C1 HUCQPHINKBNKRU-UHFFFAOYSA-N 0.000 description 1
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 1
- YJJKYKYXZZCJEE-UHFFFAOYSA-N 2,2-diphenylethylphosphane Chemical compound C=1C=CC=CC=1C(CP)C1=CC=CC=C1 YJJKYKYXZZCJEE-UHFFFAOYSA-N 0.000 description 1
- SXAMGRAIZSSWIH-UHFFFAOYSA-N 2-[3-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,2,4-oxadiazol-5-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NOC(=N1)CC(=O)N1CC2=C(CC1)NN=N2 SXAMGRAIZSSWIH-UHFFFAOYSA-N 0.000 description 1
- 229910052580 B4C Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 241000581652 Hagenia abyssinica Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 239000004965 Silica aerogel Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001540 azides Chemical class 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 239000000378 calcium silicate Substances 0.000 description 1
- 229910052918 calcium silicate Inorganic materials 0.000 description 1
- OYACROKNLOSFPA-UHFFFAOYSA-N calcium;dioxido(oxo)silane Chemical compound [Ca+2].[O-][Si]([O-])=O OYACROKNLOSFPA-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- GGNALUCSASGNCK-UHFFFAOYSA-N carbon dioxide;propan-2-ol Chemical compound O=C=O.CC(C)O GGNALUCSASGNCK-UHFFFAOYSA-N 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229940117389 dichlorobenzene Drugs 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 239000002638 heterogeneous catalyst Substances 0.000 description 1
- 239000002815 homogeneous catalyst Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 229910003480 inorganic solid Inorganic materials 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- GBMDVOWEEQVZKZ-UHFFFAOYSA-N methanol;hydrate Chemical compound O.OC GBMDVOWEEQVZKZ-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- DAZXVJBJRMWXJP-UHFFFAOYSA-N n,n-dimethylethylamine Chemical compound CCN(C)C DAZXVJBJRMWXJP-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 150000002826 nitrites Chemical class 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 239000010449 novaculite Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 229920001627 poly(4-methyl styrene) Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical class O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000010703 silicon Chemical group 0.000 description 1
- 229910052710 silicon Chemical group 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000011593 sulfur Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 235000012222 talc Nutrition 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- RXJKFRMDXUJTEX-UHFFFAOYSA-N triethylphosphine Chemical compound CCP(CC)CC RXJKFRMDXUJTEX-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
- Catalysts (AREA)
Description
発明の技術的分野
本発明はクロロ水素化シランの不均化および/
又は再分配反応によるシラン類、特にモノシラン
および/又はクロロシランの製造方法に関する。
従来の技術
シラン、特にモノシランは半導体、アモルフア
ス太陽電池、ICデバイスや感光体等に有用な素
原料である。クロロシランあるいはモノシラン
は、次式の如く、クロロシランを原料に不均化も
しくは再分配反応により得られることが知られて
いる。そしてこれらの反応に有用な触媒の開発が
行われている。
2SiHCl3SiH2Cl2+SiCl4
2SiH2Cl2SiHCl3+SiH3Cl
2SiH3ClSiH4+SiH2Cl2
上記の触媒としてはアミノ基等を含む不溶性の
固体陰イオン交換樹脂(特開昭50−119798号公
報)、トリメチルアミン又はジメチルエチルアミ
ン(特開昭59−121110号公報)、パラジウム(特
開昭54−59230号公報)、無機固体塩基(特開昭59
−174515号公報)α−オキソアミン基を含む化合
物(特開昭59−54617号公報)、テトラアルキル尿
素(特公昭55−14046号公報)炭化水素基でN−
置換したα−ピロリドン(特公昭55−14045号公
報)、スルホン酸基を有する陽イオン交換体(特
開昭59−164614号公報)、アミノアルコールとシ
リカの反応生成物(特開昭59−156907号公報)な
どがある。また特に反応生成物と触媒の分離が容
易な不均一系触媒が注目されている。
発明が解決しようとする問題点
クロロ水素化シランの不均化および/又は再分
配反応に有用な触媒はいくつか提案されている
が、特に従来の固体陰イオン交換樹脂系の触媒は
耐熱性、機械的強度に劣り、イオン交換樹脂特有
の膨潤などの問題があり、活性、触媒寿命も満足
するものではなかつた。一方ルイス酸やアミン類
等の均一系触媒は生成物と触媒の分離に多大のエ
ネルギーを要する。
問題を解決する為の手段
発明の要旨
本発明は、一般式(R3P)2N・X(式中、R
は互いに同じかあるいは異つても良いC1〜C10の
炭化水素基で酸素原子やハロゲン原子を含有して
いてもよく、飽和でも不飽和でもよい。Xは
F-、Cl-、Br-、I-、CN-、N3 -、BF4 -、BH4 -、
OH-、アルコキシド、アセテート等のモノアニ
オンである。)で表わされるビスホスフインイミ
ニウム塩を触媒成分として用い、SiHnCl4-o(た
だし、1≦n≦3)で表わされるクロロシランを
不均化および/又は再分配させることを特徴とす
るシラン類、特にモノシラン、および/又はクロ
ロシランの製造方法に関するものである。
該ビスホスフインイミニウム塩は適当な溶媒に
溶かし、均一系反応触媒として、あるいは気相不
均一系反応触媒として、使用することができる。
前者の場合、溶媒としてクロルベンゼン、ジクロ
ルベンゼン、等のハロゲン化芳香族化合物、ベン
ゼン、トルエン、キシレン等の芳香族化合物、ク
ロロホルム、塩化メチレン等に代表されるハロゲ
ン化炭化水素、アセトニリル、ベンゾニトリル等
のニトリル類、ニトロメタン、ニトロベンゼン等
のニトロ化合物等がある。又、クロロシラン類自
体を使用することができる。
後者の場合、ビスホスフインイミニウム塩を多
孔性固体表面に分散担持して用いることが好まし
く、この目的に適する多孔性固体としては、活性
炭、グラフアイト、モレキユラーシービングカー
ボン等の炭素質固体、スチレン−ジビニルベンゼ
ン共重合体、ポリ(p−メチルスチレン)及びこ
れらのハロゲン化物の様なポリスチレン構造を有
する高分子固体、ポリエチレン、ポリプロピレン
に代表される非芳香族系オレフイン重合体、及び
それらのハロゲン化物、主鎖に酸素、窒素、イオ
ウ、珪素等のヘテロ原子を含む有機高分子、ポリ
シキサン類、炭化珪素、炭化チタニウム、炭化ホ
ウ素等の炭化物、窒化珪素、窒化ホウ素、窒化ジ
ルコニウム等の窒化物、石英、ノバキユライト、
コロイダルシリカ、シリカエアロゲル等のシリ
カ、カオリン、タルクウオラストナイト、石綿、
珪酸カルシウム、珪酸アルミニウム、ゼオライト
等の珪酸塩、チタニア、ジルコニア等の金属酸化
物を用いることができる。又、その表面積は2〜
2000m2/gのものが用いられる。
ビスホスフインイミニウム塩を多孔性固体に担
持する方法としては公知の含浸法が適している。
溶媒としては、ビスホスフインイミニウム塩を溶
かすもので多孔性固体と親和性を有し、かつ適度
な揮発性を持つ液体が好ましい。特に適するもの
はメタノール、エタノール等のアルコール類、
水、塩化メチレン、クロロホルム等のハロゲン化
炭化水素、アセトン、メチルエチルケトン等のケ
トン類及びこれらの混合物である。
ビスホスフインイミニウム塩、(R3P)2NX
は公知の方法で調製することができる。即ち、ホ
スフイン、塩素、ヒドロキシルアミン塩酸塩とか
らつくることができる。例えば、トリフエニルホ
スフイン(Ph3P)と塩素との反応によりPh3PCl2
を得(Ph3P+Cl2→Ph3PCl2)、これとH2NOH・
HCl及びPh3Pとの反応により、ハロゲン化ビス
ホスフインイミニウムを得る(Ph3PCl2+Ph3P+
H2NOH・HCl→(Ph3P)2NCl+Ph3P=O
+4HCl)。この合成方法は例えば、「イノーガニ
ツク・シンセシズ」第15巻 85頁〜86頁に記載さ
れている。
触媒として使用されるビスホスフインイミニウ
ム塩を例示すると次の通りである。
ビス(トリフエニルホスフイン)イミニウムク
ロリド、同ポロヒドリド、または同テトラフルオ
ロボレイト、
ビス〔トリ(p−トリルホスフイン〕イミニウ
ムアジド、
ビス(ジフエニルエチルホスフイン)イミニウ
ムクロリド、
ビス(フエニルジメチルホスフイン)イミニウ
ムクロリド、
ビス(トリブチルホスフイン)イミニウムクロ
リド、
ビス(トリエチルホスフイン)イミニウムクロ
リド、
ビス(トリシクロヘキシルホスフイン)イミニ
ウムクロリド
特に、好ましいのは(R3P)3N・Xにおい
て、Rがフエニル、トリル等の芳香族基であるビ
ス(トリアリールホスフイン)イミニウム塩であ
る。
また不均化および/又は再分配反応の条件は、
反応温度0℃〜300℃、好ましくは10℃〜200℃、
反応時間(接触時間)0.1〜20秒、好ましくは、
0.2〜10秒、反応圧力は常圧〜50Kg/cm2、通常常
圧〜20Kg/cm2で行なわれる。フイードとなるのは
トリクロロシラン、ジクロロシラン、モノクロロ
シランおよびこれらの混合物であり、不活性流体
で希釈してもよい。
発明の効果
本発明で用いられるビスホスフインイミニウム
塩触媒は従来知られている触媒(第4アンモニウ
ム塩、あるいは第4ホスホニウム塩)に比べ触媒
成分モル当りの活性が高く、従つて、比較的低温
での反応にも使用でき更に、多孔性固体に担持し
て不均一系反応も行える為、触媒と生成物の分離
操作が不要となる。
実施例 1
ビス(トリフエニルホスフイン)イミニウムク
ロリド、〔(C6H5)3P〕2N+Cl-、(アルドリツチ
製)〕587mg(1.02mmole)を5.8mlのメタノール
−水(1/1)混合液に溶かし、この溶液に5.8
gのシリカ(フジダビソン社製シリカゲル、ID
タイプ、表面積350m2/g、30〜60メツシユを空
気中、120℃、12時間乾燥したもの)を加えてよ
く撹拌した。風乾後空気中100℃で12時間乾燥し
て触媒を調製した。
この触媒0.64g(2.0ml)をガラス製気相流通
反応装置(内径10mm)に充てんし、窒素気流中
110℃で1時間加熱した後反応層を所定温度に保
ちながら常圧下原料ガス(SiHCl3/N2、モル比
30/70)フイードとして反応を行なわしめた。反
応条件整定後1時間の生成物をヘリウムをキヤリ
ヤガスとしてガスクロマトグラフ(TCD)で分
析した。結果を表−1に示した。
TECHNICAL FIELD OF THE INVENTION The present invention relates to the disproportionation and/or
Or it relates to a method for producing silanes, particularly monosilane and/or chlorosilane, by a redistribution reaction. BACKGROUND OF THE INVENTION Silane, particularly monosilane, is a raw material useful for semiconductors, amorphous solar cells, IC devices, photoreceptors, and the like. It is known that chlorosilane or monosilane can be obtained by a disproportionation or redistribution reaction using chlorosilane as a raw material, as shown in the following formula. Catalysts useful for these reactions are being developed. 2SiHCl 3 SiH 2 Cl 2 +SiCl 4 2SiH 2 Cl 2 SiHCl 3 +SiH 3 Cl 2SiH 3 ClSiH 4 +SiH 2 Cl 2The above catalyst is an insoluble solid anion exchange resin containing amino groups etc. ), trimethylamine or dimethylethylamine (JP-A-59-121110), palladium (JP-A-54-59230), inorganic solid bases (JP-A-59-Sho 59)
-174515) Compounds containing an α-oxoamine group (Japanese Patent Application Laid-Open No. 59-54617), tetraalkylureas (Japanese Patent Publication No. 14046-1983) with a hydrocarbon group
Substituted α-pyrrolidone (Japanese Patent Publication No. 55-14045), cation exchanger having a sulfonic acid group (Japanese Patent Publication No. 59-164614), reaction product of amino alcohol and silica (Japanese Patent Publication No. 59-156907) Publication No.) etc. In particular, heterogeneous catalysts that allow easy separation of reaction products and catalysts are attracting attention. Problems to be Solved by the Invention Several catalysts useful for the disproportionation and/or redistribution reaction of chlorohydrogenated silanes have been proposed, but in particular, conventional solid anion exchange resin-based catalysts have poor heat resistance, It was inferior in mechanical strength, had problems such as swelling peculiar to ion exchange resins, and had unsatisfactory activity and catalyst life. On the other hand, homogeneous catalysts such as Lewis acids and amines require a large amount of energy to separate the product from the catalyst. Summary of the Invention as a Means for Solving Problems The present invention is based on the general formula (R 3 P) 2 N・X (in the formula, R
are C1 to C10 hydrocarbon groups which may be the same or different from each other and may contain an oxygen atom or a halogen atom, and may be saturated or unsaturated. X is
F - , Cl - , Br - , I - , CN - , N 3 - , BF 4 - , BH 4 - ,
Monoanions such as OH - , alkoxide, acetate, etc. ) Silanes characterized by disproportionation and/or redistribution of a chlorosilane represented by SiHnCl 4-o (where 1≦n≦3) using a bisphosphine iminium salt represented by the following as a catalyst component. In particular, it relates to a method for producing monosilane and/or chlorosilane. The bisphosphine iminium salt can be dissolved in a suitable solvent and used as a homogeneous reaction catalyst or as a gas phase heterogeneous reaction catalyst.
In the former case, the solvent may be a halogenated aromatic compound such as chlorobenzene or dichlorobenzene, an aromatic compound such as benzene, toluene, or xylene, a halogenated hydrocarbon such as chloroform or methylene chloride, acetonitrile, or benzonitrile. These include nitrites such as nitriles, nitro compounds such as nitromethane, and nitrobenzene. Also, chlorosilanes themselves can be used. In the latter case, it is preferable to disperse and support the bisphosphine iminium salt on the surface of a porous solid. Porous solids suitable for this purpose include carbonaceous materials such as activated carbon, graphite, and molecular sieving carbon. Solids, polymeric solids with a polystyrene structure such as styrene-divinylbenzene copolymers, poly(p-methylstyrene) and their halides, non-aromatic olefin polymers represented by polyethylene and polypropylene, and the like. halides, organic polymers containing heteroatoms such as oxygen, nitrogen, sulfur, and silicon in the main chain, polysiloxanes, carbides such as silicon carbide, titanium carbide, and boron carbide, and nitrides such as silicon nitride, boron nitride, and zirconium nitride. material, quartz, novaculite,
Silica such as colloidal silica and silica aerogel, kaolin, talcum olastonite, asbestos,
Silicates such as calcium silicate, aluminum silicate, and zeolite, and metal oxides such as titania and zirconia can be used. Also, its surface area is 2~
2000m 2 /g is used. A known impregnation method is suitable as a method for supporting the bisphosphine iminium salt on a porous solid.
The solvent is preferably a liquid that dissolves the bisphosphine iminium salt, has an affinity for the porous solid, and has appropriate volatility. Especially suitable are alcohols such as methanol and ethanol,
Water, halogenated hydrocarbons such as methylene chloride and chloroform, ketones such as acetone and methyl ethyl ketone, and mixtures thereof. Bisphosphine iminium salt, ( R3P ) 2NX
can be prepared by a known method. That is, it can be made from phosphine, chlorine, and hydroxylamine hydrochloride. For example, the reaction of triphenylphosphine (Ph 3 P) with chlorine produces Ph 3 PCl 2
(Ph 3 P + Cl 2 → Ph 3 PCl 2 ), and this and H 2 NOH・
Reaction with HCl and Ph 3 P gives bisphosphine iminium halides (Ph 3 PCl 2 + Ph 3 P+
H 2 NOH・HCl→(Ph 3 P) 2 NCl+Ph 3 P=O
+4HCl). This synthetic method is described, for example, in "Inorganic Synthesis", Vol. 15, pages 85-86. Examples of bisphosphineiminium salts used as catalysts are as follows. Bis(triphenylphosphine)iminium chloride, polyhydride, or tetrafluoroborate, bis[tri(p-tolylphosphine)iminium azide, bis(diphenylethylphosphine)iminium chloride, bis(phenyldimethyl) (phosphine) iminium chloride, bis(tributylphosphine) iminium chloride, bis(triethylphosphine) iminium chloride, bis(tricyclohexylphosphine) iminium chloride Particularly preferred is (R 3 P) 3 N. X is a bis(triarylphosphine)iminium salt in which R is an aromatic group such as phenyl or tolyl.The conditions for the disproportionation and/or redistribution reaction are as follows:
Reaction temperature: 0°C to 300°C, preferably 10°C to 200°C,
Reaction time (contact time) 0.1-20 seconds, preferably
The reaction is carried out for 0.2 to 10 seconds, and the reaction pressure is normal pressure to 50 Kg/cm 2 , usually normal pressure to 20 Kg/cm 2 . Feeds include trichlorosilane, dichlorosilane, monochlorosilane, and mixtures thereof, which may be diluted with an inert fluid. Effects of the Invention The bisphosphine iminium salt catalyst used in the present invention has higher activity per mole of catalyst component than conventionally known catalysts (quaternary ammonium salts or quaternary phosphonium salts), and therefore has a relatively low activity. It can also be used for reactions at low temperatures, and can also be supported on porous solids to perform heterogeneous reactions, making it unnecessary to separate the catalyst and products. Example 1 587 mg (1.02 mmole) of bis(triphenylphosphine)iminium chloride, [(C 6 H 5 ) 3 P] 2 N + Cl - (manufactured by Aldrich) was mixed with 5.8 ml of methanol-water (1/ 1) Dissolve in the mixed solution and add 5.8 to this solution.
g silica (Fuji Davison silica gel, ID
Type, surface area 350 m 2 /g, 30 to 60 meshes dried in air at 120° C. for 12 hours) were added and stirred well. After air drying, the catalyst was prepared by drying in air at 100°C for 12 hours. 0.64 g (2.0 ml) of this catalyst was filled into a glass gas phase flow reactor (inner diameter 10 mm) and placed in a nitrogen stream.
After heating at 110°C for 1 hour, the raw material gas (SiHCl 3 /N 2 , molar ratio
30/70) The reaction was carried out as a feed. One hour after the reaction conditions were established, the product was analyzed using a gas chromatograph (TCD) using helium as a carrier gas. The results are shown in Table-1.
【表】
実施例 2〜5
実施例1の要領でビス(トリフエニルホスフイ
ン)イミニウムクロリド(以下PPNClと略す)
をスチレン−ジビニルベンゼン共重合体ビーズ
(ダイヤイオンHP−20−三菱化成(株)製商品名
−)、活性炭(ツルミコール社製商品名、4GV、
30〜60メツシユ、を15%HNO3処理後、空気中、
100℃、24時間乾燥)、チタニア(ダイヤキヤタリ
スト(株)製)及びカオリン(小宗化学薬品(株)製)に
各々担持して触媒した。触媒調製条件を表−2に
示した。これらの触媒を用いて実施例1の要領で
トリクロロシラン(SiHCl3/N2=3/7、モル
比)の不均化反応を行なつた。実験結果を表−3
に示した。[Table] Examples 2 to 5 Bis(triphenylphosphine)iminium chloride (hereinafter abbreviated as PPNCl) according to the procedure of Example 1
Styrene-divinylbenzene copolymer beads (Diaion HP-20 - trade name manufactured by Mitsubishi Kasei Corporation -), activated carbon (trade name manufactured by Tsurmicol Co., Ltd., 4GV,
30~60 meshes, after treatment with 15% HNO3 , in the air,
(dried at 100°C for 24 hours), titania (manufactured by Dia Catalyst Co., Ltd.), and kaolin (manufactured by Koso Chemical Co., Ltd.) were supported and catalyzed. The catalyst preparation conditions are shown in Table-2. Using these catalysts, a disproportionation reaction of trichlorosilane (SiHCl 3 /N 2 =3/7, molar ratio) was carried out in the same manner as in Example 1. Table 3 shows the experimental results.
It was shown to.
【表】【table】
【表】
実施例 6
原料ガスがジクロロシラン(製鉄化学(株)製、>
98.5%)である他は実施例1と同じ要領で不均化
反応を行なつた。結果を表4に示した。[Table] Example 6 The raw material gas was dichlorosilane (manufactured by Steel Chemical Co., Ltd., >
The disproportionation reaction was carried out in the same manner as in Example 1, except that the disproportionation reaction was 98.5%). The results are shown in Table 4.
【表】
実施例 7
1Hnmr(水素核磁気共鳴)試料管に29mg(0.05
ミリモル)のビス(トリフエニルホスフイン)イ
ミニウムクロリド及びベンゼン封入キヤピラリー
(外部標準)を入れた後、試料管を真空ラインに
接続して脱気し、次に試料管をドライアイス−イ
ソプロパノールバスで冷却し、これに1.0g(7.4
ミリモル)のトリクロロシランの真空蒸留によつ
て仕込んだ後試料管上端をガスバーナーで封じ切
つた。試料管を室温まで昇温した後、封入された
サンプルをよく振り混ぜ30℃で1時間放置した。
試料の 1Hnmrスペクトルには外部標準のベンゼ
ンのピーク(τ2.8)及びビス(トリフエニルホス
フイン)イミニウムクロリドのピーク(τ2.6〜
3.0)以外に3本のシングレツト(τ3.9、τ4.6、及
びτ5.4、面積比=8:2:0.1)が観測された。
これらはそれぞれトリクロロシラン、ジクロロシ
ラン、及びモノクロロシランのSi−Hの共鳴に由
来するものであり、トリクロロシランの不均化反
応によりモノクロロシラン、ジクロロシラン、ト
リクロロシランが生成したことを示す。[Table] Example 7 1 Hnmr (hydrogen nuclear magnetic resonance) 29 mg (0.05
After introducing bis(triphenylphosphine)iminium chloride (mmol) and a benzene-filled capillary (external standard), connect the sample tube to a vacuum line to degas it, then place the sample tube in a dry ice-isopropanol bath. Cool and add 1.0g (7.4
After the sample tube was charged with 1 mmol of trichlorosilane by vacuum distillation, the top end of the sample tube was sealed off with a gas burner. After the sample tube was heated to room temperature, the enclosed sample was thoroughly shaken and left at 30°C for 1 hour.
The 1 Hnmr spectrum of the sample contains the external standard benzene peak (τ2.8) and bis(triphenylphosphine)iminium chloride peak (τ2.6~
3.0), three singlets (τ3.9, τ4.6, and τ5.4, area ratio = 8:2:0.1) were observed.
These are derived from the Si-H resonances of trichlorosilane, dichlorosilane, and monochlorosilane, respectively, and indicate that monochlorosilane, dichlorosilane, and trichlorosilane were produced by the disproportionation reaction of trichlorosilane.
Claims (1)
同じかあるいは異つてもよいC1〜C10の炭化水素
基で酸素原子やハロゲン原子を含有してもよく、
飽和でも不飽和でもよい。XはF-、Cl-、Br-、
I-、CN-、N3 -、BF4 -、BH4 -、OH-、アルコキ
シド、アセテート等のモノアニオンである。)で
表わされるビスホスフインイミニウム塩を触媒成
分として用い、SiHnCl4-o(ただし、1≦n≦3)
で表わされるクロロシランを不均化および/又は
再分配させることを特徴とするシラン類の製造方
法。1 General formula (R 3 P ) 2 N.
It may be saturated or unsaturated. X is F - , Cl - , Br - ,
These are monoanions such as I − , CN − , N 3 − , BF 4 − , BH 4 − , OH − , alkoxide, and acetate. ) is used as a catalyst component, SiHnCl 4-o (1≦n≦3)
A method for producing silanes, which comprises disproportionating and/or redistributing a chlorosilane represented by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60102766A JPS61261208A (en) | 1985-05-16 | 1985-05-16 | Production of silane |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60102766A JPS61261208A (en) | 1985-05-16 | 1985-05-16 | Production of silane |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61261208A JPS61261208A (en) | 1986-11-19 |
| JPH0339965B2 true JPH0339965B2 (en) | 1991-06-17 |
Family
ID=14336300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60102766A Granted JPS61261208A (en) | 1985-05-16 | 1985-05-16 | Production of silane |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61261208A (en) |
-
1985
- 1985-05-16 JP JP60102766A patent/JPS61261208A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61261208A (en) | 1986-11-19 |
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