JPH036239B2 - - Google Patents

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Publication number
JPH036239B2
JPH036239B2 JP645788A JP645788A JPH036239B2 JP H036239 B2 JPH036239 B2 JP H036239B2 JP 645788 A JP645788 A JP 645788A JP 645788 A JP645788 A JP 645788A JP H036239 B2 JPH036239 B2 JP H036239B2
Authority
JP
Japan
Prior art keywords
oxide
lead
coating
plating
platinum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP645788A
Other languages
Japanese (ja)
Other versions
JPH01184299A (en
Inventor
Masao Sekimoto
Takayuki Shimamune
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
De Nora Permelec Ltd
Original Assignee
Permelec Electrode Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Permelec Electrode Ltd filed Critical Permelec Electrode Ltd
Priority to JP645788A priority Critical patent/JPH01184299A/en
Publication of JPH01184299A publication Critical patent/JPH01184299A/en
Publication of JPH036239B2 publication Critical patent/JPH036239B2/ja
Granted legal-status Critical Current

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Description

【発明の詳现な説明】 産業䞊の利甚分野 本発明は、被メツキ材衚面、特にグラビア印刷
甚シリンダ等の衚面をサヌゞ゚ント济等を䜿甚し
おクロムメツキするための方法及びクロムメツキ
甚陜極に関する。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method for chrome plating the surface of a material to be plated, particularly the surface of a cylinder for gravure printing, etc., using a sergeant bath or the like, and an anode for chrome plating.

埓来技術ずその問題点 クロムメツキ法は、圢成される衚面の矎芳が良
奜であるだけでなく、圢成される被芆局が十分に
硬く又十分な耐食性を有するため、䟋えばグラビ
ア印刷甚のロヌル類、自動車等の゚ンゞン郚品、
各皮シリンダ類、食噚類及び眐詰甚の眐類等のメ
ツキに広く利甚されおいる。
(Prior art and its problems) The chrome plating method not only provides a good appearance on the formed surface, but also provides a sufficiently hard and corrosion-resistant coating layer. , engine parts for automobiles, etc.
Widely used for plating various cylinders, tableware, cans, etc.

クロムメツキ法は倧別しお、メツキ济にケむフ
ツ酞を添加するケむフツ化济を䜿甚する方法ず、
硫酞を添加するサヌゞ゚ント济を䜿甚する方法が
あり、この他に該法を基本ずしお添加剀を加え
たり液濃床を倉えたりした皮々のメツキ济が工倫
されおいる。
The chrome plating method can be roughly divided into a method using a silicate bath in which silicic acid is added to the plating bath;
There is a method of using a sergeant bath to which sulfuric acid is added, and in addition to these methods, various plating baths have been devised based on these two methods, in which additives are added or the concentration of the liquid is changed.

ケむフツ化济は仕䞊がりが良奜でか぀電流効率
が高いため自動車゚ンゞン郚品やスズを含たない
スチヌルである眐詰甚眐の鋌板等のメツキに䜿甚
されおいる。しかし液管理が容易でなく又電解济
にフツ化物むオンを含むため液の腐食性が倧きく
メツキ装眮自䜓を腐食するため保守が困難である
ずいう欠点がある。
Because the silifying bath has a good finish and high current efficiency, it is used for plating automobile engine parts and steel plates for canning cans, which are made of tin-free steel. However, it is difficult to manage the liquid, and since the electrolytic bath contains fluoride ions, the liquid is highly corrosive and corrodes the plating apparatus itself, making maintenance difficult.

サヌゞ゚ント济及びその倉圢济は、䞀般に電流
効率が若干䜎いずいう問題点はあるものの、取扱
いが容易でか぀安定しおいるこずから広く䜿甚さ
れるようにな぀おきおいる。䞀般にサヌゞ゚ント
济及びその倉圢济では陜極ずしお鉛又は鉛合金を
䜿甚しおいる。しかし鉛や鉛合金かなら成る陜極
には電解時に生成するCr3+むオンを酞化しお
Cr2O7に倉換し各むオン濃床を䞀定に保持する䜜
甚がある反面、陜極である鉛や鉛合金の溶出は数
mg〜数十mgAHに達し、溶出した鉛むオンは液
䞭のクロム酞ず反応しおクロム酞鉛PbCrO4
を圢成し液䞭に沈柱する。埓぀お該沈柱物陀去や
液亀換等の保守に手間がかかるだけでなく、該沈
柱物がクロムメツキ局自身に悪圱響を及がすずい
う問題点がある。又電極寿呜も短く頻繁に亀換し
なければならないずいう欠点を有しおいる。
Although sergeant baths and their modified baths generally have a problem of somewhat low current efficiency, they are easy to handle and stable, so they are becoming widely used. Sargent baths and their modified baths generally use lead or lead alloys as anodes. However, anodes made of lead or lead alloys oxidize Cr 3+ ions generated during electrolysis.
Although it has the effect of converting to Cr 2 O 7 and keeping the concentration of each ion constant, the elution of lead and lead alloys from the anode is limited.
mg to several tens of mg/AH, and the eluted lead ions react with chromic acid in the solution to form lead chromate (PbCrO 4 ).
forms and precipitates in the liquid. Therefore, not only is maintenance such as removal of the precipitates and liquid exchange time-consuming, but also there is a problem that the precipitates have an adverse effect on the chrome plating layer itself. Another disadvantage is that the electrodes have a short lifespan and must be replaced frequently.

この鉛の圱響をなくすためにプラむトやマグ
ネタむト電極を䜿甚する方法も提案されおいる
が、該電極はそれ自䜓極めお脆く機械的匷床が䞍
足し取扱いに现心の泚意を芁し、か぀これらのフ
゚ラむトやマグネタむトは電気䌝導床が比范的小
さく倧電流密床では䜿甚できないずいう欠点を有
しおいる。又該電極を䜿甚するずメツキ济䞭の
Cr3+むオンの濃床が䞊昇し電流効率が䜎䞋するず
いう問題点も指摘されおいる。
Methods have been proposed to use ferrite or magnetite electrodes to eliminate the effects of lead, but these electrodes are themselves extremely brittle and lack mechanical strength, requiring great care when handling. Magnetite has the disadvantage that it has a relatively low electrical conductivity and cannot be used at high current densities. Also, when using this electrode, the
It has also been pointed out that the concentration of Cr 3+ ions increases and the current efficiency decreases.

珟圚クロムメツキ甚の最適な陜極ずしお䜿甚さ
れおいる二酞化鉛被芆電極は、前述の鉛電極ず異
なり電極成分のメツキ济ぞの溶出が0.1mgAH以
䞋ず小さく、液汚染や沈柱物の生成が殆どない。
しかし該二酞化鉛被芆電極は単独ではCr3+むオン
に察する酞化䜜甚が匷すぎお济䞭のCr3+濃床がし
ばしば1.5以䞋ずなりメツキ品質が䜎䞋す
るずいう欠点がある。
Lead dioxide coated electrodes, which are currently used as the most suitable anodes for chrome plating, differ from the aforementioned lead electrodes in that the elution of electrode components into the plating bath is as small as 0.1 mg/AH or less, and there is almost no liquid contamination or precipitation. do not have.
However, when the lead dioxide coated electrode is used alone, the oxidizing effect on Cr 3+ ions is too strong, and the Cr 3+ concentration in the bath often becomes less than 1.5 g/min, resulting in poor plating quality.

貎金属系の䞍溶性金属電極ずしお、癜金メツキ
チタンや癜金族金属酞化物を含む酞化物局を被芆
したいわゆる寞法安定性電極DSEが䜿甚さ
れおいる。該DSEは耐食性が極めお倧きく又酞
玠発生に察する觊媒掻性が極めお倧きいため各皮
電解に広く䜿甚されおいる。クロムメツキの堎合
には電極は通電の他にCr3+むオンの酞化を行うず
いう機胜を有しおいるが、前蚘DSEはCr3+むオ
ン酞化に察する觊媒掻性が䞍十分でメツキ济䞭の
Cr3+むオンの濃床が䞊昇しおしたうずいう欠点を
有しおいる。
As a noble metal-based insoluble metal electrode, a so-called dimensionally stable electrode (DSE) coated with an oxide layer containing platinum-plated titanium or a platinum group metal oxide is used. DSE has extremely high corrosion resistance and extremely high catalytic activity against oxygen generation, so it is widely used in various electrolysis applications. In the case of chrome plating, the electrode has the function of oxidizing Cr 3+ ions in addition to passing current, but the DSE has insufficient catalytic activity for oxidizing Cr 3+ ions, and
It has the disadvantage that the concentration of Cr 3+ ions increases.

これらの問題点を解決するために、最近癜金メ
ツキチタン電極を陜極ずし、メツキ济䞭に鉛を浞
挬し又は該陜極に接続しおメツキ济䞭に鉛をむオ
ンずしお溶解させ該鉛むオンを前蚘チタン電極䞊
に二酞化鉛ずしお集めお、Cr3+むオンの酞化を行
うよう衚面改質をする方法が提案されおいる。こ
の方法は特に、オンオフの頻床の倚いグラビア印
刷甚ロヌルに察するメツキ等に察しお有効である
が、陜分極時に衚面に析出する二酞化鉛が少なく
又二酞化鉛の附着性が比范的匱いため、通電停止
時に二酞化鉛局が溶解したり剥離したりしやすく
なり、クロムに察する酞化力が匱く、これを改良
するためには陜極面積を通垞より倧きくする等の
配慮をする必芁がある。
In order to solve these problems, recently a platinum-plated titanium electrode is used as an anode, lead is immersed in a plating bath or connected to the anode, and the lead is dissolved as ions in the plating bath, and the lead ions are transferred to the titanium electrode. A method has been proposed in which the surface is modified to oxidize Cr 3+ ions by collecting them as lead dioxide. This method is particularly effective for plating gravure printing rolls that are frequently turned on and off, but because there is little lead dioxide deposited on the surface during anodic polarization and the adhesion of lead dioxide is relatively weak, the current supply is stopped. At times, the lead dioxide layer tends to dissolve or peel off, and its oxidizing power against chromium is weak. To improve this, it is necessary to take measures such as making the anode area larger than usual.

発明の目的 本発明は、叙䞊の問題点を解決するためになさ
れたもので、メツキ济でのクロム酞鉛の沈柱によ
る汚染を最䞊限ずするずずもに適正なCr3+濃床を
保持するこずにより長期に亘り安定しお高品質の
クロムメツキを行うこずのできるメツキ方法ずク
ロムメツキ甚陜極を提䟛するこずを目的ずする。
(Purpose of the Invention) The present invention was made to solve the above-mentioned problems, and aims to minimize contamination due to lead chromate precipitation in the plating bath and maintain an appropriate Cr 3+ concentration. The object of the present invention is to provide a plating method and an anode for chrome plating that can stably perform high-quality chrome plating over a long period of time.

問題点を解決するための手段 本発明は、第に癜金被芆を圢成した基材衚面
に、呚期埋衚第族及び第族に属する金属から
遞択された少なくずも皮の金属の゚チル型結晶
盞を有する酞化物を被芆した陜極を䜿甚し、メツ
キ济䞭に鉛成分を添加し぀぀通電しお前蚘酞化物
被芆䞊に二酞化鉛被芆を圢成し、か぀被メツキ材
にクロムメツキを行うこずを特城ずするクロムメ
ツキ法であり、第に癜金被芆を圢成した基材衚
面に、呚期埋衚第族及び第族に属する金属か
ら遞択された少なくずも皮の金属の酞化物を被
芆し、曎に該金属酞化物䞊に二酞化鉛被芆を被芆
しお成るクロムメツキ甚陜極である。
(Means for Solving the Problems) The present invention firstly provides a coating of at least one metal selected from metals belonging to Groups 4 and 5 of the Periodic Table on the surface of a base material on which a platinum coating is formed. Using an anode coated with an oxide having an ethyl type crystal phase, a lead component is added to the plating bath and electricity is applied to form a lead dioxide coating on the oxide coating, and the material to be plated is chrome plated. This is a chrome plating method characterized by: secondly, the surface of the base material on which the platinum coating is formed is coated with an oxide of at least one metal selected from metals belonging to Groups 4 and 5 of the periodic table; The anode for chrome plating is further formed by coating the metal oxide with a lead dioxide coating.

以䞋本発明を詳现に説明する。 The present invention will be explained in detail below.

本発明における電極基材ずしおはメツキ济䞭で
陜分極時に耐食性を有し又導電性を有するもので
あれば䜕ら限定されないが、安定性及び加工性の
面からチタン又はチタン合金が最適である。該基
材の圢状は、液流通やガス抜けを考慮するず穎明
板や゚クスパンドメツシナが奜適である。
The electrode base material in the present invention is not particularly limited as long as it has corrosion resistance and conductivity during anodic polarization in a plating bath, but titanium or a titanium alloy is optimal from the viewpoint of stability and workability. The shape of the base material is preferably a perforated plate or an expanded mesh in consideration of liquid flow and gas release.

次いで該基材被芆を癜金で被芆する。 The substrate coating is then coated with platinum.

クロムメツキの際の陜極における䞻反応は酞玠
発生反応であり、該反応を䞻ずしお起こさせる電
極成分ずしお癜金を䜿甚する。最近では癜金族金
属酞化物を被芆した電極DSEが䞀般に䜿甚
されおいるが、この皮の電極の酞玠発生に察する
觊媒䜜甚が極めお倧きく電解電䜍が䜎くクロムメ
ツキ液䞭の䟡クロムを䟡クロムぞ酞化するた
めの電䜍に達しないため、電極衚面に埌述する酞
化鉛による修食を斜しおもメツキ液䞭の䟡クロ
ムの酞化が行なわれない。埓぀お本発明における
電極被芆物質ずしおは䜿甚できず、䜿甚できるの
は癜金のみである。なお癜金はクロムメツキ济䞭
においお陜極ずしお十分な耐久性を有し、長期間
の操業によ぀おも劣化するこずが殆どない。
The main reaction at the anode during chrome plating is an oxygen evolution reaction, and platinum is used as the electrode component that mainly causes this reaction. Recently, electrodes coated with platinum group metal oxides (DSE) have been commonly used, but this type of electrode has an extremely catalytic effect on oxygen generation and has a low electrolytic potential. Therefore, trivalent chromium in the plating solution is not oxidized even if the electrode surface is modified with lead oxide, which will be described later. Therefore, it cannot be used as an electrode coating material in the present invention, and only platinum can be used. Note that platinum has sufficient durability as an anode in a chrome plating bath, and hardly deteriorates even after long-term operation.

癜金の前蚘基材ぞの被芆方法は該癜金を該基材
に匷固に結合するこずができれば特に限定されず
䟋えば電気メツキ法や熱分解法等の埓来技術を䜿
甚するこずができ、熱分解法が特に奜適である。
熱分解法により癜金被芆を圢成するには、䟋えば
塩化癜金酞のような癜金成分を含有する可溶性溶
液を䜜補し、該溶液を基材に塗垃した埌、空気
䞭、真空䞭又は䞍掻性雰囲気䞭等で300〜700℃に
加熱し熱分解により癜金被芆を圢成する。なお癜
金被芆を基材衚面党䜓に平滑か぀均䞀に附着させ
か぀基材自身の酞化を防止し、より長寿呜の電極
を埗るために、予め基材衚面に熱酞化法や熱分解
法によ぀お導電性の酞化チタン、酞化スズ又は
TiTaO2等の酞化物被芆を圢成するようにし
おもよい。
The method for coating the base material with platinum is not particularly limited as long as the platinum can be firmly bonded to the base material, and conventional techniques such as electroplating and pyrolysis can be used. is particularly suitable.
To form a platinum coating by a pyrolysis method, a soluble solution containing a platinum component such as chloroplatinic acid is prepared, the solution is applied to a substrate, and then the solution is heated in air, vacuum, an inert atmosphere, etc. The material is heated to 300-700°C to form a platinum coating through thermal decomposition. In addition, in order to apply the platinum coating smoothly and uniformly to the entire surface of the base material, prevent oxidation of the base material itself, and obtain an electrode with a longer lifespan, the surface of the base material is coated in advance by thermal oxidation or thermal decomposition. A conductive oxide coating such as titanium oxide, tin oxide or (TiTa)O 2 may be formed.

このように圢成した癜金被芆単独では䟡クロ
ムを䟡に酞化する胜力が䞍十分であり、該胜力
を高めるために前蚘衚面に酞化鉛の薄局を圢成す
る。該酞化鉛を圢成するためには、たず前蚘癜金
被芆電極の衚面に次蚘する金属酞化物局を圢成
し、該酞化物被芆癜金電極を䜿甚しお鉛むオンを
含むメツキ济䞭で該鉛むオンを酞化し、生成する
二酞化鉛を附着させる。前蚘酞化物局は、呚期埋
衚第族又は第族の金属即ちチタン、ゞルコニ
りム、ハフニりム、ニオブ、タンタル等の匁金属
やスズ等の金属で、奜たしくぱチル型酞化物を
圢成する金属の酞化物局ずし、該酞化物局は熱分
解法等により圢成する。この熱分解の条件は任意
であり、䟋えば䞊蚘金属を含む塩酞やアルコヌル
溶液を塗垃し400〜700℃で加熱する。この操䜜は
数回繰り返しお任意の厚さの酞化物局を埗るこず
ができる。該酞化物のうち酞化スズSnO2は
それ自身導電性がありそのたた䜿甚するこずがで
きるが、䟋えばチタン酞化物は完党なTiO2では
導電性が䞍十分であり、これにニオブやタンタル
を少量固溶させるず導電性が良奜になるずずもに
ルチル型結晶の酞化物被芆局を容易に埗るこずが
できる。
The platinum coating formed in this manner alone has insufficient ability to oxidize trivalent chromium to hexavalent chromium, and in order to increase this ability, a thin layer of lead oxide is formed on the surface. In order to form the lead oxide, first, a metal oxide layer as described below is formed on the surface of the platinum-coated electrode, and the lead ions are removed in a plating bath containing lead ions using the oxide-coated platinum electrode. oxidizes and the resulting lead dioxide is deposited. The oxide layer is a metal of Group 4 or Group 5 of the periodic table, ie, a valve metal such as titanium, zirconium, hafnium, niobium, tantalum, etc., or a metal such as tin, preferably a metal that forms an ethyl type oxide. An oxide layer is formed by a thermal decomposition method or the like. The conditions for this thermal decomposition are arbitrary; for example, a hydrochloric acid or alcohol solution containing the above metals is applied and heated at 400 to 700°C. This operation can be repeated several times to obtain an oxide layer of any desired thickness. Among these oxides, tin oxide (SnO 2 ) is conductive by itself and can be used as is, but titanium oxide, for example, has insufficient conductivity when it is completely TiO 2 , so it is necessary to add niobium or tantalum to it. When a small amount is dissolved in solid solution, the conductivity becomes good and an oxide coating layer of rutile type crystal can be easily obtained.

該酞化物被芆局が圢成された癜金電極はクロム
メツキ济䞭で該济䞭の鉛むオンを酞化しおその衚
面に容易に酞化鉛局を圢成するこずができ、該衚
面酞化鉛局の量は、癜金の電解性胜が損なわれな
い範囲の量ずし、奜たしくは0.1〜50m2であ
る。
The platinum electrode on which the oxide coating layer is formed can easily form a lead oxide layer on its surface by oxidizing lead ions in the bath in a chrome plating bath, and the amount of the surface lead oxide layer is: The amount should be within a range that does not impair the electrolytic performance of platinum, preferably 0.1 to 50 g/m 2 .

本発明方法では、衚面の二酞化鉛被芆が圢成さ
れおいない電極基材を䜿甚し、該基材䞊にクロム
メツキ時に鉛成分を含むメツキ液を䜿甚し、メツ
キ開始時に前蚘基材衚面に前蚘二酞化鉛被芆を圢
成するこずが効率的である。しかし本発明に係わ
るクロムメツキ甚陜極は該方法以倖の方法により
補造するこずもでき、二酞化鉛被芆前の基材に別
個のメツキ济で二酞化鉛をメツキしたり、懞濁物
を塗垃し200℃以䞋で加熱し固定する塗垃加熱法
により二酞化鉛被芆を圢成したりするこずもでき
る。
In the method of the present invention, an electrode base material on which a lead dioxide coating is not formed on the surface is used, a plating solution containing a lead component is used during chrome plating on the base material, and the lead dioxide is coated on the surface of the base material at the start of plating. It is efficient to form a coating. However, the anode for chrome plating according to the present invention can also be manufactured by a method other than the above method, such as by plating lead dioxide in a separate plating bath on the base material before coating with lead dioxide, or by applying a suspension at a temperature below 200°C. A lead dioxide coating can also be formed by a coating heating method in which the lead dioxide is heated and fixed.

本発明方法及び本発明に係わるクロムメツキ甚
陜極では、癜金被芆基材ず衚面の二酞化鉛被芆間
にスズ等の金属の酞化物局を圢成しおあるため、
二酞化鉛被芆の基材に察する密着性が向䞊し、電
極ずしおの寿呜が䌞びるだけでなく、クロム酞鉛
の沈柱が生ずるこずがなく、䜜業効率も数段向䞊
する。
In the method of the present invention and the anode for chrome plating according to the present invention, an oxide layer of metal such as tin is formed between the platinum-coated base material and the lead dioxide coating on the surface.
The adhesion of the lead dioxide coating to the base material is improved, which not only extends the life of the electrode, but also prevents the precipitation of lead chromate, which improves work efficiency by several degrees.

実斜䟋 以䞋本発明を実斜䟋に基づきより詳现に説明す
るが、本発明は該実斜䟋に限定されるものではな
い。
(Examples) The present invention will be explained in more detail based on Examples below, but the present invention is not limited to these Examples.

実斜䟋  JIS1皮のチタン補の瞊50mm、暪50mm及び厚さ
1.5mmの゚クスパンドメツシナを基材ずし、その
衚面をサンドブラスト凊理しお粗面化した埌、脱
脂し20の沞隰塩酞氎溶液䞭で酞掗を行぀た。該
基材衚面に次蚘する熱分解法により癜金被芆を圢
成した。぀たり塗垃液ずしお塩化癜金酞金属ず
しお25を、む゜プロピルアルコヌルず10塩
酞氎溶液を容量比で混合したの溶
液に溶解し、該混合液を刷毛により基材衚面に塗
垃し宀枩で也燥埌530℃の空気を流通させたマツ
フル炉䞭に入れお10分間焌成し、この操䜜を20回
繰り返しお癜金が10m2−チタン附着した癜金
被芆基材を埗た。
Example 1 Made of JIS 1st grade titanium, length 50mm, width 50mm and thickness
A 1.5 mm expanded mesh was used as a base material, and the surface was roughened by sandblasting, then degreased and pickled in a 20% boiling hydrochloric acid aqueous solution. A platinum coating was formed on the surface of the base material by the thermal decomposition method described below. In other words, as a coating solution, chloroplatinic acid (25 g as metal) is dissolved in a solution made by mixing isopropyl alcohol and 10% hydrochloric acid aqueous solution at a ratio of 1:1 (volume ratio), and the mixed solution is applied to the surface of the substrate with a brush. After drying at room temperature, it was fired for 10 minutes in a Matsufuru furnace with air flowing through it at 530° C. This operation was repeated 20 times to obtain a platinum-coated substrate with 10 g/m 2 of platinum attached to titanium.

次いで該癜金被芆䞊に次蚘する方法により酞化
スズSnO2の被芆を熱分解法により圢成した。
塗垃液は、塩化スズをアルミアルコヌルに溶解
し、還流冷华噚を装着しお時間加熱し塩玠むオ
ンを陀去した埌、脱むオン氎数滎を加えおスズ成
分の䞀郚が氎酞化物に倉換されるようにした。こ
の塗垃液を前蚘癜金被芆基材䞊にスプレヌ塗垃
し、150℃で也燥埌500℃で10分間焌付けた。この
操䜜を回繰り返しお玄−Snm2の被芆を
圢成した。粉末線回折蚈で芳察したずころ該酞
化スズの結晶盞はルチル型であ぀た。
Next, a tin oxide (SnO 2 ) coating was formed on the platinum coating by a thermal decomposition method according to the method described below.
The coating solution is made by dissolving tin chloride in aluminum alcohol, heating it for 3 hours with a reflux condenser to remove chlorine ions, and then adding a few drops of deionized water to convert some of the tin component into hydroxide. I made it so that it would be done. This coating solution was spray-coated onto the platinum-coated substrate, dried at 150°C, and then baked at 500°C for 10 minutes. This operation was repeated four times to form a coating of about 2 g-Sn/m 2 . Observation with a powder X-ray diffractometer revealed that the crystal phase of the tin oxide was rutile type.

比范甚ずしお酞化スズ被芆のない詊料電極を同
じ補法で甚意した。
For comparison, a sample electrode without tin oxide coating was prepared using the same manufacturing method.

䞡電極を陜極ずし、か぀陰極ずしお同圢状であ
る瞊50mm、暪50mm及び厚さ1.5mmの銅片を䜿甚し、
か぀電解前の濃床が−Pbずなるよう塩
基性炭酞鉛を加えたサヌゞ゚ント济クロムメツキ
液を䜿甚しお連続時間15Am2で銅片衚面に
クロムメツキを行぀た。
Both electrodes are anodes, and a copper piece of the same shape, 50 mm long, 50 mm wide, and 1.5 mm thick, is used as the cathode.
The surface of the copper piece was then chromed at 15 A/dm 2 for 3 continuous hours using a sergeant bath chroming solution to which basic lead carbonate was added so that the concentration before electrolysis was 1 g-Pb/.

本実斜䟋電極によるメツキでは、電流効率が16
でメツキ埌のCr3+濃床がであ぀たのに
察し、比范甚電極によるメツキでは、電流効率が
14ず䜎䞋しか぀メツキ埌のCr3+濃床が10
であり、Cr3+に察する十分な酞化胜力を有しおい
ないこずが分か぀た。
In plating using the electrode of this example, the current efficiency is 16
%, the Cr 3+ concentration after plating was 6 g/, whereas when plating with the comparison electrode, the current efficiency was
The Cr 3+ concentration after plating decreased to 14% and decreased to 10g/
It was found that it did not have sufficient oxidation ability for Cr 3+ .

実斜䟋  実斜䟋ず同様にしお準備したチタン基材の衚
面に、チタンずタンタルの原子比が2080ずなる
ように塩化チタン及び塩化タンタルを含む10塩
酞氎溶液を塗垃液ずしお刷毛を甚いお塗垃し、也
燥埌550℃で10分間焌成し衚面にチタン−タンタ
ル酞化物固溶䜓䞋地局を圢成した。この操䜜を
回繰り返し合蚈しお金属分がm2ずなるよう
にした。粉末線回折蚈で芳察したずころ該酞化
物盞の結晶盞はルチル型であ぀た。
Example 2 A 10% hydrochloric acid aqueous solution containing titanium chloride and tantalum chloride was applied as a coating liquid to the surface of a titanium base material prepared in the same manner as in Example 1 so that the atomic ratio of titanium and tantalum was 20:80. After drying, it was baked at 550°C for 10 minutes to form a titanium-tantalum oxide solid solution base layer on the surface. Do this operation 4
The total metal content was 1 g/m 2 by repeating the test several times. Observation with a powder X-ray diffractometer revealed that the crystalline phase of the oxide phase was rutile type.

この衚面に実斜䟋ず同様にしお玄10m2の
癜金を被芆し、曎にこの衚面に前蚘したず同じチ
タン−タンタルから成る金属分が1.0m2であ
るルチル型酞化物固溶䜓の被芆を同様の条件で圢
成した。
This surface was coated with approximately 10 g/m 2 of platinum in the same manner as in Example 1, and further coated with a rutile-type oxide solid solution having a metal content of 1.0 g/m 2 made of titanium-tantalum as described above. Coatings were formed under similar conditions.

比范的ずしお該チタン−タンタル衚面酞化物固
溶䜓被芆を圢成しないこず以倖は同じように電極
を䜜補した。
For comparison, an electrode was prepared in the same manner except that the titanium-tantalum surface oxide solid solution coating was not formed.

䞡電極を、濃床250の䞉酞化クロムず蟲
床の硫酞を含有するクロム酞溶液に鉛片
ずずもに浞挬し30分間15Am2で陜分極を行぀
た。このずきの液䞭の鉛濃床を分析したずころ
40ppmであり、それぞれの詊料電極に附着した二
酞化鉛は本実斜䟋電極では14m2であり、比范
甚電極では12m2であ぀た。
Both electrodes were immersed together with a lead piece in a chromic acid solution containing chromium trioxide at a concentration of 250 g/g and sulfuric acid at a concentration of 1 g/d, and anodic polarization was performed at 15 A/dm 2 for 30 minutes. Analysis of the lead concentration in the liquid at this time
The amount of lead dioxide attached to each sample electrode was 14 g/m 2 for the electrode of this example, and 12 g/m 2 for the comparative electrode.

曎に䞡電極を䞊蚘クロム酞液に浞挬し液枩50℃
で液撹拌を行いながら30分間保持した。比范甚電
極では鉛が殆ど溶出しおいたのに察し、本実斜䟋
電極ではm2の酞化鉛が残぀おいた。
Furthermore, both electrodes were immersed in the above chromic acid solution at a temperature of 50°C.
The mixture was held for 30 minutes while stirring the liquid. In the comparative electrode, most of the lead was eluted, whereas in the electrode of this example, 5 g/m 2 of lead oxide remained.

以䞊のこずからチタン−タンタル固溶䜓酞化物
衚面局を有する電極は該衚面局を有しないものず
比范しお、陜分極時に衚面に二酞化鉛を圢成しや
すく、又匷固に附着しお溶解しにくいこずが分か
぀た。
From the above, electrodes with a titanium-tantalum solid solution oxide surface layer are more likely to form lead dioxide on the surface during anodic polarization than electrodes without such a surface layer, and are also strongly attached and difficult to dissolve. I understand.

実斜䟋  JIS第皮の厚さmmのチタン板を実斜䟋ず
同様に前凊理し、実斜䟋ず同様にしお䞋地局を
圢成した。塩化癜金酞50を含む塩酞氎
溶液をメツキ液ずし宀枩にお電流密床1Am2
で厚さ0.5Όの癜金メツキを行぀た。この衚面に
実斜䟋ず同様の操䜜でm2の二酞化スズの
衚面被芆を行぀た。
Example 3 A JIS Type 1 titanium plate having a thickness of 1 mm was pretreated in the same manner as in Example 1, and a base layer was formed in the same manner as in Example 2. A 5% aqueous solution of hydrochloric acid containing 50 g of chloroplatinic acid was used as the plating liquid, and the current density was 1 A/dm 2 at room temperature.
Platinum plating was performed to a thickness of 0.5 ÎŒm. This surface was coated with 2 g/m 2 of tin dioxide in the same manner as in Example 1.

これを陜極ずし、濃床250の䞉酞化クロ
ムず、濃床の硫酞を含有するクロム酞溶
液にメツキ液ずし、鉛源ずしお玔鉛をメツキ槜に
吊支しお鉛むオン濃床を45ppmずし、銅片衚面に
クロムメツキを行぀た。液を埪環させながら50℃
15Am2で4000時間連続電解を行぀たずころ、
癜金成分の枛少は殆ど零であり、衚面に25m2
の鉛が二酞化鉛ずしお匷固に附着しおいた。䞀方
垂販の癜金メツキチタン癜金厚1Όを䜿甚
した堎合には、同䞀条件で玄10の癜金成分の枛
少が芋られ、衚面の鉛量も17m2ず本実斜䟋ず
比范しお少なか぀た。
This was used as an anode, and a plating solution was added to a chromic acid solution containing chromium trioxide at a concentration of 250 g/g and sulfuric acid at a concentration of 1 g/g, and pure lead was suspended in a plating tank as a lead source to make the lead ion concentration 45 ppm. Chrome plating was applied to the surface of the copper piece. 50℃ while circulating the liquid
After continuous electrolysis at 15A/ dm2 for 4000 hours,
The decrease in platinum content is almost zero, with 25g/ m2 on the surface.
of lead was firmly attached as lead dioxide. On the other hand, when commercially available platinum-plated titanium (platinum thickness 1 ÎŒm) was used, the platinum content decreased by about 10% under the same conditions, and the amount of lead on the surface was 17 g/m 2 , which was smaller than that in this example. Nakatsuta.

発明の効果 本発明方法は、クロムメツキを行う際に、特定
のメツキ甚電極、぀たり癜金被芆を圢成した基材
衚面に、スズ等の呚期埋衚第族及び第族に属
する金属から遞択された少なくずも皮の金属の
酞化物を被芆した陜極を䜿甚し、か぀メツキ济䞭
に鉛成分を添加し぀぀通電しこれにより前蚘酞化
スズ等が被芆された基材衚面に二酞化鉛被芆を圢
成しながら、被メツキ材にメツキを斜すようにし
おいる。
(Effects of the Invention) In the method of the present invention, when performing chrome plating, metals belonging to Groups 4 and 5 of the periodic table, such as tin, are applied to a specific plating electrode, that is, the surface of a base material coated with platinum. Using an anode coated with an oxide of at least one selected metal, and applying electricity while adding a lead component to the plating bath, the surface of the base material coated with the tin oxide etc. is coated with lead dioxide. While forming, the material to be plated is plated.

メツキ時に埮量の鉛をメツキ济䞭に溶解しおお
くのみで二酞化鉛被芆が陜極䞊に圢成され、該陜
極により䟋えばグラビアロヌルメツキ等のオンオ
フを頻繁に繰り返すメツキ条件䞋においおも長期
間に亘り安定なメツキ操䜜を行うこずが可胜にな
る。埓぀お寿呜が短くなりがちな埓来の鉛合金陜
極に換えお本発明方法に係わる陜極を䜿甚するこ
ずにより陜極の寿呜が䌞びるだけでなく液䞭ぞの
クロム酞鉛の沈柱も殆どなくなるため保守が容易
になり、操䜜を停止するこずなく長期間メツキを
続けるこずができる。
A lead dioxide coating is formed on the anode by simply dissolving a small amount of lead in the plating bath during plating, and the anode remains stable for a long period of time even under plating conditions that are frequently turned on and off, such as in gravure roll plating. It becomes possible to perform plating operations. Therefore, by using the anode according to the method of the present invention in place of the conventional lead alloy anode, which tends to have a short lifespan, not only the lifespan of the anode can be extended, but also the precipitation of lead chromate in the liquid can be almost eliminated, making maintenance easier. This makes plating easier and allows you to continue plating for a long time without stopping the operation.

又本発明に係わるクロムメツキ甚陜極も同様に
長期間安定にクロムメツキを行うこずができ、し
かも沈柱を生ずるこずが殆どない。
Further, the chrome plating anode according to the present invention can similarly perform chrome plating stably for a long period of time, and hardly causes precipitation.

Claims (1)

【特蚱請求の範囲】  癜金被芆を圢成した基材衚面に、呚期埋衚第
族及び第族に属する金属から遞択された少な
くずも皮の金属の酞化物を被芆した陜極を䜿甚
し、メツキ济䞭に鉛成分を添加し぀぀通電しお前
蚘酞化物被芆䞊に二酞化鉛被芆を圢成し、か぀被
メツキ材にクロムメツキを行うこずを特城ずする
クロムメツキ法。  メツキ济がフツ玠を含有しないメツキ济であ
る請求項に蚘茉のクロムメツキ法。  癜金被芆を圢成した玠材衚面に、呚期埋衚第
族及び第族に属する金属から遞択された少な
くずも皮の金属の酞化物を被芆し、曎に該金属
酞化物䞊に二酞化鉛被芆を被芆しお成るクロムメ
ツキ甚陜極。  金属の酞化物がルチル型結晶盞を有しおいる
請求項に蚘茉のクロムメツキ甚陜極。  金属酞化物がスズ酞化物である請求項又は
に蚘茉のクロムメツキ法。  金属酞化物がチタン酞化物及び又はタンタ
ル酞化物である請求項又はに蚘茉のクロムメ
ツキ法。  金属酞化物の被芆厚が1Ό以䞋である請求
項からたでのいずれかに蚘茉のクロムメツキ
法。
[Claims] 1. Using an anode in which the surface of a base material coated with platinum is coated with an oxide of at least one metal selected from metals belonging to Groups 4 and 5 of the periodic table, A chrome plating method characterized in that a lead component is added to a plating bath while electricity is applied to form a lead dioxide coating on the oxide coating, and the material to be plated is chrome plated. 2. The chrome plating method according to claim 1, wherein the plating bath is a plating bath that does not contain fluorine. 3 The surface of the material on which the platinum coating has been formed is coated with an oxide of at least one metal selected from metals belonging to Groups 4 and 5 of the periodic table, and further a lead dioxide coating is applied on the metal oxide. A coated anode for chrome plating. 4. The anode for chrome plating according to claim 3, wherein the metal oxide has a rutile crystal phase. 5. The chrome plating method according to claim 3 or 4, wherein the metal oxide is a tin oxide. 6. The chrome plating method according to claim 3 or 4, wherein the metal oxide is a titanium oxide and/or a tantalum oxide. 7. The chrome plating method according to any one of claims 3 to 6, wherein the coating thickness of the metal oxide is 1 ÎŒm or less.
JP645788A 1988-01-14 1988-01-14 Chromium plating method and anode for chrome plating Granted JPH01184299A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP645788A JPH01184299A (en) 1988-01-14 1988-01-14 Chromium plating method and anode for chrome plating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP645788A JPH01184299A (en) 1988-01-14 1988-01-14 Chromium plating method and anode for chrome plating

Publications (2)

Publication Number Publication Date
JPH01184299A JPH01184299A (en) 1989-07-21
JPH036239B2 true JPH036239B2 (en) 1991-01-29

Family

ID=11638969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP645788A Granted JPH01184299A (en) 1988-01-14 1988-01-14 Chromium plating method and anode for chrome plating

Country Status (1)

Country Link
JP (1) JPH01184299A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06146052A (en) * 1992-11-11 1994-05-27 Permelec Electrode Ltd Production of metallic foil by electrolysis

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06146052A (en) * 1992-11-11 1994-05-27 Permelec Electrode Ltd Production of metallic foil by electrolysis

Also Published As

Publication number Publication date
JPH01184299A (en) 1989-07-21

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