JPH0360055U - - Google Patents
Info
- Publication number
- JPH0360055U JPH0360055U JP12184789U JP12184789U JPH0360055U JP H0360055 U JPH0360055 U JP H0360055U JP 12184789 U JP12184789 U JP 12184789U JP 12184789 U JP12184789 U JP 12184789U JP H0360055 U JPH0360055 U JP H0360055U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- microscope
- camera
- infrared
- photomultiplier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims description 2
- 238000005211 surface analysis Methods 0.000 claims description 2
- 239000000700 radioactive tracer Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
Landscapes
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Microscoopes, Condenser (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
第１図は本考案の一実施例を示すウエーハ面解
析装置の模式断面図である。
１…ウエーハ、２…ウエーハステージ、３…プ
ローブ針、４…マニユピレーター、５…カーブト
レーサ、６…光学顕微鏡、７…光電子増倍器、８
…反射型赤外顕微鏡、９…赤外線カメラ、１０…
ＣＣＤカメラ、１１…モニターテレビ。
FIG. 1 is a schematic cross-sectional view of a wafer surface analysis apparatus showing an embodiment of the present invention. 1... Wafer, 2... Wafer stage, 3... Probe needle, 4... Manipulator, 5... Curve tracer, 6... Optical microscope, 7... Photomultiplier, 8
...Reflection infrared microscope, 9...Infrared camera, 10...
CCD camera, 11...Monitor TV.
Claims (1)
された光学顕微鏡及び光電子増倍器並びにＣＣＤ
カメラと、前記ウエーハ裏面側に配置された反射
型赤外顕微鏡と赤外線カメラとを有することを特
徴とするウエーハ面解析装置。 An optical microscope, a photomultiplier, and a CCD placed on the front side of the wafer whose surface is to be analyzed.
A wafer surface analysis apparatus comprising: a camera; a reflection infrared microscope and an infrared camera disposed on the back side of the wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12184789U JPH0360055U (en) | 1989-10-17 | 1989-10-17 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12184789U JPH0360055U (en) | 1989-10-17 | 1989-10-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0360055U true JPH0360055U (en) | 1991-06-13 |
Family
ID=31669869
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12184789U Pending JPH0360055U (en) | 1989-10-17 | 1989-10-17 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0360055U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008502929A (en) * | 2004-06-16 | 2008-01-31 | ビズテック セミコンダクター システムズ ゲーエムベーハー | Inspection apparatus or inspection method for fine structure by reflected or transmitted infrared light |
-
1989
- 1989-10-17 JP JP12184789U patent/JPH0360055U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008502929A (en) * | 2004-06-16 | 2008-01-31 | ビズテック セミコンダクター システムズ ゲーエムベーハー | Inspection apparatus or inspection method for fine structure by reflected or transmitted infrared light |