JPH0360110B2 - - Google Patents
Info
- Publication number
- JPH0360110B2 JPH0360110B2 JP8413381A JP8413381A JPH0360110B2 JP H0360110 B2 JPH0360110 B2 JP H0360110B2 JP 8413381 A JP8413381 A JP 8413381A JP 8413381 A JP8413381 A JP 8413381A JP H0360110 B2 JPH0360110 B2 JP H0360110B2
- Authority
- JP
- Japan
- Prior art keywords
- image forming
- metal
- image
- development
- forming layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000011161 development Methods 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 34
- 229910052751 metal Inorganic materials 0.000 claims description 31
- 239000002184 metal Substances 0.000 claims description 31
- 150000003839 salts Chemical class 0.000 claims description 26
- 239000003638 chemical reducing agent Substances 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 19
- 239000003795 chemical substances by application Substances 0.000 claims description 17
- 239000011230 binding agent Substances 0.000 claims description 14
- 230000009467 reduction Effects 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 7
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims description 6
- 229910021645 metal ion Inorganic materials 0.000 claims description 6
- 239000002923 metal particle Substances 0.000 claims description 5
- IVRMZWNICZWHMI-UHFFFAOYSA-N azide group Chemical group [N-]=[N+]=[N-] IVRMZWNICZWHMI-UHFFFAOYSA-N 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 230000018109 developmental process Effects 0.000 description 55
- 239000007864 aqueous solution Substances 0.000 description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 21
- 239000000243 solution Substances 0.000 description 18
- 238000006722 reduction reaction Methods 0.000 description 13
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 13
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 12
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 10
- 229910001385 heavy metal Inorganic materials 0.000 description 10
- 108010010803 Gelatin Proteins 0.000 description 9
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000008273 gelatin Substances 0.000 description 9
- 229920000159 gelatin Polymers 0.000 description 9
- 235000019322 gelatine Nutrition 0.000 description 9
- 235000011852 gelatine desserts Nutrition 0.000 description 9
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 9
- 229910052753 mercury Inorganic materials 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 8
- 238000007772 electroless plating Methods 0.000 description 8
- 229910052709 silver Inorganic materials 0.000 description 8
- 239000004332 silver Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- -1 iron ions Chemical class 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 101150003085 Pdcl gene Proteins 0.000 description 6
- JBANFLSTOJPTFW-UHFFFAOYSA-N azane;boron Chemical compound [B].N JBANFLSTOJPTFW-UHFFFAOYSA-N 0.000 description 6
- 229910000085 borane Inorganic materials 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000011592 zinc chloride Substances 0.000 description 6
- 235000005074 zinc chloride Nutrition 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 5
- 150000002736 metal compounds Chemical class 0.000 description 5
- 229910052763 palladium Inorganic materials 0.000 description 5
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 5
- TXUICONDJPYNPY-UHFFFAOYSA-N (1,10,13-trimethyl-3-oxo-4,5,6,7,8,9,11,12,14,15,16,17-dodecahydrocyclopenta[a]phenanthren-17-yl) heptanoate Chemical compound C1CC2CC(=O)C=C(C)C2(C)C2C1C1CCC(OC(=O)CCCCCC)C1(C)CC2 TXUICONDJPYNPY-UHFFFAOYSA-N 0.000 description 4
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 4
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 4
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 4
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 239000003431 cross linking reagent Substances 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 4
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 4
- 239000001119 stannous chloride Substances 0.000 description 4
- 235000011150 stannous chloride Nutrition 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 3
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 3
- 150000001989 diazonium salts Chemical class 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 239000001630 malic acid Substances 0.000 description 3
- 235000011090 malic acid Nutrition 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000012279 sodium borohydride Substances 0.000 description 3
- 229910000033 sodium borohydride Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 3
- 239000011975 tartaric acid Substances 0.000 description 3
- 235000002906 tartaric acid Nutrition 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- KRPUDHQXDFRBGF-UHFFFAOYSA-N 1-azido-4-(4-azidophenyl)sulfonylbenzene Chemical compound C1=CC(N=[N+]=[N-])=CC=C1S(=O)(=O)C1=CC=C(N=[N+]=[N-])C=C1 KRPUDHQXDFRBGF-UHFFFAOYSA-N 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 2
- OJVAMHKKJGICOG-UHFFFAOYSA-N 2,5-hexanedione Chemical compound CC(=O)CCC(C)=O OJVAMHKKJGICOG-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 2
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000012190 activator Substances 0.000 description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 2
- 235000003704 aspartic acid Nutrition 0.000 description 2
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 2
- QDWJUBJKEHXSMT-UHFFFAOYSA-N boranylidynenickel Chemical compound [Ni]#B QDWJUBJKEHXSMT-UHFFFAOYSA-N 0.000 description 2
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 2
- 235000015165 citric acid Nutrition 0.000 description 2
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 2
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 2
- 239000004310 lactic acid Substances 0.000 description 2
- 235000014655 lactic acid Nutrition 0.000 description 2
- 239000002932 luster Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 150000002730 mercury Chemical class 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 2
- TZMFJUDUGYTVRY-UHFFFAOYSA-N pentane-2,3-dione Chemical compound CCC(=O)C(C)=O TZMFJUDUGYTVRY-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 2
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 2
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 2
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 2
- 229940074439 potassium sodium tartrate Drugs 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 229910001961 silver nitrate Inorganic materials 0.000 description 2
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 2
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- RCIVOBGSMSSVTR-UHFFFAOYSA-L stannous sulfate Chemical compound [SnH2+2].[O-]S([O-])(=O)=O RCIVOBGSMSSVTR-UHFFFAOYSA-L 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- 239000001384 succinic acid Substances 0.000 description 2
- 229910000375 tin(II) sulfate Inorganic materials 0.000 description 2
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- KSCNHKPMMKUPLO-UHFFFAOYSA-N ($l^{1}-boranylamino)boron Chemical compound [B]N[B] KSCNHKPMMKUPLO-UHFFFAOYSA-N 0.000 description 1
- AAWZDTNXLSGCEK-LNVDRNJUSA-N (3r,5r)-1,3,4,5-tetrahydroxycyclohexane-1-carboxylic acid Chemical compound O[C@@H]1CC(O)(C(O)=O)C[C@@H](O)C1O AAWZDTNXLSGCEK-LNVDRNJUSA-N 0.000 description 1
- PQMFVUNERGGBPG-UHFFFAOYSA-N (6-bromopyridin-2-yl)hydrazine Chemical compound NNC1=CC=CC(Br)=N1 PQMFVUNERGGBPG-UHFFFAOYSA-N 0.000 description 1
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- FSAONUPVUVBQHL-UHFFFAOYSA-N 1,3-bis(4-azidophenyl)prop-2-en-1-one Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C=CC(=O)C1=CC=C(N=[N+]=[N-])C=C1 FSAONUPVUVBQHL-UHFFFAOYSA-N 0.000 description 1
- OQZQDGSYKKFLTE-UHFFFAOYSA-N 1-(4-azidophenyl)-3-phenylprop-2-en-1-one Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C(=O)C=CC1=CC=CC=C1 OQZQDGSYKKFLTE-UHFFFAOYSA-N 0.000 description 1
- TUSDEZXZIZRFGC-UHFFFAOYSA-N 1-O-galloyl-3,6-(R)-HHDP-beta-D-glucose Natural products OC1C(O2)COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC1C(O)C2OC(=O)C1=CC(O)=C(O)C(O)=C1 TUSDEZXZIZRFGC-UHFFFAOYSA-N 0.000 description 1
- YKUDHBLDJYZZQS-UHFFFAOYSA-N 2,6-dichloro-1h-1,3,5-triazin-4-one Chemical compound OC1=NC(Cl)=NC(Cl)=N1 YKUDHBLDJYZZQS-UHFFFAOYSA-N 0.000 description 1
- JQPFYXFVUKHERX-UHFFFAOYSA-N 2-hydroxy-2-cyclohexen-1-one Natural products OC1=CCCCC1=O JQPFYXFVUKHERX-UHFFFAOYSA-N 0.000 description 1
- RXTHAGCVCGSZLO-UHFFFAOYSA-O 2-hydroxybenzenediazonium Chemical class OC1=CC=CC=C1[N+]#N RXTHAGCVCGSZLO-UHFFFAOYSA-O 0.000 description 1
- IQKPRZPVTQHVOY-UHFFFAOYSA-N 2-methylpentanedial Chemical compound O=CC(C)CCC=O IQKPRZPVTQHVOY-UHFFFAOYSA-N 0.000 description 1
- FQHYQCXMFZHLAE-UHFFFAOYSA-N 25405-85-0 Chemical compound CC1(C)C2(OC(=O)C=3C=CC=CC=3)C1C1C=C(CO)CC(C(C(C)=C3)=O)(O)C3C1(O)C(C)C2OC(=O)C1=CC=CC=C1 FQHYQCXMFZHLAE-UHFFFAOYSA-N 0.000 description 1
- GDCFNVWDFSZQEE-UHFFFAOYSA-N 3-(4-azidophenyl)prop-2-enoic acid Chemical compound OC(=O)C=CC1=CC=C(N=[N+]=[N-])C=C1 GDCFNVWDFSZQEE-UHFFFAOYSA-N 0.000 description 1
- XXSPKSHUSWQAIZ-UHFFFAOYSA-L 36026-88-7 Chemical compound [Ni+2].[O-]P=O.[O-]P=O XXSPKSHUSWQAIZ-UHFFFAOYSA-L 0.000 description 1
- ABBGIFCRZQRIAV-UHFFFAOYSA-N 4-(4-azidophenyl)but-3-en-2-one Chemical compound CC(=O)C=CC1=CC=C(N=[N+]=[N-])C=C1 ABBGIFCRZQRIAV-UHFFFAOYSA-N 0.000 description 1
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- 238000012545 processing Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 150000003378 silver Chemical class 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- LRBQNJMCXXYXIU-NRMVVENXSA-N tannic acid Chemical compound OC1=C(O)C(O)=CC(C(=O)OC=2C(=C(O)C=C(C=2)C(=O)OC[C@@H]2[C@H]([C@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)[C@@H](OC(=O)C=3C=C(OC(=O)C=4C=C(O)C(O)=C(O)C=4)C(O)=C(O)C=3)O2)OC(=O)C=2C=C(OC(=O)C=3C=C(O)C(O)=C(O)C=3)C(O)=C(O)C=2)O)=C1 LRBQNJMCXXYXIU-NRMVVENXSA-N 0.000 description 1
- 229920002258 tannic acid Polymers 0.000 description 1
- 235000015523 tannic acid Nutrition 0.000 description 1
- 229940033123 tannic acid Drugs 0.000 description 1
- YBRBMKDOPFTVDT-UHFFFAOYSA-N tert-butylamine Chemical compound CC(C)(C)N YBRBMKDOPFTVDT-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- 239000012905 visible particle Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Description
本発明は物理現像により可視画像を得る型の画
像形成材料を用いる画像形成方法に関する。
物理現像は、潜像をなす微細金属核を被還元性
の金属イオンと還元剤とを含む現像液(以下、し
ばしば「物理現像液」と称する)で処理して成長
した金属粒子からなる可視画像を与える過程を云
い、一般には銀画像を形成する手段として知られ
ている。
近年、銀塩の資源的有限性から、非銀塩画像形
成材料が見直されてきているが、物理現像を利用
する画像形成法として実用化されているものは、
プリント基板への導体パターン形成法があるに過
ぎない。
従来より提案されている物理現像を用いる画像
形成法としては、第2鉄イオンが光照射により第
1鉄イオンになる反応を利用して、生成した第1
鉄イオンにより貴金属イオンを還元して金属現像
核をつくり、これを物理現像する方法がある。こ
の方法に用いられる現像核成系には、鉄−金系、
鉄−水銀系、鉄−銀系(すなわちブラウンプリン
トを与える系)などがある。
又、光還元剤として有機化合物を利用する方法
も提案されている。例えば一つの方法では、ジア
ゾスルホネートと核形成可能な水溶性水銀化合物
との組合せからなる感光剤系を使用するもので、
この系に露光すると、ジアゾスルホネートの亜硫
酸イオンが遊離し、これが一価の水銀塩を不均化
し、0価の水銀が出来、銀の物理現像液に触れさ
せると、その水銀核に銀が析出し、可視像を得
る。ジアゾスルホネートの代りに、CN-、
CNS-、NO-、S2O3 2-イオンを遊離するような感
光化合物を用いても画像が得られるとされてい
る。(特公昭37−3319号公報)
しかしながら、これらの方法は水銀を用いるこ
となどから廃液処理、操作上に問題がある。
他の方法としては、特殊なジアゾニウム塩例え
ばヒドロキシベンゼンジアゾニウム塩と核形成可
能な硝酸銀との組合せからなる、感光剤系を使用
するもので、この系に露光するとジアゾニウム塩
が分解してフエノールとなりそのフエノールの還
元力によつて銀核を形成し、銀の物理現像液に軸
れさせることにより可視像を得る。これは銀を用
いる例である。
一方、すでに物理現像と感光性樹脂を組合せる
方法を発明者等は提案している。すなわちこの方
法では、感光性樹脂の塗布層に露光ならびに現像
処理を行い、選択的に樹脂を溶出させてレリーフ
像を形成するとともに、レリーフ像中に金属核を
含ましめ、次いで物理現像する。レリーフ像中に
金属核を形成するためには、例えばレリーフ像
を、まず塩化パラジウム酸性水溶液、次いで塩化
第一スズ酸性水溶液で処理して金属パラジウム核
を形成する。
この方法は、感光性樹脂自体のレリーフ・パタ
ーン形成能を使用して金属潜像をパターン化する
ものであるが、レリーフ像とするため、充分な解
像性が得られないという難点および膜強度が弱い
欠点を有する。
又、光還元性物質として、酸化チタン(米国特
許第2738272号、同第2929709号各明細書)、アン
スラキノン(米国特許第2504593号明細書)、塩化
スズ(Plating58786(1971))などを使用する方法
も知られ、実用化されているが、これらはいずれ
もプリント基板へのパターン形成法として利用さ
れるに過ぎない。
酸化チタンを用いた場合、非画像部が透明なも
のが得られない点があり、アンスラキノン−2,
6−ジスルホン酸ナトリウムを用いたものはすで
にプリント基板作製に実用化されているがこれは
ギ酸銅、グルコン酸銅のような二価の銅塩と塩化
ニツケル、塩化コバルト硫酸鉄との組合せに限ら
れている。又塩化スズを使用した場合、塩化第1
スズが大気中の酸素によつて容易に酸化され、寿
命が短いこと、感光波長が250nm付近でパワーの
ある光源が利用出来ないことなどの問題点があ
る。
本発明者等は更に、金、白金パラジウム、銀、
鉄、銅などの金属の核を現像核とする物理現像を
ジアゾ基又はアジド基を有する化合物により抑制
することも提案しているが、かかる抑制の機構に
ついては明確ではないがジアゾ基又はアジド基を
有する化合物自体或いはこれらの化合物の物理現
像液処理によつて得られた反応生成物により物理
現像が効果的に抑制されると推定でき、この物理
現像液処理によつて得られた化合物の構造は明確
ではないが、物理現像後にはジアゾ基又はアジド
基を有する化合物が光によつて分解をしない点か
らみて、何らかの化学的変化をおこしているもの
と推定され、効果的な抑制ができる反面、物理現
像液との反応による物理現像液の疲労を招くもの
であり、くり返し同一の物理現像液を用いて物理
現像を行なうと、物理現像の所要時間が次第に長
くなる、或いは物理現像が不完全になつて可視像
の濃度が上がらない、可視像部にピンホールを生
じる等の欠点を有するものである。
本発明は上記の光架橋剤による抑制の欠点を除
くものであつて具体的にはパターン露光後、未露
光部の光架橋剤を除きしかる後物理現像を行なう
ものであり、前記画像形成材料の画像形成層に、
パターン露光を行い、その後、未露光部の光架橋
剤を溶解除去し、次いで該画像形成層を還元剤と
接触させて画像形成核を形成する第1現像工程
(金属現像核形成工程)と、該画像形成層を被還
元性の金属イオンと還元剤とを含む物理現像液と
接触させて未露光部に金属現像核を中心として前
記被還元性の金属イオンの還元により析出成長し
た金属粒子からなる画像を形成する第2現像工程
(物理現像工程)とを実施することを特徴とする
ものである。この場合、第1現像工程と第2現像
工程とは、反応機構的には逐次に進むものと考え
られるが、操作的には、この順序で逐次に行つて
もよいし、物理現像液中に比較的強い還元剤を用
いることにより実質的に同時に行うことも可能で
ある。
本発明の画像形成方法におけるパターン露光工
程は、画像形成層の露光部において、親水性バイ
ンダー層の架橋度を上げてその物理現像効果を低
下させる効果を有する。したがつて、その後の物
理現像に際しては、金属現像核の存在のもとに、
物理現像液中の金属イオンが金属として析出成長
する速度が未露光部におけるよりも低下しこのよ
うな金属の析出成長が起りにくく結果的に未露光
部に選択的に成長した金属粒子からなる可視画像
が得られる。このように、従来は、露光工程にお
いて金属現像核を発生させていたのに対して、本
発明では金属現像核は露光とは無関係に還元処理
より発生させ、露光工程では、物理現像液の浸透
速度に差をつける点に、本発明の画像形成法の最
大の特徴がある。
以下本発明について図面を用いて説明する。
以下の記載において、「%」および「部」は、
特に断らない限り重量基準とする。
第1図は本発明の画像形成材料の一実施例を概
念的に示す、その厚み方向断面図である。
第1図に一例を示すように、本発明の画画形成
材料Aは、支持体1上に、画像形成層2を設けて
なる。
支持体1としては、ガラス、木、紙、プラスチ
ツクフイルム、織布、不織布等の任意の固体材料
が用いられるが、なかでもポリエステルフイル
ム、トリアセテートフイルムなどのプラスチツク
フイルムが特に好ましく用いられる。これら支持
体1には、必要に応じて、コロナ放電処理、プラ
イマー処理などの接着性改良のための前処理をし
てから、画像形成層2を設ける。
画像形成層2は、親水性バインダー層中に、還
元されて金属現像核となる金属化合物および光架
橋剤を分散、好ましくは溶解させてなる。
バインダーとしては、たとえば、ゼラチン、カ
ゼイン、グルー、アラビアゴム、セラツクなどの
天然高分子、カルボキシメチルセルロース、卵白
アルブミン、ポリビニルアルコール(部分ケン化
ポリ酢酸ビニル)、ポリアクリル酸、ポリアクリ
ルアミド、ポリビニルピロリドン、ポリエチレン
オキシド、無水マレイン酸共重合体などが用いら
れるが、水溶性ないし親水性樹脂である限りにお
いて、上記以外のものも使用可能である。バイン
ダーに必要な親水性の程度は、画像形成層2を形
成して、物理現像液と接触させるときに、物理現
像液が画像形成層2に浸透して物理現像が可能と
なる程度である。
還元されて金属現像核を与える金属化合物とし
ては、パラジウム、金、銀、白金、銅等の貴なる
金属の塩化物、硝酸塩などの水溶性塩、たとえば
無電解メツキのアクチベーター液中に含まれる塩
化パラジウム、硝酸銀、4塩化水素金などの水溶
性塩が用いられる。なかでもパラジウム、金、白
金、銅の水溶性塩、特にパラジウムの水溶性塩が
好ましく用いられる。
画像形成層2は、好ましくは上述した金属化合
物の水溶液(市販される無電解メツキ用のアクチ
ベーター液をそのまま用いることができる)を光
架橋剤とともにバインダー水溶液と混合して、塗
布に適した粘度10〜1000センチポイズ程度の液と
し、これを支持体1上に塗布し、乾燥することに
より、通常0.1〜30μの塗膜として得られる。溶媒
としては上述した水以外にも、水と低級アルコー
ル、ケトン、エーテル等の水混和性溶媒との混合
溶媒も用いられる。
光架橋剤としては、たとえば、ジアゾ基を有す
る水溶性の塩化亜鉛複塩、硫酸塩、リン酸塩ある
いはこれらから得られるジアゾ樹脂、より具体的
には、p−N,N−ジエチルアミノベンゼンジア
ゾニウムクロリド塩化亜鉛複塩、p−N−エチル
−N−β−ヒドロキシエチルアミノベンゼンジア
ゾニウムクロリド塩化亜鉛複塩、p−N,N−ジ
メチルアミノベンゼンジアゾニウムクロリド塩化
亜鉛複塩、4−モルフオリノベンゼンジアゾニウ
ムクロリド塩化亜鉛複塩、4−モルフオリノ−
2,5−ジエトキシベンゼンジアゾニウムクロリ
ド塩化亜鉛複塩、4−モルフオリノ−2,5−ジ
ブトキシベンゼンジアゾニウムクロリド塩化亜鉛
複塩、4−ベンゾイルアミノ−2,5−ジエトキ
シベンゼンジアゾニウムクロリド塩化亜鉛複塩、
4−(4′−メトキシベンゾイルアミノ)−2,5−
ジエトキシベンゼンジアゾニウムクロリド塩化亜
鉛複塩、4−(p−トルイルメルカプト)−2,5
−ジメトキシベンゼンジアゾニウムクロリド塩化
亜鉛複塩、4−ジアゾジフエニルアミン塩化亜鉛
複塩、4−ジアゾ−4′−メトキシジフエニルアミ
ン塩化亜鉛複塩、4−ジアゾ−3−メトキシ−ジ
フエニルアミン塩化亜鉛複塩、上記塩化亜鉛複塩
に対応する硫酸塩ならびにリン酸塩など、ならび
にこれらジアゾニウム化合物とパラホルムアルデ
ヒドの反応生成物であるジアゾ樹脂など、またア
ジド化合物である、p−アジドベンザルアルデヒ
ド、p−アジドアセトフエノン、p−アジド安息
香酸、p−アジドベンザルアセトフエノン、p−
アジドベンザルアセトン、4,4′−ジアジドカル
コン、2,6−ビス−(4′−アジドベンザル)−ア
セトン、4,4′−ジアジドスチルベン−2,2′−
ジスルホン酸、p−アジドベンゾイルクロリド、
3−アジド無水フタル酸、4,4′−ジアジドジフ
エニルスルホン、p−アジド桂皮酸、4,4′−ジ
アジドベンゾイルアセトン−2,2′−スルホン酸
ナトリウムなどが用いられる。
画像形成層2中には上記したバインダー100部
に対して:金属化合物を0.1〜100部、特に1〜10
個、光架橋剤を1〜100部、特に20〜60部の割合
で含ませることが好ましい。
画像形成層2を形成後、物理現像処理中の現像
液へのバインダーの溶出を抑制するため、望まし
くは硬膜処理を行う。硬膜処理は、例えば下記の
化合物を画像形成層2の形成用塗布液中にバイン
ダー100部に対してたとえば0.1〜50部の割合で混
合するか、あるいはその水溶液を画像形成層上に
塗布することにより行われる。
カリ明バン、アンモニウム明バン等のAl化合
物;クロム明バン、硫酸クロム等のCr化合物;
ホルムアルデヒド、グリオキザル、グルタルアル
デヒド、2−メチルグルタルアルデヒド、サクシ
ナルデヒド等のアルデヒド類;O−ベンゾキノ
ン、p−ベンゾキノン、シクロヘキサン−1,2
−ジオン、シクロペンタン−1,2−ジオン、ジ
アセチル、2,3−ペンタンジオン、2,5−ヘ
キサンジオン、2,5−ヘキセンジオン等のジケ
トン;トリグリシジルイソシアヌル酸塩などのエ
ポキシド;テトラフタロイルクロリド、4,4′−
ジフエニルメタジスルフオニルクロリド、4,
4′−ジフエニルメタンジスルフオニルクロリドな
どの酸無水物;タンニン酸、没食子酸、2,4−
ジクロロ−6−ヒドロキシ−S−トリアジン、な
らびに一般式R2NPOX2、(R2N)oPOX3-o、
The present invention relates to an image forming method using an image forming material of the type that obtains a visible image by physical development. Physical development is a visible image made of metal particles grown by treating fine metal nuclei forming a latent image with a developer containing reducible metal ions and a reducing agent (hereinafter often referred to as "physical developer"). It is generally known as a means of forming silver images. In recent years, non-silver salt image forming materials have been reconsidered due to the limited resources of silver salts, but the ones that have been put into practical use as image forming methods that utilize physical development are:
There is only a method for forming conductor patterns on printed circuit boards. An image forming method using physical development that has been proposed so far utilizes the reaction of ferric ions to become ferrous ions when irradiated with light.
There is a method of reducing noble metal ions with iron ions to create metal development nuclei and physically developing them. Development nucleation systems used in this method include iron-gold system,
There are iron-mercury-based, iron-silver-based (that is, systems that give brown prints), and the like. Furthermore, a method using an organic compound as a photoreducing agent has also been proposed. For example, one method uses a photosensitizer system consisting of a combination of a diazosulfonate and a nucleating water-soluble mercury compound;
When exposed to this system, the sulfite ion of the diazosulfonate is liberated, which disproportionates the monovalent mercury salt to form zero-valent mercury, and when exposed to a physical silver developer, silver is deposited on the mercury nucleus. and obtain a visible image. Instead of diazosulfonate, CN - ,
It is said that images can also be obtained using photosensitive compounds that liberate CNS - , NO - , and S 2 O 3 2- ions. (Japanese Patent Publication No. 37-3319) However, since these methods use mercury, there are problems in waste liquid treatment and operation. Another method is to use a photosensitive system consisting of a combination of a special diazonium salt, such as a hydroxybenzenediazonium salt, and nucleating silver nitrate; upon exposure to this system, the diazonium salt decomposes to form a phenol. Silver nuclei are formed by the reducing power of phenol, and a visible image is obtained by exposing them to a physical silver developer. This is an example using silver. On the other hand, the inventors have already proposed a method of combining physical development and photosensitive resin. That is, in this method, a coated layer of photosensitive resin is exposed and developed, the resin is selectively eluted to form a relief image, metal nuclei are included in the relief image, and then physical development is performed. In order to form metal nuclei in the relief image, for example, the relief image is first treated with an acidic aqueous solution of palladium chloride and then with an acidic aqueous solution of stannous chloride to form metal palladium nuclei. This method uses the relief pattern forming ability of the photosensitive resin itself to pattern a metal latent image, but since it is a relief image, it has the disadvantage of not being able to obtain sufficient resolution and the film strength. has a weak disadvantage. In addition, titanium oxide (U.S. Patent Nos. 2,738,272 and 2,929,709), anthraquinone (U.S. Pat. No. 2,504,593), tin chloride (Plating 58,786 (1971)), etc. are used as photoreducing substances. Methods are also known and have been put into practical use, but all of these methods are used only as methods for forming patterns on printed circuit boards. When using titanium oxide, it is difficult to obtain a transparent non-image area, and anthraquinone-2,
Sodium 6-disulfonate has already been put to practical use in the production of printed circuit boards, but this is limited to combinations of divalent copper salts such as copper formate and copper gluconate with nickel chloride, cobalt chloride, and iron sulfate. It is being Also, when using tin chloride, stannous chloride
Problems include that tin is easily oxidized by oxygen in the atmosphere, has a short lifespan, and that a powerful light source cannot be used because the photosensitive wavelength is around 250 nm. The inventors further discovered that gold, platinum palladium, silver,
It has also been proposed that physical development using a metal nucleus such as iron or copper as a development nucleus is inhibited by a compound having a diazo group or an azide group, but the mechanism of such inhibition is not clear, but It can be presumed that physical development is effectively suppressed by the compounds themselves having , or the reaction products obtained by treating these compounds with a physical developer, and the structure of the compound obtained by this physical developer treatment. Although it is not clear whether the compound has a diazo group or azide group is not decomposed by light after physical development, it is presumed that some kind of chemical change has occurred, and while this can be effectively suppressed, This causes fatigue of the physical developer due to the reaction with the physical developer, and if physical development is performed repeatedly using the same physical developer, the time required for physical development will gradually increase, or the physical development may be incomplete. This method has drawbacks such as the density of the visible image not increasing as the image ages, and pinholes forming in the visible image area. The present invention eliminates the drawbacks of the above-mentioned suppression by a photo-crosslinking agent, and specifically, after pattern exposure, the photo-crosslinking agent in unexposed areas is removed, and then physical development is performed. In the image forming layer,
A first development step (metal development nucleus formation step) of performing pattern exposure, then dissolving and removing the photocrosslinking agent in the unexposed areas, and then bringing the image forming layer into contact with a reducing agent to form image formation nuclei; The image forming layer is brought into contact with a physical developer containing reducible metal ions and a reducing agent, and metal particles are deposited and grown in unexposed areas by reduction of the reducible metal ions, centering on metal development nuclei. This is characterized in that a second development step (physical development step) is performed to form an image. In this case, the first development step and the second development step are considered to proceed sequentially in terms of reaction mechanism, but operationally, they may be carried out sequentially in this order, or they may be carried out in a physical developer. It is also possible to carry out substantially simultaneously by using a relatively strong reducing agent. The pattern exposure step in the image forming method of the present invention has the effect of increasing the degree of crosslinking of the hydrophilic binder layer in the exposed portion of the image forming layer and reducing its physical development effect. Therefore, in the subsequent physical development, in the presence of metal development nuclei,
The rate at which metal ions in the physical developer precipitate and grow as metal is lower than that in unexposed areas, making it difficult for such metal precipitation to occur.As a result, visible particles consisting of metal particles that selectively grow in unexposed areas An image is obtained. In this way, conventionally, metal development nuclei were generated in the exposure process, but in the present invention, metal development nuclei are generated through reduction treatment regardless of exposure, and in the exposure process, metal development nuclei are generated by the reduction process, which is caused by the penetration of the physical developer. The most important feature of the image forming method of the present invention is that it provides a difference in speed. The present invention will be explained below with reference to the drawings. In the following description, "%" and "part" are
Unless otherwise specified, measurements are based on weight. FIG. 1 is a sectional view in the thickness direction conceptually showing one embodiment of the image forming material of the present invention. As an example is shown in FIG. 1, the image forming material A of the present invention comprises a support 1 and an image forming layer 2 provided thereon. As the support 1, any solid material such as glass, wood, paper, plastic film, woven fabric, non-woven fabric can be used, and among them, plastic films such as polyester film and triacetate film are particularly preferably used. These supports 1 are provided with the image forming layer 2 after being pretreated to improve adhesion, such as corona discharge treatment and primer treatment, if necessary. The image forming layer 2 is formed by dispersing, preferably dissolving, in a hydrophilic binder layer, a metal compound that is reduced to become metal development nuclei and a photocrosslinking agent. Examples of binders include natural polymers such as gelatin, casein, glue, gum arabic, and shellac, carboxymethylcellulose, egg albumin, polyvinyl alcohol (partially saponified polyvinyl acetate), polyacrylic acid, polyacrylamide, polyvinylpyrrolidone, and polyvinyl pyrrolidone. Ethylene oxide, maleic anhydride copolymers, etc. are used, but other resins than the above can also be used as long as they are water-soluble or hydrophilic resins. The degree of hydrophilicity required for the binder is such that when the image forming layer 2 is formed and brought into contact with a physical developer, the physical developer permeates into the image forming layer 2 to enable physical development. Metal compounds that are reduced to give metal development nuclei include water-soluble salts such as chlorides and nitrates of noble metals such as palladium, gold, silver, platinum, and copper, such as those contained in the activator solution for electroless plating. Water-soluble salts such as palladium chloride, silver nitrate, and gold tetrachloride are used. Among these, water-soluble salts of palladium, gold, platinum, and copper, particularly water-soluble salts of palladium, are preferably used. The image forming layer 2 is preferably formed by mixing an aqueous solution of the above-mentioned metal compound (a commercially available activator liquid for electroless plating can be used as is) with an aqueous binder solution together with a photocrosslinking agent to obtain a viscosity suitable for coating. A liquid having a thickness of about 10 to 1000 centipoise is prepared, and this is applied onto the support 1 and dried to obtain a coating film having a thickness of usually 0.1 to 30 μm. In addition to the water mentioned above, a mixed solvent of water and a water-miscible solvent such as a lower alcohol, ketone, or ether may also be used as the solvent. Examples of the photocrosslinking agent include water-soluble zinc chloride double salts, sulfates, and phosphates having a diazo group, or diazo resins obtained from these, and more specifically, p-N,N-diethylaminobenzenediazonium chloride. Zinc chloride double salt, p-N-ethyl-N-β-hydroxyethylaminobenzenediazonium chloride zinc chloride double salt, p-N,N-dimethylaminobenzenediazonium chloride zinc chloride double salt, 4-morpholinobenzenediazonium chloride Zinc chloride double salt, 4-morpholino-
2,5-diethoxybenzenediazonium chloride zinc chloride double salt, 4-morpholino-2,5-dibutoxybenzenediazonium chloride zinc chloride double salt, 4-benzoylamino-2,5-diethoxybenzenediazonium chloride zinc chloride double salt ,
4-(4'-methoxybenzoylamino)-2,5-
Diethoxybenzenediazonium chloride zinc chloride double salt, 4-(p-tolylmercapto)-2,5
-Dimethoxybenzenediazonium chloride zinc chloride double salt, 4-diazodiphenylamine zinc chloride double salt, 4-diazo-4'-methoxydiphenylamine zinc chloride double salt, 4-diazo-3-methoxy-diphenylamine zinc chloride double salt , sulfates and phosphates corresponding to the zinc chloride double salts, diazo resins which are reaction products of these diazonium compounds and paraformaldehyde, and azide compounds such as p-azidobenzaldehyde and p-azide. Acetophenone, p-azidobenzoic acid, p-azidobenzalacetophenone, p-
Azidobenzalacetone, 4,4'-diazidochalcone, 2,6-bis-(4'-azidobenzal)-acetone, 4,4'-diazidostilbene-2,2'-
Disulfonic acid, p-azidobenzoyl chloride,
3-azido phthalic anhydride, 4,4'-diazido diphenyl sulfone, p-azido cinnamic acid, sodium 4,4'-diazidobenzoylacetone-2,2'-sulfonate, etc. are used. The image forming layer 2 contains 0.1 to 100 parts of a metal compound, particularly 1 to 10 parts of a metal compound per 100 parts of the above-mentioned binder.
It is preferable to include a photocrosslinking agent in an amount of 1 to 100 parts, particularly 20 to 60 parts. After forming the image forming layer 2, a hardening process is desirably performed in order to suppress elution of the binder into the developer during physical development. For hardening, for example, the following compound is mixed in the coating solution for forming the image forming layer 2 at a ratio of 0.1 to 50 parts per 100 parts of the binder, or an aqueous solution thereof is applied onto the image forming layer. This is done by Al compounds such as potassium alum and ammonium alum; Cr compounds such as chromium alum and chromium sulfate;
Aldehydes such as formaldehyde, glyoxal, glutaraldehyde, 2-methylglutaraldehyde, succinaldehyde; O-benzoquinone, p-benzoquinone, cyclohexane-1,2
-dione, diketones such as cyclopentane-1,2-dione, diacetyl, 2,3-pentanedione, 2,5-hexanedione, 2,5-hexenedione; epoxides such as triglycidyl isocyanurate; tetraphthaloyl Chloride, 4,4'-
diphenylmetadisulfonyl chloride, 4,
Acid anhydrides such as 4'-diphenylmethanedisulfonyl chloride; tannic acid, gallic acid, 2,4-
Dichloro-6-hydroxy-S-triazine, as well as general formulas R 2 NPOX 2 , (R 2 N) o POX 3-o ,
【式】
およびR−N=C=N−R′(ここでRは炭素2〜
6のアルキル基、R′は(CH3)3N+(CH3)3X-基、
XはF又はCl、nは1又は2)で表わされるリン
化合物又はカルボジイミド;スチレン/マレイン
酸共重合体、ビニルピロリドン/マレイン酸共重
合体、ビニルメチルエーテル/マレイン酸共重合
体、エチレンイミン/マレイン酸共重合体、メタ
クリル酸/メタクリロニトリル共重合体、ポリメ
タクリルアミド、メタクリル酸エステル共重合体
等の樹脂類。ジカルボン酸としてグルタル酸、コ
ハク酸、ヒドロキシカルボン酸としてりんご酸、
乳酸、クエン酸、アスパラギン酸、グルコール
酸、酒石酸等の有機カルボン酸も使用出来る。
本発明の画像形成方法に従えば、まず画像形成
層2にたとえば第2図に示すような透過原稿3を
介して、パターン露光を行う。これにより露光部
2Aにおいて選択的に且つ露光量に応じた程度に
光架橋剤を分壊架橋させる。光源としては、前記
した光架橋剤を分壊できる光源ならば任意のもの
が用いられる。例えば、超高圧水銀灯、高圧水銀
灯、低圧水銀灯、メタルハライド灯、アーク灯、
ケミカルランプ、キセノン灯、Arレーザーなど
が使用できる。所望の画像階調に応じて、たとえ
ば中心波長が405nm紫外光を用いた場合、1w/
m3〜300w/m3の強度で10〜200秒露光すればよ
い。以上のパターン露光により露光部2Aにおい
て光架橋剤が分解して露光部2Aにおいて親水性
バインダーが架橋されると共に疎水性が付与され
る。
上記のパターン露光により露光されていない部
分である未露光部には光架橋剤が変化することな
く残存しているので未露光部の光架橋剤をそのま
まにして以降の現像を行なうと物理現像液の疲労
が早まるため未露光部の光架橋剤を溶解除去する
必要がある。溶解除去は画像形成層を水の中に浸
漬、或いは水と接触させて行なえばよく、処理に
要する時間は親水性バインダー層の材料によつて
も異なるが、一般に5〜30分である。
次いでこのようにしてパターン露光により、パ
ターン状に疎水性が付与された潜像を有する画像
形成層2に還元剤水溶液を浸漬ないしは塗布によ
り接触させて画像形成層2中にほぼ一様に金属現
像核を発生させる。還元剤としては、塩化第1ス
ズ、硫酸第1スズ、水素化ホウ素ナトリウム、ジ
メチルアミンボラザン、ジエチルアミンボラザ
ン、トリメチルアミンボラザン、その他ボラザン
誘導体、ボラン、ジボラン、メチルジボラン等の
ボラン誘導体、ヒドラジン等を用いることができ
る。特に望ましくは、酸性塩化第1スズ溶液、硫
酸第1スズ溶液(Weiss液)あるいは市販の無電
解メツキ用のセンシタイザー液などが用いられる
が、一般には強力な還元剤であればすべて使用で
きる。この還元処理は、還元剤の強度によつても
異なるが一般に還元剤を0.1〜50g/の濃度で含
む還元剤溶液を用い、常温ないし加温下で10秒〜
400秒程度行われる。
更に、このようにして得られた金属現像核と光
架橋剤の選択的分解による架橋密度が高く、疎水
性が付与された潜像を有する画像形成層2に、物
理現像液を浸漬ないし塗布により接触させて、未
露光部に金属現像核を中心として現像液中の金属
が還元により析出した第3図に示すような可視像
2Bを形成する。
物理現像液としては、水溶性の被還元性重金属
塩および還元剤を含む水溶液が必要に応じて加温
した状態で使用される。
被還元性重金属塩としては、例えばニツケル、
コバルト、鉄及びクロム等のVIb族金属、銅等の
Ib族金属の水溶性塩が単独で又は混合して使用さ
れる。適当な水溶性の被還元性重金属塩として
は、例えば以下のものが用いられる。
塩化第一コバルト、ヨウ化第一コバルト、臭化
第一鉄、塩化第一鉄、臭化第二クロム、ヨウ化第
二クロム、塩化第二銅等の重金属ハライド;硫酸
ニツケル、硫酸第一鉄、硫酸第一コバルト、硫酸
第二クロム、硫酸第二銅等の重金属硫酸塩;硝酸
ニツケル、硝酸第一鉄、硝酸第一コバルト、硝酸
第二クロム、硝酸第二銅等の重金属硝酸塩;フエ
ラスアセテート、コバルタスアセテート、クロミ
ツクアセテート、キユープリツクフオルメート等
の重金属の有機酸塩。
これら被還元性重金属塩は物理現像液中に、た
とえば10〜100g/の割合で含まれる。
還元剤としては、例えば次亜リン酸、次亜リン
酸ナトリウム、水素化ホウ素ナトリウム、ヒドラ
ジン、ホルマリン、ジエチルアミンボラン、ジメ
チルアミンボラン、トリメチルアミンボラン、ボ
ラン、ジボラン、メチルジボラン、ジボラザン、
ボラゼン、ボラジン、t−ブチルアミンボラザ
ン、ピリジンボラン、2,6−ルチジンボラン、
エチレンジアミンボラン、ヒドラジンジボラン、
ジメチルホスフインボラン、フエニルホスフイン
ボラン、ジメチルアルジンボラン、フエニルアル
ジンボラン、ジメチルスチピンボラン、ジエチル
スチピンボランなどが使用できる。
これら還元剤は、物理現像液中に、たとえば
0.1〜50g/の割合で用いられる。
物理現像液中に有効な還元剤のいくつかは、金
属現像核の発生のための還元剤と重複するもので
ある。したがつて、比較的強い還元剤を含む物理
現像液を用いる場合は、露光後には金属現像核発
生のための還元処理を行わず、直接に物理現像液
で処理して、金属現像核の発生と物理現像を実質
的に同時に行うこともできる。ただし、二段階に
分けて行うと、還元反応と金属析出反応をそれぞ
れ温度、反応時間で正確にコントロール出来る利
点がある。
特に本発明の画像形成方法においては現像時間
を長びかせると、未露光部のみならず露光部にも
物理現像液が浸透し、いわゆるカブリを起こすた
め二段階の方が好ましい。
物理現像液中には、前記した被還元性重金属塩
の溶解により生成する重金属イオンが水酸化物と
して沈澱するのを防止するために、たとえばモノ
カルボン酸;ジカルボン酸;リンゴ酸、乳酸等の
ヒドロキシカルボン酸;コハク酸、クエン酸、ア
スパラギン酸、グリコール酸、酒石酸、エチレン
ジアミンテトラ酢酸、グルコン酸、糖酸、キニン
酸等の有機カルボン酸からなる錯塩化剤の一種又
は二種以上を含ませることができる。これら錯塩
化剤は、物理現像液中にたとえば1〜100g/
の割合で用いられる。
更に、物理現像液には、現像液の保存性および
操作性ならびに得られる画像の質を改善するため
に、酸及び塩基等のPH調節剤、緩衝剤、防腐剤、
増白剤、界面活性剤などが常法に従い必要に応じ
て添加される。
本発明によれば、物理現像液の疲労が少ないた
め、物理現像の所要時間の延長、可視像の濃度の
低下、ピンホールの発生等を防止することができ
る利点を有し、更に透過光学濃度が4以上もあり
必要に応じて階調のある黒色画像が形成可能であ
り、光架橋剤溶解系を用いるため解像力も高く、
銀塩写真法による画像と代替し得る画像が得られ
る。又、画像は、金属画像であるため、赤血塩と
チオ硫酸ナトリウムからなるフアーマー減力液、
コダツクR−4などの減力液を用いて修正可能で
ある。このような特徴を生かして本発明法により
得られる画像材料は、リスフイルムの代替物ある
いはマスク材などとして使用可能である。また、
物理現像を、たとえば第1現像をホウ素還元剤を
用いたニツケルメツキ浴で、第2現像を次亜リン
酸ナトリウムを還元剤を用いた65℃から90℃の高
温ニツケルメツキ浴又は銅メツキで高速メツキす
る条件で行えば、バインダー表面に金属光沢を持
つ金属画像を形成できる。しかも得られた画像
を、たとえば塩酸5%又は硝酸の5%水溶液で5
分間処理することにより非画像部のバインダーを
選択的に除去できるためプリント基板としても使
用が可能である。
以下、実施例により本発明をより具体的に説明
する。
実施例 1
PdCl22gを、HCl20mlとともに水1000c.c.中に溶
解し、得られたPdCl2液の20gを用いて下記組成
の感材(画像形成層形成用塗布液)を調製した。
上記組成のPdCl2液 20g
ゼラチン(新田ゼラチン製P−2151)30%水溶
液 10g
ジアゾレジン20%水溶液 2.5g
グルタル酸 0.12g
上記感材を30℃〜40℃に温度調整し、あらかじ
めプラズマ処理を行なつたポリエステルフイルム
(東レ・ルミラーS・100#)に塗布し乾燥して
5μの塗膜を得た。
上記で得られた感材フイルム(画像形成材料)
に超高圧水銀灯2KWプリンター(光源からの距
離100cm)を用いて2分間ネガフイルムを密着露
光し、ついで20℃の水中に浸漬してジアゾレジン
を溶解除去した後30℃の下記還元浴に1分間浸漬
して還元処理した。
SnCl2 1g
HCl 40ml
H2O 100c.c.
次いで、下記組成の90℃の物理現像液で処理し
て金属を析出せしめ、黒色の画像を形成した。
塩化ニツケル 30g
次亜リン酸ナトリウム 10g
オキシ酢酸ナトリウム 50g
水 900g
同様の感材フイルムを超高圧水銀灯2KWプリ
ンター(光源からの距離100cm)を用い2分間ネ
ガフイルムを密着して露光した。次いで20℃の水
中に20分浸漬した後特別の還元処理を行うことな
く65℃のホウ素−ニツケル系メツキ浴(シバニツ
ケル原液、奥野製薬製)50秒間浸漬し現像し乾燥
した。
得られた画像は黒色で150線4%網点を解像し
た。この現像処理では還元と現像が同時に行なわ
れている。
実施例 2
実施例1と同様にして感材フイルムを作成し、
ネガフイルムを介して露光し20℃の水中に浸漬し
た後、下記の組成の物理現像液に30℃で1分30秒
浸漬して現像し、黒色画像を得た。
塩化ニツケル 0.1モル
ジメチルアミンボラン 0.1モル
コハク酸 0.5モル
NaOHでPHを7.0に調節した。
実施例 3
実施例1と同様にして感材フイルムを作成なら
びに露光、水洗し、下記の組成のA液とB液とを
使用直前に1:1で混合して得た物理現像液
(Narcussの無電解メツキ浴)に22℃で7分間浸
漬して現像し、黒色画像を得た。
A 液
硫酸銅 60g/
硫酸ニツケル 15g/
硫酸ヒドラジン 45g/
B 液
水酸化ナトリウム 45g/
酒石酸カリウムナトリウム 180g/
炭酸ナトリウム 15g/
実施例 4
実施例1と同様に作製した感材フイルムを水洗
乾燥し、超高圧水銀灯2KWプリンター(光源か
らの距離100cm)を用い2分間露光し、流水で30
分水洗した後、塩酸ヒドラジン(N2H2・HCl)
を1.0mol/の割合で含む還元浴に40℃で1分
間浸漬した。
次いで下記に示す無電解メツキ液で6分間処理
をして金属光沢のある画像を得た。
塩化ニツケル 50g/
次亜リン酸ナトリウム 10g/
クエン酸ナトリウム 10g/
同様に
実施例1の感材フイルムを、超高圧水銀灯
2KWプリンター(光源からの距離100cm)を用
い、2分間露光し、流水で30分水洗した後、
N2H2・HClの1.0mol/濃度・溶液により40℃
で1分間処理し、更に下記の組成でPH5.5の無電
解メツキ液により21℃で1分30秒処理した。
次亜リン酸ニツケル 26g/
ホウ酸 12g/
硫酸アンモニウム 2.6g/
酢酸ナトリウム 20g/
以上の操作により均一で黒色の画像を得た。
実施例 5
実施例1と同様にして作製したPdCl2塩酸水溶
液を用い下記の組成にて感材を調製し、以下、実
施例1と同様にしてポリエステルフイルム上に塗
布し、乾燥して感材フイルムを作製した。
PdCl2塩酸水溶液(日本カニゼン) 20g
ゼラチン(新田ゼラチン製p−2151)30%水溶
液 10g
ジアゾレジン20%水溶液 2.5g
グルタルアルデヒド50%水溶液 0.05g
この感材フイルムに超高圧水銀灯2KWプリン
ター(光源からの距離100cm)を用い2分間ネガ
フイルムを密着露光し、流水で30分水洗した後65
℃のホウ素−ニツケルメツキ浴(シバニツケル原
液、奥野製薬製)に100秒間浸漬し現像し乾燥し
た。
現像時間が実施例1よりも長くなるが、膜の密
着性が良く現像中に手で膜面をこすつても膜が剥
離することがない。画質は良好で150線4%網点
を解像した。
実施例 6
下記組成にて感材を調製し、これから実施例1
と同様に感材フイルムを作製した。
PdCl2塩酸水溶液(日本カニゼン レツドシユ
ーマ) 20g
PVA(日本合成ゴーセノールNH−14)10%水
溶液 20g
ジアゾレンジ20%水溶液 2.5g
りんご酸 0.08g
上記の感材フイルムをジアゾコピー用ランプ
(リコーハイスタート4)で40秒間ネガフイルム
と重ね合せて露光し、流水で30分水洗しSnCl21
%塩酸水溶液(日本カニゼンピンクシユーマ)か
らなる還元浴に常温で1分浸漬して全面に物理現
像核を形成した。
次に物理現像浴として、次亜リン酸系無電解メ
ツキ液ブルーシユーマー(奥野製薬製)を用い65
℃で1分30秒処理し、露光部に黒色の画像を得
た。
同様に、上記感材フイルムについて上記還元浴
にあらかじめ処理してから水洗乾燥してジアゾコ
ピー用のランプでパターン露光を行ないその後ブ
ルーシユーマーにて現像処理を行なつても露光部
に黒色の画像を得た。
また上記感材フイルムに露光後、流水で30分処
理した後、還元浴処理を行なわないで下記の現像
浴(NaOHによりPHを12.5に調節。温度40〜50
℃)で2分間処理することにより一浴で還元およ
び物理現像を行い良好な黒色の画像を得た。
硫酸ニツケル 20g
酒石酸カリウムナトリウム 40g
水素化ホウ素ナトリウム 2.3g
水 1000g
実施例 7
下記の組成感材を用いて感光性フイルムを実施
例1と同様に作製した。
HAuCl4・4H2O1%塩酸水溶液 20g
ゼラチン(新田ゼラチンp−2222)30%水溶液
6.7g
ジアゾレジン20%水溶液 2.5g
酒石酸 0.05g
露光条件、水洗条件、還元浴条件、現像浴条件
すべて実施例1と同様にして行なつた結果、3通
りの方法のいずれを用いた場合も黒色の画像が得
られる。
実施例 8
下記の組成にて感材を作成し、実施例1と同様
に感材フイルムを作製した。
レツドシユーマー 20g
ゼラチン(p−2152B新田ゼラチン)20%水溶
液 6.7g
4,4′−ジアジドジフエニルスルホン20%水溶
液 2.0g
ムコクロル酸 0.06g
露光条件、水洗条件、還元条件、現像条件はす
べて実施例1と同様に行なつた結果、3通りの方
法のいずれを用いた場合も黒色の画像が得られ
た。[Formula] and R-N=C=N-R' (where R is carbon 2-
6 alkyl group, R′ is (CH 3 ) 3 N+(CH 3 ) 3 X - group,
X is F or Cl; Resins such as maleic acid copolymers, methacrylic acid/methacrylonitrile copolymers, polymethacrylamide, and methacrylic acid ester copolymers. Glutaric acid, succinic acid as dicarboxylic acids, malic acid as hydroxycarboxylic acids,
Organic carboxylic acids such as lactic acid, citric acid, aspartic acid, glycolic acid, and tartaric acid can also be used. According to the image forming method of the present invention, the image forming layer 2 is first subjected to pattern exposure through a transparent original 3 as shown in FIG. 2, for example. As a result, the photocrosslinking agent is selectively decomposed and crosslinked in the exposed area 2A to a degree corresponding to the amount of exposure. As the light source, any light source can be used as long as it can destroy the photocrosslinking agent described above. For example, ultra-high pressure mercury lamps, high pressure mercury lamps, low pressure mercury lamps, metal halide lamps, arc lamps,
Chemical lamps, xenon lamps, Ar lasers, etc. can be used. Depending on the desired image gradation, for example, when using ultraviolet light with a center wavelength of 405 nm, the
It is sufficient to expose for 10 to 200 seconds at an intensity of m3 to 300w/ m3 . Due to the pattern exposure described above, the photocrosslinking agent is decomposed in the exposed area 2A, and the hydrophilic binder is crosslinked in the exposed area 2A and is imparted with hydrophobicity. The photo-crosslinking agent remains unchanged in the unexposed area, which is the area that has not been exposed by the above pattern exposure, so if the photo-crosslinking agent in the unexposed area is left as is and subsequent development is carried out, a physical developer is used. The photocrosslinking agent in the unexposed area must be dissolved and removed because the fatigue of the photocatalyst is accelerated. Dissolution and removal may be carried out by immersing the image forming layer in water or by bringing it into contact with water, and the time required for the treatment varies depending on the material of the hydrophilic binder layer, but is generally 5 to 30 minutes. Then, through pattern exposure, an aqueous reducing agent solution is brought into contact with the image forming layer 2 having a latent image imparted with hydrophobicity in a pattern by dipping or coating, thereby almost uniformly developing the metal into the image forming layer 2. Generate a nucleus. Examples of reducing agents include stannous chloride, stannous sulfate, sodium borohydride, dimethylamine borazane, diethylamine borazane, trimethylamine borazane, other borazane derivatives, borane derivatives such as borane, diborane, and methyldiborane, hydrazine, etc. can be used. Particularly preferably, an acidic stannous chloride solution, a stannous sulfate solution (Weiss solution), or a commercially available sensitizer solution for electroless plating is used, but in general, any strong reducing agent can be used. This reduction treatment generally uses a reducing agent solution containing a reducing agent at a concentration of 0.1 to 50 g, and is performed for 10 seconds or more at room temperature or under heating, although it varies depending on the strength of the reducing agent.
It takes about 400 seconds. Furthermore, the image forming layer 2 having a latent image with high crosslinking density due to selective decomposition of the metal development nuclei and photocrosslinking agent obtained in this way and imparted with hydrophobicity is coated with a physical developer by dipping or coating. When brought into contact, a visible image 2B as shown in FIG. 3 is formed in which the metal in the developer is precipitated by reduction centering on the metal development nuclei in the unexposed area. As the physical developer, an aqueous solution containing a water-soluble reducible heavy metal salt and a reducing agent is used, if necessary, in a heated state. Examples of reducible heavy metal salts include nickel,
Group VIb metals such as cobalt, iron and chromium, copper etc.
Water-soluble salts of Group Ib metals are used alone or in mixtures. As suitable water-soluble reducible heavy metal salts, for example, the following can be used. Heavy metal halides such as cobaltous chloride, cobaltous iodide, ferrous bromide, ferrous chloride, chromic bromide, chromic iodide, cupric chloride; nickel sulfate, ferrous sulfate , heavy metal sulfates such as cobaltous sulfate, chromic sulfate, cupric sulfate; heavy metal nitrates such as nickel nitrate, ferrous nitrate, cobaltous nitrate, chromic nitrate, cupric nitrate; ferras Organic acid salts of heavy metals such as acetate, cobalt acetate, chromic acetate, and chromic fluorate. These reducible heavy metal salts are contained in the physical developer at a rate of, for example, 10 to 100 g/g/. Examples of reducing agents include hypophosphorous acid, sodium hypophosphite, sodium borohydride, hydrazine, formalin, diethylamine borane, dimethylamine borane, trimethylamine borane, borane, diborane, methyldiborane, diborazane,
Borazane, borazine, t-butylamine borazane, pyridine borane, 2,6-lutidine borane,
Ethylenediamineborane, hydrazinediborane,
Dimethylphosphine borane, phenylphosphine borane, dimethylaldine borane, phenylaldine borane, dimethylstipine borane, diethylstipine borane, etc. can be used. These reducing agents can be added to the physical developer, for example.
It is used at a rate of 0.1 to 50g/. Some of the reducing agents available in the physical developer are those for the generation of metal development nuclei. Therefore, when using a physical developer containing a relatively strong reducing agent, the reduction treatment for generating metal development nuclei is not performed after exposure, and the process is directly performed with the physical developer to prevent the generation of metal development nuclei. It is also possible to perform both physical development and physical development substantially simultaneously. However, if the reaction is carried out in two stages, there is an advantage that the reduction reaction and the metal precipitation reaction can be controlled accurately by adjusting the temperature and reaction time, respectively. In particular, in the image forming method of the present invention, if the development time is prolonged, the physical developer will penetrate not only the unexposed areas but also the exposed areas, causing so-called fog, so a two-step process is preferable. In order to prevent heavy metal ions generated by dissolving the above-mentioned reducible heavy metal salts from precipitating as hydroxides, the physical developer contains, for example, monocarboxylic acids; dicarboxylic acids; hydroxyl acids such as malic acid and lactic acid. Carboxylic acid; may contain one or more complexing agents consisting of organic carboxylic acids such as succinic acid, citric acid, aspartic acid, glycolic acid, tartaric acid, ethylenediaminetetraacetic acid, gluconic acid, sugar acid, and quinic acid. can. For example, 1 to 100 g of these complex chloride agents may be added to the physical developer.
used at a rate of Furthermore, the physical developer contains PH regulators such as acids and bases, buffers, preservatives, etc. to improve the storage stability and operability of the developer and the quality of the resulting images.
Brighteners, surfactants, etc. are added as necessary according to conventional methods. According to the present invention, since the physical developer is less fatigued, it has the advantage of being able to prolong the time required for physical development, reduce the density of a visible image, and prevent the occurrence of pinholes. With a density of 4 or more, it is possible to form a black image with gradations as required, and because it uses a photocrosslinking agent dissolution system, the resolution is high.
Images that can replace images obtained by silver salt photography are obtained. In addition, since the image is a metal image, Furmar reduction liquid consisting of red blood salt and sodium thiosulfate,
This can be corrected using a reducing fluid such as Kodak R-4. Taking advantage of these characteristics, the image material obtained by the method of the present invention can be used as a substitute for lithographic film or as a mask material. Also,
Physical development is performed, for example, the first development is performed using a nickel plating bath using a boron reducing agent, and the second development is performed using a high-temperature nickel plating bath at 65 to 90°C using a reducing agent containing sodium hypophosphite, or high-speed plating using copper plating. If the conditions are met, a metallic image with metallic luster can be formed on the binder surface. Moreover, the obtained image can be washed with a 5% aqueous solution of, for example, hydrochloric acid or 5% nitric acid.
Since the binder in non-image areas can be selectively removed by processing for minutes, it can also be used as a printed circuit board. Hereinafter, the present invention will be explained in more detail with reference to Examples. Example 1 2 g of PdCl 2 was dissolved in 1000 c.c. of water together with 20 ml of HCl, and 20 g of the resulting two PdCl solutions were used to prepare a sensitive material (coating solution for forming an image forming layer) having the following composition. PdCl 2 liquid with the above composition 20g Gelatin (Nitta Gelatin P-2151) 30% aqueous solution 10g Diazoresin 20% aqueous solution 2.5g Glutaric acid 0.12g The temperature of the above sensitive material was adjusted to 30°C to 40°C, and plasma treatment was performed in advance. Apply to Natsuta polyester film (Toray Lumirror S 100#) and dry.
A coating film of 5μ was obtained. Sensitive film (image forming material) obtained above
The negative film was closely exposed for 2 minutes using an ultra-high pressure mercury lamp 2KW printer (distance 100cm from the light source), then immersed in water at 20℃ to dissolve and remove the diazoresin, and then immersed in the following reducing bath at 30℃ for 1 minute. and reduced it. SnCl 2 1g HCl 40ml H 2 O 100c.c. Next, it was treated with a physical developer having the following composition at 90°C to precipitate metal and form a black image. Nickel chloride 30g Sodium hypophosphite 10g Sodium oxyacetate 50g Water 900g A similar sensitive film was exposed for 2 minutes using a 2KW ultra-high pressure mercury lamp printer (distance 100cm from the light source) with the negative film in close contact. The film was then immersed in water at 20°C for 20 minutes, and then immersed in a boron-nickel plating bath (Shibanitsukel stock solution, manufactured by Okuno Pharmaceutical Co., Ltd.) at 65°C for 50 seconds, developed, and dried without any special reduction treatment. The resulting image was black with 150 lines and 4% halftone dots resolved. In this development process, reduction and development are performed simultaneously. Example 2 A sensitive film was prepared in the same manner as in Example 1,
After exposure through a negative film and immersing it in water at 20°C, it was developed by immersing it in a physical developer having the following composition at 30°C for 1 minute and 30 seconds to obtain a black image. Nickel chloride 0.1 mol Dimethylamine borane 0.1 mol Succinic acid 0.5 mol The pH was adjusted to 7.0 with NaOH. Example 3 A sensitive film was prepared in the same manner as in Example 1, exposed to light, washed with water, and mixed with a physical developing solution (Narcuss) obtained by mixing liquids A and B having the following composition at a ratio of 1:1 immediately before use. The film was developed by immersing it in an electroless plating bath (electroless plating bath) at 22°C for 7 minutes to obtain a black image. Solution A Copper sulfate 60g / Nickel sulfate 15g / Hydrazine sulfate 45g / Solution B Sodium hydroxide 45g / Potassium sodium tartrate 180g / Sodium carbonate 15g / Example 4 A sensitive film prepared in the same manner as Example 1 was washed with water and dried. Expose for 2 minutes using a high-pressure mercury lamp 2KW printer (distance 100cm from the light source) and 30 minutes with running water.
After washing with water, hydrazine hydrochloride (N 2 H 2 · HCl)
The sample was immersed for 1 minute at 40°C in a reduction bath containing 1.0 mol of Then, it was treated with an electroless plating solution shown below for 6 minutes to obtain an image with metallic luster. Nickel chloride 50g / Sodium hypophosphite 10g / Sodium citrate 10g / Similarly, the sensitive film of Example 1 was heated using an ultra-high pressure mercury lamp.
Using a 2KW printer (distance 100cm from the light source), expose for 2 minutes, wash with running water for 30 minutes,
1.0 mol of N 2 H 2 HCl/40℃ depending on concentration and solution
The film was then treated with an electroless plating solution having the composition shown below and having a pH of 5.5 at 21°C for 1 minute and 30 seconds. Nickel hypophosphite 26g/boric acid 12g/ammonium sulfate 2.6g/sodium acetate 20g/A uniform black image was obtained by the above operations. Example 5 A photosensitive material was prepared with the following composition using a PdCl dihydrochloric acid aqueous solution prepared in the same manner as in Example 1, and then coated on a polyester film in the same manner as in Example 1, and dried to form a photosensitive material. A film was produced. PdCl dihydrochloric acid aqueous solution (Nippon Kanizen) 20g Gelatin (Nitta Gelatin p-2151) 30% aqueous solution 10g Diazoresin 20% aqueous solution 2.5g Glutaraldehyde 50% aqueous solution 0.05g After exposing the negative film for 2 minutes using a camera (distance 100cm) and washing it under running water for 30 minutes,
It was immersed in a boron-nickel bath (Shibanitsukel stock solution, manufactured by Okuno Pharmaceutical Co., Ltd.) at 100°C for 100 seconds, developed, and dried. Although the development time is longer than in Example 1, the film has good adhesion and does not peel off even if the film surface is rubbed by hand during development. The image quality was good, resolving 150 lines and 4% halftone dots. Example 6 A sensitive material was prepared with the following composition and used in Example 1.
A sensitive film was prepared in the same manner. PdCl dihydrochloric acid aqueous solution (Nippon Kanigen Retschuma) 20g PVA (Nippon Synthetic Gohsenol NH-14) 10% aqueous solution 20g Diazolene 20% aqueous solution 2.5g Malic acid 0.08g The above photosensitive film was heated with a diazocopy lamp (Ricoh Hi-Start 4). Expose for 40 seconds by overlaying with negative film, rinse with running water for 30 minutes, and remove SnCl 2 1.
% hydrochloric acid aqueous solution (Nippon Kanigen Pink Shauma) for 1 minute at room temperature to form physical development nuclei on the entire surface. Next, as a physical development bath, hypophosphorous acid-based electroless plating solution Blue Syumer (manufactured by Okuno Pharmaceutical Co., Ltd.) was used.
It was processed at ℃ for 1 minute and 30 seconds to obtain a black image in the exposed area. Similarly, even if the above-mentioned sensitive film is pre-treated in the above-mentioned reducing bath, washed with water, dried, pattern-exposed using a diazocopy lamp, and then developed using a blue chemist, there will be no black color in the exposed areas. Got the image. After exposure, the above-mentioned sensitive film was treated with running water for 30 minutes, and then the following developing bath (pH adjusted to 12.5 with NaOH, temperature 40-50
℃) for 2 minutes, reduction and physical development were performed in one bath, and a good black image was obtained. Nickel sulfate 20g Potassium sodium tartrate 40g Sodium borohydride 2.3g Water 1000g Example 7 A photosensitive film was prepared in the same manner as in Example 1 using the sensitive material having the composition shown below. HAuCl 4・4H 2 O1% hydrochloric acid aqueous solution 20g Gelatin (Nitta gelatin p-2222) 30% aqueous solution
6.7g Diazoresin 20% aqueous solution 2.5g Tartaric acid 0.05g Exposure conditions, water washing conditions, reduction bath conditions, and development bath conditions were all the same as in Example 1. As a result, black color was obtained by using any of the three methods. An image is obtained. Example 8 A photosensitive material was prepared with the following composition, and a photosensitive film was prepared in the same manner as in Example 1. Redshumer 20g Gelatin (p-2152B Nitta Gelatin) 20% aqueous solution 6.7g 4,4'-Diazidodiphenylsulfone 20% aqueous solution 2.0g Mucochloric acid 0.06g Exposure conditions, water washing conditions, reduction conditions, and development conditions are all examples. As a result of carrying out the same procedure as in 1, a black image was obtained using any of the three methods.
第1図は、本発明の画像形成材料の積層構造を
示す厚み方向模式断面図、第2図および第3図は
第1図図示の画像形成材料を用いる本発明の画像
形成方法の中間工程を示すための同様な模式断面
図である。
1……支持体、2……画像形成層、2A……露
光部、2B……可視像、3……透過原稿、A……
画像形成材料。
FIG. 1 is a schematic cross-sectional view in the thickness direction showing the laminated structure of the image forming material of the present invention, and FIGS. 2 and 3 show intermediate steps of the image forming method of the present invention using the image forming material shown in FIG. FIG. 1...Support, 2...Image forming layer, 2A...Exposed area, 2B...Visible image, 3...Transparent original, A...
Imaging materials.
Claims (1)
形成層が還元されて金属現像核となる金属塩と光
架橋剤とを含有する親水性バインダー層からなる
画像形成材料の該画像形成層にパターン露光を行
なつて露光部の前記光架橋剤を反応させて該露光
部の親水性バインダー層を架橋し、次いで未露光
部の前記光架橋剤を溶解除去し、しかる後、該画
像形成層を還元剤と接触させて画像形成層中に金
属現像核を形成させる第1現像工程と、該画像形
成層を被還元性の金属イオンと還元剤とを含む物
理現像液と接触させて、前記未露光部に金属現像
核を中心として前記被還元性の金属イオンの還元
により析出成長した金属粒子からなる画像を形成
する第2現像工程とを実施することを特徴とする
画像形成方法。 2 光架橋剤はジアゾ基又はアジド基を有する化
合物の単体又は混合物からなることを特徴とする
特許請求の範囲第1項記載の画像形成方法。[Scope of Claims] 1 Image formation comprising an image forming layer provided on a support, and a hydrophilic binder layer containing a photocrosslinking agent and a metal salt that becomes metal development nuclei when the image forming layer is reduced. pattern-exposing the image forming layer of the material to react the photocrosslinking agent in the exposed areas to crosslink the hydrophilic binder layer in the exposed areas, and then dissolving and removing the photocrosslinking agent in the unexposed areas; Thereafter, the image forming layer is brought into contact with a reducing agent to form metal development nuclei in the image forming layer, and the image forming layer is subjected to physical development containing reducible metal ions and a reducing agent. A second developing step is performed in which an image is formed in the unexposed area by bringing the metal particles into contact with a liquid, and the metal particles are precipitated and grown by reduction of the reducible metal ions in the unexposed area. image forming method. 2. The image forming method according to claim 1, wherein the photocrosslinking agent is composed of a single compound or a mixture of compounds having a diazo group or an azide group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8413381A JPS57198453A (en) | 1981-05-30 | 1981-05-30 | Formation of picture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8413381A JPS57198453A (en) | 1981-05-30 | 1981-05-30 | Formation of picture |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57198453A JPS57198453A (en) | 1982-12-06 |
| JPH0360110B2 true JPH0360110B2 (en) | 1991-09-12 |
Family
ID=13821999
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8413381A Granted JPS57198453A (en) | 1981-05-30 | 1981-05-30 | Formation of picture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57198453A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2589823B2 (en) * | 1989-08-31 | 1997-03-12 | 富士写真フイルム株式会社 | Positive photoresist developer for semiconductor manufacturing |
-
1981
- 1981-05-30 JP JP8413381A patent/JPS57198453A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57198453A (en) | 1982-12-06 |
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