JPH0356183A - Washing apparatus - Google Patents
Washing apparatusInfo
- Publication number
- JPH0356183A JPH0356183A JP1193673A JP19367389A JPH0356183A JP H0356183 A JPH0356183 A JP H0356183A JP 1193673 A JP1193673 A JP 1193673A JP 19367389 A JP19367389 A JP 19367389A JP H0356183 A JPH0356183 A JP H0356183A
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning liquid
- liquid
- tank
- drying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Drying Of Solid Materials (AREA)
- Detergent Compositions (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は半導体等の被洗浄物を洗浄する洗浄装置に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a cleaning device for cleaning objects to be cleaned, such as semiconductors.
なお、ここでヒートポンブとは、温流体を製造する狭義
のヒートポンプのみならず、冷流体を製造するヒートポ
ンプを意味する。Note that the heat pump here means not only a heat pump in a narrow sense that produces hot fluid, but also a heat pump that produces cold fluid.
従来、半導体等の被洗浄物を洗浄する洗浄装置としては
、洗浄液としてフロン等を用い、第３ＵｇＪに示すよう
な構成のものであった。即ち、洗浄槽１内には、フロン
等の洗浄液３が収容されており、洗浄槽１内に配置され
ている超音波発生装置２により超音波が発射され、洗浄
槽１内に浸漬された半導体等の被洗浄物４１が洗浄され
る。その後被洗浄物４１は洗浄槽１から出され、自然乾
燥したり、図示する如くヒータ１２により、加熱され、
加圧装置１１により強制通風される空気等により乾燥す
る。Conventionally, cleaning apparatuses for cleaning objects to be cleaned, such as semiconductors, have used Freon or the like as a cleaning liquid and have a configuration as shown in No. 3 UgJ. That is, a cleaning liquid 3 such as chlorofluorocarbon is contained in the cleaning tank 1, and ultrasonic waves are emitted by an ultrasonic generator 2 disposed in the cleaning tank 1 to clean the semiconductor immersed in the cleaning tank 1. Objects 41 to be cleaned, such as the following, are cleaned. Thereafter, the object 41 to be cleaned is taken out from the cleaning tank 1, dried naturally, or heated by a heater 12 as shown in the figure.
Drying is performed by forced air, etc., by the pressurizing device 11.
上記洗浄乾燥工程で１よ、洗浄液が蒸発し、部屋２０内
に拡散するので、送風機２１を用いてダクト２２から強
制的に屋外に排出される。In the above-mentioned cleaning and drying process, the cleaning liquid evaporates and diffuses into the room 20, and is forcibly discharged outdoors from the duct 22 using the blower 21.
ここで洗浄液としてフロン（特にトリクロロトノフル才
ロエタン，ＣＦＣ１１３）を用いる場合は、排出された
フロンが大気成Ｍ圏のオゾン層を破壊するという理由か
ら、排気中のフロンを回収するように装置が構成されて
いる場合が多い。図においては、冷凍機の蒸発部３４が
ダクト２２内に組み込まれており、フロンを含んだ排気
がこの部分を通った時に冷却され該蒸発部３４の下部の
ダクト２２の凹部２２ａにたまる。このたまったフロン
は配管３５を経て洗浄槽１に戻る。一方、フロンを取り
除かれた排気は送風機２１から外気に放出される。また
、フロンを凝縮させる冷凍機は圧縮機３１、凝縮機３２
、減圧装置３３、蒸発器３４から構成される。When using fluorocarbons (particularly trichlorotonofluroethane, CFC113) as the cleaning liquid, equipment is required to recover the fluorocarbons from the exhaust gas because the emitted fluorocarbons destroy the ozone layer in the atmospheric stroma. Often configured. In the figure, the evaporator section 34 of the refrigerator is built into the duct 22, and when exhaust gas containing fluorocarbons passes through this section, it is cooled and collects in the recess 22a of the duct 22 below the evaporator section 34. This accumulated fluorocarbon returns to the cleaning tank 1 via the pipe 35. On the other hand, the exhaust gas from which Freon has been removed is discharged from the blower 21 to the outside air. In addition, the refrigerator that condenses Freon is a compressor 31 and a condenser 32.
, a pressure reducing device 33, and an evaporator 34.
しかしながら、上記のような従来の洗浄装置では、動力
源が多く、エネルギーロスが非常に大きいという欠点が
あった。However, the conventional cleaning apparatus as described above has the disadvantage that it requires many power sources and has a very large energy loss.
このエネルギーの無駄使いは、言い換えれば一次エネル
ギーで考えると炭酸ガスの発生量の増加を意味し、温室
効果による地球温暖化という別の公害を生み出してしま
うことにもなる。In other words, in terms of primary energy, this wasteful use of energy means an increase in the amount of carbon dioxide gas generated, which in turn leads to another type of pollution: global warming due to the greenhouse effect.
本発明は上述の点に鑑みてなされたもので、上記問題点
を除去し、省エネルギータイプの洗浄装置提供すること
を目的とする。The present invention has been made in view of the above-mentioned points, and aims to eliminate the above-mentioned problems and provide an energy-saving cleaning device.
上記課題を解決するため本発明は洗浄装置を下記の如く
構成した。即ち、
第１図に示すように、洗浄ｍｌが内部に超音波装近２を
具備する超音波洗浄槽であり、且つ収容される洗浄液を
冷凍機の蒸発器３４により冷却する構成とし、冷凍機の
冷却熱源である凝縮器３２を洗浄後の被洗浄物４１を乾
燥する乾燥機の乾燥用流体を加熱する加熱源とし、且つ
洗浄液として少なくともジクロロトリフルオロエタンを
含む洗浄液を用いることを特徴とする。In order to solve the above problems, the present invention has a cleaning device configured as follows. That is, as shown in FIG. 1, the cleaning ml is an ultrasonic cleaning tank equipped with an ultrasonic tank 2 inside, and the cleaning liquid contained therein is cooled by an evaporator 34 of a refrigerator. The condenser 32, which is a cooling heat source, is used as a heat source for heating the drying fluid of the dryer that dries the object 41 after cleaning, and the cleaning liquid contains at least dichlorotrifluoroethane. .
また、第２図に示すように、洗浄槽１がその洗浄液がヒ
ートポンブの凝縮器３２により加熱されている洗浄槽で
あり、ヒートポンプの吸熱源が乾燥液の排ガスからの洗
浄液回収部にある蒸発器３４であり、且つ洗浄用液とし
て少なくともジクロロトリフルオロエタンを含む洗浄液
を用いることを特徴とする。Further, as shown in FIG. 2, the cleaning tank 1 is a cleaning tank in which the cleaning liquid is heated by a condenser 32 of a heat pump, and the heat absorption source of the heat pump is an evaporator in which the cleaning liquid is recovered from the exhaust gas of the drying liquid. 34, and is characterized in that a cleaning liquid containing at least dichlorotrifluoroethane is used as the cleaning liquid.
洗浄装置を上記の如く構或するので、洗浄槽１には冷凍
機の蒸発器３４が配置されて、洗浄液３が冷却されるか
ら、洗浄液３の温度が低くなり、飽和圧力が下がり、蒸
発量を大幅に低くすることができる。また、１台の冷凍
機の蒸発器３４を洗浄槽１内の洗浄液３の冷却用とし、
凝縮器３２を洗浄後の被洗浄物４１を乾燥する乾燥用空
気の加熱用として用いるので、エネルギーロスが殆どな
く、省エネルギーの洗浄装置となる。Since the cleaning device is configured as described above, the evaporator 34 of the refrigerator is disposed in the cleaning tank 1 to cool the cleaning liquid 3, so the temperature of the cleaning liquid 3 is lowered, the saturation pressure is lowered, and the amount of evaporation is reduced. can be significantly lowered. Further, the evaporator 34 of one refrigerator is used for cooling the cleaning liquid 3 in the cleaning tank 1,
Since the condenser 32 is used to heat the drying air for drying the object 41 to be cleaned after cleaning, there is almost no energy loss, resulting in an energy-saving cleaning device.
また、洗浄液がヒートポンプの凝縮器３２により加熱さ
れ、ヒートポンプの吸熱源が乾燥液の排ガスからの洗浄
液回収部にある蒸発器３４であるので、１台のヒートポ
ンプを用いて、洗浄、乾燥用ガスの加熱、洗浄液の回収
を１度に行なうことができるから、エネルギーロスが殆
どなく、省エネルギーの洗浄装置となる。In addition, the cleaning liquid is heated by the condenser 32 of the heat pump, and the heat absorption source of the heat pump is the evaporator 34 in the cleaning liquid recovery section from the exhaust gas of the drying liquid. Since heating and cleaning liquid recovery can be performed at the same time, there is almost no energy loss, resulting in an energy-saving cleaning device.
以下、本発明の実施例を図面に基づいて説明する。 Embodiments of the present invention will be described below based on the drawings.
第１図は本発明に係る洗浄装置の概略構戒を示す図であ
る。本洗浄装置は、洗浄槽１内に超音波発生装置２が配
置された超音波洗浄槽である。半導体等の被洗浄物４１
は洗浄槽１内の洗浄液３に浸漬しており、超音波発生装
置２より超音波を発射し洗浄する。この洗浄槽１内には
、圧縮機３１、凝縮器３２、減圧装置３３及び蒸発器３
４から構或される冷凍機の蒸発器３４が配置されており
、洗浄液３を冷却している。従って、洗浄液３の温度が
低くなるので、飽和圧力が下がり、蒸発量を大幅に低く
することができる。FIG. 1 is a diagram showing the general structure of a cleaning device according to the present invention. This cleaning device is an ultrasonic cleaning tank in which an ultrasonic generator 2 is placed inside a cleaning tank 1. Objects to be cleaned such as semiconductors 41
is immersed in a cleaning liquid 3 in a cleaning tank 1, and is cleaned by emitting ultrasonic waves from an ultrasonic generator 2. This cleaning tank 1 includes a compressor 31, a condenser 32, a pressure reducing device 33, and an evaporator 3.
An evaporator 34 of a refrigerator consisting of 4 is arranged to cool the cleaning liquid 3. Therefore, since the temperature of the cleaning liquid 3 is lowered, the saturation pressure is lowered, and the amount of evaporation can be significantly lowered.
一方、前記の冷凍機の凝縮器３２は、被洗浄物４１の洗
浄後の乾燥用として、加圧装置１１にて強制通風する空
気を加熱するため、ダクト２４内に配置される。On the other hand, the condenser 32 of the refrigerator is arranged in the duct 24 to heat the air forcedly ventilated by the pressurizing device 11 for drying the object 41 to be cleaned after cleaning.
上記のように洗浄装置は、１台の冷凍機の蒸発器３４を
洗浄槽１内の洗浄液３の冷却用とし、凝縮器３２を洗浄
後の被洗浄物４１を乾燥する乾燥用空気の加熱用として
用いるので、エネルギーロスが殆どなく、省エネルギー
の洗浄装置となる。As described above, the cleaning device uses the evaporator 34 of one refrigerator for cooling the cleaning liquid 3 in the cleaning tank 1, and the condenser 32 for heating the drying air for drying the object 41 after cleaning. Since it is used as a cleaning device, there is almost no energy loss, resulting in an energy-saving cleaning device.
また、乾燥時に、被洗浄物４１に付着した洗浄液３の量
が多い場合には、蒸発器３４を２分割し、一方を洗浄液
３の冷却用とし、他方を排気中の洗浄液３の凝縮回収に
用いることも考えられる。In addition, if there is a large amount of cleaning liquid 3 attached to the object 41 to be cleaned during drying, the evaporator 34 is divided into two parts, one for cooling the cleaning liquid 3 and the other for condensation and recovery of the cleaning liquid 3 being exhausted. It is also possible to use
なお、この洗浄装置は特に洗浄液としてジクロロトリフ
ルオロエタン（ＨＣＦＣ−１２３）を用いる場合に有効
である。ジクロロトリフルオロエタンは洗浄液として有
効であるが、従来用いられているトリクロ口トリプル才
ロエタン（ＣＦＣ−１１３）に比べて沸点が低いので、
第３図に示す従来タイプの洗浄装置では、送風機２１、
冷凍機用圧縮機３１等に大容量のものが必要となる。Note that this cleaning device is particularly effective when dichlorotrifluoroethane (HCFC-123) is used as the cleaning liquid. Although dichlorotrifluoroethane is effective as a cleaning liquid, it has a lower boiling point than the conventionally used trifluoroethane (CFC-113).
In the conventional type cleaning device shown in FIG.
A large capacity compressor 31 etc. for the refrigerator is required.
第２図は本発明に係る洗浄装置の他の概略構戒を示す図
である。本洗浄装置は洗浄槽の洗浄液をヒートポンプで
加熱するタイプの洗浄装置であり、洗浄槽１の底部に圧
縮機３１、プレ凝縮器３２′、凝縮器３２、減圧装置３
３及び蒸発器３４にて構成されるヒートポンプの凝縮器
３２が配置されている。この凝縮器３２により洗浄液３
は加熱蒸発し、洗浄槽１の中を攪拌する。この攪拌作用
により、洗浄液３の中に浸漬されている半導体等の被洗
浄物４１は洗浄される。FIG. 2 is a diagram showing another general structure of the cleaning device according to the present invention. This cleaning device is a type of cleaning device that heats the cleaning liquid in the cleaning tank using a heat pump.
A heat pump condenser 32 consisting of a heat pump 3 and an evaporator 34 is arranged. By this condenser 32, the cleaning liquid 3
is heated and evaporated, and the inside of the cleaning tank 1 is stirred. Due to this stirring action, the object 41 to be cleaned, such as a semiconductor, immersed in the cleaning liquid 3 is cleaned.
洗浄槽１から蒸発した洗浄液３のガスはダクト２３を通
り、プレ凝縮器３２′にて加熱された後、加圧装置１１
より、被洗浄物４１の乾燥用ガスとして吹き付けられる
。この乾燥用ガスと被洗浄物４１の表面に付着していた
洗浄液が蒸発したガスは混合して排気用の送風機２１よ
りダクト２２を通って吸引され、ダクト２２内に配置さ
れたヒートポンプの蒸発器３４を通る時、洗浄液は凝縮
され、蒸発器３４の下部のダクト２２の凹部２２ａにた
まる。このたまった洗浄液は配管３５を通って洗浄槽１
に戻される。また、洗浄液を凝縮回収した後、空気など
不凝縮ガスのみ屋外に排出される。The gas of the cleaning liquid 3 evaporated from the cleaning tank 1 passes through the duct 23, is heated in the pre-condenser 32', and is then transferred to the pressurizing device 11.
The gas is sprayed as a drying gas for the object 41 to be cleaned. This drying gas and the gas from which the cleaning liquid adhering to the surface of the object to be cleaned 41 has evaporated are mixed and sucked through the duct 22 by the exhaust blower 21, and are then sucked into the evaporator of the heat pump disposed inside the duct 22. 34, the cleaning liquid is condensed and collected in the recess 22a of the duct 22 at the bottom of the evaporator 34. This accumulated cleaning liquid passes through the pipe 35 to the cleaning tank 1.
will be returned to. Further, after condensing and recovering the cleaning liquid, only non-condensable gases such as air are discharged outdoors.
洗浄装置を上記のように構成することにより、１台のヒ
ートポンブを用いて、洗浄、乾燥用ガスの加熱、洗浄液
の回収を１度に行なうことができるので、エネルギーロ
スが殆どなく、省エネルギーの洗浄装置となる。By configuring the cleaning device as described above, it is possible to perform cleaning, heating the drying gas, and recovering the cleaning liquid all at once using one heat pump, resulting in energy-saving cleaning with almost no energy loss. It becomes a device.
以上、説明したように本発明によれば下記のような優れ
た効果が得られる。As explained above, according to the present invention, the following excellent effects can be obtained.
（１）洗浄液を冷凍機により冷却するので、洗浄液の蒸
発量を大幅に低減でき、且つ１台の冷凍機で洗浄液３の
冷却と乾燥用ガスの加熱を同時に行なうので、エネルギ
ーロスが殆どなく、省エネルギーの洗浄装置となる。(1) Since the cleaning liquid is cooled by a refrigerator, the amount of evaporation of the cleaning liquid can be significantly reduced, and since one refrigerator cools the cleaning liquid 3 and heats the drying gas at the same time, there is almost no energy loss. It becomes an energy-saving cleaning device.
（２）また、１台のヒートポンプで、洗浄液を加熱する
ことにより、洗浄液は攪拌され、洗浄作用が付加され、
且つ乾燥用ガスの加熱と洗浄液の凝縮回収ができるので
エネルギーロスが殆どなく、省エネルギーの洗浄装置と
なる。(2) Also, by heating the cleaning liquid with one heat pump, the cleaning liquid is stirred and a cleaning action is added.
In addition, since the drying gas can be heated and the cleaning liquid can be condensed and recovered, there is almost no energy loss, resulting in an energy-saving cleaning device.
第１図は本発明に係る洗浄装置の概略構成を示す図、第
２図は本発明に係る洗浄装置の他の概略構成を示す図、
第３図は従来の洗浄装置の概略構成を示す図である。
図中、１・・・・洗浄槽、２・・・・超音波発生装置、
３・・・・洗浄液、１１・・・・加圧装置、２１・・・
・送風機、２２・・・・ダクト、２３・・・・ダクト、
２４・・・ダクト、３１・・・・圧縮機、３２・・・・
凝縮器、３３・・・・減圧装置、３４・・・・蒸発器、
３５・・・配管、４１・・・・被洗浄物。FIG. 1 is a diagram showing a schematic configuration of a cleaning device according to the present invention, FIG. 2 is a diagram showing another schematic configuration of a cleaning device according to the present invention,
FIG. 3 is a diagram showing a schematic configuration of a conventional cleaning device. In the figure, 1... cleaning tank, 2... ultrasonic generator,
3...Cleaning liquid, 11...Pressure device, 21...
・Blower, 22...Duct, 23...Duct,
24...Duct, 31...Compressor, 32...
Condenser, 33... pressure reducing device, 34... evaporator,
35...Piping, 41...Object to be cleaned.
Claims (2)
浄液を冷凍機により冷却する構成とし、前記冷凍機の冷
却熱源が洗浄後の被洗浄物を乾燥する乾燥機の乾燥用流
体を加熱する加熱源とし、且つ洗浄液として少なくとも
ジクロロトリフルオロエタンを含む洗浄液を用いること
を特徴とする洗浄装置。(1) The cleaning tank is an ultrasonic cleaning tank, and the cleaning liquid contained therein is cooled by a refrigerator, and the cooling heat source of the refrigerator is connected to the drying fluid of the dryer that dries the object to be cleaned after cleaning. A cleaning device characterized by using a heating source for heating and a cleaning liquid containing at least dichlorotrifluoroethane as a cleaning liquid.
れている洗浄槽であり、前記ヒートポンプの吸熱源が乾
燥液の排ガスからの洗浄液を回収する回収部にあり、且
つ洗浄用液として少なくともジクロロトリフルオロエタ
ンを含む洗浄液を用いることを特徴とする洗浄装置。(2) The cleaning tank is a cleaning tank in which the cleaning liquid is heated by a heat pump, the heat absorption source of the heat pump is located in a recovery section that recovers the cleaning liquid from the exhaust gas of the drying liquid, and the cleaning liquid is at least dichlorotrifluorochloride. A cleaning device characterized by using a cleaning liquid containing ethane.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1193673A JPH0634976B2 (en) | 1989-07-25 | 1989-07-25 | Cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1193673A JPH0634976B2 (en) | 1989-07-25 | 1989-07-25 | Cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0356183A true JPH0356183A (en) | 1991-03-11 |
| JPH0634976B2 JPH0634976B2 (en) | 1994-05-11 |
Family
ID=16311882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1193673A Expired - Lifetime JPH0634976B2 (en) | 1989-07-25 | 1989-07-25 | Cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0634976B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0655150A (en) * | 1992-08-06 | 1994-03-01 | Kimura Chem Plants Co Ltd | Washing unit and washing apparatus using the same |
| US9728918B2 (en) | 2013-05-22 | 2017-08-08 | Knuerr Gmbh | Distribution strip |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010185649A (en) * | 2009-01-15 | 2010-08-26 | Omron Corp | Hot air supply device and hot air supply method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6345873A (en) * | 1986-08-13 | 1988-02-26 | Hitachi Ltd | superconducting transistor |
-
1989
- 1989-07-25 JP JP1193673A patent/JPH0634976B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6345873A (en) * | 1986-08-13 | 1988-02-26 | Hitachi Ltd | superconducting transistor |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0655150A (en) * | 1992-08-06 | 1994-03-01 | Kimura Chem Plants Co Ltd | Washing unit and washing apparatus using the same |
| US9728918B2 (en) | 2013-05-22 | 2017-08-08 | Knuerr Gmbh | Distribution strip |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0634976B2 (en) | 1994-05-11 |
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