JPH0352130B2 - - Google Patents
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- Publication number
- JPH0352130B2 JPH0352130B2 JP21346685A JP21346685A JPH0352130B2 JP H0352130 B2 JPH0352130 B2 JP H0352130B2 JP 21346685 A JP21346685 A JP 21346685A JP 21346685 A JP21346685 A JP 21346685A JP H0352130 B2 JPH0352130 B2 JP H0352130B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- magnetic
- glass
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 53
- 239000010408 film Substances 0.000 claims description 33
- 239000011521 glass Substances 0.000 claims description 30
- 239000010409 thin film Substances 0.000 claims description 17
- 230000003746 surface roughness Effects 0.000 claims description 11
- 238000005342 ion exchange Methods 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 238000005498 polishing Methods 0.000 claims description 8
- 238000000034 method Methods 0.000 description 12
- 230000007547 defect Effects 0.000 description 9
- 239000005361 soda-lime glass Substances 0.000 description 9
- 229910000838 Al alloy Inorganic materials 0.000 description 6
- 239000011651 chromium Substances 0.000 description 6
- 239000005354 aluminosilicate glass Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910020630 Co Ni Inorganic materials 0.000 description 3
- 229910002440 Co–Ni Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 3
- 229910000420 cerium oxide Inorganic materials 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 3
- 238000007517 polishing process Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910000765 intermetallic Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- -1 Co alone Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、磁気デイスク装置に使用される磁気
記録媒体の製造方法、特に、ガラス基板上に磁性
膜を被着した磁気記録媒体の製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing a magnetic recording medium used in a magnetic disk device, particularly a method for manufacturing a magnetic recording medium in which a magnetic film is coated on a glass substrate. Regarding.
近年、磁気記録媒体の高密度記録化の要請によ
り、金属磁性薄膜を磁性膜とする連続薄膜形の磁
気記録媒体が注目を集めている。この金属磁性膜
としては、スパツタリング法等により被着された
Co、又はCo−Ni、Co−Ni−Ｐ、Co−Ｐなどの
Co合金系の金属薄膜が知られ、その磁性特性を
改善するために、磁気記録媒体用基板と磁性膜と
の間に下地層としてCr膜を介在したものも知ら
れている。
In recent years, due to the demand for high-density recording in magnetic recording media, continuous thin film magnetic recording media in which the magnetic film is a metal magnetic thin film have been attracting attention. This metal magnetic film is deposited by sputtering method etc.
Co, or Co-Ni, Co-Ni-P, Co-P, etc.
Co alloy-based metal thin films are known, and in order to improve their magnetic properties, films in which a Cr film is interposed as an underlayer between the magnetic recording medium substrate and the magnetic film are also known.
一方、磁気記録媒体用基板としては、従来主と
してアルミニウム合金基板が使用されていたが、
高密度記録化の要請に伴い、アルミニウム合金基
板の加工精度の向上が望まれ、更に、アルミニウ
ム合金特有の金属間化合物による表面欠陥（突起
やピツト等）が問題になり、アルミニウム合金基
板に代わるものとしてガラス基板が注目されつゝ
ある。 On the other hand, aluminum alloy substrates have traditionally been mainly used as substrates for magnetic recording media;
With the demand for high-density recording, it is desired to improve the processing accuracy of aluminum alloy substrates.Furthermore, surface defects (protrusions, pits, etc.) caused by intermetallic compounds unique to aluminum alloys have become a problem. Glass substrates are attracting attention as
一方、低温型イオン交換は、転移温度を越えな
い温度域でガラスを、そのガラス中に含まれてい
るアルカリより大きいイオン半径を有するアルカ
リの溶融塩と接触させて、例えばNa+（ガラス）
K+（溶融塩）置換、Li+（ガラス）Na+（溶融
塩）置換を起こさせることにより、ガラスを強化
させる手段として知られている。 On the other hand, in low-temperature ion exchange, glass is brought into contact with a molten salt of an alkali having a larger ionic radius than the alkali contained in the glass at a temperature that does not exceed the transition temperature.
It is known as a means to strengthen glass by causing K + (molten salt) substitution and Li + (glass) Na + (molten salt) substitution.
磁気記録媒体と磁気ヘツドとの距離、いわゆる
ヘツド浮上高さは、高密度記録化の要請により微
小化傾向にあり、現在でも1000Å以下であり、磁
気記録媒体用基板の表面粗さRnax（最大高さ）に
対しては上記ヘツド浮上高さの20％以下、すなわ
ち200Å以下まで要求されている。
The distance between the magnetic recording medium and the magnetic head, the so-called head flying height, is becoming smaller due to the demand for higher-density recording, and is still less than 1000 Å, and the surface roughness of the magnetic recording medium substrate R nax (maximum The height) is required to be 20% or less of the flying height of the head, that is, 200 Å or less.
しかしながら、アルミニウム合金基板は、通常
の研摩方法ではその表面粗さRnax200Å程度が限
界であり、上記要求に対して応えることができな
い。また、前述のアルミニウム合金特有の金属間
化合物による表面欠陥（突起やピツト等）が磁気
記録媒体の回転駆動時におけるエラーの原因であ
ると考えられ、それらの欠陥を少なくする改善が
なされたが、それでもなお、基板表面には欠陥が
残るという問題点があり、このような表面欠陥が
発生しない基板が要求されている。 However, the surface roughness R nax of aluminum alloy substrates is limited to about 200 Å by ordinary polishing methods, and cannot meet the above requirements. In addition, surface defects (protrusions, pits, etc.) caused by the intermetallic compounds specific to aluminum alloys mentioned above are thought to be the cause of errors during rotational driving of magnetic recording media, and improvements have been made to reduce these defects. However, there is still a problem that defects remain on the surface of the substrate, and there is a need for a substrate that does not have such surface defects.
一方、ガラス基板は、上記要求に対して充分応
えることができるが、ガラス基板と磁性膜（又は
下地層）との間の付着力が充分でないために、膜
がはがれやすい問題点があつた。 On the other hand, although glass substrates can fully meet the above requirements, there is a problem in that the film tends to peel off because the adhesion between the glass substrate and the magnetic film (or underlayer) is not sufficient.
本発明は、このような問題点を解決するために
なされたもので、第１の目的は、突起やピツトと
いつた表面欠陥のない基板に磁性膜を含む薄膜を
被着した磁気記録媒体を得ること、第２の目的
は、表面粗さの小さい基板に磁性膜を含む薄膜を
被着した磁気記録媒体を得ること、第３の目的
は、基板への膜の付着力を改善した磁気記録媒体
を得ることである。 The present invention was made to solve these problems, and its first purpose is to create a magnetic recording medium in which a thin film containing a magnetic film is coated on a substrate free of surface defects such as protrusions and pits. The second objective is to obtain a magnetic recording medium in which a thin film containing a magnetic film is adhered to a substrate with small surface roughness, and the third objective is to obtain a magnetic recording medium with improved adhesion of the film to the substrate. It's about getting the medium.
そこで、従来の磁気記録媒体用基板におけるア
ルミニウム合金の欠点とガラス基板の問題点を解
消するために鋭意研究した結果、先ず、基板表面
上の突起やピツト状の微小欠陥を除去し、ヘツド
浮上高さを1000Å以下にするとの要求に対して、
磁気記録媒体用基板をガラス基板に選定し、この
ガラス基板の主表面を表面粗さRnax200Å以下に
研摩することにより、充分に応えられることを見
い出した。そして、低温型イオン交換処理するこ
とにより、単にガラスを強化するだけでなく、ガ
ラス基板とその上の薄膜との付着力を増大させる
ことができるとの知見に基づき、前述した研摩後
のガラス基板を低温型イオン交換処理し、次にそ
のガラス基板の主表面に磁性膜を含む薄膜を被着
することを特徴とする本発明の磁気記録媒体の製
造方法を完成するに到達した。
Therefore, as a result of intensive research to solve the drawbacks of aluminum alloy and the problems of glass substrates in conventional magnetic recording media substrates, we first removed microscopic defects such as protrusions and pits on the substrate surface and increased the flying height of the head. In response to the request to reduce the thickness to 1000Å or less,
It has been found that by selecting a glass substrate as the substrate for a magnetic recording medium and polishing the main surface of this glass substrate to a surface roughness R nax of 200 Å or less, the present invention can be satisfactorily met. Based on the knowledge that low-temperature ion exchange treatment not only strengthens the glass but also increases the adhesion between the glass substrate and the thin film on it, we applied the above-mentioned glass substrate after polishing. We have completed a method for producing a magnetic recording medium according to the present invention, which comprises subjecting a glass substrate to a low-temperature ion exchange treatment and then depositing a thin film containing a magnetic film on the main surface of the glass substrate.
以下、本発明の実施例を説明する。 Examples of the present invention will be described below.
実施例 １
磁気記録媒体用基板の材料としてソーダライム
ガラス（140mm□
、厚さ2.2mm）を用意し、これを
40〓内径加工と130〓外径加工を同心度10μｍ以内で
行い、次いで、面取り加工も行う。Example 1 Soda lime glass (140 mm□, 2.2 mm thick) was prepared as a material for a magnetic recording medium substrate.
40〓Inner diameter machining and 130〓Outer diameter machining are performed with concentricity within 10μm, and then chamfering is also performed.
次に、＃400と＃1000砥粒の砂かけ工程を経て、
酸化セリウム（CeO2）による研摩工程を行い、
洗浄工程を経て、上記ソーダライムガラスを厚さ
1.9mm、表面粗さRnax20Å程度に仕上げる。 Next, through the sanding process with #400 and #1000 abrasive grains,
A polishing process using cerium oxide (CeO 2 ) is performed,
After the cleaning process, the above soda lime glass is reduced to a thickness of
Finish to 1.9mm and surface roughness R nax 20Å.
次に、このソーダライムガラスを低温型イオン
交換工程を経て、磁気記録媒体用基板とする。こ
の低温型イオン交換処理済のソーダライムガラス
は、ガラスの強化の他に、後述する薄膜との付着
力を増大させる。 Next, this soda lime glass is subjected to a low temperature ion exchange process to form a substrate for a magnetic recording medium. This low-temperature ion exchange treated soda lime glass not only strengthens the glass, but also increases the adhesive force with the thin film described below.
次に、上記ソーダライムガラスの両主表面上に
下地層としてCr膜（1800Å）、磁性層として25wt
％のNiを含むCo−Ni合金膜（1000Å）、保護膜
としてＣ膜（1000Å）をスパツタリング法により
順次積層して、本実施例の磁気記録媒体を製造し
た。 Next, on both main surfaces of the soda lime glass, a Cr film (1800 Å) was applied as an underlayer, and a 25wt Cr film was applied as a magnetic layer.
A Co--Ni alloy film (1000 Å) containing 50% Ni and a C film (1000 Å) as a protective film were successively deposited by sputtering to produce the magnetic recording medium of this example.
本実施例の磁気記録媒体の製造方法によれば、
ソーダライムガラス基板の表面粗さRnaxが20Å
程度まで精密研摩されているので、その基板表面
には突起やピツト状の微小欠陥を除去し、磁気ヘ
ツドとの浮上高さを100Å程度まで低くすること
ができ、磁気デイスク装置に磁気記録媒体を設置
して3600rpmで回転させても、ヘツドクラツシユ
のようなトラブルも発生しなかつた。また、本実
施例の磁気記録媒体のソーダライムガラスと薄膜
との間の付着力については、上記した研摩工程後
のソーダライムガラス基板について低温型イオン
交換処理工程を経た処理基板と同工程を行わない
未処理基板の主表面上に上記したCo−Ni合金の
磁性膜をスパツタリング法により被着したものを
試料（それぞれ20枚）として用意し、次のような
引つかき法により評価した。すなわち、引つかき
試験器（新東化学製：HEIDON−18）の先端に
砂消しゴム（６mm〓）を取り付け、荷重600ｇ、引
つかき速度50mm／分、移動距離50mmで各試料につ
いて５回引つかき試験をした結果、処理基板上の
磁性膜については引つかきキズが全く発生しなか
つたが、未処理基板上の磁性膜については引つか
きキズが多少発生したことから、イオン交換処理
によるガラス基板とその基板上の薄膜との間の付
着力が増大していることが判明された。その他、
回転破壊強度についても2.5×104rpmで回転試験
に対して、処理基板では割れるものは皆無であつ
たが、未処理基板では逆に約20％のものが割れて
しまつた。また、処理基板と未処理基板はそれぞ
れ坑折強度について約50Kg／mm2及び約10Kg／mm2、
硬度（Hv）について約600Kg／mm2及び約500Kg／
mm2であつて、何れも処理基板の方が優れていた。 According to the method for manufacturing a magnetic recording medium of this embodiment,
Surface roughness R nax of soda lime glass substrate is 20Å
The surface of the substrate is precisely polished to a certain degree, so that the surface of the substrate is free from minute defects such as protrusions and pits, and the flying height with respect to the magnetic head can be lowered to about 100 Å, making it possible to use magnetic recording media in magnetic disk devices. Even after installing it and rotating it at 3600 rpm, no problems like head crashes occurred. In addition, regarding the adhesion between the soda lime glass and the thin film of the magnetic recording medium of this example, the soda lime glass substrate after the above-mentioned polishing process was subjected to the same process as the treated substrate that had undergone the low temperature ion exchange process. Samples (20 pieces each) were prepared by depositing the above-mentioned Co--Ni alloy magnetic film by sputtering on the main surface of an untreated substrate, and evaluated by the following attraction method. That is, a sand eraser (6 mm) was attached to the tip of a drag tester (Shinto Kagaku: HEIDON-18), and each sample was pulled 5 times at a load of 600 g, a drag speed of 50 mm/min, and a moving distance of 50 mm. As a result of the scratch test, the magnetic film on the treated substrate did not cause any scratches due to attraction, but the magnetic film on the untreated substrate did have some scratches due to attraction. It has been found that the adhesion between a glass substrate and a thin film on that substrate is increased. others,
As for rotational fracture strength, in a rotation test at 2.5×10 4 rpm, none of the treated substrates cracked, but on the contrary, about 20% of the untreated substrates cracked. In addition, the treated and untreated substrates have a dimensional strength of about 50 Kg/mm 2 and about 10 Kg/mm 2 , respectively.
Hardness (Hv): approx. 600Kg/mm 2 and approx. 500Kg/
mm 2 , and the treated substrate was superior in all cases.
実施例 ２
磁気記録媒体用基板としてソーダアルミノケイ
酸ガラスを使用して、実施例１と同様な加工を行
つた後、研摩工程において、酸化セリウムによる
研摩加工の後に、コロイダルシリカ（SiO2）に
よる超精密研摩加工を行つて、表面粗さRnax10
Å程度まで仕上げる。このガラスを低温型イオン
交換処理した後、実施例１と同様にCr膜、Co−
Ni膜及びＣ膜を積層して、磁気記録媒体を製造
した。Example 2 Soda aluminosilicate glass was used as a substrate for a magnetic recording medium and processed in the same manner as in Example 1. In the polishing process, after polishing with cerium oxide, superimposition with colloidal silica (SiO 2 ) was performed. Surface roughness R nax 10 by precision polishing
Finish to about Å. After this glass was subjected to low-temperature ion exchange treatment, a Cr film and a Co-
A magnetic recording medium was manufactured by laminating a Ni film and a C film.
本実施例の製造方法によれば、ソーダアルミノ
ケイ酸ガラス基板の表面粗さRnaxが10Å程度ま
で超精密研摩されているので、実施例１によるも
のよりさらに、磁気ヘツドとの浮上高さを50Å程
度まで低くすることができる。また、付着力や坑
折強度及び硬度についても実施例１と同様な効果
が確認された。 According to the manufacturing method of the present example, the surface roughness R nax of the soda aluminosilicate glass substrate is ultra-precision polished to about 10 Å. It can be lowered to a certain degree. Furthermore, the same effects as in Example 1 were confirmed regarding adhesion, mechanical strength, and hardness.
本発明の磁気記録媒体の製造方法は、実施例１
及び２に限定されない。先ず、ガラス基板の材料
についてはソーダライムガラスやソーダアルミノ
ケイ酸ガラスの他に、アルミノシリケートガラス
などのナトリウムイオン（Na+）やリチウムイオ
ン（Li+）などのイオン交換可能なイオンを含有
した多成分系ガラスであればよい。ガラス基板の
研摩方法については酸化セリウムやコロイダルシ
リカの研摩剤の他に、アルミナ（γ−Al2O3）、
べんがら（Fe2O3）、酸化クロム（Cr2O3）、酸化
ジルコニウム（ZrO2）、酸化チタン（TiO2）など
を使用してもよいし、更に、研摩加工後に、ウエ
ツトエツチング又はドライエツチングを行つても
よい。 Example 1 of the method for manufacturing a magnetic recording medium of the present invention
and not limited to 2. First, regarding the material of the glass substrate, in addition to soda lime glass and soda aluminosilicate glass, there are also multi-component materials containing ion exchangeable ions such as sodium ions (Na + ) and lithium ions (Li + ) such as aluminosilicate glass. Any type of glass may be used. Regarding polishing methods for glass substrates, in addition to cerium oxide and colloidal silica abrasives, alumina (γ-Al 2 O 3 ),
Red iron (Fe 2 O 3 ), chromium oxide (Cr 2 O 3 ), zirconium oxide (ZrO 2 ), titanium oxide (TiO 2 ), etc. may be used, and after polishing, wet etching or dry etching may be used. Etching may be performed.
また、薄膜について、下地層はCr以外のTa、
Moなどの非磁性材料の薄膜であつてもよいし、
この下地層を設けなくてもよい。また、磁性層は
Co−Ni合金以外に、Co単体や、Co−Ni、Co−
Ni−ｐ、Co−Ｐ、Cr−γFe2O3等のCo系合金の
薄膜でもよい。保護膜はＣ膜以外に、SiO2膜、
Cr／Ｃ複合膜などでもよい。これ等の薄膜の被
着面は、実施例ではガラス基板の両主表面とした
が、一方の主表面としてもよい。これ等の成膜方
法についてはスパツタリング法以外に各種蒸着
法、イオンプレーテイング法、メツキ法などでも
よい。 In addition, for thin films, the underlying layer is Ta other than Cr,
It may be a thin film of non-magnetic material such as Mo,
This base layer may not be provided. In addition, the magnetic layer
In addition to Co-Ni alloy, Co alone, Co-Ni, Co-
A thin film of a Co-based alloy such as Ni-p, Co-P, Cr-γFe 2 O 3 or the like may be used. In addition to the C film, the protective film is a SiO 2 film,
A Cr/C composite film or the like may also be used. Although these thin films were applied to both main surfaces of the glass substrate in the embodiment, they may be applied to one of the main surfaces. In addition to the sputtering method, various deposition methods, ion plating methods, plating methods, etc. may be used for forming these films.
以上の通り、本発明の磁気記録媒体の製造方法
によれば、ガラス基板の表面粗さをRnax200Å以
下に研摩していることから、表面上の突起やピツ
ト状の微小欠陥を除去しているため、磁性膜の均
一化（膜厚の一定化、膜表面の平坦化）が得ら
れ、磁気デイスク装置での回転駆動時におけるノ
イズの発生を除去することができる。また、ヘツ
ド浮上高さを1000Å以下にするとの要求に充分に
応えることができ、また、ガラス基板の表面粗さ
はRnax10Å程度まで容易に研摩することができ
るので、今後の高密度記録化が一層進められた場
合に対しても余裕をもつて応えることができる。
更に、研摩されたガラス基板をイオン交換処理し
た後に磁性膜を含む薄膜を被着していることか
ら、ガラス基板と薄膜との間の付着力を増大し、
また回転破壊強度、坑折強度及び硬度も増大する
ことができる。
As described above, according to the method for manufacturing a magnetic recording medium of the present invention, since the surface roughness of the glass substrate is polished to R nax 200 Å or less, micro defects such as protrusions and pits on the surface can be removed. Therefore, the magnetic film can be made uniform (constant film thickness, flattened film surface), and the generation of noise during rotational driving in a magnetic disk device can be eliminated. In addition, it can fully meet the demand for a head flying height of 1000 Å or less, and the surface roughness of the glass substrate can be easily polished to R nax 10 Å, making it ideal for future high-density recording. We will be able to respond with plenty of time even if the situation is further advanced.
Furthermore, since the thin film containing the magnetic film is applied after the polished glass substrate is subjected to ion exchange treatment, the adhesion between the glass substrate and the thin film is increased.
Rotational fracture strength, mechanical strength and hardness can also be increased.
Claims (1)
下に研摩した後、そのガラス基板を低温型イオン
交換処理し、次に、そのガラス基板の主表面上に
磁性膜を含む薄膜を被着することを特徴とする磁
気記録媒体の製造方法。1. After polishing the main surface of the glass substrate to a surface roughness R nax of 200 Å or less, the glass substrate is subjected to low-temperature ion exchange treatment, and then a thin film including a magnetic film is deposited on the main surface of the glass substrate. A method of manufacturing a magnetic recording medium, characterized in that:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21346685A JPS6273426A (en) | 1985-09-26 | 1985-09-26 | Production of magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21346685A JPS6273426A (en) | 1985-09-26 | 1985-09-26 | Production of magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6273426A JPS6273426A (en) | 1987-04-04 |
| JPH0352130B2 true JPH0352130B2 (en) | 1991-08-09 |
Family
ID=16639669
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21346685A Granted JPS6273426A (en) | 1985-09-26 | 1985-09-26 | Production of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6273426A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2547994B2 (en) * | 1987-01-16 | 1996-10-30 | ティーディーケイ株式会社 | Magnetic recording media |
| JPH0695363B2 (en) * | 1987-08-27 | 1994-11-24 | ティーディーケイ株式会社 | Magnetic recording / reproducing device |
| JP2657967B2 (en) * | 1988-07-20 | 1997-09-30 | ホーヤ株式会社 | Glass substrate for recording medium, recording medium, and method for producing them |
-
1985
- 1985-09-26 JP JP21346685A patent/JPS6273426A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6273426A (en) | 1987-04-04 |
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