JPH0351738Y2 - - Google Patents

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Publication number
JPH0351738Y2
JPH0351738Y2 JP1985198671U JP19867185U JPH0351738Y2 JP H0351738 Y2 JPH0351738 Y2 JP H0351738Y2 JP 1985198671 U JP1985198671 U JP 1985198671U JP 19867185 U JP19867185 U JP 19867185U JP H0351738 Y2 JPH0351738 Y2 JP H0351738Y2
Authority
JP
Japan
Prior art keywords
sample
reference material
heat
holes
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1985198671U
Other languages
Japanese (ja)
Other versions
JPS62115155U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985198671U priority Critical patent/JPH0351738Y2/ja
Publication of JPS62115155U publication Critical patent/JPS62115155U/ja
Application granted granted Critical
Publication of JPH0351738Y2 publication Critical patent/JPH0351738Y2/ja
Expired legal-status Critical Current

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  • Investigating Or Analyzing Materials Using Thermal Means (AREA)

Description

【考案の詳細な説明】 (産業上の利用分野) 本考案は、試料と基準物質を同一温度で上昇さ
せるための機構に特徴を有する示差熱分析装置に
関する。
[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a differential thermal analysis device characterized by a mechanism for raising a sample and a reference material at the same temperature.

(従来技術) 示差熱分析装置は、巻線型抵抗炉や赤外線ラン
プ等を用いて試料と基準物質を一定の速度で加熱
昇温させるように構成されているが、さらに試料
と基準物質を同一温度で昇温させるため、熱源と
これらとの間に均熱板を配設し、均熱板を回転さ
せることによつてその肉厚の違いや偏心量等から
内部の温度分布を変化させたり、あるいは赤外線
ランプの位置をズラすなどして、試料と基準物質
の位置する部分が同じ温度分布をなすように調整
している。
(Prior art) A differential thermal analyzer is configured to heat the sample and reference material at a constant rate using a wire-wound resistance furnace, an infrared lamp, etc., but it also heats the sample and reference material at the same temperature. In order to raise the temperature, a heat equalizing plate is placed between the heat source and these, and by rotating the heat equalizing plate, the internal temperature distribution can be changed based on the difference in wall thickness and amount of eccentricity. Alternatively, the position of the infrared lamp may be shifted so that the sample and reference material areas have the same temperature distribution.

ところが、使用温度が1500℃から2000℃程度の
超高温用の示差熱分析装置になると均熱板にセラ
ミツク材を使用することができず、より高温の耐
熱材であるタングステンやモリブデンあるいは結
晶性のセラミツクを使用しなければならなくなる
が、これらの素材を用いた均熱板は炉の温度分布
に似た温度となるため、これを回転させても肉厚
の違いによつて温度差をなくすことができず、ま
た、均熱板を偏心させても超高温のもとでは輻射
効果が大きいため、試料と基準物質の温度分布を
変えることができないといつた問題を有する。
However, when it comes to ultra-high temperature differential thermal analyzers with operating temperatures of around 1500°C to 2000°C, ceramic materials cannot be used for the heat equalizing plate, and higher temperature heat-resistant materials such as tungsten, molybdenum, or crystalline materials are used. Ceramics will have to be used, but the temperature distribution of heat equalizing plates made of these materials will be similar to the temperature distribution of the furnace, so even if the plate is rotated, the difference in wall thickness will eliminate the temperature difference. Furthermore, even if the heating plate is eccentric, the radiation effect is large at extremely high temperatures, so the temperature distribution between the sample and the reference material cannot be changed.

(目的) 本考案はかかる問題に鑑みてなされたもので、
その目的とするところは、超高温領域でも試料と
基準物質を効果的に均熱化させることのできる構
造簡単な装置を提供することにある。
(Purpose) This invention was made in view of the above problems.
The purpose is to provide a device with a simple structure that can effectively equalize the temperature of a sample and a reference material even in an ultra-high temperature range.

(目的を達成するための手段) すなわち本考案はかかる目的を達成するため
に、筒状をなす加熱源の内方に、基準物質と試料
を囲繞するようにして円筒状の均熱部材を回動可
能に配設するとともに、該均熱部材の相対向する
面に、表面積を異ならしめる多数の通孔を設けた
示差熱分析装置にある。
(Means for achieving the object) In other words, in order to achieve the object, the present invention rotates a cylindrical heat-uniforming member inside a cylindrical heating source so as to surround the reference material and the sample. The differential thermal analyzer is movably disposed and has a number of through holes having different surface areas on opposing surfaces of the heat equalizing member.

(実施例) そこで以下に本考案の詳細を図示した実施例に
基づいて説明する。
(Example) The details of the present invention will be explained below based on the illustrated example.

図面は本考案の一実施例を示したもので、図中
符号1は、超高温領域で耐熱性を有する例えばタ
ングステンやモリブデンあるいは結晶性のセラミ
ツク等の素材によつて形成された円筒状の均熱板
で、この均熱板1は、試料S及び基準物質Rを収
容した各試料容器4S,4Rを囲繞するようにし
て、これらとヒータ5との間に回動調整可能に配
設されており、さらにこの均熱板1の表面には、
互いに180°の間隔をおいて一方には孔径の小さな
多数の孔2…が対側には孔径の大きな多数の孔3
…が等しいピツチ間隔のもとに穿たれていて、部
分的に異なる均熱板1の表面積により試料Sもし
くは基準物質Rへ放射するエネルギ量に変化を持
たせるように構成されている。
The drawing shows one embodiment of the present invention, and reference numeral 1 in the drawing indicates a cylindrical, uniform material made of a material that is heat resistant in an ultra-high temperature range, such as tungsten, molybdenum, or crystalline ceramic. This heat soaking plate 1 is a hot plate, and is rotatably arranged between the sample containers 4S and 4R containing the sample S and the reference material R so as to surround them and the heater 5. Furthermore, on the surface of this heating plate 1,
A large number of holes 2 with a small hole diameter are formed on one side at an interval of 180° from each other, and a large number of holes 3 with a large hole diameter are formed on the other side.
... are bored at equal pitch intervals, and the amount of energy radiated to the sample S or the reference material R is varied depending on the surface area of the heat-uniforming plate 1 which is partially different.

なお図中符号6は、基準物質側TRと試料側
TSで基準物質Rと試料Sとの温度差を、基準物
質側TRと冷温側Oで基準物質Rの温度を、また
試料側TSと冷温側Oで試料Sの温度をそれぞれ
測定できるようにされた熱電対を示している。
In addition, the symbol 6 in the figure indicates the reference material side TR and the sample side.
It is possible to measure the temperature difference between the reference material R and the sample S on the TS, the temperature of the reference material R on the reference material side TR and the cold side O, and the temperature of the sample S on the sample side TS and the cold side O. A thermocouple is shown.

このように構成された装置において、ヒータ5
の中心部に配置された基準物質Rと試料Sには、
ヒータ5からの輻射熱が均熱板1を経て主に均熱
板1からの輻射熱として伝わることになる。そし
てこの場合、均熱板1から基準物質R及び試料S
に向けて放出される輻射エネルギは、均熱板1内
面の黒度が等しく、かつ均熱板1から基準物質R
及び試料Sまでの距離が等しいとした場合、その
表面積の大きい部分、換言すれば径の小さな孔2
…を穿つた表面部分ほど多いことになる。
In the device configured in this way, the heater 5
The reference material R and sample S placed in the center of
The radiant heat from the heater 5 passes through the heat equalizing plate 1 and is transmitted mainly as radiant heat from the heat equalizing plate 1. In this case, from the soaking plate 1 to the reference material R and the sample S
The radiant energy emitted towards the reference material R from the heating plate 1 is
and the distance to the sample S is the same, the part with a large surface area, in other words, the hole 2 with a small diameter
The more holes there are on the surface, the more holes there are.

したがつて、いま炉の温度分布が基準物質R側
で低く、試料S側で高い場合には、図に示したよ
うに径の小さな孔2…を穿つた表面部分が基準物
質R側に位置するように均熱板1を回転させれ
ば、基準物質R側には試料S側より大きな輻射熱
が伝えられて、両者を均一温度に調節することが
できる。
Therefore, if the temperature distribution in the furnace is low on the reference material R side and high on the sample S side, the surface portion where the small-diameter holes 2 are bored will be located on the reference material R side as shown in the figure. By rotating the heat-uniforming plate 1 in this manner, greater radiant heat is transmitted to the reference material R side than to the sample S side, making it possible to adjust the temperature of both to a uniform temperature.

なお上述した実施例では、均熱板1の相対向す
る面に小径の孔2…と大径の孔3…を等間隔に設
けたものであるが、対向する各面にピツチを異に
して同径の孔を設けてもよく、また、孔の代わり
に巾を異にしたスリツトあるいはピツチ間隔を異
にしたスリツトを設けて、各面の表面積を変える
ようにすることもできる。
In the above-described embodiment, the small diameter holes 2 and the large diameter holes 3 are provided at equal intervals on the opposing surfaces of the heat soaking plate 1, but the holes 2 and 3 are provided at different pitches on each opposing surface. Holes of the same diameter may be provided, or instead of holes, slits with different widths or slits with different pitch intervals may be provided to vary the surface area of each side.

(効果) 以上、説明したように本願考案においては筒状
をなす加熱源の内方に、基準物質と試料を囲繞す
るようにして円筒状の均熱部材を回動可能に配設
するとともに、この均熱部材の相対向する面に開
口面積を異ならしめた多数の通孔を設けたので、
均熱部材の各部分に表面積の違いによる放射エネ
ルギの明確な差を生じさせて1500及至2000℃とい
う高温領域でも確実な均熱効果を得ることができ
る。
(Effects) As explained above, in the present invention, a cylindrical heat-uniforming member is rotatably disposed inside the cylindrical heating source so as to surround the reference material and the sample, and By providing a large number of holes with different opening areas on the opposing surfaces of this heat equalizing member,
By creating clear differences in radiant energy due to differences in surface area in each part of the heat equalizing member, a reliable heat equalizing effect can be obtained even in the high temperature range of 1500 to 2000 degrees Celsius.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案の一実施例を示す装置の斜視図で
ある。 1……均熱板、2……小径の孔、3……大径の
孔、4……試料容器、5……ヒータ。
The drawing is a perspective view of an apparatus showing an embodiment of the present invention. 1... Heat soaking plate, 2... Small diameter hole, 3... Large diameter hole, 4... Sample container, 5... Heater.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 筒状をなす加熱源の内方に、基準物質と試料を
囲繞するようにして円筒状の均熱部材を回動可能
に配設するとともに、前記均熱部材の相対向する
面に開口面積を異ならしめた多数の通孔を設けた
ことを特徴とする示差熱分析装置。
A cylindrical heat equalizing member is rotatably disposed inside the cylindrical heating source so as to surround the reference material and the sample, and an opening area is provided on opposing surfaces of the heat equalizing member. A differential thermal analysis device characterized by having a large number of different through holes.
JP1985198671U 1985-12-23 1985-12-23 Expired JPH0351738Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985198671U JPH0351738Y2 (en) 1985-12-23 1985-12-23

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985198671U JPH0351738Y2 (en) 1985-12-23 1985-12-23

Publications (2)

Publication Number Publication Date
JPS62115155U JPS62115155U (en) 1987-07-22
JPH0351738Y2 true JPH0351738Y2 (en) 1991-11-07

Family

ID=31159574

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985198671U Expired JPH0351738Y2 (en) 1985-12-23 1985-12-23

Country Status (1)

Country Link
JP (1) JPH0351738Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2710852B2 (en) * 1990-03-28 1998-02-10 ホーヤ株式会社 Apparatus and method for manufacturing glass molded body

Also Published As

Publication number Publication date
JPS62115155U (en) 1987-07-22

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