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Priority to JP22861382ApriorityCriticalpatent/JPS59201058A/ja
Publication of JPS59201058ApublicationCriticalpatent/JPS59201058A/ja
Publication of JPH0356620B2publicationCriticalpatent/JPH0356620B2/ja
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F5/00—Screening processes; Screens therefor
G03F5/22—Screening processes; Screens therefor combining several screens; Elimination of moiré
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Photosensitive Polymer And Photoresist Processing
(AREA)