JPH0361393A - Silver plating method - Google Patents
Silver plating methodInfo
- Publication number
- JPH0361393A JPH0361393A JP19424189A JP19424189A JPH0361393A JP H0361393 A JPH0361393 A JP H0361393A JP 19424189 A JP19424189 A JP 19424189A JP 19424189 A JP19424189 A JP 19424189A JP H0361393 A JPH0361393 A JP H0361393A
- Authority
- JP
- Japan
- Prior art keywords
- silver
- silver plating
- sodium
- contg
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
[発明の目的]
(産業上の利用分野)
本発明は主成分として酸性銀錯塩を用いる銀めっき法に
関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a silver plating method using an acidic silver complex salt as a main component.
(従来の技術)
従来、銀めっきを行なう際には青化物浴を用いることが
多かった。近年、青化物の廃水規制がきびしくなり、こ
れに対処するため酸性銀めっきも行なわれている。(Prior Art) Conventionally, a cyanide bath has often been used when performing silver plating. In recent years, regulations regarding cyanide wastewater have become stricter, and acid silver plating is also being used to deal with this.
(発明が解決しようとする問題点)
しかし、酸性銀めっきは工業化するに当たり、青化物浴
に比べて様々な欠点がある。その最大の問題点は光沢の
有無にある。特に銀めっき後の機械研磨はせっかく厚め
つきした銀膜を削り取ることは不経済であるのみならず
、銀膜が軟質のため、機械研磨はかなりの熟練を要する
。(Problems to be Solved by the Invention) However, acidic silver plating has various disadvantages when industrialized compared to cyanide baths. The biggest problem with this is the lack of gloss. In particular, mechanical polishing after silver plating is not only uneconomical to scrape off a thick silver film, but also requires considerable skill because the silver film is soft.
青化物浴で用いられる光沢剤は硫化物が多く、例えば二
硫化炭素系が用いられている。これに、ロート油、ホル
マリンなどが添加されている。しかし、決定的な鏡面光
沢をえるには至っていない。The brighteners used in cyanide baths often contain sulfides, such as carbon disulfide. Added to this are funnel oil and formalin. However, it has not yet achieved a definitive specular luster.
[発明の構成]
(問題点を解決するための手段)
本発明は、主成分として酸性銀錯塩を用いる銀めっき法
において、添加剤として少なくとも含窒素カルボン酸誘
導体、アルデヒド C=S 含有化合物を含むものを用
いる方法である。[Structure of the Invention] (Means for Solving the Problems) The present invention provides a silver plating method using an acidic silver complex salt as a main component, which contains at least a nitrogen-containing carboxylic acid derivative and an aldehyde C=S-containing compound as an additive. It is a method of using things.
本発明の浴の構成の説明する。本発明の方法で用いる銀
塩は硝酸銀、塩化銀、硫酸塩などいずれを用いてもよい
が、銀の金屑性の含有量の多いものが有利であり、また
、有機、無機の水溶液に溶解し易いことが必要である。The structure of the bath of the present invention will be explained. The silver salt used in the method of the present invention may be silver nitrate, silver chloride, sulfate, etc., but it is advantageous to use silver with a high content of gold dust, and it is preferable to use one that is soluble in an organic or inorganic aqueous solution. It needs to be easy to do.
添加剤としては前記の含窒素カルボン酸誘導体、アルデ
ヒド C=S含有化合物以外に錯化剤、導電塩、安定化
剤、緩衝剤などが含まれる。In addition to the above-mentioned nitrogen-containing carboxylic acid derivatives and aldehyde C=S-containing compounds, additives include complexing agents, conductive salts, stabilizers, buffers, and the like.
錯化剤としては、チオ硫酸ソーダ、ピロ亜硫酸ソーダ、
亜硫酸水素ソーダなどが用いられ、銀塩と反応して錯塩
を生成する。これは硝酸根、塩化物根、硫酸根などにつ
いていずれも可能である。Complexing agents include sodium thiosulfate, sodium pyrosulfite,
Sodium hydrogen sulfite is used and reacts with silver salts to form complex salts. This is possible for nitrate roots, chloride roots, sulfate roots, etc.
導電剤としては硫酸ソーダ、硫酸アンモン、炭酸ソーダ
などが用いられ、安定剤としてはホウ酸が、緩衝剤とし
てはニコチン酸ソーダ、リンゴ酸、酒石酸、ロッセル塩
などが用いられる。本発明は、以上のそれぞれの薬品に
よって浴を構成する。Sodium sulfate, ammonium sulfate, soda carbonate, etc. are used as the conductive agent, boric acid is used as the stabilizer, and sodium nicotinate, malic acid, tartaric acid, Rossel's salt, etc. are used as the buffering agent. In the present invention, a bath is constituted by each of the above chemicals.
(作用)
本発明のめっき方法にわいて用いられる建浴と相互作用
効果について説明する。本発明の方法においては、従来
の青化物と異なり酸性錯イオンが用いられる。この錯イ
オンを作るにはチオ硫酸ソーダまたはカリを用いなけら
ばならない。古くは銀めっきにはソーダよりもカリが良
いとされているが、本発明はこれに促われない。(Function) The bath preparation used in the plating method of the present invention and the interaction effect will be explained. In the method of the present invention, acidic complex ions are used, unlike conventional cyanides. Sodium thiosulfate or potassium must be used to create this complex ion. It has long been believed that potash is better for silver plating than soda, but the present invention is not inspired by this.
チオ硫酸ソーダ(NaaSzOa)は酸性水溶液中では
以下の式に示すように硫黄が析亀されて分解してしまう
。Sodium thiosulfate (NaaSzOa) decomposes in an acidic aqueous solution as sulfur is precipitated as shown in the following formula.
S20□’−+H4HSO3−+S ・・・(1
)この分解を極力抑制するには、ピロ亜硫酸ソーダ(N
aaSzOa) または亜硫酸水素ナトリウム(Na
H3Os) を加えることが望ましい。これらの塩類
は水溶液中では次のように反応する。S20□'-+H4HSO3-+S...(1
) To suppress this decomposition as much as possible, use sodium pyrosulfite (N
aaSzOa) or sodium bisulfite (Na
It is desirable to add H3Os). These salts react in the following manner in an aqueous solution.
520s”−+HpO2H8Oa−−(2)N a H
S Ox N a4+HS Ox−−(3)(2)、
(3)式の反応により2H8O3の共通イオンによって
(+)式に示されるようなS2’s2−の分解を抑制す
ることができる。従って建浴するには、この分解を避け
るためには以下に示すような溶解段階が必要であり、一
般的な溶解方法では沈澱と分解で建浴にならない。520s"-+HpO2H8Oa--(2) N a H
S Ox Na4+HS Ox--(3)(2),
By the reaction of formula (3), the decomposition of S2's2- as shown in formula (+) can be suppressed by the common ion of 2H8O3. Therefore, in order to prepare a bath, the following dissolution step is required to avoid this decomposition, and the general dissolution method does not result in bath preparation due to precipitation and decomposition.
先ず、硝酸銀を単独の水に溶解する。次に重亜硫酸ソー
ダの単独水溶液を混合した後、チオ硫酸ソーダの単独水
溶液を混合する。この混合順序を経ることが必要である
。もしさきにチオ硫酸ソーダの単独水溶液を混合すると
下記の式に示すようにA g 2 Sの黒色沈澱が生じ
ることになる。First, silver nitrate is dissolved in water alone. Next, a single aqueous solution of sodium bisulfite is mixed, and then a single aqueous solution of sodium thiosulfate is mixed. It is necessary to go through this mixing order. If a single aqueous solution of sodium thiosulfate is mixed first, a black precipitate of A g 2 S will be formed as shown in the following formula.
2 A g N O* + N a 2 S 20 x
=AgzS20t+NaN0z −・
=(4ン(白色性R)
↓
AgzS20t+HtO→A g 2 S + H=S
Oa(黒色沈澱)
・・・・・・(5)
(5)式のように硫化m(Ag=S)が沈澱することは
、洛中に銀イオンが減少することを意味する。2 A g N O * + N a 2 S 20 x
=AgzS20t+NaN0z −・
=(4n (whiteness R) ↓ AgzS20t+HtO→A g 2 S + H=S
Oa (black precipitate) (5) Precipitation of sulfide m (Ag=S) as shown in equation (5) means that silver ions are reduced in the atmosphere.
これは工業的には不経済である。よって建浴に黒色沈澱
を抑制するため、前述の建浴の各種成分を正しく溶解す
る。これによって、浴としての銀はチオ硫酸銀錯陰イオ
ンを形成する。このことからCA g (S 20 *
) )−と(Ag (S20s))”−とが浴中共存
すると推定される。その化学反応は以下の式、 (B)
、(7)、(8)で示す。またはピロ亜硫酸ソーダにつ
いても同じく、次式のとおりで2 A g N O3+
N a t S 20 s= A g 2 S 20
s + N a N Os + A g 2 S 2
0 s(白色)
+2NatSzO* ””’(G)A g
2820S+N aas20嘗
2Na (Ag (S20a))
十Nats*Os −・・・−+(7)
A g 2 S 20 s + 4 N a a S
2032Na (Ag (32gs)2)”+Naa
S*Os ”・・(8)生成したチ
オ硫酸銀錯陰イオンの不安定度定数を以下に示す。This is industrially uneconomical. Therefore, in order to suppress black precipitate in the prepared bath, the various components of the prepared bath described above are properly dissolved. Thereby, the silver as a bath forms a silver thiosulfate complex anion. From this, CA g (S 20 *
) )- and (Ag (S20s))"- are estimated to coexist in the bath. The chemical reaction is expressed by the following equation, (B)
, (7) and (8). Or, similarly for sodium pyrosulfite, as shown in the following formula, 2 A g N O3+
N at S 20 s= A g 2 S 20
s + N a N Os + A g 2 S 2
0 s (white) +2NatSzO* “”’ (G) A g
2820S+N aas20嘗2Na (Ag (S20a)) 10Nats*Os -・・・-+(7)
A g 2 S 20 s + 4 N a a S
2032Na (Ag (32gs)2)”+Naa
S*Os''...(8) The instability constant of the produced silver thiosulfate complex anion is shown below.
CAg (320m) ) −K K = 1. 5X
10−”(Ag (S20s) 2) ”−K i
=3.5X 10−14従って (Ag (−3ag
s)2] ”−が多く共存し、CAg (S203))
−は少ない。これは前述の不安定度定数によるものと考
えられる。CAg (320m) -K K = 1. 5X
10-”(Ag (S20s) 2) ”-K i
=3.5X 10-14 Therefore (Ag (-3ag
s)2] ”− coexists in large numbers, CAg (S203))
- is rare. This is considered to be due to the instability constant mentioned above.
以上は硝a銀を用いた場合についてのものである。塩化
銀(AgC1)についても硝酸銀(AgN Oa )と
同様である。ただ、異なることは塩化銀はチオ硫酸ソー
ダに溶解度が高いことである。反応過程にチオ硫酸銀錯
イオンを形成することは硝酸銀と同じでその反応式は次
の通りである。The above is about the case where silver nitrate is used. The same applies to silver chloride (AgC1) and silver nitrate (AgN Oa ). However, the difference is that silver chloride has a high solubility in sodium thiosulfate. The formation of silver thiosulfate complex ions during the reaction process is the same as with silver nitrate, and the reaction formula is as follows.
AgCl+2Naas20a
Nag (Ag (S2sh) 2) +NaC1・・
・・・・(9)
(実施例)
以下、表1および表2に本発明の銀めっき法に用いられ
る浴組成の実施例を示す。AgCl+2Naas20a Nag (Ag (S2sh) 2) +NaC1...
(9) (Example) Tables 1 and 2 below show examples of bath compositions used in the silver plating method of the present invention.
この組成の配合は酸性から中性まで銀を析出することが
でき、青化物浴からの銀めっきと同等の膜ができる。This compositional formulation is capable of depositing silver from acidic to neutral conditions, producing a film equivalent to silver plating from a cyanide bath.
表1.銀めっき浴組成(硝酸銀めっき浴)(注1)添加
剤はニコチン酸ソーダ及び/またはニコチン酸カリのエ
ポキシ50%重合水溶性物。Table 1. Silver plating bath composition (silver nitrate plating bath) (Note 1) The additive is a 50% epoxy polymerized water-soluble product of sodium nicotinate and/or potassium nicotinate.
表2.銀めっき浴組成(塩化銀めっき浴)(注1)添加
剤はニコチン酸ソーダ及び/またはニコチン酸カリのエ
ポキシ50%重合水溶性物。Table 2. Silver plating bath composition (silver chloride plating bath) (Note 1) The additive is a 50% polymerized water-soluble epoxy of sodium nicotinate and/or potassium nicotinate.
銀を光沢化するにはすべてのめっき膜は微細な結晶粒が
優先配向する金属多結晶体で平滑な析出をすることによ
って始めて鏡面光沢が得られる。In order to make silver shiny, mirror luster can only be obtained by depositing smooth metal polycrystals in which fine crystal grains are preferentially oriented in all plating films.
また光沢だけでなく、次の諸条件も併せて考慮される。In addition to gloss, the following conditions are also taken into consideration.
即ち、平滑化、結晶の微細化、光沢化、均一電着性の改
善、残留応力の低減、ビット防止、陽極の不動態化防止
、などであり、これらの事項が考慮される。That is, smoothing, crystal refinement, gloss, improvement of uniform electrodeposition, reduction of residual stress, prevention of bits, prevention of anode passivation, etc. are taken into consideration.
本発明の方法で用いられる添加剤は含窒素カルボン酸誘
導体、アルデヒド、C=S含有化合物、またはその互変
異性体などを含む、界面活性剤、光沢剤、平滑剤の全て
を含有する。以上記述した建浴の配合についての相互作
用、添加剤の果たす役割について理解できるものである
。The additives used in the method of the present invention include all surfactants, brighteners, and leveling agents, including nitrogen-containing carboxylic acid derivatives, aldehydes, C=S-containing compounds, or tautomers thereof. This will help you understand the interaction of the bath preparation formulations and the roles played by additives as described above.
めっき条件は重要であり、これは生産性および浴管理に
大きい影響を与える。浴に必要とされる要性は、作業中
安定で、その寿命が長いことである。変化が激しく、分
解するようでは均一な製品が得られない。Plating conditions are important and have a large impact on productivity and bath management. The requirements for the bath are that it be stable during operation and have a long life. It changes rapidly and if it decomposes, a uniform product cannot be obtained.
本発明のめっき方法の条件として、■イオン濃度、■電
流密度、■pH,■温度、■撹拌、■時間、■添加剤(
光沢剤を含む)などの−例を示す。The conditions for the plating method of the present invention include: ■ion concentration, ■current density, ■pH, ■temperature, ■stirring, ■time, and ■additives (
(including brighteners).
■イオン濃度:各配合と組み合わせるに必要な銀イオン
濃度は適正であること。過剰の添加による沈澱、または
遊離することがあってはならない。■Ion concentration: The silver ion concentration required in combination with each formulation must be appropriate. There should be no precipitation or release due to excessive addition.
その例として銀錯化物Nag (Ag (Sl!O))
)は水に溶解しやすいけれどもN a (A g (
S2(h) )は水に溶解しにくい(沈澱する)。しか
し、チオ硫酸ソーダ(NaaS20i)の過剰によく溶
解する。An example of this is the silver complex Nag (Ag (Sl!O))
) is easily dissolved in water, but N a (A g (
S2(h)) is difficult to dissolve in water (precipitates). However, it dissolves well in excess of sodium thiosulfate (NaaS20i).
銀塩の銀1モルに対し、チオ硫酸塩は2モルが必要であ
る。これがイオン濃度の安定を左右する因子となる。2 moles of thiosulfate are required for 1 mole of silver in the silver salt. This is a factor that influences the stability of ion concentration.
■電流密度:大きい電流密度でめっきすることが望まし
い。しかし、銀は導電性の高い金属であることで、電流
密度は電流効率、水素発生による分極効果の低下がある
。■Current density: It is desirable to plate with a high current density. However, since silver is a highly conductive metal, there is a decrease in current density, current efficiency, and polarization effect due to hydrogen generation.
■pH:析出速度と関係があって高いときは極板の溶解
がしにくくなる。低いときは水素の発生が多く、析出速
度が小さい。(2) pH: It is related to the precipitation rate, and when it is high, it becomes difficult to dissolve the electrode plate. When it is low, a lot of hydrogen is generated and the precipitation rate is low.
■温度:できる限り低温度のほうがのぞましい。■Temperature: It is preferable to keep the temperature as low as possible.
高温度の場合管理が困難である。本研究は室温として2
0〜35℃以下を条件としている。Difficult to manage at high temperatures. In this study, 2
The condition is 0 to 35°C or less.
■撹拌:撹拌はイオン拡散を早め、分極効果を高めるこ
とによって、つき回りの向上をはかる。■ Stirring: Stirring speeds up ion diffusion and increases the polarization effect, thereby improving coverage.
■時間:時間はめっき厚みと深い関係があるので、必要
な厚みは計算によって得られる。■Time: Since time has a close relationship with plating thickness, the required thickness can be obtained by calculation.
■添加剤(光沢剤を含む):添加剤の作用は浴全体を構
成するにそれぞれの役割を果たしている。■Additives (including brighteners): Additives play different roles in making up the entire bath.
特に本発明は平滑な鏡面光沢を得るに市販の数多(の光
沢剤を実験したが、ニコチン酸ソーダ及び/またはニコ
チン酸カリのエポキシ樹脂の50%水溶性のものがもっ
と効果が良好である。その添加量は表1に示された通り
である。In particular, in the present invention, we experimented with a number of commercially available brighteners to obtain a smooth specular gloss, but we found that 50% water-soluble epoxy resins of sodium nicotinate and/or potassium nicotinate were more effective. The amount added is shown in Table 1.
[発明の効果]
本発明の銀めっき法によれば青化物を使用することなく
光沢のある銀めっき膜を得ることができる。[Effects of the Invention] According to the silver plating method of the present invention, a shiny silver plating film can be obtained without using a cyanide.
Claims (1)
いて、添加剤が少なくとも含窒素カルボン酸誘導体、ア
ルデヒドC=S含有化合物を含むことを特徴とする銀め
っき方法。(2)前記添加剤が少なくともニコチン酸ソ
ーダ及び/またはニコチン酸カリのエポキシ50%重合
水溶性物を含むことを特徴とする請求項1記載の銀めっ
き方法。(1) A silver plating method using an acidic silver complex salt as a main component, characterized in that the additive contains at least a nitrogen-containing carboxylic acid derivative and an aldehyde C═S-containing compound. (2) The silver plating method according to claim 1, wherein the additive includes at least sodium nicotinate and/or a 50% epoxy polymerized water-soluble product of potassium nicotinate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19424189A JPH0361393A (en) | 1989-07-28 | 1989-07-28 | Silver plating method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19424189A JPH0361393A (en) | 1989-07-28 | 1989-07-28 | Silver plating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0361393A true JPH0361393A (en) | 1991-03-18 |
Family
ID=16321330
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19424189A Pending JPH0361393A (en) | 1989-07-28 | 1989-07-28 | Silver plating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0361393A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100355944C (en) * | 2005-01-17 | 2007-12-19 | 上海大学 | Brightening agent for cyanogen-free silver-plating and its preparing method |
| WO2008043528A2 (en) | 2006-10-09 | 2008-04-17 | Enthone Inc. | Cyanide-free electrolyte composition, and method for the deposition of silver or silver alloy layers on substrates |
| WO2014020981A1 (en) | 2012-07-31 | 2014-02-06 | 株式会社大和化成研究所 | Electrosilver plating fluid |
| CN109518236A (en) * | 2019-01-21 | 2019-03-26 | 南昌航空大学 | A method of preparing non-cyanide plating silver layer resistant to high temperatures on copper plating piece |
-
1989
- 1989-07-28 JP JP19424189A patent/JPH0361393A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100355944C (en) * | 2005-01-17 | 2007-12-19 | 上海大学 | Brightening agent for cyanogen-free silver-plating and its preparing method |
| WO2008043528A2 (en) | 2006-10-09 | 2008-04-17 | Enthone Inc. | Cyanide-free electrolyte composition, and method for the deposition of silver or silver alloy layers on substrates |
| WO2008043528A3 (en) * | 2006-10-09 | 2009-04-16 | Enthone | Cyanide-free electrolyte composition, and method for the deposition of silver or silver alloy layers on substrates |
| KR101409701B1 (en) * | 2006-10-09 | 2014-06-19 | 엔쏜 인코포레이티드 | Electrolyte compositions and methods without cyanide for deposition on substrates of silver or silver alloy layers |
| WO2014020981A1 (en) | 2012-07-31 | 2014-02-06 | 株式会社大和化成研究所 | Electrosilver plating fluid |
| CN109518236A (en) * | 2019-01-21 | 2019-03-26 | 南昌航空大学 | A method of preparing non-cyanide plating silver layer resistant to high temperatures on copper plating piece |
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