JPH036914Y2 - - Google Patents
Info
- Publication number
- JPH036914Y2 JPH036914Y2 JP1985138591U JP13859185U JPH036914Y2 JP H036914 Y2 JPH036914 Y2 JP H036914Y2 JP 1985138591 U JP1985138591 U JP 1985138591U JP 13859185 U JP13859185 U JP 13859185U JP H036914 Y2 JPH036914 Y2 JP H036914Y2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- nozzle
- mask
- vacuum vessel
- compound vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985138591U JPH036914Y2 (mo) | 1985-09-10 | 1985-09-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985138591U JPH036914Y2 (mo) | 1985-09-10 | 1985-09-10 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62106238U JPS62106238U (mo) | 1987-07-07 |
| JPH036914Y2 true JPH036914Y2 (mo) | 1991-02-21 |
Family
ID=31043718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985138591U Expired JPH036914Y2 (mo) | 1985-09-10 | 1985-09-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH036914Y2 (mo) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012008145A (ja) * | 1999-07-09 | 2012-01-12 | Fei Co | 二次イオンの収量を高める方法及び装置 |
-
1985
- 1985-09-10 JP JP1985138591U patent/JPH036914Y2/ja not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012008145A (ja) * | 1999-07-09 | 2012-01-12 | Fei Co | 二次イオンの収量を高める方法及び装置 |
| JP4863593B2 (ja) * | 1999-07-09 | 2012-01-25 | エフ イー アイ カンパニ | 二次イオンの収量を高める方法及び装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62106238U (mo) | 1987-07-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI669742B (zh) | 檢測區準備 | |
| CA1293337C (en) | Secondary electron detector for use in a gaseous atmosphere | |
| US6926935B2 (en) | Proximity deposition | |
| TW201637062A (zh) | 帶電粒子束系統與方法 | |
| JP2002250707A (ja) | 荷電粒子ビームを用いた自動基板検査の装置及び方法 | |
| US8653455B2 (en) | Charged particle beam device and evaluation method using the charged particle beam device | |
| JP6779847B2 (ja) | 荷電粒子装置、荷電粒子描画装置および荷電粒子ビーム制御方法 | |
| JPH0320831Y2 (mo) | ||
| JP3489989B2 (ja) | パターン膜形成方法及びそれに用いる集束イオンビーム加工装置 | |
| JP2543680B2 (ja) | マスクリペア装置 | |
| JPH0135342B2 (mo) | ||
| JP2000285842A (ja) | 荷電粒子線装置 | |
| JP2000180391A (ja) | 電子顕微鏡および欠陥形状確認方法 | |
| JP4671223B2 (ja) | 集束イオンビームによる加工方法及び集束イオンビーム加工装置 | |
| JPH10241618A (ja) | 荷電ビームによる観察,加工方法及びその装置 | |
| JPH0135340B2 (mo) | ||
| JPS6325660B2 (mo) | ||
| JPS62106238U (mo) | ||
| JPS6242156A (ja) | マスクリペア装置 | |
| JPH1092364A (ja) | 集束イオンビーム加工位置合わせ方法 | |
| JPS6298543A (ja) | イオンビ−ム発生装置 | |
| JPS61123843A (ja) | 集束イオンビ−ムを用いたマスク修正装置 | |
| JPS62154544A (ja) | イオン処理装置 | |
| JPH0588502B2 (mo) | ||
| JPH07333828A (ja) | パターン膜修正方法とその装置 |