JPH0357956U - - Google Patents

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Publication number
JPH0357956U
JPH0357956U JP11860789U JP11860789U JPH0357956U JP H0357956 U JPH0357956 U JP H0357956U JP 11860789 U JP11860789 U JP 11860789U JP 11860789 U JP11860789 U JP 11860789U JP H0357956 U JPH0357956 U JP H0357956U
Authority
JP
Japan
Prior art keywords
ion beam
processing
sample
ion
processing chambers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11860789U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11860789U priority Critical patent/JPH0357956U/ja
Publication of JPH0357956U publication Critical patent/JPH0357956U/ja
Pending legal-status Critical Current

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  • Design And Manufacture Of Integrated Circuits (AREA)
  • Structure Of Printed Boards (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、この考案の一実施例に係るイオン処
理装置を部分的に示す縦断面図である。第2図は
、この考案の他の実施例に係るイオン処理装置を
部分的に示す縦断面図である。第3図は、従来の
イオン注入装置の一例を部分的に示す縦断面図で
ある。 2,2c……イオンビーム、4a〜4d……処
理室、6a〜6d……試料、8a〜8d……ホル
ダ。
FIG. 1 is a longitudinal sectional view partially showing an ion processing apparatus according to an embodiment of this invention. FIG. 2 is a longitudinal sectional view partially showing an ion processing apparatus according to another embodiment of the invention. FIG. 3 is a longitudinal sectional view partially showing an example of a conventional ion implantation device. 2, 2c...Ion beam, 4a-4d...Processing chamber, 6a-6d...Sample, 8a-8d...Holder.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] イオンビームの一つのビームラインに対して、
試料を保持するホルダをそれぞれ有していて当該
試料を前記イオンビームを用いて処理する処理室
を複数段直列に設け、かつ最終段以外の処理室内
のホルダを、イオンビームを後段側へ通過させる
ことができるように可動にしたことを特徴とする
イオン処理装置。
For one beam line of ion beam,
A plurality of processing chambers each having a holder for holding a sample and processing the sample using the ion beam are provided in series, and the holders in the processing chambers other than the final stage allow the ion beam to pass through to the subsequent stage side. An ion processing device characterized in that it is movable so that it can be moved.
JP11860789U 1989-10-09 1989-10-09 Pending JPH0357956U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11860789U JPH0357956U (en) 1989-10-09 1989-10-09

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11860789U JPH0357956U (en) 1989-10-09 1989-10-09

Publications (1)

Publication Number Publication Date
JPH0357956U true JPH0357956U (en) 1991-06-05

Family

ID=31666761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11860789U Pending JPH0357956U (en) 1989-10-09 1989-10-09

Country Status (1)

Country Link
JP (1) JPH0357956U (en)

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