JPH0346199B2 - - Google Patents

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Publication number
JPH0346199B2
JPH0346199B2 JP61199021A JP19902186A JPH0346199B2 JP H0346199 B2 JPH0346199 B2 JP H0346199B2 JP 61199021 A JP61199021 A JP 61199021A JP 19902186 A JP19902186 A JP 19902186A JP H0346199 B2 JPH0346199 B2 JP H0346199B2
Authority
JP
Japan
Prior art keywords
wastewater
treatment
semiconductor
light
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61199021A
Other languages
Japanese (ja)
Other versions
JPS6354992A (en
Inventor
Hiroshi Tsubomura
Michio Matsumura
Makoto Iwasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Oji Paper Co Ltd
Original Assignee
Oji Paper Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oji Paper Co Ltd filed Critical Oji Paper Co Ltd
Priority to JP19902186A priority Critical patent/JPS6354992A/en
Publication of JPS6354992A publication Critical patent/JPS6354992A/en
Publication of JPH0346199B2 publication Critical patent/JPH0346199B2/ja
Granted legal-status Critical Current

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  • Physical Water Treatments (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

(産業上の利用分野) 本発明は、パルプ排水の光化学的処理方法に関
する。 (従来の技術) 従来、パルプ排水処理には一般的に、(1)未処理
放流、(2)凝集沈殿処理、(3)ばつ気処理、(4)イオン
交換処理、(5)限外ろ過膜処理、(6)逆浸透処理、(7)
電気化学処理あるいは前記(1)から(7)の併用などが
あるが、このような処理方法を用いても不満足な
場合が多い。 一方、パルプ排水を光を使つて照射処理する方
法は、Ind.Eng.Chem.Prosess10(4)509(1971)な
どで知られているが、光源に紫外光だけを単独に
用いると量子収率が低く、実用的でない。 光照射の際に塩素を併用する方法は、Amer.
Chem.Soc.Div.Water、Air Waste Chem.Gen.
Pap.1968、8(2)44−50およびChemical &
Engineering News p−98(1969)に提案されて
おり、化学的酸素要求量(COD)、全有機炭素量
(TOD)除去に顕著な効果が認められる。特開昭
48−73374号公報および特開昭48−73375号公報も
これと全く同じ原理に基づくものである。酸化剤
として、塩素の代わりに価格の安い酸素を用いる
方法もあり、特開昭48−42101号公報に提案され
ている。 光照射の際に塩素あるいは酸素を併用する方法
には、(1)酸化力が強く、色度、生物学的酸素要求
量(BOD)、COD、TODをほとんど零にまで処
理することができる、(2)広範囲な種類の排水に適
用できる、(3)スラツジの生成が無い、(4)装置が単
純で操作が簡単であるなどの利点がある。一方、
欠点としては、反応が早いとは言え、完全に脱色
できるまでに数時間かかること、また紫外光しか
使えないので光源が限定され、そのため高価なラ
ンプが必要になり、発生用の必要電力も大きくな
る点である。 電解脱色の場合には、塩化ナトリウムなどの塩
を電極表面で塩素イオンを塩素に酸化し、それを
酸化剤として排水を処理する方法が知られてい
る。(Pulp & Paper Can.80(4)68(1979))しか
しこの方法の欠点は、電力費が大きく経済的でな
いこと、更に電極表面の汚れが激しいことであ
る。 本発明者らは、光照射法および電解脱色法につ
いて多角的に検討した結果、酸化剤の存在下で紫
外光を照射して排水処理を行う光化学的な処理に
おいて、半導体および水溶性ハロゲン化合物を併
用すると、処理効率が急激に増加することを知得
した。更に、半導体の種類を変えることによつて
紫外光のみならず可視光も光源として利用できる
ことも発見した。 (発明の目的) 本発明は、前記した光照射法および電解脱色法
の欠点を解決するためになされたもので、その目
的は、パルプ排水の処理効率が高く、かつ可視光
をも利用できる新規なパルプ排水処理方法を提供
することである。 更に他の目的は、有機塩素化合物を含まない排
水を提供するものであり、更に他の目的は、パル
プ排水のみならず通常の排水処理方法では処理困
難な産業排水の処理法を提供するものであり、更
に他の目的は、以下の記載から明らかになるであ
ろう。 (発明の構成) 本発明は、パルプ排水に酸化剤および半導体の
存在下に、更に水溶性のハロゲン化合物を加えた
後に紫外光および/または可視光を照射すること
を特徴とするパルプ排水の光化学的処理方法に関
する。 次に本発明を構成する要素について詳説する。
本発明で処理されるパルプ排水としては、塩素
段、アルカリ段、ハイポ段、二酸化塩素段などの
いわゆる塩素系漂白段からの排水のみならず酸素
段、オゾン段、過酸化水素段などのいわゆる非塩
素系漂白段からの排水あるいはスクリーン排水、
蒸解段からの排水、エバポレーターからの排水な
どのパイプ化工程からの排水および抄紙工程から
の排水あるいは加工工程からの排水などを含むこ
とができる。 本発明に使用される酸化剤としては、酸素、空
気、酸素富化空気、オゾン、過酸化水素、次亜塩
素酸ソーダ、二酸化窒素など、いずれを使用して
も良いが、酸素または空気を使用すると便利であ
る。酸素または空気を使用した場合の供給量は、
排水が酸素で飽和されている状態を維持するに足
りる量であれば良い。 本発明で使われるところの半導体としては、市
販されているTiO2、ZnO、CdS、Si、GaP、
GaAs、SiCなどのP型半導体およびN型半導体
のいずれでも良い。更に半導体の結晶構造は、例
えばTiO2の場合ではルチル型あるいはアナター
ゼ型のいずれでも良いように、どのような結晶構
造であつても良く、ドーピングされたものでも良
い。また半導体を水素で過熱還元して使用しても
良い。更に半導体に他の金属、例えば白金等を担
持しても良い。半導体を使用する場合は、固定化
しても粒状あるいは粉末状にして排水中に懸濁し
ても良く、各プロセスに最も適した方法で使用さ
れることが好ましい。 本発明で使用される光源としては、太陽光が最
も経済的であるが、紫外光を照射する場合には高
圧水銀灯、可視光を照射する場合にはキセノン灯
を使用するのが好ましい。その他にもタングステ
ン灯、ハロゲン灯および各種のレーザーなどがあ
り、光源は、光化学を行う半導体の光吸収の分光
感度や排水の種類を考慮して選ぶことができる。 排水にローズベンガル、ローダミンB、クロロ
フイル、メチレンブルー、キノマイシンなどの色
素増感剤を加えて光化学的処理を行う場合には、
半導体の固有吸収波長よりも長波長の光にも感応
できるので、この場合には更に多くの種類の光源
を選ぶことができる。 本発明で使用される水溶性ハロゲン化合物とし
ては、周期律表のアルカリ金属元素および/また
はアルカリ金属土類元素とハロゲン元素との化合
物のうち水溶性であれば、どのような化合物でも
良いが、経済性および薬品の取り扱い性を考慮す
るならば海水あるいは塩化ナトリウム、塩化カリ
ウムを使用するのが好ましい。 本発明のパルプ排水処理系に適用される温度は
10〜70℃であり、好ましくは30〜60℃である。反
応時間は、反応が早いために60分以下で良いが、
排水の流量などによつて反応時間が延びても何等
問題は無い。PHは、いずれの領域でも良い。 本発明を実施するにあたつては、パルプ排水が
排水処理工程に入る第一段目で使用するのも良い
し、あるいは凝集沈殿処理などを受けた後の排水
について、いわゆる高次処理の形で使用しても良
く、更には連続あるいはバツチ操作でも良く、数
多くの方法が適用される。 (発明の実施例) 次に本発明の実施例について説明するが、本発
明はこれによりなんら限定されるものではない。 実施例 1および2 クラフト工場のアルカリ排水(COD 120ppm、
BOD 470ppm、PH 10.8)を10倍に希釈して試
料液とした。 実験法は、室温の試料液から10mlを石英製容器
に入れる。スターラーで攪はんしながら、半導体
粉末を50mgおよび塩化ナトリウムを0.3g容器に
加え、酸素を30ml/分の流量でバブリングさせな
がら入力500wの高圧水銀灯を距離30cmの位置よ
り照射し、凸レンズで集光して所定時間反応させ
た。一定時間後液の上澄みを採取して、その
465nmにおける吸光度を測定し脱色の程度を測
定した。 実施例1…TiO2使用 実施例2…ZnO使用 比較例1乃至比較例6 次に記載する事項以外は、実施例1および2と
同じ試料液を用いて、同じ方法で光照射し、処理
液の脱色の程度を測定した。 比較例1…NaCl添加なし、TiO2使用 比較例2…NaCl添加なし、ZnO使用 比較例3…半導体およびNaCl添加なし 比較例4…半導体および酸素添加なし 比較例5…酸素およびNaCl添加なし、ZnO使用 比較例6…半導体添加なし 実施例1〜比較列6までの測定結果を第1表に
示した。表において、照射0分の吸光度を100%
として相対値で示した
(Industrial Application Field) The present invention relates to a method for photochemically treating pulp wastewater. (Prior art) Conventionally, pulp wastewater treatment generally includes (1) untreated discharge, (2) coagulation sedimentation treatment, (3) aeration treatment, (4) ion exchange treatment, and (5) ultrafiltration. Membrane treatment, (6) reverse osmosis treatment, (7)
Electrochemical treatment or a combination of the above (1) to (7) can be used, but even if such treatment methods are used, they are often unsatisfactory. On the other hand, a method of irradiating pulp wastewater with light is known, such as in Ind.Eng.Chem.Prosess 10 (4) 509 (1971), but if only ultraviolet light is used as a light source, quantum loss occurs. rate is low and impractical. Amer.
Chem.Soc.Div.Water, Air Waste Chem.Gen.
Pap.1968, 8(2)44-50 and Chemical &
This method was proposed in Engineering News p-98 (1969), and has been found to be highly effective in removing chemical oxygen demand (COD) and total organic carbon (TOD). Tokukai Akira
No. 48-73374 and Japanese Unexamined Patent Publication No. 48-73375 are based on exactly the same principle. There is also a method of using inexpensive oxygen instead of chlorine as an oxidizing agent, which is proposed in Japanese Patent Application Laid-Open No. 48-42101. The method of using chlorine or oxygen in combination with light irradiation includes (1) strong oxidizing power and can reduce chromaticity, biological oxygen demand (BOD), COD, and TOD to almost zero; It has the following advantages: (2) it can be applied to a wide range of wastewater types, (3) it does not generate sludge, and (4) the device is simple and easy to operate. on the other hand,
The disadvantages are that although the reaction is quick, it takes several hours to completely decolorize, and since only ultraviolet light can be used, the light source is limited, so expensive lamps are required, and the power required for generation is large. This is the point. In the case of electrolytic decolorization, a method is known in which chlorine ions are oxidized to chlorine using a salt such as sodium chloride on the electrode surface, and wastewater is treated using this as an oxidizing agent. (Pulp & Paper Can. 80 (4)68 (1979)) However, the disadvantages of this method are that it is not economical due to the high power cost and that the electrode surface is heavily contaminated. As a result of multifaceted studies on light irradiation methods and electrolytic decolorization methods, the present inventors found that semiconductors and water-soluble halogen compounds can be used in photochemical treatment for wastewater treatment by irradiating ultraviolet light in the presence of an oxidizing agent. We learned that when used together, the processing efficiency increases rapidly. Furthermore, they discovered that by changing the type of semiconductor, not only ultraviolet light but also visible light can be used as a light source. (Objective of the Invention) The present invention was made to solve the drawbacks of the light irradiation method and the electrolytic decolorization method described above. An object of the present invention is to provide a pulp wastewater treatment method. Still another purpose is to provide wastewater that does not contain organic chlorine compounds, and yet another purpose is to provide a method for treating not only pulp wastewater but also industrial wastewater that is difficult to treat with normal wastewater treatment methods. Yes, and further objects will become apparent from the description below. (Structure of the Invention) The present invention provides photochemistry of pulp wastewater, which is characterized by irradiating ultraviolet light and/or visible light after adding a water-soluble halogen compound to the pulp wastewater in the presence of an oxidizing agent and a semiconductor. Regarding the processing method. Next, the elements constituting the present invention will be explained in detail.
Pulp wastewater treated in the present invention includes not only wastewater from so-called chlorine bleach stages such as chlorine stage, alkaline stage, hypo stage, and chlorine dioxide stage, but also so-called non-containing water such as oxygen stage, ozone stage, and hydrogen peroxide stage. Drainage from chlorine bleach stage or screen drainage,
It can include wastewater from the cooking stage, wastewater from the piping process such as wastewater from the evaporator, wastewater from the papermaking process, or wastewater from the processing process. The oxidizing agent used in the present invention may be oxygen, air, oxygen-enriched air, ozone, hydrogen peroxide, sodium hypochlorite, nitrogen dioxide, etc., but oxygen or air may be used. That's convenient. When using oxygen or air, the supply amount is
It is sufficient if the amount is sufficient to maintain the state in which the wastewater is saturated with oxygen. Semiconductors used in the present invention include commercially available TiO 2 , ZnO, CdS, Si, GaP,
Either a P-type semiconductor or an N-type semiconductor such as GaAs or SiC may be used. Further, the crystal structure of the semiconductor may be any type of crystal structure, such as rutile type or anatase type in the case of TiO2 , and may be doped. Alternatively, a semiconductor may be used after being heated and reduced with hydrogen. Furthermore, other metals, such as platinum, may be supported on the semiconductor. When using a semiconductor, it may be immobilized or suspended in the waste water in the form of granules or powder, and it is preferable to use the method most suitable for each process. Although sunlight is the most economical light source for use in the present invention, it is preferable to use a high-pressure mercury lamp when irradiating ultraviolet light, and a xenon lamp when irradiating visible light. Other options include tungsten lamps, halogen lamps, and various lasers, and the light source can be selected in consideration of the spectral sensitivity of light absorption of the semiconductor performing photochemistry and the type of wastewater. When photochemically treating wastewater by adding dye sensitizers such as rose bengal, rhodamine B, chlorophyll, methylene blue, and kinomycin,
In this case, even more types of light sources can be selected since it can also be sensitive to light with a wavelength longer than the inherent absorption wavelength of the semiconductor. The water-soluble halogen compound used in the present invention may be any compound of a halogen element and an alkali metal element and/or an alkali metal earth element in the periodic table as long as it is water-soluble. Considering economical efficiency and ease of handling chemicals, it is preferable to use seawater, sodium chloride, or potassium chloride. The temperature applied to the pulp wastewater treatment system of the present invention is
The temperature is 10 to 70°C, preferably 30 to 60°C. The reaction time should be less than 60 minutes because the reaction is fast, but
There is no problem even if the reaction time is extended due to the flow rate of the wastewater, etc. PH may be in any range. When carrying out the present invention, pulp wastewater may be used in the first stage when it enters the wastewater treatment process, or it may be used in the form of so-called higher-order treatment for wastewater after undergoing coagulation and sedimentation treatment. It may be used in a continuous or batchwise manner, and a number of methods are applicable. (Examples of the Invention) Next, Examples of the present invention will be described, but the present invention is not limited thereto in any way. Examples 1 and 2 Alkaline wastewater from a kraft factory (COD 120ppm,
BOD 470ppm, PH 10.8) was diluted 10 times to prepare a sample solution. The experimental method is to place 10 ml of the sample solution at room temperature into a quartz container. Add 50 mg of semiconductor powder and 0.3 g of sodium chloride to a container while stirring with a stirrer, and while bubbling oxygen at a flow rate of 30 ml/min, irradiate it with a high-pressure mercury lamp with an input of 500 W from a distance of 30 cm, and collect it with a convex lens. The mixture was exposed to light and allowed to react for a predetermined period of time. After a certain period of time, collect the supernatant of the liquid and
The degree of decolorization was determined by measuring the absorbance at 465 nm. Example 1 Using TiO 2 Example 2 Using ZnO Comparative Example 1 to Comparative Example 6 The same sample solution as in Examples 1 and 2 was used except for the following items, and the treatment solution was irradiated with light in the same manner. The degree of decolorization was measured. Comparative example 1...No addition of NaCl, use of TiO 2 Comparative example 2...No addition of NaCl, use of ZnO Comparative example 3...No addition of semiconductor and NaCl Comparative example 4...No addition of semiconductor and oxygen Comparative example 5...No addition of oxygen and NaCl, ZnO Comparative Use Example 6: No addition of semiconductor The measurement results of Example 1 to Comparative Row 6 are shown in Table 1. In the table, absorbance at 0 minutes of irradiation is 100%
expressed as a relative value as

【表】 実施例 3および4 試料液として市販のアルカリリグニン0.1gを
水1に溶解した液を用い、実施例1および2と
同じ方法で光照射し、処理液の脱色の程度を測定
した。 実施例3…TiO2使用 実施例4…ZnO使用 比較例 7および8 次に記載の事項以外は、実施例3および4と同
じ試料液を用い、実施例1および2と同じ方法で
光照射し、処理液の脱色の程度を測定した。 実施例3、4および比較例7、8の測定結果を
第2表に示す。
[Table] Examples 3 and 4 Using a solution prepared by dissolving 0.1 g of commercially available alkali lignin in 1 part of water as a sample solution, light irradiation was performed in the same manner as in Examples 1 and 2, and the degree of decolorization of the treated solution was measured. Example 3...Example 4 using TiO2 ...Comparative example using ZnO 7 and 8 Except for the following, the same sample solution as in Examples 3 and 4 was used, and light irradiation was carried out in the same manner as in Examples 1 and 2. The degree of decolorization of the treatment solution was measured. The measurement results of Examples 3 and 4 and Comparative Examples 7 and 8 are shown in Table 2.

【表】 (発明の効果) 前記第1表および第2表から明らかなように酸
素、半導体存在下で、更に水溶性のハロゲン化合
物を加えた後に光照射して排水を処理すると非常
に短時間で、ほぼ完全に処理できることが認めら
れた。 更にこの効果に加えて本発明方法により処理し
たものについては脱臭効果も認められた。 また通常の排水処理方法では必ず生じるスラツ
ジが本発明法では生成しないために、スラツジの
廃棄の問題が全く生じないことも大きな特徴であ
る。
[Table] (Effects of the invention) As is clear from Tables 1 and 2 above, when wastewater is treated in the presence of oxygen and semiconductors by adding a water-soluble halogen compound and then irradiating it with light, it takes a very short time. It was confirmed that it could be treated almost completely. Furthermore, in addition to this effect, a deodorizing effect was also observed for those treated by the method of the present invention. Another major feature is that the method of the present invention does not produce sludge, which is always produced in ordinary wastewater treatment methods, so there is no problem of sludge disposal.

Claims (1)

【特許請求の範囲】[Claims] 1 パルプ排水に酸化剤および半導体の存在下
で、更に水溶性のハロゲン化合物を加えた後に紫
外光/または可視光を照射することを特徴とする
パルプ排水の光化学的処理方法。
1. A method for photochemically treating pulp wastewater, which comprises adding a water-soluble halogen compound to the pulp wastewater in the presence of an oxidizing agent and a semiconductor, and then irradiating it with ultraviolet light/or visible light.
JP19902186A 1986-08-27 1986-08-27 Photochemical treatment method for pulp wastewater Granted JPS6354992A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19902186A JPS6354992A (en) 1986-08-27 1986-08-27 Photochemical treatment method for pulp wastewater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19902186A JPS6354992A (en) 1986-08-27 1986-08-27 Photochemical treatment method for pulp wastewater

Publications (2)

Publication Number Publication Date
JPS6354992A JPS6354992A (en) 1988-03-09
JPH0346199B2 true JPH0346199B2 (en) 1991-07-15

Family

ID=16400802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19902186A Granted JPS6354992A (en) 1986-08-27 1986-08-27 Photochemical treatment method for pulp wastewater

Country Status (1)

Country Link
JP (1) JPS6354992A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194998A (en) * 1987-10-05 1989-04-13 Agency Of Ind Science & Technol Photochemical treatment of waste water
JPH01119394A (en) * 1987-11-02 1989-05-11 Ebara Res Co Ltd Treatment of water by photocatalyst

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6011829A (en) * 1983-06-30 1985-01-22 Matsushita Electric Ind Co Ltd Copying magnification converter
JPS60118236A (en) * 1983-11-30 1985-06-25 Giken Kogyo Kk Molded photo-oxidation catalyst body

Also Published As

Publication number Publication date
JPS6354992A (en) 1988-03-09

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