JPH0361862B2 - - Google Patents
Info
- Publication number
- JPH0361862B2 JPH0361862B2 JP60158240A JP15824085A JPH0361862B2 JP H0361862 B2 JPH0361862 B2 JP H0361862B2 JP 60158240 A JP60158240 A JP 60158240A JP 15824085 A JP15824085 A JP 15824085A JP H0361862 B2 JPH0361862 B2 JP H0361862B2
- Authority
- JP
- Japan
- Prior art keywords
- valve
- valve plate
- vacuum valve
- shield
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000002184 metal Substances 0.000 description 5
- NMFHJNAPXOMSRX-PUPDPRJKSA-N [(1r)-3-(3,4-dimethoxyphenyl)-1-[3-(2-morpholin-4-ylethoxy)phenyl]propyl] (2s)-1-[(2s)-2-(3,4,5-trimethoxyphenyl)butanoyl]piperidine-2-carboxylate Chemical compound C([C@@H](OC(=O)[C@@H]1CCCCN1C(=O)[C@@H](CC)C=1C=C(OC)C(OC)=C(OC)C=1)C=1C=C(OCCN2CCOCC2)C=CC=1)CC1=CC=C(OC)C(OC)=C1 NMFHJNAPXOMSRX-PUPDPRJKSA-N 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 238000010304 firing Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
Landscapes
- Plasma Technology (AREA)
- Sliding Valves (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、真空バルブに係り、特に、ビーム通
路の途中に取付けられ、106Torr・／Ｓ以下の
リーク量を要求される個所に好適な真空バルブに
関する。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a vacuum valve, and particularly to a vacuum valve installed in the middle of a beam path and suitable for a location where a leakage amount of 10 6 Torr/S or less is required. Regarding vacuum valves.
イオン、あるいは中性粒子ビームがその通路や
ビームリミタに衝突し、該金属が周囲をスパツタ
するのは周知である。しかし、スパツタ金属が○
リングに付着し、亀裂を発生させ、○リングのシ
ール性能を低下させることは知られておらず、従
つて、スパツタシールドを備えた超高真空弁はな
かつた。尚、此種装置に関連するものとしては、
例えば特開昭56−65981号公報が挙げられる。
It is well known that an ion or neutral beam impinges on its path or beam limiter, causing the metal to sputter around. However, the spattered metal is ○
It is not known to adhere to the ring, cause cracks, and reduce the sealing performance of the ○ ring, and therefore there have been no ultra-high vacuum valves with spatter shields. Additionally, related to this type of device are:
For example, Japanese Patent Application Laid-Open No. 56-65981 can be mentioned.
本発明の目的は、シール用○リングがスパツタ
されないように、ビーム発射中、つまり、弁板引
抜き時は、ビーム通路にスパツタシールドが配置
される真空バルブを提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a vacuum valve in which a spatter shield is placed in the beam passage during beam firing, that is, when the valve plate is pulled out, so that the sealing ring is not spattered.
本発明はバルブ閉時、つまりビームを発射しな
い時は、弁板の移動を妨げない位置にあり、バル
ブ開時、つまり、ビーム発射時にはビーム通路に
来るようなスパツタシールドを設けたものであ
る。
The present invention is provided with a spatter shield that is located in a position that does not obstruct the movement of the valve plate when the valve is closed, that is, when the beam is not emitted, and is located in the beam path when the valve is open, that is, when the beam is not emitted. .
第１図および第２図により本発明を説明する。 The present invention will be explained with reference to FIGS. 1 and 2.
第１図はバルブ閉の状態を示し、SUS304ある
いは、Mo板等高融点金属で製作されたスパツタ
シールド１は、バルブ本体７の照射側のスペース
に引き込まれており、弁板３は弁押し４によりロ
ツド６の上方のエヤシリンダ等（図示せず）から
の推力でリンク５を介し、バルブ本体７に押付け
られ弁板３に装置された○リング２を押し、ビー
ム源側と照射側を真空的に切離している。 Figure 1 shows the valve closed state, where the spatter shield 1 made of high melting point metal such as SUS304 or Mo plate is drawn into the space on the irradiation side of the valve body 7, and the valve plate 3 is the valve pusher. 4, the thrust from an air cylinder or the like (not shown) above the rod 6 pushes the ○ ring 2 which is pressed against the valve body 7 and installed on the valve plate 3 through the link 5, and the beam source side and the irradiation side are vacuumed. are separated from each other.
ビームＢを発射する際は、弁板３が上方に引き
上げられる。このときの状態を第２図に示す。弁
板３が上方に引き上げられると、スパツタシール
ド１はバルブ本体の照射側スペースから、リン
ク、又はラツク、あるいはピニオン方式（図示せ
ず）により、ビーム源側に移動し、弁板３の引込
部を閉鎖する。図中８はベローズである。 When firing the beam B, the valve plate 3 is pulled upward. The state at this time is shown in FIG. When the valve plate 3 is pulled upward, the sputter shield 1 is moved from the irradiation side space of the valve body to the beam source side by a link, rack, or pinion system (not shown), and the valve plate 3 is retracted. Department will be closed. 8 in the figure is a bellows.
本実施例によれば、ビーム発射中に発生する蒸
発金属はスパツタシールド１にさえぎられ、○リ
ング２に到達しないという効果がある。 According to this embodiment, the evaporated metal generated during beam emission is blocked by the sputter shield 1 and does not reach the circle ring 2.
本発明によれば、ビーム発射中に発生する蒸発
金属はスパツタシールドにさえぎられ、○リング
には到達しないので○リングがスパツタされるこ
とはなく、従つて亀裂と生じることが無く、真空
バルブとしてのシール性能が維持できる。
According to the present invention, the evaporated metal generated during beam emission is blocked by the spatter shield and does not reach the ○ ring, so the ○ ring is not spattered and therefore no cracks are formed, and the vacuum valve The sealing performance can be maintained.
第１図は本発明の一実施例のスパツタシールド
を設け閉時の真空バルブの断面図、第２図は本発
明のスパツタシールドを設け開時の真空バルブの
断面図である。
１……スパツタシールド、２……○リング、３
……弁板、４……弁押し、５……リンク、６……
ロツド、７……バルブ本体、８……ベローズ。
FIG. 1 is a cross-sectional view of a vacuum valve provided with a sputter shield according to an embodiment of the present invention when closed, and FIG. 2 is a cross-sectional view of the vacuum valve provided with a spatter shield of the present invention when opened. 1...Spatsuta Shield, 2...○Ring, 3
...Valve plate, 4...Valve pusher, 5...Link, 6...
Rod, 7... Valve body, 8... Bellows.
Claims (1)
射されてない時にはビーム通路を閉じ、ビーム発
射中はバルブ本体収納部に収納されている真空バ
ルブにおいて、ビームが発射されない時には前記
弁板の移動を妨げない位置にあり、ビーム発射中
には真空バルブが収納されている収納部の開口部
を塞ぐようにビーム通路に移動可能なスパツタシ
ールドを設けたことを特徴とする真空バルブ。1. A vacuum valve consisting of a valve plate and a seal ring, which closes the beam passage when the beam is not being emitted, and which is housed in the valve body housing part during the beam emitting, and prevents the valve plate from moving when the beam is not emitted. A vacuum valve characterized in that a sputter shield is located in a position where it is not obstructed and is movable in a beam passage so as to close an opening of a storage section in which the vacuum valve is stored during beam emission.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60158240A JPS6220973A (en) | 1985-07-19 | 1985-07-19 | Vacuum valve with spatter shield |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60158240A JPS6220973A (en) | 1985-07-19 | 1985-07-19 | Vacuum valve with spatter shield |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6220973A JPS6220973A (en) | 1987-01-29 |
| JPH0361862B2 true JPH0361862B2 (en) | 1991-09-24 |
Family
ID=15667326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60158240A Granted JPS6220973A (en) | 1985-07-19 | 1985-07-19 | Vacuum valve with spatter shield |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6220973A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4980794B2 (en) * | 2007-05-24 | 2012-07-18 | 日本電子株式会社 | Charged particle beam equipment |
| JP4561814B2 (en) * | 2007-11-21 | 2010-10-13 | Ｔｄｋ株式会社 | Milling device |
| DE102008049353A1 (en) | 2008-09-29 | 2010-04-08 | Vat Holding Ag | vacuum valve |
| JP4997361B2 (en) * | 2009-03-05 | 2012-08-08 | Ｓｍｃ株式会社 | Vacuum valve |
| CN114657538B (en) * | 2022-03-25 | 2024-02-02 | 厦门韫茂科技有限公司 | The cavity structure of a continuous ALD coating equipment |
-
1985
- 1985-07-19 JP JP60158240A patent/JPS6220973A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6220973A (en) | 1987-01-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |