JPH0343344B2 - - Google Patents
Info
- Publication number
- JPH0343344B2 JPH0343344B2 JP24319684A JP24319684A JPH0343344B2 JP H0343344 B2 JPH0343344 B2 JP H0343344B2 JP 24319684 A JP24319684 A JP 24319684A JP 24319684 A JP24319684 A JP 24319684A JP H0343344 B2 JPH0343344 B2 JP H0343344B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- chemical plating
- adhesive
- chemically
- grinding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 28
- 239000000126 substance Substances 0.000 claims description 25
- 238000007747 plating Methods 0.000 claims description 21
- 239000010410 layer Substances 0.000 claims description 17
- 239000012790 adhesive layer Substances 0.000 claims description 14
- 238000007788 roughening Methods 0.000 claims description 11
- 239000012212 insulator Substances 0.000 claims description 8
- 239000002344 surface layer Substances 0.000 claims description 8
- 230000001680 brushing effect Effects 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims 1
- 239000000853 adhesive Substances 0.000 description 14
- 230000001070 adhesive effect Effects 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- JZULKTSSLJNBQJ-UHFFFAOYSA-N chromium;sulfuric acid Chemical compound [Cr].OS(O)(=O)=O JZULKTSSLJNBQJ-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000004677 Nylon Substances 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- YBADLXQNJCMBKR-UHFFFAOYSA-N (4-nitrophenyl)acetic acid Chemical compound OC(=O)CC1=CC=C([N+]([O-])=O)C=C1 YBADLXQNJCMBKR-UHFFFAOYSA-N 0.000 description 1
- IICCLYANAQEHCI-UHFFFAOYSA-N 4,5,6,7-tetrachloro-3',6'-dihydroxy-2',4',5',7'-tetraiodospiro[2-benzofuran-3,9'-xanthene]-1-one Chemical compound O1C(=O)C(C(=C(Cl)C(Cl)=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 IICCLYANAQEHCI-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229930187593 rose bengal Natural products 0.000 description 1
- 229940081623 rose bengal Drugs 0.000 description 1
- STRXNPAVPKGJQR-UHFFFAOYSA-N rose bengal A Natural products O1C(=O)C(C(=CC=C2Cl)Cl)=C2C21C1=CC(I)=C(O)C(I)=C1OC1=C(I)C(O)=C(I)C=C21 STRXNPAVPKGJQR-UHFFFAOYSA-N 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- UGZADUVQMDAIAO-UHFFFAOYSA-L zinc hydroxide Chemical compound [OH-].[OH-].[Zn+2] UGZADUVQMDAIAO-UHFFFAOYSA-L 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/22—Roughening, e.g. by etching
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
この発明は絶縁体上に化学メツキを形成する方
法に関し、詳しくは、絶縁体上に接着剤層を施
し、その表面を化学的に粗化した後、化学メツキ
を形成する方法に関するものである。[Detailed Description of the Invention] (Industrial Application Field) This invention relates to a method of forming chemical plating on an insulator, and more specifically, a method of forming an adhesive layer on an insulator and chemically roughening the surface. After that, it relates to a method of forming chemical plating.
(従来の技術)
プラスチツク、ガラスなどの絶縁体の表面に金
属層を被着させる技術は、電気器具部品、自動車
部品、装飾品、電子部品などその応用例は枚挙に
いとまが多い。この様な絶縁体の表面に金属層を
被着する方法は、化学メツキにより行なわれ、ア
デイテイブ法として良く知られている。化学メツ
キのみによつて不導体の表面上に金属を被着する
フルアデイテイブ法と、化学メツキと電気メツキ
を併用するセミアデイテイブ法は、いずれも化学
メツキによる金属層の密着力が充分でなくしばし
ば基板から剥離する問題に遭遇する。(Prior Art) The technology of depositing a metal layer on the surface of an insulating material such as plastic or glass has many applications such as electrical appliance parts, automobile parts, ornaments, and electronic parts. The method of depositing a metal layer on the surface of such an insulator is carried out by chemical plating, and is well known as an additive method. In both the fully additive method, in which metal is deposited on the surface of a nonconductor by chemical plating alone, and the semi-additive method, in which chemical plating and electroplating are combined, the adhesion of the metal layer by chemical plating is insufficient, and the metal layer often separates from the substrate. Encounter peeling problems.
この様に弱い密着力を高める為に接着剤を塗布
して行う方法、例えば特公昭57−16495号に見ら
れるようにアクリロニトリルゴム、フエノール樹
脂及びエポキシ樹脂を定められた量で混合したも
のを下地層として設け、その表面をクロム硫酸溶
液で凹凸化する方法、特公昭57−18358号に示さ
れる様に熱硬化性樹脂ニトリルゴムと、フエノー
ル変性エポキシ樹脂およびP・ニトロフエニル酢
酸、ローズベンガル、銅クロロフイリンナトリウ
ムの一種以上と、酸化亜鉛、水酸化亜鉛の一種以
上を定められた量で混合した接着性熱硬化樹脂組
成物を塗布し、その表面を粗化する方法などがあ
る。これらの接着剤は、いずれもその表面を化学
的或は機械的手段によつて粗化する手段が講じら
れる。この粗化の具体的な方法も上記各公報に記
述されているが、特にクロム酸などによる化学的
粗化は第2図に示すような不都合な出来事に遭遇
する。 In order to improve this weak adhesion, there is a method of applying an adhesive, for example, as seen in Japanese Patent Publication No. 16495/1983, a mixture of acrylonitrile rubber, phenol resin and epoxy resin in specified amounts is used. A method of forming a stratum and making the surface uneven with a chromium sulfuric acid solution, as shown in Japanese Patent Publication No. 57-18358, uses thermosetting resin nitrile rubber, phenol-modified epoxy resin, P-nitrophenyl acetic acid, rose bengal, copper chloro There is a method of applying an adhesive thermosetting resin composition in which one or more types of filin sodium and one or more types of zinc oxide and zinc hydroxide are mixed in predetermined amounts and roughening the surface. For all of these adhesives, measures are taken to roughen the surface by chemical or mechanical means. Specific methods for this roughening are also described in the above-mentioned publications, but chemical roughening using chromic acid or the like encounters inconvenient events as shown in FIG.
即ち第2図は化学的粗化としてクロム硫酸によ
つて接着剤表面を粗化した直後の工程断面の顕微
鏡写真をモデル図的に表したものである。クロム
硫酸などの化学的粗化が、サンドブラスト法など
の機械的粗化より有利な点は、第2図で示したモ
デル図でも理解できる様に、この表面状態が極め
て複雑な拝相を呈することである。従つてこの表
面上に被着される化学メツキ層は容易に剥離され
ることはない。 That is, FIG. 2 is a model diagram of a micrograph of a process cross section immediately after the surface of the adhesive has been roughened by chromium sulfuric acid as chemical roughening. The advantage of chemical roughening such as chromium sulfate over mechanical roughening such as sandblasting is that this surface condition exhibits an extremely complex pattern, as can be understood from the model diagram shown in Figure 2. It is. The chemical plating layer deposited on this surface is therefore not easily peeled off.
(発明が解決しようとする問題点)
しかしながら唯一の欠点は化学メツキ時に発生
するガス、例えば水素ガスが、樹枝状に凹凸化し
た表面の内部に吸蔵してしまうことである。この
凹凸化した接着剤1の奥深く閉じ込められた水素
ガス2は、やがて図示しない化学メツキ層を押し
上げ、ふくれ現象となつて現れる。この様な現象
は断線や密着不良を招くものである。尚、3は絶
縁性基板である。(Problems to be Solved by the Invention) However, the only drawback is that gases generated during chemical plating, such as hydrogen gas, are occluded inside the dendritic uneven surface. The hydrogen gas 2 trapped deep within the uneven adhesive 1 eventually pushes up the chemically plated layer (not shown) and appears as a blistering phenomenon. Such a phenomenon causes wire breakage and poor adhesion. Note that 3 is an insulating substrate.
従つてこの発明は絶縁板上に接着剤を塗布して
化学メツキを被着する工程で、特にこの接着剤の
表層を化学的に粗化しても、化学メツキ層にふく
れ現象が発生せずに高い密着力を呈する方法を得
ることにある。 Therefore, this invention is a process of applying an adhesive onto an insulating plate to apply chemical plating, and in particular, even if the surface layer of this adhesive is chemically roughened, the chemical plating layer does not blister. The object of the present invention is to obtain a method that exhibits high adhesion.
(問題を解決する為の手段)
この発明は接着剤の表面を化学的に粗化した
後、化学メツキ工程で発生する気泡を前記接着剤
の内部に取り込まない程度その表層を化学メツキ
工程に先立つて研削するものである。(Means for Solving the Problem) This invention chemically roughens the surface of the adhesive and then roughens the surface layer prior to the chemical plating process to the extent that air bubbles generated during the chemical plating process are not incorporated into the adhesive. It is used for grinding.
(作用)
この発明の特徴的な作用は化学的に粗面化され
た接着剤でありながら化学メツキ工程での気泡を
吸蔵しない粗面をもつから、化学メツキの密着力
の向上に特に有効に作用するものである。(Function) The characteristic effect of this invention is that although it is a chemically roughened adhesive, it has a rough surface that does not absorb air bubbles during the chemical plating process, so it is particularly effective in improving the adhesion of chemical plating. It is something that works.
(実施例)
この発明の好ましい一実施例を図面に従つて説
明する。第1図はこの発明方法に基づく金属芯入
り印刷回路板の製造工程を断面図として示したも
のでありaに示すように金属板10に公知の流動
浸漬塗装法又は静電粉体塗装法などによつてその
表面を絶縁体11で被覆し、この絶縁体11と、
その上に形成される導体回路13との間の密着力
を付与するための接着剤層12を形成する。この
接着剤12は先に挙例した公報に示された組成物
でも良いが、この実施例ではフエノール系スミラ
イト樹脂を用いた。次にbに示すように接着剤層
12をクロム硫酸により粗化した。次でcに示す
ように粗化された前記接着剤層12の表層を研削
した。この研削量は前記b工程での粗化時間や使
用される接着剤或は研削時に使用する溶剤によつ
て異なるので定量的に記述することが困難である
が、粗化された接着剤層12の表層の半分程度で
ある。つまり、次工程での化学メツキ被着時に発
生する水素ガスなどの気泡が、粗化された接着剤
層12の奥深くに吸蔵されることがないように適
宜研削する。この研削が過度に行われると、d工
程で示す化学メツキ層13の密着力が著しく低下
するので注意されたい。(Embodiment) A preferred embodiment of the present invention will be described with reference to the drawings. FIG. 1 is a cross-sectional view showing the manufacturing process of a printed circuit board with a metal core based on the method of the present invention. The surface is covered with an insulator 11, and this insulator 11 and
An adhesive layer 12 is formed to provide adhesion to the conductor circuit 13 formed thereon. The adhesive 12 may be the composition shown in the above-mentioned publication, but in this example, phenol-based Sumilite resin was used. Next, as shown in b, the adhesive layer 12 was roughened with chromium sulfuric acid. Next, as shown in c, the roughened surface layer of the adhesive layer 12 was ground. The amount of this grinding varies depending on the roughening time in step b, the adhesive used, or the solvent used during grinding, so it is difficult to describe it quantitatively, but the roughened adhesive layer 12 It is about half of the surface layer. In other words, appropriate grinding is performed to prevent bubbles such as hydrogen gas generated during chemical plating in the next step from being occluded deep into the roughened adhesive layer 12. Please note that if this grinding is performed excessively, the adhesion of the chemically plated layer 13 shown in step d will be significantly reduced.
研削はブラツシングによる方法を試みた。ブラ
ツシング材はナイロン、毛、ワイヤブラシにて行
つたが、硬度の点でナイロンブラシが良好であつ
た。そしてブラツシング方向は単方向よりも多方
向、つまりランダムに擦つた方がふくれの発生率
が低かつた。これは前記b工程でのクロム硫酸に
よる粗化が全く方向性を示さないことに起因す
る。即ち単方向のブラツシングはブラシの太さよ
り小さい凹凸部分が全く研削されないことが起り
得るからである。従つて多方向からランダムに擦
るのが好ましい。より具体的には回転と往復動を
適宜与えながらブラツシングを行うのが賢明であ
る。 For grinding, a method using brushing was tried. Nylon, hair, and wire brushes were used as brushing materials, but nylon brushes were better in terms of hardness. The incidence of blisters was lower when brushing was done in multiple directions, that is, in a random manner, than in a single direction. This is because the roughening by chromium sulfuric acid in step b does not show any directionality. That is, with unidirectional brushing, it is possible that uneven portions smaller than the thickness of the brush may not be ground at all. Therefore, it is preferable to rub randomly from multiple directions. More specifically, it is wise to perform brushing while appropriately applying rotation and reciprocating motion.
この様にブラツシングなどの機械的研削手段に
よつて表層が削られ、次工程で発生する水素ガス
などの気泡を内蔵することのない凹凸部状態をも
つ接着剤層12は、次にdで示すように化学メツ
キ層13が、その表面に被着される。 The surface of the adhesive layer 12 has been scraped by mechanical grinding means such as brushing, and the adhesive layer 12 has an uneven state that does not contain bubbles such as hydrogen gas generated in the next process, as shown by d below. A chemical plating layer 13 is then deposited on the surface.
以降、セミアデイテイブ法に於てはこの化学メ
ツキ層13上に電気メツキ層が形成され、印刷回
路板に於ては、更にパターニングが施されるが、
これらの各工程の詳細な説明は省略する。 Thereafter, in the semi-additive method, an electroplated layer is formed on this chemically plated layer 13, and patterning is further performed in the printed circuit board.
A detailed explanation of each of these steps will be omitted.
(発明の効果)
この発明方法によれば、接着剤層の表面を化学
的に粗化し、更に機械的手段によつてその表層を
研削することにより、化学メツキ時に発生するガ
スを吸蔵しないが複雑な凹凸部をもつ接着剤の表
層を作り得るから、その上にふくれが発生しない
密着力の高い化学メツキ層を被着できるという大
きな利益を生むものである。(Effect of the invention) According to the method of this invention, by chemically roughening the surface of the adhesive layer and further grinding the surface layer by mechanical means, gases generated during chemical plating are not occluded, but the process is complicated. Since it is possible to create a surface layer of the adhesive with irregularities, it is possible to apply a chemical plating layer with high adhesion that does not cause blisters on top of the surface layer, which is a great advantage.
第1図a〜dはこの発明の好ましい一実施例を
示す工程断面のモデル図である。第2図は、接着
剤の表面を化学的に粗化した直後の工程断面図の
顕微鏡写真のモデル図である。
10……金属板、11……絶縁体、12……接
着剤層、13……化学メツキ層。
1A to 1D are process cross-sectional model diagrams showing a preferred embodiment of the present invention. FIG. 2 is a model diagram of a microscopic photograph of a cross-sectional view of the process immediately after the surface of the adhesive has been chemically roughened. 10... Metal plate, 11... Insulator, 12... Adhesive layer, 13... Chemical plating layer.
Claims (1)
面を化学的に粗化して化学メツキ層を形成する方
法に於て、前記化学メツキ層を形成するに先立つ
て、前記接着剤層の化学的粗化表層をブラツシン
グによつて研削する工程を含み、前記研削量は前
記化学メツキ層形成時に発生するガスが前記接着
剤層表面の特に凹部に吸蔵しない表面状態になる
迄行う事を特徴とする絶縁体上に化学メツキを形
成する方法。1. In a method of depositing an adhesive layer on the surface of an insulator and chemically roughening the surface of this layer to form a chemically plated layer, the adhesive layer is coated before forming the chemically plated layer. The method includes the step of grinding the chemically roughened surface layer of the adhesive layer by brushing, and the amount of grinding is such that the amount of grinding is such that the surface condition is such that the gas generated during the formation of the chemical plating layer is not occluded particularly in the recesses on the surface of the adhesive layer. A method of forming chemical plating on a characteristic insulator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24319684A JPS61124577A (en) | 1984-11-20 | 1984-11-20 | Method for forming chemical plating on insulator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24319684A JPS61124577A (en) | 1984-11-20 | 1984-11-20 | Method for forming chemical plating on insulator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61124577A JPS61124577A (en) | 1986-06-12 |
| JPH0343344B2 true JPH0343344B2 (en) | 1991-07-02 |
Family
ID=17100258
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24319684A Granted JPS61124577A (en) | 1984-11-20 | 1984-11-20 | Method for forming chemical plating on insulator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61124577A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3963661B2 (en) * | 2001-05-10 | 2007-08-22 | 株式会社荏原製作所 | Electroless plating method and apparatus |
-
1984
- 1984-11-20 JP JP24319684A patent/JPS61124577A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61124577A (en) | 1986-06-12 |
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