JPH0357574A - Electron beam working machine - Google Patents

Electron beam working machine

Info

Publication number
JPH0357574A
JPH0357574A JP18895889A JP18895889A JPH0357574A JP H0357574 A JPH0357574 A JP H0357574A JP 18895889 A JP18895889 A JP 18895889A JP 18895889 A JP18895889 A JP 18895889A JP H0357574 A JPH0357574 A JP H0357574A
Authority
JP
Japan
Prior art keywords
electron beam
workpiece
level
welding
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18895889A
Other languages
Japanese (ja)
Inventor
Kiyuuzou Arakawa
及蔵 荒川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP18895889A priority Critical patent/JPH0357574A/en
Publication of JPH0357574A publication Critical patent/JPH0357574A/en
Pending legal-status Critical Current

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  • Welding Or Cutting Using Electron Beams (AREA)

Abstract

PURPOSE:To prevent the wall of a working chamber from being melted by providing a deviation detecting circuit for monitoring a variation of a level of a detection waveform of an electron beam detecting device and detecting a fact that an electron beam is deviated from an object to be worked. CONSTITUTION:In the case an electron beam 3 is welding an object 4 to be welded, a large quantity of reflected electrons or secondary electrons are generat ed, therefore, a DC level of a detection waveform of an oscilloscope 13 is high. When an electron beam 3' deviates from an object 4' to be welded, the secon dary electron 9 decreases suddenly being in inverse proportion to the square of a distance, therefore, the DC level of the detection waveform becomes low. By detecting the time 17 of the instant of this deviation by a deviation detecting circuit 15, the generation of the electron beam 3 can be stopped before melting a wall of a welding chamber 16. In such a way, melting of the wall of the working chamber is prevented, and it can also be detected that the electron beam deviates from the object 4' to be worked.

Description

【発明の詳細な説明】 [産業上の利用分野] この発明は、電子ビーム加工機、特に電子ビームが被加
工物から外れたときに加工室の壁を溶融することを妨げ
る電子ビーム加工機に関するものである。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an electron beam processing machine, and particularly to an electron beam processing machine that prevents the walls of the processing chamber from being melted when the electron beam leaves the workpiece. It is something.

[従来の技術] 第3図は、例えば特開昭60−3985号公報に開示さ
れた加工線例えば溶接線を検出する装置を持つ従来の電
子ビーム加工機としての電子ビーム溶接機を示す概略構
或図である。
[Prior Art] FIG. 3 shows a schematic structure of an electron beam welding machine as a conventional electron beam processing machine having a device for detecting a processing line, such as a welding line, as disclosed in, for example, Japanese Patent Laid-Open No. 60-3985. This is a diagram.

図において、(1)は一端例えば十端子がアースされた
高電圧電源、(2〉はこの高電圧電源(1)の両端間に
接続された電子銃、(3)はこの電子銃(2〉が発生し
た電子ビーム、(4)はこの電子ビーム(3)で加工さ
れる被加工物、この場合は被溶接物、(5)は電子銃(
2)と被溶接物(4)の間に配置されて電子銃(2〉が
発生した電子ビーム(3)を被溶接物(4)の表面に集
束させるための集束コイル、(6〉はこの集束コイル(
5)と被溶接物(4)の間に配置されて電子ビーム(3
)が被溶接物(4)の加工線例えば溶接線(7)を横切
るように電子ビーム(3)を走査2 させるための(m向コイル、(8)はこの偏向コイル(
6)と被溶接物(4)の間に配置されて射突電子ビーム
(3〉の反射電子および二次電子(9)を捕捉するセン
サとしてのコレクタ、ク10〉は信号発生器、(11)
はこの信号発生器(10)の出力測に接続された波形変
換部、〈12〉はこの波形変換部(11)と偏向コイル
(6)の間に接続された電流増幅器、R1はこの電流増
幅器(12)と偏向コイル(6)の間に接続された抵抗
器、R2はコレクタ(8)とアースの間に接続された抵
抗器、(13)は抵抗器R1の各端にそれぞれ接続され
ている水平軸偏向端子(13a)(13b)および抵抗
器R2の各端にそれぞれ接続されている垂直軸偏向端子
(13c), (13d)を有してコレクタ(8)と一
緒に溶接線検出装置を構成するオシロスコープ、(14
〉はこのオシロスコープ(13)の画面上に現れる輝点
てある。
In the figure, (1) is a high-voltage power supply whose one end, for example, the ten terminal, is grounded, (2> is an electron gun connected between both ends of this high-voltage power supply (1), and (3) is this electron gun (2>). (4) is the workpiece to be processed by this electron beam (3), in this case the workpiece to be welded, and (5) is the electron gun (
2) and the workpiece (4) to focus the electron beam (3) generated by the electron gun (2> on the surface of the workpiece (4), (6>) Focusing coil (
5) and the object to be welded (4).
) to scan the electron beam (3) across the processing line (4), for example, the welding line (7), (8) is the deflection coil (2).
6) and the object to be welded (4) to capture the reflected electrons and secondary electrons (9) of the incident electron beam (3); )
is a waveform converter connected to the output of this signal generator (10), <12> is a current amplifier connected between this waveform converter (11) and the deflection coil (6), and R1 is this current amplifier. (12) is a resistor connected between the deflection coil (6), R2 is a resistor connected between the collector (8) and ground, and (13) is connected to each end of the resistor R1. Weld line detection device together with the collector (8) has horizontal axis deflection terminals (13a) (13b) and vertical axis deflection terminals (13c), (13d) respectively connected to each end of resistor R2. Oscilloscope (14)
> is a bright spot appearing on the screen of this oscilloscope (13).

従来の電子ビーム溶接機は上述したようにi或されてお
り、以下にその動作を詳しく説明する。
The conventional electron beam welding machine is operated as described above, and its operation will be explained in detail below.

第3図の電子ビーム溶接機において、信号発生器(10
〉の出力は、波形変換部(11)にナ3いて後述する波
形変換が行われてから電流増幅器(12)に入力され、
こ\で所定の大きさに増幅された後、偏向コイル(6)
に供給されると共に、抵抗器R1の両端間の信号はオシ
ロスコープ(13)の水平軸偏向端子(13a)および
(13b)に入力される。一方、集束コイル(5)によ
り被溶接物(4〉の表面に集束された電子ビーム(3)
は偏向コイル(6)によって被溶接物(4)の溶接線(
ア)を横切るように走査される。
In the electron beam welding machine shown in Fig. 3, a signal generator (10
The output of
After being amplified to a predetermined size, the deflection coil (6)
The signal across the resistor R1 is input to the horizontal axis deflection terminals (13a) and (13b) of the oscilloscope (13). On the other hand, the electron beam (3) is focused on the surface of the workpiece (4) by the focusing coil (5).
The welding line (
a) is scanned across the area.

また、電子ビーム(3)の反射電子および二次電子(9
〉はコレクタ(8)により捕捉され、抵抗器R2の両端
間の信号は、オシロスコープ(13)の垂直軸偏向端子
(13c)および(13d)に入力される。信号発生器
(10)は三角波状の信号を出力し、この信号は波形変
換部(11)で第4図に示されるような波形を変換され
る。第4図に示される波形は各電圧零点が時間tの間、
引き延ばされている。これにより電子ビーム(3)が偏
向されない点、すなわち電子ビーム(3)が溶接線(7
)の上にあるとき、オシロスコープ(13)では電圧波
形が第5図中の時間tの間停止するので、画面には輝点
(14)が生ずることどなる。従って、反射電子および
二次電子(9)のコレクタ(8)への到達量が溶接線(
7)の位置において減少ずる特徴を利用し、輝点(14
)と、コレクタ(8)よりの信号減少のピーク点とを一
致させれば、位置決めが達戒されることとなる。
In addition, the reflected electrons and secondary electrons (9) of the electron beam (3)
> is captured by the collector (8) and the signal across the resistor R2 is input to the vertical axis deflection terminals (13c) and (13d) of the oscilloscope (13). The signal generator (10) outputs a triangular waveform signal, and this signal is converted into a waveform as shown in FIG. 4 by a waveform converter (11). The waveform shown in FIG. 4 shows that each voltage zero point is for a time t,
It's stretched out. As a result, the point where the electron beam (3) is not deflected, that is, the point where the electron beam (3) is
), the voltage waveform on the oscilloscope (13) stops for time t in FIG. 5, and a bright spot (14) appears on the screen. Therefore, the amount of reflected electrons and secondary electrons (9) reaching the collector (8) is smaller than the welding line (
Using the decreasing feature at the position of bright point (14)
) and the peak point of the signal decrease from the collector (8), positioning will be achieved.

[発明が解決しようとする課題] 従来の電子ビーム加工機では、電子ビームが被加工物か
ら外れたことを検出する手段がなく、電子ビームが加工
室例えば溶接室の壁を溶融してしまうなどの問題点があ
った。
[Problems to be Solved by the Invention] Conventional electron beam processing machines do not have a means to detect that the electron beam has come off the workpiece, and the electron beam may melt the walls of the processing chamber, for example, the welding chamber. There was a problem.

この発明は、このような問題点を解決するためになされ
たもので、加工線を検出できるのみならず電子ビームが
被加工物から外れたことも検出もできる電子ビーム加工
機を得ることを目的とする。
This invention was made to solve these problems, and the object is to provide an electron beam processing machine that can not only detect processing lines but also detect when the electron beam has come off the workpiece. shall be.

[課題を解決するための手段] この発明に係る電子ビーム加工機は、加工線検出装置の
検出波形のレベルの変化をモニタして電子ビームが被加
工物から外れたことを検出する目外れ検出回路を設けた
ものである。
[Means for Solving the Problems] The electron beam processing machine according to the present invention detects deviation of the electron beam from the workpiece by monitoring changes in the level of the detection waveform of the processing line detection device. It is equipped with a circuit.

[作 用コ 5 この発明では、電子ビームが被加工物から外れると加工
線検出装置の検出波形のレベルが極端に小さくなること
を利用する。
[Function 5] This invention utilizes the fact that when the electron beam leaves the workpiece, the level of the detection waveform of the processing line detection device becomes extremely small.

[実施例] 以下、この発明の一実施例を図について説明する。この
一実施例の概略構成を示す第1図において、(1)〜(
14)は従来例におけるものと全く同一である。ク15
)はオシロスコープ(13)と電気的に接続され、電子
ビーム(3)が被溶接物(4)から外れたことを検出す
る目外れ検出回路である。また、第2図は、この発明の
動作を補足する説明図であり、(16)は溶接室の壁、
(17)は目外れ時間、そして破&i(3’), (4
’), (9“)は目外れした状態を示す。
[Example] Hereinafter, an example of the present invention will be described with reference to the drawings. In FIG. 1 showing the schematic configuration of this embodiment, (1) to (
14) is exactly the same as that in the conventional example. 15
) is a misalignment detection circuit that is electrically connected to the oscilloscope (13) and detects that the electron beam (3) has come off the workpiece (4). Moreover, FIG. 2 is an explanatory diagram supplementary to the operation of the present invention, in which (16) is the wall of the welding room,
(17) is the off-target time, and break&i(3'), (4
'), (9'') indicate a missed result.

この発明の電子ビーム加工機例えば電子ビーム溶接機は
上述したように構成されており、以下にその動作につい
て説明する。
The electron beam processing machine, such as the electron beam welding machine, of the present invention is constructed as described above, and its operation will be described below.

第2図(.)に実線で示すように電子ビーム(3)が被
溶接物(4〉を溶接している場合には大量の反射電子ま
たは二次電子(9)が発生するので、第2図(h)に示
すようにオシロスコープ(13)の検出波6一 形の直流レベルは高い。しかしながら、第2図(.)に
破線で示すように溶接中に電子ヒーム(3゛)が被溶接
物(4′)から外れると反射電子または二次電子(9゛
)が距離の二乗に反比例して急激に少なくなるので、検
出波形の直流レベルは低くなる。この目外れした瞬間の
時間(17)を第1図の目外れ検出回路(15)で検田
して溶接室(16)の壁を溶融する前に電子ビーム(3
〉の発生を停止させることが可能となる。
As shown by the solid line in Figure 2 (.), when the electron beam (3) is welding the workpiece (4), a large amount of reflected electrons or secondary electrons (9) is generated, so As shown in Figure (h), the DC level of the detection wave 6 of the oscilloscope (13) is high. However, as shown by the broken line in Figure 2 (.), the electron beam (3゛) is When the object (4') deviates from the object (4'), the reflected electrons or secondary electrons (9') rapidly decrease in inverse proportion to the square of the distance, so the DC level of the detected waveform becomes low. ) is inspected by the misalignment detection circuit (15) shown in Fig. 1, and the electron beam (3
> can be stopped from occurring.

なお、上記実施例はこの発明を電子ビーム溶接機に適用
した例について述へたが、この発明を溶接以外の例えば
切断などに適用しても良い。また、コレクタの代わりに
XRセンサを用いても上記実施例と同様の効果を奏する
In the above embodiment, the present invention was applied to an electron beam welding machine, but the present invention may also be applied to other applications other than welding, such as cutting. Further, even if an XR sensor is used instead of the collector, the same effects as in the above embodiment can be obtained.

[発明の効果] 以上のように、この発明は、加工線検出装置の検出波形
のレベルの変化をモニタして電子ビームが被加工物から
外れたことを検出する目外れ検出回路を備えているので
、従来の電子ビーム加工機に簡単な目外れ検出回路を追
加するだけて加工室の壁を溶融することを防ぎ、また装
置を安価に構成できると云う効果を奏する。
[Effects of the Invention] As described above, the present invention includes a misalignment detection circuit that monitors changes in the level of the detection waveform of the processing line detection device and detects that the electron beam has deviated from the workpiece. Therefore, by simply adding a simple misalignment detection circuit to a conventional electron beam processing machine, it is possible to prevent the wall of the processing chamber from melting, and the apparatus can be constructed at a low cost.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明による電子ビーム溶接機の一実施例を
示す概略構成図、第2図は被溶接物の移動と検出波形の
直流レベルの関係を示す図、第3図は従来の電子ビーム
溶接機を示す概略構或図、第4図は波形変換部の電圧を
示す波形図である。 図において、(2)は電子銃、(3)は電子ビーム、(
4〉は被溶接物、(5)は集束コイル、(6〉は偏向コ
イル、(7)は溶接線、(8〉はコレクタ、〈9〉は反
射電子または二次電子、(13)はオシロスコープ、(
15)は目外れ検出回路である。 なお、図中、同一符号は同一、または相当部分を示す。
Fig. 1 is a schematic configuration diagram showing an embodiment of an electron beam welding machine according to the present invention, Fig. 2 is a diagram showing the relationship between the movement of the workpiece and the DC level of the detected waveform, and Fig. 3 is a diagram showing the relationship between the movement of the workpiece and the DC level of the detected waveform. FIG. 4 is a schematic diagram showing the welding machine, and is a waveform diagram showing the voltage of the waveform converter. In the figure, (2) is an electron gun, (3) is an electron beam, (
4> is the object to be welded, (5) is the focusing coil, (6> is the deflection coil, (7) is the welding wire, (8> is the collector, <9> is the reflected electron or secondary electron, and (13) is the oscilloscope. ,(
15) is a misalignment detection circuit. In addition, in the figures, the same reference numerals indicate the same or equivalent parts.

Claims (1)

【特許請求の範囲】[Claims] (1)、被加工物を加工する電子ビームを発生する電子
ビーム発生手段と、この電子ビーム発生手段と前記被加
工物の間に配置され、前記電子ビームを前記被加工物上
に集束させるとともに前記被加工物の加工線を横切るよ
うに前記電子ビームを走査させる集束・偏向手段と、こ
の集束・偏向手段と前記被加工物の間に配置され、前記
被加工物に射突した電子ビームの反射電子または二次電
子を捕捉して前記加工線を検出する加工線検出装置と、
この加工線検出装置と電気的に接続され、その検出波形
のレベルの変化をモニタして前記電子ビームが前記被加
工物から外れたことを検出する目外れ検出回路とを備え
たことを特徴とする電子ビーム加工機。
(1) an electron beam generating means for generating an electron beam for processing a workpiece; an electron beam generating means disposed between the electron beam generating means and the workpiece; and focusing the electron beam on the workpiece; a focusing/deflecting means for scanning the electron beam across the machining line of the workpiece; a focusing/deflecting means disposed between the focusing/deflecting means and the workpiece; a processed line detection device that detects the processed line by capturing reflected electrons or secondary electrons;
The method further comprises a misalignment detection circuit that is electrically connected to the processed line detection device and monitors changes in the level of the detected waveform to detect that the electron beam has come off the workpiece. Electron beam processing machine.
JP18895889A 1989-07-24 1989-07-24 Electron beam working machine Pending JPH0357574A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18895889A JPH0357574A (en) 1989-07-24 1989-07-24 Electron beam working machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18895889A JPH0357574A (en) 1989-07-24 1989-07-24 Electron beam working machine

Publications (1)

Publication Number Publication Date
JPH0357574A true JPH0357574A (en) 1991-03-12

Family

ID=16232906

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18895889A Pending JPH0357574A (en) 1989-07-24 1989-07-24 Electron beam working machine

Country Status (1)

Country Link
JP (1) JPH0357574A (en)

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