JPH036239B2 - - Google Patents
Info
- Publication number
- JPH036239B2 JPH036239B2 JP645788A JP645788A JPH036239B2 JP H036239 B2 JPH036239 B2 JP H036239B2 JP 645788 A JP645788 A JP 645788A JP 645788 A JP645788 A JP 645788A JP H036239 B2 JPH036239 B2 JP H036239B2
- Authority
- JP
- Japan
- Prior art keywords
- oxide
- lead
- coating
- plating
- platinum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 68
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 62
- YADSGOSSYOOKMP-UHFFFAOYSA-N dioxolead Chemical compound O=[Pb]=O YADSGOSSYOOKMP-UHFFFAOYSA-N 0.000 claims description 48
- 238000000576 coating method Methods 0.000 claims description 39
- 239000011248 coating agent Substances 0.000 claims description 38
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 33
- 229910052697 platinum Inorganic materials 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 28
- 229910052751 metal Inorganic materials 0.000 claims description 20
- 239000002184 metal Substances 0.000 claims description 20
- 229910044991 metal oxide Inorganic materials 0.000 claims description 9
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 9
- 150000004706 metal oxides Chemical class 0.000 claims description 7
- 229910001887 tin oxide Inorganic materials 0.000 claims description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 7
- 150000002739 metals Chemical class 0.000 claims description 6
- 230000000737 periodic effect Effects 0.000 claims description 6
- 239000013078 crystal Substances 0.000 claims description 4
- 230000005611 electricity Effects 0.000 claims description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 229910052731 fluorine Inorganic materials 0.000 claims 1
- 239000011737 fluorine Substances 0.000 claims 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims 1
- 229910001936 tantalum oxide Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- 150000002500 ions Chemical class 0.000 description 14
- 239000010410 layer Substances 0.000 description 13
- 239000007788 liquid Substances 0.000 description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 11
- 239000010936 titanium Substances 0.000 description 11
- 229910052719 titanium Inorganic materials 0.000 description 11
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 229910000464 lead oxide Inorganic materials 0.000 description 6
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical group [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 6
- 238000005979 thermal decomposition reaction Methods 0.000 description 6
- -1 fluoride ions Chemical class 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- 238000001556 precipitation Methods 0.000 description 5
- 239000006104 solid solution Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 229910000978 Pb alloy Inorganic materials 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005868 electrolysis reaction Methods 0.000 description 4
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 4
- MOUPNEIJQCETIW-UHFFFAOYSA-N lead chromate Chemical compound [Pb+2].[O-][Cr]([O-])(=O)=O MOUPNEIJQCETIW-UHFFFAOYSA-N 0.000 description 4
- 230000010287 polarization Effects 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- 238000012423 maintenance Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 3
- VSSLEOGOUUKTNN-UHFFFAOYSA-N tantalum titanium Chemical compound [Ti].[Ta] VSSLEOGOUUKTNN-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 229940117975 chromium trioxide Drugs 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000007646 gravure printing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- SZVJSHCCFOBDDC-UHFFFAOYSA-N iron(II,III) oxide Inorganic materials O=[Fe]O[Fe]O[Fe]=O SZVJSHCCFOBDDC-UHFFFAOYSA-N 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910000004 White lead Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- CSLZEOQUCAWYDO-UHFFFAOYSA-N [O-2].[Ti+4].[Ta+5] Chemical compound [O-2].[Ti+4].[Ta+5] CSLZEOQUCAWYDO-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000009924 canning Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- RVPVRDXYQKGNMQ-UHFFFAOYSA-N lead(2+) Chemical compound [Pb+2] RVPVRDXYQKGNMQ-UHFFFAOYSA-N 0.000 description 1
- RYZCLUQMCYZBJQ-UHFFFAOYSA-H lead(2+);dicarbonate;dihydroxide Chemical compound [OH-].[OH-].[Pb+2].[Pb+2].[Pb+2].[O-]C([O-])=O.[O-]C([O-])=O RYZCLUQMCYZBJQ-UHFFFAOYSA-H 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- OEIMLTQPLAGXMX-UHFFFAOYSA-I tantalum(v) chloride Chemical compound Cl[Ta](Cl)(Cl)(Cl)Cl OEIMLTQPLAGXMX-UHFFFAOYSA-I 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 239000005029 tin-free steel Substances 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Description
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çšéœæ¥µã«é¢ãããDETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for chrome plating the surface of a material to be plated, particularly the surface of a cylinder for gravure printing, etc., using a sergeant bath or the like, and an anode for chrome plating.
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ããã«åºãå©çšãããŠããã(Prior art and its problems) The chrome plating method not only provides a good appearance on the formed surface, but also provides a sufficiently hard and corrosion-resistant coating layer. , engine parts for automobiles, etc.
Widely used for plating various cylinders, tableware, cans, etc.
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ãããŠããã The chrome plating method can be roughly divided into a method using a silicate bath in which silicic acid is added to the plating bath;
There is a method of using a sergeant bath to which sulfuric acid is added, and in addition to these methods, various plating baths have been devised based on these two methods, in which additives are added or the concentration of the liquid is changed.
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ãšããæ¬ ç¹ãããã Because the silifying bath has a good finish and high current efficiency, it is used for plating automobile engine parts and steel plates for canning cans, which are made of tin-free steel. However, it is difficult to manage the liquid, and since the electrolytic bath contains fluoride ions, the liquid is highly corrosive and corrodes the plating apparatus itself, making maintenance difficult.
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ãªããã°ãªããªããšããæ¬ ç¹ãæããŠããã Although sergeant baths and their modified baths generally have a problem of somewhat low current efficiency, they are easy to handle and stable, so they are becoming widely used. Sargent baths and their modified baths generally use lead or lead alloys as anodes. However, anodes made of lead or lead alloys oxidize Cr 3+ ions generated during electrolysis.
Although it has the effect of converting to Cr 2 O 7 and keeping the concentration of each ion constant, the elution of lead and lead alloys from the anode is limited.
mg to several tens of mg/AH, and the eluted lead ions react with chromic acid in the solution to form lead chromate (PbCrO 4 ).
forms and precipitates in the liquid. Therefore, not only is maintenance such as removal of the precipitates and liquid exchange time-consuming, but also there is a problem that the precipitates have an adverse effect on the chrome plating layer itself. Another disadvantage is that the electrodes have a short lifespan and must be replaced frequently.
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ããåé¡ç¹ãææãããŠããã Methods have been proposed to use ferrite or magnetite electrodes to eliminate the effects of lead, but these electrodes are themselves extremely brittle and lack mechanical strength, requiring great care when handling. Magnetite has the disadvantage that it has a relatively low electrical conductivity and cannot be used at high current densities. Also, when using this electrode, the
It has also been pointed out that the concentration of Cr 3+ ions increases and the current efficiency decreases.
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ããšããæ¬ ç¹ãããã Lead dioxide coated electrodes, which are currently used as the most suitable anodes for chrome plating, differ from the aforementioned lead electrodes in that the elution of electrode components into the plating bath is as small as 0.1 mg/AH or less, and there is almost no liquid contamination or precipitation. do not have.
However, when the lead dioxide coated electrode is used alone, the oxidizing effect on Cr 3+ ions is too strong, and the Cr 3+ concentration in the bath often becomes less than 1.5 g/min, resulting in poor plating quality.
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æããŠããã As a noble metal-based insoluble metal electrode, a so-called dimensionally stable electrode (DSE) coated with an oxide layer containing platinum-plated titanium or a platinum group metal oxide is used. DSE has extremely high corrosion resistance and extremely high catalytic activity against oxygen generation, so it is widely used in various electrolysis applications. In the case of chrome plating, the electrode has the function of oxidizing Cr 3+ ions in addition to passing current, but the DSE has insufficient catalytic activity for oxidizing Cr 3+ ions, and
It has the disadvantage that the concentration of Cr 3+ ions increases.
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èŠãããã In order to solve these problems, recently a platinum-plated titanium electrode is used as an anode, lead is immersed in a plating bath or connected to the anode, and the lead is dissolved as ions in the plating bath, and the lead ions are transferred to the titanium electrode. A method has been proposed in which the surface is modified to oxidize Cr 3+ ions by collecting them as lead dioxide. This method is particularly effective for plating gravure printing rolls that are frequently turned on and off, but because there is little lead dioxide deposited on the surface during anodic polarization and the adhesion of lead dioxide is relatively weak, the current supply is stopped. At times, the lead dioxide layer tends to dissolve or peel off, and its oxidizing power against chromium is weak. To improve this, it is necessary to take measures such as making the anode area larger than usual.
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ãã ã¡ããçšéœæ¥µãæäŸããããšãç®çãšããã(Purpose of the Invention) The present invention was made to solve the above-mentioned problems, and aims to minimize contamination due to lead chromate precipitation in the plating bath and maintain an appropriate Cr 3+ concentration. The object of the present invention is to provide a plating method and an anode for chrome plating that can stably perform high-quality chrome plating over a long period of time.
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ããŠæãã¯ãã ã¡ããçšéœæ¥µã§ããã(Means for Solving the Problems) The present invention firstly provides a coating of at least one metal selected from metals belonging to Groups 4 and 5 of the Periodic Table on the surface of a base material on which a platinum coating is formed. Using an anode coated with an oxide having an ethyl type crystal phase, a lead component is added to the plating bath and electricity is applied to form a lead dioxide coating on the oxide coating, and the material to be plated is chrome plated. This is a chrome plating method characterized by: secondly, the surface of the base material on which the platinum coating is formed is coated with an oxide of at least one metal selected from metals belonging to Groups 4 and 5 of the periodic table; The anode for chrome plating is further formed by coating the metal oxide with a lead dioxide coating.
ä»¥äžæ¬çºæã詳现ã«èª¬æããã The present invention will be explained in detail below.
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æ¿ããšã¯ã¹ãã³ãã¡ãã·ãŠã奜é©ã§ããã The electrode base material in the present invention is not particularly limited as long as it has corrosion resistance and conductivity during anodic polarization in a plating bath, but titanium or a titanium alloy is optimal from the viewpoint of stability and workability. The shape of the base material is preferably a perforated plate or an expanded mesh in consideration of liquid flow and gas release.
次ãã§è©²åºæè¢«èŠãçœéã§è¢«èŠããã The substrate coating is then coated with platinum.
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ã®ææ¥ã«ãã€ãŠãå£åããããšãæ®ã©ãªãã The main reaction at the anode during chrome plating is an oxygen evolution reaction, and platinum is used as the electrode component that mainly causes this reaction. Recently, electrodes coated with platinum group metal oxides (DSE) have been commonly used, but this type of electrode has an extremely catalytic effect on oxygen generation and has a low electrolytic potential. Therefore, trivalent chromium in the plating solution is not oxidized even if the electrode surface is modified with lead oxide, which will be described later. Therefore, it cannot be used as an electrode coating material in the present invention, and only platinum can be used. Note that platinum has sufficient durability as an anode in a chrome plating bath, and hardly deteriorates even after long-term operation.
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ãŠãããã The method for coating the base material with platinum is not particularly limited as long as the platinum can be firmly bonded to the base material, and conventional techniques such as electroplating and pyrolysis can be used. is particularly suitable.
To form a platinum coating by a pyrolysis method, a soluble solution containing a platinum component such as chloroplatinic acid is prepared, the solution is applied to a substrate, and then the solution is heated in air, vacuum, an inert atmosphere, etc. The material is heated to 300-700°C to form a platinum coating through thermal decomposition. In addition, in order to apply the platinum coating smoothly and uniformly to the entire surface of the base material, prevent oxidation of the base material itself, and obtain an electrode with a longer lifespan, the surface of the base material is coated in advance by thermal oxidation or thermal decomposition. A conductive oxide coating such as titanium oxide, tin oxide or (TiTa)O 2 may be formed.
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ã§ããã The platinum coating formed in this manner alone has insufficient ability to oxidize trivalent chromium to hexavalent chromium, and in order to increase this ability, a thin layer of lead oxide is formed on the surface. In order to form the lead oxide, first, a metal oxide layer as described below is formed on the surface of the platinum-coated electrode, and the lead ions are removed in a plating bath containing lead ions using the oxide-coated platinum electrode. oxidizes and the resulting lead dioxide is deposited. The oxide layer is a metal of Group 4 or Group 5 of the periodic table, ie, a valve metal such as titanium, zirconium, hafnium, niobium, tantalum, etc., or a metal such as tin, preferably a metal that forms an ethyl type oxide. An oxide layer is formed by a thermal decomposition method or the like. The conditions for this thermal decomposition are arbitrary; for example, a hydrochloric acid or alcohol solution containing the above metals is applied and heated at 400 to 700°C. This operation can be repeated several times to obtain an oxide layer of any desired thickness. Among these oxides, tin oxide (SnO 2 ) is conductive by itself and can be used as is, but titanium oxide, for example, has insufficient conductivity when it is completely TiO 2 , so it is necessary to add niobium or tantalum to it. When a small amount is dissolved in solid solution, the conductivity becomes good and an oxide coating layer of rutile type crystal can be easily obtained.
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ãã In the method of the present invention, an electrode base material on which a lead dioxide coating is not formed on the surface is used, a plating solution containing a lead component is used during chrome plating on the base material, and the lead dioxide is coated on the surface of the base material at the start of plating. It is efficient to form a coating. However, the anode for chrome plating according to the present invention can also be manufactured by a method other than the above method, such as by plating lead dioxide in a separate plating bath on the base material before coating with lead dioxide, or by applying a suspension at a temperature below 200°C. A lead dioxide coating can also be formed by a coating heating method in which the lead dioxide is heated and fixed.
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ããã In the method of the present invention and the anode for chrome plating according to the present invention, an oxide layer of metal such as tin is formed between the platinum-coated base material and the lead dioxide coating on the surface.
The adhesion of the lead dioxide coating to the base material is improved, which not only extends the life of the electrode, but also prevents the precipitation of lead chromate, which improves work efficiency by several degrees.
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A 1.5 mm expanded mesh was used as a base material, and the surface was roughened by sandblasting, then degreased and pickled in a 20% boiling hydrochloric acid aqueous solution. A platinum coating was formed on the surface of the base material by the thermal decomposition method described below. In other words, as a coating solution, chloroplatinic acid (25 g as metal) is dissolved in a solution made by mixing isopropyl alcohol and 10% hydrochloric acid aqueous solution at a ratio of 1:1 (volume ratio), and the mixed solution is applied to the surface of the substrate with a brush. After drying at room temperature, it was fired for 10 minutes in a Matsufuru furnace with air flowing through it at 530° C. This operation was repeated 20 times to obtain a platinum-coated substrate with 10 g/m 2 of platinum attached to titanium.
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åã¹ãºã®çµæ¶çžã¯ã«ãã«åã§ãã€ãã Next, a tin oxide (SnO 2 ) coating was formed on the platinum coating by a thermal decomposition method according to the method described below.
The coating solution is made by dissolving tin chloride in aluminum alcohol, heating it for 3 hours with a reflux condenser to remove chlorine ions, and then adding a few drops of deionized water to convert some of the tin component into hydroxide. I made it so that it would be done. This coating solution was spray-coated onto the platinum-coated substrate, dried at 150°C, and then baked at 500°C for 10 minutes. This operation was repeated four times to form a coating of about 2 g-Sn/m 2 . Observation with a powder X-ray diffractometer revealed that the crystal phase of the tin oxide was rutile type.
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The surface of the copper piece was then chromed at 15 A/dm 2 for 3 continuous hours using a sergeant bath chroming solution to which basic lead carbonate was added so that the concentration before electrolysis was 1 g-Pb/.
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%, the Cr 3+ concentration after plating was 6 g/, whereas when plating with the comparison electrode, the current efficiency was
The Cr 3+ concentration after plating decreased to 14% and decreased to 10g/
It was found that it did not have sufficient oxidation ability for Cr 3+ .
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ç©çžã®çµæ¶çžã¯ã«ãã«åã§ãã€ããExample 2 A 10% hydrochloric acid aqueous solution containing titanium chloride and tantalum chloride was applied as a coating liquid to the surface of a titanium base material prepared in the same manner as in Example 1 so that the atomic ratio of titanium and tantalum was 20:80. After drying, it was baked at 550°C for 10 minutes to form a titanium-tantalum oxide solid solution base layer on the surface. Do this operation 4
The total metal content was 1 g/m 2 by repeating the test several times. Observation with a powder X-ray diffractometer revealed that the crystalline phase of the oxide phase was rutile type.
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æããã This surface was coated with approximately 10 g/m 2 of platinum in the same manner as in Example 1, and further coated with a rutile-type oxide solid solution having a metal content of 1.0 g/m 2 made of titanium-tantalum as described above. Coatings were formed under similar conditions.
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ãäœè£œããã For comparison, an electrode was prepared in the same manner except that the titanium-tantalum surface oxide solid solution coating was not formed.
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çšé»æ¥µã§ã¯12ïœïŒm2ã§ãã€ãã Both electrodes were immersed together with a lead piece in a chromic acid solution containing chromium trioxide at a concentration of 250 g/g and sulfuric acid at a concentration of 1 g/d, and anodic polarization was performed at 15 A/dm 2 for 30 minutes. Analysis of the lead concentration in the liquid at this time
The amount of lead dioxide attached to each sample electrode was 14 g/m 2 for the electrode of this example, and 12 g/m 2 for the comparative electrode.
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žåéãæ®ã€ãŠããã Furthermore, both electrodes were immersed in the above chromic acid solution at a temperature of 50°C.
The mixture was held for 30 minutes while stirring the liquid. In the comparative electrode, most of the lead was eluted, whereas in the electrode of this example, 5 g/m 2 of lead oxide remained.
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ã€ãã From the above, electrodes with a titanium-tantalum solid solution oxide surface layer are more likely to form lead dioxide on the surface during anodic polarization than electrodes without such a surface layer, and are also strongly attached and difficult to dissolve. I understand.
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JIS第ïŒçš®ã®åãïŒmmã®ãã¿ã³æ¿ã宿œäŸïŒãš
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衚é¢è¢«èŠãè¡ã€ããExample 3 A JIS Type 1 titanium plate having a thickness of 1 mm was pretreated in the same manner as in Example 1, and a base layer was formed in the same manner as in Example 2. A 5% aqueous solution of hydrochloric acid containing 50 g of chloroplatinic acid was used as the plating liquid, and the current density was 1 A/dm 2 at room temperature.
Platinum plating was performed to a thickness of 0.5 ÎŒm. This surface was coated with 2 g/m 2 of tin dioxide in the same manner as in Example 1.
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æ¯èŒããŠå°ãªãã€ãã This was used as an anode, and a plating solution was added to a chromic acid solution containing chromium trioxide at a concentration of 250 g/g and sulfuric acid at a concentration of 1 g/g, and pure lead was suspended in a plating tank as a lead source to make the lead ion concentration 45 ppm. Chrome plating was applied to the surface of the copper piece. 50â while circulating the liquid
After continuous electrolysis at 15A/ dm2 for 4000 hours,
The decrease in platinum content is almost zero, with 25g/ m2 on the surface.
of lead was firmly attached as lead dioxide. On the other hand, when commercially available platinum-plated titanium (platinum thickness 1 ÎŒm) was used, the platinum content decreased by about 10% under the same conditions, and the amount of lead on the surface was 17 g/m 2 , which was smaller than that in this example. Nakatsuta.
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ãŠããã(Effects of the Invention) In the method of the present invention, when performing chrome plating, metals belonging to Groups 4 and 5 of the periodic table, such as tin, are applied to a specific plating electrode, that is, the surface of a base material coated with platinum. Using an anode coated with an oxide of at least one selected metal, and applying electricity while adding a lead component to the plating bath, the surface of the base material coated with the tin oxide etc. is coated with lead dioxide. While forming, the material to be plated is plated.
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ç¶ããããšãã§ããã A lead dioxide coating is formed on the anode by simply dissolving a small amount of lead in the plating bath during plating, and the anode remains stable for a long period of time even under plating conditions that are frequently turned on and off, such as in gravure roll plating. It becomes possible to perform plating operations. Therefore, by using the anode according to the method of the present invention in place of the conventional lead alloy anode, which tends to have a short lifespan, not only the lifespan of the anode can be extended, but also the precipitation of lead chromate in the liquid can be almost eliminated, making maintenance easier. This makes plating easier and allows you to continue plating for a long time without stopping the operation.
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ããæ²æŸ±ãçããããšãæ®ã©ãªãã Further, the chrome plating anode according to the present invention can similarly perform chrome plating stably for a long period of time, and hardly causes precipitation.
Claims (1)
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ã¯ãã ã¡ããæ³ã ïŒ ã¡ããæµŽãããçŽ ã嫿ããªãã¡ããæµŽã§ã
ãè«æ±é ïŒã«èšèŒã®ã¯ãã ã¡ããæ³ã ïŒ çœé被èŠã圢æããçŽ æè¡šé¢ã«ãåšæåŸè¡šç¬¬
ïŒæåã³ç¬¬ïŒæã«å±ããéå±ããéžæãããå°ãª
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é žåç©äžã«äºé žåé被èŠã被èŠããŠæãã¯ãã ã¡
ããçšéœæ¥µã ïŒ éå±ã®é žåç©ãã«ãã«åçµæ¶çžãæããŠãã
è«æ±é ïŒã«èšèŒã®ã¯ãã ã¡ããçšéœæ¥µã ïŒ éå±é žåç©ãã¹ãºé žåç©ã§ããè«æ±é ïŒåã¯
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ã«é žåç©ã§ããè«æ±é ïŒåã¯ïŒã«èšèŒã®ã¯ãã ã¡
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æ³ã[Claims] 1. Using an anode in which the surface of a base material coated with platinum is coated with an oxide of at least one metal selected from metals belonging to Groups 4 and 5 of the periodic table, A chrome plating method characterized in that a lead component is added to a plating bath while electricity is applied to form a lead dioxide coating on the oxide coating, and the material to be plated is chrome plated. 2. The chrome plating method according to claim 1, wherein the plating bath is a plating bath that does not contain fluorine. 3 The surface of the material on which the platinum coating has been formed is coated with an oxide of at least one metal selected from metals belonging to Groups 4 and 5 of the periodic table, and further a lead dioxide coating is applied on the metal oxide. A coated anode for chrome plating. 4. The anode for chrome plating according to claim 3, wherein the metal oxide has a rutile crystal phase. 5. The chrome plating method according to claim 3 or 4, wherein the metal oxide is a tin oxide. 6. The chrome plating method according to claim 3 or 4, wherein the metal oxide is a titanium oxide and/or a tantalum oxide. 7. The chrome plating method according to any one of claims 3 to 6, wherein the coating thickness of the metal oxide is 1 ÎŒm or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP645788A JPH01184299A (en) | 1988-01-14 | 1988-01-14 | Chromium plating method and anode for chrome plating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP645788A JPH01184299A (en) | 1988-01-14 | 1988-01-14 | Chromium plating method and anode for chrome plating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01184299A JPH01184299A (en) | 1989-07-21 |
| JPH036239B2 true JPH036239B2 (en) | 1991-01-29 |
Family
ID=11638969
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP645788A Granted JPH01184299A (en) | 1988-01-14 | 1988-01-14 | Chromium plating method and anode for chrome plating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01184299A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06146052A (en) * | 1992-11-11 | 1994-05-27 | Permelec Electrode Ltd | Production of metallic foil by electrolysis |
-
1988
- 1988-01-14 JP JP645788A patent/JPH01184299A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06146052A (en) * | 1992-11-11 | 1994-05-27 | Permelec Electrode Ltd | Production of metallic foil by electrolysis |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01184299A (en) | 1989-07-21 |
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