JPH0367126A - Measurement position determining method - Google Patents
Measurement position determining methodInfo
- Publication number
- JPH0367126A JPH0367126A JP20228989A JP20228989A JPH0367126A JP H0367126 A JPH0367126 A JP H0367126A JP 20228989 A JP20228989 A JP 20228989A JP 20228989 A JP20228989 A JP 20228989A JP H0367126 A JPH0367126 A JP H0367126A
- Authority
- JP
- Japan
- Prior art keywords
- area
- measured
- measurement
- divided
- sections
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Testing Or Calibration Of Command Recording Devices (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野〕
本発明は、被測定対象物を当該被測定対象物の任意の平
面内で、等面積に区分した複数の被測定区画の中心部に
測定点を設け、偏りがなく均一な被測定対象物の特性を
測定する方法に関するものである。Detailed Description of the Invention [Industrial Field of Application] The present invention provides a method for measuring an object to be measured at the center of a plurality of sections divided into equal areas within an arbitrary plane of the object to be measured. The present invention relates to a method of measuring the characteristics of an object to be measured uniformly and without bias by providing points.
[従来の技術]
従来のこの種の測定方法によれば、例えば第2図に示す
ように半径Rを持つ円形の測定頭域において、当該被測
定領域と共通の中心を持つ2つの同心円Jl及びJ2上
と、それらの円の中心に測定点が設定される。第2図に
おいて、Aは被測定領域、Jl及びJ2は被測定領域A
と共通の中心を持つ同心円、
S ij (i =0.l、2,3 ; j=O,l
、2゜・・・・19)は:測定点である。[Prior Art] According to this type of conventional measurement method, for example, in a circular measurement head area having a radius R as shown in FIG. 2, two concentric circles Jl and Measurement points are set on J2 and at the center of those circles. In Figure 2, A is the area to be measured, and Jl and J2 are the areas to be measured A.
concentric circles with a common center, S ij (i = 0.l, 2, 3; j = O, l
, 2°...19) are: measurement points.
この従来技術においては、同心円の半径は、被測定領域
Aの半径をRとしたとき、それぞれ0゜4R及び0.8
Rとなるように設定される。このため半径が大きい方の
同心円J2の円周は、半径が小さい方の同心円Jlの円
周の2倍となるから、これに合わせて半径が大きい方の
同心円J2上の測定点の数は、半径が小さい方の同心円
Jlの測定点の数の2倍に設定されている。In this prior art, the radius of the concentric circles is 0°4R and 0.8R, respectively, where R is the radius of the measurement area A.
It is set to be R. Therefore, the circumference of the concentric circle J2 with the larger radius is twice the circumference of the concentric circle J1 with the smaller radius, so the number of measurement points on the concentric circle J2 with the larger radius is accordingly: The radius is set to twice the number of measurement points of the smaller concentric circle Jl.
このような■1j定点の設定方法によると、測定対象領
ViAにおける測定点の面密度、すなわち単位被測定領
域面積当りの測定点の数は、測定対象領域Aの全域にわ
たって均一とはならない。従ってこのような測定点を用
いて被測定領域Aの測定を行った場合、互いに等面積の
領域についての測定値結果が得られないから、測定の結
果に偏りを生じる欠点を内在している。According to such a method of setting the fixed points 1j, the areal density of the measurement points in the measurement target area ViA, that is, the number of measurement points per unit area of the measurement target area, is not uniform over the entire area of the measurement target area A. Therefore, when measuring the area A to be measured using such measurement points, measurement results for areas having the same area cannot be obtained, so there is an inherent drawback that the measurement results are biased.
[発明が解決しようとする課題]
本発明は、上記の従来の測定位置決定方法における欠点
を解消し、任意の被測定対象物の平面を、偏りなく均一
に測定する方法を提供することを目的とする。[Problems to be Solved by the Invention] It is an object of the present invention to provide a method that eliminates the drawbacks of the conventional measurement position determination methods described above and uniformly measures the plane of any object to be measured without bias. shall be.
[課題を解決するための手段]
上記課題を解決するために、本発明においては、被測定
領域を等面積を有する複数の被測定区画に分割し、それ
ぞれの被測定区画のほぼ中央に1個の測定点を設定する
。[Means for Solving the Problems] In order to solve the above problems, in the present invention, a measurement area is divided into a plurality of measurement sections having equal areas, and one measurement area is placed approximately in the center of each measurement section. Set the measurement point.
[作用コ
被測定対象物が円である場合、半径方向に同心円によっ
て分割し、最内周の外側にある領域を回転角方向に分割
する。これらの分割によって設定された領域を被測定区
画とし、被測定区画の面積は互いに等しくなるように各
同心円の半径及び区画数を設定する。また、最内周を除
き、各被測定区画について、半径方向及び回転角方向で
面積を2等分する補助線の交点を測定点として設定する
。[Operation] If the object to be measured is a circle, it is divided in the radial direction by concentric circles, and the area outside the innermost circumference is divided in the rotation angle direction. The area set by these divisions is defined as a section to be measured, and the radius of each concentric circle and the number of sections are set so that the areas of the sections to be measured are equal to each other. In addition, for each section to be measured except for the innermost circumference, the intersection of auxiliary lines dividing the area into two in the radial direction and rotational angle direction is set as a measurement point.
[実施例]
第1図は、本発明の詳細な説明するための図であって、
Aは被測定対象物の平面内に定義された円形の被測定領
域、If、I2及びI3は被測定領域Aと共通の中心を
持っ内円、Ll、L2゜及びL3は被測定領域と共通の
中心を持つ補助内、S ij (i =0.1.2,3
; j=0.l、2.・・・・、9)は測定点であ
る。[Example] FIG. 1 is a diagram for explaining the present invention in detail,
A is a circular measurement area defined in the plane of the object to be measured, If, I2 and I3 are inner circles having a common center with measurement area A, and Ll, L2° and L3 are common to the measurement area. In the auxiliary with the center of S ij (i = 0.1.2, 3
; j=0. l, 2. ..., 9) are measurement points.
第1図の実施例においては、被測定領域Aは、3つの内
円If、12. 及びI3ζこより半径方向に4分割
され、それらの内円のうちで最も半径の小さい最内周1
1の外側にある被測定領域は、最内内■1の回転角方向
に等回転角で8分割されている。In the embodiment of FIG. 1, the measurement area A includes three inner circles If, 12. and I3ζ are divided into four in the radial direction, and the innermost circumference 1 with the smallest radius among these inner circles
The area to be measured outside 1 is divided into eight parts at equal rotation angles in the rotation angle direction of the innermost part 1.
上記の回転角方向での分割は、内円11及びI2で囲ま
れた被測定領域、内円I2及びI3で囲まれた被測定領
域、内円I3の外部の被測定領域で、それぞれ異なった
方法で行われている。The above division in the rotation angle direction is divided into a measurement area surrounded by the inner circle 11 and I2, a measurement area surrounded by the inner circles I2 and I3, and a measurement area outside the inner circle I3. It is done in a way.
上記の方法によって分割して区分された最内周の外部の
同心円の一部を周囲に持つ被測定領域と、最内周の内部
の被測定領域を被測定区画とし、その被測定区画のそれ
ぞれの面積は等しくなるように設定されている。A measurement area surrounding a part of the concentric circle outside the innermost periphery divided by the above method and a measurement area inside the innermost periphery are defined as the measurement partitions, and each of the measurement partitions is The areas of are set to be equal.
第1図の実施例において、最内内■1の半径をrl、そ
の外側の内円(同心円)I2の半径をI2、内円I3の
半径をI3、被測定領域Aの半径をI4としたとき、そ
れぞれの被測定区画の面積は、次の式によって計算する
ことができる。In the example shown in Fig. 1, the radius of the innermost ■1 is rl, the radius of the outer inner circle (concentric circle) I2 is I2, the radius of the inner circle I3 is I3, and the radius of the measurement area A is I4. Then, the area of each measured section can be calculated by the following formula:
内円I1の面積:81
al=π・rl2
内円I1の外側の被測定区画の面積:a2a2=(π・
I2”−π・rl2)/8=π(I22−r 1”)/
8
内円I2の外側の被測定区画の面積:a3a3=(π・
I32−π・I22)/8=π (I32−I22)/
8
内円I3の外側の被測定区画の面積:a4a4=(π・
I42−π・I32)/8=π(I42−I32)/8
第1図の実施例においては、区画数を8としたが、この
数に限定されるものではない。本発明においては、要す
るにそれぞれの被測定区画を等面積に決定するのである
から、一般に、各被測定区画の面積が、al=a2=a
3=a4、という条件を満足するように、各半径、区画
数等を選定すれば良い。Area of inner circle I1: 81 al=π・rl2 Area of measured section outside inner circle I1: a2a2=(π・rl2
I2"-π・rl2)/8=π(I22-r 1")/
8 Area of measured section outside inner circle I2: a3a3=(π・
I32-π・I22)/8=π (I32-I22)/
8 Area of measured section outside inner circle I3: a4a4=(π・
I42-π·I32)/8=π(I42-I32)/8 In the embodiment shown in FIG. 1, the number of sections is eight, but the number is not limited to this number. In the present invention, in short, each section to be measured is determined to have an equal area, so generally, the area of each section to be measured is al=a2=a
Each radius, number of sections, etc. may be selected so as to satisfy the condition 3=a4.
次に、被測定区画の面積を2等分するように定義された
補助内Ll、L2. およびL3と、当該被測定区間
の面積を2等分し、被測定領域の中心を通るように定義
された補助直線(第1図においては、823の点を通る
補助直線りによって例示する)の交点の位置に測定点s
ljを設定する。Next, Ll, L2 . and L3, and an auxiliary straight line defined to divide the area of the measured section into two and pass through the center of the measured area (in Figure 1, this is illustrated by an auxiliary straight line passing through point 823). Measurement point s at the intersection
Set lj.
さらに測定点S2jの位置座標は測定点Sljの位置座
標に対して、被測定領域の中心を原点とし、当該原点の
回りを反時計方向に15度向回転た回転角を持つように
設定する。面様に測定点S3jの位置座標は測定点S2
jの位置座標に対して、当該原点の回りを反時計方向に
15度回転した回転角を持つように設定されている。Further, the position coordinates of the measurement point S2j are set to have a rotation angle of 15 degrees counterclockwise around the origin, with the center of the measurement area as the origin, with respect to the position coordinates of the measurement point Slj. The position coordinates of the measurement point S3j are the measurement point S2 like a surface.
It is set to have a rotation angle of 15 degrees counterclockwise around the origin with respect to the position coordinates of j.
このように測定点Sljが設定されているために、被測
定領域Aにおける測定点の面密度、つまり単位被測定領
域面積当りの測定点数、は偏りがなく均一となり、当該
1111+定点を用いることにより当該被測定領域Aを
均一に測定することができる。Since the measurement points Slj are set in this way, the areal density of measurement points in the measurement area A, that is, the number of measurement points per unit area of the measurement area, is uniform without bias, and by using the 1111+fixed points, The area to be measured A can be uniformly measured.
本実施例は被測定区間を3つの内円により半径方向に4
分別し、回転角方向に8分11」シた場合を示している
が、被測定対象物の平面内の均一性に応じ、半径方向及
び回転角方向の分割数を自由に設定することができ、こ
のときの測定点位置は、本実施例と同様の方法により、
容易に求めることができる。In this example, the measured section is divided into four circles in the radial direction by three inner circles.
The figure shows a case in which the object is divided into 8 parts and 11 parts in the direction of the rotation angle, but the number of divisions in the radial direction and rotation angle direction can be freely set depending on the uniformity of the object to be measured within the plane. , the measurement point position at this time is determined by the same method as in this example.
can be easily determined.
また、本発明の方法を実施するための装置としては、数
値処理装置、所定の計算手順とデータを記憶するための
メモリ、計算結果に基づいて、被測定対象物の平面内に
測定点を設定するための測定点プロッタを構成要素とし
て実現することができる。このような装置に」二記の同
心円の半径、区画数等の測定点の決定に必要な要素の数
値をパラメータとして入力し、上記の測定点を算出する
ための手法に従って測定点の座標を算出し、座標データ
の制御によって具体的な測定点の設定を順次行うことが
可能となる。The apparatus for carrying out the method of the present invention includes a numerical processing device, a memory for storing predetermined calculation procedures and data, and a measurement point set within the plane of the object to be measured based on the calculation results. A measuring point plotter can be implemented as a component. Input the numerical values of the elements necessary for determining the measurement point, such as the radius of the concentric circles and the number of sections, as parameters into such a device, and calculate the coordinates of the measurement point according to the method for calculating the measurement point described above. However, by controlling the coordinate data, it becomes possible to sequentially set specific measurement points.
本発明は、上記のような構成を備えているから、例えば
、シリコンウェハの表面に測定点を設定して、表面全体
にわたり、比抵抗、格子欠陥密度、等の物理的測定を実
施し、シリコンウェハの品質評価を厳密に行う場合に好
適である。その他にも、例えば光ディスクあるいは磁気
ディスク等の記録媒体における記録特性の■(1定、各
種材料の表面における物性試験等を実施する際に、被測
定対象物の平面内において均一な測定点の設定を行う場
合にきわめて有効である。Since the present invention has the above configuration, for example, measurement points are set on the surface of a silicon wafer and physical measurements such as specific resistance and lattice defect density are carried out over the entire surface. This is suitable for strictly evaluating the quality of wafers. In addition, for example, when conducting physical property tests on the surface of various materials, the recording characteristics of recording media such as optical disks or magnetic disks are determined. It is extremely effective when carrying out.
[発明の効果]
以上説明したように、本発明の測定方法では被測定対象
物の平面に円形あるいは矩形の被測定領域を定義し、当
該被測定領域を等面積を持つ被測定区画に分割し、それ
ぞれの被測定区画のほぼ中央に各1個の測定点を設定す
るため、当該測定領域における測定点の面密度が均一と
なり、当該測定点を用いると偏りのない均一な測定を行
うことができる。このため被測定領域の均質性を検査し
たり、被測定領域内での均質性の場所依存性を正しく測
定することができる。[Effects of the Invention] As explained above, in the measurement method of the present invention, a circular or rectangular measurement area is defined on the plane of the object to be measured, and the measurement area is divided into measurement sections having equal areas. Since one measurement point is set approximately in the center of each measurement area, the area density of measurement points in the measurement area is uniform, and using this measurement point makes it possible to perform unbiased and uniform measurements. can. Therefore, it is possible to inspect the homogeneity of the region to be measured, and to accurately measure the location dependence of the homogeneity within the region to be measured.
また、本発明の方法は、論理的かつ数値的に測定点を設
定することができるから、再現性が良好であり、被測定
対象物の平面に自動的に測定点の設定を行う装置を実現
することができる。また、測定点の数、分布等の要素を
パラメータとして与えることにより、測定点を設定する
ことが可能である。In addition, since the method of the present invention allows measurement points to be set logically and numerically, it has good reproducibility and realizes a device that automatically sets measurement points on the plane of the object to be measured. can do. Furthermore, it is possible to set measurement points by giving elements such as the number of measurement points and their distribution as parameters.
の位置を示している。It shows the position of
A・・―・・被測定領域
Jl及びJ211・・・・被測定領域と共通の中心を持
つ同心円
LX、L2及びL3・・◆@@被測定領域と共通の中心
を持つ補助円
II、12及UI3m−@−−被m)J定領域と共通の
中心を持つ内円
SiJ (t =o+ L 2+ 3: J
=01 11 21 31・・・、9)・・・・・測定
点A...Measurement area Jl and J211...Concentric circles LX, L2 and L3 having a common center with the measurement area...◆@@Auxiliary circle II, 12 having a common center with the measurement area and UI3m−@−−m) Inner circle SiJ (t = o + L 2+ 3: J
=01 11 21 31..., 9)...Measurement point
Claims (1)
する方法であって、当該平面に円形被測定領域を定義し
、当該被測定領域を等面積を持つ複数の被測定区画に分
割し、被測定対象物の平面上で、かつ、複数のそれぞれ
の被測定区画のほぼ中央に各1個の測定点を設定するこ
とを特徴とする測定位置決定方法。A method of measuring an object to be measured within an arbitrary plane of the object, in which a circular measurement area is defined on the plane, and the measurement area is divided into multiple measurement sections with equal areas. A method for determining a measurement position, characterized in that one measurement point is set on a plane of the object to be measured and approximately at the center of each of the plurality of sections to be measured.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20228989A JPH0367126A (en) | 1989-08-05 | 1989-08-05 | Measurement position determining method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20228989A JPH0367126A (en) | 1989-08-05 | 1989-08-05 | Measurement position determining method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0367126A true JPH0367126A (en) | 1991-03-22 |
Family
ID=16455078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20228989A Pending JPH0367126A (en) | 1989-08-05 | 1989-08-05 | Measurement position determining method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0367126A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0587561A (en) * | 1991-09-27 | 1993-04-06 | Mitsutoyo Corp | Device for measuring surface roughness |
| JP2019049549A (en) * | 2015-08-26 | 2019-03-28 | 財團法人工業技術研究院Industrial Technology Research Institute | Surface measurement device and method thereof |
| JP2020144148A (en) * | 2015-08-26 | 2020-09-10 | 財團法人工業技術研究院Industrial Technology Research Institute | Surface measuring device and its method |
| CN115740068A (en) * | 2022-11-15 | 2023-03-07 | 中信渤海铝业控股有限公司 | Circle area equal dividing method with dividing line not passing through circle center and flow velocity detection mold |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57124265A (en) * | 1981-01-26 | 1982-08-03 | Fujitsu Ltd | Averaging method for measurement-point density by testing equipment |
-
1989
- 1989-08-05 JP JP20228989A patent/JPH0367126A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57124265A (en) * | 1981-01-26 | 1982-08-03 | Fujitsu Ltd | Averaging method for measurement-point density by testing equipment |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0587561A (en) * | 1991-09-27 | 1993-04-06 | Mitsutoyo Corp | Device for measuring surface roughness |
| JP2019049549A (en) * | 2015-08-26 | 2019-03-28 | 財團法人工業技術研究院Industrial Technology Research Institute | Surface measurement device and method thereof |
| JP2020144148A (en) * | 2015-08-26 | 2020-09-10 | 財團法人工業技術研究院Industrial Technology Research Institute | Surface measuring device and its method |
| CN115740068A (en) * | 2022-11-15 | 2023-03-07 | 中信渤海铝业控股有限公司 | Circle area equal dividing method with dividing line not passing through circle center and flow velocity detection mold |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4369581A (en) | Method and apparatus for the determination of the axis of rotation of a circular table in multiple coordinate measuring instruments | |
| JPS6348249Y2 (en) | ||
| CN112414297A (en) | Magnetic sensor device, system and method | |
| JPS63122912A (en) | Method and device for measuring displacement of rotary table | |
| KR20000068713A (en) | Method for correcting measurement errors in a machine measuring co-ordinates | |
| CN107481960B (en) | A square wafer offset measurement and calibration device and method | |
| CN109990712A (en) | A kind of width gage on-line calibration method | |
| CN109443265A (en) | Assessment method based on polar angle dichotomizing search optimizing circumference equal dividing hole location | |
| JPH0367126A (en) | Measurement position determining method | |
| CN111609869B (en) | Positive and negative multi-position fiber-optic gyroscope orientation effect judgment method based on hypothesis testing | |
| JPH0322922B2 (en) | ||
| CN108803373B (en) | Ground speed eliminating method of three-axis turntable | |
| CN110608828A (en) | Bragg Angle Measurement Method Based on Monochromatic X-ray Diffraction | |
| CN111504301A (en) | Positioning method, device and system based on magnetic field characteristic vector | |
| CN114675226B (en) | Method, system, chip and device for measuring mounting matrix of three-axis magnetometer | |
| CN110209715B (en) | Data pre-analysis method for eddy current detection data analysis | |
| JPH07117427B2 (en) | Measuring accuracy of measuring instruments | |
| JPH0333635A (en) | Apparatus for evaluating shape of non-spherical lens | |
| CN115540797B (en) | Sensing data processing method | |
| CN120334853B (en) | A method and system for locating acoustic emission sources based on hybrid model | |
| CN106625033B (en) | A kind of method of determining Single point diamond turning o tool marks polishing removal behavior | |
| Fisher et al. | A computer program for the calculation of lattice spacings from Kossel diffraction patterns | |
| JPH0587746A (en) | Method for analyzing electron diffraction pattern | |
| Fugelso et al. | Finding the best fit centerline of cylinders with interrupted circumferences on a polar CMM | |
| JP2003240543A (en) | measuring device |