JPH0353224Y2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improvement in an etching spinner used for manufacturing a photomask plate for forming a desired photoresist pattern on a silicon wafer by exposure.

In general, photomask plates that have a metal vapor deposited film on a glass substrate are used to form a mask pattern by removing the vapor deposited film in non-resist areas through corrosive etching. While a photomask original plate is loaded and rotated at high speed, an etching liquid is injected downward toward the center of the mask original plate, and while the etching liquid is uniformly applied to the mask original plate surface, the deposited film on the non-resist part is etched. , forming mask patterns and manufacturing photomask plates.

However, with conventional etching spinner devices, there is no way to check if the metal film is missing at a predetermined location due to etching or to confirm the end point of etching, which often results in excessive etching or insufficient etching due to poor fogging at corners. , there were cases where this was overlooked.

The present invention solves the above-mentioned disadvantages,
A disk is attached to the etching spinner device to detect the missing part of the corrosion mask plate and a rough guide for the etching end point. The concentric lines or grooves and the color tone of the disc can be seen through it.

The present invention provides an etching spinner device used for manufacturing photomasks by an etching method, in which a rotating holder 2 of a spinner 1 is
A disk 6 with a concentric pattern drawn from the center of rotation is attached to the top surface, and a staircase can be fitted and fixed to the corner of the square photomask plate a of various sizes from the upper side of the disk 6 to the rotating outer circumference of the rotating holder 2. This is an etching spinner characterized in that it is equipped with a chuck 4 shaped like a chuck.

The disk 6 to be attached to the spinner of the present invention should have a non-reflective surface since a strongly reflective surface is formed when the photomask original plate is a glass substrate with a metal film formed by chromium metal vapor deposition. Since a photomask original plate on which a chromium oxide metal vapor-deposited film is further formed has a color tone close to black, the disk 6 is preferably white or has a diffuse reflection surface.

If the present invention is explained in detail according to the drawings, the first
The figure is a side sectional view of a spinner device used for etching, where 1 is a spinner, 2 is a holder, and 3 is a spinner device.
is a rotating shaft that pivotally supports the center support part 11 of the holder 2, and the holder 2 is integrally attached to the support part 11 and extends radially in all directions outside of the support part 11. 4 is a stepped chuck attached to the rotating outer circumferential side of the holder 2 with a screw 12, etc.; 5 is a stepped chuck 4;
, 6 is the disk, 7 is the axis 3 drawn on the disk 6
8 is a bearing portion that rotatably supports the shaft 3, 9 is a spinner support frame, and 10 is an etching liquid injection nozzle.

FIG. 2 is a plan view of the spinner device of the present invention. The spinner 1 is equipped with a holder 2 that extends radially in all directions around a support portion 11, and a chuck 4 provided on the outer circumference of the spinner is located at the center. The corners of the mask plate a can be fitted and fixed to the flat portions 5 at predetermined levels depending on the size of the mask plate a.

The spinner 1 can be rotated at low to high speeds via a shaft 3 by a predetermined power source.

The mask plate a is inserted downward from the nozzle 10 provided on the upper side of the mask plate a placed on the spinner chuck 4.
While injecting the etching liquid toward the center, the mask plate a is rotated to uniformly apply the etching liquid to the surface of the mask plate a, and the excess liquid can be removed by scattering it toward the outside of the rotation. .

In the process of etching while rotating the mask plate a by the spinner 1, the opaque metal vapor deposited layer on the non-resist part of the mask plate a is pattern-etched gradually from the center outward, becoming transparent and rotating. Through the halftone part created by the transparent part, the color of the lower disk and the concentric thin line 7 can be observed from above through the glass substrate, and the spread of the halftone is detected using the concentric thin line 7 as a scale, It is possible to know the etching progress and condition of the photomask plate a. When the halftone portion of the rotating photomask plate reaches a concentric circle having a predetermined radius and no further enlargement occurs, it is determined that the etching has come to an end.

According to the present invention, the progress of etching can be detected from the contrast between the black color of the opaque part of the photomask plate or the reflected light from the strongly reflective surface and the color of the lower disk observed from the transparent part and the concentric fine line scale. The etching condition can be known and the etching condition can be determined without stopping the rotation of the etching spinner.

[Brief explanation of the drawing]

FIG. 1 is a side sectional view of the spinner device of the present invention;
FIG. 2 is a plan view of the spinner device of the present invention. 1...Spinner, 2...Holder, 4...Chuck, 5...Chuck flat part, 6...Disc, 7
... Thin wire, 10... Nozzle, a... Mask plate.

Claims (1)

[Claims for Utility Model Registration] (1) In an etching spinner device used for manufacturing photomasks by an etching method, a disk 6 having a concentric pattern drawn from the center of rotation is placed on the upper surface of a rotating holder 2 of a spinner 1. A spinner for etching, characterized in that a step-like chuck 4 is attached to the rotating outer circumferential portion of the rotating holder 2 from above the disk 6 to fit and fix corner portions of angular photomask plates a of various sizes. (2) The etching spinner according to claim 1, wherein the disc 6 is a disc colored white, and the pattern is a conspicuous thin line such as a black line or a cut groove. (3) The etching spinner according to claim 1, wherein the disc 6 described in claim 1 is a disc colored black, and the pattern is a conspicuous thin line such as a white line cut groove.