JPH0359817A - Magnetic storage body, method for manufacturing the same, and magnetic storage device - Google Patents
Magnetic storage body, method for manufacturing the same, and magnetic storage deviceInfo
- Publication number
- JPH0359817A JPH0359817A JP19586089A JP19586089A JPH0359817A JP H0359817 A JPH0359817 A JP H0359817A JP 19586089 A JP19586089 A JP 19586089A JP 19586089 A JP19586089 A JP 19586089A JP H0359817 A JPH0359817 A JP H0359817A
- Authority
- JP
- Japan
- Prior art keywords
- coated
- metal
- magnetic storage
- group
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 31
- 238000000034 method Methods 0.000 title claims description 15
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000003860 storage Methods 0.000 title description 27
- 229910052751 metal Inorganic materials 0.000 claims description 28
- 239000002184 metal Substances 0.000 claims description 28
- 239000010408 film Substances 0.000 claims description 13
- 239000010409 thin film Substances 0.000 claims description 12
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 11
- 229930195729 fatty acid Natural products 0.000 claims description 11
- 239000000194 fatty acid Substances 0.000 claims description 11
- 150000004665 fatty acids Chemical class 0.000 claims description 11
- 150000003839 salts Chemical class 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- 239000000758 substrate Substances 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 9
- 150000002902 organometallic compounds Chemical class 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- 125000003277 amino group Chemical group 0.000 claims description 7
- 125000001153 fluoro group Chemical group F* 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000001841 imino group Chemical group [H]N=* 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 150000001247 metal acetylides Chemical class 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 5
- 238000005260 corrosion Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 238000007598 dipping method Methods 0.000 description 4
- 239000000314 lubricant Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 3
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 229910052735 hafnium Inorganic materials 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910018104 Ni-P Inorganic materials 0.000 description 1
- 229910018536 Ni—P Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- 241000219995 Wisteria Species 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000005294 ferromagnetic effect Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000035987 intoxication Effects 0.000 description 1
- 231100000566 intoxication Toxicity 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 150000004671 saturated fatty acids Chemical class 0.000 description 1
- 235000003441 saturated fatty acids Nutrition 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000008685 targeting Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
[産業上の利用分野〕
本発明は磁気記憶装置(磁気ディスク装置、磁気ドラム
装置及び磁気テープ装置)及び、該磁気記憶装置に用い
られる磁気記憶体(以下、記憶体と呼ぶ)及びその製造
方法に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to magnetic storage devices (magnetic disk devices, magnetic drum devices, and magnetic tape devices) and magnetic storage bodies (hereinafter referred to as storage bodies) used in the magnetic storage devices. ) and its manufacturing method.
[従来の技術]
金属磁性媒体(以下、金属媒体と呼ぶ)を有する記憶体
に於いては、記録再生ヘッド(以下、ヘプトと呼ぶ)と
の接触に耐えるだけの充分な機械的信頼性と水分、塩素
等の腐食環境に充分耐える耐食性が要求される。[Prior Art] A storage body having a metal magnetic medium (hereinafter referred to as a metal medium) must have sufficient mechanical reliability and moisture content to withstand contact with a recording/reproducing head (hereinafter referred to as a hept). It is required to have sufficient corrosion resistance to withstand corrosive environments such as chlorine and chlorine.
従来より基板はアルマイト処理やN1−Pメツキ等の非
磁性メツキ処理後、鏡面化やすじ目付けのための研磨が
施こされたA/、合金基板等が用いられ、次にN 1−
E 、 Hi −Ou −P等の非磁性メツキやOr
、Bi等の被覆の有無の後、強磁性金属媒体を被覆し、
更にSXO,(ポリケイ酸を含む)、AtN 、O、S
i、H4とAt、0.の固溶体等の保護膜が被覆され
、カップリング剤を用いた中間層の有無の後パーフロロ
ポリエーテルに代表される液体潤滑剤や高級アルコール
や脂肪酸に代表される固体潤滑剤の薄層が被覆される。Conventionally, substrates have been A/, alloy substrates, etc., which have been subjected to non-magnetic plating treatment such as alumite treatment or N1-P plating, and then polished to make them mirror-finished or have streaks.
Non-magnetic plating such as E, Hi-Ou-P and Or
, coated with a ferromagnetic metal medium after coating with Bi, etc.,
Furthermore, SXO, (including polysilicic acid), AtN, O, S
i, H4 and At, 0. A protective film such as a solid solution of is coated, with or without an intermediate layer using a coupling agent, and then a thin layer of a liquid lubricant such as perfluoropolyether or a solid lubricant such as higher alcohol or fatty acid is coated. be done.
上記記憶体は一応の耐久性能を有し、既に市場に出回り
始めているものの大きな欠点を有している。Although the above-mentioned memory bodies have a certain level of durability and have already begun to appear on the market, they have major drawbacks.
上記記憶体を搭載した磁気記憶装置を40℃80%R,
H,の環境下に放置すると記憶体1枚の1〜2ケ所に腐
食点が発生し、ディフェクトエラーに至る。又記憶体と
ヘッドとの接触を繰り返すことにより、両者間の摩擦係
数が増大し、スピンドルモーターがしばしば停止に至っ
た。A magnetic storage device equipped with the above storage body was heated at 40℃80%R.
If left in an environment of H., corrosion points will occur in one or two places on one memory body, leading to defect errors. Furthermore, repeated contact between the storage body and the head increased the coefficient of friction between them, often causing the spindle motor to stop.
[発明が解決しようとする課題]
従来の技術では、金属媒体の耐食性を充分に確保できず
、又記憶体とヘッド間の機械的信頼性を充分に確保でき
ないという課題を有していた。[Problems to be Solved by the Invention] Conventional techniques have had the problem of not being able to sufficiently ensure the corrosion resistance of the metal medium, and also not being able to sufficiently ensure the mechanical reliability between the storage body and the head.
本発明は上記の課題を解決するものであり、その目的と
するところは、水分や塩素等の環境下に於ける金属媒体
の耐食性を飛躍的に向上させるとともに、記憶体とへノ
ド間の摩擦係数を大幅に低減し、且つその効果を長期に
維持しうる信頼性に優れた記憶体の製造、提供と該記憶
体を用いた磁気記憶装置を提供することにある。The present invention is intended to solve the above problems, and its purpose is to dramatically improve the corrosion resistance of metal media in environments containing moisture and chlorine, and to reduce the friction between the storage body and the henode. It is an object of the present invention to manufacture and provide a highly reliable storage body that can significantly reduce the coefficient and maintain its effect for a long period of time, and to provide a magnetic storage device using the storage body.
[課題を解決する虹めの手段]
本発明は、基体上に金属磁性媒体が被覆され、この金属
磁性媒体上に酸化物、窒化物、炭化物及び炭素から選ば
れる少なくとも1種の物質より成る薄膜が被覆され、次
に分子の一方の末端にアミノ基或いはイミノ基の少なく
とも1種を有し、他方の末端に加水分解性基を有する有
機金属化合物の少なくとも1種の硬化膜が被覆され、更
に水素原子の少なくとも1部が弗素原子で置換された脂
肪酸の金属塩の少なくとも1種を被覆せしめた事を特徴
とする。[Rainbow Means for Solving the Problems] The present invention provides a method in which a metal magnetic medium is coated on a substrate, and a thin film made of at least one substance selected from oxides, nitrides, carbides, and carbon is coated on the metal magnetic medium. is coated, and then a cured film of at least one organometallic compound having at least one amino group or imino group at one end of the molecule and a hydrolyzable group at the other end is coated, and It is characterized in that it is coated with at least one metal salt of a fatty acid in which at least a portion of hydrogen atoms are replaced with fluorine atoms.
金属媒体は従来技術と同様の材料そして製法によって被
覆する事が出来る。Co、IFe、Ni。The metal media can be coated using materials and methods similar to those of the prior art. Co, IFe, Ni.
Or、Ta、P、貴金属元素等から成る金属を湿式メツ
キ法やスパッタリング法に代表される乾式成膜法で被覆
形成する。A metal such as Or, Ta, P, or a noble metal element is coated by a dry film forming method such as a wet plating method or a sputtering method.
酸化物、窒化物、炭化物は、At、B、Y。Oxides, nitrides, and carbides are At, B, and Y.
Si、Ti、Zr、Hf、Nb、Ta、Or。Si, Ti, Zr, Hf, Nb, Ta, Or.
Mo、Wから選ばれる元素との化合物であり、その混合
層、積層は任意である。炭素はグラファイト、ダイヤモ
ンド、アモルファスの単独、混合。It is a compound with an element selected from Mo and W, and the mixed layer and lamination thereof are arbitrary. Carbon can be graphite, diamond, or amorphous, either alone or in a mixture.
積層であり、いずれも100〜500又の膜厚が適切で
ある。上記化合物及び炭素はスパッタリング法、イオン
ブレーティング法等のPVD法やOVD法で形成可能で
あり、酸化物は有機金属化合物の塗布f焼成によっても
得られる。These are laminated layers, and a film thickness of 100 to 500 layers is appropriate for each layer. The above compound and carbon can be formed by a PVD method or an OVD method such as a sputtering method or an ion blasting method, and an oxide can also be obtained by coating and baking an organometallic compound.
分子の一方の末端にアミ/基或いはイミノ基の少なくと
も1種を有し、他方の末端に加水分解性基を有する有機
金属化合物は、
NH,−0,H4−NH−0,H,−M−(OR) 、
: 或いはNH,−0,Ho−M−(OR) 。An organometallic compound having at least one type of amine/imino group at one end of the molecule and a hydrolyzable group at the other end is NH, -0,H4-NH-0,H, -M -(OR),
: or NH, -0, Ho-M-(OR).
N H,−00N H−0,H6−M−(OR)、等こ
こでMはSi、Ti、Zr、Hf、Nb或いはTaであ
り、Rは炭素数が1〜4のアルキル基又は水素でありモ
してXはMの金属元素の価数である。N H, -00N H-0, H6-M-(OR), etc., where M is Si, Ti, Zr, Hf, Nb or Ta, and R is an alkyl group having 1 to 4 carbon atoms or hydrogen. Actually, X is the valence of the metal element M.
に代表される。上述の有機金属化合物は単独或いは混合
され、特にケイ素化合物の場合は弱酸水溶液の添加の有
無の後、アルコール類等の可溶性溶媒に希釈した後、ス
プレー法、スピンナー法、ディッピング法や超音波噴霧
吹き付は法等の既知の製法で塗布し、必要に応じて焼成
する。溶媒希釈の割合は得たい膜厚に応じて適宜決定す
る。又焼成は50〜200″cJ、1分〜30分で充分
であり膜厚は単分子層レベルから100Xが適切である
水素原子の少なくとも一部が弗素原子で置換された脂肪
酸の金属塩は、直鎖2分校又は飽和、不飽和の制限は無
いが炭素数は12以上の脂肪酸とN a 、’ K 、
L i 、 Oa 、 B a 、 Z n等の金属
塩の水素原子の一部が弗素原子で置換されたものが望ま
しい。これらは可溶性溶媒に溶解、希釈され、スピンナ
ー法、ディッピング法、スプレー法等の湿式法や真空蒸
着法等で形成され、必要に応じて焼成する。希釈の割合
は得たい膜厚に応じて適宜決定する又焼成は50〜15
0℃、1〜20分で充分であり、膜厚は10〜100失
が適切である[作用コ
本発明によれば、金属媒体に、硬度、緻密性に優れる酸
化物、窒化物、炭化物及び炭素から選ばれる少なくとも
1種の物質より成る薄膜を形成することにより、ヘッド
の衝撃摩耗からそして環境中の水分や塩素等から金属媒
体を保護する。represented by. The above-mentioned organometallic compounds may be used alone or in combination, and in particular, in the case of silicon compounds, they may be used with or without the addition of a weak acid aqueous solution, diluted with a soluble solvent such as alcohol, and then subjected to a spray method, a spinner method, a dipping method, or an ultrasonic atomization method. The coating is applied by a known manufacturing method such as the method, and baked if necessary. The ratio of solvent dilution is appropriately determined depending on the desired film thickness. In addition, firing at 50 to 200"cJ for 1 to 30 minutes is sufficient, and the appropriate film thickness is from the monomolecular layer level to 100X.A metal salt of a fatty acid in which at least a portion of the hydrogen atoms is substituted with fluorine atoms is There is no restriction on straight chain dibranches or saturated or unsaturated fatty acids, but the number of carbon atoms is 12 or more, and N a , ' K ,
Metal salts such as Li, Oa, B a and Z n in which some of the hydrogen atoms are substituted with fluorine atoms are desirable. These are dissolved and diluted in a soluble solvent, formed by a wet method such as a spinner method, a dipping method, a spray method, a vacuum evaporation method, and the like, and fired if necessary. The dilution ratio is determined as appropriate depending on the desired film thickness.
0°C for 1 to 20 minutes is sufficient, and a film thickness of 10 to 100 mm is appropriate. By forming a thin film made of at least one substance selected from carbon, the metal medium is protected from impact wear of the head and from moisture, chlorine, etc. in the environment.
しかし、上記薄膜は、数100X前後と薄く、ピンホー
ルレスにすることは困難である。又上記薄膜のうち炭素
、以外は潤滑性に乏しく、最も優れる炭素膜に於いても
、潤滑性が不充分なため、各種の潤滑剤を薄膜上に積層
化せしめるのが一般的であった。しかしながら、上記の
薄膜と潤滑剤との固着力が弱いため、長期間に及ぶヘッ
ドと記憶体の接触摩耗により、潤滑剤が徐々に記憶体上
から除去され、初期の優れた潤滑効果が失なわれてしま
った。However, the above-mentioned thin film is thin, around several hundred times, and it is difficult to make it pinhole-free. Moreover, among the above-mentioned thin films, materials other than carbon have poor lubricity, and even the most excellent carbon film has insufficient lubricity, so it has been common practice to layer various lubricants on the thin film. However, because the adhesion between the thin film and the lubricant is weak, the lubricant is gradually removed from the memory element due to contact wear between the head and the memory element over a long period of time, causing the initial excellent lubrication effect to be lost. I got lost.
本発明は、上記薄膜上に、分子の一方の末端にアミノ基
或いはイミノ基の少なくとも1種を有し、他方の末端に
加水分解性基を有する有機金属化合物の硬化族を被覆せ
しめた後に水素原子の一部を弗素原子で置換した脂肪酸
の金属塩を被覆せしめるものである。加水分解性基は、
酸化物、窒化物、炭化物及び炭素の最表面の活性基(−
OH。The present invention provides hydrogen after coating the thin film with a curing group of an organometallic compound having at least one type of amino group or imino group at one end of the molecule and a hydrolyzable group at the other end. It is coated with a metal salt of a fatty acid in which some of the atoms are replaced with fluorine atoms. The hydrolyzable group is
Active groups (-
Oh.
−0OOH等)との親和力が強く、アミノ基或いはイミ
ノ基は脂肪酸金属塩のカルボニル基との親和力が強く、
該脂肪酸金属塩が記憶体上に強固に固定化されヘッドの
衝撃摩耗によって記憶体上から除去される事を防ぐ。-0OOH etc.), and the amino group or imino group has a strong affinity with the carbonyl group of the fatty acid metal salt.
The fatty acid metal salt is firmly fixed on the memory and is prevented from being removed from the memory due to impact wear of the head.
又水素原子の一部が弗素原子で置換された脂肪酸金属塩
は優れた撥水性を示し、防錆作用を高める効果があり、
上記の理由により、その効果は長期間に亘り維持される
。In addition, fatty acid metal salts in which some of the hydrogen atoms are replaced with fluorine atoms exhibit excellent water repellency and have the effect of increasing rust prevention.
For the above reasons, the effect is maintained over a long period of time.
以上により長期機械的信頼性及び保存信頼性に優れた記
憶体の製造、提供が可能になり、更に該記憶体を用いる
ことにより磁気記憶装置の信頼性は著しく向上した。As described above, it has become possible to manufacture and provide a memory body with excellent long-term mechanical reliability and storage reliability, and furthermore, by using this memory body, the reliability of a magnetic memory device has been significantly improved.
[実施例]
鏡面仕上げされたディスク状アルミニウム合金基板上に
非磁性N1−P合金メツキを約15μ扉厚に施こした後
、研摩により表面粗度Raニア0〜120又、Rmax
=700〜1500X K表酊すじ目付は加工し、更
に0O−Ni−P合金メツキを約α05μ扉厚に施こし
た。[Example] After applying non-magnetic N1-P alloy plating to a door thickness of approximately 15 μm on a mirror-finished disk-shaped aluminum alloy substrate, the surface roughness was polished to a surface roughness of Ra near 0 to 120 and Rmax.
= 700~1500X K surface intoxication streaks were processed, and 0O-Ni-P alloy plating was applied to approximately α05μ door thickness.
次にマグネトロンスパッタ装置に上記基板をセットし、
5 X 10−’ torr 以下まで排気した後、
基板を80℃まで加熱し、吸着水分の除去後、Arガス
を導入、し、5 X 10−3torr にした後、
第1表に示した材料をターゲットとして、パワー密度4
W /−で成膜した。Next, set the above substrate in a magnetron sputtering device,
After exhausting to below 5 x 10-' torr,
After heating the substrate to 80°C and removing adsorbed moisture, Ar gas was introduced and the pressure was adjusted to 5 x 10-3 torr.
Targeting the materials shown in Table 1, power density 4
The film was formed using W/-.
次に同じく第1表に示す有機金属化合物をメタノールと
フロン113(混合比1対3休債比)に0.005W/
V%の濃度で溶解し、ディッピング法(10crn/藤
)で塗布し、その後、110 ’Oで10分間焼成した
。Next, the organometallic compound shown in Table 1 was added to methanol and Freon 113 (mixing ratio 1:3) at 0.005W/
It was dissolved at a concentration of V%, applied by a dipping method (10 crn/wisteria), and then baked at 110'O for 10 minutes.
次に同じく第1表に示す脂肪酸金属塩をフロン113と
メタノール(混合比9対1体積比)にa2 W / v
%濃度で溶解し、ディッピング法で塗布し、その後11
0℃で10分間焼成した。Next, the fatty acid metal salts shown in Table 1 were mixed with Freon 113 and methanol (mixing ratio 9:1 by volume) at a2 W/v.
% concentration and applied by dipping method, then 11% concentration.
It was baked at 0°C for 10 minutes.
上記製造方法により作製した記憶体と、3370タイプ
の薄膜ヘッド(フライハイド0.15μms 9 m/
see )を用い磁気記憶装置を作製し、下記試験によ
って評価した。結果は第2表に示す。A memory body manufactured by the above manufacturing method and a 3370 type thin film head (Flyhide 0.15 μms 9 m/
A magnetic storage device was fabricated using a magnetic storage device (see) and evaluated by the following tests. The results are shown in Table 2.
(1) OS S耐久試験
aSS動作(立ち上がり、立ち下がり時間10sec)
前後の外観変化、静摩擦係数と出力の低下率を求める。(1) OS S durability test aSS operation (rise and fall time 10 seconds)
Determine the change in appearance before and after, the coefficient of static friction, and the rate of decrease in output.
(2)耐食性試験
80℃、90%R,H,の環境下に放置して、放置時間
の経過をおって、ミッシングビット数ヲ測定し、その増
加が認められた時点を寿命と判断した。(2) Corrosion Resistance Test The product was left in an environment of 80°C and 90% R and H, and after the time had elapsed, the number of missing bits was measured, and the time when the number of missing bits increased was determined to be the end of its life.
第
2
表
[発明の効果コ
高記録密度対応の記憶体としての薄膜型記憶体を用いた
磁気記憶装置が登場して久しいが、長期信頼性に対する
不安からその使用は一部に限られていた。Table 2 [Effects of the invention] Magnetic storage devices using thin-film storage as a storage medium compatible with high recording densities have been on the market for some time, but their use has been limited to some due to concerns about long-term reliability. .
本発明によれば、加温湿下で記憶体が用いられても金属
媒体は実用的に何等の影響を受けず、又増々硬質化、低
フライハイド化するヘッドを用いての機械的信頼性が高
いので、更に小型化し、厳しい環境下で用いられる磁気
記憶装置に搭載されても、記憶体、ヘッドはともに特性
劣化は、はとんど認められない。According to the present invention, even if the storage medium is used under warm and humid conditions, the metal medium will not be affected in any way in practical terms, and the mechanical reliability will be improved even when using heads that are becoming increasingly hard and have low fly-hide properties. Because of the high resistance, even if the magnetic storage device is further miniaturized and installed in a magnetic storage device used in harsh environments, no deterioration in the characteristics of either the storage body or the head will be observed.
以上の如く、高記録密度対応の高耐久性記憶体の製造、
提供そして該記憶体を用いることにより信頼性の高い磁
気記憶装置の提供が可能になった以上As described above, manufacturing of highly durable memory bodies compatible with high recording density,
Since it has become possible to provide a highly reliable magnetic storage device by providing and using the storage medium,
Claims (3)
媒体上に酸化物、窒化物、炭化物及び炭素から選ばれる
少なくとも1種の物質より成る薄膜が被覆され、次に分
子の一方の末端にアミノ基或いはイミノ基の少なくとも
1種を有し、他方の末端に加水分解性基を有する有機金
属化合物の少なくとも1種の硬化膜が被覆され、更に水
素原子の少なくとも一部が弗素原子で置換された脂肪酸
の金属塩の少なくとも1種を被覆せしめた事を特徴とす
る磁気記憶体。(1) A metal magnetic medium is coated on the substrate, a thin film made of at least one substance selected from oxide, nitride, carbide, and carbon is coated on the metal magnetic medium, and then one end of the molecule is coated with a cured film of at least one organometallic compound having at least one type of amino group or imino group and a hydrolyzable group at the other end, and furthermore, at least a part of the hydrogen atoms are substituted with fluorine atoms. 1. A magnetic memory material coated with at least one metal salt of a fatty acid.
に酸化物、窒化物、炭化物及び炭素から選ばれる少なく
とも1種の物質より成る薄膜を被覆させる工程、次に分
子の一方の末端にアミノ基或いはイミノ基の少なくとも
1種を有し、他方の末端に加水分解性基を有する有機金
属化合物の少なくとも1種の硬化膜を被覆せしめる工程
、更に水素原子の少なくとも一部が弗素原子で置換され
た脂肪酸の金属塩の少なくとも一種を被覆せしめる工程
を有することを特徴とする磁気記憶体の製造方法。(2) A step of coating a metal magnetic medium on a substrate, a step of coating the medium with a thin film made of at least one substance selected from oxides, nitrides, carbides, and carbon, and then one end of the molecule. a step of coating the substrate with a cured film of at least one organometallic compound having at least one type of amino group or imino group and having a hydrolyzable group at the other end; 1. A method for manufacturing a magnetic memory, comprising the step of coating with at least one metal salt of a substituted fatty acid.
媒体上に酸化物、窒化物、炭化物及び炭素から選ばれる
少なくとも、種の物質より成る薄膜が被覆され、次に分
子の一方の末端にアミノ基或いはイミノ基の少なくとも
、種を有し、他方の末端に加水分解性基を有する有機金
属化合物の少なくとも1種の硬化膜が被覆され、更に水
素原子の少なくとも一部が弗素原子で置換された脂肪酸
の金属塩の少なくとも1種を被覆した請求項1記載の磁
気記憶体を用いた事を特徴とする磁気記憶装置。(3) A metal magnetic medium is coated on the substrate, a thin film consisting of at least a species selected from oxides, nitrides, carbides, and carbon is coated on the metal magnetic medium, and then one end of the molecule is coated with a cured film of at least one organometallic compound having at least a species of an amino group or an imino group and a hydrolyzable group at the other end, and furthermore, at least a part of the hydrogen atoms are substituted with fluorine atoms. 2. A magnetic memory device characterized by using the magnetic memory body according to claim 1, which is coated with at least one metal salt of a fatty acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19586089A JPH0359817A (en) | 1989-07-28 | 1989-07-28 | Magnetic storage body, method for manufacturing the same, and magnetic storage device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19586089A JPH0359817A (en) | 1989-07-28 | 1989-07-28 | Magnetic storage body, method for manufacturing the same, and magnetic storage device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0359817A true JPH0359817A (en) | 1991-03-14 |
Family
ID=16348194
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19586089A Pending JPH0359817A (en) | 1989-07-28 | 1989-07-28 | Magnetic storage body, method for manufacturing the same, and magnetic storage device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0359817A (en) |
-
1989
- 1989-07-28 JP JP19586089A patent/JPH0359817A/en active Pending
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