JPH0346603A - Waveguide type optical demultiplexer and its manufacture - Google Patents

Waveguide type optical demultiplexer and its manufacture

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Publication number
JPH0346603A
JPH0346603A JP1183047A JP18304789A JPH0346603A JP H0346603 A JPH0346603 A JP H0346603A JP 1183047 A JP1183047 A JP 1183047A JP 18304789 A JP18304789 A JP 18304789A JP H0346603 A JPH0346603 A JP H0346603A
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JP
Japan
Prior art keywords
optical
waveguide
directional coupler
periodic
optical waveguide
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Granted
Application number
JP1183047A
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Japanese (ja)
Other versions
JP3005996B2 (en
Inventor
Mitsukazu Kondo
充和 近藤
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NEC Corp
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NEC Corp
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Publication of JPH0346603A publication Critical patent/JPH0346603A/en
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Abstract

PURPOSE:To obtain stability to temperature and to facilitate the manufacture by providing an optical directional coupler consisting of two optical waveguides which has a specific difference in equivalent refractive index and a grating pattern which is installed nearby at least one optical waveguide and generates periodic equivalent bending rate variation in a light transmission direction. CONSTITUTION:The optical waveguides 22 whose equivalent refractive indexes n1 and n2 are shown by an in equality I are put close to each other to constitute the optical directional coupler 24. Further, the grating pattern 25 whose is period LAMBDA is installed for matching and the optical directional coupler 24 couples only light with wavelength lambdai satisftying an equation II with the other optical waveguide 22. Namely, separated wavelength components are outputted in the same direction with incident light 26 (provided that the light is outputted to the optical waveguide 22 which is separated spatially). Consequently, the constitution is simple, the device is stable to temperature, and the manufacture is easy.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は光波の特定の波長を選択的に分離する光分波器
に関し、特に基板上に設置すた光導波路を用いた導波形
光分波器およびその製造方法に関する。
Detailed Description of the Invention (Field of Industrial Application) The present invention relates to an optical demultiplexer that selectively separates specific wavelengths of light waves, and in particular to a waveguide optical demultiplexer that uses an optical waveguide installed on a substrate. This article relates to corrugated equipment and its manufacturing method.

(従来の技術) 光通信技術は、加入者系、コンピュータ間データ伝送、
インテリジェントビル内LAN等様々な分野への導入が
進められており、益々大容量化多チャネル化に対する要
求が強まっている。波長多重伝送技術は複数の波長にそ
れぞれ異なる情報をのせて各々独立に、しかも、1本の
光ファイバを用いて伝送する光の特徴を充分に生かした
伝送方式であり、前述のような要求を満たずことのでき
る有力な方式である。波長多重に伝送では、受信部やL
AN等の分岐部では特定の波長を選択的に取り出す光分
波器が必要である。従来、光分波器は、誘電体多層膜干
渉フィルターや回折格子を利用したものが実用されてい
るが、さらに小型化、高分解能化、多チャネル化を可能
にするものとして光導波路を利用した導波形光分波器が
報告されている。第5図、第6図は従来の導波枝分波器
を示す斜視図である。
(Conventional technology) Optical communication technology is used for subscriber systems, data transmission between computers,
Their introduction into various fields, such as intelligent in-building LANs, is progressing, and the demand for higher capacity and multiple channels is increasing. Wavelength multiplexing transmission technology is a transmission method that takes full advantage of the characteristics of light, transmitting different information on multiple wavelengths independently using a single optical fiber, and it meets the requirements mentioned above. This is a powerful method that can meet the requirements. In wavelength multiplexing transmission, the receiver and L
A branching section such as an AN requires an optical demultiplexer that selectively extracts a specific wavelength. Conventionally, optical demultiplexers have been put into practical use using dielectric multilayer interference filters or diffraction gratings, but optical waveguides have been developed to enable further miniaturization, higher resolution, and multiple channels. A waveguide optical demultiplexer has been reported. FIGS. 5 and 6 are perspective views showing conventional waveguide branching filters.

第5図は偏光変換形の光分波器の一例であり、詳細はオ
プティックス・レターズ第5巻11号473〜475頁
(OPTIC8LETTER8,Vol、5. No、
11 pp473−475)に述べられている。第5図
において、ニオブ酸リチウム(LiNb03)結晶基板
lの表面にチタン(Ti)を拡散して形成された光導波
路2が設置されその」二部に周期穴をもち長さLの制御
電極3が設置されている。入射光4は基板に平行な方向
(Z軸方向)の直線偏光すなわちTEモードであり、制
御電極3への印加電圧により下式(1)を満たず波長λ
iのみTMモード(X軸方向の偏光成分)に変換される
Figure 5 shows an example of a polarization conversion type optical demultiplexer, and details can be found in Optics Letters, Vol. 5, No. 11, pp. 473-475 (OPTIC 8 LETTER 8, Vol.
11 pp473-475). In FIG. 5, an optical waveguide 2 formed by diffusing titanium (Ti) is installed on the surface of a lithium niobate (LiNb03) crystal substrate l, and a control electrode 3 having a length L and having periodic holes in its second part is installed. is installed. The incident light 4 is linearly polarized light in the direction parallel to the substrate (Z-axis direction), that is, the TE mode, and due to the voltage applied to the control electrode 3, the following equation (1) is not satisfied and the wavelength λ
Only i is converted into TM mode (polarized light component in the X-axis direction).

ここでnTEi 、nTMiはそれぞれ光導波路2を伝
搬する波長入i成分のTE、 TMモードの等側屈折率
である。また、偏光変換される波長のスペクトル幅Δλ
は(2)式となる。
Here, nTEi and nTMi are the isolateral refractive indexes of the TE and TM modes of the wavelength input i component propagating through the optical waveguide 2, respectively. Also, the spectral width Δλ of the wavelength to be polarized is
is the formula (2).

Δλ =       入i            
            (2)第6図はブラップ反射
を利用した光分波器の一例であり、詳細はアプライド・
オプティックス第19巻、16号2848〜2855頁
(APLIED 0PTIC8,Vol、19゜No、
16. pp2848−2855)に述べられている。
Δλ = input i
(2) Figure 6 is an example of an optical demultiplexer using Blup reflection.
Optics Vol. 19, No. 16, pp. 2848-2855 (APLIED 0PTIC8, Vol. 19° No.
16. pp. 2848-2855).

第6図において、基板110表面に互いに断面形状の異
なる2つの光導波路12と13が近接して形成され、光
方向性結合器14を構成している。さらに光方向性結合
器14の光導波路12と13の間には長さLで周期穴を
もつ反則格子15が形成されている。光導波路12への
入射16は下式(3)を満たす波長成分λiのみが反射
格子15によって反射され、かつ光導波路15へ結合し
て出射光17となる。
In FIG. 6, two optical waveguides 12 and 13 having mutually different cross-sectional shapes are formed adjacent to each other on the surface of a substrate 110 to constitute an optical directional coupler 14. Furthermore, a reciprocal grating 15 having a length L and having periodic holes is formed between the optical waveguides 12 and 13 of the optical directional coupler 14. Only the wavelength component λi that is incident on the optical waveguide 12 and satisfies the following formula (3) is reflected by the reflection grating 15 and coupled to the optical waveguide 15 to become the output light 17.

ここでn1iq n2iは光導波路12及び13を伝搬
する光波の波λi戊成分等側屈折率である。また、反射
格子15によって回折される波長スペクトル幅Δλは大
まかな近似としては(2)式で決定される。
Here, n1iq n2i is the equal-side refractive index of the wave λi component of the light wave propagating through the optical waveguides 12 and 13. Further, the wavelength spectrum width Δλ diffracted by the reflection grating 15 is determined by equation (2) as a rough approximation.

(発明が解決しようとする課題) 従来の第5図に示した偏光変換形光分波器では、特定の
波長を分離して取出すためには本質的に偏光分離器が必
要であり、構成が非常に複雑となる。また、(1)式に
おいて、等側屈折率nTEi、nTMiはそれぞれ以上
光屈折率n8、常光屈折率nQが関与しており、その差
1ne −nolは、温度に夕;]シて非常に敏感であ
るため常に温度コンI・ロールを必要とするという欠点
がある。
(Problems to be Solved by the Invention) In the conventional polarization conversion type optical demultiplexer shown in FIG. It becomes very complicated. In addition, in equation (1), the isolateral refractive indexes nTEi and nTMi are related to the optical refractive index n8 and the ordinary refractive index nQ, respectively, and the difference 1ne -nol is very sensitive to temperature. Therefore, there is a drawback that a temperature control I/roll is always required.

一方、第6図のブラッグ反射形光分波器を実現するため
には(3)式を満たす周期穴をもつ反則格子を形成する
必要があるが、光導波路基板としてよく用いられるLi
NbO3結晶やGaAs結晶に対しては、通常への値は
波長1.3〜1.5pm付近では1000〜3000A
程度となってしまう製作が非常に困難である。
On the other hand, in order to realize the Bragg reflection type optical demultiplexer shown in Figure 6, it is necessary to form a reciprocal grating with periodic holes that satisfy equation (3).
For NbO3 crystals and GaAs crystals, the normal value is 1000 to 3000 A around the wavelength of 1.3 to 1.5 pm.
It is extremely difficult to manufacture as it will only reach a certain level.

上述の第5図、第6図に示した光分波器以外にも、例え
ば非対称な光方向性結合器の伝搬定数の波長分数を利用
した光分波器が゛′アプライドフイジックスレターズ”
′、第33巻、2号161〜163頁(Appl。
In addition to the optical demultiplexers shown in Figures 5 and 6 above, for example, there are optical demultiplexers that utilize the wavelength fraction of the propagation constant of an asymmetric optical directional coupler.
', Vol. 33, No. 2, pp. 161-163 (Appl.

Phy、 Lett、 、 Vol、 33. No、
2. pp161−163)に報告されているが、この
場合は選択可能な波長スペクトル幅Δλが大きい(数百
穴)という欠点がある。
Phy, Lett, Vol. 33. No,
2. pp. 161-163), but this case has the disadvantage that the selectable wavelength spectrum width Δλ is large (several hundred holes).

本発明の目的は、構成が簡単で、温度に対して安定で製
作が容易でかつ比較的波長スペクトル幅が狭い導波形光
分波器及びその製造方法を提供することにある。
An object of the present invention is to provide a waveguide optical demultiplexer that is simple in structure, stable over temperature, easy to manufacture, and has a relatively narrow wavelength spectrum width, and a method for manufacturing the same.

(課題を解決するための手段) 本発明の導波形光分波器は、基板上に、互いに近接して
並置された、互いに最低次数の導波モードに列する等側
屈折率の差1n1−n21が、5.6X10−3≦」n
□−n2|≦ 1.3である2本の光導波路によって構
成される光方向性結合器と、前記光導波路の少なくとも
一方の近傍に設置され、光透過方向に周期的な等側屈折
率変化を与える格子状パターンとを設置して構成さる。
(Means for Solving the Problems) The waveguide type optical demultiplexer of the present invention is provided with a difference 1n1- in equilateral refractive indexes that are arranged in close proximity to each other on a substrate and aligned with each other in the lowest-order waveguide mode. n21 is 5.6X10-3≦”n
An optical directional coupler constituted by two optical waveguides with □−n2|≦1.3, and a periodic isolateral refractive index change in the light transmission direction, which is installed near at least one of the optical waveguides. It is constructed by installing a grid pattern that gives

さらに本発明によれば光学結晶基板上に、金属拡散によ
って形成する第1の光導波路とイオン交換によって形成
する第2の光導波路とを互いに近接させて光方向性結合
器を構成し、前記第1又は第2の光導波路内または該光
導波路に近接して光透過方向に周期的な格子状パターン
を設置することを特徴とする導波形光分波器の製造方法
が得られ、さらに上記の周期的な格子状パターンを周期
的な金属拡散領域または周期的なイオン交換領域のいず
れかによって構成することを特徴とする導波形光分波器
の製造方法が得られる。また、電気光学効果を有する基
板上に、互いに近接して並置された、互いに最低次数の
導波モードに対する等側屈折率の差Int −n21が
、5゜6×10  こ|n1− n21 < 1.3で
ある2本の光導波路によって構成される光方向性結合器
と、前記光導波路の少なくとも一方の近傍に設置され、
光透過方向に周期的な等側屈折率変化を与える格子状パ
ターンと、前記光方向性結合器に沿って少なくとも一列
の制御電極を設置したことを特長とする導波形光分波器
が得られる。
Furthermore, according to the present invention, an optical directional coupler is constructed by placing a first optical waveguide formed by metal diffusion and a second optical waveguide formed by ion exchange close to each other on an optical crystal substrate; There is obtained a method for manufacturing a waveguide optical demultiplexer, characterized in that a periodic lattice-like pattern is installed in the light transmission direction within the first or second optical waveguide or in the vicinity of the optical waveguide, and further comprises: A method for manufacturing a waveguide optical demultiplexer is obtained, characterized in that the periodic lattice pattern is composed of either periodic metal diffusion regions or periodic ion exchange regions. Further, on the substrate having an electro-optic effect, the difference Int -n21 in the isolateral refractive index of the lowest-order waveguide modes juxtaposed in close proximity to each other is 5°6x10 |n1-n21 < 1 .3, an optical directional coupler configured by two optical waveguides, and installed near at least one of the optical waveguides,
A waveguide optical demultiplexer is obtained, which is characterized by a lattice pattern that provides periodic isolateral refractive index changes in the light transmission direction, and at least one row of control electrodes installed along the optical directional coupler. .

(作用) 本発明の導波形光分波器では等側屈折率n1.n2をも
つ光導波路を近接させて光方向性結合器を構成する。さ
らに次式(4)を満たす同期Aをもつ格子状パターンを
上記光導波路近傍に設置する。
(Function) In the waveguide type optical demultiplexer of the present invention, the isolateral refractive index n1. An optical directional coupler is constructed by placing optical waveguides having n2 in close proximity. Further, a lattice pattern having synchronization A satisfying the following equation (4) is installed near the optical waveguide.

本発明では伝搬定数の大きく異なる2つの光導波路間の
結合を上述の周期Aの格子状パターンを設置することに
よって整合させ、光方向性結合器で上述(4)式を満た
すλiの波長のみを他の光導波路へ結合させるものであ
る。こでは第5図の従来例のように偏光変換を用いるの
ではなく、同一の偏光間の空間的な結合を利用すること
、第6図の従来例のように格子によってブラッグ反射さ
せるのではなく分離された波長成分は入射光と同一の方
向へ(但し、空間的に分離された別の光導波路へ)出力
される点で従来例とは異なっている。
In the present invention, the coupling between two optical waveguides with significantly different propagation constants is matched by installing the above-mentioned lattice pattern with a period A, and the optical directional coupler is used to match only the wavelength of λi that satisfies the above equation (4). It is used for coupling to other optical waveguides. In this case, instead of using polarization conversion as in the conventional example shown in Fig. 5, we use spatial coupling between the same polarized lights, and instead of Bragg reflection by a grating as in the conventional example shown in Fig. 6. This differs from the conventional example in that the separated wavelength components are output in the same direction as the incident light (but to separate spatially separated optical waveguides).

ここで、100A以下の狭い波長スペクトル幅を得たい
場合には、入射波長λiを1.3pm、長さL<30m
mとして(2)式よりA<201pmとなり、(4)よ
りIn1−n21と5.6X10−3 であればよいことがわかる。一方、製作の容易性を考え
るとA>lpmが必要であり、このためには(4)式よ
り 1nx−n21と1.3 となることが要求される。
Here, if you want to obtain a narrow wavelength spectrum width of 100 A or less, set the incident wavelength λi to 1.3 pm and the length L<30 m.
Assuming m, from equation (2), A<201 pm, and from (4), it can be seen that In1-n21 and 5.6X10-3 are sufficient. On the other hand, considering ease of manufacture, it is necessary that A>lpm, and for this purpose, 1nx-n21 and 1.3 are required from equation (4).

このように異なる等側屈折率をもつ2本の導波路は、異
なった作成方法で作ることにより得られるし、また、別
々の材料で構成してもできる。但し、2つの光導波路を
同じ手段を用いて形成した場合、例えばTi拡散法のみ
またはイオン交換法のみを用いて光導波路断面形状のみ
を異ならしめるように形成した場合には、通常上記(4
)式の1n1− n21の値は10−3オ一ダ程度の小
さな値になってしまい、スペクトル幅Δλは、通常製作
の容易なLの値(1〜30mm程度)では100Aとな
ってしまい狭いΔλの値は得られない。
The two waveguides having different equilateral refractive indices can be obtained by using different manufacturing methods, or can be made of different materials. However, when two optical waveguides are formed using the same means, for example, when they are formed using only the Ti diffusion method or only the ion exchange method so that only the cross-sectional shapes of the optical waveguides are different, the above (4)
) The value of 1n1-n21 in the equation becomes a small value of about 10-3 orders of magnitude, and the spectral width Δλ is 100A for a value of L that is usually easy to manufacture (about 1 to 30 mm), which is narrow. The value of Δλ is not available.

本発明の製造方法では、2つの光導波路を全く異なる方
法、例えばTi拡散法とイオン交換法でそれぞれ作成す
ることによりnlとn2の値は一般に大きく異なりAの
値は数〜数+11m、Δλの値として数〜数十穴を得て
いる。
In the manufacturing method of the present invention, the two optical waveguides are created using completely different methods, for example, the Ti diffusion method and the ion exchange method, so that the values of nl and n2 are generally very different, and the value of A is from several to several + 11 m, and the value of Δλ is We are getting several to dozens of holes as a value.

(実施例) 第1図は本発明による導波形光分波器の一実施例を示す
斜視図である。
(Embodiment) FIG. 1 is a perspective view showing an embodiment of a waveguide optical demultiplexer according to the present invention.

LiNbO3結晶基板21上にTi拡散法によって形成
された第1の光導波路22とプロトンイオン交換によっ
て形成された第2の光導波路23が形成され、基板中央
部でそれらが互いに数pmまで近接して光方向性結合器
24を構成している。また光方向性結合器24の上部に
は酸化ニオブ膜等の誘電体膜によって格子状パターン2
5が形成されている。ここで光導波路22の屈折率はT
i拡散により基板よす10−2程度大きくなっており、
その等価屈折率はn1=ns十Δn1(但し、n8はL
iNbO3結晶基板21の屈折率、Δn1=5X10 
”)となっている。また、光導波路23の屈折率は、プ
ロトン交換により10−1程度基板より大きく、その等
価屈折率はn2=n8+Δn2(但し、Δn2=5.5
X10 ”)となっている。格子状パターン25の周期
Aは(4)式を満たずように26pmとなっている。ま
た格子状パターン25の長さLは20mmとすると(2
)式より得られる波長スペクトル幅はλi=1.3pm
に対し、Δλ=17Aとなる。
A first optical waveguide 22 formed by Ti diffusion method and a second optical waveguide 23 formed by proton ion exchange are formed on a LiNbO3 crystal substrate 21, and they are located close to each other within several pm at the center of the substrate. It constitutes an optical directional coupler 24. In addition, a dielectric film such as a niobium oxide film is formed on the top of the optical directional coupler 24 to form a grid pattern 2.
5 is formed. Here, the refractive index of the optical waveguide 22 is T
Due to i-diffusion, the substrate height has increased by about 10-2,
Its equivalent refractive index is n1=ns+Δn1 (however, n8 is L
Refractive index of iNbO3 crystal substrate 21, Δn1=5X10
”). Furthermore, the refractive index of the optical waveguide 23 is approximately 10-1 larger than the substrate due to proton exchange, and its equivalent refractive index is n2=n8+Δn2 (however, Δn2=5.5
X10'').The period A of the grid pattern 25 is set to 26 pm so as not to satisfy equation (4).Also, if the length L of the grid pattern 25 is 20 mm, then (2
) The wavelength spectrum width obtained from the formula is λi = 1.3pm
On the other hand, Δλ=17A.

(11) 本実施例において、屈折率の大きい光導波路23は多モ
ード光導波路となる場合があるが、(4)式が0次モー
ドに対するn2に対して成立するように条件を選べぼ0
次光のみを励起するようにできる。また、光導波路23
を作成する手段としては、やはり大きな屈折率変化が得
られるイオン注入法を用いることができる。さらには、
他の誘電体膜を用いて一方の光導波路のみをLiNbO
3結晶基板21・上に形成することもでき、この場合に
は|n1  n21の値はさらに大きくできる。
(11) In this embodiment, the optical waveguide 23 with a large refractive index may be a multimode optical waveguide, but the conditions must be selected so that equation (4) holds true for n2 for the zero-order mode.
It is possible to excite only the secondary light. In addition, the optical waveguide 23
An ion implantation method can be used as a means for creating the refractive index, which also provides a large change in refractive index. Furthermore,
Only one optical waveguide is made of LiNbO using another dielectric film.
It can also be formed on the tricrystalline substrate 21, in which case the values of |n1 n21 can be made even larger.

また、格子状パターン25を形成する方法としては、L
iNbO3結晶基板21を直接イオンビーム加工等によ
ってエツチングする方法も可能である。
Further, as a method for forming the grid pattern 25, L
A method of directly etching the iNbO3 crystal substrate 21 by ion beam processing or the like is also possible.

LiNbO3結晶基板21の変わりにタンタル酸リチウ
ム、GaAs等の半導体基板を使用することも可能であ
る。特にIII + V族化合物半導体基板を用いる場
合には、光導波路22.23は互いに異なる組成をもた
せるように独立にエビ成長させて形成する等の方法によ
り本発明の光分波器が得られる。
Instead of the LiNbO3 crystal substrate 21, it is also possible to use a semiconductor substrate made of lithium tantalate, GaAs, or the like. In particular, when a III+V group compound semiconductor substrate is used, the optical demultiplexer of the present invention can be obtained by a method such as forming the optical waveguides 22 and 23 by independently growing them so that they have different compositions.

(12) 第2図は、本発明による導波形光分波器の他の実施例を
示す斜視図である。第1図の実施例と同様にLiNbO
3結晶基板21上にTi拡散法による光導波路22とプ
ロトン交換法による光導波路23が形成され光方向性結
合器24を構成している。但し、本実施例においては格
子状パターン30は光導波路23の中にTi拡散法によ
って形成されている。
(12) FIG. 2 is a perspective view showing another embodiment of the waveguide optical demultiplexer according to the present invention. LiNbO as in the embodiment shown in FIG.
An optical waveguide 22 formed by a Ti diffusion method and an optical waveguide 23 formed by a proton exchange method are formed on a tricrystalline substrate 21 to constitute an optical directional coupler 24. However, in this embodiment, the lattice pattern 30 is formed in the optical waveguide 23 by the Ti diffusion method.

本実施例の動作は第1図の例と同様であり、光導波路2
2への入射光26の中の波長λiの成分のみ、光導波路
23へ結合して出射する。
The operation of this embodiment is similar to the example shown in FIG. 1, and the optical waveguide 2
Only the component of wavelength λi in the incident light 26 to the optical waveguide 23 is coupled to the optical waveguide 23 and output.

第3図は本発明による導波形光分波器の製造方法の一実
施例を示す図である。
FIG. 3 is a diagram showing an embodiment of the method for manufacturing a waveguide optical demultiplexer according to the present invention.

第3図は、説明のために導波形光分波器の中の光方向性
結合器部分の一部だけを切り出して示す図(斜視図)で
ある。
FIG. 3 is a diagram (perspective view) showing only a part of the optical directional coupler in the waveguide optical demultiplexer cut out for explanation.

第3図において、先ずLiNbO3結晶基板上にスパッ
タ等によりコーティングした数百AのTi膜をフォトリ
ソグラフィによりパターン化して第1の光導波路パター
ン32と格子状パターン33を形成する(第3図(a)
)。次にその基板を1000〜11000Cの電気炉中
に数時間放置することにより基板中にTiが拡散してT
i拡散光導波路34及びTi拡散格子パターン35が形
成される(第3図(b))。次に第1の光導波路に近接
した格子パターン35を含む領域にプロトン交換法によ
り第2の光導波路36が形成される(第3図(C))。
In FIG. 3, first, a Ti film of several hundred amps coated on a LiNbO3 crystal substrate by sputtering or the like is patterned by photolithography to form a first optical waveguide pattern 32 and a lattice pattern 33 (see FIG. 3(a). )
). Next, by leaving the substrate in an electric furnace at 1000 to 11000C for several hours, Ti diffuses into the substrate and T
An i-diffused optical waveguide 34 and a Ti-diffused grating pattern 35 are formed (FIG. 3(b)). Next, a second optical waveguide 36 is formed in a region including the grating pattern 35 close to the first optical waveguide by a proton exchange method (FIG. 3(C)).

ここで、プロトン交換法の一例としては、第2の光導波
路36の形状の開口を有するTi膜マスクを基板上に設
置し、その基板を200〜250°Cの安息香酸中に数
十分〜数時間浸すことにより光導波路が得られる。
Here, as an example of the proton exchange method, a Ti film mask having an opening in the shape of the second optical waveguide 36 is placed on a substrate, and the substrate is placed in benzoic acid at 200 to 250°C for several tens of minutes. Optical waveguides are obtained by soaking for several hours.

本発明による光分波器の製造方法の他の一例としては、
先ずTi拡散により第1の光導波路のみを形成し、その
後、第2の光導波路パターン及び格子パターンの開口を
もつマスクを用いてプロトン交換を行う方法がある。
Another example of the method for manufacturing an optical demultiplexer according to the present invention is as follows:
There is a method in which only the first optical waveguide is first formed by Ti diffusion, and then proton exchange is performed using a second optical waveguide pattern and a mask having lattice pattern openings.

第4図は本発明の一実施例を示し、電圧により制御可能
な導波形光分配器の斜視図である。
FIG. 4 shows one embodiment of the present invention, and is a perspective view of a waveguide optical splitter that can be controlled by voltage.

第4図において電気光学効果を有するLiNbO3結晶
基板21上に第1図の実施例と同様にTi拡散法による
光導波路22とプロトン交換法による光導波路23が形
成され、光方向性結合器24を構成している。
In FIG. 4, an optical waveguide 22 formed by the Ti diffusion method and an optical waveguide 23 formed by the proton exchange method are formed on a LiNbO3 crystal substrate 21 having an electro-optic effect, as in the embodiment shown in FIG. It consists of

本実施例では格子状パターン40は光方向性結合器24
の光導波路22と23の間にイオン交換法又はTi拡散
法によって形成されている。さらに光方向性結合器24
の光導波路22と23の上部に1対の制御電極41が設
置されている本実施例において、制御電極への印加電圧
がO場合は第1図の実施例と同様に光導波路22への入
射26の(4)式を満たず波長λiの成分が光導波路2
3へ結合するが、制御電極下の屈折率が変化し、その結
果(4)式の|nl  n21の値が変化するので光導
波路23から取り出される波長λiが電圧に応じて変化
する。すなわち、本実施例では制御電極への印加電圧の
大きさによって分離する波長を調整することができる。
In this embodiment, the grid pattern 40 is the optical directional coupler 24.
The optical waveguides 22 and 23 are formed by an ion exchange method or a Ti diffusion method. Further, the optical directional coupler 24
In this embodiment, in which a pair of control electrodes 41 are installed above the optical waveguides 22 and 23, when the voltage applied to the control electrodes is O, the incidence on the optical waveguide 22 is similar to the embodiment shown in FIG. 26 (4) is not satisfied and the component of wavelength λi is in the optical waveguide 2.
However, the refractive index under the control electrode changes, and as a result, the value of |nl n21 in equation (4) changes, so the wavelength λi extracted from the optical waveguide 23 changes in accordance with the voltage. That is, in this embodiment, the wavelength to be separated can be adjusted by the magnitude of the voltage applied to the control electrode.

(発明の効果) 以上述べたように本発明により、溝底が簡単で、温度に
足して安定で、製作が容易でかつ比較的波長スペクトル
幅が狭い導波形光分波器及びその製造方法が得られる。
(Effects of the Invention) As described above, the present invention provides a waveguide optical demultiplexer that has a simple groove bottom, is stable with respect to temperature, is easy to manufacture, and has a relatively narrow wavelength spectrum width, and a method for manufacturing the same. can get.

【図面の簡単な説明】[Brief explanation of drawings]

(15) 第1図、第2図、第4図は本発明による導波形光分派器
の実施例を示す図、第3図は本発明による導波形光分波
器の製造方法の実施例を示す図、第5図、第6図は従来
の導波形光分波器の例を示す図である。図において、1
.11.21.31はニオブ酸リチウム結晶、2.22
.34はTi拡散による光導波路、23.36はイオン
交換による光導波路、25.30.35.40は格子パ
ターン、41は制御電極である。
(15) FIGS. 1, 2, and 4 are diagrams showing an embodiment of a waveguide optical splitter according to the present invention, and FIG. 3 is a diagram showing an embodiment of a method for manufacturing a waveguide optical splitter according to the present invention. 5 and 6 are diagrams showing examples of conventional waveguide type optical demultiplexers. In the figure, 1
.. 11.21.31 is lithium niobate crystal, 2.22
.. 34 is an optical waveguide by Ti diffusion, 23.36 is an ion exchange optical waveguide, 25.30.35.40 is a grating pattern, and 41 is a control electrode.

Claims (4)

【特許請求の範囲】[Claims] (1)基板上に、互いに近接して並置された、互いに最
低次数の導波モードに対する等価屈折率の差|n_1−
n_2|が、5.6×10^−^3≦|n_1−n_2
|≦1.3である2本の光導波路によって構成される光
方向性結合器と、前記光導波路の少なくとも一方の近傍
に設置され、光透過方向に周期的な等価屈折率変化を与
える格子状パターンとを設置したことを特徴とする導波
形光分波器。
(1) Difference in equivalent refractive index for the lowest-order waveguide modes juxtaposed close to each other on the substrate | n_1−
n_2| is 5.6×10^-^3≦|n_1-n_2
|≦1.3; an optical directional coupler configured with two optical waveguides; and a lattice-shaped coupler that is installed near at least one of the optical waveguides and provides a periodic change in equivalent refractive index in the light transmission direction. A waveguide optical demultiplexer characterized by having a pattern.
(2)光学結晶基板上に、金属拡散によって形成する第
1の光導波路とイオン交換によって形成する第2の光導
波路とを互いに近接させて光方向性結合器を構成し、前
記第1又は第2の光導波路内または該光導波路に近接し
て光透過方向に周期的な格子状パターンを設置すること
を特徴とする導波形光分波器の製造方法。
(2) An optical directional coupler is constructed by placing a first optical waveguide formed by metal diffusion and a second optical waveguide formed by ion exchange close to each other on an optical crystal substrate, and A method for manufacturing a waveguide optical demultiplexer, characterized in that a periodic lattice pattern is installed in the light transmission direction within or close to the optical waveguide of No. 2.
(3)周期的な格子状パターンを周期的な金属拡散領域
または周期的なイオン交換領域のいずれかによって構成
することを特徴とする特許請求の範囲第2項記載の導波
形光分波器の製造方法。
(3) The waveguide optical demultiplexer according to claim 2, wherein the periodic lattice pattern is composed of either periodic metal diffusion regions or periodic ion exchange regions. Production method.
(4)電気光学効果を有する基板上に、互いに近接して
並置された、互いに最低次数の導波モードに対する等価
屈折率の差|n_1−n_2|が、5.6×10^−^
3≦|n_1−n_2|≦1.3である2本の光導波路
によって構成される光方向性結合器と、前記光導波路の
少なくとも一方の近傍に設置され、光透過方向に周期的
な等価屈折率変化を与える格子状パターンと、前記光方
向性結合器に沿って少なくとも一対の制御電極を設置し
たことを特徴とする導波形光分波器。
(4) On a substrate having an electro-optic effect, the difference in equivalent refractive index for the lowest-order waveguide modes juxtaposed in close proximity to each other |n_1-n_2| is 5.6×10^-^
3≦|n_1−n_2|≦1.3, and an optical directional coupler that is installed near at least one of the optical waveguides and has periodic equivalent refraction in the light transmission direction. What is claimed is: 1. A waveguide optical demultiplexer, comprising: a grid pattern that provides a rate change; and at least one pair of control electrodes installed along the optical directional coupler.
JP1183047A 1989-07-14 1989-07-14 Waveguide optical demultiplexer and method of manufacturing the same Expired - Fee Related JP3005996B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1183047A JP3005996B2 (en) 1989-07-14 1989-07-14 Waveguide optical demultiplexer and method of manufacturing the same

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Application Number Priority Date Filing Date Title
JP1183047A JP3005996B2 (en) 1989-07-14 1989-07-14 Waveguide optical demultiplexer and method of manufacturing the same

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Publication Number Publication Date
JPH0346603A true JPH0346603A (en) 1991-02-27
JP3005996B2 JP3005996B2 (en) 2000-02-07

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06130237A (en) * 1991-06-20 1994-05-13 Oki Electric Ind Co Ltd Wavelength selection element
EP0729043A3 (en) * 1995-02-24 1997-01-29 At & T Corp Optical tapping filters employing long period gratings
US6226428B1 (en) 1997-07-30 2001-05-01 Nec Corporation Optical multiplexer/demultiplexer with optical waveguides and a diffraction grating
WO2002088838A3 (en) * 2001-04-30 2003-12-31 Raytheon Co Apparatus for separating and/or combining optical signals, and methods of making and operating it
JP2020134619A (en) * 2019-02-15 2020-08-31 沖電気工業株式会社 Optical wavelength filter
EP2879250B1 (en) * 2013-11-27 2022-10-05 OpenLight Photonics, Inc. Multiport photonic device with asymmetric waveguides

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06130237A (en) * 1991-06-20 1994-05-13 Oki Electric Ind Co Ltd Wavelength selection element
EP0729043A3 (en) * 1995-02-24 1997-01-29 At & T Corp Optical tapping filters employing long period gratings
US6226428B1 (en) 1997-07-30 2001-05-01 Nec Corporation Optical multiplexer/demultiplexer with optical waveguides and a diffraction grating
WO2002088838A3 (en) * 2001-04-30 2003-12-31 Raytheon Co Apparatus for separating and/or combining optical signals, and methods of making and operating it
CN1308714C (en) * 2001-04-30 2007-04-04 雷斯昂公司 Devices for separating and/or combining optical signals
KR100737048B1 (en) * 2001-04-30 2007-07-09 레이던 컴퍼니 Devices for separating and / or combining optical signals
EP2879250B1 (en) * 2013-11-27 2022-10-05 OpenLight Photonics, Inc. Multiport photonic device with asymmetric waveguides
JP2020134619A (en) * 2019-02-15 2020-08-31 沖電気工業株式会社 Optical wavelength filter

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