JPH0368959B2 - - Google Patents

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Publication number
JPH0368959B2
JPH0368959B2 JP16767484A JP16767484A JPH0368959B2 JP H0368959 B2 JPH0368959 B2 JP H0368959B2 JP 16767484 A JP16767484 A JP 16767484A JP 16767484 A JP16767484 A JP 16767484A JP H0368959 B2 JPH0368959 B2 JP H0368959B2
Authority
JP
Japan
Prior art keywords
nickel
aqueous solution
toc
concentration
wastewater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16767484A
Other languages
Japanese (ja)
Other versions
JPS6148588A (en
Inventor
Hiroshi Tao
Takeshi Nakagawa
Teruaki Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP16767484A priority Critical patent/JPS6148588A/en
Publication of JPS6148588A publication Critical patent/JPS6148588A/en
Publication of JPH0368959B2 publication Critical patent/JPH0368959B2/ja
Granted legal-status Critical Current

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  • Electrolytic Production Of Metals (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 本発明はニツケルめつき排水を浄液し、特に合
計有機炭素(以下TOCと略称する)を減少させ
てこれをニツケル電解精製用の補給液として再生
する方法に関する。 〔従来の技術〕 このめつき排水は、中小企業のめつき工場等に
おいて発生するめつき洗浄水等を濃縮したものが
対象となる。該排水のニツケル濃度は比較的濃厚
なものとして受け入れられるが不純物として多量
のTOC等を含有する。 従つて、このめつき排水をそのまゝニツケルの
電解系に供給すると、電解液中のTOC濃度に起
因するものと思われる各種のトラブルが発生す
る。例えば電解によつてNi種板に電着したニツ
ケルが剥離したり該ニツケルな硬度が高くなる等
である。 上記の現象を避けるためには、ニツケルめつき
排水を極く小量ずつしか電解液に補給することが
できないので実用的とは云えなかつた。 他の方法としては、このニツケルめつき排水に
アルカリを加えてニツケルを水酸化物として分離
し、次いで焙焼したのち電気炉で溶解してアノー
ドとし、造液電解する方法もあるが、この方法は
煩雑で且つコスト高になるという欠点があつた。 〔発明が解決しようとする問題点〕 本発明の目的は、上記の問題点を解消し、簡便
な方法によつて該めつき排水からニツケル電解精
製の電解液に比較的多量に添加して使用できる硫
酸ニツケル水溶液を得る方法を提供することにあ
る。 〔問題点を解決するための手段〕 本願発明者等は、電気ニツケルをうるための電
解液中のTOC濃度が、得られるニツケル電着物
の性状に及ぼす影響について実験を行なつたとこ
ろ、通常ニツケル電解液のNi濃度65〜75g/
の場合TOC濃度は4ppm以下とする必要があるこ
とを知見した。 TOC濃度がこれ以上の場合、前述した現象が
大なり小なり現われる。そこでニツケルめつき排
水を再生して得たNi濃度65〜75g/の硫酸ニ
ツケル水溶液を、ニツケル電解精製のため該電解
槽から取り出した電解液に対して容量で約1/10ず
つ添加できるようにするためには、ニツケルめつ
き排水を再生して得た硫酸ニツケル水溶液中の
TOC濃度が40ppm以下となるようにすればよい。 即ち、本発明はこのような硫酸ニツケル水溶液
を、ニツケルめつき排水から得られるようにする
ため、PH8.0〜9.0のアルカリ水溶液を40℃以上に
保持し撹拌されている状態の該水溶液に、ニツケ
ルめつき排水と炭酸アルカリ水溶液又は水酸化ア
ルカリ水溶液とを同時に、該水溶液のPH及び温度
を維持しながら、該水溶液の底部に吹き込むよう
にして添加し、生成した沈殿を温水によるレパル
プ洗浄と、洗浄水を分離する脱水操作を複数回行
ない、少なくとも最終脱水操作で付着水分35重量
%以下としたのち希硫酸に溶解しニツケル濃度を
ニツケルの電解精製に適する濃度に調整するよう
にしたことにある。 〔作用〕 本発明の方法においてPH8〜9.0の範囲で反応
させる理由は、PHがこれより低いと塩基性硫酸塩
との複塩を一部生成し、これより高いPHでは
TOCの除去が不充分となるからである。 反応温度を40℃以上好ましくは60℃以上とする
のは、これ以上では生成物の濾過速度が遅いため
である。 次にまず反応槽に少量のアルカリ水溶液を用意
し、これにニツケルめつき排水と炭酸アルカリ塩
又は水酸化アルカリ塩の水溶液を、PH値と温度を
保持して同時に吹き込むようにして添加するの
は、従来法のように例えば濃厚なアルカリ水溶液
に所定温度のニツケルめつき排水を添加すると局
部的に濃厚なアルカリとニツケルとの反応が進行
し、正常な炭酸塩または水酸化物が生成しないた
めかTOC等の除去率が大幅に低下するためであ
る。 炭酸塩又は水酸化物として沈殿したニツケルの
沈殿は強力な吸引濾過法或は遠心分離法により母
液と分離し、得られたケーキは初工程の温度と同
様な温度の温水を大量に加えてレパルプしたのち
洗浄水を分離する脱水操作を2回以上行なう。吸
引濾過法を強力に適用する。このときの最終脱水
操作では付着水分35重量%以下となるようにし、
この洗浄脱水操作を2回以上行なうのは、1回で
は不充分で、2回以上で最終脱水操作で付着水分
35重量%以下とすることにより、TOCの除去が、
後に、この沈殿を希硫酸に溶解しニツケル濃度を
ニツケルの電解精製に適する濃度に調整したとき
にTOCの濃度が約40ppm以下とすることが可能
となるからである。 〔実施例〕 以下実施例について説明する。 実施例 1 容量10のビーカーに、水に炭酸ナトリウム水
溶液を加えて調整した所定のPHで50℃の水溶液各
500mlを入れ、これをスリーワンモーターで撹拌
しながら、ニツケル84g/、TOC6.6g/の
ニツケルめつき排水と150g/の炭酸ナトリウ
ム水溶液とを常温で夫々ローラーポンプを用い、
該めつき排水は1分間当り400〜500ml、こるに対
するアルカリは夫々1.05〜1.1当量、同時にビー
カーの底部に吹き込むようにして添加し、この間
該容器内は湯煎器で50℃に保持し、PHは平間理化
製のPHコントローラーにより炭酸ナトリウム水溶
液の添加をON−OFFさせながら所定PH値に保持
しつつ各5のニツケルめつき排水を処理し、反
応液の滞留時間は変動させ得られたスラリーは吸
引濾過器(ヌツチエ)で濾過した。 次に得られたケーキは、100g当り600ml、50℃
の温度で各30分間レパルプ洗浄を夫々行ない、そ
の都度吸引濾過器で濾過し、最終回の濾過はケー
キの保有水分が30重量%程度となるまで吸引によ
り脱水した。このようにして得られたケーキは
1.1当量の希硫酸で溶解し、更に水を加えてNi75
g/の水溶液とし、そのTOCをJIS規格に基ず
いて定量した。その結果を第1表に示す。
[Industrial Field of Application] The present invention relates to a method for purifying nickel plating wastewater, particularly reducing total organic carbon (hereinafter abbreviated as TOC), and regenerating it as a replenishment liquid for nickel electrolytic refining. [Prior Art] This plating wastewater is concentrated plating washing water etc. generated in plating factories of small and medium-sized enterprises. Although the nickel concentration of the wastewater is accepted as relatively high, it contains a large amount of TOC and the like as impurities. Therefore, if this plating wastewater is supplied as is to the nickel electrolyte system, various problems will occur that are thought to be caused by the TOC concentration in the electrolyte. For example, the nickel electrodeposited on the Ni seed plate may peel off due to electrolysis, or the hardness of the nickel may increase. In order to avoid the above-mentioned phenomenon, it is not practical to replenish the electrolyte with the nickel-plated wastewater only in very small amounts. Another method is to add alkali to this nickel-plated wastewater to separate the nickel as hydroxide, then roast it and melt it in an electric furnace to form an anode, followed by electrolysis to form a liquid. has the drawbacks of being complicated and expensive. [Problems to be Solved by the Invention] The purpose of the present invention is to solve the above-mentioned problems, and to add a relatively large amount of the plating wastewater to the electrolytic solution of nickel electrolytic refining using a simple method. The object of the present invention is to provide a method for obtaining an aqueous nickel sulfate solution. [Means for Solving the Problems] The inventors of the present application conducted an experiment on the influence of the TOC concentration in the electrolytic solution for obtaining electrical nickel on the properties of the resulting nickel electrodeposit. Electrolyte Ni concentration 65-75g/
It was found that the TOC concentration needs to be 4 ppm or less in this case. If the TOC concentration is higher than this, the above-mentioned phenomenon will occur to a greater or lesser extent. Therefore, a nickel sulfate aqueous solution with a Ni concentration of 65 to 75 g/N obtained by regenerating nickel plating wastewater can be added at a rate of about 1/10 of the volume to the electrolyte taken out from the electrolytic tank for nickel electrolytic refining. In order to
The TOC concentration should be 40 ppm or less. That is, in the present invention, in order to obtain such a nickel sulfate aqueous solution from nickel plating wastewater, an alkaline aqueous solution with a pH of 8.0 to 9.0 is maintained at 40°C or higher and stirred, and then added to the aqueous solution while being stirred. Nickel plating wastewater and an aqueous alkali carbonate solution or an aqueous alkali hydroxide solution are added at the same time by blowing into the bottom of the aqueous solution while maintaining the pH and temperature of the aqueous solution, and the resulting precipitate is repulped with hot water, The dehydration operation to separate the washing water is performed multiple times, and after the adhering moisture is reduced to at least 35% by weight in the final dehydration operation, it is dissolved in dilute sulfuric acid and the nickel concentration is adjusted to a concentration suitable for electrolytic refining of nickel. . [Function] The reason why the reaction is carried out in the pH range of 8 to 9.0 in the method of the present invention is that when the pH is lower than this, some double salts with basic sulfate are formed, and when the pH is higher than this,
This is because TOC removal becomes insufficient. The reason why the reaction temperature is set to 40°C or higher, preferably 60°C or higher is because the filtration rate of the product is slow at higher temperatures. Next, first prepare a small amount of alkaline aqueous solution in the reaction tank, and add nickel plating wastewater and aqueous solution of alkali carbonate or alkali hydroxide to it by simultaneously blowing into it while maintaining the pH value and temperature. For example, if nickel plating wastewater at a predetermined temperature is added to a concentrated alkaline aqueous solution as in the conventional method, the reaction between the concentrated alkali and nickel proceeds locally, and normal carbonates or hydroxides are not produced. This is because the removal rate of TOC etc. is significantly reduced. The nickel precipitate as carbonate or hydroxide is separated from the mother liquor by strong suction filtration or centrifugation, and the resulting cake is repulped by adding a large amount of hot water at the same temperature as the initial process. After that, a dehydration operation to separate the washing water is performed two or more times. Apply a strong suction filtration method. At this time, in the final dehydration operation, the adhering moisture should be 35% by weight or less,
It is recommended to perform this washing and dehydration operation two or more times, as one time is not sufficient, and doing so twice or more will remove the adhering moisture in the final dehydration operation.
By setting the content to 35% by weight or less, TOC removal can be improved.
This is because when this precipitate is later dissolved in dilute sulfuric acid and the nickel concentration is adjusted to a concentration suitable for electrolytic refining of nickel, the TOC concentration can be reduced to about 40 ppm or less. [Example] Examples will be described below. Example 1 Into a beaker with a capacity of 10, add each aqueous solution at a predetermined pH and temperature of 50°C, which was adjusted by adding an aqueous sodium carbonate solution to water.
Add 500 ml of nickel, stir with a three-one motor, and add 84 g of nickel/TOC, 6.6 g/of nickel-plated waste water, and 150 g of sodium carbonate aqueous solution at room temperature using a roller pump.
Add 400 to 500 ml of wastewater per minute and 1.05 to 1.1 equivalents of alkali per minute to the bottom of the beaker at the same time. During this time, the inside of the container was kept at 50℃ with a water bath, and the pH was Using a PH controller manufactured by Hirama Rika, the addition of the sodium carbonate aqueous solution was turned ON and OFF while maintaining the specified PH value while treating each of the 5 nickel plating wastewaters.The residence time of the reaction liquid was varied and the resulting slurry was sucked out. It was filtered using a filter (Nutsche). Next, the cake obtained was 600 ml per 100 g, 50°C.
Repulp washing was carried out for 30 minutes each at a temperature of , and each time the cake was filtered using a suction filter, and in the final filtration, the cake was dehydrated by suction until the moisture content of the cake was about 30% by weight. The cake obtained in this way is
Dissolve Ni75 in 1.1 equivalent of dilute sulfuric acid and add water.
g/g/ of an aqueous solution, and its TOC was determined based on JIS standards. The results are shown in Table 1.

【表】 第1表より明らかなように当初6.6g/もあ
つたTOCを期待値30ppm以下に、いずれも確実
にクリヤーした。 実施例 2 85g/のNi、12g/のTOCを含むニツケ
ルめつき排水を、アルカリとして200g/の水
酸化ナトリウム水溶液を使用し、反応温度を60℃
とした以外は実施例1と同様にして脱TOCの処
理を行なつた。その結果を第2表に示す。但し実
験No.9は2回とも通常の軽い吸引濾過を行なつた
ものである。
[Table] As is clear from Table 1, the TOC, which was initially as high as 6.6 g/mt, was reduced to the expected value of 30 ppm or less, and was clearly cleared in all cases. Example 2 Nickel plating wastewater containing 85 g/Ni and 12 g/TOC was reacted at a reaction temperature of 60°C using 200 g/Aqueous sodium hydroxide solution as an alkali.
TOC removal treatment was carried out in the same manner as in Example 1, except for the following. The results are shown in Table 2. However, in Experiment No. 9, ordinary light suction filtration was performed both times.

【表】 第2表を見て判るように原料中のTOC濃度が
実施例1の約2倍と濃厚になつても、殆んど同様
の除去率でTOCを分解除去しTOC濃度約20〜
30ppmと低濃度のものが得られた。以上実施例1
及び2はレパルプ洗浄脱水操作を2回行なつた場
合であり、レパルプ洗浄脱水操作の回数をさらに
多くすると、よりTOCの低いニツケル再生液を
得ることが可能である。通常の濾過法を適用した
実験No.9は洗浄脱水方法及び回収が同じでも
TOCの除去が不良であつた。 ちなみに第1表試料No.2及び第2表試料No.5の
場合洗浄脱水操作1回のケーキを硫酸で溶解し
Ni75g/の水溶液とした際のTOC濃度は夫々
220ppm、160ppmであつた。 〔発明の効果〕 このようにニツケルめつき排水中のTOC除去
は、一般的な不純物の除去と比較すると極めて困
難であるが、本発明法を適用すると99.5重量%以
上が除去され得られる再生電解液中のTOC濃度
は、マツト電解を行なう際の電解液の濃度65〜75
g/Niの場合TOC10〜30ppmまで低下させる
ことができる。 実施例としては特に示さなかつたが、本発明法
の適用によつて他の不純物(アルカリ添加により
沈殿しないもの)も同時に除去されるという利点
も得られる。尚、該めつき排水より回収されるニ
ツケルの収率は99.5重量%以上である。 本発明法で得られる再生ニツケル水溶液は、そ
のまゝニツケルマツト電解槽より抜き出し電解廃
液として浄液したのち、該電解槽に給液される上
記電解廃液と合流させて何ら支障なく使用するこ
とができる。
[Table] As can be seen from Table 2, even if the TOC concentration in the raw material was about twice as high as in Example 1, the TOC was decomposed and removed with almost the same removal rate, and the TOC concentration was about 20 ~
A low concentration of 30ppm was obtained. Above example 1
and 2 are cases where the repulp washing and dehydration operation was performed twice, and by increasing the number of repulp washing and dehydration operations, it is possible to obtain a nickel regenerated liquid with a lower TOC. In Experiment No. 9, which applied the normal filtration method, even though the washing and dehydration method and recovery were the same,
TOC removal was inadequate. By the way, in the case of sample No. 2 in Table 1 and sample No. 5 in Table 2, the cake that had been washed and dehydrated once was dissolved in sulfuric acid.
The TOC concentration when making an aqueous solution of Ni75g/
They were 220ppm and 160ppm. [Effects of the invention] As described above, TOC removal from nickel-plated wastewater is extremely difficult compared to the removal of general impurities, but when the method of the present invention is applied, more than 99.5% by weight can be removed and the resulting recycled electrolytic The TOC concentration in the solution is 65 to 75 when performing matt electrolysis.
In the case of g/Ni, the TOC can be lowered to 10 to 30 ppm. Although not specifically shown in the examples, application of the method of the present invention also provides the advantage that other impurities (those that do not precipitate due to the addition of alkali) are also removed at the same time. The yield of nickel recovered from the plating wastewater is 99.5% by weight or more. The recycled nickel aqueous solution obtained by the method of the present invention can be used without any problem by being extracted from the nickel pine electrolytic cell as it is, purified as an electrolytic waste liquid, and then combined with the electrolytic waste liquid supplied to the electrolytic cell. .

Claims (1)

【特許請求の範囲】[Claims] 1 PH8.0〜9.0のアルカリ水溶液を40℃以上に保
持し、撹拌されている状態の該水溶液に、ニツケ
ルめつき排水と炭酸アルカリ水溶液又は水酸化ア
ルカリ水溶液とを同時に、該水溶液のPH及び温度
を維持しつつ該水溶液の底部に吹き込むようにし
て添加し、生成した沈殿を温水によるレパルプ洗
浄と、洗浄物からの脱水操作とを複数回行ない最
終脱水操作で付着水分35重量%以下としたのち希
硫酸に溶解しニツケル濃度をニツケルの電解精製
に適する濃度に調整することを特徴とするニツケ
ルめつき排水をニツケルの電解精製用補給液とし
て再生する方法。
1. Keep an alkaline aqueous solution with a pH of 8.0 to 9.0 above 40°C, and add nickel plating wastewater and an alkali carbonate aqueous solution or an alkali hydroxide aqueous solution to the aqueous solution while stirring, and adjust the pH and temperature of the aqueous solution. It is added to the bottom of the aqueous solution by blowing it into the bottom of the aqueous solution while maintaining the water content, and the precipitate formed is repulped with warm water and dehydrated from the washed material several times to reduce the adhering moisture to 35% by weight or less in the final dehydration operation. A method for regenerating nickel-plated wastewater as a replenishment liquid for electrolytic refining of nickel, characterized by dissolving it in dilute sulfuric acid and adjusting the concentration of nickel to a concentration suitable for electrolytic refining of nickel.
JP16767484A 1984-08-09 1984-08-09 Method for regenerating waste water after nickel plating as replenisher for electrolytic refining of nickle Granted JPS6148588A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16767484A JPS6148588A (en) 1984-08-09 1984-08-09 Method for regenerating waste water after nickel plating as replenisher for electrolytic refining of nickle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16767484A JPS6148588A (en) 1984-08-09 1984-08-09 Method for regenerating waste water after nickel plating as replenisher for electrolytic refining of nickle

Publications (2)

Publication Number Publication Date
JPS6148588A JPS6148588A (en) 1986-03-10
JPH0368959B2 true JPH0368959B2 (en) 1991-10-30

Family

ID=15854112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16767484A Granted JPS6148588A (en) 1984-08-09 1984-08-09 Method for regenerating waste water after nickel plating as replenisher for electrolytic refining of nickle

Country Status (1)

Country Link
JP (1) JPS6148588A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5585786B2 (en) * 2011-06-08 2014-09-10 住友金属鉱山株式会社 Measuring method of total organic carbon
CN104005049B (en) * 2014-05-30 2016-08-17 成都易态科技有限公司 The electrowinning with insoluble anode production technology of nickel

Also Published As

Publication number Publication date
JPS6148588A (en) 1986-03-10

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