JPS6354992A - Photochemical treatment method for pulp wastewater - Google Patents

Photochemical treatment method for pulp wastewater

Info

Publication number
JPS6354992A
JPS6354992A JP19902186A JP19902186A JPS6354992A JP S6354992 A JPS6354992 A JP S6354992A JP 19902186 A JP19902186 A JP 19902186A JP 19902186 A JP19902186 A JP 19902186A JP S6354992 A JPS6354992 A JP S6354992A
Authority
JP
Japan
Prior art keywords
wastewater
semiconductor
light
treatment
oxidizing agent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19902186A
Other languages
Japanese (ja)
Other versions
JPH0346199B2 (en
Inventor
Hiroshi Tsubomura
坪村 宏
Michio Matsumura
道雄 松村
Makoto Iwasaki
誠 岩崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
New Oji Paper Co Ltd
Original Assignee
Oji Paper Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oji Paper Co Ltd filed Critical Oji Paper Co Ltd
Priority to JP19902186A priority Critical patent/JPS6354992A/en
Publication of JPS6354992A publication Critical patent/JPS6354992A/en
Publication of JPH0346199B2 publication Critical patent/JPH0346199B2/ja
Granted legal-status Critical Current

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  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Physical Water Treatments (AREA)

Abstract

PURPOSE:To enable quick and substantially perfect decoloration by projecting UV light and/or visible light to pulp waste water in the presence of an oxidizing agent and semiconductor. CONSTITUTION:The pulp waste water is projected with the UV light and/or visible light in the presence of the oxidizing agent such as air and the semiconductor such as TiO2. After the halide of sodium chloride or the like is further added to the pulp waste water in the presence of the above-mentioned oxidizing agent and semiconductor, and is projected with the UV light and/or visible light. As a result, the quick and substantially perfect decoloration treatment is possible. There is also deodorization effect.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明はパルプ排水の光化学的処理方法に関する。[Detailed description of the invention] (Industrial application field) The present invention relates to a method for photochemical treatment of pulp wastewater.

(従来技術) 従来パルプ排水処理には一般的に、l)未処理放流、2
)凝集沈殿処理、3)ばっ気処理、4)イオン交換処理
、5)限外ろ過膜処理、6)逆浸透処理、7)電気化学
処理、 あるいは前記l)から7)の併用などがあるが
、このような処理方法を用いても不満足な場合が多い。
(Prior art) Conventional pulp wastewater treatment generally includes: l) untreated discharge;
) coagulation sedimentation treatment, 3) aeration treatment, 4) ion exchange treatment, 5) ultrafiltration membrane treatment, 6) reverse osmosis treatment, 7) electrochemical treatment, or a combination of 1) to 7) above. However, even if such a processing method is used, it is often unsatisfactory.

一方パルブ排水を光を使って照射処理する方法は、In
d、Eng、Chem、Processl O(4) 
509 (1971)などで知られているが、光源に紫
外光だけを筆独に用いると量子収率が低く、実用的でな
い。
On the other hand, the method of irradiating pulp wastewater using light is In
d, Eng, Chem, Processl O (4)
509 (1971), but if only ultraviolet light is used as a light source, the quantum yield is low and it is not practical.

光照射の際に塩素を併用する方法は、Amer、Che
m、soc、Div、Water、Air  Wast
e  にhem、Gen、Pap、   1 968.
8 (2)44−50およびChemical & E
ngineering News p−98(1969
)に提案されており化学的酸素要求量(COD)、全有
機炭素量(TOC)除去に顕著な効果が認められる。特
開昭48−73374号公報および特開昭48−733
75号公報もこれと全く同じ原理に基くものである。酸
化剤として、塩素の代わりに価格の安い酸素を用いる方
法もあり、特開昭48−42101号公報に提案されて
いる。
A method of using chlorine in combination with light irradiation is described by Amer, Che.
m, soc, Div, Water, Air Waste
e to hem, Gen, Pap, 1 968.
8 (2) 44-50 and Chemical & E
ngineering News p-98 (1969
), and has been found to be highly effective in removing chemical oxygen demand (COD) and total organic carbon (TOC). JP-A-48-73374 and JP-A-48-733
Publication No. 75 is also based on exactly the same principle. There is also a method of using inexpensive oxygen instead of chlorine as an oxidizing agent, which is proposed in Japanese Patent Application Laid-Open No. 48-42101.

光照射の際に塩素あるいは酸素を併用する方法には、1
)酸化力が強く、色度、生物学的酸素要求量(BOD)
、COD、TOCをほとんど零にまで処理することがで
きる。 2)広範囲な種類の排水に適用できる。 3)
スラッジの生成がない。
For the method of using chlorine or oxygen together during light irradiation, 1
) Strong oxidizing power, chromaticity, biological oxygen demand (BOD)
, COD, and TOC can be reduced to almost zero. 2) Applicable to a wide range of types of wastewater. 3)
No sludge generation.

4)装置が単純で操作が簡単である。 などの利点があ
る。一方欠点としては反応が早いとは言え、完全に脱色
できるまでに数時間かかること。また紫外光しか使えな
いので光源が限定される。そのため高価なランプが必要
となり、発生用の必要電力も大きくなる点である。
4) The device is simple and easy to operate. There are advantages such as On the other hand, the drawback is that although the reaction is quick, it takes several hours for complete decolorization. Furthermore, since only ultraviolet light can be used, the light source is limited. This requires expensive lamps and increases the amount of power required for generation.

電解脱色の場合には、塩化ナトリウムなどの塩を′電極
表面で塩素イオンを塩素に酸化し、それを酸化剤として
排水を処理する方法が知られている。(Pulp & 
Paper Can、旦0 (4)68 (1979)
)しかしこの方法の欠点は電力費が大きく経済的でない
こと、更に電極表面の汚れが激しいことである。
In the case of electrolytic decolorization, a method is known in which a salt such as sodium chloride is used to oxidize chlorine ions to chlorine on the electrode surface, and wastewater is treated using this as an oxidizing agent. (Pulp &
Paper Can, Dan 0 (4) 68 (1979)
) However, the disadvantages of this method are that it is not economical due to the high power cost and that the electrode surface is heavily contaminated.

本発明者らは、光照射法および電解脱色法について多角
的に検討した結果、酸化剤の存在下で紫外光を照射して
排水処理を行う、光化学的な処理において、半導体のみ
を併用するかあるいは半導体および水溶性ハロゲン化合
物を併用すると、処理効率が急激に増加することを知得
した。更に半導体の種類を変えることによって、紫外光
のみならず可視光も光源として利用できることも発見し
た。
As a result of multifaceted studies on light irradiation methods and electrolytic decolorization methods, the present inventors found that it is possible to use only semiconductors in combination with photochemical treatment in which wastewater treatment is performed by irradiating ultraviolet light in the presence of an oxidizing agent. Alternatively, we have learned that when a semiconductor and a water-soluble halogen compound are used together, the processing efficiency increases rapidly. They also discovered that by changing the type of semiconductor, not only ultraviolet light but also visible light can be used as a light source.

(発明の目的) 本発明は前記した光照射法および電解脱色法の欠点を解
決するためになされたもので、その目的はパルプ排水の
処理効率が高く、かつ可視光をも利用できる新規なパル
プ排水処理方法を提供することである。
(Object of the Invention) The present invention was made to solve the drawbacks of the light irradiation method and the electrolytic decolorization method described above. An object of the present invention is to provide a wastewater treatment method.

更に他の目的は、有機塩素化合物を含まない排水を提供
するものであり、更に他の目的は、パルプ排水のみなら
ず通常の排水処理方法では処理困難な産業排水の処理法
を提供するものであり、更に他の目的は、以下の記載か
ら明らかになるであろう。
Still another purpose is to provide wastewater that does not contain organic chlorine compounds, and yet another purpose is to provide a method for treating not only pulp wastewater but also industrial wastewater that is difficult to treat with normal wastewater treatment methods. Yes, and further objects will become apparent from the description below.

(発明の構成) 本発明を概説すると、平一番目の発明はパルプ排水に酸
化剤および半導体の存在下に紫外光および/または可視
光を照射することを特徴とするパルプ排水の光化学的処
理方法に関するものであり、また第二番目の発明は第一
番目の発明の改良にかかるものであり、パルプ排水に酸
化剤および半導体の存在下に、更に水溶性のハロゲン化
合物を加えた後に紫外光および/または可視光を照射す
ることを特徴とするパルプ排水の光化学的処理方法に関
する。
(Structure of the Invention) To summarize the present invention, the first invention relates to a method for photochemical treatment of pulp wastewater, which comprises irradiating the pulp wastewater with ultraviolet light and/or visible light in the presence of an oxidizing agent and a semiconductor. The second invention is an improvement on the first invention, in which a water-soluble halogen compound is further added to the pulp wastewater in the presence of an oxidizing agent and a semiconductor, and then ultraviolet light and/or Alternatively, the present invention relates to a method for photochemical treatment of pulp wastewater, which comprises irradiating visible light.

次に本発明を構成する要素について詳説する。Next, the elements constituting the present invention will be explained in detail.

本発明で処理されるパルプ排水としては、塩素段、アル
カリ段、ハイポ段、二酸化塩素段などの、いわゆる塩素
系漂白段からの排水のみならず酸素段、オゾン段、過酸
化水素段などの、いわゆる非塩素系漂白段からの排水あ
るいはスクリーン排水、蒸解段からの排水、エバポレー
タからの排水などのパルプ化工程からの排水および抄紙
工程からの排水あるいは加工工程からの排水などを含む
ことかできる。
Pulp wastewater treated in the present invention includes not only wastewater from so-called chlorine bleach stages such as chlorine stage, alkaline stage, hypo stage, and chlorine dioxide stage, but also wastewater from oxygen stage, ozone stage, hydrogen peroxide stage, etc. It can include wastewater from the pulping process, such as wastewater from so-called non-chlorine bleaching stage or screen wastewater, wastewater from the digestion stage, wastewater from the evaporator, and wastewater from the papermaking process or from the processing process.

本発明に使用される酸化剤としては、酸素、空気、酸素
富化空気、オゾン、過酸化水素、次亜塩素酸ソーダ、二
酸化チッ素など、いずれを使用しても良いが、酸素また
は空気を使用すると便利である。酸素または空気を使用
した場合の供給量は、排水が酸素で飽和されている状態
を維持するに足る量であれば良い。
The oxidizing agent used in the present invention may be oxygen, air, oxygen-enriched air, ozone, hydrogen peroxide, sodium hypochlorite, nitrogen dioxide, etc.; however, oxygen or air may be used. It is convenient to use. When oxygen or air is used, the supply amount may be sufficient to maintain the state in which the wastewater is saturated with oxygen.

本発明で使われるところの半導体としては、市販されて
いるTiO2,ZnO,CdS、GaP、Si、GaA
s、SiCなどのP型半導体およびN型゛ト導体のいず
れでも良い。更に半導体の結晶構造は、例えばTiO2
の場合ではルチル型あるいはアナターゼ型のいずれでも
良いように、どのような結晶構造であっても良く、ドー
ポングされたものでも良い。また半導体を水素で加熱還
元して使用しても良い。更に半導体に他の金属、例えば
白金等を担持しても良い。半導体を使用する場合は、固
定化しても粒状あるいは粉末状にして排水中に懸濁して
も良く、各プロセスに最も適した方法で使用されること
が好ましい。
The semiconductors used in the present invention include commercially available TiO2, ZnO, CdS, GaP, Si, and GaA.
Either a P-type semiconductor such as S, SiC, or an N-type conductor may be used. Furthermore, the crystal structure of the semiconductor is, for example, TiO2
In the case of , it may have any crystal structure, such as rutile type or anatase type, and may be doped. Alternatively, a semiconductor may be used after being heated and reduced with hydrogen. Furthermore, other metals, such as platinum, may be supported on the semiconductor. When using a semiconductor, it may be immobilized or suspended in the waste water in the form of granules or powder, and it is preferable to use the method most suitable for each process.

本発明で使用される光源としては、大陽光が最も経済的
であるが、紫外光を照射する場合には高圧水銀灯を、可
視光を照射する場合にはキャノン灯を使用するのが好ま
しい。その他にもタングステン灯、ハロゲン灯および各
種のレーザーなどがあり、光源は光化学を行う半導体の
光吸収の分光感度や排水の種類を考慮して選ぶことがで
きる。
The most economical light source used in the present invention is sunlight, but it is preferable to use a high-pressure mercury lamp when irradiating ultraviolet light, and a cannon lamp when irradiating visible light. Other options include tungsten lamps, halogen lamps, and various lasers, and the light source can be selected by considering the spectral sensitivity of light absorption of the semiconductor performing photochemistry and the type of wastewater.

排水にローズベンガル、ローダミンB、クロロフィル、
メチレンブルー、キノマイシンなどの色素増感剤を加え
て光化学的処理を行う場合には、半導体の固有吸収波長
よりも長波長の光にも感応できるので、この場合には更
に多くの種類の光源を選ぶことができる。
Rose Bengal, Rhodamine B, Chlorophyll, for drainage.
When performing photochemical treatment by adding a dye sensitizer such as methylene blue or quinomycin, it can be sensitive to light with a wavelength longer than the inherent absorption wavelength of the semiconductor, so in this case more types of light sources are selected. be able to.

本発明で使用される水溶性ハロゲン化合物としては、周
Jul率表のアルカリ金属元素および/またはアルカリ
金属上類元素とハロゲン元素との化合物のうち水溶性で
あれば、どのような化合物でも良いが、経済性および薬
品の取り扱い性を考慮するならば海水あるいは塩化ナト
リウム、塩化カリウムを使用するのが好ましい。
The water-soluble halogen compound used in the present invention may be any compound of a halogen element and an alkali metal element and/or an alkali metal element listed in the Peripheral Table as long as it is water-soluble. Considering economic efficiency and ease of handling chemicals, it is preferable to use seawater, sodium chloride, or potassium chloride.

本発明のパルプ排水処理系に適用される温度は10−7
0・Cであり、好ましくは30−60・Cである0反応
時間は反応が早いために60分以下で良いが、排水の流
量などによって反応時間が延びても何隻間通はない。p
Hはいずわの領域でも良い。
The temperature applied to the pulp wastewater treatment system of the present invention is 10-7
0.C, preferably 30-60.C, the reaction time may be 60 minutes or less because the reaction is fast, but even if the reaction time is extended due to the flow rate of waste water, etc., there will be no interruption between ships. p
H may be in the Iwa area.

本発明を実施するにあたっては、パルプ排水か排水処理
工程に入る第一段目で使用するのも良いし、あるいは凝
集沈殿処理などを受けた後の排水について、いわゆる高
次処理の形で使用しても良く、更には連続あるいはバッ
チ操作でも良く、数多くの方法が適用される。
In carrying out the present invention, it may be used in the first stage of the pulp wastewater treatment process, or it may be used in the so-called higher-level treatment of wastewater after undergoing coagulation and sedimentation treatment. It may also be a continuous or batch operation, and a number of methods are applicable.

(発明の実施例) 次に本発明の実施例について説明するが、本発明はこれ
によりなんら限定されるものではない。
(Examples of the Invention) Next, Examples of the present invention will be described, but the present invention is not limited thereto in any way.

実施例1および2 と比較例1.2.3および4クラフ
ト工場のアルカリ排水(COD  1200ppm、 
BOD  470ppm、 pHfo、 8)を10倍
に希釈して試料液とした。
Examples 1 and 2 and Comparative Examples 1.2.3 and 4 Kraft factory alkaline wastewater (COD 1200 ppm,
BOD 470ppm, pHfo, 8) was diluted 10 times to prepare a sample solution.

実験法は、室温の試料液から10ccを石英製容器にい
れる。スターラーで攪はんしながら、半導体粉末を50
mg容器に加え、酸素をバブリングさせながら入力50
0wの高圧水銀灯を距l!!30cI11の位置より照
射し、凸レンズで集光して所定時間反応させた。一定時
間接液の上澄みを採取して、その465nmにおける吸
光度を測定し現色の程度を測定した。別に塩化ナトリウ
ムも添加した後に光照射して処理した排水についても同
様に測定した。
In the experimental method, 10 cc of a sample solution at room temperature was poured into a quartz container. While stirring with a stirrer, add 50% of the semiconductor powder.
mg container and input 50 while bubbling oxygen.
A 0W high pressure mercury lamp! ! Irradiation was performed from a position of 30cI11, the light was collected by a convex lens, and the reaction was allowed to occur for a predetermined period of time. A supernatant of the solution in contact with the solution for a certain period of time was collected, and its absorbance at 465 nm was measured to determine the degree of color development. Separately, wastewater treated by adding sodium chloride and then irradiating it with light was also measured in the same way.

実施例1および2は、試料液にそれぞれ半導体としてT
iO□ (実施例1)およびZnO(実施例2)を加え
て処理実験を行った例である。比較例は同試料液に酸素
だけをバブリングして照射した例(比較例1ンおよび塩
化ナトリウムだけを添加して照射した例(比較例2)更
にはZnOの半導体だけを添加して照射した例(比較例
3)および酸素と塩化ナトリウムとの併用系に照射した
例(比較例4)である。その結果を第1表に示す。
In Examples 1 and 2, T was added as a semiconductor to the sample solution, respectively.
This is an example in which a treatment experiment was conducted by adding iO□ (Example 1) and ZnO (Example 2). Comparative examples include an example in which the same sample solution was irradiated by bubbling only oxygen (Comparative Example 1), an example in which only sodium chloride was added and irradiated (Comparative Example 2), and an example in which only a ZnO semiconductor was added and irradiated. (Comparative Example 3) and an example in which a combined system of oxygen and sodium chloride was irradiated (Comparative Example 4).The results are shown in Table 1.

第1表 表においては照射0分の吸光度を100%として、相対
値で表示した。
In Table 1, the absorbance at 0 minutes of irradiation is taken as 100%, and the absorbance is expressed as a relative value.

実施例3は試料液として重版のアルカリリグニン0.1
gを水ILに溶解した液を用い、半導体としてTiO2
を使用して前記と同様な排水処理を行った例である。実
施例4は、同アルカリリグニン液を、半導体にZnOを
使用して光酸化処理した例である。その結果を第2表に
示す。
In Example 3, reprinted alkali lignin 0.1 was used as the sample solution.
TiO2 as a semiconductor using a solution of g dissolved in water IL.
This is an example of wastewater treatment similar to the above using. Example 4 is an example in which the same alkaline lignin solution was photo-oxidized using ZnO as a semiconductor. The results are shown in Table 2.

第2表 (発明の効果) 面記第1表および第2表から明らかなように酸素、半導
体の存在下で光照射して排水を処理すると非常に短時間
で、はぼ完全に処理できることが認められた。
Table 2 (Effects of the Invention) As is clear from Tables 1 and 2, if wastewater is treated by light irradiation in the presence of oxygen and semiconductors, it can be completely treated in a very short time. Admitted.

更にこの効果に加えて本発明方法により処理したものに
ついては脱臭効果も認められた。
Furthermore, in addition to this effect, a deodorizing effect was also observed for those treated by the method of the present invention.

また通常の排水処理方法では必ず生じるスラッジが本発
明方法では生成しないために、スラッジの廃棄の問題が
全く生じないことも大きな特徴である。
Another major feature is that the method of the present invention does not produce sludge, which is always produced in ordinary wastewater treatment methods, so there is no problem of sludge disposal.

Claims (1)

【特許請求の範囲】 1)パルプ排水に酸化剤および半導体の存在下に紫外光
および/または可視光を照射することを特徴とするパル
プ排水の光化学的処理方法。 2)パルプ排水に酸化剤および半導体の存在下で、更に
水溶性のハロゲン化合物を加えた後に紫外光および/ま
たは可視光を照射することを特徴とするパルプ排水の光
化学的処理方法。
[Scope of Claims] 1) A method for photochemical treatment of pulp wastewater, which comprises irradiating the pulp wastewater with ultraviolet light and/or visible light in the presence of an oxidizing agent and a semiconductor. 2) A method for photochemical treatment of pulp wastewater, which comprises adding a water-soluble halogen compound to the pulp wastewater in the presence of an oxidizing agent and a semiconductor, and then irradiating the pulp wastewater with ultraviolet light and/or visible light.
JP19902186A 1986-08-27 1986-08-27 Photochemical treatment method for pulp wastewater Granted JPS6354992A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19902186A JPS6354992A (en) 1986-08-27 1986-08-27 Photochemical treatment method for pulp wastewater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19902186A JPS6354992A (en) 1986-08-27 1986-08-27 Photochemical treatment method for pulp wastewater

Publications (2)

Publication Number Publication Date
JPS6354992A true JPS6354992A (en) 1988-03-09
JPH0346199B2 JPH0346199B2 (en) 1991-07-15

Family

ID=16400802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19902186A Granted JPS6354992A (en) 1986-08-27 1986-08-27 Photochemical treatment method for pulp wastewater

Country Status (1)

Country Link
JP (1) JPS6354992A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194998A (en) * 1987-10-05 1989-04-13 Agency Of Ind Science & Technol Photochemical treatment of waste water
JPH01119394A (en) * 1987-11-02 1989-05-11 Ebara Res Co Ltd Treatment of water by photocatalyst

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6011829A (en) * 1983-06-30 1985-01-22 Matsushita Electric Ind Co Ltd Copying magnification converter
JPS60118236A (en) * 1983-11-30 1985-06-25 Giken Kogyo Kk Molded photo-oxidation catalyst body

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6011829A (en) * 1983-06-30 1985-01-22 Matsushita Electric Ind Co Ltd Copying magnification converter
JPS60118236A (en) * 1983-11-30 1985-06-25 Giken Kogyo Kk Molded photo-oxidation catalyst body

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0194998A (en) * 1987-10-05 1989-04-13 Agency Of Ind Science & Technol Photochemical treatment of waste water
JPH01119394A (en) * 1987-11-02 1989-05-11 Ebara Res Co Ltd Treatment of water by photocatalyst

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JPH0346199B2 (en) 1991-07-15

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