JPH036489A - Fine adjustment device - Google Patents

Abstract

PURPOSE:To make possible fine adjustment of high controllability by having a rotation supporting point at a first stage and making a mechanism abutting on a movement edge part of a micrometer fixed on the first stage on a lever abutting a part thereof at a second stage. CONSTITUTION:The fine adjustment device consists of an X stage 30 movable in the movement direction of an edge part 27a of a micrometer 21 and a first lever 28 having a shaft 29b on a coarse stage 20 to the stage 20 on which the micrometer 21 is fixed. And when the micrometer 21 is rotated, the edge part 27a is allowed to move by a quantity of movement (p) alone in the X direction in accordance therewith, for the reason, the lever 28 is allowed to rotate around the shaft 29b and an X stage movement pin 29a fixed in a slot 28a is a allowed to move by about pXl2/l1 alone in the X direction. Since a part of the side face of the pin 29a is allowed to abut on the side face 30a of a block fixed on the stage 30, the stage 30 is allowed to move by about pXl2/l1 alone in the X direction. However, a second lever 38 provided between the X and Y stages 30, 40 also have the same function. Fine adjustment is made possible by the reduction and extension of such a movement quantity.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a fine movement device, and more particularly to a fine movement device capable of coarse movement and fine movement.

[Conventional technology]

When testing the electrical characteristics of semiconductor elements, semiconductor integrated circuits, etc. formed on a semiconductor wafer, a micromanipulator (hereinafter simply referred to as a manipulator) is used to bring a probe into contact with a minute area on the semiconductor wafer.

In order to precisely move this probe,
A fine movement device using a micrometer is mounted on the device body (probe, etc.), the probe is fixed to this fine movement device,
The probe is making slight movements.

In conventional fine movement devices, a cross guide is generally used, and the moving tip of the micrometer is brought into direct contact with a moving table to move the fine movement table at an operating ratio of 1:1.

[Problem to be solved by the invention]

In recent years, as semiconductor integrated circuits have become more highly integrated, the size of semiconductor chips has also become larger.

Therefore, it has become necessary to move and adjust the probe of the manipulator over a wide range.

However, in the conventional fine movement device, the movable table can only be moved 1:1 with respect to the movement of the micrometer, so the movement range of the probe fixed to the movable table is limited. Therefore, it has become difficult to test the electrical characteristics of integrated circuits and the like on a semiconductor wafer at once without moving the semiconductor wafer. Furthermore, if a micrometer with a long stroke is used to widen the movement range, the size of the fine movement device will become too large. Therefore, operability may deteriorate.

SUMMARY OF THE INVENTION Therefore, an object of the present invention is to solve the above problems and provide a small fine movement device that is movable over a wide range and has high operability.

[Means to solve the problem]

The fine movement device of the present invention has a first part to which a micrometer is fixed.
a stage; a second stage movable in the direction of movement of the moving tip of the micrometer relative to the first stage;
The present invention is characterized in that the first stage has a rotational fulcrum, and a lever mechanism is provided, the movable tip of the micrometer is in contact with a part thereof, and the other part is in contact with the second stage.

[Effect]

In the fine movement device of the present invention, configured as described above, the moving tip of the micrometer fixed to the first stage pushes a certain portion of the lever mechanism in accordance with the operation of the micrometer. As this portion moves, the lever mechanism rotates about the rotational fulcrum. This rotation causes the second lever mechanism to come into contact with another part of the lever mechanism.
The stage moves by an amount corresponding to the ratio of the distance between one part of the lever mechanism and the other part from the rotational fulcrum.

〔Example〕

Embodiments according to the present invention will be described below with reference to the drawings.

Elements with the same reference numerals have the same functions, so duplicate explanations will be omitted.

FIG. 1 shows an external perspective view of a fine movement device according to an embodiment of the present invention.

As shown in FIG. 1, the fine movement device 1 includes a fixing base 10 fixed to a main body 2 of the device such as a prober (part of which is shown by a dashed line). A coarse movement stage 20 is mounted on the fixed base 10 and slides relatively in the X direction and in the rotational direction on the XY plane in FIG. Furthermore, this fine movement device 1 further includes an X stage 30 that is relatively movable in the X direction on the coarse movement stage 20, a Y stage 40 that is relatively movable in the Y direction on this X stage 30, and furthermore, this Y stage 40. An X stage 50 that is relatively movable in the Z direction above
It is equipped with A probe fixing arm 60 is fixed to the second stage 50. Further, the X stage 30 can be finely moved in the X direction with respect to the coarse movement stage 20 by moving the micrometer 21 (movement accuracy of 1/100 mm) fixed on the coarse movement stage 20.

Further, the Y stage 40 and the X stage 50 can also be moved slightly by micrometers 31 and 41 fixed to the X stage 30 and Y stage 40, respectively.

FIG. 2 shows the detailed structure of the fine movement device according to the above embodiment.

The detailed structure of this embodiment will be explained using FIG. 2.

FIG. 2(a) is a view from the rear of the fine movement device, that is, the rear surface of the probe fixing arm 60, FIG. 2(b) is a view of the fine movement device as seen from the side, and FIG. 2(c) is a view of the fine movement device as seen from the rear side. shows the state viewed from above.

First, the fixing table 10 is provided on the main body 2 of the apparatus shown by the two-dot chain line in FIG.
It is fixed at a. This fixation is carried out by inserting the fixing guide pin 15a in the shape of an inverted truncated cone provided on the fixing base 10 and the fixing guide portion 2a using the rod 11 for pressing.

A coarse movement stage 20 is mounted on the fixed table 10, and the coarse movement stage 20
In FIGS. 1 and 2, it is movable in the X direction and rotational direction. A sliding groove 22a extending in the X direction is provided in the coarse movement stage 20, and the cross-sectional shape of the sliding groove 22a is an internally enlarged shape as shown in FIG. 2(a). is getting wider. Such a sliding groove 22
a consists of two members 22 and 23 as shown in FIG. 2(a).
Generally, they are formed in combination, but they may also be formed in the coarse movement stage 20 at once by machining.

On the other hand, a through hole 15 is formed approximately in the center of the fixed base 10, and the foot portion 1.2 a of the sliding member 12 is inserted into the through hole 15.
is inserted. The head 12b of the sliding part shrine 12 has the shape of a rotating body. The sliding groove 22a and the sliding member 12 are slidably engaged with each other.

The state of engagement between the fixed base 10 and the coarse movement stage 20 is shown in the third figure. As shown in FIG. 3, the coarse movement stage 20 is not only slidable in the X direction with respect to the fixed base 10, but also slidable in the rotational direction R. Such sliding occurs between the lower surface 12C of the head 12b of the sliding member 12 and the sliding groove 2.
Since this is performed between the lower surface 22b of the lower surface 2a, it is necessary to grind these surfaces 12c and 22b with high precision in order to perform this sliding smoothly.

In the above embodiment, sliding in the linear direction and sliding in the rotational direction are performed by one mechanism, but two different mechanisms may be used for each.

Next, a mechanism for fixing the fixed stage 10 and the coarse movement stage 20 will be explained using FIG. 4.

FIGS. 4(a) and 4(b) show cross sections of the fixing mechanism, and as shown in these figures, the sliding member 12 is slidable in the Z direction within the through hole 15 provided in the fixing base 10. , its head 12
The part on the opposite side from b penetrates the lower side of the fixing base 10. A cam 14, a wave washer 14e, a washer 14a, and a disc spring 14b are inserted into the penetrating portion 1.2d. A screw hole 12f is formed in the end surface of this penetrating portion 12d, and a bolt 12 is inserted into this screw hole 12f.
The bolt 12e holds the cam 4, the wave washer 14e, the washer 14a, and the disc spring 1.4b in the penetrating portion 12d.

- A cam pin 16 is fixed to the blade fixing base 10.

FIG. 4(c) shows the structure of the cam 14. As shown in the figure, the inner surface of the cam 14 is provided with an inclined groove 16a on its outer periphery. This inclined groove 16a is inclined over a rotational angle of about 60 degrees of the cam. The cam pin 16 slides within this inclined groove 16a. A rotating arm 13 for rotating the cam 14 is fixed to the outer circumference of the cam 14.

First, when the fixed base 10 and the coarse movement stage 20 are in a relatively slidable state, the state shown in FIG. ) of P
It is located at In this state, the cam pin 16 is connected to the cam 14.
The cam 14 does not come into contact with the sliding surface of the inclined groove 16a and is in a floating state, and does not push the cam 14 downward in the Z direction.

As a result, the upper surface of the cam 14 is attached to the surface of the fixed base 10 by the disc spring 1.
, 4 a and a wave washer], 4 e. In this state, the head 12 of the sliding member 12
The lower surface of b is pressed against the sliding groove 22a with a desired pressing force, and the sliding member 12 is adjusted so that it can move smoothly within the sliding groove 22a.

This adjustment is performed using the bolt 12e. In this state, the coarse movement stage 20 can smoothly move relative to the fixed base 10. The reason why the wave washer 14e is used here is to enable delicate adjustment of the desired pressing force.

Next, the fixed state of the fixed base 10 and the coarse movement stage 20 is adjusted to the fourth position.
This will be explained using FIG. 4(b) and FIG. 4(c). Fixed stand 1
0 and the coarse movement stage 20, the rotary arm 13 is also rotated about 60 degrees. This rotation causes the cam pin 16 to move from position P to position S in FIG. 4(C). In this state, the cam 14 is forcibly pushed downward in the Z direction by Δd by the cam pin 16, as shown in FIG. 4(b). This forced downward movement of the cam 14 compresses the disc spring 14a, and its repulsive force pushes the sliding member 12 downward.

By this pushing down, the lower surface 12c of the head of the sliding member 12], 2b is pressed against the upper surface 22b of the sliding groove 22a in the coarse movement stage 2o, and the fixed base 10 and the coarse movement stage 20 are
and fix it.

Note that the amount of rotation of the rotary arm 13 is limited by the cam pin 16 and the area where the inclined groove 16a on the cam 14 is formed.

Further, in the fine movement device 1 of the above embodiment, an X stage 30 that can be finely moved in the X direction is mounted on the coarse movement stage 20, and a cross guide 24 is provided between the X stage 30 and the coarse movement stage 20. ing. And this cross guide 2
One side 24a of 4 is fixed to the coarse movement stage 20, and the other side 24b is fixed to the X stage 30, and a bearing, etc., for example, is inserted between them in order to slide easily and accurately.

A fixed arm 27 is fixed to the coarse movement stage 20, and a micrometer 21 is fixed to this fixed arm 27. By moving this micrometer 21, the X stage 30 can be finely moved relative to the coarse movement stage 20. A second lever 28 is provided on the side surface of the coarse movement stage 20 so as to be rotatable about a lever 29b. One side of the free end of this lever 28 is in contact with the moving tip 27a of the micrometer 21. This louver 28 is provided with an elongated hole 28a extending in the radial direction in the middle thereof, and an X-stage moving pin 29a is fixed in the elongated hole 28a. This X
A portion of the stage moving pin 29a, that is, a portion extending from the first lever in a direction perpendicular to the rotational direction, is in contact with a side surface 30a of a block fixed to a side surface of the X stage 30.

The X stage 30 is engaged with the coarse movement stage 20 via a spring spring 26, one end of which is fixed to a protrusion provided on the coarse movement stage 20, and the other end is fixed to the X stage. ing. These protrusions can be easily formed by fixing bolts on the coarse movement stage 20 and the X stage 30. This spring 26 allows the coarse movement stage 20 and the X stage 30 to
They are always relatively biased in a certain direction along the direction. Therefore, the tip 27a of the micrometer 21 is kept pressed against the side surface of the louver 28. Further, the side surface of the X-stage moving pin 29a is always pressed against a part of the X-stage 30.

With this configuration, the X stage 30 can be moved in accordance with the amount of movement of the tip portion 27a of the micrometer 21.

Next, the mechanism of the above configuration will be explained in detail using FIG. 5. Note that in FIG. 5, elements given the same reference numbers as in FIGS. 1 and 2 indicate the same elements.

In FIG. 5, by rotating the operating portion of the micrometer 21, the tip portion 27a moves in the X direction by a movement ff1p corresponding to the amount of rotation. And this tip 2
7a is in contact with the side surface of the louver 28, so the louver 28 rotates around the axis 29b 2 . Therefore, the X stage moving pin 29a fixed in the elongated hole 28a of the second lever 28 is
Move it by XΩ2/Ωl in the X direction. A part of the side surface of this X-stage moving pin 29a is in contact with a side surface 30a of the pro- tsuku fixed on the X-stage 30, and as a result, this X-stage moving pin 29a is
0 is moved in the X direction by an amount of approximately pXρ2/Ωl. That is, by operating the micrometer 21,
The X stage 30 is moved by an amount obtained by reducing the amount of movement of the tip 27a of the micrometer 21 by a predetermined ratio (approximately β2/β1).
can be moved relative to the coarse movement stage 20.

In the above embodiment, an example was explained in which the amount of movement is reduced.
and the contact position of the X stage moving pin 2 of the louver 28.
By reversing the contact position of the micrometer 9a to the X stage 30, the X stage 30 can be moved by increasing the amount of movement of the tip 27a of the micrometer 21. Also,
By moving the position of the X stage moving pin 39a within the radial direction A, it is also possible to easily change the magnification, etc.

For example, when Ω1 = 4mm SR2 = 1.3mm,
The magnification is about 0.3, and ρI=15mmg2=13
If mm, the magnification is approximately 1.1, and the magnification can be changed over a range of approximately 3.7 times. In this way, the amount of movement of the tip of the micrometer is enlarged or reduced by a predetermined magnification, and the X stage or the like can be moved slightly.

In the above embodiment, as shown in FIGS. 1 and 2, a Y stage 40 that can be moved slightly in the Y direction is further provided on the X stage 30. This Y stage 40 and X stage 30
The relationship between them is the same as the relationship between the X stage 30 and the coarse movement stage 20 described above. That is, X stage 3
0, a micrometer 31 is fixed, and the tip 37a of this micrometer 31 is in contact with the side surface of a second lever 38 whose rotation center is on the Y stage 40. At a predetermined position in the middle of this second lever 38, a Y
A stage moving pin 39a is fixed, and the side surface of this Y stage moving pin 39a is in contact with a block 40a fixed on the Y stage 40. And Y stage 40
A cross guide 34 is provided between the X stage 30 and the X stage 30 to allow relatively smooth movement.

Further, the Y stage 40 and the X stage 30 are connected to each other via a spring 36, and the Y stage 40 is always urged in the direction along the Y direction with respect to the X stage 30. Therefore, the tip 37a of the micrometer 31 is always pressed against the side surface of the second lever 38.

Further, the side surface of the Y-stage moving pin 39a is always kept pressed against a portion of the Y-stage 40. With this configuration, the Y stage 40 can be moved in accordance with the amount of movement of the tip portion 37a of the micrometer 31.

Here, the expansion/reduction of the amount of movement of the tip portion 37a of the micrometer 31 is the same as in the case of the X stage 30 described above, so a detailed explanation will be omitted.

5 6 Further, a Z stage 50 is provided above the Y stage 40 and is movable slightly in the Z direction with respect to the Y stage 40 .

This Z stage 50 comes into contact with the tip 47a of the micrometer 41 fixed on the Y stage 40, and moves in the Z direction in accordance with the movement of the movable tip 47a. This Z stage 50 is engaged with the Y stage 40 via a spring 56, and due to the action of this spring 56, the side surface 50a of the Z stage 50 is
It is pressed against the tip 47a of the. With this configuration, the Z stage 50 moves in the Z direction by the same amount as the amount of movement of the tip 47a of the micrometer 41.

The present invention is not limited to the above embodiments, and various modifications may be made.

Specifically, in the above embodiment, only the X stage is configured to be able to make coarse and fine movements, but the Y stage and Z stage are each provided with a coarse movement stage so that they can also make coarse and fine movements. It's okay.

Further, in the above embodiment, a mechanism for reducing and enlarging the amount of movement using a lever is provided for fine adjustment of the X stage and the Y stage, but a similar mechanism for reducing the amount of movement may be provided for the two stages as well. Furthermore, in the above embodiment, both the X stage and the Y stage are provided with mechanisms for reducing and enlarging the amount of movement.
A movement amount reduction mechanism may be provided only on either one, or a movement amount reduction/enlargement mechanism may not be provided as in the Z stage.

〔Effect of the invention〕

As described above, in the fine adjustment device of the present invention, since the amount of movement of the micrometer is reduced or expanded and transmitted to the movement stage, fine adjustment can be made accurately or over a wide range. As a result, by applying such a fine movement device to a measuring device, for example, a micromanipulator of a prober for testing semiconductor devices, accurate positioning or expansion of the measurement range becomes possible. Further, by using such a fine movement device, a device with a high degree of integration and a large chip size, such as IM and 4M.

The workability of measuring companion conductor memory such as 16M is outstanding 7 8 Improve yourself.

[Brief explanation of drawings]

1 is an external perspective view of an embodiment of the fine movement device according to the present invention, FIG. 2 is a rear, side and top view of the fine movement device shown in FIG. 1, and FIG. 3 is a view of the fine movement device shown in FIG. 1. 4 is a diagram explaining the movement of the coarse movement stage of the fine movement device shown in FIG. 1, and FIG. It is a figure explaining the fine movement mechanism which makes it. 1... Fine movement device, 2... Micromanipulator, 1
0...Fixed base, 20...Coarse movement stage, 30...
X stage, 40...Y stage, 50...2 stage, 21.31.41...micrometer.

Claims (1)

[Scope of Claims] 1. A first stage to which a micrometer is fixed; a second stage movable in the direction of movement of the moving tip of the micrometer with respect to the first stage; and a rotatable stage for the first stage. A fine movement device comprising: a lever mechanism having a fulcrum, a portion of which is in contact with a moving tip of a differential micrometer, and another portion of which is in contact with the second stage. 2. A variable ratio mechanism is provided that can change the ratio of the distance between a part of the lever mechanism and the rotation support and the distance between the other part of the lever mechanism and the rotation support. Micromotion device as described.