JPH0344006A - Thick film resistor drawing method - Google Patents
Thick film resistor drawing methodInfo
- Publication number
- JPH0344006A JPH0344006A JP1179609A JP17960989A JPH0344006A JP H0344006 A JPH0344006 A JP H0344006A JP 1179609 A JP1179609 A JP 1179609A JP 17960989 A JP17960989 A JP 17960989A JP H0344006 A JPH0344006 A JP H0344006A
- Authority
- JP
- Japan
- Prior art keywords
- data
- resistor
- writing
- substrate
- back side
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、ハイブリッドIC(以下HICと略す)の抵
抗体を形成する厚膜抵抗描画方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a thick film resistor drawing method for forming a resistor of a hybrid IC (hereinafter abbreviated as HIC).
従来の技術
HICでは、基板の表裏の両面とも抵抗を描画する必要
があるが、従来の抵抗描画機の描画開始位置は、基板の
表面は表面での基準点からのデータで抵抗体を描画し、
また基板の裏面は裏面での基準点からのデータで抵抗体
を描画するように、各面ごとの基準点で、描画開始位置
を決定していた。In the conventional HIC technology, it is necessary to draw resistors on both the front and back sides of the board, but the drawing start position of the conventional resistance drawing machine is based on the data from the reference point on the front surface of the board. ,
In addition, on the back side of the substrate, the drawing start position was determined using the reference point for each side, so that the resistor was drawn using data from the reference point on the back side.
発明が解決しようとする課題
しかし、従来の方法においては、同じ基板でありながら
、表と裏で基準点を変えて描画開始位置を作成する必要
がある。Problems to be Solved by the Invention However, in the conventional method, it is necessary to create a drawing start position by changing reference points on the front and back sides of the same substrate.
近年CAD等から出力される抵抗位置データは、表面も
裏面も同じ基準点によるデータで表わされ、CADから
のデータを直接使用する時には、裏面のデータは作業者
が再度描画位置を計算し再入力していた。In recent years, resistance position data output from CAD, etc., is expressed using the same reference point on both the front and back sides, and when using data directly from CAD, the data on the back side has to be recalculated by the operator to re-calculate the drawing position. I was typing.
つまり第1図に示すデータが与えられた時、2の表面の
描画開始位置データは(X+、yl)であり、そのデー
タで直接描画できる。しかし、3の裏面描画開始位置デ
ータは(X2.y2)であるが、裏面にした時、描画特
有の描画方法である、X、Y方向へはそれぞれ一方向し
か描画できないという限定等もあり、直接そのデータは
使用できず、作業者か計算し再入力する必要かあった。In other words, when the data shown in FIG. 1 is given, the drawing start position data for the surface 2 is (X+, yl), and direct drawing can be performed using that data. However, although the back side drawing start position data of 3 is (X2.y2), when it is on the back side, there is a limitation that drawing can only be done in one direction each in the X and Y directions, which is a unique drawing method. The data could not be used directly and had to be calculated and re-entered by the operator.
課題を解決するための手段
そして上記問題点を解決する本発明の技術的手段は、描
画データの基準点が表裏とも同しである抵抗体のデータ
を、描画開始位置演算工程と描画終了位置演算工程によ
り、基板の表裏両面のデータへ変換し、これに基づき描
画するものである。Means for Solving the Problems The technical means of the present invention for solving the above-mentioned problems is to use the data of a resistor whose reference point is the same on the front and back sides of the drawing data in a drawing start position calculation process and a drawing end position calculation process. Through the process, data is converted to data on both the front and back sides of the substrate, and drawing is performed based on this data.
作用 この技術的手段による作用は次のようになる。action The effect of this technical means is as follows.
すなわち、描画開始位置データが基板の表面も裏面とも
同じ基準点で与えられた場合に、座標変換して裏面の描
画開始位置データを計算し、裏面の抵抗描画が可能とな
る。That is, when drawing start position data is given at the same reference point for both the front and back sides of the substrate, coordinate conversion is performed to calculate the drawing start position data for the back side, making it possible to perform resistance drawing on the back side.
実施例 以下本発明の一実施例を添付図面に基づいて説明する。Example An embodiment of the present invention will be described below based on the accompanying drawings.
第1図において、1は描画を行なう基板であり、2は基
板表面に描画する抵抗体、3は基板裏面に描画する抵抗
体、4はCAD等により与えられた表面の抵抗体2の描
画開始点、5は裏面の抵抗体3の描画開始点、6はこれ
ら抵抗体の描画方向である。In FIG. 1, 1 is a board on which drawing is performed, 2 is a resistor to be drawn on the surface of the substrate, 3 is a resistor to be drawn on the back side of the substrate, and 4 is the start of drawing of the resistor 2 on the surface given by CAD etc. Point 5 is the drawing start point of the resistors 3 on the back surface, and 6 is the drawing direction of these resistors.
第2図は、基板1をY軸に対してX座標を反転し、裏面
にした時の状態である。7は裏面時の抵抗体3の描画開
始点であり、8は抵抗体2の表面描画終了点、9は抵抗
体3の裏面描画終了点である。FIG. 2 shows a state in which the X coordinate of the substrate 1 is reversed with respect to the Y axis so that the back side is formed. 7 is the drawing start point of the resistor 3 on the back side, 8 is the end point of the front side drawing of the resistor 2, and 9 is the end point of the back side drawing of the resistor 3.
表面を描画する場合は、4の描画開始位置(x +、
y +)と描画長さ 11のデータで描画終了(x+
+j!+、Y+)を求め、描画させることかできる。When drawing the surface, the drawing start position of 4 (x +,
Drawing ends with data of y +) and drawing length 11 (x+
+j! +, Y+) and draw it.
しかし、裏面を描画する場合、5の描画開始位置(X2
.Y2)と描画長さ12のデータでは描画できない。裏
面の場合は第2図となり、描画開始位置のデータは、(
−x2.y2)になる。しかし描画特有の性質である描
画方向がX方向下方向それぞれ一方向に限られているた
め、裏面の5の描画開始位置は、第2図の7の位置より
右方向へ描画しなければならない。したかって、裏面時
の描画開始点7の座標は、((X2 +12)y2)で
求められ、描画長さはは12であるので描画終了点9が
求まる。However, when drawing the back side, the drawing start position of 5 (X2
.. Y2) and data with a drawing length of 12 cannot be used to draw. In the case of the back side, it will be shown in Figure 2, and the data of the drawing start position will be (
-x2. y2). However, since the drawing direction, which is a characteristic peculiar to drawing, is limited to one direction each downward in the X direction, the drawing start position of 5 on the back side must be drawn to the right from the position of 7 in FIG. Therefore, the coordinates of the drawing start point 7 for the back side can be found as ((X2 + 12) y2), and since the drawing length is 12, the drawing end point 9 can be found.
この一連の座標変換工程により、裏面抵抗体すべての描
画開始位置が求まる。第3図にこのフローチャートを示
す。Through this series of coordinate conversion steps, the drawing start positions of all the backside resistors are determined. FIG. 3 shows this flowchart.
発明の効果
本発明によれば、抵抗描画装置で表面裏面の両面の抵抗
体を描画する場合に、表面と裏面の描画位置データが同
じ基準点で与えられても、座標変換が可能となり、作業
者が描画位置データを変換して再度入力する必要がなく
、データ作成時間を短縮できる。Effects of the Invention According to the present invention, when drawing a resistor on both the front and back surfaces using a resistance drawing device, even if drawing position data for the front and back sides are given at the same reference point, coordinate conversion is possible, and the work is simplified. There is no need for the operator to convert the drawing position data and re-enter it, reducing data creation time.
第1図は表面から見た描画基板図、第2図は裏面から見
た描画基板図、第3図は座標変換機能のフローチャート
である。
1・・・・・・基板、2・・・・・・表面描画抵抗、3
・・・・・・裏面描画抵抗、4・・・・・・表面描画開
始位置、5・・・・・・裏面描画開始位置、6・・・・
・・描画方向、7・・・・・・裏面時の描画開始位置、
8・・・・・・表面描画終了位置、9・・・裏面描画終
了位置。FIG. 1 is a diagram of the drawing board seen from the front side, FIG. 2 is a diagram of the drawing board seen from the back side, and FIG. 3 is a flowchart of the coordinate conversion function. 1...Substrate, 2...Surface drawing resistor, 3
...Back side drawing resistance, 4...Surface drawing start position, 5...Back side drawing start position, 6...
...Drawing direction, 7...Drawing start position for back side,
8... Front side drawing end position, 9... Back side drawing end position.
Claims (1)
て、基板両面に抵抗体を描画する際、描画データの基準
点が表裏とも同じである抵抗体のデータを、描画開始位
置演算工程と描画終了位置演算工程により基板の表裏両
面のデータへ変換し、この描画データに基づいて裏面の
抵抗体を描画することを特徴とする厚膜抵抗描画方法。In a thick film resistor drawing method in which a viscous material is discharged from a nozzle, when drawing resistors on both sides of the substrate, data of the resistor whose drawing data reference point is the same on both sides is used in the drawing start position calculation process and the drawing end position. A thick film resistor drawing method characterized by converting data on both the front and back sides of a substrate through a calculation process and drawing a resistor on the back side based on this drawing data.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1179609A JPH0344006A (en) | 1989-07-11 | 1989-07-11 | Thick film resistor drawing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1179609A JPH0344006A (en) | 1989-07-11 | 1989-07-11 | Thick film resistor drawing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0344006A true JPH0344006A (en) | 1991-02-25 |
Family
ID=16068743
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1179609A Pending JPH0344006A (en) | 1989-07-11 | 1989-07-11 | Thick film resistor drawing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0344006A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160113731A (en) | 2012-04-09 | 2016-09-30 | 미쓰이 가가쿠 가부시키가이샤 | Plant cultivation material and plant cultivation method using same |
-
1989
- 1989-07-11 JP JP1179609A patent/JPH0344006A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160113731A (en) | 2012-04-09 | 2016-09-30 | 미쓰이 가가쿠 가부시키가이샤 | Plant cultivation material and plant cultivation method using same |
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