JPH0366145U - - Google Patents
Info
- Publication number
- JPH0366145U JPH0366145U JP12729289U JP12729289U JPH0366145U JP H0366145 U JPH0366145 U JP H0366145U JP 12729289 U JP12729289 U JP 12729289U JP 12729289 U JP12729289 U JP 12729289U JP H0366145 U JPH0366145 U JP H0366145U
- Authority
- JP
- Japan
- Prior art keywords
- pair
- flat plate
- plate electrodes
- inductively coupled
- coupled plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009616 inductively coupled plasma Methods 0.000 claims description 4
- 238000001514 detection method Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
Description
第１図は本考案実施例の要部裁断構成斜視図、
第２図は高周波誘導結合プラズマ質量分析計の全
体的な構成説明図、第３図は従来例の要部構成説
明図である。
１……プラズマトーチ、３……アルゴンガス供
給源、７……高周波誘導結合プラズマ、８……ノ
ズル、９……スキマー、１６……マスフイルタ、
１９……二次電子増倍管、２０……信号処理部、
２１，２２……アパーチヤープレート、２３ａ〜
２３ｈ……四極子レンズ電極、２４ａ〜２４ｄ…
…平板電極、２５ａ〜２５ｃ……可変電圧電源。
FIG. 1 is a perspective view of the main part of the embodiment of the present invention;
FIG. 2 is an explanatory diagram of the overall configuration of a high-frequency inductively coupled plasma mass spectrometer, and FIG. 3 is an explanatory diagram of the main part configuration of a conventional example. 1... Plasma torch, 3... Argon gas supply source, 7... High frequency inductively coupled plasma, 8... Nozzle, 9... Skimmer, 16... Mass filter,
19...Secondary electron multiplier, 20...Signal processing section,
21, 22...Aperture plate, 23a~
23h... Quadrupole lens electrode, 24a to 24d...
...Plant electrode, 25a to 25c...Variable voltage power supply.
Claims (1)
せ生じたイオンをノズルとスキマーからなるイン
ターフエイスを介して質量分析計検出器に導いて
検出することにより前記試料中の被測定元素を分
析する分析計において、開口部を有する一対のア
パーチヤープレートで偏向レンズを挟むと共に、
これら一対のアパーチヤーレンズと偏向レンズの
平均電位を可変にすると共に、平行に向い合せた
一対の平板電極を２組並べ、一組目の平板電極と
２組目の平板電極に平均電位を中心にして対称的
に電圧を印加することを特徴とする高周波誘導結
合プラズマ質量分析計。 In an analyzer that analyzes an element to be measured in a sample by exciting the sample using high-frequency inductively coupled plasma and guiding the generated ions to a mass spectrometer detector through an interface consisting of a nozzle and a skimmer for detection. , sandwiching the deflection lens between a pair of aperture plates having openings, and
In addition to making the average potential of the pair of aperture lenses and deflection lenses variable, two pairs of flat plate electrodes facing each other in parallel are arranged, and the average potential is centered between the first pair of flat plate electrodes and the second pair of flat plate electrodes. A high-frequency inductively coupled plasma mass spectrometer that applies voltage symmetrically.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989127292U JPH0541496Y2 (en) | 1989-10-31 | 1989-10-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989127292U JPH0541496Y2 (en) | 1989-10-31 | 1989-10-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0366145U true JPH0366145U (en) | 1991-06-27 |
| JPH0541496Y2 JPH0541496Y2 (en) | 1993-10-20 |
Family
ID=31675053
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989127292U Expired - Lifetime JPH0541496Y2 (en) | 1989-10-31 | 1989-10-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0541496Y2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01252772A (en) * | 1988-03-31 | 1989-10-09 | Ulvac Corp | Ion implantation equipment |
-
1989
- 1989-10-31 JP JP1989127292U patent/JPH0541496Y2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01252772A (en) * | 1988-03-31 | 1989-10-09 | Ulvac Corp | Ion implantation equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0541496Y2 (en) | 1993-10-20 |
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