JPH0358535B2 - - Google Patents

Info

Publication number
JPH0358535B2
JPH0358535B2 JP9795285A JP9795285A JPH0358535B2 JP H0358535 B2 JPH0358535 B2 JP H0358535B2 JP 9795285 A JP9795285 A JP 9795285A JP 9795285 A JP9795285 A JP 9795285A JP H0358535 B2 JPH0358535 B2 JP H0358535B2
Authority
JP
Japan
Prior art keywords
insulator
conductive wire
auxiliary electrode
bonding
thyristor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP9795285A
Other languages
Japanese (ja)
Other versions
JPS61256736A (en
Inventor
Yoshiaki Tsunoda
Hideo Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP60097952A priority Critical patent/JPS61256736A/en
Publication of JPS61256736A publication Critical patent/JPS61256736A/en
Publication of JPH0358535B2 publication Critical patent/JPH0358535B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/015Manufacture or treatment of bond wires
    • H10W72/01515Forming coatings
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/01Manufacture or treatment
    • H10W72/015Manufacture or treatment of bond wires
    • H10W72/01551Changing the shapes of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07551Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/5363Shapes of wire connectors the connected ends being wedge-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/541Dispositions of bond wires
    • H10W72/5438Dispositions of bond wires the bond wires having multiple connections on the same bond pad
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/551Materials of bond wires
    • H10W72/552Materials of bond wires comprising metals or metalloids, e.g. silver
    • H10W72/5524Materials of bond wires comprising metals or metalloids, e.g. silver comprising aluminium [Al]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/59Bond pads specially adapted therefor

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Thyristors (AREA)
  • Wire Bonding (AREA)
  • Die Bonding (AREA)

Abstract

PURPOSE:To enhance the reliability of the device, in a semiconductor device having an auxiliary electrode in a thyristor, a power transistor and the like, by bonding a conductor wire, which is attached to the auxiliary electrode that is held between main electrodes, on at least two parts, coating the wire with an insulator, and exposing the conductor wire at the intermediate part. CONSTITUTION:An auxiliary electrode 5 is held between main electrodes 2 and 3 in the structure of a thyristor, a power transistor and the like. The following procedure is used when a conductor wire 6 made of Al and the like is bonded to the auxiliary electrode 5. At least two parts 6a or more are used as bonding parts. The entire surface including these parts is coated with an insulator 7 such as silicone rubber. A part of the conducting wire 6, which is connected between the bonding parts, is not embedded. Said part 6b is floated and exposed on the insulator 7. Therefore, the exposed part serves the role of cushion, and the bonding parts 6a are not deteriorated.

Description

【発明の詳細な説明】 [発明の技術分野] この発明は、半導体装置に関し、特にサイリス
タやパワートランジスタのごとき補助電極を有す
る電力用半導体装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a semiconductor device, and particularly to a power semiconductor device having an auxiliary electrode such as a thyristor or a power transistor.

[発明の技術的背景] 第2図は、平形外囲器構造の公知のサイリスタ
を半部縦断面図で示したものである。同図におい
て、1は半導体ペレツト、2及び3は主電極、4
は熱緩衝板、5は補助電極、6は補助電極5に接
続された導電線、7は補助電極5に対する該導電
線6のボンデイング部分を被覆している絶縁物、
8は半導体ペレツト及び主電極2及び3の外周部
を包囲している筒状の外囲器、9は熱緩衝板4と
外囲器8との間に嵌入されて両者を絶縁している
絶縁体、10は導電線6を外囲器8の外側位置に
おいて保護している保護管である。
[Technical Background of the Invention] FIG. 2 shows a known thyristor with a flat envelope structure in half longitudinal section. In the figure, 1 is a semiconductor pellet, 2 and 3 are main electrodes, and 4 is a semiconductor pellet.
5 is a thermal buffer plate; 5 is an auxiliary electrode; 6 is a conductive wire connected to the auxiliary electrode 5; 7 is an insulator covering the bonding portion of the conductive wire 6 to the auxiliary electrode 5;
Reference numeral 8 denotes a cylindrical envelope surrounding the semiconductor pellet and the outer periphery of the main electrodes 2 and 3, and 9 an insulator fitted between the thermal buffer plate 4 and the envelope 8 to insulate them. The body 10 is a protective tube that protects the conductive wire 6 at a position outside the envelope 8.

公知のサイリスタにおいては、導電線6には
Al線が用いられており、該導電線6の一端は保
護管10の外側を押し潰してかしめることにより
該保護管10の外端において保護管10に固定さ
れている。導電線6の他端は補助電極に接続され
るが、その引出し方法は、補助電極に導電線6を
圧接する方法とボンデイングする方法が一般的で
あり、そのボンデイングは通常超音波法で行われ
る。導電線6のボンデイング部分を被覆している
絶縁物7はシリコーンゴムであり、該絶縁物7は
半導体ペレツト1のベベル面への塗布と同時に該
ボンデイング部分の上に塗布される。
In the known thyristor, the conductive wire 6 has
An Al wire is used, and one end of the conductive wire 6 is fixed to the protective tube 10 at the outer end of the protective tube 10 by crushing and caulking the outside of the protective tube 10. The other end of the conductive wire 6 is connected to an auxiliary electrode, and its extraction method is generally to press the conductive wire 6 to the auxiliary electrode or by bonding, and the bonding is usually performed by an ultrasonic method. . The insulator 7 covering the bonding portion of the conductive wire 6 is silicone rubber, and the insulator 7 is applied onto the bonding portion at the same time as it is applied to the beveled surface of the semiconductor pellet 1.

前記のごとき従来のサイリスタにおいては、信
頼性を高めるために補助電極の導電線6が、通常
第3図に示す通り、2箇所以上のボンデイング部
分6aを形成するように接合されており、また該
ボンデイング部分6aが外囲器組立工程等におい
て剥離したり損傷しないように該ボンデイング部
分6aとその間の導電線がすべて絶縁物7で被覆
されていた。
In the conventional thyristor as described above, in order to improve reliability, the conductive wire 6 of the auxiliary electrode is usually bonded to form two or more bonding portions 6a, as shown in FIG. The bonding portion 6a and the conductive wires therebetween were all covered with an insulator 7 to prevent the bonding portion 6a from peeling off or being damaged during the envelope assembly process or the like.

[背景技術の問題点] 前記のごとき構造の従来のサイリスタにおいて
は、導電線6のボンデイング部分6aとその間の
導電線がすべて絶縁物7で被覆されているのでボ
ンデイング部分6aとその近傍が絶縁物7で保護
される反面、絶縁物7と導電線6のそれぞれの熱
膨脹係数の差が大きいため、サイリスタの使用状
態においては絶縁物7の内部の導電線部分に繰返
し熱応力が発生し、その結果、該導電線部分が疲
労してボンデイング部分の劣化が生じるという危
険性があつた。
[Problems with the Background Art] In the conventional thyristor having the above structure, the bonding portion 6a of the conductive wire 6 and the conductive wire therebetween are all covered with the insulator 7, so the bonding portion 6a and the vicinity thereof are covered with the insulator. On the other hand, since there is a large difference in the coefficient of thermal expansion between the insulator 7 and the conductive wire 6, thermal stress repeatedly occurs in the conductive wire inside the insulator 7 when the thyristor is in use. There was a risk that the conductive wire portion would become fatigued and the bonding portion would deteriorate.

すなわち、Al製の導電線の場合、その熱膨脹
係数は2.3×10-5cm/deg.であるが、絶縁物7が
シリコーンゴムの場合、その熱膨脹係数は3.0×
10-4cm/deg.であつて、導電線の熱膨脹係数は絶
縁物7の1/10以下の値である。従つて、サイリス
タをその使用温度範囲−40℃〜+125℃で使用し
た場合、ボンデイング部分6a間の導電線と絶縁
物7とは共に膨脹しあるいは共に収縮するが導電
線6の膨脹量及び収縮量は絶縁物7よりも小さい
ためボンデイング部分6aには熱応力が発生し、
この熱応力がサイリスタのオンオフ動作に伴う温
度上昇及び下降の度毎に繰り返されるため、ボン
デイング部分6aが疲労し、ついには剥離に至る
可能性があつた。特に、Alは100℃以上の温度に
おいて定荷重を長時間にわたつて負荷されている
とクリープを起こしやすい性質を有しているた
め、前記のごとき繰返し応力状態が高温度におい
て負荷されると脆化する危険性は極めて大きく、
従つて従来のサイリスタ等の電力用半導体装置に
おいては信頼性に問題があつた。
That is, in the case of a conductive wire made of Al, its coefficient of thermal expansion is 2.3×10 -5 cm/deg., but if the insulator 7 is made of silicone rubber, its coefficient of thermal expansion is 3.0×
10 −4 cm/deg., and the coefficient of thermal expansion of the conductive wire is 1/10 or less of that of the insulator 7. Therefore, when the thyristor is used in the operating temperature range of -40°C to +125°C, the conductive wire and the insulator 7 between the bonding portions 6a expand or contract together, but the amount of expansion and contraction of the conductive wire 6 is Since is smaller than the insulator 7, thermal stress is generated in the bonding portion 6a,
Since this thermal stress is repeated every time the temperature rises and falls as the thyristor turns on and off, there is a possibility that the bonding portion 6a may become fatigued and eventually peel off. In particular, Al has a tendency to creep when subjected to a constant load for a long time at a temperature of 100°C or higher, so it becomes brittle when the above-mentioned repeated stress state is applied at high temperatures. The risk of becoming
Therefore, conventional power semiconductor devices such as thyristors have had reliability problems.

[発明の目的] この発明の目的は、前記のごとき従来の半導体
装置よりも高い信頼性を有する改良された半導体
装置を提供することであり、更に詳細には、半導
体ペレツトに接続される導電線の剥離や破断等が
生じる恐れの少ない改良された半導体装置を提供
することである。
[Object of the Invention] An object of the present invention is to provide an improved semiconductor device having higher reliability than the conventional semiconductor device as described above, and more specifically, to provide an improved semiconductor device having higher reliability than the conventional semiconductor device as described above. An object of the present invention is to provide an improved semiconductor device that is less likely to cause peeling or breakage.

[発明の概要] この発明による改良された半導体装置の特徴
は、たとえばサイリスタの補助電極に接続された
導電線の2箇所以上のボンデイング部分を絶縁物
で被覆するとともに該ボンデイング部分間の該導
電線を絶縁物被覆しなようにしたことである。こ
のような構造によれば、導電線と絶縁物との接触
面積を減少させることができるため、サイリスタ
のオンオフ動作に伴う昇温及び降温過程において
該絶縁物から該導電線に加えられる外力が減少
し、その結果該ボンデイング部分における応力が
小さくなつて該導電線の破断や該ボンデイング部
分の剥離が生じる恐れの少ない半導体装置を得る
ことができる。
[Summary of the Invention] The improved semiconductor device according to the present invention is characterized in that, for example, two or more bonding portions of a conductive wire connected to an auxiliary electrode of a thyristor are coated with an insulating material, and the conductive wire between the bonding portions is coated with an insulating material. The reason is that it is not covered with an insulating material. According to such a structure, the contact area between the conductive wire and the insulator can be reduced, so the external force applied from the insulator to the conductive wire during the temperature rising and cooling process associated with the on/off operation of the thyristor is reduced. As a result, stress in the bonding portion is reduced, and a semiconductor device can be obtained in which there is less risk of breakage of the conductive wire or peeling of the bonding portion.

[発明の実施例] 以下に第1図を参照して、本発明をサイリスタ
に適用した実施例について説明する。なお、第1
図は第3図と同じくサイリスタの補助電極5上の
導電線ボンデイング部の拡大断面図を示し、同図
において第2図及び第3図と同一符号で表示され
ている部分は従来のサイリスタと同じ部分であ
る。
[Embodiments of the Invention] An embodiment in which the present invention is applied to a thyristor will be described below with reference to FIG. In addition, the first
The figure shows an enlarged cross-sectional view of the conductive wire bonding part on the auxiliary electrode 5 of the thyristor as in Figure 3, and in the figure, the parts labeled with the same symbols as in Figures 2 and 3 are the same as in the conventional thyristor. It is a part.

第1図に示されるように、本発明を適用して構
成されたサイリスタにおいては半導体ペレツト1
の補助電極5上にAlの導電線6が互いに離れた
2箇所の点でボンデイングされていて2個のボン
デイング部分6aが形成されており、これらのボ
ンデイング部分6aはシリコーンゴム等の絶縁物
7で被覆されているが、該ボンデイング部分6a
の間の導電線部分6bは絶縁物7上に露出してい
る。従つて、サイリスタの使用状態において半導
体ペレツト1及び補助電極の温度が上昇及び下降
して絶縁物7が膨脹及び収縮しても該部分6bに
は絶縁物7の膨脹及び収縮に伴う外力が加わらな
いため、導電線6のボンデイング部分6aに対す
る熱応力は従来のサイリスタにくらべて著しく小
さくなり、その結果、ボンデイング部分の剥離や
導電線の断線及び劣化が生じる恐れも非常に小さ
くなる。また、絶縁物7で被覆されている導電線
部分にかかる応力は絶縁物7外の導電線部分6b
を変形させる力として消費されるため、ボンデイ
ング部分6aを劣化させるには至らない。
As shown in FIG. 1, in the thyristor constructed by applying the present invention, a semiconductor pellet 1
An Al conductive wire 6 is bonded to the auxiliary electrode 5 at two points separated from each other to form two bonding portions 6a, and these bonding portions 6a are made of an insulating material 7 such as silicone rubber. Although covered, the bonding portion 6a
The conductive wire portion 6b between the two is exposed on the insulator 7. Therefore, even if the temperature of the semiconductor pellet 1 and the auxiliary electrode rises and falls during use of the thyristor and the insulator 7 expands and contracts, no external force is applied to the portion 6b due to the expansion and contraction of the insulator 7. Therefore, the thermal stress on the bonding portion 6a of the conductive wire 6 is significantly smaller than that of conventional thyristors, and as a result, the risk of peeling of the bonding portion, disconnection, and deterioration of the conductive wire is also extremely reduced. Moreover, the stress applied to the conductive wire portion covered with the insulator 7 is
Since it is consumed as a force to deform the bonding portion 6a, it does not lead to deterioration of the bonding portion 6a.

[発明の効果] 前記のように、本発明の半導体装置では2個所
ボンデイング部分間の導電線が絶縁物で被覆され
ていないので該導電線及び該ボンデイング部分の
劣化が生じる危険性が従来の半導体装置よりも小
さく、従つて、本発明によれば、従来の半導体装
置よりも信頼性の高い半導体装置が得られる。
[Effects of the Invention] As described above, in the semiconductor device of the present invention, since the conductive wire between the two bonding parts is not covered with an insulating material, there is a risk of deterioration of the conductive wire and the bonding part compared to the conventional semiconductor device. Therefore, the present invention provides a semiconductor device that is more reliable than conventional semiconductor devices.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明により改良された半導体装置の
一部を拡大して示す断面図、第2図は従来の半導
体装置の半部縦断面図、第3図は第2図の一部の
拡大断面図である。 1……半導体ペレツト、2,3……主電極、4
……熱緩衝板、5……補助電極、6……導電線、
6a……ボンデイング部分、6b……導電線の露
出部分、7……絶縁物、8……外囲器、9……絶
縁体、10……(導電線6の)保護管。
FIG. 1 is an enlarged sectional view of a part of a semiconductor device improved by the present invention, FIG. 2 is a longitudinal sectional view of a half of a conventional semiconductor device, and FIG. 3 is an enlarged part of FIG. 2. FIG. 1... Semiconductor pellet, 2, 3... Main electrode, 4
... Thermal buffer plate, 5 ... Auxiliary electrode, 6 ... Conductive wire,
6a... Bonding portion, 6b... Exposed portion of the conductive wire, 7... Insulator, 8... Envelope, 9... Insulator, 10... Protection tube (of the conductive wire 6).

Claims (1)

【特許請求の範囲】[Claims] 1 2つの主電極及び少なくとも1つの補助電極
をもち、該補助電極に接続される導電線が該補助
電極に2箇所以上でボンデイングされている半導
体装置において、該導電線のボンデイング部分を
絶縁物で被覆するとともに該ボンデイング部分間
の該導電線の少なくとも一部分を該絶縁物で被覆
しないようにしたことを特徴とする半導体装置。
1. In a semiconductor device that has two main electrodes and at least one auxiliary electrode, and in which a conductive wire connected to the auxiliary electrode is bonded to the auxiliary electrode at two or more places, the bonding portion of the conductive wire is made of an insulator. A semiconductor device characterized in that at least a portion of the conductive wire between the bonding portions is not covered with the insulator.
JP60097952A 1985-05-10 1985-05-10 Semiconductor device Granted JPS61256736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60097952A JPS61256736A (en) 1985-05-10 1985-05-10 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60097952A JPS61256736A (en) 1985-05-10 1985-05-10 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS61256736A JPS61256736A (en) 1986-11-14
JPH0358535B2 true JPH0358535B2 (en) 1991-09-05

Family

ID=14206003

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60097952A Granted JPS61256736A (en) 1985-05-10 1985-05-10 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS61256736A (en)

Also Published As

Publication number Publication date
JPS61256736A (en) 1986-11-14

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