JPH0358058B2 - - Google Patents
Info
- Publication number
- JPH0358058B2 JPH0358058B2 JP56023286A JP2328681A JPH0358058B2 JP H0358058 B2 JPH0358058 B2 JP H0358058B2 JP 56023286 A JP56023286 A JP 56023286A JP 2328681 A JP2328681 A JP 2328681A JP H0358058 B2 JPH0358058 B2 JP H0358058B2
- Authority
- JP
- Japan
- Prior art keywords
- angle
- plane
- crystal
- rays
- axis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000013078 crystal Substances 0.000 claims description 61
- 238000000034 method Methods 0.000 claims description 11
- 238000005259 measurement Methods 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 238000005162 X-ray Laue diffraction Methods 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Description
本発明は単結晶の切断面偏差角測定方法に関す
る。
単結晶体はその性質として異方性を示すものが
多い。異方性とは結晶の方位により機械的,電気
的あるいは光学的な性質が異なることである。こ
のような結晶の物性を効果的に利用する素子を得
るためには材料の所定の格子面に対し一定の方位
を持つて一定の角度で切り出す必要がある。例え
ば、通信機における発信周波数の制御あるいは時
間基準を得るための基準発振器等に用いられる水
晶共振子にあつては、所定の格子面、あるいは結
晶軸に対する切断面の角度によつて〇〇カツトと
いうように名称が与えられている。しかし、現実
には理想のカツトは行なわれにくく、理想の角度
から若干の偏りがあるのでこのような単結晶体の
切断面と結晶格子面との間の角度を測定するため
にX線の回折現象が利用されている。
まず第1図および第2図を参照して、従来の測
定方法の問題点に言及する。従来の測定方法は第
1図に示すように切断面に対する結晶格子面の傾
斜方向は入射X線の方向を含む結晶の回転軸に垂
直な平面(装置面B)と平行に整備された結晶が
測定対象に限られていた。第1図においてN→sは
切断面法線単位ベクトル、N→pは格子面法線単位
ベクトルを示し、破線で格子面を示してある。す
なわち従来方法では結晶の回転軸zと回転軸格子
面(破線)および切断面が平行になるように整備
された試料についてのみ回折を起すω回転角を求
めることにより偏差角δを求めていた。偏差角δ
はδ=ω−θで与えられる。ここにおいてθは所
定の格子面における既知のブラツグ角である。し
かし、第2図に示すように格子面が結晶回転軸と
平行でなく図のようにδ1だけ傾いていると回折平
面(入射X線X→iと回折X線X→dの張る面)
OPQO′はもはや装置面とは平行ではなくなり、
格子面により回折を起こすω回転角はω=θ0+δ2
となる。
ここでθ0は見掛けのブラツグ角であり、このθ0
とブラツグ角θとは次式で示す関係にある。
sinθ0=sinθcosδ2/cosδ=sinθ
cosδ2√1+2 1+2 2
したがつて、格子面が結晶回転軸と平行でない
ことを知らずに、あるいは良く平行に整備されて
ない試料に対し、回折条件を満足するω回転角の
観測により偏差角δを求めると誤まつた判定によ
り良品が不良品に、あるいは不良品が良品として
処理されるおそれがある。また上記式からδ1,δ2
を求めることもできない。
従来結晶表面(切断面)に対し格子面の傾きの
方向が未知である試料はラウエ法により試験が行
なわれていた。しかし、ラウエ法は写真法であり
かなりの露出時間を要し、かつ暗室での作業も加
わり能率よく試験を行ない得ない欠点があつた。
また測定精度も劣つている。
本発明の目的は前述したような傾きのある場合
における測定上の問題を解決した単結晶の切断面
偏差角測定方法を提供することにある。
前記目的を達成するために、本発明による単結
晶の切断面偏差角測定方法は、
回転手段により即知の単結晶をその切断表面と
平行なω回転軸まわりに回転させ、
X線源からのX線を前記ω回転軸に直角な細径
のビームとして前記切断表面を照射し、
検出器により前記切断表面で回折した回折X線
の強度が最大になるときの結晶の回転角(ω)と
前記ω回転軸に垂直な平面に対する前記回折X線
の角度(φ)を検出し、
前記(ω)、(φ)および前記回折の原因となつ
た格子面のブラツグ角(θ)を
δ=cos-1(sinθcos
ω+cos θcos ωcos φ)
に代入し、
前記結晶切断表面と前記格子面の偏差角(δ)
を求めるように構成されている。
上記構成によれば、従来方法によつては不可能
であつた複雑な角度で傾いている結晶面の偏差角
を迅速に、また正確に測定でき、本発明の目的は
完全に達成できる。
以下、図面等を参照して本発明方法とその方法
を実施する装置とともにさらに詳しく説明する。
第3図Aは本発明方法を実施する第1の実施例
装置を示す斜視図である装置のω回転軸をz軸と
して、X線はx軸にそつて入射するように、点状
のX線源Sからコリメータ6やスリツトによつて
点状に制限され、試料結晶1に入射する。試料結
晶1はその表面(切断面)がz軸を含むように配
置される。試料結晶1が矩形をしている場合は図
示のような場合はL字形の結晶ホルダブロツクに
より実現できる。この結晶ホルダブロツク2によ
り結晶の底面はxy平面と平行に配置される。な
お、試料結晶1の形状が円柱状をなしている場合
は切断面をz軸と一致させるとともに円柱の軸方
向がxy平面と平行になるように結晶を保持する。
このようにすることによりX線は(x,y,z)
座標の原点に照射されるとともに結晶の外形を代
表する座標(a,b,c)を定めた場合(x,
y,z)座標との対応がつく。
この装置はω回転モータ5,ウオーム4,同ホ
イル3よりなり結晶1をz軸のまわりに回転させ
る機構(以下単にω回転機構という)を有してお
り結晶表面と入射X線のなす角ωを観測すること
ができる。入射X線の方向に対しxy平面内で2θ
(所定の格子面に対する回折角)の角度方向にX
線検出器8を配置することにより格子面で回折さ
れたX線を検出することができる。格子面がz軸
(回転軸)と平行な場合、回折X線の方向はxy平
面(装置面)内にあるが、z軸に対して傾きを持
つている場合は傾きの大きさに応じ、入射X線の
方向を軸に半頂角が2θである直円錐の母線に沿つ
て放射される。
X線検出器8はX線を検出し得る区域が大きさ
を持ち、この範囲に入射すれば回折X線を検出し
得るものである。
スリツト板10はX線検出器8の前面に設けら
れ所定の格子面から回折されたX線だけを通すよ
うに溝孔10aが設けられている第3図のように
スリツト板10をyz平面に平行に配置した場合
は前記溝孔10aは円錐との交線の円弧(半径=
Ltan2θ)に沿つて適当幅をもつて溝孔により形
成される。このようにすることにより、一定の格
子面に対する回折角(2θ)に近い別の格子面によ
る回折線はX線検出器8の第3図Bに破線で示す
有感域8aには入射せずスリツト板10により遮
断される。
次に格子面により回折されたX線がX線検出器
10のどの位置に入射しているかを調べるかによ
りxy平面(装置面)と回折平面(入射X線と回
折X線の方向が張る面)のなす角φの観測につい
て説明する。この実施例装置では前記φの観測の
ためにx軸のまわりに回転するセクタ7を設けて
ある。まず前述したω回転機構により結晶1を回
転させ格子面から回折されたX線強度が最大とな
るωの角度位置に結晶を固定する。このω回転の
際はセクタ7は円弧状の溝10aをふさがない位
置に外しておく。次にセクタ7をセクタモータ9
に回転させたセクタ7の遮断面により回折スポツ
トが半割り(X線強度が半分)になる回転角を検
出してセクタ7を固定する。このときのy軸と遮
断面第3図Bに示すセクタ7の下端面7aのなす
角がφである。遮断面とy軸が平行である第3図
Bの状態をφ=0とし、この状態より反時計回り
の回転角+角、時計まわりの回転角を一角とす
る。
次に第4図を参照して前述したφ角を観測する
第2の実施例装置について説明する。この実施例
は位置感応形比例計数管11を用いてある。
先に説明した第1の実施例と共通する部分には
同一の符号を付してある。第4図B,Cに示すよ
うに、格子面により回折されたX線が比例計数管
11の芯線11aに向つて入射するように、芯線
11aは円弧状に張られ、X線の入射窓11bも
入射X線を妨げないよう適当な幅を持つて円弧状
に設けられている。この比例計数管11の出力は
ブリアンプ12,13を介して位置分析回路14
に接続されており、その分析結果は強度および入
射表示装置15により表示される。この第2の実
施例装置においても前述と同様にして、ω回転機
構により、結晶1を回転させ回折X線の強度が最
大になるところのω位置角度を検出する。
前記比例計数管11の出力はプリアンプ12,
13により位置分析回路14に接続され、両アン
プの出力の差を演算することにより回折X線の
xy平面よりの高さが検出されると、φ角が求め
られ、15により強度と位置の表示が行われる。
以上のようにしてω角およびφ角を知れば第2
図に示す結晶表面と格子面とのなす角、すなわち
偏差角δおよび傾きの方向4を後述するように演
算できる。また結晶の形状が矩形である場合に、
結晶の側面と格子面の交線と結晶表面とのなす角
δ1、および底面と格子面の交線と結晶表面とのな
す角δ2も後述のように演算できる。これら一連の
測定手順は前記ω角,φ角を観測とともに所定の
プログラムにしたがつて行なわれ、δ,δ1,δ2,
ψは自動的に演算表示される。この演算にもとず
く自動選別も可能である。
次に前述したω角、φ角によりδ,δ1,δ2,ψ
が求められることを説明する。以下の説明におい
て記号はすでに説明したものであるが以下のよう
に定義して用いることにする。
(a,b,c);結晶の外形を代表する座標。
b軸は結晶表面に垂直な単位ベクトルN→sと
平行。
(x,y,z);装置を代表する座標。
x軸→入射X線と平行
z軸→ω回転回転軸
X→i;入射X線単位ベクトル
X→d;回折X線単位ベクトル。
N→p;回折格子面法線単位ベクトル
(格子面ノルマル)
N→s;結晶表面法線単位ベクトル
(結晶面ノルマル)
第5図を参照してX→i,X→dが与えられたとき
N→p(格子面ノルマル)を求め、N→s(結晶表面ノ
ルマル)に対する傾きの大きさ、および方向を計
算する。まず、回折外子面が結晶表面に対して傾
むいているため、回折平面(OPQO′)が装置面
(x,y平面)に対しx軸のまわりにφだけ回転
した平面となる場合を考える。
直交座標系(x,y,z)に対し、X→iはx軸
に平行で方向が逆であるから
X→i=−1
0
0 ……(1)
X→dはX→iに対し2θの角度をなしx軸のまわりに
φだけ回転した方向だからただちに
X→d=−cos2θ
sin2θcosφ
sin2θsinφ=2sin2θ−1
2sinθcosθcosφ
2sinθcosθsinφ ……(2)
X→i,X→dを知ることによりNpを求めることが
できる。N→pはX→i,X→dの張る平面(回折平
面)内になければならないので、N→pはX→i,X→
dの一次結合で表わすことができる。
N→p=aX→i+bX→d ……(3)
係数a,bは次の条件式により求まる。
−(X→i・N→p)=(X→d・N→p) ……(4)
(N→p・N→p)=1 ……(5)
実行すると(4)式より
(a+b)〔X→i・X→d+1〕〕0
〔 〕≠0であるからa+b=0
∴a=−b
(5)式より
a2+b2+2ab(X→i×X→d)=1
a=−b,(X→i・X→d)=cos2θより
2(1−cos2θ)a2=1
∴a=±1/2sinθ,b=〓1/2sinθ
(複合同順)a→+,b→−符号は−N→bを示す
ので、
N→p=−1/2sinθX→i+1/2sinθX
→d
=1/2sinθ−−1
0
0+−cos2θ
sin2θ cosφ
sin2θ sinφ=sinθ
cosθ sinφ
cosθ sinφ ……(6)
一方、z軸のまわりに結晶を回転し、入射X線
X→iと結晶面(a軸)とのなす角がωのとき回折
条件を満足したとするとN→sは以下のように求ま
る。ω回転による(x,y,z)座標と(a,
b,c)座標の関係は直交変換ωにより、次で表
わされる。
x
y
z=ωa
b
c ……(7)
ω=cosω sinω0
−sinωcosω0
0 0 1 ……(8)
N→sはb軸に平行であるから(a,b,c)座標
系で
N→sa,b,c=0
1
0 ……(9)
従つて、(x,y,z)座標系でN→sは
N→s=sinω
cosω
0 ……(10)
N→pとN→sのなす角をδとすると(6)式と(10)式よ
り
N→p・N→s=cosδ=sinθsinω
+cosθcosωcosφ
∴δ=cos-1(sinθsinω
+cosθcosωcosφ) ……(11)
傾きの方向(6)式で示されるが(6)式は(x,y,
z)座標で示され不便である。そこで、第6図の
ように結晶の外形を代表する座標系(a,b,
c)でNpを表わしてやると良い。
第6図から容易に理解できるようにac平面は
結晶の表面と一致し、これを直角なb軸はNs(結
晶面ノルマル)と平行、ω回転はc軸まわりに行
なわれ、N→sは次式で与えられる。
N→sa,b,c=0
1
0
(7)式の逆変換を行なう。
ω-1=cosω
sinω
0 −sinω
cosω
0 0
0
1 ……(12)
N→pa,b,c=ω-1N→px,y,z=sinθ cosω−c
osθsinωcosφ
sinθ sinω+cosθcosωcosφ
cosθ sinφ ……(13)
(13)式の各成分はそれぞれa,b,c軸方向と
N→pa,b,cの方向余弦を示している。
当然のことながら(N→pa,b,c・N→sa,b,c)は(11)
式に
帰着する。
(13)式は結晶表面に対する格子面の傾きの大
きさと方向を示すものであるがまだ実際的でな
い。そこで第7図に示すように、結晶表面上での
最大傾斜の方向とa軸とのなす角ψ、また図のよ
うに結晶の外形が瀬正方体である場合、側面と格
子面の交線と結晶表面のなす角δ1および底面と格
子面の交線と結晶表面とのなす角δ2を求めるのは
具体的で有意義である。
N→pa.b.c(ap,bp,cp)とすると第7図より
tanx=cp/−ap ……(14)
tanδ1=cp/bp ……(15)
tanδ2=−ap/bp ……(16)
cosδ=bp ……(17)
(13)〜(17)式によりδ,δ1,δ2,ψは以下
のように与えられる。
δ=cos-1(sinθcosω+cosθcosωcosφ)……(11)
δ1=tan-1(cosθ sinφ/sinθsinω+cosθcosωcos
φ)……(18)
δ2=tan-1(cosθsinωcosφ−sinθcosω/sinθsin
ω+cosωcosφ)……(19)
ψ=tan-1(cosθ sinφ/cosθsinωcosφ−sinθcos
ω)
=tan-1(tanδ1/tanδ2) ……(20)
ただしψ角はδ1,δ2の符号により次に分類する
式を適用する。
The present invention relates to a method for measuring a deviation angle of a cut plane of a single crystal. Many single crystals exhibit anisotropy as a property. Anisotropy refers to differences in mechanical, electrical, or optical properties depending on crystal orientation. In order to obtain an element that effectively utilizes the physical properties of such a crystal, it is necessary to cut the material at a certain orientation and at a certain angle with respect to a predetermined lattice plane. For example, in the case of a crystal resonator used as a reference oscillator for controlling the transmission frequency in communication equipment or obtaining a time reference, the angle of the cut plane with respect to the predetermined lattice plane or crystal axis is called The name is given as follows. However, in reality, it is difficult to make an ideal cut, and there is a slight deviation from the ideal angle. phenomenon is used. First, with reference to FIGS. 1 and 2, problems with the conventional measurement method will be discussed. In the conventional measurement method, as shown in Figure 1, the crystal is arranged so that the inclination direction of the crystal lattice plane with respect to the cut plane is parallel to the plane (device plane B) perpendicular to the crystal rotation axis that includes the direction of the incident X-ray. The measurement target was limited. In FIG. 1, N→s indicates a unit vector normal to the cut plane, N→p indicates a unit vector normal to the lattice plane, and the lattice plane is indicated by a broken line. That is, in the conventional method, the deviation angle δ was determined by determining the ω rotation angle that causes diffraction only for a sample prepared so that the rotation axis z of the crystal, the rotation axis lattice plane (broken line), and the cut plane are parallel. deviation angle δ
is given by δ=ω−θ. where θ is the known Bragg angle in a given lattice plane. However, as shown in Figure 2, if the lattice plane is not parallel to the crystal rotation axis but tilted by δ 1 as shown in the figure, the diffraction plane (the plane where the incident X-rays X→i and the diffracted X-rays X→d span)
OPQO′ is no longer parallel to the device plane;
The ω rotation angle that causes diffraction by the lattice plane is ω = θ 0 + δ 2
becomes. Here θ 0 is the apparent Bragg angle, and this θ 0
and Bragg angle θ have the relationship shown by the following equation. sinθ 0 = sinθcosδ 2 /cosδ=sinθ cosδ 2 √1+ 2 1 + 2 2 Therefore, if the lattice plane is not parallel to the crystal rotation axis or is not well arranged in parallel, the diffraction conditions may be changed. If the deviation angle δ is determined by observing the ω rotation angle that satisfies the following, there is a risk that a good product will be treated as a defective product or a defective product will be treated as a non-defective product due to incorrect judgment. Also, from the above formula, δ 1 , δ 2
I can't even ask for it. Conventionally, samples in which the direction of inclination of the lattice plane with respect to the crystal surface (cut plane) was unknown were tested using the Laue method. However, the Laue method is a photographic method that requires a considerable amount of exposure time and requires work in a dark room, making it difficult to conduct tests efficiently.
Furthermore, the measurement accuracy is also poor. An object of the present invention is to provide a method for measuring a deviation angle of a cut plane of a single crystal, which solves the measurement problems in the case where there is an inclination as described above. In order to achieve the above object, the method for measuring the deviation angle of a cutting surface of a single crystal according to the present invention includes: rotating a conventional single crystal around an ω rotation axis parallel to its cutting surface using a rotating means; The cut surface is irradiated with X-rays as a narrow beam perpendicular to the ω rotation axis, and the rotation angle (ω) of the crystal at which the intensity of the diffracted X-rays diffracted by the cut surface is maximized by a detector. The angle (φ) of the diffracted X-ray with respect to a plane perpendicular to the ω rotation axis is detected, and the Bragg angle (θ) of the lattice plane that caused the diffraction is calculated as δ=cos. -1 (sinθcos ω+cos θcos ωcos φ) and the deviation angle (δ) between the crystal cutting surface and the lattice plane
It is configured to ask for. According to the above configuration, it is possible to quickly and accurately measure the deviation angle of a crystal plane tilted at a complicated angle, which was impossible using conventional methods, and the object of the present invention can be completely achieved. DESCRIPTION OF THE PREFERRED EMBODIMENTS The method of the present invention and the apparatus for carrying out the method will be described in more detail below with reference to the drawings and the like. FIG. 3A is a perspective view showing the first embodiment of the apparatus for carrying out the method of the present invention. The radiation from the radiation source S is restricted to a point by the collimator 6 and the slit, and is incident on the sample crystal 1. The sample crystal 1 is arranged so that its surface (cut surface) includes the z-axis. If the sample crystal 1 is rectangular, it can be realized by an L-shaped crystal holder block as shown in the figure. With this crystal holder block 2, the bottom surface of the crystal is arranged parallel to the xy plane. Note that when the sample crystal 1 has a cylindrical shape, the crystal is held so that the cut plane coincides with the z-axis and the axial direction of the cylinder is parallel to the xy plane.
By doing this, the X-rays become (x, y, z)
When the coordinates (a, b, c) that are irradiated to the origin of the coordinates and represent the external shape of the crystal are determined (x,
y, z) coordinates. This device is composed of an ω rotation motor 5, a worm 4, and a foil 3, and has a mechanism for rotating the crystal 1 around the z-axis (hereinafter simply referred to as ω rotation mechanism), and the angle ω between the crystal surface and the incident X-ray is can be observed. 2θ in the xy plane relative to the direction of the incident X-ray
X in the angular direction (diffraction angle with respect to a given lattice plane)
By arranging the ray detector 8, it is possible to detect X-rays diffracted by the lattice plane. When the lattice plane is parallel to the z-axis (rotation axis), the direction of the diffracted X-rays is within the xy plane (device plane), but when it is tilted with respect to the z-axis, depending on the magnitude of the tilt, The radiation is radiated along the generatrix of a right circular cone whose half apex angle is 2θ with the direction of the incident X-ray as its axis. The X-ray detector 8 has a size that allows it to detect X-rays, and can detect diffracted X-rays if the X-rays are incident within this range. The slit plate 10 is provided in front of the X-ray detector 8, and is provided with a slot 10a to allow only the X-rays diffracted from a predetermined grating plane to pass through.The slit plate 10 is placed in the yz plane as shown in FIG. When arranged in parallel, the slot 10a has a circular arc (radius =
It is formed by a slot with an appropriate width along Ltan2θ). By doing this, diffraction lines from another lattice plane that are close to the diffraction angle (2θ) with respect to a certain lattice plane do not enter the sensitive area 8a of the X-ray detector 8 shown by the broken line in FIG. 3B. It is blocked by the slit plate 10. Next, depending on where on the X-ray detector 10 the X-rays diffracted by the lattice plane are incident, the xy plane (device plane) and the diffraction plane (the plane where the directions of the incident X-rays and the diffracted ) will be explained about the observation of the angle φ. The device of this embodiment is provided with a sector 7 that rotates around the x-axis for observing the φ. First, the crystal 1 is rotated by the ω rotation mechanism described above, and the crystal 1 is fixed at an angular position of ω, where the intensity of X-rays diffracted from the lattice plane is maximized. During this ω rotation, the sector 7 is removed to a position where it does not block the arcuate groove 10a. Next, move sector 7 to sector motor 9.
The sector 7 is fixed by detecting the rotation angle at which the diffraction spot is halved (the X-ray intensity is halved) by the cut-off surface of the sector 7 which has been rotated. At this time, the angle formed by the y-axis and the lower end surface 7a of the sector 7 shown in the cut-off plane FIG. 3B is φ. The state in FIG. 3B where the blocking plane and the y-axis are parallel is set to φ=0, and from this state, the counterclockwise rotation angle + angle and the clockwise rotation angle are set as one angle. Next, a second embodiment of the apparatus for observing the φ angle mentioned above will be explained with reference to FIG. This embodiment uses a position sensitive proportional counter 11. The same reference numerals are given to parts common to the first embodiment described above. As shown in FIGS. 4B and 4C, the core wire 11a is stretched in an arc shape so that the X-rays diffracted by the lattice plane enter the core wire 11a of the proportional counter tube 11, and the X-ray entrance window 11b It is also provided in an arc shape with an appropriate width so as not to obstruct the incident X-rays. The output of this proportional counter 11 is sent to a position analysis circuit 14 via preamplifiers 12 and 13.
The analysis results are displayed by the intensity and incidence display device 15. In the second embodiment, the crystal 1 is rotated by the ω rotation mechanism in the same manner as described above, and the ω position angle at which the intensity of the diffracted X-rays is maximized is detected. The output of the proportional counter tube 11 is supplied to a preamplifier 12,
13 to the position analysis circuit 14, and calculates the difference between the outputs of both amplifiers to detect the diffracted X-rays.
When the height from the xy plane is detected, the φ angle is determined, and the intensity and position are displayed using 15. If you know the ω angle and φ angle as described above, the second
The angle between the crystal surface and the lattice plane shown in the figure, that is, the deviation angle δ and the direction of inclination 4 can be calculated as described below. Also, when the crystal shape is rectangular,
The angle δ 1 between the intersection line between the side surface of the crystal and the lattice plane and the crystal surface, and the angle δ 2 between the intersection line between the bottom plane and the lattice plane and the crystal surface can also be calculated as described below. These series of measurement procedures are performed according to a predetermined program while observing the ω angle and φ angle, and δ, δ 1 , δ 2 ,
ψ is automatically calculated and displayed. Automatic selection based on this calculation is also possible. Next, using the ω angle and φ angle mentioned above, δ, δ 1 , δ 2 , ψ
Explain what is required. In the following explanation, the symbols have already been explained, but they will be defined and used as follows. (a, b, c); Coordinates representing the external shape of the crystal. The b-axis is parallel to the unit vector N→s perpendicular to the crystal surface. (x, y, z); Coordinates representing the device. x-axis → parallel to incident X-ray z-axis → ω rotation rotational axis X → i; incident X-ray unit vector X → d; diffraction X-ray unit vector. N→p; unit vector normal to the diffraction lattice surface (lattice surface normal) N→s; unit vector normal to the crystal surface (crystal surface normal) When X→i and X→d are given with reference to Figure 5 N→p (lattice plane normal) is determined, and the magnitude and direction of the inclination with respect to N→s (crystal surface normal) are calculated. First, consider the case where the diffraction plane (OPQO') is rotated by φ around the x-axis with respect to the device plane (x, y plane) because the outer diffraction plane is tilted with respect to the crystal surface. . For the orthogonal coordinate system (x, y, z), X→i is parallel to the x-axis and the direction is opposite, so X→i=-1 0 0 ...(1) X→d is relative to X→i Since it is a direction that forms an angle of 2θ and is rotated by φ around the x-axis, immediately can be found. N→p must be within the plane (diffraction plane) defined by X→i, X→d, so N→p is X→i, X→
It can be expressed as a linear combination of d. N→p=aX→i+bX→d...(3) Coefficients a and b are determined by the following conditional expressions. −(X→i・N→p)=(X→d・N→p) ...(4) (N→p・N→p)=1 ...(5) When executed, from equation (4) (a+b ) [X→i・X→d+1]]0 Since [ ]≠0, a+b=0 ∴a=−b From equation (5), a 2 +b 2 +2ab(X→i×X→d)=1 a= -b, (X→i・X→d)=cos2θ 2(1−cos2θ)a 2 =1 ∴a=±1/2sinθ, b=〓1/2sinθ (compound same order) a→+, b→ -The sign indicates -N→b, so N→p=-1/2sinθX→i+1/2sinθX
→d = 1/2sinθ−−1 0 0+−cos2θ sin2θ cosφ sin2θ sinφ=sinθ cosθ sinφ cosθ sinφ ……(6) On the other hand, rotate the crystal around the z-axis, and rotate the incident X-ray X→i and the crystal plane ( If the diffraction condition is satisfied when the angle formed with the a-axis is ω, then N→s can be found as follows. (x, y, z) coordinates and (a,
b, c) The relationship between the coordinates is expressed as follows by orthogonal transformation ω. x y z=ωa b c ...(7) ω=cosω sinω0 −sinωcosω0 0 0 1 ...(8) Since N→s is parallel to the b axis, N→s in the (a, b, c) coordinate system a,b,c =0 1 0 ...(9) Therefore, in the (x, y, z) coordinate system, N→s is N→s=sinω cosω 0 ...(10) N→p and N→s If the angle formed by Equation (6) is (x, y,
z) It is inconvenient because it is indicated by coordinates. Therefore, as shown in Figure 6, the coordinate system (a, b,
It is good to express Np by c). As can be easily understood from Figure 6, the ac plane coincides with the surface of the crystal, the b axis perpendicular to this is parallel to Ns (crystal surface normal), ω rotation is performed around the c axis, and N→s is It is given by the following formula. N→s a,b,c =0 1 0 Inverse transformation of equation (7) is performed. ω -1 = cosω sinω 0 −sinω cosω 0 0 0 1 ...(12) N→p a,b,c =ω -1 N→p x,y,z = sinθ cosω−c
osθsinωcosφ sinθ sinω+cosθcosωcosφ cosθ sinφ (13) Each component of equation (13) indicates the direction cosine of the a, b, and c axis directions and N→p a, b, and c, respectively. Naturally, (N→p a,b,c・N→s a,b,c ) is (11)
It comes down to the formula. Equation (13) indicates the magnitude and direction of the inclination of the lattice plane with respect to the crystal surface, but it is not yet practical. Therefore, as shown in Figure 7, the angle ψ between the direction of maximum inclination on the crystal surface and the a-axis, and if the external shape of the crystal is a square parallelepiped as shown in the figure, the intersection line between the side surface and the lattice plane. It is specific and meaningful to determine the angle δ 1 formed by the crystal surface and the angle δ 2 formed between the intersection line of the base and the lattice plane and the crystal surface. If N→p a . b . c (a p , b p , c p ), from Figure 7 tanx=c p /−a p ……(14) tanδ 1 = c p /b p ……(15) tan δ 2 =−a p /b p (16) cos δ = b p (17) δ, δ 1 , δ 2 , and ψ are given as follows using equations (13) to (17). δ=cos -1 (sinθcosω+cosθcosωcosφ)...(11) δ 1 = tan -1 (cosθ sinφ/sinθsinω+cosθcosωcos
φ)……(18) δ 2 = tan -1 (cosθsinωcosφ−sinθcosω/sinθsin
ω+cosωcosφ)……(19) ψ=tan -1 (cosθ sinφ/cosθsinωcosφ−sinθcos
ω) = tan -1 (tan δ 1 /tan δ 2 ) ...(20) However, for the ψ angle, the following formulas are applied depending on the signs of δ 1 and δ 2 .
【表】
以上説明したように本発明ではωとφを測定す
ることにより、格子面と切断表面のなす角δを測
定できる。このδは結晶の外形が正方体でない結
晶、例えば円柱状,球状の場合にも外形を代表す
る座標を前述のように定めることにより適用でき
る。この場合も前従した(11),(18),(19),
(20)式の示すアルゴリズムにより(θ,ω,φ)
の関数としてただちに演算表示できるものであ
る。
したがつて前述したラウエ法に比較して、短時
間で正確な測定が可能となり振動子の生産管理な
どにも好適に利用可能である。[Table] As explained above, in the present invention, by measuring ω and φ, the angle δ between the lattice plane and the cut surface can be measured. This δ can be applied even when the external shape of the crystal is not a square, such as a cylinder or a sphere, by determining the coordinates representing the external shape as described above. In this case as well, (11), (18), (19),
By the algorithm shown in equation (20), (θ, ω, φ)
It can be immediately calculated and displayed as a function of . Therefore, compared to the above-mentioned Laue method, accurate measurement can be performed in a short time, and it can be suitably used for production control of vibrators.
第1図および第2図は従来の偏差角測定装置の
問題点を説明するための略図である。第3図は発
明方法を実施するための第1の実施例装置を示す
図であつて、同図Aは斜視図、同図Bは検出器の
正面図、同図Cは結晶と検出器の関係を示す平面
図である。第4図は本発明方法を実施するための
第2の実施例装置を示す図であつて、同図Aは斜
視図、同図Bは検出器の正面図、同図Cは結晶と
検出器の関係を示す平面図である。第5図,第6
図,第7図はそれぞれωおよびφから偏差角が演
算できることを説明するための略図である。
1……試料結晶、2……結晶ホルダブロツク、
3……ウオームホイル、4……ウオーム、5……
ω回転モータ、6……コリメータ、7……セク
タ、8……X線検出器、9……セクタモータ、1
0……スリツト板、11……比例計数管、12,
13……前置増幅器、14……位置分析回路、1
5……強度位置表示装置。
FIG. 1 and FIG. 2 are schematic diagrams for explaining the problems of the conventional deviation angle measuring device. FIG. 3 is a diagram showing the first embodiment of the apparatus for carrying out the method of the invention, in which FIG. 3A is a perspective view, FIG. 3B is a front view of the detector, and FIG. FIG. 3 is a plan view showing the relationship. FIG. 4 shows a second embodiment of the apparatus for carrying out the method of the present invention, in which FIG. A is a perspective view, FIG. B is a front view of a detector, and FIG. C is a crystal and a detector. FIG. Figures 5 and 6
7 and 7 are schematic diagrams for explaining that the deviation angle can be calculated from ω and φ, respectively. 1...Sample crystal, 2...Crystal holder block,
3...Warm foil, 4...Worm, 5...
ω rotation motor, 6...Collimator, 7...Sector, 8...X-ray detector, 9...Sector motor, 1
0...Slit plate, 11...Proportional counter tube, 12,
13...Preamplifier, 14...Position analysis circuit, 1
5...Intensity position display device.
Claims (1)
と平行なω回転軸まわりに回転させ、 X線源からのX線を前記ω回転軸に直角な細径
のビームとして前記切断表面を照射し、 検出器により前記切断表面で回折した回折X線
の強度が最大になるときの結晶の回転角ωと前記
ωの回転軸に垂直な平面に対する前記回折X線の
角度(φ)を検出し、 下記の式に前記ω,φおよび前記回折の原因と
なつた格子面のブラツグ角(θ)を代入し、 前記結晶切断表面と前記格子面の偏差角(δ)
を求めるように構成した単結晶の切断面偏差角測
定方法。 δ=cos-1(sinθcosω +cosθcosωcosφ)[Claims] 1. Rotating a known single crystal around an ω rotation axis parallel to its cutting surface by means of a rotation means, and converting X-rays from an X-ray source into a narrow beam perpendicular to the ω rotation axis. The cut surface is irradiated, and the rotation angle ω of the crystal when the intensity of the diffracted X-rays diffracted at the cut surface by a detector is maximized, and the angle (φ) of the diffracted X-rays with respect to a plane perpendicular to the rotation axis ), and by substituting the above ω, φ and the Bragg angle (θ) of the lattice plane that caused the diffraction into the following equation, the deviation angle (δ) between the crystal cut surface and the lattice plane is obtained.
A method for measuring the deviation angle of a cut plane of a single crystal configured to find the following. δ=cos -1 (sinθcosω +cosθcosωcosφ)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2328681A JPS57136150A (en) | 1981-02-18 | 1981-02-18 | Method for measuring deviation angle of cut plane of single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2328681A JPS57136150A (en) | 1981-02-18 | 1981-02-18 | Method for measuring deviation angle of cut plane of single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57136150A JPS57136150A (en) | 1982-08-23 |
| JPH0358058B2 true JPH0358058B2 (en) | 1991-09-04 |
Family
ID=12106356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2328681A Granted JPS57136150A (en) | 1981-02-18 | 1981-02-18 | Method for measuring deviation angle of cut plane of single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57136150A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3904543B2 (en) | 2003-10-14 | 2007-04-11 | 株式会社リガク | X-ray crystal orientation measuring apparatus and X-ray crystal orientation measuring method |
| US7285168B2 (en) | 2004-08-10 | 2007-10-23 | Efg Elektrotechnische Fabrikations-Und Grosshandelsgesellschaft Mnb | Method and apparatus for the measurement, orientation and fixation of at least one single crystal |
| CN105092583A (en) * | 2015-08-13 | 2015-11-25 | 中国振华集团永光电子有限公司(国营第八七三厂) | Silicon single crystal orientation deviation testing device with common light source |
-
1981
- 1981-02-18 JP JP2328681A patent/JPS57136150A/en active Granted
Non-Patent Citations (1)
| Title |
|---|
| ELECTRONICS * |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57136150A (en) | 1982-08-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH05107203A (en) | X-ray apparatus for evaluating surface condition of sample | |
| JPH0358058B2 (en) | ||
| Bauch et al. | Innovative Analysis of X‐ray Microdiffraction Images on Selected Applications of the Kossel Technique | |
| JP2005528594A (en) | X-ray diffraction apparatus and method | |
| JPH08313458A (en) | X-ray equipment | |
| JPH0459581B2 (en) | ||
| JP3629542B2 (en) | X-ray fluorescence analyzer | |
| JPH11304729A (en) | X-ray measuring method and X-ray measuring device | |
| US3504178A (en) | Method for determining crystall-ographic orientation | |
| JP3664483B2 (en) | Pole measurement method | |
| JPH0517497B2 (en) | ||
| JPH06109667A (en) | Method for determining crystal orientation of single crystal ingot | |
| JPH02266249A (en) | Method for measuring x-ray diffraction of crystal plane | |
| JPH05312736A (en) | Apparatus and method of x-ray measurement of single crystal orientation | |
| SU522458A1 (en) | X-ray three-crystal spectrometer | |
| JPH05288616A (en) | X-ray residual stress measuring method | |
| JP2003149179A (en) | Orientation measuring device for monocrystal | |
| JPH0459582B2 (en) | ||
| JPS62228152A (en) | X-ray diffracting apparatus and its use | |
| JPH08254510A (en) | Nondestructive inspection and measuring apparatus | |
| JPH03125948A (en) | Method for precisely measuring lattice constant | |
| JPH0217403A (en) | Buried depth measuring method | |
| JPH11248652A (en) | X-ray diffractometry and X-ray diffractometer | |
| Bairsto | The adjustment of a crystal from x-ray rotation photographs | |
| JP2003254917A (en) | X-ray measurement device |