JPH0349932A - Adhering method of copper to resin - Google Patents
Adhering method of copper to resinInfo
- Publication number
- JPH0349932A JPH0349932A JP1184643A JP18464389A JPH0349932A JP H0349932 A JPH0349932 A JP H0349932A JP 1184643 A JP1184643 A JP 1184643A JP 18464389 A JP18464389 A JP 18464389A JP H0349932 A JPH0349932 A JP H0349932A
- Authority
- JP
- Japan
- Prior art keywords
- copper
- resin
- acid
- layer
- copper oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C66/00—General aspects of processes or apparatus for joining preformed parts
- B29C66/70—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material
- B29C66/71—General aspects of processes or apparatus for joining preformed parts characterised by the composition, physical properties or the structure of the material of the parts to be joined; Joining with non-plastics material characterised by the composition of the plastics material of the parts to be joined
Landscapes
- Lining Or Joining Of Plastics Or The Like (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は接着力と耐酸性とを両立させる銅と樹脂との接
着方法に係り、特に銅回路層と樹脂層を積層接着して作
成する多層印刷配線板の製造に好適な銅と樹脂の接着方
法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method of adhering copper and resin that achieves both adhesive strength and acid resistance, and particularly relates to a method of adhering copper and resin, which is created by laminating and adhering a copper circuit layer and a resin layer. The present invention relates to a method for adhering copper and resin suitable for manufacturing multilayer printed wiring boards.
従来、銅と樹脂の接着に際しては、接着力を向上させる
ため銅表面に銅酸化物層を形成する方法が知られていた
。この方法は微細な凹凸が形成されて機械的投錨効果に
よる接着力向上には有効であった。しかし、一般に銅の
酸化物層は、酸と接触すると加水分解により溶解してし
まうため、処理後接着までの間に酸との接触を避ける必
要があった。また接着後においても、酸処理を行う場合
接着面を貫通する穴の内面や切断面端部に露出した接着
界面の酸化物層が失なわれるという好ましくない現象の
起こる問題がある。この耐酸の問題を解決する方法とし
て、特公昭64−11479号公報ではアルカリ性還元
溶液で酸化第2銅を金属銅にした旨の記載がある。Conventionally, when adhering copper and resin, a method has been known in which a copper oxide layer is formed on the copper surface in order to improve the adhesion force. This method was effective in improving adhesive strength due to the formation of fine irregularities and a mechanical anchoring effect. However, since the copper oxide layer generally dissolves due to hydrolysis when it comes into contact with acid, it is necessary to avoid contact with acid after treatment and before adhesion. Further, even after bonding, when acid treatment is performed, there is a problem in that an undesirable phenomenon occurs in that the oxide layer at the bonding interface exposed at the inner surface of the hole penetrating the bonding surface or at the end of the cut surface is lost. As a method for solving this acid resistance problem, Japanese Patent Publication No. 11479/1983 describes that cupric oxide is converted into metallic copper using an alkaline reducing solution.
上記従来技術においては、酸化第2銅被膜をアルカリ性
還元剤溶液を使用して還元しているが、このアルカリ性
の溶液は、浸漬後の洗浄が困難であり、樹脂を侵かしや
すいという問題がある。In the above conventional technology, the cupric oxide coating is reduced using an alkaline reducing agent solution, but this alkaline solution has the problem of being difficult to clean after immersion and easily corroding the resin. be.
本発明の目的は、耐酸性が良好で、かつ十分高い接着力
を与える銅と樹脂の接着方法を提供することにあり、特
に、高い信頼性が要求される多層印刷配線板の積層接着
に好適な、樹脂との接着方法を提供することにある。An object of the present invention is to provide a method for adhering copper and resin that has good acid resistance and sufficiently high adhesion strength, and is particularly suitable for lamination adhesion of multilayer printed wiring boards that require high reliability. Another object of the present invention is to provide a method for bonding with resin.
上記目的を達成するために、銅と樹脂とを加熱圧着にて
接着する方法において、銅表面に銅酸化物層を形成する
工程と、該形成された銅酸化物層をPH7,0以下の酸
性還元溶液によって金属銅に還元する工程とを設けたも
のである。In order to achieve the above object, the method of bonding copper and resin by heat compression bonding includes a step of forming a copper oxide layer on the copper surface, and an acidic solution having a pH of 7.0 or less. This method includes a step of reducing copper to metal using a reducing solution.
種々検討を行った結果、銅表面に一旦銅酸化物層を形成
した後、この銅酸化物層を溶解しない酸性還元溶液を用
いて、金属銅に還元することにより、良好な耐酸性と接
着力を実現できることを見いだした。また、酸性還元溶
液を用いるため浸漬後の水洗浄効果が優れており、樹脂
層を侵さないことが認められた。銅酸化物層を形成する
方法としては、酸化剤を含む水溶液を用いるのが良い。As a result of various studies, we have found that by forming a copper oxide layer on the copper surface and then reducing it to metallic copper using an acidic reducing solution that does not dissolve the copper oxide layer, we have achieved good acid resistance and adhesive strength. We discovered that it is possible to achieve this. Furthermore, since an acidic reducing solution was used, the water washing effect after immersion was excellent, and it was confirmed that the resin layer was not attacked. As a method for forming the copper oxide layer, it is preferable to use an aqueous solution containing an oxidizing agent.
形成した銅酸化物層を金属に還元するには一般式%式%
CH,)で表わされるアミンボラン類の少なくとも一種
類とホウ素系薬品を混合した酸性溶液を用いて行うのが
良い。In order to reduce the formed copper oxide layer to metal, it is preferable to use an acidic solution containing a mixture of at least one type of amine borane represented by the general formula % CH, and a boron-based chemical.
以下、多層印刷配線板の積層接着を例にとって本発明を
説明する。Hereinafter, the present invention will be explained by taking lamination adhesion of a multilayer printed wiring board as an example.
1)ガラス布入りポリイミド樹脂銅張積層板の銅表面を
、
CuCl2.・2H,050)/Q
HcQ (36%) 500)/Q湿温度
40℃
の水溶液に1分間浸漬してエツチングを行った。1) The copper surface of the glass cloth-containing polyimide resin copper-clad laminate was coated with CuCl2.・2H,050)/Q HcQ (36%) 500)/Q humidity temperature
Etching was performed by immersing it in an aqueous solution at 40°C for 1 minute.
2)次に水洗を行った後
NαCQO□ 30 ?IQN cL3PO
,・12H,05t/QNcLOH10tIQ
温度 75℃
の水溶液に2分間浸漬し、銅酸化物層を形成した。2) Next, after washing with water, NαCQO□ 30? IQN cL3PO
, ·12H,05t/QNcLOH10tIQ It was immersed in an aqueous solution at a temperature of 75°C for 2 minutes to form a copper oxide layer.
3)次に水洗を行った後 ジメチルアミンボラン 62/Q ホウ酸 10p/QPH6,01 温度 45℃ の水溶液で2分間処理した後酸化物層を還元した。3) After washing with water Dimethylamine borane 62/Q Boric acid 10p/QPH6,01 Temperature 45℃ After treatment with an aqueous solution of for 2 minutes, the oxide layer was reduced.
4)以上のように処理した銅張積層板を水洗し、乾燥し
た後、ガラス布にポリイミド樹脂を含浸させたプリプレ
グを介して積層し、170”Cで、20kgf/a+f
の圧力を90分間かけて接着した。4) After washing the copper-clad laminates treated as above and drying them, they were laminated through a prepreg made of glass cloth impregnated with polyimide resin, and heated to 20 kgf/a+f at 170"C.
The adhesive was applied for 90 minutes.
このようにして積層接着した銅箔とプリプレグのポリイ
ミド樹脂との接着は良好で、ビール強度は1.2kgf
/amであった。The adhesion between the copper foil laminated and bonded in this way and the polyimide resin of the prepreg is good, and the beer strength is 1.2 kgf.
/am.
また積層接着に先立って、還元処理後の銅張積層板を1
:1の塩酸に浸漬しても1表面処理層の変色、溶解は見
られなかった。更に多層化接着後、貫通スルホールをあ
け、1:1の塩酸に浸漬したが、3時間以上浸漬しても
、スルホール壁からの酸のしみ込みや、接着層の変色は
見られなかった。In addition, prior to lamination bonding, the copper clad laminate after reduction treatment is
: Even when immersed in hydrochloric acid of 1, no discoloration or dissolution of the 1 surface treatment layer was observed. Furthermore, after multilayer adhesion, through-holes were opened and immersed in 1:1 hydrochloric acid, but no acid seepage through the through-hole walls or discoloration of the adhesive layer was observed even after immersion for more than 3 hours.
また還元溶液が酸性であるため処理後の水洗効果が優れ
ており清浄な表面が容易に得られ作業性が良好である。Furthermore, since the reducing solution is acidic, the water washing effect after treatment is excellent, a clean surface can be easily obtained, and workability is good.
また銅張積層板の樹脂層を侵さないことが誌められた。It was also noted that it did not attack the resin layer of copper-clad laminates.
以上述べたように、本発明によれば、接着前後における
耐酸性の問題を避けて良好な接着を行うことができる。As described above, according to the present invention, it is possible to perform good adhesion while avoiding the problem of acid resistance before and after adhesion.
また銅表面の洗浄効果が優れており作業性が良く、樹脂
層を侵かさない効果がある。In addition, it has an excellent cleaning effect on the copper surface, has good workability, and has the effect of not corroding the resin layer.
Claims (1)
銅表面に銅酸化物層を形成する工程と、該形成された銅
酸化物層をPH7.0以下の酸性還元溶液によって金属
銅に還元する工程とを含むことを特徴とする銅と樹脂の
接着方法。1. In the method of bonding copper and resin by heat compression bonding,
Adhesion of copper and resin, comprising a step of forming a copper oxide layer on a copper surface, and a step of reducing the formed copper oxide layer to metallic copper with an acidic reducing solution having a pH of 7.0 or less. Method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1184643A JP2656622B2 (en) | 1989-07-19 | 1989-07-19 | Bonding method between copper and resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1184643A JP2656622B2 (en) | 1989-07-19 | 1989-07-19 | Bonding method between copper and resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0349932A true JPH0349932A (en) | 1991-03-04 |
| JP2656622B2 JP2656622B2 (en) | 1997-09-24 |
Family
ID=16156823
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1184643A Expired - Fee Related JP2656622B2 (en) | 1989-07-19 | 1989-07-19 | Bonding method between copper and resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2656622B2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03129793A (en) * | 1989-10-14 | 1991-06-03 | Matsushita Electric Works Ltd | Treating method for circuit board substrate |
| WO1995027808A1 (en) * | 1994-04-11 | 1995-10-19 | Electrochemicals, Inc. | Method for treating an oxidized copper film |
| JP2008088543A (en) * | 2006-09-08 | 2008-04-17 | Hitachi Chem Co Ltd | Copper surface treatment liquid set, copper surface treatment method using the same, copper, wiring board, and semiconductor package |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20070111549A (en) | 2005-03-11 | 2007-11-21 | 히다치 가세고교 가부시끼가이샤 | Copper surface treatment method and copper |
| KR101268145B1 (en) | 2008-10-27 | 2013-05-27 | 히타치가세이가부시끼가이샤 | Method for surface treatment of copper and copper |
| US10522444B2 (en) | 2013-03-11 | 2019-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Surface treatment method and apparatus for semiconductor packaging |
-
1989
- 1989-07-19 JP JP1184643A patent/JP2656622B2/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03129793A (en) * | 1989-10-14 | 1991-06-03 | Matsushita Electric Works Ltd | Treating method for circuit board substrate |
| WO1995027808A1 (en) * | 1994-04-11 | 1995-10-19 | Electrochemicals, Inc. | Method for treating an oxidized copper film |
| JP2008088543A (en) * | 2006-09-08 | 2008-04-17 | Hitachi Chem Co Ltd | Copper surface treatment liquid set, copper surface treatment method using the same, copper, wiring board, and semiconductor package |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2656622B2 (en) | 1997-09-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |