JPH0368871B2 - - Google Patents
Info
- Publication number
- JPH0368871B2 JPH0368871B2 JP58084606A JP8460683A JPH0368871B2 JP H0368871 B2 JPH0368871 B2 JP H0368871B2 JP 58084606 A JP58084606 A JP 58084606A JP 8460683 A JP8460683 A JP 8460683A JP H0368871 B2 JPH0368871 B2 JP H0368871B2
- Authority
- JP
- Japan
- Prior art keywords
- parts
- acrylic acid
- meth
- solvent
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 15
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 9
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000002904 solvent Substances 0.000 description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- 230000009102 absorption Effects 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000005855 radiation Effects 0.000 description 5
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 5
- 238000001723 curing Methods 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- -1 acrylic ester Chemical class 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 229940105990 diglycerin Drugs 0.000 description 3
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000003504 photosensitizing agent Substances 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 2
- 238000003847 radiation curing Methods 0.000 description 2
- 238000007127 saponification reaction Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical compound C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 description 1
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 1
- OPLCSTZDXXUYDU-UHFFFAOYSA-N 2,4-dimethyl-6-tert-butylphenol Chemical compound CC1=CC(C)=C(O)C(C(C)(C)C)=C1 OPLCSTZDXXUYDU-UHFFFAOYSA-N 0.000 description 1
- QFSYADJLNBHAKO-UHFFFAOYSA-N 2,5-dihydroxy-1,4-benzoquinone Chemical compound OC1=CC(=O)C(O)=CC1=O QFSYADJLNBHAKO-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- UBUCNCOMADRQHX-UHFFFAOYSA-N N-Nitrosodiphenylamine Chemical compound C=1C=CC=CC=1N(N=O)C1=CC=CC=C1 UBUCNCOMADRQHX-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N hexane Substances CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- YDKNBNOOCSNPNS-UHFFFAOYSA-N methyl 1,3-benzoxazole-2-carboxylate Chemical compound C1=CC=C2OC(C(=O)OC)=NC2=C1 YDKNBNOOCSNPNS-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 229950000688 phenothiazine Drugs 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000012925 reference material Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
本発明は新規な(メタ)アクリル酸エステル及
びその製造法に関するものである。
近年紫外線硬化型印刷インキ及び塗料等が普及
してきている。これらの印刷インキ及び塗料には
ビヒクルとして多くの種類のアクリル酸エステル
が使用されている。
本発明者らは鋭意研究の結果、紫外線硬化型印
刷インキ及び塗料のビヒクルとして有用な硬化速
度が速い新規な(メタ)アクリル酸エステルを得
るに至つた。
すなわち本発明は
(1) 一般式
(式中、Rは、H又はCH3を示す。)
で表わされるジ(メタ)アクリル酸エステル。
(2) 下記構造式
を有する化合物をアクリル酸もしくはメタクリル
酸でエステル化する事を特徴とする下記一般式
〔〕で表わされるジ(メタ)アクリル酸エステ
ルの製造方法である。
更に詳しく説明するならば、本発明に用いる構
造式〔〕を有する化合物は、2,2−ジメチル
−3−オキシプロパナールとジグリセリンとの縮
合によつて得られたものである。またアクリル酸
またはメタクリル酸は化学量論比以上に使用され
るのが通常である。一般にアルコールに対するカ
ルボン酸のモル比は1.0〜2.0であるが好ましくは
1.1〜1.5である。反応は触媒も使用し生成する水
は蒸留する事により促進されるこのような触媒
は、硫酸、P−トルエンスルホン酸等の酸性触媒
であり、その使用量は、アクリル酸またはメタク
リル酸に対して0.1〜10モル%好ましくは、1〜
5モル%使用される。反応により生成した水を蒸
留するのには共沸溶剤を用いるのが有利である。
このような共沸溶剤は、60℃〜130℃の沸点を
有し、水と分離し易いものなら使用できるが、n
−ヘキサン、n−ヘプタンのような脂肪族炭化水
素、ベンゼン、トルエンのような芳香族炭化水
素、シクロヘキサンのような脂環式炭化水素が適
している。その使用量は、通常、反応混合物の5
〜70重量パーセントである。反応温度は、60〜
130℃の範囲でよいが、反応時間の短縮と重合防
止の点から、75〜120℃で行われるのが有利であ
る。アクリル酸またはメタクリル酸には既に重合
防止剤が添加されているのが普通であるが反応時
に改めて重合防止剤を添加してもよい。そのよう
な重合防止剤には、ハイドロキノン、P−メトキ
シフエノール、2,4−ジメチル−6−t−ブチ
ルフエノール、3−ヒドロキシチオール、α−ニ
トロソーβ−ナフトール、P−ベンゾキノン、
2,5−ジヒドロキシ−P−キノン、フエノチア
ジン、N−ニトロソジフエニルアミン、銅塩等が
挙げられる。その使用量は通常反応混合物に対し
て0.01〜1重量%である。
本発明のジ(メタ)アクリル酸エステルは、必
要ならば水若しくはアルカリ水溶液等で洗浄した
り、減圧蒸留のような方法で溶剤と分離する事に
よつて、工業的用途に使用される。
このジ(メタ)アクリル酸エステル〔〕は、
コーテイング及びインキ組成物のビヒクルとして
有用であり、それらは、放射線により、又は熱的
手段により硬化させることができる。放射線硬化
はイオン化もしくは電子線のような微粒子放射に
より、または紫外線放射のような化学線により行
うことができる。化学線により硬化を行う場合に
は一般的に当業界に公知の多くの種類の光増感剤
または光重合開始剤を包含させる。放射線硬化技
術及び熱硬化技術は当業者に周知であり、それら
のそれぞれにより硬化を行う事ができる。
本発明のジ(メタ)アクリル酸エステルは、そ
れ自体単独で、または他の単量体例えばトリメチ
ロールプロパンポリアクリレート、ペンタエリス
リトールポリアクリレート、ペンタエリスリトー
ルテトラアクリレート、もしくは不飽和基含有樹
脂例えば不飽和ポリエステル、エポキシアクリレ
ート、ウレタンアクリレート等の樹脂と混合して
ビヒクルとして使用することができる。
この新規なジ(メタ)アクリル酸エステルは有
機過酸化物の添加によつても重合させることもで
きる。
以下実施例を以つて説明する。例中、部とは重
量部を示す。
実施例 1
撹拌機、温度調節装置、温度計、凝縮器及び分
離器を備えた2l反応器に、2,2−ジメチル−3
−オキシプロパナールとジグリセリンの縮合体で
ある下記の構造を有する化合物347.2部
アクリル酸179.5部、パラトルエンスルホン酸20
部、ハイドロキノン2部、ベンゼン480部、シク
ロヘキサン120部を仕込み、加熱し、生成水は溶
剤と共に蒸留、凝縮させ分離器で水のみ系外に取
り除き、溶剤は反応器に戻す。水が37.3部生成し
た時点で冷却した。反応温度は80〜85℃であつ
た。反応混合物をベンゼン384部及びシクロヘキ
サン96部に溶解し、20%苛性ソーゾ水溶液で中和
した後、20%食塩水300部で3回洗浄する。溶剤
を減圧留去して淡黄色の液体401部を得た。この
ものは、下記の性質を有する。
比重(25℃) 1.1310
粘度(25℃) 3392CPS
鹸化価 241mgKOH/g
酸価 0.06mgKOH/g
屈折率(20℃)
元素分析値C(%) H(%)
59.61 7.76
得られた生成物の高分解能核磁気共鳴
(NMR)による吸収周波数の測定を行つた結果
を下記に示す。
No. 吸収周波数(Hz)
1 2492.187
2 1972.656
3 1958.984
4 1929.687
5 1921.875
6 1650.390
7 1640.625
8 1615.234
9 1611.328
10 1564.453
11 1550.781
12 1537.109
13 1433.593
14 1191.406
15 1158.203
16 1126.953
17 1121.093
18 1080.078
19 1076.171
20 1066.406
21 1044.921
22 1037.109
23 1027.343
24 1015.625
25 1011.718
26 1005.859
27 947.265
28 583.984
29 578.125
30 574.218
31 570.312
32 564.453
33 509.765
34 353.515
35 310.546
36 289.052
37 −1.953
猶上記測定には基準物質としてテトラメチルシ
ランを用い、溶剤としてクロロホルムを用いH1,
C13−Hのカツプリングさせた測定をして最終的
にC13のDカツプルの同定結果を示した。上記吸
収のうち、No.14,15,16、は溶媒の吸収のピーク
位置を示す。
実施例 2
実施例1と同一の反応器に、2,2−ジメチル
−3−オキシプロパナールとジグリセリンの縮合
体である下記の構造を有する化合物347.2部、
メタクリル酸214.4部、P−トルエンスルホン酸
20部、ハイドロキノン3部、トルエン600部を仕
込み、加熱し、生成水は溶剤と共に蒸留、凝縮さ
せ分離器で水のみ系外に取り除き、溶剤は反応器
に戻す。水が37.3部生成した時点で冷却した。反
応温度は111℃〜118℃であつた。反応混合物をト
ルエン500部に溶解し、20%苛性ソーダ水溶液で
中和した後、20%食塩水溶液400部で3回洗浄す
る。溶剤を減圧留去して淡黄色の液体427.4部を
得た。このものは、下記の性質を有する。
比重(25℃) 1.1070
粘度(25℃) 1200CPS
鹸化価 213.1mgKOH/g
酸価 0.01 mgKOH/g
屈折率(20℃)
元素分析値C(%) H(%)
61.19 8.21
NMRによる測定結果
No. 吸収周波数(Hz)
1 2511.718
2 2050.781
3 2046.875
4 1892.578
5 1882.812
6 1654.296
7 1632.812
8 1619.140
9 1615.234
10 1568.359
11 1437.500
12 1193.359
13 1160.156
14 1128.906
15 1123.046
16 1082.031
17 1078.125
18 1052.734
19 1046.875
20 1042.968
21 1017.578
22 1013.671
23 1007.823
24 984.375
25 964.843
26 583.984
27 578.125
28 572.265
29 568.359
30 366.406
31 511.718
32 312.500
33 291.015
34 275.390
35 0.000
上記吸収のうち、No.12,13,14、は溶媒の吸収
のピーク位置を示す。
応用例1,2、比較応用例1〜3
実施例1,2で得られた新規なジ(メタ)アク
リル酸エステル60部に対して、エポキシアクリレ
ート樹脂(エピコート828(シエル石油化学社製ビ
スフエノール型エポキシ樹脂)をアクリル酸でエ
ステル化して得られた樹脂)40部、光増感剤とし
てイルガキユアー184(チバガイギー社製)を3部
加え、鋼製パネル上に塗布し、高圧水銀灯(東芝
社製、2KW)により紫外線硬化させた。結果を
下表1に示す。比較例として上記と同一組成でジ
(メタ)アクリル酸エステルの所をポリエチレン
グリコールジアクリレート(日本化薬社製、品名
PEG400DA)、1,6−ヘキサンジオールジアク
リレート(日本化薬社製、品名HDDA)、ネオペ
ンチルグリコールジアクリレート(日本化薬社
製、品名NPGDA)の各々に変えたものの硬化結
果も併せて下表1に示す。
The present invention relates to a novel (meth)acrylic acid ester and a method for producing the same. In recent years, ultraviolet curable printing inks, paints, etc. have become popular. Many types of acrylic esters are used as vehicles in these printing inks and paints. As a result of intensive research, the present inventors have obtained a novel (meth)acrylic acid ester that has a fast curing speed and is useful as a vehicle for ultraviolet curable printing inks and paints. That is, the present invention is based on (1) general formula (In the formula, R represents H or CH 3. ) A di(meth)acrylic acid ester represented by: (2) Structural formula below This is a method for producing a di(meth)acrylic ester represented by the following general formula [], which is characterized by esterifying a compound having the following with acrylic acid or methacrylic acid. More specifically, the compound having the structural formula [] used in the present invention is obtained by condensation of 2,2-dimethyl-3-oxypropanal and diglycerin. Further, acrylic acid or methacrylic acid is usually used in an amount greater than the stoichiometric ratio. Generally, the molar ratio of carboxylic acid to alcohol is 1.0 to 2.0, but preferably
It is 1.1-1.5. The reaction is promoted by using a catalyst and distilling the water produced. Such catalysts are acidic catalysts such as sulfuric acid and P-toluenesulfonic acid, and the amount used is approximately 100% relative to acrylic acid or methacrylic acid. 0.1-10 mol%, preferably 1-10 mol%
5 mol% is used. Advantageously, an azeotropic solvent is used to distill the water produced by the reaction. Such azeotropic solvents can be used as long as they have a boiling point of 60°C to 130°C and are easily separated from water, but n
Suitable are aliphatic hydrocarbons such as -hexane and n-heptane, aromatic hydrocarbons such as benzene and toluene, and cycloaliphatic hydrocarbons such as cyclohexane. The amount used is usually 5% of the reaction mixture.
~70% by weight. The reaction temperature is 60~
The temperature may be in the range of 130°C, but from the viewpoint of shortening the reaction time and preventing polymerization, it is advantageous to carry out the reaction at a temperature of 75 to 120°C. Usually, a polymerization inhibitor is already added to acrylic acid or methacrylic acid, but the polymerization inhibitor may be added again during the reaction. Such polymerization inhibitors include hydroquinone, P-methoxyphenol, 2,4-dimethyl-6-t-butylphenol, 3-hydroxythiol, α-nitroso-β-naphthol, P-benzoquinone,
Examples include 2,5-dihydroxy-P-quinone, phenothiazine, N-nitrosodiphenylamine, and copper salts. The amount used is usually 0.01 to 1% by weight based on the reaction mixture. The di(meth)acrylic acid ester of the present invention is used for industrial purposes by washing with water or aqueous alkaline solution, etc., if necessary, or by separating it from the solvent by a method such as vacuum distillation. This di(meth)acrylic acid ester [] is
Useful as vehicles for coating and ink compositions, they can be cured by radiation or by thermal means. Radiation curing can be carried out by particulate radiation, such as ionizing or electron beams, or by actinic radiation, such as ultraviolet radiation. When curing is carried out with actinic radiation, many types of photosensitizers or photoinitiators commonly known in the art are included. Radiation curing techniques and heat curing techniques are well known to those skilled in the art, and curing can be accomplished by each of them. The di(meth)acrylic acid esters of the present invention may be used alone or with other monomers such as trimethylolpropane polyacrylate, pentaerythritol polyacrylate, pentaerythritol tetraacrylate, or unsaturated group-containing resins such as unsaturated polyesters. It can be used as a vehicle by mixing with resins such as , epoxy acrylate, and urethane acrylate. The new di(meth)acrylic esters can also be polymerized by addition of organic peroxides. Examples will be described below. In the examples, parts indicate parts by weight. Example 1 In a 2 l reactor equipped with a stirrer, temperature regulator, thermometer, condenser and separator, 2,2-dimethyl-3
- 347.2 parts of a compound having the following structure, which is a condensate of oxypropanal and diglycerin 179.5 parts of acrylic acid, 20 parts of para-toluenesulfonic acid
1 part, 2 parts of hydroquinone, 480 parts of benzene, and 120 parts of cyclohexane are charged and heated. The produced water is distilled and condensed together with the solvent, and only the water is removed from the system in a separator, and the solvent is returned to the reactor. Cooling occurred when 37.3 parts of water had been produced. The reaction temperature was 80-85°C. The reaction mixture is dissolved in 384 parts of benzene and 96 parts of cyclohexane, neutralized with 20% caustic Sozo aqueous solution, and washed three times with 300 parts of 20% brine. The solvent was distilled off under reduced pressure to obtain 401 parts of a pale yellow liquid. This material has the following properties. Specific gravity (25℃) 1.1310 Viscosity (25℃) 3392CPS Saponification value 241mgKOH/g Acid value 0.06mgKOH/g Refractive index (20℃) Elemental analysis value C (%) H (%) 59.61 7.76 High resolution of the obtained product The results of absorption frequency measurements by nuclear magnetic resonance (NMR) are shown below. No. Absorption frequency (Hz) 1 2492.187 2 1972.656 3 1958.984 4 1929.687 5 1921.875 6 1650.390 7 1640.625 8 1615.234 9 1611.328 10 1564.453 11 1 550.781 12 1537.109 13 1433.593 14 1191.406 15 1158.203 16 1126.953 17 1121.093 18 1080.078 19 1076.171 20 1066.406 21 1044.9 21 22 1037.109 23 1027.343 24 1015.625 25 1011.718 26 1005.859 27 947.265 28 583.984 29 578.125 30 574.218 31 570.312 32 564.453 33 509.765 34 353.515 35 310.546 36 289.052 37 −1.953 In the above measurement, tetramethylsilane was used as the reference material and chloroform was used as the solvent. Using H 1 ,
A coupled measurement of C 13 -H was performed, and the results finally showed the identification of the D couple of C 13 . Among the above absorptions, Nos. 14, 15, and 16 indicate the absorption peak positions of the solvent. Example 2 Into the same reactor as in Example 1, 347.2 parts of a compound having the following structure, which is a condensate of 2,2-dimethyl-3-oxypropanal and diglycerin, was added. 214.4 parts of methacrylic acid, P-toluenesulfonic acid
20 parts of hydroquinone, 3 parts of hydroquinone, and 600 parts of toluene are charged and heated. The produced water is distilled and condensed together with the solvent, and only the water is removed from the system in a separator, and the solvent is returned to the reactor. Cooling occurred when 37.3 parts of water had been produced. The reaction temperature was 111°C to 118°C. The reaction mixture is dissolved in 500 parts of toluene, neutralized with 20% aqueous sodium hydroxide solution, and washed three times with 400 parts of 20% aqueous sodium chloride solution. The solvent was distilled off under reduced pressure to obtain 427.4 parts of a pale yellow liquid. This material has the following properties. Specific gravity (25℃) 1.1070 Viscosity (25℃) 1200CPS Saponification value 213.1mgKOH/g Acid value 0.01 mgKOH/g Refractive index (20℃) Elemental analysis value C (%) H (%) 61.19 8.21 NMR measurement results No. Absorption Frequency (Hz) 1 2511.718 2 2050.781 3 2046.875 4 1892.578 5 1882.812 6 1654.296 7 1632.812 8 1619.140 9 1615.234 10 1568.359 11 1437 .500 12 1193.359 13 1160.156 14 1128.906 15 1123.046 16 1082.031 17 1078.125 18 1052.734 19 1046.875 20 1042.968 21 1017.578 22 1013.671 23 1007.823 24 984.375 25 964.843 26 583.984 27 578.125 28 572.265 29 568.359 30 366.406 31 511.718 32 312.500 33 291.015 34 275.390 35 0.000 Among the above absorptions, No. 12, 13, and 14 indicate the absorption peak positions of the solvent. Application Examples 1 and 2, Comparative Application Examples 1 to 3 To 60 parts of the novel di(meth)acrylic acid ester obtained in Examples 1 and 2, epoxy acrylate resin (Epicoat 828 (bisphenol manufactured by Ciel Petrochemical Co., Ltd.) 40 parts of resin (obtained by esterifying a type epoxy resin) with acrylic acid, 3 parts of IRGAKURE 184 (manufactured by Ciba Geigy) as a photosensitizer were added, and the mixture was coated on a steel panel, and a high-pressure mercury lamp (manufactured by Toshiba) was added. , 2KW). The results are shown in Table 1 below. As a comparative example, with the same composition as above, polyethylene glycol diacrylate (manufactured by Nippon Kayaku Co., Ltd., product name:
The table below also shows the curing results of PEG400DA), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., product name HDDA), and neopentyl glycol diacrylate (manufactured by Nippon Kayaku Co., Ltd., product name NPGDA). Shown in 1.
【表】【table】
【表】
通過させた時の指触乾燥するまでの水銀
灯の通過回数。
[Table] Number of times a mercury lamp passes until it is dry to the touch.
Claims (1)
酸でエステル化する事を特徴とする下記一般式
〔〕で表わされるジ(メタ)アクリル酸エステ
ルの製造方法。 [Claims] 1. General formula (In the formula, R represents H or CH 3. ) A di(meth)acrylic acid ester represented by: 2 Structural formula below A method for producing a di(meth)acrylic acid ester represented by the following general formula [], which comprises esterifying a compound having the following with acrylic acid or methacrylic acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58084606A JPS59210079A (en) | 1983-05-14 | 1983-05-14 | Di(meth)acrylic acid ester and its preparation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58084606A JPS59210079A (en) | 1983-05-14 | 1983-05-14 | Di(meth)acrylic acid ester and its preparation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59210079A JPS59210079A (en) | 1984-11-28 |
| JPH0368871B2 true JPH0368871B2 (en) | 1991-10-30 |
Family
ID=13835342
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58084606A Granted JPS59210079A (en) | 1983-05-14 | 1983-05-14 | Di(meth)acrylic acid ester and its preparation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59210079A (en) |
-
1983
- 1983-05-14 JP JP58084606A patent/JPS59210079A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59210079A (en) | 1984-11-28 |
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