JPH0372023B2 - - Google Patents
Info
- Publication number
- JPH0372023B2 JPH0372023B2 JP21804785A JP21804785A JPH0372023B2 JP H0372023 B2 JPH0372023 B2 JP H0372023B2 JP 21804785 A JP21804785 A JP 21804785A JP 21804785 A JP21804785 A JP 21804785A JP H0372023 B2 JPH0372023 B2 JP H0372023B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- temperature
- low
- thermal expansion
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 89
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 39
- 239000000203 mixture Substances 0.000 claims description 24
- 239000000463 material Substances 0.000 description 20
- 239000005300 metallic glass Substances 0.000 description 12
- 239000000945 filler Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000005394 sealing glass Substances 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000004580 weight loss Effects 0.000 description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000007496 glass forming Methods 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/16—Silica-free oxide glass compositions containing phosphorus
- C03C3/21—Silica-free oxide glass compositions containing phosphorus containing titanium, zirconium, vanadium, tungsten or molybdenum
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Description
〔発明の利用分野〕
本発明は、ガラスを用いた低温充てんや低温ボ
ンテイングに係り、特にアモルフアス金属を採用
した高性能磁気ヘツド用充てん材やボンデイング
材として好適な強耐水性低温軟化ガラス組成物に
関する。
〔発明の背景〕
近年、記録装置の小型化や高密度記録化が進む
につれて、より性能の優れた磁気ヘツドが要求さ
れるようになつた。そのため、大きな飽和磁束密
度を有するアモルフアス金属を採用した高性能磁
気ヘツドの開発が急速に進められている。
磁気ヘツドは磁気ギヤツプ部でボンデイングさ
れた構造となつており、従来から充てん材やボン
デイング材としては非磁性であるガラスが寿命の
点で最も適していることが知られている。アモル
フアス金属を採用した高性能磁気ヘツドの充てん
材やボンデイング材として使用されるガラスは、
ガラスの熱膨脹係数が被充てん材や被ボンデイン
グ材の熱膨脹係数に適合していることが大切であ
る。また充てんやボンデイングの作業温度が被充
てん材や被ボンデイング材の耐熱限度より低いこ
とが要求されることはもちろんであるが、特にア
モルフアス金属の高温加熱は結晶化を起こすの
で、作業温度は出来るだけ低い方がよく、出来得
るならば480℃以下で充てんやボンデイングでき
ることが望ましい。更に磁気ヘツドは湿度の高い
雰囲気中で使用される場合もあるので、磁気ヘツ
ドに使用するガラスの耐水性が弱いと、ガラスの
溶出を起こし、磁気ヘツドとしての信頼性を損う
ことにもなるので、ガラスに対しては実用に耐え
る程度の強い耐水性が要求される。
従来からこの種のガラスとしては、鉛を多量に
含み、PbO−B2O3を基本とした系が多く、この
系では鉛含量が多いほど、より低温で作業できる
が、熱膨脹係数が100×10-7/℃を超える上に、
耐水性が劣るという欠点がある。一方鉛含量を少
なくすると、熱膨脹係数が100×10-7/℃以下の
ものも得られ、また耐水性もある程度改善される
が、充てんやボンデイングの作業温度が500℃以
上で高過ぎる欠点がある。
このため、従来からのガラスではアモルフアス
金属を採用した高性能磁気ヘツドには適しておら
ず、3つの特性すなわち、熱膨脹係数、作業温度
及び耐水性を満足したガラスがいまだ出現してい
ない。これは3つの特性が相矛盾したものである
ことが原因で、3つの特性を満足した新規なガラ
スの開発が磁気ヘツドに限らず、従来からいろい
ろな方面で大変強く望まれている。
V2O5を含有するガラスの発明として、例えば
特開昭58−74539号、同55−75937号、同54−
64514号、同53−82826号、同48−43007号がある。
B2O3−ZnO−V2O5−Bi2O3−Tl2O3系ガラス(特
開昭58−74539号)、Li2O−Na2O−ZnO−B2O3−
V2O5−P2O5−ZrO2−Al2O3系ガラス(特開昭54
−64514号)、Na2O−ZnO−B2O3−P2O5−V2O5
系ガラス(特開昭53−82826号)及びB2O3−
V2O5−ZnO−Na2O−SiO2−Al2O3−ZrO2系ガラ
ス(特開昭48−43007号)においては、熱膨脹係
数が100×10-7/℃以下のものも得られるが、充
てんやボンデイングの作業温度が500℃以上と高
いという問題がある。PbO−V2O5−P2O5系ガラ
ス(特開昭55−75937号)はPbOを最も多く含み、
軟化点が約320℃と低く、しかも強い耐水性をも
つといつた利点があるが、熱膨脹係数が約150×
10-7/℃と大きい問題がある。
〔発明の目的〕
本発明の目的は、従来からの低温軟化ガラス組
成物より、熱膨脹係数が小さく、しかも低温で作
業でき、その上耐水性の優れた強耐水性低温軟化
ガラス組成物を提供することにある。特にアモル
フアス金属を採用した高性能磁気ヘツド用充てん
材やボンデイング材に適した強耐水性低温軟化ガ
ラス組成物を提供することにある。
〔発明の概要〕
本発明を概説すれば、本発明は耐水性低温軟化
ガラス組成物に関する発明であつて、主要成分と
して、V2O5を55〜70重量%、P2O5を17〜30重量
%及びSb2O3を2〜20重量%含有し、熱膨脹係数
が100×10-7/℃以下であることを特徴とする。
更に上記組成に20重量%以下、好ましくは3重
量%以上のPbOを加えた範囲内にあり、熱膨脹係
数が70〜100×10-7/℃、作業点が450℃以下であ
ることを特徴とするV2O5−P2O5−Sb2O3−PbO
系耐水性低温軟化ガラス組成物に係るものでもあ
る。
更に15重量%以下、好ましくは2重量%以上の
Tl2Oを加え、熱膨脹係数が80〜100×10-7/℃、
作業点が440℃以下であることを特徴とするV2O5
−P2O5−Sb2O3−PbO−Tl2Oの系強耐水性低温
軟化ガラス組成物に係るものでもある。
また、前記2種の系のいずれかに5重量%以
下、好ましくは0.5重量%以上のNb2O5を加え、
熱膨脹係数が70〜95×10-7/℃、作業点が450℃
以下であることを特徴とするV2O5−P2O5−
Sb2O3−PbO−Nb2O5系及びV2O5−P2O5−Sb2O3
−PbO−Tl2O−Nb2O5系強耐水性低温軟化ガラ
ス組成物に係るものである。
本発明において、作業点とはガラスの粘度が約
104ポアズになる温度をいう。
本発明の耐水性低温軟化ガラス組成物は、その
熱膨脹係数をアモルフアス金属を採用した高性能
磁気ヘツドの被充てん材や被ボンデイング材の熱
膨脹係数に適合させることができるほどに小さい
のでガラスが破損することなく充てんやボンデイ
ングが可能である。また、このガラスは、480℃
以下の低温で充てんやボンデイングが可能なの
で、高温での加熱を嫌うアモルフアス金属として
は、結晶化を起こさず、磁気ヘツドの高性能化を
より高めることができる。更にまた本発明のガラ
スは、その耐水性も良好なので、このガラスで充
てんやボンデイングした磁気ヘツドは高湿度中に
さらされても、ガラスが溶出することなく、アモ
ルフアス金属を採用した高性能磁気ヘツドの信頼
性の向上に役立つ。以上、本発明の強耐水性低温
軟化ガラス組成物は、前に述べた従来のこの種の
ガラスの欠点が取除かれた新規なガラスである。
次に本発明の強耐水性低温軟化ガラス組成物を
構成する各種成分並びにそれらの組成範囲の限定
理由について説明する。
まずV2O5は強耐水性低温軟化ガラス組成物の
主成分で、ガラスの熱膨脹係数及び作業点を下げ
るのに有効であるが、70重量%を超えるとガラス
の耐水性が悪化し、また55重量%未満であるとガ
ラスの熱膨脹係数が大きくなり過ぎる。
P2O5はガラス形成酸化物であり、ガラスの失
透を防止し、流動性を良くするが、30重量%を超
えるとガラスの作業点が上がり過ぎかつ耐水性も
悪くなる。また17重量%未満ではガラスが失透を
起こしやすく、実用に供し得ない。
Sb2O3はガラスの耐水性改善に著しく効果があ
るが、20重量%を超えるとガラスの作業点が上が
り過ぎ、また、2重量%未満ではガラスの耐水性
改善に対し充分な効果が得られない。
PbOはガラスの作業点を下げ、かつ耐水性を向
上させるが、20重量%を超えるとガラスの熱膨脹
係数が大きくなり過ぎ、しかも失透を起こしやす
くなる。
Tl2Oはガラスの作業点を下げるために加える
が、15重量%を超えるとガラスの熱膨脹係数が大
きくなり過ぎ、しかも耐水性が悪くなる。
Nb2O5はガラスの熱膨脹係数を小さくするため
に加えるが5重量%を超えるとガラスの作業点が
上がり過ぎ、しかも失透しやすくなる。
次に本発明のガラスの熱膨脹係数の範囲が70〜
100×10-7/℃であるので、各種フエライト等の
被充てん材や被ボンデイング材に適合した、すな
わち磁気ヘツドとして適したガラスを選択するこ
とができる。一般に100×10-7/℃を超えるガラ
スは、充てん後やボンデイング後にガラス部にク
ラツクが発生したり、強固な充てんやボンデイン
グができないため、磁気ヘツドが壊れやすくなつ
てしまう。また熱膨脹差による応力が磁性材にか
かり磁気ヘツドの磁気特性が劣化してしまう。70
×10-7/℃未満のガラスは低温軟化ガラスにおい
てはいまだ出現していないが、存在するとすれ
ば、上記の様な問題が生ずるであろう。
ガラスの作業点が480℃以下であるということ
は、磁気ヘツド作製におけるガラス充てんやボン
デイングが480℃以下で行えるということであり、
このような低温で作業できることはアモルフアス
金属を採用した高性能磁気ヘツドには最も有効で
ある。充てんやボンデイング温度が高いとアモル
フアス金属は結晶化を起こし、磁気ヘツドとして
の性能を発揮できない。また、アモルフアス金属
は結晶化を起こさない温度範囲にあつても、充て
ん温度やボンデイング温度が高いほど寿命が短く
なり、すなわち磁気ヘツドとしての寿命が短くな
るので、なるべく低温で充てんやボンデイングを
する必要がある。その点、本発明のガラスは440
℃以下の低温で充てんやボンデイングもできるの
で、アモルフアス金属を結晶化させずに、長寿命
な高性能磁気ヘツドを作製することが可能であ
る。
本発明のガラスを構成する成分の原料としては
焼成により、前記成分の酸化物若しくはそれらの
酸化物の混合物を生ずるものであればどんなもの
でもよい。
次に本発明のガラスの製造方法について説明す
る。ガラス原料を配合及び混合し、アルミナルツ
ボ又は白金ルツボに入れ、電気炉中で900℃、0.5
〜1時間溶融させた。この溶融物を250〜300℃に
保持した黒鉛治具に流し込み、その後空冷させて
ガラスを作製した。
〔発明の実施例〕
以下、本発明を実施例により更に具体的に説明
するが、本発明はこれら実施例に限定されない。
第1表〜第5表に本発明における実施例の組成
と特性を示す。第6表に比較例として従来のこの
種の低温軟化ガラスの組成と特性を示す。なお、
各ガラスの特性の測定方法は以下のとおりであ
る。
(1) 熱膨脹係数
5φ×20mmの円柱状に加工したガラスを測定
試料として、熱膨脹計を用いて、空気中、昇温
速度10℃/分で測定した。
(2) 軟化点及び作業点
粉末にしたガラスを示差熱分析装置を用い
て、空気中、昇温速度10℃/分で、軟化点及び
作業点を測定した。ここで軟化点及び作業点は
粘度が約107.6ポアズ及び約104ポアズに相当す
る。
(3) 耐水性
5×5×5mmの立方体に加工したガラス片を
40c.c.の蒸留水中に入れ、70℃、2時間加熱し、
その後ガラス片を十分乾燥させ、重量減少を測
定した。ここにおける耐水性とは、上記条件で
試料1g当りの重量減少をmgで算出した値であ
る。
[Field of Application of the Invention] The present invention relates to low-temperature filling and low-temperature bonding using glass, and particularly to a strong water-resistant low-temperature softening glass composition suitable as a filler or bonding material for high-performance magnetic heads that employs amorphous metal. . [Background of the Invention] In recent years, as recording devices have become smaller and recording density has increased, magnetic heads with even better performance have been required. Therefore, the development of high-performance magnetic heads employing amorphous metals having high saturation magnetic flux density is progressing rapidly. The magnetic head has a bonded structure at the magnetic gap, and it has been known that non-magnetic glass is most suitable as a filler or bonding material in terms of longevity. Glass is used as a filler and bonding material for high-performance magnetic heads that use amorphous metal.
It is important that the coefficient of thermal expansion of the glass matches the coefficient of thermal expansion of the material to be filled and bonded. In addition, it goes without saying that the working temperature for filling and bonding must be lower than the heat resistance limit of the material to be filled and bonded, but since high-temperature heating of amorphous metal in particular causes crystallization, the working temperature should be kept as low as possible. The lower the temperature, the better, and if possible, it is desirable to be able to fill and bond at temperatures below 480°C. Furthermore, since magnetic heads are sometimes used in humid environments, if the water resistance of the glass used for the magnetic head is low, the glass may elute, impairing its reliability as a magnetic head. Therefore, glass is required to have strong water resistance that can withstand practical use. Traditionally, this type of glass has been based on PbO-B 2 O 3 , which contains a large amount of lead.In this system, the higher the lead content, the lower the temperature you can work with, but the coefficient of thermal expansion is 100 × In addition to exceeding 10 -7 /℃,
It has the disadvantage of poor water resistance. On the other hand, if the lead content is reduced, a thermal expansion coefficient of 100×10 -7 /℃ or less can be obtained, and the water resistance is improved to some extent, but the disadvantage is that the working temperature for filling and bonding is too high at 500℃ or higher. . For this reason, conventional glasses are not suitable for high-performance magnetic heads employing amorphous metals, and a glass that satisfies the three properties, namely, coefficient of thermal expansion, working temperature, and water resistance, has not yet appeared. This is because the three properties are contradictory, and the development of a new glass that satisfies the three properties has been highly desired not only in magnetic heads but in a variety of other fields. As inventions of glasses containing V 2 O 5 , for example, Japanese Patent Application Laid-open Nos. 58-74539, 55-75937, and 54-
There are No. 64514, No. 53-82826, and No. 48-43007.
B 2 O 3 −ZnO−V 2 O 5 −Bi 2 O 3 −Tl 2 O 3 glass (Japanese Unexamined Patent Publication No. 1974-74539), Li 2 O−Na 2 O−ZnO−B 2 O 3 −
V 2 O 5 −P 2 O 5 −ZrO 2 −Al 2 O 3 -based glass
−64514), Na 2 O−ZnO−B 2 O 3 −P 2 O 5 −V 2 O 5
glass (JP-A-53-82826) and B 2 O 3 −
V 2 O 5 −ZnO−Na 2 O−SiO 2 −Al 2 O 3 −ZrO 2 glass (Japanese Unexamined Patent Publication No. 48-43007) has a coefficient of thermal expansion of 100×10 -7 /°C or less. However, there is a problem in that the working temperature for filling and bonding is high, at over 500℃. PbO−V 2 O 5 −P 2 O 5 glass (JP-A-55-75937) contains the highest amount of PbO,
It has the advantage of having a low softening point of about 320℃ and strong water resistance, but its coefficient of thermal expansion is about 150×
10 -7 /℃, which is a big problem. [Object of the Invention] The object of the present invention is to provide a strong water-resistant low-temperature softening glass composition that has a lower coefficient of thermal expansion than conventional low-temperature softening glass compositions, can be worked at low temperatures, and has excellent water resistance. There is a particular thing. The object of the present invention is to provide a strong water-resistant, low-temperature softening glass composition that is particularly suitable for use as a filler or bonding material for high-performance magnetic heads employing amorphous metal. [Summary of the Invention] To summarize the present invention, the present invention relates to a water-resistant low temperature softening glass composition, which contains 55 to 70% by weight of V 2 O 5 and 17 to 17% by weight of P 2 O 5 as main components. It is characterized by containing 30% by weight and 2 to 20% by weight of Sb 2 O 3 and having a coefficient of thermal expansion of 100×10 -7 /°C or less. Furthermore, it is characterized by having the above composition plus 20% by weight or less, preferably 3% by weight or more of PbO, a coefficient of thermal expansion of 70 to 100×10 -7 /°C, and a working point of 450°C or less. V 2 O 5 −P 2 O 5 −Sb 2 O 3 −PbO
It also relates to a water-resistant low temperature softening glass composition. Furthermore, 15% by weight or less, preferably 2% by weight or more
Add Tl 2 O, the thermal expansion coefficient is 80 ~ 100 × 10 -7 / °C,
V 2 O 5 characterized by a working point below 440℃
It also relates to a strong water-resistant low temperature softening glass composition of -P2O5 - Sb2O3 -PbO- Tl2O . Further, adding 5% by weight or less, preferably 0.5% by weight or more of Nb 2 O 5 to either of the two types of systems,
Thermal expansion coefficient is 70~95×10 -7 /℃, working point is 450℃
V 2 O 5 −P 2 O 5 − characterized by:
Sb 2 O 3 −PbO−Nb 2 O 5 system and V 2 O 5 −P 2 O 5 −Sb 2 O 3
-PbO- Tl2O - Nb2O5 - based strong water-resistant low temperature softening glass composition. In the present invention, the working point means that the viscosity of the glass is approximately
10 The temperature at which the temperature reaches 4 poise. The water-resistant low-temperature softening glass composition of the present invention has a coefficient of thermal expansion so small that it can be matched to the coefficient of thermal expansion of the filling material or bonding material of a high-performance magnetic head employing amorphous metal, so that the glass will not break. It is possible to fill and bond without any trouble. In addition, this glass can be heated at 480℃
Since filling and bonding can be performed at a low temperature of below 100, an amorphous metal that does not like heating at high temperatures will not crystallize and can further improve the performance of the magnetic head. Furthermore, the glass of the present invention has good water resistance, so even if a magnetic head filled or bonded with this glass is exposed to high humidity, the glass will not elute, making it possible to create a high-performance magnetic head using amorphous metal. helps improve reliability. As described above, the strong water-resistant low-temperature softening glass composition of the present invention is a novel glass in which the drawbacks of the conventional glasses of this kind described above have been eliminated. Next, various components constituting the strong water resistant low temperature softening glass composition of the present invention and reasons for limiting the composition ranges thereof will be explained. First, V 2 O 5 is the main component of a strong water-resistant low-temperature softening glass composition, and is effective in lowering the thermal expansion coefficient and working point of the glass. However, if it exceeds 70% by weight, the water resistance of the glass deteriorates and If it is less than 55% by weight, the coefficient of thermal expansion of the glass will become too large. P 2 O 5 is a glass-forming oxide that prevents devitrification of the glass and improves fluidity, but if it exceeds 30% by weight, the working point of the glass becomes too high and the water resistance deteriorates. Moreover, if it is less than 17% by weight, the glass tends to devitrify and cannot be put to practical use. Sb 2 O 3 is extremely effective in improving the water resistance of glass, but if it exceeds 20% by weight, the working point of the glass increases too much, and if it is less than 2% by weight, it is not sufficiently effective in improving the water resistance of glass. I can't do it. PbO lowers the working point of the glass and improves its water resistance, but if it exceeds 20% by weight, the coefficient of thermal expansion of the glass becomes too large and it becomes more likely to cause devitrification. Tl 2 O is added to lower the working point of the glass, but if it exceeds 15% by weight, the coefficient of thermal expansion of the glass becomes too large and the water resistance deteriorates. Nb 2 O 5 is added to reduce the coefficient of thermal expansion of the glass, but if it exceeds 5% by weight, the working point of the glass becomes too high and it tends to devitrify. Next, the thermal expansion coefficient of the glass of the present invention ranges from 70 to
Since the temperature is 100×10 -7 /°C, it is possible to select a glass suitable for the filling material such as various ferrites and the bonding material, that is, suitable for the magnetic head. Generally, glass with a temperature exceeding 100 x 10 -7 /°C will cause cracks in the glass portion after filling or bonding, and will not allow strong filling or bonding, making the magnetic head more likely to break. Further, stress due to the difference in thermal expansion is applied to the magnetic material, deteriorating the magnetic properties of the magnetic head. 70
Glasses with a temperature lower than ×10 -7 /°C have not yet appeared in low-temperature softening glasses, but if they did exist, the above-mentioned problems would probably occur. The fact that the working point of glass is 480°C or lower means that glass filling and bonding can be performed at 480°C or lower in the production of magnetic heads.
The ability to work at such low temperatures is most effective for high-performance magnetic heads that employ amorphous metal. If the filling or bonding temperature is high, amorphous metal will crystallize and will not be able to exhibit its performance as a magnetic head. Furthermore, even if the amorphous metal is in a temperature range where crystallization does not occur, the higher the filling temperature or bonding temperature, the shorter the lifespan of the magnetic head, so it is necessary to fill and bond at as low a temperature as possible. There is. In this respect, the glass of the present invention has 440
Since filling and bonding can be performed at low temperatures below 0.9°C, it is possible to produce long-life, high-performance magnetic heads without crystallizing the amorphous metal. Any material may be used as the raw material for the components constituting the glass of the present invention as long as it produces an oxide of the component or a mixture of these oxides upon firing. Next, the method for manufacturing glass of the present invention will be explained. Blend and mix the glass raw materials, place in an alumina crucible or platinum crucible, and heat at 900℃ in an electric furnace at 0.5
Allowed to melt for ~1 hour. This melt was poured into a graphite jig kept at 250 to 300°C, and then cooled in air to produce glass. [Examples of the Invention] Hereinafter, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples. Tables 1 to 5 show the compositions and properties of Examples of the present invention. Table 6 shows the composition and properties of this type of conventional low-temperature softening glass as a comparative example. In addition,
The method for measuring the characteristics of each glass is as follows. (1) Coefficient of thermal expansion Glass processed into a cylindrical shape of 5φ x 20 mm was used as a measurement sample, and was measured in air at a heating rate of 10° C./min using a thermal dilatometer. (2) Softening point and working point The softening point and working point of the powdered glass were measured using a differential thermal analyzer in air at a heating rate of 10°C/min. The softening point and working point here correspond to viscosities of about 10 7.6 poise and about 10 4 poise. (3) Water resistance A piece of glass processed into a cube of 5 x 5 x 5 mm.
Place in 40c.c. distilled water and heat at 70℃ for 2 hours.
Thereafter, the glass pieces were thoroughly dried and weight loss was measured. The water resistance here is a value calculated in mg of weight loss per 1 g of sample under the above conditions.
【表】【table】
【表】【table】
【表】【table】
【表】【table】
【表】【table】
【表】【table】
【表】【table】
【表】【table】
本発明は、従来からの低温軟化ガラスのように
PbOを主成分とした組成ではなく、V2O5を主成
分としたV2O5−P2O5−Sb2O3系であり、従来の
ガラスより熱膨脹係数が100×10-7/℃以下と小
さく、しかも作業点も低く、その上耐水性も強い
といつた3つの効果を同時に達成したガラスであ
る。したがつて、ガラスを用いた480℃以下の低
温充てんや低温ボンデイングに係り、特にアモル
フアス金属を採用した高性能磁気ヘツド材やボン
デイング材として好適である。
PbOを加えたV2O5−P2O5−Sb2O−PbO系で
は、熱膨脹係数が70〜100×10-7/℃であり、作
業点が450℃以下とより低温化でき、しかも耐水
性を向上させることができる強耐水性低温軟化ガ
ラスが得られる。
更にTl2Oを加えたV2O5−P2O5−Sb2O−PbO3
−Tl2O系では、熱膨脹係数が80〜100×10-7/℃
であり、作業点が440℃以下とより低温化させる
ことができる強耐水性低温軟化ガラスが得られ
る。この系のガラスを用いると440℃以下の低温
で充てんやボンデイングが可能であり、アモルフ
アス金属のように耐熱性のないものにとつては非
常に有効である。
更にNb2O5を加えたV2O5−P2O5−Sb2O3−
PbO−Nb2O5系及びV2O5−P2O5−Sb2O3−PbO
−Tl2O−Na2O5系では、熱膨脹係数が70〜95×
10-7/℃とより小さく、作業点が450℃以下であ
る強耐水性低温軟化ガラスが得られる。この系の
ガラスは被充てん材や被ボンデイング材に熱膨脹
係数の小さい材料を用いるときに特に有効に使用
することができる。
本発明の低温軟化ガラスは低膨張、低融点及び
強耐水性である3つの特性を同時に満足し、従来
のガラスの特性を著しく上回り、いまだ世の中に
出現していない画期的なガラスである。このよう
なガラスは充てん、ボンデイング及び封止用ガラ
スとしていろいろな方面で強く望まれている。
その他にも、一般の磁気ヘツドやLSIパツケー
ジにも使用できる。広くは、セラミツクスへの低
温ボンデイングに有効である。
一般の磁気ヘツドの充てん材及びボンデイング
材として使用する場合には、低温で作業ができる
という利点があり、磁気ヘツド全般にわたり有効
に使用できる。
LSIパツケージ、特に高熱伝導性SiCを用いた
パツケージの封止用ガラスとして有効に使用でき
る。この封止用ガラスとして、現在高膨脹低融点
であるPbO系ガラスに低膨脹材であるフイラーを
多量に含有させた材料を用いているが、本発明の
ガラスでは少量のフイラー又はフイラーなしで封
止でき、また従来より低温で封止でき、更に耐水
性が優れているので高湿中でもパツケージの使用
が可能となる。SiCとのぬれ性も悪くないことが
わかつている。
以上のように、比較的低膨脹である材料への低
温充てん、低温ボンデイング及び低温封止に有効
に使用できる。
The present invention is similar to conventional low-temperature softening glass.
The composition is not PbO as the main component, but a V 2 O 5 -P 2 O 5 -Sb 2 O 3 system with V 2 O 5 as the main component, and has a thermal expansion coefficient of 100 × 10 -7 / It is a glass that achieves three effects at the same time: it is small at less than °C, has a low working point, and is highly water resistant. Therefore, it is particularly suitable as a high-performance magnetic head material or bonding material that uses amorphous metal in low-temperature filling or bonding using glass at temperatures below 480°C. The V 2 O 5 −P 2 O 5 −Sb 2 O−PbO system with PbO added has a thermal expansion coefficient of 70 to 100×10 -7 /°C, and the working point can be lowered to 450°C or lower, and A strong water-resistant low-temperature softening glass that can improve water resistance is obtained. V 2 O 5 −P 2 O 5 −Sb 2 O−PbO 3 with further addition of Tl 2 O
-In the Tl 2 O system, the thermal expansion coefficient is 80 to 100 × 10 -7 /℃
This results in a highly water-resistant, low-temperature softening glass that can be lowered to a working point of 440°C or lower. Using this type of glass, it is possible to perform filling and bonding at low temperatures below 440°C, which is extremely effective for materials that do not have heat resistance, such as amorphous metals. V 2 O 5 −P 2 O 5 −Sb 2 O 3 − with further addition of Nb 2 O 5
PbO−Nb 2 O 5 system and V 2 O 5 −P 2 O 5 −Sb 2 O 3 −PbO
−Tl 2 O− Na 2 O 5 system has a coefficient of thermal expansion of 70 to 95 ×
A highly water-resistant, low-temperature softening glass with a lower temperature of 10 -7 /°C and a working point of 450°C or less can be obtained. This type of glass can be used particularly effectively when a material with a small coefficient of thermal expansion is used as a filling material or a bonding material. The low-temperature softening glass of the present invention simultaneously satisfies the three properties of low expansion, low melting point, and strong water resistance, significantly exceeding the properties of conventional glass, and is an epoch-making glass that has not yet appeared in the world. Such glasses are highly desired in various fields as filling, bonding and sealing glasses. In addition, it can also be used for general magnetic heads and LSI packages. Broadly speaking, it is effective for low-temperature bonding to ceramics. When used as a filler and bonding material for general magnetic heads, it has the advantage of being able to work at low temperatures and can be effectively used for all kinds of magnetic heads. It can be effectively used as a sealing glass for LSI packages, especially packages using high thermal conductivity SiC. Currently, this sealing glass is made of PbO glass, which has high expansion and low melting point, and contains a large amount of filler, which is a low expansion material, but the glass of the present invention can be sealed with a small amount of filler or without filler. It can be sealed at a lower temperature than before, and it has excellent water resistance, so the package can be used even in high humidity. It is known that the wettability with SiC is not bad. As described above, it can be effectively used for low-temperature filling, low-temperature bonding, and low-temperature sealing of materials with relatively low expansion.
Claims (1)
P2O5を17〜30重量%及びSb2O3を2〜20重量%含
有し、熱膨脹係数が100×10-7/℃以下であるこ
とを特徴とする耐水性低温軟化ガラス組成物。 2 成分として更にPbOを20重量%以下含有し、
熱膨脹係数が70〜100×10-7/℃、作業点が450℃
以下である特許請求の範囲第1項記載の耐水性低
温軟化ガラス組成物。 3 成分として更にTl2Oを15重量%以下含有し、
熱膨脹係数が80〜100×10-7/℃、作業点が440℃
以下である特許請求の範囲第2項記載の耐水性低
温軟化ガラス組成物。 4 成分として更にNb2O5を5重量%以下含有
し、熱膨脹係数が70〜95×10-7/℃、作業点が
450℃以下である特許請求の範囲第2項又は第3
項記載の耐水性低温軟化ガラス組成物。[Claims] 1. 55 to 70% by weight of V 2 O 5 as the main component;
A water-resistant low-temperature softening glass composition containing 17 to 30% by weight of P 2 O 5 and 2 to 20% by weight of Sb 2 O 3 and having a coefficient of thermal expansion of 100×10 −7 /° C. or less. 2 further contains 20% by weight or less of PbO as a component,
Thermal expansion coefficient is 70~100× 10-7 /℃, working point is 450℃
The water-resistant low-temperature softening glass composition according to claim 1, which is as follows. 3 further contains 15% by weight or less of Tl 2 O as a component,
Thermal expansion coefficient is 80~100×10 -7 /℃, working point is 440℃
The water-resistant low temperature softening glass composition according to claim 2, which is as follows. 4 Contains 5% by weight or less of Nb 2 O 5 as a component, has a thermal expansion coefficient of 70 to 95×10 -7 /℃, and has a working point of
Claim 2 or 3 that the temperature is 450°C or less
The water-resistant low-temperature softening glass composition described in 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21804785A JPS6278128A (en) | 1985-10-02 | 1985-10-02 | Water-resistant low temperature softening glass composition for amorphous magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21804785A JPS6278128A (en) | 1985-10-02 | 1985-10-02 | Water-resistant low temperature softening glass composition for amorphous magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6278128A JPS6278128A (en) | 1987-04-10 |
| JPH0372023B2 true JPH0372023B2 (en) | 1991-11-15 |
Family
ID=16713815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21804785A Granted JPS6278128A (en) | 1985-10-02 | 1985-10-02 | Water-resistant low temperature softening glass composition for amorphous magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6278128A (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0686309B2 (en) * | 1989-02-23 | 1994-11-02 | 株式会社日立製作所 | Magnetic head, manufacturing method thereof, and magnetic recording / reproducing apparatus |
| JP2767276B2 (en) * | 1989-04-06 | 1998-06-18 | 株式会社日立製作所 | Sealing material |
| JPH07112934B2 (en) * | 1990-09-26 | 1995-12-06 | 株式会社日立製作所 | Magnetic head, its bonded glass, and magnetic recording / reproducing apparatus |
| US7344901B2 (en) | 2003-04-16 | 2008-03-18 | Corning Incorporated | Hermetically sealed package and method of fabricating of a hermetically sealed package |
| US6998776B2 (en) * | 2003-04-16 | 2006-02-14 | Corning Incorporated | Glass package that is hermetically sealed with a frit and method of fabrication |
| JP2006290665A (en) * | 2005-04-08 | 2006-10-26 | Boe Technology Group Co Ltd | Lead-free sealing glass powder and its producing method |
| JP4800849B2 (en) * | 2006-06-02 | 2011-10-26 | 株式会社日立製作所 | Glass sealing material, frame glass for flat panel display, and flat panel display |
| JP6098984B2 (en) | 2012-08-30 | 2017-03-22 | コーニング インコーポレイテッド | Antimony-free glass, antimony-free frit, and glass package hermetically sealed with the frit |
-
1985
- 1985-10-02 JP JP21804785A patent/JPS6278128A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6278128A (en) | 1987-04-10 |
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