JPH036288A - Electrodeposited iridium oxide film - Google Patents
Electrodeposited iridium oxide filmInfo
- Publication number
- JPH036288A JPH036288A JP1141032A JP14103289A JPH036288A JP H036288 A JPH036288 A JP H036288A JP 1141032 A JP1141032 A JP 1141032A JP 14103289 A JP14103289 A JP 14103289A JP H036288 A JPH036288 A JP H036288A
- Authority
- JP
- Japan
- Prior art keywords
- film
- solution
- electrodeposition
- mol
- iridium oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野〕
本発明はイリジウム酸化物膜に係り,とくに平滑性にす
ぐれ,エレクトロクロミック素子の表示極として用いて
好適な上記酸化物の電析膜に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an iridium oxide film, and particularly to an electrodeposited film of the above oxide which has excellent smoothness and is suitable for use as a display electrode of an electrochromic device.
従来のイリジウム酸化物膜形成用電析液は特願昭61−
173653号に記載されるように,四塩化イリジウム
(IrCQ4)の5g/12坪1.5X 1 0−”m
ofi / Qと蓚酸( (COOH)、)の5 g/
n 44 X 1 0−”moM / Qを含む溶液
を調製し、さらに炭酸ナトリウム(NazC○,)を加
えてpH10のアルカリ性としたものであった。The conventional electrodeposition solution for forming an iridium oxide film was disclosed in a patent application filed in 1986.
As described in No. 173653, 5g/12 tsubo 1.5X 10-"m of iridium tetrachloride (IrCQ4)
ofi/Q and oxalic acid ((COOH), ) 5 g/
A solution containing n 44 X 1 0-''moM/Q was prepared and made alkaline to pH 10 by adding sodium carbonate (NazC○,).
このような組成の電析液は調製後,時間の経過とともに
徐々に沈澱(IrOオ・nH,O)を生じる.このため
電析液組成が変化し、得られる電析膜の膜質の再現性が
乏しいという欠点があった。After preparation, an electrodeposition solution with such a composition gradually forms a precipitate (IrO, nH, O) over time. As a result, the composition of the electrodeposited solution changes, resulting in poor reproducibility of the quality of the resulting electrodeposited film.
また、得られた電析膜の表面は平滑でなく荒れており、
基板との密着性が弱い。このため、とくに厚膜化して発
色濃度の高いものを得ることは剥離しやすく、困難であ
った。In addition, the surface of the obtained electrodeposited film was not smooth but rough;
Weak adhesion to the substrate. For this reason, it has been difficult to obtain a particularly thick film with high coloring density because it tends to peel off easily.
本発明の目的は、これらの欠点のないイリジウム酸化物
電析膜を得ることにある。An object of the present invention is to obtain an iridium oxide electrodeposited film free of these drawbacks.
上記目的は電析液組成としてのイリジウム塩(IrCQ
、、Ir(SO2)、、Na2IrCI2.等)および
錯化剤(たとえば(COOH)、)の濃度範囲、さらに
雰囲気および温度の選定によって達成される。The above purpose is to use iridium salt (IrCQ) as an electrodepositing solution composition.
, , Ir(SO2), , Na2IrCI2. etc.) and the complexing agent (eg (COOH), ), as well as the selection of the atmosphere and temperature.
イリジウム酸化物薄膜形成用の電析液は本発明者の先願
発明、特願昭61−173653号において開示したも
のの他に例がなく、独特である。The electrodepositing solution for forming an iridium oxide thin film is unique in that there is no example other than that disclosed in the inventor's earlier invention, Japanese Patent Application No. 173653/1983.
これはイリジウム塩、(COOH)、、Na、Go。This is an iridium salt, (COOH), Na, Go.
で構成されている。この構成において、イリジウム塩の
濃度と錯化剤(COOH)zの濃度は電析効率(電析電
流密度に対する電析量)に、また(COOH)2は電析
膜の表面状態に影響することが検討の結果明らかになっ
た。これは第1表に示す通りである。It consists of In this configuration, the concentration of the iridium salt and the concentration of the complexing agent (COOH) z affect the electrodeposition efficiency (deposition amount relative to the deposition current density), and (COOH)2 affects the surface state of the deposited film. was revealed as a result of the study. This is shown in Table 1.
第1表は電析液の組成と電析効率(電流密度に対する電
析量:表では電流密度と電析量とに分けて記載)および
膜の表面状態の関係を表わしている。Table 1 shows the relationship between the composition of the electrodepositing solution, the deposition efficiency (the amount of electrodeposition versus the current density: the current density and the amount of electrodeposition are listed separately in the table), and the surface condition of the film.
ここで、電析液中の(の濃度が
40 X I 0−3rnoQ / Qの場合と、零の
場合とを比較すると、同じ電析量を得るのに(COOH
Lによって電析効率が高くなることがわかる。しかし、
(COOH)、の存在は膜表面を荒らし、し7かも膜を
基板から剥離しやすくさせるという作用もあるこの現象
は(COOH)2.11度が8、OX 10″″3mo
l/lと、比較的低い濃度でも現われていることがわか
る。また(COOH)。Here, when comparing the case where the concentration of (in the electrodepositing solution is 40 ×
It can be seen that the electrodeposition efficiency increases with L. but,
The presence of (COOH) roughens the film surface and also has the effect of making the film easier to peel off from the substrate.This phenomenon is caused by the fact that (COOH)2.11 degrees
It can be seen that it appears even at a relatively low concentration of l/l. Also (COOH).
の存在下ではイリジウム塩の濃度が低いほど電析効率が
高くなることがわかる。It can be seen that in the presence of , the lower the concentration of iridium salt, the higher the electrodeposition efficiency.
これらのことから(COOH)’、は電析膜の平滑性を
失なわない程度の低い濃度で、しかも電析効率も高める
という最適濃度とし、またイリジウム塩は電析効率の点
から低濃度とする
(1.5X10″″”m、oQ/Qの高濃度で調製した
液からは沈澱を生ずるので低濃度化は好ましい)ことで
、高電析効率を有し、しかもすぐれた平滑性をもつ膜を
形成しうる、沈澱生成などのない安定した、経時変化の
ない電析液かえられた。すなわち、イリジウム塩は、沈
澱生成および電析効率の点から6.0X10−’moQ
/Q以下、錯化剤(COOH)、は電析膜の平滑性をそ
こなわないで電析効率を高める点から、8.0X10−
″3mol/l以下の濃度である。For these reasons, (COOH)' was selected to have an optimal concentration that was low enough not to lose the smoothness of the deposited film, but also to increase the electrodeposition efficiency, and for iridium salt, a low concentration was selected from the viewpoint of electrodeposition efficiency. (A solution prepared at a high concentration of 1.5 x 10'''' m, oQ/Q will produce a precipitate, so lowering the concentration is preferable.) It has high electrodeposition efficiency and excellent smoothness. The electrodeposition solution was changed to a stable electrodeposition solution that can form a film, does not generate precipitates, and does not change over time.In other words, the iridium salt is 6.0×10-'moQ from the viewpoint of precipitate formation and electrodeposition efficiency.
/Q and below, the complexing agent (COOH) is 8.0X10-
``The concentration is 3 mol/l or less.
また、第1表に示されている結果はすべて電析液を窒素
雰囲気下(液中にも窒素を吹込む)で行なったものであ
る。窒素雰囲気下で行なった方が電析の効率は著しく改
善され、約2倍高く、また電析膜の平滑性も良好である
。Furthermore, all the results shown in Table 1 were performed using the electrodeposition solution under a nitrogen atmosphere (nitrogen was also blown into the solution). The efficiency of electrodeposition is significantly improved when carried out under a nitrogen atmosphere, being about twice as high, and the smoothness of the deposited film is also good.
また、電析温度の電析効率に対する影響も顕著であり、
低温になるほど効率は高くな−y、15℃以下において
好結果を得る。表の結果はすべて10℃で行ったもので
ある。In addition, the influence of the electrodeposition temperature on the electrodeposition efficiency is significant.
The efficiency increases as the temperature decreases, and good results are obtained at temperatures below 15°C. All results in the table were performed at 10°C.
以下、本発明の内容を具体的実施例でより詳細に説明す
る。Hereinafter, the content of the present invention will be explained in more detail with reference to specific examples.
実施例1゜
6.0X10−”moQ/Qの工rCQ4を含む溶液を
100m QrlA製した。この溶液に炭酸カリウム(
K 2 G O? )を加えてpHを10とした。この
溶液をシート抵抗が10Ω/am”の、酸化インジウム
を主成分とする透明導電膜でコートしたガラス基板(以
下ITO基板と記す)を陽極、金線を陰極とし、電析電
流密度を400μA/cm2、温度10’Cで、窒素を
流入しながら30分間電析した。Example 1 A 100 m QrlA solution containing 6.0 x 10-"moQ/Q of engineered rCQ4 was prepared. Potassium carbonate (
K2GO? ) was added to adjust the pH to 10. This solution was applied to a glass substrate (hereinafter referred to as an ITO substrate) coated with a transparent conductive film mainly composed of indium oxide with a sheet resistance of 10 Ω/am” as an anode and a gold wire as a cathode, and the electrodeposition current density was set to 400 μA/am. cm2 and a temperature of 10'C for 30 minutes while flowing nitrogen.
その結果陽極の透明導電膜上にブルーブラックの被膜が
電着した。この膜は平滑で鏡面であった。As a result, a blue-black film was electrodeposited on the transparent conductive film of the anode. This film was smooth and mirror-like.
実施例2゜
3、OXlo−3moQ/nのIrCl24を含む溶液
を100m12調製した。以下実施例1と同様な操作で
同様の平滑で鏡面をもつブルーブラックの電析膜を得た
。Example 2 100ml of a solution containing IrCl24 of OXlo-3moQ/n was prepared. Thereafter, the same procedure as in Example 1 was carried out to obtain a blue-black electrodeposited film having a smooth mirror surface.
実施例3゜
6、OX 10−’mof2 / Qの工rCQ4と4
.0×10′″3mol/lの蓚酸を含む溶液を100
mQ調製した。この溶液に炭酸カリウムを加えてP H
を10とした。この溶液をシート抵抗が10Ω/cm”
のITO基板を陽極、金線を陰極とし、電析電流密度2
0011 A/cm”、液温10℃で窒素を流入しなが
ら30分間電析した。その結果陽極の透明導電膜上にブ
ルーブラックの被膜が電着した。この膜は平滑で鏡面で
あった。Example 3゜6, OX 10-'mof2/Q's CQ4 and 4
.. A solution containing 0×10′″3 mol/l of oxalic acid was added to 100
mQ was prepared. Add potassium carbonate to this solution and P H
was set as 10. This solution has a sheet resistance of 10Ω/cm”
The ITO substrate was used as an anode, the gold wire was used as a cathode, and the deposition current density was 2.
Electrodeposition was carried out for 30 minutes while flowing nitrogen at a temperature of 10° C. and a liquid temperature of 10° C. As a result, a blue-black film was electrodeposited on the transparent conductive film of the anode. This film was smooth and had a mirror surface.
実施例4゜
4.5 X 10−3rnoQ / QのIrCQ、と
4.0X10””man/Qの蓚酸を含む溶液を100
mQ調製した。以下実施例3と同様な操作でp I(%
調製、同様の電極を用い、電流密度230μA/c+a
”、液温10℃で窒素を流入しながら電枦した。その結
果陽極の透明導電膜上にブルーブラックの被膜が電着し
た。この膜は平滑で鏡面であった。Example 4 A solution containing 4.5 x 10-3rnoQ/Q of IrCQ and 4.0 x 10''man/Q of oxalic acid was
mQ was prepared. Hereinafter, in the same manner as in Example 3, p I (%
Preparation, using similar electrodes, current density 230 μA/c+a
"Electrification was carried out at a liquid temperature of 10° C. while nitrogen was flowing in. As a result, a blue-black film was electrodeposited on the transparent conductive film of the anode. This film was smooth and had a mirror surface.
C発明の効果〕
以上に述べたように1本発明のイリジウム酸化物膜形成
用電析液を用いることによって平滑性にすぐれた鏡面を
有する膜を比較的簡便に生成しつるので、イリジウム酸
化物膜を用いた製品の高品位化、低価格化に効果がある
。C Effects of the Invention] As described above, by using the electrodeposition solution for forming an iridium oxide film of the present invention, a film having a mirror surface with excellent smoothness can be produced relatively easily. It is effective in improving the quality and lowering the cost of products using membranes.
651651
Claims (5)
下のイリジウム化合物を含むアルカリ性の溶液から電析
させたことを特徴とするイリジウム酸化物電析膜。1. An iridium oxide electrodeposited film, characterized in that it is deposited from an alkaline solution containing an iridium compound of 6×10^-^3 mol/l or less per iridium atom.
0^−^3mol/l以下のイリジウム化合物を含むア
ルカリ性の溶液において、さらに錯化剤を加えた溶液か
ら電析させたことを特徴とするイリジウム酸化物電析膜
。2. 6×1 per iridium atom according to claim 1 above.
An iridium oxide electrodeposited film, characterized in that it is deposited from an alkaline solution containing an iridium compound of 0^-^3 mol/l or less, to which a complexing agent is further added.
下の蓚酸であることを特徴とする上記請求項第2項記載
のイリジウム酸化物電析膜。3. 3. The iridium oxide electrodeposited film according to claim 2, wherein the complexing agent is oxalic acid of 8x10^-^3 mol/l or less.
る上記請求項第1、第2、第3項記載のイリジウム酸化
物電析膜。4. 4. The iridium oxide electrodeposited film according to claim 1, wherein the iridium oxide film is deposited from a solution into which nitrogen is introduced.
請求項第1項乃至第4項記載のイリジウム酸化物電析膜
。5. The iridium oxide electrodeposited film according to any one of claims 1 to 4, which is deposited from a solution at a temperature of 5.15° or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1141032A JPH036288A (en) | 1989-06-05 | 1989-06-05 | Electrodeposited iridium oxide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1141032A JPH036288A (en) | 1989-06-05 | 1989-06-05 | Electrodeposited iridium oxide film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH036288A true JPH036288A (en) | 1991-01-11 |
Family
ID=15282635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1141032A Pending JPH036288A (en) | 1989-06-05 | 1989-06-05 | Electrodeposited iridium oxide film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH036288A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0627983U (en) * | 1992-09-08 | 1994-04-15 | 文健 江口 | Volume |
| JP2007222873A (en) * | 2007-06-04 | 2007-09-06 | Ohbayashi Corp | Method and apparatus for separating and removing harmful substances |
-
1989
- 1989-06-05 JP JP1141032A patent/JPH036288A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0627983U (en) * | 1992-09-08 | 1994-04-15 | 文健 江口 | Volume |
| JP2007222873A (en) * | 2007-06-04 | 2007-09-06 | Ohbayashi Corp | Method and apparatus for separating and removing harmful substances |
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