JPH0366395B2 - - Google Patents
Info
- Publication number
- JPH0366395B2 JPH0366395B2 JP63117025A JP11702588A JPH0366395B2 JP H0366395 B2 JPH0366395 B2 JP H0366395B2 JP 63117025 A JP63117025 A JP 63117025A JP 11702588 A JP11702588 A JP 11702588A JP H0366395 B2 JPH0366395 B2 JP H0366395B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- shadow mask
- ferric chloride
- chloride solution
- beam passage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/28—Acidic compositions for etching iron group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明はシヤドウマスクの製造方法に係り、特
に鉄及びニツケルを主成分とする例えばアンバー
からなるシヤドウマスク素材に塩化第２鉄溶液を
スプレイ法により吹きつけ微細精密な電子ビーム
通過孔部を穿設するシヤドウマスクの製造方法に
関するものである。[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to a method for manufacturing a shadow mask, in particular a method of spraying a ferric chloride solution onto a shadow mask material made of amber, for example, whose main components are iron and nickel. The present invention relates to a method of manufacturing a shadow mask in which fine and precise electron beam passage holes are formed.
例えばカラー受像管に内装するシヤドウマスク
としては一般に純鉄軟鋼板が多く使用されている
が、高精密、高精細度の画面が要求されるデイス
プレイ用のカラー受像管に内装するシヤドウマス
クはこの画面に対応するように電子ビーム通過孔
部の孔径及びピツチも極めて微細なものが使用さ
れる。一例としてデルタ型に円形電子ビーム通過
孔部の穿設されたシヤドウマスクではピツチ0.20
mm、電子銃側の孔径は直径0.10mm程度となつてい
る。 For example, pure iron mild steel plates are generally used for the shadow masks built into color picture tubes, but the shadow masks built into color picture tubes for displays that require high-precision, high-definition screens are compatible with this screen. In order to do this, the hole diameter and pitch of the electron beam passage hole are extremely small. As an example, a shadow mask with a delta-shaped circular electron beam passage hole has a pitch of 0.20.
mm, and the hole diameter on the electron gun side is approximately 0.10 mm in diameter.
シヤドウマスクを内装するカラー受像管の最も
重要な特性を電子銃より発射された電子ビームを
シヤドウマスクの電子ビーム通過孔部を通過して
忠実に蛍光面を形成する所定の蛍光体積に射突さ
せることである。しかしながら、稼動中のシヤド
ウマスクは時間の経過と共に電子ビームの射突に
よる温度上昇を伴い、熱膨張を起し、その結果、
電子ビームの軌跡と蛍光体層との位置が合致しな
くなり、所謂ミスランデイングを生じて色ずれ現
象を起すことになる。 The most important characteristic of a color picture tube equipped with a shadow mask is that the electron beam emitted from the electron gun passes through the electron beam passage hole of the shadow mask and hits a predetermined fluorescent volume that faithfully forms a fluorescent screen. be. However, as time passes, the temperature of the shadow mask during operation increases due to the impact of the electron beam, causing thermal expansion, and as a result,
The locus of the electron beam and the position of the phosphor layer no longer match, resulting in so-called mislanding and a color shift phenomenon.
このことはカラー受像管としての致命的欠陥と
なるため、解決方法として線膨張係数の極めて小
さないわゆるアンバー材を使用してシヤドウマス
クを作ることも提案されている。このアンバー材
はニツケル鋼の一種であり、標準組成はＣ＜0.2
％、Mn0.5％、Ni36％、残りがFeからなり、線
膨張係数が０〜40℃間で約１×10-6／degと小さ
いことが特徴である。この線膨張係数の値は従来
のシヤドウマスク素材の純鉄軟鋼材の約１／10
で、この特性は普通の熱膨張と磁気的体積収縮と
の重ね合わせにより現れるものと考えられてい
る。 Since this is a fatal defect for color picture tubes, it has been proposed as a solution to this problem that a shadow mask be made of a so-called invar material having an extremely small coefficient of linear expansion. This amber material is a type of nickel steel, and its standard composition is C<0.2
%, Mn 0.5%, Ni 36%, and the rest Fe, and is characterized by a small coefficient of linear expansion of about 1×10 -6 /deg between 0 and 40°C. This coefficient of linear expansion is approximately 1/10 that of pure iron and mild steel used as conventional shadow mask materials.
This characteristic is thought to arise from the combination of ordinary thermal expansion and magnetic volumetric contraction.
しかるにアンバー材などの鉄及びニツケルを主
成分とする合金材は通常塩化第２鉄溶液をエツチ
ング液として、スプレイ法により電子ビーム通過
孔部を穿設するが、この場合、塩化第２鉄溶液中
の遊離塩酸量をある範囲より多くすると非エツチ
ング部に被着されている感光膜レジストの耐蝕性
がもたず不所望部までエツチングされるし、また
少なくすると水酸化ニツケル及び水酸化鉄が生成
され、これがエツチング部に沈着するため第１図
に示すように電子ビーム通過孔部１の周縁にぎざ
ぎざ２が発生し、微細な寸法ばらつきを生じ寸法
管理が困難となり、またユニフオミテイも劣り、
むらのある画面しか得られない問題点がある。
However, for alloy materials whose main components are iron and nickel, such as amber materials, electron beam passage holes are usually drilled by a spray method using a ferric chloride solution as an etching solution. If the amount of free hydrochloric acid exceeds a certain range, the photoresist coated on the non-etched areas will not have the corrosion resistance and undesired areas will be etched, and if it is decreased, nickel hydroxide and iron hydroxide will be produced. As this deposits on the etched area, burrs 2 are generated on the periphery of the electron beam passage hole 1 as shown in FIG.
The problem is that you can only get an uneven screen.
また塩化第２鉄溶液中のエツチングに寄与しな
いFe++及びNi++がある範囲以上になるとエツチ
ング界面でのエツチングイオン（Fe+++）の交換
速度がばらつきエツチング速度の制御が困難とな
ると同時に電子ビーム通過孔部が同じく第１図に
示すような形状になるため、遊離塩酸量の場合と
同様に微細な寸法管理が困難となる問題点があ
る。 Furthermore, if Fe ++ and Ni ++ , which do not contribute to etching in the ferric chloride solution, exceed a certain range, the exchange rate of etching ions (Fe +++ ) at the etching interface will vary, making it difficult to control the etching rate. At the same time, since the electron beam passage hole has the same shape as shown in FIG. 1, there is a problem in that fine dimensional control is difficult, as in the case of the amount of free hydrochloric acid.
また塩化第２鉄溶液の温度もある温度以下では
生産性が悪くなるため設備が大きくなるし、ある
温度以上では感光膜レジストの膨潤により耐蝕性
が劣化し、不所望部までエツチングされる問題点
がある。 Furthermore, if the temperature of the ferric chloride solution is below a certain temperature, productivity will deteriorate and the equipment will need to be large; if the temperature exceeds a certain temperature, the corrosion resistance will deteriorate due to swelling of the photoresist, and undesired areas will be etched. There is.
また温度と液比重との間には相関性があるが、
液比重が低すぎた場合液粘度が低下し、エツチン
グイオンの拡散速度が一律である鉄−ニツケル合
金のエツチングではエツチング速度が非常に速く
なる。この結果様々な結晶面を有する多結晶の鉄
−ニツケル合金は溶解され易い面が優先的にエツ
チングされ、電子ビーム通過孔部が第１図に示す
ような形状になり、遊離塩酸量の場合と同様に微
細な寸法管理が困難な問題点がある。逆に液比重
が高すぎた場合、液粘度が上り過ぎエツチングイ
オンの移動が抑制されるためエツチング速度が低
下し過ぎ量産に適さない問題点がある。この結果
量産面とマスク品質との両面からある温度と比重
の範囲を決める必要がある。 There is also a correlation between temperature and liquid specific gravity,
If the specific gravity of the liquid is too low, the viscosity of the liquid decreases, and the etching rate becomes very high when etching an iron-nickel alloy in which the diffusion rate of etching ions is uniform. As a result, in a polycrystalline iron-nickel alloy having various crystal planes, the easily soluble plane is preferentially etched, and the electron beam passage hole becomes shaped as shown in Figure 1, which is different from the case of free hydrochloric acid. Similarly, there is the problem that fine dimensional control is difficult. On the other hand, if the specific gravity of the liquid is too high, the viscosity of the liquid increases too much and the movement of etching ions is suppressed, resulting in a problem that the etching rate decreases too much and is not suitable for mass production. As a result, it is necessary to determine a certain range of temperature and specific gravity from both aspects of mass production and mask quality.
本発明は前述した諸問題に鑑みなされたもので
あり、アンバー材などの鉄及びニツケルを主成物
とする合金材からなるシヤドウマスク素材に塩化
第２鉄溶液をスプレイ法により吹きつけシヤドウ
マスクを製造する場合、塩化第２鉄溶液の諸特性
を限定することにより極めて品質のよいシヤドウ
マスクを得ることが可能なシヤドウマスクの製造
方法を提供することを目的としている。
The present invention was made in view of the above-mentioned problems, and involves manufacturing a shadow mask by spraying a ferric chloride solution onto a shadow mask material made of an alloy material mainly composed of iron and nickel, such as umber material. In this case, it is an object of the present invention to provide a method for manufacturing a shadow mask, which makes it possible to obtain a shadow mask of extremely high quality by limiting various properties of a ferric chloride solution.
即ち、本発明は鉄及びニツケルを主成分とする
合金材からなるシヤドウマスク素材に塩化第２鉄
溶液をスプレイ法により吹きつけ微細精密な電子
ビーム通過孔部を穿設するシヤドウマスクの製造
方法において、塩化第２鉄溶液が、遊離塩酸量
0.30±0.20％、〔Fe++、Fe+++〕合わせて15％以
下、液温40〜70℃の範囲で比重が、1.461−4.63
×10-4×Ｔ−1.96×10-6×T2と1.552＋7.79×10-5
×Ｔ−1.18×10-5×T2の式に囲まれた（Ｔは液
温）範囲にあるように制御されていることを特徴
としている。
That is, the present invention provides a method for producing a shadow mask, in which a ferric chloride solution is sprayed onto a shadow mask material made of an alloy material mainly composed of iron and nickel to form fine and precise electron beam passage holes. The amount of free hydrochloric acid in the ferric solution
0.30±0.20%, [Fe ++ , Fe +++ ] total 15% or less, specific gravity 1.461-4.63 in the liquid temperature range of 40 to 70℃
×10 -4 ×T-1.96× 10-6 ×T 2 and 1.552+7.79× 10-5
It is characterized in that it is controlled to be within the range defined by the formula xT-1.18 x 10 -5 x T 2 (T is the liquid temperature).
次に本発明の一実施例を説明する。 Next, one embodiment of the present invention will be described.
先ず本発明者らは種々の塩化第２鉄溶液を使用
し、実際にアンバー材からなるシヤドウマスク素
材に電子ビーム通過孔部を穿設し、この電子ビー
ム通過孔部の形状、感光膜レジストの状態などを
検査する方法を用いて塩化第２鉄溶液の温度と遊
離塩酸量の関係における安全域を調査し第２図の
安全域１１、即ち40℃〜70℃まで遊離塩酸量は
0.10％〜0.50％が安全域１１となる。これは0.30
±0.10％が最適であることを示している。この安
全域１１に遊離塩酸量をおさえることにより、感
光膜レジストは浸蝕されないし、また電子ビーム
通過孔部の形状も完全円形となり、寸法のばらつ
きも少なく、結果としてユニフオミテイもよく、
画面のむらもなくなる。 First, the present inventors used various ferric chloride solutions to actually drill an electron beam passage hole in a shadow mask material made of amber material, and determined the shape of the electron beam passage hole and the condition of the photoresist film resist. The safety margin in the relationship between the temperature of the ferric chloride solution and the amount of free hydrochloric acid was investigated using methods such as testing, and the amount of free hydrochloric acid was
0.10% to 0.50% is the safety margin 11. This is 0.30
It shows that ±0.10% is optimal. By suppressing the amount of free hydrochloric acid within this safety range 11, the photoresist film resist will not be corroded, and the shape of the electron beam passage hole will also be completely circular, with little variation in dimensions and, as a result, good uniformity.
The screen will no longer be uneven.
次に同様な検査方法を用いて塩化第２鉄溶液の
温度とFe++とNi++の関係を調査した結果第３図
の安全域１２即ち全温度でFe++とNi++を合わせ
て15％以下とすることにより最適結果が得られ
た。そしてこの安全域１２にFe++をおさえるこ
とによりエツチング速度の制御ができると共に電
子ビーム通過孔部の形状の完全円形とすることが
可能となる。 Next, we investigated the relationship between the temperature of the ferric chloride solution and Fe ++ and Ni ++ using a similar testing method. As a result, we found that Fe ++ and Ni ++ were equal at the safety range 12 in Figure 3, that is, at all temperatures. Optimal results were obtained by setting the ratio to 15% or less. By suppressing Fe ++ within this safety range 12, the etching rate can be controlled and the electron beam passage hole can be made completely circular in shape.
次に同様な検査方法を用いて塩化第２鉄溶液の
温度と比重の関係を調査した結果第４図の安全域
１３即ち液温40℃〜70℃の間で1.461−4.63×10-4
×Ｔ−1.96×10-6×T2と1.552＋7.79×10-5×Ｔ−
1.18×10-5×T2の式に囲まれた（Ｔは液温）範囲
にすることにより感光膜の耐蝕性が劣化すること
もなく、設備を増加することがない。更に電子ビ
ーム通過孔部が完全円形となることは勿論のこと
寸法管理も極めて容易にできる。 Next, we investigated the relationship between the temperature and specific gravity of the ferric chloride solution using a similar test method, and found that the safety range 13 in Figure 4 was 1.461-4.63×10 -4 when the liquid temperature was between 40°C and 70°C.
×T-1.96× 10-6 ×T 2 and 1.552+7.79× 10-5 ×T-
By setting the temperature within the range defined by the formula 1.18×10 -5 ×T 2 (T is the liquid temperature), the corrosion resistance of the photoresist film will not deteriorate and the equipment will not need to be increased. Furthermore, not only can the electron beam passage hole be perfectly circular, but its dimensions can also be controlled extremely easily.
〔発明の効果〕
前述のようにアンバーなど、鉄及びニツケルを
主成分とする合金材からなるシヤドウマスク素材
に塩化第２鉄溶液をスプレイ法により吹きつけ電
子ビーム通過孔部を穿設する時、塩化第２鉄溶液
中の遊離塩酸量、Fe++、Ni++、温度、比重、を
制御することにより微細、精密な電子ビーム通過
孔部を穿設することが可能となるのでその工業的
価値は極めて大である。[Effects of the Invention] As mentioned above, when a ferric chloride solution is sprayed onto a shadow mask material made of an alloy material mainly composed of iron and nickel, such as amber, to form an electron beam passage hole, the chloride By controlling the amount of free hydrochloric acid, Fe ++ , Ni ++ , temperature, and specific gravity in the ferric solution, it is possible to drill fine and precise electron beam passage holes, which has great industrial value. is extremely large.
第１図は周縁にぎざぎざのある電子ビーム通過
孔部を示す説明図、第２図は塩化第２鉄溶液の温
度と遊離塩酸量との安全域を示すグラフ、第３図
は塩化第２鉄溶液の温度とFe++＋Ni++量との安
全域を示すグラフ、第４図は塩化第２鉄溶液の温
度と比重との安全域を示すグラフである。
１…電子ビーム通過孔部、１１，１２，１３…
安全域。
Figure 1 is an explanatory diagram showing the electron beam passage hole with jagged edges, Figure 2 is a graph showing the safety margin between the temperature of ferric chloride solution and the amount of free hydrochloric acid, and Figure 3 is ferric chloride. FIG. 4 is a graph showing the safety margin between the temperature of the solution and the amount of Fe +++ Ni ++. FIG. 4 is a graph showing the safety margin between the temperature and specific gravity of the ferric chloride solution. 1... Electron beam passing hole portion, 11, 12, 13...
Safety margin.
Claims (1)
るシヤドウマスク素材に塩化第２鉄溶液をスプレ
イ法により吹きつけ微細精密な電子ビーム通過孔
部を穿設するシヤドウマスクの製造方法におい
て、前記塩化第２鉄溶液が遊離塩酸量0.30±0.20
％、〔Fe++、Ni++〕合わせて15％以下、液温40℃
〜70℃の範囲で比重が1.461−4.63×10-4×Ｔ−
1.96×10-6×T2と1.552＋7.79×10-5T−1.18×
10-5×T2（但しＴは液温）の式に囲まれた範囲に
あるように制御されていることを特徴とするシヤ
ドウマスクの製造方法。[Claims] 1. A method for manufacturing a shadow mask, in which a ferric chloride solution is sprayed onto a shadow mask material made of an alloy material containing iron and nickel as main components to form fine and precise electron beam passage holes. , the amount of free hydrochloric acid in the ferric chloride solution is 0.30±0.20
%, [Fe ++ , Ni ++ ] total 15% or less, liquid temperature 40℃
Specific gravity is 1.461−4.63×10 -4 ×T− in the range of ~70℃
1.96×10 -6 ×T 2 and 1.552 + 7.79×10 -5 T−1.18×
10 -5 ×T 2 (where T is liquid temperature).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11702588A JPS64283A (en) | 1988-05-16 | 1988-05-16 | Production of shadow mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11702588A JPS64283A (en) | 1988-05-16 | 1988-05-16 | Production of shadow mask |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH01283A JPH01283A (en) | 1989-01-05 |
| JPS64283A JPS64283A (en) | 1989-01-05 |
| JPH0366395B2 true JPH0366395B2 (en) | 1991-10-17 |
Family
ID=14701582
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11702588A Granted JPS64283A (en) | 1988-05-16 | 1988-05-16 | Production of shadow mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS64283A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2018178142A (en) * | 2017-04-04 | 2018-11-15 | 株式会社Adeka | Etching solution composition and etching method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4838054A (en) * | 1971-09-16 | 1973-06-05 | ||
| US4061529A (en) * | 1977-02-28 | 1977-12-06 | Rca Corporation | Method for making etch-resistant stencil with dichromate-sensitized casein coating |
| JPS54158342A (en) * | 1978-06-05 | 1979-12-14 | Sumitomo Metal Mining Co | Etching iron alloy |
-
1988
- 1988-05-16 JP JP11702588A patent/JPS64283A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS64283A (en) | 1989-01-05 |
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