JPH03689B2 - - Google Patents
Info
- Publication number
- JPH03689B2 JPH03689B2 JP10442783A JP10442783A JPH03689B2 JP H03689 B2 JPH03689 B2 JP H03689B2 JP 10442783 A JP10442783 A JP 10442783A JP 10442783 A JP10442783 A JP 10442783A JP H03689 B2 JPH03689 B2 JP H03689B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic permeability
- magnetic
- high magnetic
- nonmagnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000035699 permeability Effects 0.000 claims description 53
- 230000005415 magnetization Effects 0.000 claims description 10
- 239000000853 adhesive Substances 0.000 claims description 9
- 230000001070 adhesive effect Effects 0.000 claims description 9
- 229920002120 photoresistant polymer Polymers 0.000 description 21
- 239000003822 epoxy resin Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 229920000647 polyepoxide Polymers 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000007517 polishing process Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 229960002089 ferrous chloride Drugs 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/1278—Structure or manufacture of heads, e.g. inductive specially adapted for magnetisations perpendicular to the surface of the record carrier
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は磁気記録方式の垂直磁化記録において
磁気記録媒体の膜面に信号を垂直方向に磁化し、
記録および再生するために使用される垂直磁化記
録用ヘツドに関するものである。[Detailed Description of the Invention] Industrial Application Field The present invention perpendicularly magnetizes a signal on the film surface of a magnetic recording medium in perpendicular magnetization recording using a magnetic recording method.
The present invention relates to a perpendicular magnetization recording head used for recording and reproducing.
従来例の構成とその問題点
第１図に代表的な垂直磁化記録ヘツドを示す。
有機フイルム１上に垂直異方性を有する磁性層２
が形成されている記録媒体７に対し、主磁極８お
よび補助磁極９が記録媒体７の両側から挟み込ん
で配置され、主磁極８の非磁性ブロツク５の中に
設置された高透磁率膜６の先端が記録媒体７に近
接して走行する。記録は補助磁極９の高透磁率ブ
ロツク３に巻かれたコイル４に流れた信号電流に
よつて補助磁極９から磁界が発生し、その磁界に
より主磁極８の高透磁率膜６が磁化し、その磁界
によつて記録媒体７に接した部分の磁性層２が磁
化し、記録される。再生は全くこの逆の過程を経
て、補助磁極９にあるコイル４より再生信号を得
る。このような機能を有する主磁極９の記録媒体
７側からみた断面図を第２図に示す。図において
５は非磁性ブロツクで、高透磁率膜６をエポキシ
系の接着剤１０で挟み込むような形状になつてい
る。しかしながら、上記のような主磁極は、記録
媒体７とのあたりをよくするため、表面を研磨す
る工程があるが、その工程で図のａで示すような
クラツクが高透磁率膜６と非磁性ブロツク５との
界面で発生する。さらにそれが高透磁率膜６のク
ラツクへと発展する。こういうクラツクが発生し
た場合、主磁極の磁気的特性を著しくそこなうこ
とは勿論のこと、主磁極の耐久性においても寿命
の短いものとなつていた。Conventional structure and problems thereof FIG. 1 shows a typical perpendicular magnetization recording head.
Magnetic layer 2 having perpendicular anisotropy on organic film 1
A main magnetic pole 8 and an auxiliary magnetic pole 9 are arranged to sandwich the recording medium 7 from both sides of the recording medium 7. The leading end runs close to the recording medium 7. In recording, a magnetic field is generated from the auxiliary magnetic pole 9 by a signal current flowing through the coil 4 wound around the high magnetic permeability block 3 of the auxiliary magnetic pole 9, and the high magnetic permeability film 6 of the main magnetic pole 8 is magnetized by the magnetic field. Due to the magnetic field, the portion of the magnetic layer 2 in contact with the recording medium 7 is magnetized and recorded. For reproduction, a reproduction signal is obtained from the coil 4 in the auxiliary magnetic pole 9 through a completely reverse process. FIG. 2 shows a cross-sectional view of the main magnetic pole 9 having such a function as viewed from the recording medium 7 side. In the figure, reference numeral 5 denotes a non-magnetic block, which has a shape such that a high magnetic permeability film 6 is sandwiched between epoxy adhesives 10. However, in order to improve contact with the recording medium 7, the main magnetic pole described above requires a process of polishing the surface, but in this process, cracks as shown in a in the figure occur between the high magnetic permeability film 6 and the non-magnetic material. This occurs at the interface with block 5. This further develops into a crack in the high magnetic permeability film 6. When such a crack occurs, it goes without saying that the magnetic properties of the main pole are significantly impaired, and the durability of the main pole is also shortened.
発明の目的
本発明は以上のような欠点を解消するもので、
主磁極の高透磁率膜のクラツクを防止し、記録再
生時の出力や周波数特性を安定化すると同時に長
時間の使用に耐える主磁極を有する垂直磁化記録
用ヘツドを提供することを目的とする。Purpose of the invention The present invention solves the above-mentioned drawbacks.
It is an object of the present invention to provide a perpendicular magnetization recording head having a main magnetic pole that prevents cracks in the high magnetic permeability film of the main magnetic pole, stabilizes output and frequency characteristics during recording and reproduction, and can withstand long-term use.
発明の構成
本発明による基本構成は、非磁性ブロツクの表
面に高透磁率膜を形成したいわゆる垂直磁化記録
用主磁極で、２個の非磁性ブロツクが接着剤を用
いて接着され、前記非磁性ブロツクの一方の接着
面側の表面に、高透磁率膜と非磁性膜とを有し、
非磁性膜が高透磁率膜の少なくとも端面をはさみ
こむ形で形成されていることを特徴とするもので
ある。本構成のヘツドでは、主磁極の研磨工程時
や、記録媒体との長時間の主磁極先端部の接触に
おいて、高透磁率膜にクラツクが入らないことを
実現できるようにしたもので、それによつて、良
好な磁気特性をもちながら、耐久性のある主磁極
を提供できるものである。Structure of the Invention The basic structure of the present invention is a so-called main magnetic pole for perpendicular magnetization recording in which a high magnetic permeability film is formed on the surface of a non-magnetic block. The block has a high magnetic permeability film and a non-magnetic film on the surface of one adhesive side,
It is characterized in that the nonmagnetic film is formed to sandwich at least the end faces of the high magnetic permeability film. In the head with this configuration, it is possible to prevent cracks from forming in the high magnetic permeability film during the polishing process of the main pole or when the tip of the main pole is in contact with the recording medium for a long time. Therefore, it is possible to provide a durable main pole while having good magnetic properties.
実施例の説明
以下本発明の一実施例について図面を参照しな
がら説明する。第３図は本発明の一実施例におけ
る主磁極の記録媒体側からみた断面図を製造工程
順に示すものである。DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 3 is a cross-sectional view of the main pole in an embodiment of the present invention, viewed from the recording medium side, in the order of manufacturing steps.
第３図ａにおいてまずAl2O3やSiC等のセラミ
ツクの材料から２mm×11mm×１mmの角形に切り出
された非磁性ブロツク１１の表面をダイヤモンド
ペーストで研磨する。次に蒸着、スパツター法に
よつて高透磁率膜（この場合パーマロイ膜を実施
例とする）１２を前記非磁性ブロツク１１の研磨
面上に1μm厚みで形成する。次にホトレジスト１
３を塗布し、所定のパターンを露光、現像する。
次に塩化第一鉄の溶液中でパーマロイ膜をエツチ
ング除去する。この時ホトレジスト１３はそのま
ま残存させておく。この状態が第３図ａである。 In FIG. 3a, first, the surface of a non-magnetic block 11 cut out of a ceramic material such as Al 2 O 3 or SiC into a square shape of 2 mm x 11 mm x 1 mm is polished with diamond paste. Next, a high magnetic permeability film (permalloy film is used as an example) 12 is formed to a thickness of 1 μm on the polished surface of the nonmagnetic block 11 by vapor deposition or sputtering. Next, photoresist 1
3 is applied, and a predetermined pattern is exposed and developed.
Next, the permalloy film is removed by etching in a ferrous chloride solution. At this time, the photoresist 13 is left as is. This state is shown in FIG. 3a.
次に第３図ｂに示すように、ホトレジスト１３
を含む非磁性ブロツク１１の表面全体にCr，Cu，
Ti，Al等の非磁性膜１４を蒸着し、スパツタ法
で1μm厚みで形成する。 Next, as shown in FIG. 3b, the photoresist 13
Cr, Cu,
A non-magnetic film 14 made of Ti, Al, etc. is deposited to a thickness of 1 μm using a sputtering method.
次に、レジスト除去液でホトレジスト１３を除
去するとレジスト１３上の非磁性膜１４も同時に
除去される。この状態を第３図ｃに示す。 Next, when the photoresist 13 is removed using a resist removal solution, the nonmagnetic film 14 on the resist 13 is also removed at the same time. This state is shown in FIG. 3c.
次に第３図ｄの如く、エポキシ系の樹脂１５を
表面に塗布した非磁性ブロツク１１′を、前述の
高透磁率膜１２および非磁性膜１４の表面に接着
する。 Next, as shown in FIG. 3d, a nonmagnetic block 11' whose surface is coated with epoxy resin 15 is adhered to the surfaces of the high magnetic permeability film 12 and nonmagnetic film 14 described above.
次にダイヤモンドペーストを主体とした研磨剤
で主磁極の表面を研磨する。 Next, the surface of the main pole is polished with an abrasive mainly composed of diamond paste.
第３図ｄに示すような構成の本実施例によれば
高透磁率膜１２の非磁性ブロツク１１と接触して
いる部分にエポキシ系の樹脂１５が入らないよう
に非磁性膜１４が配置されているので、前述の主
磁極の研磨工程においても研磨剤の粒子が高透磁
率膜１２と非磁性ブロツク１１との界面から入る
ことがなく非磁性ブロツク１１と高透磁率膜１２
との間にハクリ現象やクラツクが入らない。それ
によつて主磁極の歩留りを向上できるのみなら
ず、長時間の耐久性テストに耐える主磁極を提供
することができる。 According to this embodiment having the configuration shown in FIG. 3d, the nonmagnetic film 14 is arranged so that the epoxy resin 15 does not enter the part of the high magnetic permeability film 12 that is in contact with the nonmagnetic block 11. Therefore, even in the polishing process of the main pole described above, particles of the abrasive do not enter from the interface between the high magnetic permeability film 12 and the non-magnetic block 11, and the non-magnetic block 11 and the high magnetic permeability film 12
There is no peeling phenomenon or crack between the two. This not only improves the yield of the main magnetic pole, but also provides a main magnetic pole that can withstand long-term durability tests.
次に本発明の第２の実施例について図面を参照
しながら説明する。第４図は本発明の第２の実施
例における主磁極の記録媒体側からみた断面図を
製造工程順に示すものである。 Next, a second embodiment of the present invention will be described with reference to the drawings. FIG. 4 is a cross-sectional view of the main pole in a second embodiment of the present invention, viewed from the recording medium side, in the order of manufacturing steps.
第４図ａにおいてAl2O3やSiC等のセラミツク
の材料から２mm×11mm×１mmの角型に切り出され
た非磁性ブロツク１１の表面をダイヤモンドペー
ストで研磨した後、蒸着、スパツター法によつて
高透磁率膜１２を前記非磁性ブロツク１１の研磨
面上に1μm厚みで形成する。次にホトレジストを
塗布し、所定のパターンで露光、現像する。 In FIG. 4a, the surface of a nonmagnetic block 11 cut into a square shape of 2 mm x 11 mm x 1 mm from a ceramic material such as Al 2 O 3 or SiC is polished with diamond paste, and then polished by vapor deposition or sputtering. A high magnetic permeability film 12 is formed on the polished surface of the nonmagnetic block 11 to a thickness of 1 μm. Next, photoresist is applied, exposed and developed in a predetermined pattern.
次に高透磁率膜１２をエツチング除去する（第
４図ａ参照）。 Next, the high magnetic permeability film 12 is removed by etching (see FIG. 4a).
次に第４図ｂに示すように、非磁性ブロツク１
１の表面で高透磁率膜１２の近傍のみに開口部
（たとえば高透磁率膜１２の側端面から50μm位の
大きさ）をもつホトレジスト１６を形成する（第
４図ｂ参照）。 Next, as shown in FIG. 4b, the non-magnetic block 1
A photoresist 16 having an opening (for example, about 50 μm from the side end face of the high magnetic permeability film 12) is formed on the surface of the high magnetic permeability film 12 only in the vicinity of the high magnetic permeability film 12 (see FIG. 4b).
次にその上に非磁性膜１７を蒸着又はスパツタ
法で1μm厚みで形成する（第４図ｃ参照）。 Next, a nonmagnetic film 17 is formed thereon to a thickness of 1 μm by vapor deposition or sputtering (see FIG. 4c).
次に第４図ｄで示すように、レジスト除去液で
ホトレジスト１３およびホトレジスト１６を除去
すると、レジスト上の非磁性膜１７も同時に除去
されるが、高透磁率膜１２の近傍の開口部に形成
された非磁性膜１７のみが残存する（第４図ｄ参
照）。 Next, as shown in FIG. 4d, when the photoresist 13 and the photoresist 16 are removed using a resist removal solution, the non-magnetic film 17 on the resist is also removed at the same time, but the non-magnetic film 17 formed in the opening near the high magnetic permeability film 12 is removed. Only the nonmagnetic film 17 that has been removed remains (see FIG. 4d).
次にエポキシ系の樹脂１８を表面に塗布した非
磁性ブロツク１１を、前述の高透磁率膜１２およ
び非磁性膜１７の表面に接着する（第４図ｅ参
照）。 Next, a nonmagnetic block 11 whose surface is coated with epoxy resin 18 is adhered to the surfaces of the high magnetic permeability film 12 and nonmagnetic film 17 (see FIG. 4e).
次にダイヤモンドペーストを主体とした研磨剤
で主磁極の表面を研磨する。 Next, the surface of the main pole is polished with an abrasive mainly composed of diamond paste.
本実施例によれば、第１の実施例と同様に高透
磁率膜１２の近傍に非磁性膜１７があるため高透
磁率膜１２にクラツクが入ることを防止できると
同時に、第１の実施例では接着剤が２つの非磁性
ブロツクを高透磁率膜１２や非磁性膜１７を介し
て接続させていたが、さらに直接的に非磁性ブロ
ツク１１，１１′間の接続を行なえる部分がある
ので、強度的に強い主磁極を提供することができ
る。なおこの場合においても磁気的特性は第１の
実施例と同様の特性が得られるのはいうまでもな
い。 According to this embodiment, since the non-magnetic film 17 is provided near the high magnetic permeability film 12 as in the first embodiment, it is possible to prevent cracks from entering the high magnetic permeability film 12, and at the same time, it is possible to prevent cracks from entering the high magnetic permeability film 12. In the example, the adhesive connects two non-magnetic blocks via the high magnetic permeability film 12 and the non-magnetic film 17, but there are parts where the non-magnetic blocks 11 and 11' can be more directly connected. Therefore, a strong main magnetic pole can be provided. It goes without saying that even in this case, the same magnetic properties as in the first embodiment can be obtained.
次に本発明の第３の実施例について図面を参照
しながら説明する。第５図は本発明の第３の実施
例における主磁極の記録媒体側からみた断面図を
製造工程順に示すものである。 Next, a third embodiment of the present invention will be described with reference to the drawings. FIG. 5 shows cross-sectional views of the main pole in the third embodiment of the present invention as viewed from the recording medium side in the order of manufacturing steps.
第５図ａにおいて実施例１や実施例２で示した
ように、表面が研磨剤で研磨されている非磁性ブ
ロツク２１の表面に1μm厚みの高透磁率膜２２を
形成後、所定のパターンで抜いたホトレジスト２
３を形成し高透磁率膜２２をエツチング除去した
ものを示している。次にホトレジスト２３をレジ
スト除去液で除去しその後、非磁性膜２４を1μm
厚みで形成する（第５図ｂ）。 In FIG. 5a, as shown in Examples 1 and 2, after forming a high magnetic permeability film 22 with a thickness of 1 μm on the surface of a non-magnetic block 21 whose surface has been polished with an abrasive, it is formed in a predetermined pattern. Removed photoresist 2
3 is formed and the high magnetic permeability film 22 is etched away. Next, remove the photoresist 23 with a resist removal solution, and then remove the non-magnetic film 24 with a thickness of 1 μm.
It is formed thickly (Fig. 5b).
次にエポキシ系の樹脂２６を表面に塗布した非
磁性ブロツク２１′を、前述の非磁性膜２４の表
面に接着する（第５図ｃ参照）。次に主磁極の表
面を前述した方法で研磨する。 Next, a nonmagnetic block 21' whose surface is coated with epoxy resin 26 is adhered to the surface of the nonmagnetic film 24 described above (see FIG. 5c). Next, the surface of the main pole is polished by the method described above.
本実施例によれば、高透磁率膜２２が非磁性膜
２４に完全に被覆されているので、前述したよう
な高透磁率膜２２にクラツクが入ることを完全に
防ぐことができる。 According to this embodiment, since the high magnetic permeability film 22 is completely covered with the nonmagnetic film 24, cracks in the high magnetic permeability film 22 as described above can be completely prevented.
次に本発明の第４の実施例について図面を参照
しながら説明する。第６図は本発明の第４の実施
例における主磁極の記録媒体側からみた断面図を
製造工程順に示すものである。 Next, a fourth embodiment of the present invention will be described with reference to the drawings. FIG. 6 is a cross-sectional view of the main pole in the fourth embodiment of the present invention, viewed from the recording medium side, in the order of manufacturing steps.
第６図ａにおいて、第１の実施例で説明したよ
うに表面が研磨剤で研磨されている非磁性ブロツ
ク２１の表面に1μm厚みの高透磁率膜２２を形成
後、所定のパターンで抜いたホトレジスト２３を
形成し、高透磁率膜２２をエツチング除去したも
のを示している。次にホトレジスト２３をレジス
ト除去液で除去し、その後非磁性膜２４を1μm厚
みで形成する（第６図ｂ参照）。次に高透磁率膜
２２の上部とその近傍を被覆するようにホトレジ
スト２５を形成する（第６図ｃ参照）。 In FIG. 6a, a high magnetic permeability film 22 with a thickness of 1 μm was formed on the surface of a non-magnetic block 21 whose surface had been polished with an abrasive as described in the first embodiment, and then punched out in a predetermined pattern. A photoresist 23 is formed and the high magnetic permeability film 22 is etched away. Next, the photoresist 23 is removed with a resist removal solution, and then a nonmagnetic film 24 is formed to a thickness of 1 μm (see FIG. 6b). Next, a photoresist 25 is formed to cover the upper part of the high magnetic permeability film 22 and its vicinity (see FIG. 6c).
次に非磁性膜２４をプラズマエツチング法でエ
ツチング除去し、さらにホトレジスト２５もレジ
スト除去液で除去する（第６図ｄ参照）。 Next, the nonmagnetic film 24 is etched away using a plasma etching method, and the photoresist 25 is also removed using a resist removing solution (see FIG. 6d).
次にエポキシ系の樹脂２６を表面に塗布した非
磁性ブロツク２１′を、前述の非磁性膜２４およ
びもう一つの非磁性ブロツク２１に接着する（第
６図ｅ参照）。次に主磁極の表面研磨を行う。 Next, a nonmagnetic block 21' whose surface is coated with epoxy resin 26 is adhered to the aforementioned nonmagnetic film 24 and another nonmagnetic block 21 (see FIG. 6e). Next, the surface of the main pole is polished.
本実施例によれば、高透磁率膜２２が非磁性膜
２４に完全に被覆されているので、高透磁率膜２
２が完全に保護されると同時に２つの非磁性ブロ
ツクが、接着剤で接続されているので主磁極とし
ての強度も強くなる。 According to this embodiment, since the high magnetic permeability film 22 is completely covered with the nonmagnetic film 24, the high magnetic permeability film 22
2 is completely protected, and at the same time, the two non-magnetic blocks are connected with adhesive, which increases the strength of the main magnetic pole.
次に本発明の第５の実施例について図面を参照
しながら説明する。第７図は本発明の第５の実施
例における主磁極の記録媒体側からみた断面図を
製造工程順に示すものである。 Next, a fifth embodiment of the present invention will be described with reference to the drawings. FIG. 7 is a cross-sectional view of the main pole in the fifth embodiment of the present invention, viewed from the recording medium side, in the order of manufacturing steps.
表面が研磨剤で研磨されている非磁性ブロツク
３１の表面に1μm厚みの非磁性膜３２を形成後、
さらにその上に高透磁率膜３３を形成する。そし
て次に所定のパターンで抜いたホトレジスト３４
を形成し、高透磁率膜３３および非磁性膜３２を
エツチング除去した後の断面形状を第７図ａで示
している。 After forming a 1 μm thick nonmagnetic film 32 on the surface of the nonmagnetic block 31 whose surface has been polished with an abrasive,
Furthermore, a high magnetic permeability film 33 is formed thereon. Then, the photoresist 34 is cut out in a predetermined pattern.
FIG. 7a shows the cross-sectional shape after forming the high magnetic permeability film 33 and the nonmagnetic film 32 by etching.
次にホトレジスト３４をレジスト除去液で除去
後、非磁性膜３５をさらに1.5μm厚みで形成する
（第７図ｂ参照）。 Next, after removing the photoresist 34 with a resist removal solution, a nonmagnetic film 35 is further formed to a thickness of 1.5 μm (see FIG. 7b).
その後エポキシ系の樹脂３７を表面に塗布した
非磁性ブロツク３１′を前述の非磁性膜３５の表
面に接着する（第７図ｃ参照）。次に主磁極の表
面研磨を行う。 Thereafter, a non-magnetic block 31' whose surface is coated with epoxy resin 37 is adhered to the surface of the non-magnetic film 35 (see FIG. 7c). Next, the surface of the main pole is polished.
第７図ｃに示す本実施例によれば高透磁率膜３
３が、非磁性ブロツク３１と完全に分離して形成
されるので、非磁性ブロツク３１のグラツクの影
響が全くおよばないので、高透磁率膜３３にクラ
ツクの入らない主磁極を提供できる。 According to this embodiment shown in FIG. 7c, the high magnetic permeability film 3
3 is formed completely separate from the non-magnetic block 31, so that it is completely unaffected by the cracks of the non-magnetic block 31, so that the high magnetic permeability film 33 can be provided with a main pole free from cracks.
次に本発明の第６の実施例について図面を参照
しながら説明する。第８図は本発明の第６の実施
例における主磁極の記録媒体側からみた断面図を
製造工程順に示すものである。 Next, a sixth embodiment of the present invention will be described with reference to the drawings. FIG. 8 shows cross-sectional views of the main magnetic pole as viewed from the recording medium side in the order of manufacturing steps in a sixth embodiment of the present invention.
表面が研磨剤で研磨されている非磁性ブロツク
３１の表面に1μm厚みの非磁性膜３２を形成後、
さらにその上に高透磁率膜３３を形成する。そし
て次に所定のパターンで抜いたホトレジスト３４
を形成し高透磁率膜３３および非磁性膜３２をエ
ツチング除去した後の断面形状を第８図ａで示し
ている。 After forming a 1 μm thick nonmagnetic film 32 on the surface of the nonmagnetic block 31 whose surface has been polished with an abrasive,
Furthermore, a high magnetic permeability film 33 is formed thereon. Then, the photoresist 34 is cut out in a predetermined pattern.
FIG. 8a shows the cross-sectional shape after forming the high magnetic permeability film 33 and the nonmagnetic film 32 by etching.
次にホトレジスト３４をレジスト除去液で除去
後、非磁性膜３５をさらに1.5μm厚みで形成する
（第８図ｂ参照）。 Next, after removing the photoresist 34 with a resist removal solution, a nonmagnetic film 35 is further formed to a thickness of 1.5 μm (see FIG. 8b).
次に高透磁率膜３３の上部とその近傍を被覆す
るようにホトレジスト３６を形成する（第８図ｃ
参照）。 Next, a photoresist 36 is formed so as to cover the upper part of the high magnetic permeability film 33 and its vicinity (FIG. 8c).
reference).
次に非磁性膜３５をプラズマエツチング法でエ
ツチング除去しさらにホトレジスト３６もレジス
ト除去液で除去する（第８図ｄ参照）。 Next, the nonmagnetic film 35 is removed by plasma etching, and the photoresist 36 is also removed using a resist removal solution (see FIG. 8d).
次にエポキシ系の樹脂３７を表面に塗布した非
磁性ブロツク３１′を、前述の非磁性膜３３およ
びもう一つの非磁性ブロツク３１に接着する（第
８図ｅ参照）。次に主磁極の表面研磨を行う。 Next, a nonmagnetic block 31' whose surface is coated with epoxy resin 37 is adhered to the aforementioned nonmagnetic film 33 and another nonmagnetic block 31 (see FIG. 8e). Next, the surface of the main pole is polished.
本実施例によれば、高透磁率膜３３が、非磁性
ブロツク３１と完全に分離して形成されるので、
非磁性ブロツク３１のクラツクの影響が全くおよ
ばないので、高透磁率膜３３にクラツクが入らな
いという効果があると同時に、２つの非磁性ブロ
ツクが接着剤で接続されているので主磁極として
の強度も強くなる。 According to this embodiment, since the high magnetic permeability film 33 is formed completely separate from the non-magnetic block 31,
Since cracks in the non-magnetic block 31 are not affected at all, the high magnetic permeability film 33 has the effect of not being cracked, and at the same time, since the two non-magnetic blocks are connected with adhesive, the strength of the main magnetic pole is increased. It also becomes stronger.
発明の効果
以上のように本発明は、２個の非磁性ブロツク
が接着剤を用いて接着され、前記非磁性ブロツク
の一方の接着面側の表面に高透磁率膜と非磁性膜
とを有し、非磁性膜が高透磁率膜を一部又は全部
を被覆するように形成しているもので、主磁極の
研磨工程中に入る非磁性ブロツクのクラツクが直
接高透磁率膜を汚損させるというようなことがな
くなり、信頼性の高い、高歩留りの主磁極を提供
することができるものである。Effects of the Invention As described above, in the present invention, two non-magnetic blocks are bonded together using an adhesive, and a high magnetic permeability film and a non-magnetic film are provided on the adhesive surface side of one of the non-magnetic blocks. However, since the non-magnetic film is formed so as to cover part or all of the high magnetic permeability film, cracks in the non-magnetic block during the polishing process of the main pole will directly stain the high magnetic permeability film. This eliminates this problem and makes it possible to provide a main magnetic pole with high reliability and high yield.
第１図は従来の垂直磁化記録ヘツドの主磁極補
助磁極および記録媒体の模式図、第２図は従来の
主磁極の記録媒体側からみた断面図、第３図〜第
８図は本発明の実施例における垂直磁化記録用ヘ
ツドの主磁極を、製造工程順に示した断面図であ
る。
１１，１１′，２１，２１′，３１，３１′……
非磁性ブロツク、１２，２２，３３……高透磁率
膜、１４，１７，２４，３２，３５……非磁性
膜、１５，１８，２６，３７……接着剤、１３，
１６，２３，２５，３４，３６……ホトレジス
ト。
FIG. 1 is a schematic diagram of a main magnetic pole, an auxiliary magnetic pole, and a recording medium of a conventional perpendicular magnetization recording head, FIG. 2 is a sectional view of the conventional main magnetic pole viewed from the recording medium side, and FIGS. FIG. 3 is a cross-sectional view showing the main magnetic pole of the perpendicular magnetization recording head in the example in the order of manufacturing steps. 11, 11', 21, 21', 31, 31'...
Non-magnetic block, 12, 22, 33... High magnetic permeability film, 14, 17, 24, 32, 35... Non-magnetic film, 15, 18, 26, 37... Adhesive, 13,
16, 23, 25, 34, 36...photoresist.
Claims (1)
前記非磁性ブロツクの一方の接着面側の一部に高
透磁率膜が形成され、前記高透磁率膜が形成され
た前記非磁性ブロツク上に、前記高透磁率膜に少
なくとも一部が接触して非磁性膜が形成されてい
ることを特徴とする垂直磁化記録用へツド。 ２ 非磁性膜が少なくとも高透磁率膜表面を覆つ
て設けられていることを特徴とする特許請求の範
囲第１項記載の垂直磁化記録用ヘツド。 ３ 非磁性膜が高透磁率膜をとり囲むように設け
られていることを特徴とする特許請求の範囲第１
項記載の垂直磁化記録用ヘツド。[Claims] 1. Two non-magnetic blocks are bonded with an adhesive,
A high magnetic permeability film is formed on a part of one adhesive surface side of the non-magnetic block, and at least a part of the non-magnetic block on which the high magnetic permeability film is formed is in contact with the high magnetic permeability film. A head for perpendicular magnetization recording, characterized in that a nonmagnetic film is formed on the head. 2. The perpendicular magnetization recording head according to claim 1, wherein the nonmagnetic film is provided to cover at least the surface of the high magnetic permeability film. 3. Claim 1, characterized in that the non-magnetic film is provided so as to surround the high magnetic permeability film.
The perpendicular magnetization recording head described in Section 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58104427A JPS59229726A (en) | 1983-06-10 | 1983-06-10 | Perpendicular magnetization recording head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58104427A JPS59229726A (en) | 1983-06-10 | 1983-06-10 | Perpendicular magnetization recording head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59229726A JPS59229726A (en) | 1984-12-24 |
| JPH03689B2 true JPH03689B2 (en) | 1991-01-08 |
Family
ID=14380383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58104427A Granted JPS59229726A (en) | 1983-06-10 | 1983-06-10 | Perpendicular magnetization recording head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59229726A (en) |
-
1983
- 1983-06-10 JP JP58104427A patent/JPS59229726A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59229726A (en) | 1984-12-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2979509B2 (en) | Method of manufacturing a flat magnetic head by forming a cavity in a non-magnetic wafer | |
| JPH076331A (en) | Manufacture of thin-film magnetic head and thin-film magnetic head manufactured by such method | |
| KR970008167B1 (en) | Thin-film magnetic head and method of producing the same | |
| KR860001743B1 (en) | Magnetic Head and Manufacturing Method Thereof | |
| JPH03689B2 (en) | ||
| JPS60175208A (en) | thin film magnetic head | |
| JPH0833977B2 (en) | Magnetic head for perpendicular magnetization and method of manufacturing the same | |
| JPH0110731Y2 (en) | ||
| GB2200238A (en) | Magnetic head for use in vertical recording | |
| JPS6341609Y2 (en) | ||
| JPH08106613A (en) | Perpendicular magnetic recording thin film magnetic head | |
| JPS62205507A (en) | Magnetic head | |
| JPS60157710A (en) | Single magnetic pole type magnetic head for vertical recording | |
| JPS62102409A (en) | magnetic head core | |
| JP2002279608A (en) | Thin-film magnetic head and method of manufacturing the same | |
| JP2556479B2 (en) | Magnetic head | |
| JP2555031B2 (en) | Magnetic head | |
| KR890003866B1 (en) | The complicated magnetic material | |
| JPS6134709A (en) | Manufacture of magnetic head | |
| JPS63108510A (en) | Magnetic head | |
| JPH04134610A (en) | Perpendicular recording thin film magnetic head and its manufacturing | |
| JPS5864613A (en) | Vertical magnetic head | |
| JPS62250505A (en) | Magnetic head | |
| JPH05159237A (en) | Thin-film magnetic head and production thereof | |
| JPS59229718A (en) | Magnetic head for auxiliary magnetic pole energizing vertical magnetic recording |