JPH0362786B2 - - Google Patents
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- Publication number
- JPH0362786B2 JPH0362786B2 JP60038439A JP3843985A JPH0362786B2 JP H0362786 B2 JPH0362786 B2 JP H0362786B2 JP 60038439 A JP60038439 A JP 60038439A JP 3843985 A JP3843985 A JP 3843985A JP H0362786 B2 JPH0362786 B2 JP H0362786B2
- Authority
- JP
- Japan
- Prior art keywords
- molten metal
- plating
- core wire
- plated
- wire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Coating With Molten Metal (AREA)
Description
【発明の詳細な説明】
<産業上の利用分野>
本発明は、めつき装置、特に厚めつきを行なう
溶融めつき装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION <Industrial Application Field> The present invention relates to a plating apparatus, particularly a hot melt plating apparatus for performing thick plating.
<従来の技術>
めつき材の製造方法を大別すると、溶融めつき
法と電気めつき法とがあり、前者は比較的高速で
装置も簡便で低融点のめつき層を形成するのに適
した方式であるがその反面めつき層厚さの増加に
も、限界があり、厚めつきを表面品質の良い状態
で形成させることは、困難である。<Conventional technology> Methods for producing plated materials can be roughly divided into melt plating methods and electroplating methods.The former is relatively fast, uses simple equipment, and is effective in forming a plated layer with a low melting point. Although this method is suitable, there is a limit to the increase in the thickness of the plating layer, and it is difficult to form a thick plating layer with good surface quality.
後者は、偏肉の少くない厚めつきを行うことが
可能であり、融点の高い材料のめつきを行うこと
も可能であるが、めつき速度は遅く製造装置上も
めつき浴費用上も経済性が劣る上、表面硬さが溶
融めつき材よりも低下することもおこるためめつ
き材使用工程上の派生問題も生じることがある。 The latter allows thicker plating with less uneven thickness, and it is also possible to plate materials with high melting points, but the plating speed is slow and it is not economical in terms of manufacturing equipment and plating bath costs. In addition, the surface hardness may be lower than that of melt-plated materials, which may cause problems in the process of using the plating materials.
電気めつき法に比して経済性のよい溶融めつき
法により、均一な品質の安定した製品を得ること
ができる装置の開発が望まれていた。 It has been desired to develop an apparatus that can produce stable products of uniform quality by melt plating, which is more economical than electroplating.
<発明が解決しようとする問題点>
本発明の目的は、前記した従来技術の欠点を解
消し、溶融めつき法において厚めつきを行う時
に、表面品質の良好なめつき材を製造する溶融め
つき装置を提供することにある。<Problems to be Solved by the Invention> The purpose of the present invention is to solve the above-mentioned drawbacks of the prior art, and to provide a hot-melt plating method for producing a plated material with good surface quality when thick plating is performed using the hot-melt gluing method. The goal is to provide equipment.
<問題点を解決するための手段>
本発明は線または条の溶融めつき装置におい
て、比めつき線または条の周囲に前記被めつき線
または条の走行方向に沿つて溶融金属を層流状態
で流す強制循環手段を有し、かつ前記被めつき線
または条を垂直方向に走行させて溶融厚めつきを
行うことを特徴とする溶融めつき装置を提供する
ものである。<Means for Solving the Problems> The present invention provides a wire or strip melt welding device in which a laminar flow of molten metal is applied around the compared wire or strip along the running direction of the covered wire or strip. The object of the present invention is to provide a melt plating apparatus characterized in that it has a forced circulation means for flowing the plating line or strip in a vertical direction and performs melt thick plating by running the line or strip to be plated in a vertical direction.
<発明の構成>
以下に本発明の好適な実施例を示す図面を用い
て発明の構成を詳述する。<Configuration of the Invention> The configuration of the invention will be described in detail below using drawings showing preferred embodiments of the invention.
第2図は従来の溶融めつきラインを示した略図
である。所定の前処理槽3により前処理をした芯
線2は、めつき浴槽に入り表面に溶融金属4のめ
つき層がついた状態でダイス5の孔を通り、上方
に引き上げられ、巻取り機7により巻取られる。
めつき層がほぼ5μm以上の比較的厚い時は、め
つき層が凝固するまでに重力、振動、冷却状態の
不均一等によつて、めつき層が芯線表面で芯線の
長手方向、円周方向へ不均一に流動しやすいた
め、めつき厚の部分変動が発生し、表面状態の平
滑性が失なわれる。特に、第3図に示すように、
ダイス5直下の溶融金属4は、被めつき線2の速
度により対流を生じダイスブレによるめつきムラ
が生じやすい。 FIG. 2 is a schematic diagram showing a conventional melt welding line. The core wire 2 that has been pretreated in a predetermined pretreatment tank 3 enters the plating bath, passes through a hole in a die 5 with a plating layer of molten metal 4 on its surface, is pulled upward, and is pulled up into a winder 7. It is wound up by.
When the plating layer is relatively thick (approximately 5 μm or more), due to factors such as gravity, vibration, and uneven cooling conditions, the plating layer may spread in the longitudinal direction and circumference of the core wire on the core wire surface until the plating layer solidifies. Since it tends to flow non-uniformly in the direction, local variations in plating thickness occur and the smoothness of the surface condition is lost. In particular, as shown in Figure 3,
The molten metal 4 directly below the die 5 generates convection due to the speed of the plated wire 2, which tends to cause uneven plating due to die wobbling.
このような従来法の欠点を改善する、本発明装
置の一構成例を第1図に示す。 FIG. 1 shows an example of the configuration of the apparatus of the present invention, which improves the drawbacks of the conventional method.
本発明の溶融めつき装置12は、めつき厚が
5μm以上の厚めつきを目的とする、芯線2が垂
直方向に走行する縦型溶融めつき装置であつて、
芯線供給口金10と、芯線供給口金10を経て供
給される芯線2を中央部に垂直方向に走行させる
溶融金属流路11と、溶融金属流路11を通過す
ることによつて被めつき金属としての芯線2にめ
つきされた溶融金属のめつき量を制御するダイス
5と、溶融金属4を芯線2の走行方向に沿つて層
流状態で強制循環させる溶融金属循環機9とを有
する。 The melt plating device 12 of the present invention has a plating thickness of
A vertical melt gluing device in which the core wire 2 runs in a vertical direction and is intended for thick plating of 5 μm or more,
A core wire supply cap 10, a molten metal channel 11 that allows the core wire 2 supplied through the core wire supply cap 10 to travel in a vertical direction in the center, and a molten metal channel 11 that allows the core wire 2 to be passed through the molten metal channel 11 to be used as a covered metal. It has a die 5 for controlling the amount of molten metal plated on the core wire 2, and a molten metal circulation machine 9 for forcibly circulating the molten metal 4 in a laminar flow state along the running direction of the core wire 2.
芯線供給口金10は通常のいかなる口金をも用
いることができる。 As the core wire supply cap 10, any conventional cap can be used.
溶融金属流路11は溶融金属4の強制循環手段
としての溶融金属循環機9とともに溶融金属4の
循環閉流路を形成し、溶融金属循環機9によつて
芯線2の周囲を、層流状態にてその走行方向と同
方向に流れるように、溶融金属4を所望の速度で
強制循環させる。芯線2の走行速度と溶融金属4
の相対流速は、溶融金属4が芯線2の周囲にて層
流状態で流れるように溶融金属循環機9によつて
種々選択することができる。とくに、芯線2の走
行速度と溶融金属4の流速を同一とすることが好
ましい。溶融金属流路11は芯線直径の5倍以上
であればできるだけ断面を狭くし、かつ温度制御
を精度よく行なうことにより、肉厚の均一な5μ
m以上の厚めつきを行うことができる。 The molten metal flow path 11 forms a closed circulation path for the molten metal 4 together with a molten metal circulator 9 as a forced circulation means for the molten metal 4, and the molten metal circulator 9 flows around the core wire 2 in a laminar flow state. The molten metal 4 is forced to circulate at a desired speed so that it flows in the same direction as the running direction. Running speed of core wire 2 and molten metal 4
The relative flow velocity of can be selected differently by the molten metal circulator 9 so that the molten metal 4 flows in a laminar manner around the core wire 2. In particular, it is preferable that the running speed of the core wire 2 and the flow speed of the molten metal 4 be the same. The molten metal channel 11 has a uniform wall thickness of 5 μm by making the cross section as narrow as possible if it is at least 5 times the diameter of the core wire and by controlling the temperature accurately.
It is possible to apply a thickness of m or more.
本発明の溶融めつき装置は、上記の構成とする
ことにより、芯線2が接触している溶融金属4の
温度が均一となり、めつき厚みが均一となり、安
定した品質の厚めつきを得ることができる。 By having the above-mentioned configuration of the molten gluing apparatus of the present invention, the temperature of the molten metal 4 with which the core wire 2 is in contact becomes uniform, the plating thickness becomes uniform, and thick plating with stable quality can be obtained. can.
溶融金属循環機9は、前記の溶融金属流路11
と共に溶融金属4を芯線2の周囲にてその走行方
向と同方向に層流状態で流れるように強制循環さ
せることができればよく、通常の高温金属用ポン
プを用いることができる。また図示していないが
連続もしくは一定時間ごとに溶融金属4を供給で
きるようにし、めつきによつて失われる溶融金属
4を補充して、常に一定量の溶融金属が溶融金属
流路11中を流れるようにする。 The molten metal circulation machine 9 has the above-mentioned molten metal flow path 11.
At the same time, it is sufficient that the molten metal 4 can be forcedly circulated around the core wire 2 so as to flow in a laminar flow in the same direction as the running direction of the core wire 2, and a normal pump for high-temperature metals can be used. Although not shown, the molten metal 4 can be supplied continuously or at regular intervals to replenish the molten metal 4 lost due to plating, so that a constant amount of molten metal always flows through the molten metal channel 11. Let it flow.
ダイス5は通常のいかなるダイスを用いてもよ
い。 The dice 5 may be any conventional dice.
被めつき材である芯線2の径や材質、めつき金
属である溶融金属4の種類に対して、溶融金属流
路11の長さ、芯線走行速度、溶融金属設定温度
を最適に選定することによつて厚めつきを行なう
ことができる。めつき条件は熱の受授を考慮して
理論的に算定され、種々の実験によつて実際上の
補正を行つて決定する。 To optimally select the length of the molten metal flow path 11, the core wire running speed, and the molten metal set temperature for the diameter and material of the core wire 2, which is the material to be plated, and the type of the molten metal 4, which is the plated metal. Thick coating can be achieved by The plating conditions are calculated theoretically taking into consideration the transfer of heat, and are determined by making practical corrections through various experiments.
本発明の溶融めつき装置を用いるめつきプロセ
スは、送り出し装置1により送り出された芯線2
が、巻取り機7によつて巻取られ、所望の速度で
垂直方向に走行する。送り出し装置1と巻取り機
7の間に前記処理槽3を経て溶融めつき装置12
を設置し、溶融めつき装置12のダイス5に隣接
して冷却槽6を設置する。 The plating process using the melt gluing device of the present invention is performed by using a core wire 2 fed out by a feeding device 1.
is wound up by the winder 7 and runs vertically at a desired speed. A melting and gluing device 12 is connected between the feeding device 1 and the winding device 7 via the processing tank 3.
A cooling tank 6 is installed adjacent to the die 5 of the melting and gluing device 12.
芯線2は、芯線供給口金10を通り、溶融金属
循環機9により芯線2の走行方向と同方向の層流
状態とされた溶融金属流体内を通り、ダイス5で
所定寸法にしぼられ、ダイス直後にある冷却槽6
により冷却されてめつき線8となる。 The core wire 2 passes through a core wire supply mouthpiece 10, passes through a molten metal fluid that is made into a laminar flow state in the same direction as the running direction of the core wire 2 by a molten metal circulation machine 9, is narrowed to a predetermined size by a die 5, and immediately after passing through the die. Cooling tank 6 in
It is cooled to form a plated wire 8.
<実施例>
直径0.50mmφの軟銅線を240±5℃のSn60%−
Pb40%半田溶融金属浴を用いて溶融めつきを行
なつた。芯線走行速度50cm/sec、溶融金属流速
40cm/secの並流とし、ダイス径0.60mmφを用い
た。<Example> Annealed copper wire with a diameter of 0.50 mmφ was coated with Sn60% at 240±5℃.
Hot-dip plating was performed using a 40% Pb solder melting metal bath. Core wire running speed 50cm/sec, molten metal flow rate
A parallel flow of 40 cm/sec was used, and a die diameter of 0.60 mmφ was used.
得られためつき線は、偏肉のないまた、表面も
平滑なめつき厚0.025mmのものがえられた。 The resulting plating line had no uneven thickness and had a smooth surface with a plating thickness of 0.025 mm.
<発明の効果>
本発明の溶融めつき装置は、厚めつきを目的と
した、被めつき金属線または条を垂直方向に走行
させて溶融めつきを行なう溶融めつき装置であつ
て、溶融金属が線または条の周囲をその走行方向
と同方向に、好ましくは同速度にて流れているの
で、被めつき線に接触している溶融金属の温度は
均一となり、めつき厚が均一となり、品質の安定
した厚めつき線がえられる。<Effects of the Invention> The molten gluing apparatus of the present invention is a molten gluing apparatus that performs molten gluing by running a metal wire or strip to be plated in a vertical direction for the purpose of thick plating. Since the metal flows around the wire or strip in the same direction as the running direction, preferably at the same speed, the temperature of the molten metal in contact with the wire to be plated becomes uniform, and the plating thickness becomes uniform. A thick wire with stable quality can be obtained.
とくに溶融金属が芯線と同じ速度で走行すると
その間芯線周囲の金属が凝固するのが低温の芯線
に熱が吸収され0.030mmの厚めつきが可能となる。
従来法では高温の溶融金属が乱流状態で芯線に接
するため、温度が高くなりめつき厚みは数μが上
限であつた。 In particular, when the molten metal travels at the same speed as the core wire, the metal around the core wire solidifies during that time, and the heat is absorbed by the low-temperature core wire, making it possible to build the material as thick as 0.030 mm.
In the conventional method, the high-temperature molten metal contacts the core wire in a turbulent state, resulting in high temperatures and the upper limit of the plating thickness to be several microns.
また、溶融金属を比較的狭い流路を循環させる
ことで、応答性よく温度制御が可能となり、厚
肉、均一条件を設定しやすい。 In addition, by circulating the molten metal through a relatively narrow flow path, it is possible to control the temperature with good responsiveness, making it easy to set thick walls and uniform conditions.
第1図は、本発明の溶融めつき装置の断面図で
ある。第2図は従来例の溶融めつきラインの断面
図である。第3図は第2図のダイス付近の詳細図
である。
符号の説明、1……送り出し装置、2……芯
線、3……前処理槽、4……溶融金属、5……ダ
イス、6……冷却槽、7……巻取り機、8……め
つき線、9……溶融金属循環機、10……芯線供
給口金、11……溶融金属流路、12……溶融め
つき装置、13……溶融金属の対流(従来例)。
FIG. 1 is a sectional view of the melt-plating apparatus of the present invention. FIG. 2 is a sectional view of a conventional melt-plating line. FIG. 3 is a detailed view of the vicinity of the dice in FIG. 2. Explanation of symbols, 1... Feeding device, 2... Core wire, 3... Pre-treatment tank, 4... Molten metal, 5... Dice, 6... Cooling tank, 7... Winding machine, 8... Me Wire, 9... Molten metal circulation machine, 10... Core wire supply mouthpiece, 11... Molten metal channel, 12... Melt plating device, 13... Molten metal convection (conventional example).
Claims (1)
つき線または条の周囲に前記被めつき線または条
の走行方向に沿つて溶融金属を層流状態で流す強
制循環手段を有し、かつ前記被めつき線または条
を垂直方向に走行させて溶融厚めつきを行なうこ
とを特徴とする溶融めつき装置。1. An apparatus for hot-melting wires or strips, having forced circulation means for flowing molten metal in a laminar flow around the wire or strip to be plated along the running direction of the wire or strip to be plated, and A melt plating device characterized by performing melt thick plating by running a line or strip to be plated in a vertical direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3843985A JPS61199064A (en) | 1985-02-27 | 1985-02-27 | Hot dip coating apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3843985A JPS61199064A (en) | 1985-02-27 | 1985-02-27 | Hot dip coating apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61199064A JPS61199064A (en) | 1986-09-03 |
| JPH0362786B2 true JPH0362786B2 (en) | 1991-09-27 |
Family
ID=12525336
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3843985A Granted JPS61199064A (en) | 1985-02-27 | 1985-02-27 | Hot dip coating apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61199064A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4208578A1 (en) * | 1992-03-13 | 1993-09-16 | Mannesmann Ag | METHOD FOR COATING THE SURFACE OF STRAND-SHAPED GOODS |
| DE4426705C1 (en) * | 1994-07-20 | 1995-09-07 | Mannesmann Ag | Inversion casting installation with a crystalliser |
| CN1050157C (en) * | 1996-05-27 | 2000-03-08 | 宝山钢铁(集团)公司 | Reversal-fixation method for continuous production of composite plate stripe |
| BE1014093A3 (en) * | 2001-04-03 | 2003-04-01 | Ct Rech Metallurgiques Asbl | PROCESS AND DISPSOTIVE FOR COATING A METAL STRIP WITH HARDENING. |
| CN107881451B (en) * | 2017-12-12 | 2019-02-01 | 深圳市溢诚电子科技有限公司 | A tinning equipment |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4842930A (en) * | 1971-10-07 | 1973-06-21 | ||
| JPS5235015B2 (en) * | 1972-12-22 | 1977-09-07 |
-
1985
- 1985-02-27 JP JP3843985A patent/JPS61199064A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61199064A (en) | 1986-09-03 |
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