JPH0373101B2 - - Google Patents

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Publication number
JPH0373101B2
JPH0373101B2 JP61012105A JP1210586A JPH0373101B2 JP H0373101 B2 JPH0373101 B2 JP H0373101B2 JP 61012105 A JP61012105 A JP 61012105A JP 1210586 A JP1210586 A JP 1210586A JP H0373101 B2 JPH0373101 B2 JP H0373101B2
Authority
JP
Japan
Prior art keywords
ray
electrode
plasma
gas
extraction window
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61012105A
Other languages
Japanese (ja)
Other versions
JPS62172648A (en
Inventor
Yasunao Saito
Ikuo Okada
Hideo Yoshihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP61012105A priority Critical patent/JPS62172648A/en
Priority to EP86105914A priority patent/EP0201034B1/en
Priority to DE86105914T priority patent/DE3688946T2/en
Priority to US06/857,112 priority patent/US4771447A/en
Publication of JPS62172648A publication Critical patent/JPS62172648A/en
Publication of JPH0373101B2 publication Critical patent/JPH0373101B2/ja
Granted legal-status Critical Current

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  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は真空中でプラズマを形成し、このプラ
ズマから発生する軟X線を所望の雰囲気中に取り
だすX線発生装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an X-ray generator that forms plasma in a vacuum and extracts soft X-rays generated from the plasma into a desired atmosphere.

[従来の技術] 集積回路の高密度化に伴い、微細高精度な転写
技術が必要であり、その一方法としてX線露光法
がある。従来、X線露光装置のX線源としては、
アルミニウム、シリコン、パラジウム等の金属に
電子線を照射してX線を発生させる電子線励起方
式が使用されていたが、X線発生効率が10-4台と
低く、高出力のX線が得られず、生産性が低いと
いう問題があつた。この問題を解決するX線源と
して、電子線励起方式に比べて、X線発生効率が
高く、高出力のX線を得ることが期待できるプラ
ズマX線発生装置がある。プラズマX線発生装置
には、ポリエチレン細管放電、プラズマフオーカ
ス、ガス注入放電等があるが、ポリエチレン細管
放電では、ポリエチレンが蒸発して高密度プラズ
マを形成し、長波長のX線しか発生しないので、
X線露光には適さない。また、プラズマフオーカ
スでは、沿面放電を用いているために沿面が汚染
し、X線出力安定性が悪いという問題がある。こ
れらのプラズマX線源に比べ、ガス注入型放電法
はX線露光に適した波長が得られ、X線出力安定
性が良い。
[Prior Art] With the increase in the density of integrated circuits, fine and highly accurate transfer technology is required, and X-ray exposure is one such method. Conventionally, as an X-ray source for an X-ray exposure device,
An electron beam excitation method was used in which metals such as aluminum, silicon, and palladium were irradiated with electron beams to generate X-rays, but the X-ray generation efficiency was low at 10 -4 , making it difficult to produce high-power X-rays. The problem was that productivity was low. As an X-ray source that solves this problem, there is a plasma X-ray generator that has a higher X-ray generation efficiency than an electron beam excitation method and is expected to generate high-output X-rays. Plasma X-ray generators include polyethylene capillary discharge, plasma focus, and gas injection discharge, but in polyethylene capillary discharge, polyethylene evaporates to form high-density plasma and only long-wavelength X-rays are generated. ,
Not suitable for X-ray exposure. Furthermore, since plasma focus uses creeping discharge, there is a problem that the creeping surface is contaminated and the X-ray output stability is poor. Compared to these plasma X-ray sources, the gas injection discharge method provides a wavelength suitable for X-ray exposure and has good X-ray output stability.

第13図に従来のガス注入形プラズマX線発生
装置を用いたX線露光装置の一例を示す。図にお
いて、1は真空容器、2は真空室、3は真空ポン
プ、4は上部電極で電極部4Aと電極支持部4B
とからなつている。電極部4Aにはガス通路4C
が設けられている。また電極支持部4Bにはガス
溜め5A、ピストン5Bを備えた高速開閉ガスバ
ルブ5が設けられている。ガス溜め5Aと電極部
4A内のガス通路4Cはガス通路5Cで連結され
ている。ピストン5Bの駆動装置は図示を省略し
てある。6は下部電極で、上部電極の電極部4A
と対向する電極部6A、電極支持部6Bからなつ
ている。電極部6Aはメツシユまたは孔を有して
いる。支持部6Bは導電性材料からなり、排気の
ための孔6Cを有している。7はガス通路4Cか
ら噴出されたガス塊、8はピンチしたプラズマ、
9は発生したX線、10は粒子群、11はX線取
出し窓、12はマスク、13はウエハ、14は2
個の永久磁石からなる荷電粒子除去器、15は上
部電極4、下部電極6、真空容器1を絶縁する絶
縁体である。16はコンデンサで下部電極6はリ
ード線18を介してコンデンサ16に接続されて
いる。17は放電スイツチで、一端はコンデンサ
16に、他端は上部電極4に接続されている。
FIG. 13 shows an example of an X-ray exposure apparatus using a conventional gas injection type plasma X-ray generator. In the figure, 1 is a vacuum container, 2 is a vacuum chamber, 3 is a vacuum pump, and 4 is an upper electrode with an electrode part 4A and an electrode support part 4B.
It is made up of. There is a gas passage 4C in the electrode part 4A.
is provided. Further, the electrode support portion 4B is provided with a high-speed opening/closing gas valve 5 having a gas reservoir 5A and a piston 5B. The gas reservoir 5A and the gas passage 4C in the electrode section 4A are connected by a gas passage 5C. A driving device for the piston 5B is not shown. 6 is the lower electrode, and the electrode part 4A of the upper electrode
It consists of an electrode part 6A and an electrode support part 6B, which face each other. The electrode portion 6A has a mesh or a hole. The support portion 6B is made of a conductive material and has a hole 6C for exhaust. 7 is a gas mass ejected from the gas passage 4C, 8 is a pinched plasma,
9 is the generated X-ray, 10 is a particle group, 11 is an X-ray extraction window, 12 is a mask, 13 is a wafer, 14 is 2
A charged particle remover 15 consisting of permanent magnets is an insulator that insulates the upper electrode 4, the lower electrode 6, and the vacuum vessel 1. 16 is a capacitor, and the lower electrode 6 is connected to the capacitor 16 via a lead wire 18. 17 is a discharge switch, one end of which is connected to the capacitor 16, and the other end connected to the upper electrode 4.

ガス注入放電を起すには、真空室2を真空ポン
プ3により、10-5〜10-6Torr程度まで排気し、
ガスボンベ19から、ネオンやクリプトン等の放
電ガスを高速開閉ガスバルブ5へ導入する。つぎ
に、充電電源20によりコンデンサ16を充電し
たあと、信号発生装置21の信号により、高速開
閉ガスバルブ5の電源22を動作させ、高速開閉
ガスバルブ5を駆動し、高電圧が印加される上部
電極4の電極部4Aと対向する下部電極6の電極
部6Aの間にガス塊7を形成する。同時に信号発
生装置21の信号は、上部電極部4Aと下部電極
部6Aの間に放電用ガスが注入される時間と放電
開始の時間とが一致するように設定された遅延パ
ルサ23を通つて、高電圧パルス発生装置24に
入力され、高電圧パルスで放電スイツチ17を動
作させ、絶縁体15で絶縁されている上部電極4
と下部電極6の間に高電圧を印加し、ガス塊7を
電離して円柱状のプラズマを生成する。さらに、
円柱状プラズマの中心軸方向(以後、プラズマ軸
方向という)に沿つて流れる電流の作る磁場とプ
ラズマ中のイオン・電子の相互作用によりプラズ
マを収束させ、プラズマを圧縮し、高温高密度プ
ラズマ8を生成する。この高温高密度プラズマ8
中のイオンと電子の相互作用でX線9を発生させ
る。高温高密度プラズマ8からは、X線の他に光
等の電磁波やイオン、電子などの荷電粒子および
高温ガスからなる粒子群10が放出され、とく
に、電極の中心軸方向には高エネルギの粒子群1
0が大量に放射される。
To generate gas injection discharge, the vacuum chamber 2 is evacuated to about 10 -5 to 10 -6 Torr using the vacuum pump 3.
A discharge gas such as neon or krypton is introduced from the gas cylinder 19 to the high-speed opening/closing gas valve 5. Next, after the capacitor 16 is charged by the charging power source 20, the power source 22 of the high-speed opening/closing gas valve 5 is operated according to the signal from the signal generator 21, driving the high-speed opening/closing gas valve 5, and the upper electrode 4 to which a high voltage is applied. A gas mass 7 is formed between the electrode section 4A of the lower electrode 6 and the opposing electrode section 6A of the lower electrode 6. At the same time, the signal from the signal generator 21 passes through the delay pulser 23, which is set so that the time when the discharge gas is injected between the upper electrode part 4A and the lower electrode part 6A coincides with the time when the discharge starts. The high voltage pulse is input to the high voltage pulse generator 24 and operates the discharge switch 17, and the upper electrode 4 which is insulated with the insulator 15
A high voltage is applied between the lower electrode 6 and the gas mass 7 to ionize the gas mass 7 and generate a cylindrical plasma. moreover,
The interaction between the magnetic field created by the current flowing along the central axis of the columnar plasma (hereinafter referred to as the plasma axis direction) and the ions and electrons in the plasma converges the plasma, compresses the plasma, and creates a high-temperature, high-density plasma 8. generate. This high temperature high density plasma 8
X-rays 9 are generated by interaction between ions and electrons inside. In addition to X-rays, the high-temperature, high-density plasma 8 emits particle groups 10 consisting of electromagnetic waves such as light, charged particles such as ions and electrons, and high-temperature gas. Group 1
A large amount of 0 is emitted.

X線源径が小さく微細パタン転写に適するプラ
ズマ軸方向露光では、プラズマ軸方向に飛来する
大きなエネルギを持つた粒子、光等によるX線取
出し窓11の損傷が大きくなる。プラズマ軸方向
露光に際して荷電粒子による損傷をさけるため
に、従来、第13図に示すように、ピンチしたプ
ラズマ8とX線取出し窓11の間に、荷電粒子除
去器14を挿入し、荷電粒子除去器の磁場により
荷電粒子を除去する方法が用いられていた。しか
し、ガス注入路を有する上部電極に反射された荷
電粒子はほとんどX線取出し窓方向に放射される
ため、X線取出し窓方向の荷電粒子が極端に増大
し、荷電粒子除去器のみでは、荷電粒子を完全に
除去できない。そのため、膜厚の厚いベリリウム
等のX線取出し窓を用いることでX線取出し窓1
1の損傷を防止していた。そのため、X線取出し
効率が悪く、X線露光に要する時間が長くなつ
て、スループツトが低下する問題があつた。
In plasma axial exposure where the diameter of the X-ray source is small and is suitable for fine pattern transfer, the X-ray extraction window 11 is seriously damaged by particles, light, etc. with high energy flying in the plasma axis direction. In order to avoid damage caused by charged particles during plasma axial exposure, conventionally a charged particle remover 14 is inserted between the pinched plasma 8 and the X-ray extraction window 11 to remove the charged particles, as shown in FIG. A method was used to remove charged particles using a magnetic field. However, most of the charged particles reflected by the upper electrode with the gas injection path are emitted toward the X-ray extraction window, so the number of charged particles in the direction of the X-ray extraction window increases dramatically, and charged particle removers alone cannot Particles cannot be completely removed. Therefore, by using an X-ray extraction window made of thick beryllium, etc., the X-ray extraction window 1
1 damage was prevented. Therefore, there was a problem that the X-ray extraction efficiency was poor, the time required for X-ray exposure was increased, and the throughput was reduced.

1回の露光に際し、露光むらをさけるため、通
常10ないし20シヨツトの繰返し放電を行つてい
る。繰返し放電は排気、ガス注入、放電を繰返す
のであるが、従来の装置では放電の繰返し速度を
速くすると、放電電極部4A,6A付近のガス抜
きが不充分となり、電極部4A,6A以外の部分
で放電する異常放電が起り易く、X線出力が低下
するので、安定なX線出力を得るためには、1Hz
程度の繰返し速度で使用しなければならず、スル
ープツトの向上が望めなかつた。
To avoid uneven exposure, usually 10 to 20 shots are repeatedly discharged during one exposure. Repeated discharge involves repeating exhaust, gas injection, and discharge. However, in conventional devices, when the discharge repetition rate is increased, gas removal near the discharge electrode parts 4A and 6A is insufficient, and parts other than the electrode parts 4A and 6A are In order to obtain stable X-ray output, it is necessary to reduce the
It had to be used at a certain repetition rate, and no improvement in throughput could be expected.

またプラズマがピンチし崩壊したときに、上部
電極に衝突し反射されたガスがX線取出し窓方向
に放射されるため、高繰返し放電時には、X線取
出し窓方向のガスの排気が不充分となり、それら
のガスによりX線取出し窓方向のX線が減衰す
る。たとえば、第14図に示すように、波長12Å
のX線では、下部電極中心付近に厚さ1〜2cm程
度で70Torrのネオンガスが存在すると、X線出
力は1/2程度に低下する。
In addition, when the plasma pinches and collapses, the gas that collides with the upper electrode and is reflected is radiated toward the X-ray extraction window, so during high-repetition discharges, the gas is insufficiently exhausted toward the X-ray extraction window. These gases attenuate the X-rays in the direction of the X-ray extraction window. For example, as shown in Figure 14, the wavelength is 12 Å.
For X-rays, if a neon gas of 70 Torr with a thickness of about 1 to 2 cm exists near the center of the lower electrode, the X-ray output decreases to about 1/2.

さらに、プラズマ軸方向には、高温、高密度の
プラズマが放出されるため、上部電極の中心部
は、消耗が激しくなる等の問題があつた。
Furthermore, since high-temperature, high-density plasma is emitted in the plasma axis direction, the central part of the upper electrode suffers from severe wear and other problems.

また、他の露光装置として、荷重粒子、高温ガ
スなどの粒子群の影響を避けるため、粒子群10
のプラズマ径方向への放射が軸方向の1/100〜1/1
000であるのを利用して、第15図のようにX線
取出し窓11、マスク12、ウエハ13等はピン
チしたプラズマ8の径方向に設置し、X線取出し
窓11からX線を取出して露光させる装置があ
る。なお第15図では放電用ガス供給系、放電の
ための電気系は図示を省略してある。第16図は
X線マスクの設置されているX線源の径方向から
撮影したX線ピンホール写真によるX線源の形状
である。このような径方向露光では、マスク・ウ
エハ間隔を10〜20μmとしてプロキシミテイ露光
を行つた場合には、第17図に示すようにピンチ
したプラズマすなわちX線源の長さdとX線源距
離D、ウエハ・マスク間隔sで決まる半影ぼけδ
=ds/Dが大きくなるため、微細パタン転写は不
可能であつた。
In addition, in other exposure devices, in order to avoid the influence of particle groups such as loaded particles and high-temperature gas,
The plasma radiation in the radial direction is 1/100 to 1/1 of that in the axial direction.
000, the X-ray extraction window 11, mask 12, wafer 13, etc. are installed in the radial direction of the pinched plasma 8 as shown in FIG. 15, and the X-rays are extracted from the X-ray extraction window 11. There is an exposure device. Note that in FIG. 15, the gas supply system for discharge and the electrical system for discharge are omitted from illustration. FIG. 16 shows the shape of the X-ray source as an X-ray pinhole photograph taken from the radial direction of the X-ray source where the X-ray mask is installed. In such radial exposure, when proximity exposure is performed with a mask-wafer interval of 10 to 20 μm, the pinched plasma, that is, the length d of the X-ray source and the X-ray source distance, are D, penumbra blur δ determined by wafer-mask spacing s
=ds/D became large, making it impossible to transfer fine patterns.

[発明が解決しようとする問題点] 本発明は、半影ぼけの少ないプラズマ軸方向取
出しのX線発生装置における上述した欠点、すな
わち荷電粒子、高温ガスなどの粒子群によるX
線取出し窓および上部電極の損傷、高速繰返し
放電時のX線出力の不安定性、ガスによるX線
出力の減衰、を改善し、X線取出し窓の薄膜化、
X線露光の高速化、高速繰返し露光の可能なX線
発生装置を提供することを目的とする。
[Problems to be Solved by the Invention] The present invention solves the above-mentioned drawbacks of an X-ray generator that takes out the plasma in the axial direction with little penumbra blur, namely,
Damage to the X-ray extraction window and upper electrode, instability of X-ray output during high-speed repetitive discharge, and attenuation of X-ray output due to gas have been improved, and the X-ray extraction window has been made thinner.
It is an object of the present invention to provide an X-ray generator capable of high-speed X-ray exposure and high-speed repetitive exposure.

[問題点を解決するための手段] このような目的を達成するために、本発明のX
線発生装置においては、プラズマ形成のための対
向する1組の電極の一方に放電用ガス注入のため
のガス通路が設けられており、1組の電極のそれ
ぞれには、一端が各電極の対向面に開口した他端
がそれぞれの電極の対向面以外の面に開口して真
空に連なる貫通孔が少なくとも1個設けられてい
る。
[Means for solving the problem] In order to achieve such an object,
In the line generator, a gas passage for injecting discharge gas is provided on one side of a pair of opposing electrodes for plasma formation, and each of the pair of electrodes has one end facing opposite to each electrode. At least one through hole is provided, the other end of which is open in the surface, open in a surface other than the opposing surface of each electrode, and connected to the vacuum.

[作用] プラズマを形成させるための1組の放電電極
に、一端が両電極の対向面に開口し、他端が対向
面以外の面に開口して真空に連なる貫通孔を設け
ることにより、プラズマから発生するイオンや電
子、高温ガス等によるX線取出し窓の損傷を小さ
くでき、薄膜のX線取出し窓が使用できると同時
にX線源距離を小さくできるため、プラズマから
発生するX線を高効率で利用できる。また高速繰
返し露光が可能になる。
[Operation] Plasma can be generated by providing a set of discharge electrodes for forming plasma with a through hole that opens at one end on the opposing surface of both electrodes, and the other end opens on a surface other than the opposing surface and connects to a vacuum. Damage to the X-ray extraction window due to ions, electrons, high-temperature gas, etc. generated from the plasma can be reduced, and a thin-film X-ray extraction window can be used, while the distance to the X-ray source can be shortened, making it possible to efficiently capture X-rays generated from the plasma. Available at Furthermore, high-speed repetitive exposure becomes possible.

[実施例] 以下に図面を参照して本発明の実施例を詳細に
説明する。
[Examples] Examples of the present invention will be described in detail below with reference to the drawings.

実施例 1 第1図に本発明のX線発生装置の実施例を用い
たX線露光装置の例を示す。図においては第12
図に示した従来例と同一または類似の部分は同一
番号を付して説明を省略する。本実施例が従来例
と最も異なるのは、上部電極4に、一端が電極部
4Aの下部電極6の電極部6Aと対向する面に開
口し、他端が電極支持部4Bの側面に開口する貫
通孔31が設けられている点である。貫通孔31
の全ての端部が真空室内に開口するように、上部
電極4が真空室2内に深く挿入され、下部電極支
持部6Bの形状も上部電極4に合わせてある。上
部電極4と下部電極6との間の空間は孔6Cを通
して真空ポンプ3により排気される。第2図は第
1図の上部電極支持部4BのX−X線に沿つた断
面を示す図である。この図では貫通孔31は電極
部4Aの中心部から上方に延び、支持部4B内で
3方向に分岐して支持部4Bの側面の3個所に開
口している例を示してあるが、分岐は3方向には
限られず、また分岐を有しなくてもよい。5Cは
ガス溜め5Aと電極部4A内のガス通路4Cを結
ぶガス通路である。第2図ではガス通路5C,4
Cを多数の円管状通路で形成した例を示したが、
ガス通路5C,4Cは断面が円弧状の複数通路で
形成してもよく、貫通孔31が分岐を有しない場
合は断面が円環状であつてもよい。
Embodiment 1 FIG. 1 shows an example of an X-ray exposure apparatus using an embodiment of the X-ray generating apparatus of the present invention. In the figure, the 12th
Portions that are the same as or similar to those of the conventional example shown in the figures are given the same numbers and their explanations will be omitted. The biggest difference between this embodiment and the conventional example is that the upper electrode 4 has one end opened on the surface of the lower electrode 6 of the electrode section 4A facing the electrode section 6A, and the other end opened on the side surface of the electrode support section 4B. The point is that a through hole 31 is provided. Through hole 31
The upper electrode 4 is deeply inserted into the vacuum chamber 2 so that all ends thereof open into the vacuum chamber, and the shape of the lower electrode support portion 6B is also matched to the upper electrode 4. The space between the upper electrode 4 and the lower electrode 6 is evacuated by the vacuum pump 3 through the hole 6C. FIG. 2 is a diagram showing a cross section of the upper electrode support portion 4B of FIG. 1 taken along the line X--X. In this figure, an example is shown in which the through hole 31 extends upward from the center of the electrode section 4A, branches in three directions within the support section 4B, and opens at three locations on the side surface of the support section 4B. is not limited to three directions, and may not have branches. 5C is a gas passage connecting the gas reservoir 5A and the gas passage 4C in the electrode section 4A. In Figure 2, gas passages 5C, 4
Although we have shown an example in which C is formed by a large number of circular tubular passages,
The gas passages 5C and 4C may be formed of a plurality of passages each having an arcuate cross section, or may have an annular cross section if the through hole 31 does not have a branch.

第1図に示した実施例を動作させるには、先に
述べた従来例を動作させるのと同様にして行う。
すなわち、真空室2内を10-5〜10-6Torr程度に
排気し、電極部4A,6A間にガスを注入してガ
ス塊7を形成し、両電極間に高電圧を印加して放
電を起させ、プラズマ8を形成してX線9を発生
させる。電極部4A,6Aには例えば、銅、銅−
タングステン合金などを使用する。1回の放電に
おけるX線の発生時間は1μ秒またはそれ以下で
ある。排気−ガス注入−放電−X線発生のサイク
ルを繰返して露光作業を行う。
The embodiment shown in FIG. 1 is operated in the same manner as the prior art example described above.
That is, the inside of the vacuum chamber 2 is evacuated to about 10 -5 to 10 -6 Torr, gas is injected between the electrode parts 4A and 6A to form a gas mass 7, and a high voltage is applied between both electrodes to cause discharge. is caused to occur, plasma 8 is formed, and X-rays 9 are generated. For example, copper, copper-
Use tungsten alloy, etc. The generation time of X-rays in one discharge is 1 μsec or less. Exposure work is performed by repeating the cycle of exhaust, gas injection, discharge, and X-ray generation.

電極間でピンチしたプラズマ8からX線9の他
に高密度プラズマの崩壊過程で生ずるイオンや電
子、高温ガス等の粒子群10が放出される。X線
がプラズマの各点から周囲へほぼ等方的に放射さ
れるのに対し、イオン、電子、高温ガス等はプラ
ズマ軸方向を中心に放出させる。本発明では、プ
ラズマ軸方向のガス注入側の上部電極4にも貫通
孔31を有しているため、ピンチしたプラズマ8
から発生する粒子群は、X線取出し窓11方向だ
けでなく、上部電極4側にも吸収される。第3図
A,Bはマスク12の位置にフアラデーカツプを
置いて、X線取出し窓方向に放出されるイオンに
よる起電力を測定した結果を示す。第3図Aは従
来の電極を用いた場合、同図Bは第1図の実施例
に示す貫通孔31を有する本発明の上部電極4を
用いた場合の結果である。明らかに貫通孔31を
有する電極の方が、粒子群の一部であるイオンが
減少していることがわかる。本発明では、第3図
に示すように、X線取出し窓方向への粒子群は減
少し、X線取出し窓11の損傷も少なくなる。し
たがつて、X線取出し窓11の薄膜化が可能にな
り、X線取出し効率がよくなるため、スループツ
トの向上に役立つ。
In addition to X-rays 9, a group of particles 10 such as ions, electrons, and high-temperature gas generated during the collapse process of the high-density plasma are emitted from the plasma 8 pinched between the electrodes. While X-rays are emitted almost isotropically from each point of the plasma to the surroundings, ions, electrons, high temperature gas, etc. are emitted mainly in the plasma axis direction. In the present invention, since the upper electrode 4 on the gas injection side in the plasma axis direction also has the through hole 31, the pinched plasma 8
The particles generated from the X-ray extraction window 11 are absorbed not only toward the X-ray extraction window 11 but also toward the upper electrode 4. 3A and 3B show the results of measuring the electromotive force caused by ions emitted toward the X-ray extraction window with a Faraday cup placed at the position of the mask 12. 3A shows the result when a conventional electrode is used, and FIG. 3B shows the result when the upper electrode 4 of the present invention having the through hole 31 shown in the embodiment of FIG. 1 is used. It is clearly seen that the electrode having the through holes 31 has fewer ions that are part of the particle group. In the present invention, as shown in FIG. 3, the number of particles moving toward the X-ray extraction window is reduced, and damage to the X-ray extraction window 11 is also reduced. Therefore, it is possible to make the X-ray extraction window 11 thinner, and the X-ray extraction efficiency is improved, which helps improve throughput.

先に述べたように、X線露光のための繰返し放
電に際して、電極間に注入したガス急速に排気す
る必要がある。排気が不充分だと異常放電が起り
易くなり、X線の出力が低下する。第4図は繰返
し放電の速さとX線出力との関係を調べた結果で
あつて、曲線aは従来の電極を用いた場合、曲線
bは貫通孔31を有する上部電極を用いた本発明
のX線発生装置の場合である。従来のX線発生装
置では繰返し放電を3Hzで行うと、X線出力は1
Hzの時の約80%に低下する。これに対し、本実施
例の装置では、上部電極4に電極部4Aの下部電
極との対向面に開口を有する貫通孔31が設けら
れているので、ピンチしたプラズマが上部電極に
衝突し反射することがなく、そのまま排気される
ため、電極付近のガスの排気が速くなり、3Hz程
度の高速運転でも異常放電を起すことなく1Hzと
同様なX線出力が安定に得られる。
As mentioned above, during repeated discharge for X-ray exposure, it is necessary to rapidly exhaust the gas injected between the electrodes. If the exhaust is insufficient, abnormal discharge tends to occur and the output of X-rays decreases. FIG. 4 shows the results of investigating the relationship between the speed of repeated discharge and the X-ray output. Curve a is the case when a conventional electrode is used, and curve b is the case where the upper electrode with the through hole 31 is used. This is the case with an X-ray generator. With conventional X-ray generators, when repeated discharge is performed at 3Hz, the X-ray output is 1
It drops to about 80% of that of Hz. In contrast, in the device of this embodiment, the upper electrode 4 is provided with the through hole 31 having an opening on the surface facing the lower electrode of the electrode section 4A, so that the pinched plasma collides with the upper electrode and is reflected. Since the gas near the electrodes is exhausted without causing any abnormal discharge, the gas near the electrodes is exhausted quickly, and X-ray output similar to that at 1 Hz can be stably obtained without abnormal discharge even during high-speed operation of about 3 Hz.

また本発明のX線発生装置では、上部電極の損
傷が少ない。第5図A,Bは1000シヨツト放電後
の銅製の上部電極の断面図で、同図Aが従来の装
置、Bが本発明の実施例である。従来の装置では
電極部4Aの中心部が溶けて、4Dで示すように
消耗している。第5図Bに示す本発明の実施例で
は、電極中心部が開口しているので、高温、高密
度プラズマが電極に集中的に当ることがなく、電
極消耗も電極表面がわずかに減る程度である。
Furthermore, in the X-ray generator of the present invention, the upper electrode is less likely to be damaged. FIGS. 5A and 5B are cross-sectional views of the copper upper electrode after 1000 shot discharges, where A is a conventional device and B is an embodiment of the present invention. In the conventional device, the center of the electrode portion 4A melts and is consumed as shown by 4D. In the embodiment of the present invention shown in FIG. 5B, since the center of the electrode is open, high-temperature, high-density plasma does not hit the electrode intensively, and electrode wear is only slightly reduced on the electrode surface. be.

第6図に貫通孔31の他の形態を示す。この例
では貫通孔31の一端は電極部4Aの電極部6A
との対向面に開口し、他端は電極部4Aの側面に
開口している。図示のように電極部4Aを外筒4
Eと内筒4Fを組合せて形成すると作成が容易で
ある。
FIG. 6 shows another form of the through hole 31. In this example, one end of the through hole 31 is connected to the electrode portion 6A of the electrode portion 4A.
The other end is opened at the side surface of the electrode section 4A. As shown in the figure, connect the electrode part 4A to the outer cylinder 4.
It is easy to create by combining E and the inner cylinder 4F.

実施例 2 第7図は本発明の他の実施例を示す図である。
図において、放電用ガスの供給系、放電のための
電気系は図示を省略してある。この実施例は上部
電極4の貫通孔31が他の排気装置に接続された
ものである。ここで、32はターボ分子ポンプ等
の真空ポンプ、33はポンプと上部電極の貫通孔
31を結ぶ配管系である。プラズマがピンチした
ときにプラズマ軸方向に発生する粒子群10は上
部電極4の貫通孔31と配管系を通り真空ポンプ
32で排気される。したがつて、X線取出し窓1
1方向の粒子群10が少なくなり、X線取出し窓
の薄膜化が可能になつてX線取出し効率が向上す
る。
Embodiment 2 FIG. 7 is a diagram showing another embodiment of the present invention.
In the figure, illustration of a discharge gas supply system and an electrical system for discharge is omitted. In this embodiment, the through hole 31 of the upper electrode 4 is connected to another exhaust device. Here, 32 is a vacuum pump such as a turbo molecular pump, and 33 is a piping system connecting the pump and the through hole 31 of the upper electrode. Particle groups 10 generated in the plasma axis direction when the plasma is pinched pass through the through hole 31 of the upper electrode 4 and the piping system, and are exhausted by the vacuum pump 32. Therefore, X-ray extraction window 1
The number of particle groups 10 in one direction is reduced, the X-ray extraction window can be made thinner, and the X-ray extraction efficiency is improved.

第8図は上部電極4の電極部4Aの他の形態を
示す断面図である。電極部4Aの外筒4Eの先端
部を内側へ湾曲させることによつて、注入ガスを
電極中心部に集中させ、貫通孔31による排気を
一層効率よく行うことができる。
FIG. 8 is a sectional view showing another form of the electrode portion 4A of the upper electrode 4. By curving the tip of the outer tube 4E of the electrode section 4A inward, the injected gas can be concentrated at the center of the electrode, and the gas can be exhausted through the through hole 31 more efficiently.

実施例 3 第9図に本発明の他の実施例を示す。この例で
はガスの注入が下部電極6側から行われる。なお
第9図において真空室外部のガス注入系、電気系
は図示を省略してある。放電用ガスは下部電極側
からガス通路6Eを通して注入されるが、放電に
よるプラズマの形成、X線の発生は、第1図およ
び第7図に示した実施例と全く同様に行うことが
できる。この実施例における上部電極4の電極部
4Aは円筒状であり、その中央部は貫通孔31と
なつている。粒子群10は貫通孔31を通つて真
空容器の上部へ排気されるので、X線取出し窓1
1方向への放射が少なくなる。真空容器1の貫通
孔31の直上部に当る部分に耐熱性のブロツク3
4を設けて、粒子群10を横方向に反射させると
真空容器の高さを低くしても損傷を少なくし、か
つ粒子群の排気にも都合がよい。
Embodiment 3 FIG. 9 shows another embodiment of the present invention. In this example, gas is injected from the lower electrode 6 side. In FIG. 9, the gas injection system and electrical system outside the vacuum chamber are not shown. Although the discharge gas is injected from the lower electrode side through the gas passage 6E, plasma formation and X-ray generation by discharge can be performed in exactly the same manner as in the embodiments shown in FIGS. 1 and 7. The electrode portion 4A of the upper electrode 4 in this embodiment has a cylindrical shape, and a through hole 31 is formed in the center thereof. Since the particle group 10 is exhausted to the upper part of the vacuum container through the through hole 31, the X-ray extraction window 1
Radiation in one direction is reduced. A heat-resistant block 3 is placed directly above the through hole 31 of the vacuum container 1.
4 to reflect the particle group 10 laterally, damage can be reduced even if the height of the vacuum container is lowered, and it is also convenient for exhausting the particle group.

実施例 4 第10図は本発明の他の実施例を示す図であ
る。本実施例においては、X線取出し窓11が、
第1の膜11A、第2の膜11B、第3の膜11
Cからなつている。その他の構成は第1図に示し
た実施例と同様である。
Embodiment 4 FIG. 10 is a diagram showing another embodiment of the present invention. In this embodiment, the X-ray extraction window 11 is
First film 11A, second film 11B, third film 11
It starts with C. The rest of the structure is the same as the embodiment shown in FIG.

粒子群10の多くは貫通孔31を通つて排気さ
れるが、X線取出し窓方向に放射される部分もあ
る。その中の荷電粒子は荷電粒子除去器14によ
つて除去されるが、高温ガスや除去し切れなかつ
た荷電粒子の一部はX線取出し窓11に到達す
る。第1の膜11Aは、残存して到達した粒子群
を除去するためのもので、比較的耐熱性が高く、
かつX線の透過のよいベリリウム、アルミニウ
ム、チタン等の金属薄膜、炭素、Si−N、SiN4
SiC、BN等の無機膜、ポリイミド等の有機膜、
あるいは、これらの複合膜であることが望まし
い。第2の膜11Bは真空を保持するための膜で
ベリリウム、アルミニウム、チタン等の金属薄
膜、炭素、Si−N、SiN4、SiC、BN等の無機膜、
ポリプロピレン、マイラー、ポリイミド等の有機
膜、あるいは、これらの複合膜であることが望ま
しく、またこれらの膜を金属メツシユ、炭素メツ
シユ、シリコンメツシユ等で補強したものでもよ
い。第3の膜11CはX線取出し室35と大気と
を隔る膜である。X線取出し室35にはガス入口
35Aからヘリウム等のX線透過率の高いガスが
導入され、ガス出口35Bから排出される。マス
ク、ウエハ等は第3の膜に近接して置かれる。第
1の膜と第2の膜の距離は短く、第2の膜と第3
の膜の間はヘリウムで満されるので、3重膜構造
としてもX線の減衰は少ない。第3の膜はX線の
透過率が高ければよく、ベリリウム、アルミニウ
ム、チタン等の金属薄膜、炭素、Si−N、SiN4
SiC、BN等の無機膜、ポリプロピレン、マイラ
ー、ポリイミド等の有機膜、あるいは、これらの
複合膜を用いることができ、また1μm以下の薄
膜を使用することができる。
Most of the particle group 10 is exhausted through the through hole 31, but some part is emitted toward the X-ray extraction window. The charged particles therein are removed by the charged particle remover 14, but the high temperature gas and some of the charged particles that cannot be removed reach the X-ray extraction window 11. The first film 11A is for removing the remaining particle group and has relatively high heat resistance.
Metal thin films such as beryllium, aluminum, and titanium that have good X-ray transmission, carbon, Si-N, SiN 4 ,
Inorganic films such as SiC and BN, organic films such as polyimide,
Alternatively, a composite membrane of these is desirable. The second film 11B is a film for maintaining a vacuum, and includes a thin metal film such as beryllium, aluminum, and titanium, an inorganic film such as carbon, Si-N, SiN4 , SiC, and BN.
It is preferable to use an organic film such as polypropylene, Mylar, or polyimide, or a composite film of these films, and these films may be reinforced with metal mesh, carbon mesh, silicon mesh, or the like. The third film 11C is a film that separates the X-ray extraction chamber 35 from the atmosphere. A gas with high X-ray transmittance, such as helium, is introduced into the X-ray extraction chamber 35 from the gas inlet 35A, and is discharged from the gas outlet 35B. A mask, wafer, etc. is placed in close proximity to the third membrane. The distance between the first film and the second film is short, and the distance between the second film and the third film is short.
Since the spaces between the membranes are filled with helium, the attenuation of X-rays is small even with the triple membrane structure. The third film only needs to have high X-ray transmittance, and may be a metal thin film such as beryllium, aluminum, titanium, carbon, Si-N, SiN 4 ,
An inorganic film such as SiC or BN, an organic film such as polypropylene, Mylar, or polyimide, or a composite film thereof can be used, and a thin film of 1 μm or less can be used.

このような3重膜構造のX線取出し窓11は、
個々の膜を薄くすることができるので全体として
X線透過率を高めることができる。さらに、第1
0図に示すように、貫通孔31をもつ上部電極に
よればX線取出し窓方向への粒子群の放出が少な
くなるので、第1の膜をより薄くすることがで
き、取出すX線の強度をより高いものとすること
ができる。
The X-ray extraction window 11 with such a triple membrane structure is
Since each film can be made thinner, the overall X-ray transmittance can be increased. Furthermore, the first
As shown in Figure 0, the upper electrode with the through hole 31 reduces the emission of particle groups toward the X-ray extraction window, allowing the first film to be made thinner and reducing the intensity of the X-rays extracted. can be made higher.

実施例 5 第11図に本発明のさらに他の実施例を示す。
図には、放電電極部およびX線取出し窓部のみを
示してある。本実施例の特徴は、上部電極4に貫
通孔31を設け、しかもX線取出し窓11の法線
方向とプラズマ発生のための一組の電極の中心軸
とを傾け、かつX線取出し窓11の中心位置が発
生されるプラズマ8の軸方向延長線からずらして
設けられていることである。貫通孔31の効果に
ついては、これまでの実施例において説明したと
おりである。ピンチしたプラズマ8から発生する
X線9がプラズマの各点から周囲へほぼ等方的に
放射されるのに対し、イオン、電子、高温ガス等
の粒子群は、プラズマ軸方向を中心に放出され
る。第11図に示した構成のX線発生装置では、
X線9はX線取出し窓11を照射するが、貫通孔
31から排気されず、下部電極6側に放射された
粒子群10はほとんどX線取出し窓11には衝突
しない。X線取出し窓の法線と上部電極、下部電
極の中心軸のなす角度は45°をこえると先に述べ
た径方向露光の欠点、すなわち半影ぼけが大きく
なるので好ましくない。有効な傾き角の下限は露
光装置の構成によつて異なるが、通常の装置構成
では2°〜3°で充分である。貫通孔31の効果とあ
わせX線取出し窓の損傷を一層少なくすることが
できる。その結果、薄膜のX線取出し窓が使用で
きると同時にX線源距離を短くできるため、プラ
ズマから発生するX線を高効率で利用できる。
Embodiment 5 FIG. 11 shows still another embodiment of the present invention.
In the figure, only the discharge electrode section and the X-ray extraction window section are shown. The feature of this embodiment is that the upper electrode 4 is provided with a through hole 31, the normal direction of the X-ray extraction window 11 and the central axis of a set of electrodes for plasma generation are tilted, and the X-ray extraction window 11 The central position of the plasma 8 is offset from the axial extension line of the generated plasma 8. The effect of the through hole 31 is as explained in the previous embodiments. While the X-rays 9 generated from the pinched plasma 8 are emitted almost isotropically from each point of the plasma to the surroundings, groups of particles such as ions, electrons, and high-temperature gas are emitted centered in the plasma axis direction. Ru. In the X-ray generator with the configuration shown in Fig. 11,
Although the X-rays 9 irradiate the X-ray extraction window 11, they are not exhausted from the through hole 31, and the particle group 10 emitted toward the lower electrode 6 hardly collides with the X-ray extraction window 11. If the angle between the normal line of the X-ray extraction window and the central axes of the upper and lower electrodes exceeds 45°, the above-mentioned drawback of radial exposure, that is, penumbra blur will increase, which is not preferable. Although the lower limit of the effective tilt angle differs depending on the configuration of the exposure apparatus, 2° to 3° is sufficient for normal apparatus configurations. In combination with the effect of the through hole 31, damage to the X-ray extraction window can be further reduced. As a result, a thin film X-ray extraction window can be used and at the same time the distance between the X-ray sources can be shortened, so that X-rays generated from plasma can be used with high efficiency.

第12図に示すように、上部電極4に貫通孔3
1を設け、電極の中心軸を11A,11B,11
Cの3重膜構造のX線取出し窓11の法線方向と
傾けることも可能である。第12図に示した実施
例の構成によれば、貫通孔31の効果、3重膜構
造のX線取出し窓の効果、放電電極の中心軸とX
線取出し窓の傾きの効果が相乗されるので、プラ
ズマから発生するX線を高効率で利用でき、X線
露光のスループツトを向上させることができる。
As shown in FIG. 12, the upper electrode 4 has a through hole 3.
1, and the central axes of the electrodes are set at 11A, 11B, 11
It is also possible to tilt with respect to the normal direction of the X-ray extraction window 11 having the triple membrane structure of C. According to the configuration of the embodiment shown in FIG. 12, the effect of the through hole 31, the effect of the X-ray extraction window of the triple membrane structure, the
Since the effects of the inclination of the radiation extraction window are multiplied, the X-rays generated from the plasma can be used with high efficiency, and the throughput of X-ray exposure can be improved.

なお、貫通孔を備えた放電電極と3重膜構造の
X線取出し窓を組合わせた場合および貫通孔を備
えた放電電極の中心軸がX線取出し窓の法線方向
と傾けて設けられている場合の貫通孔の形態は、
第10図、第11図、第12図に図示した実施例
における形態に限られないことは言うまでもな
い。またガス注入のためのガス溜め5A、ピスト
ン5Bは、放電電極内に設けることがガス注入の
急速化のためには好ましいが、それらを放電電極
の外部に設け、放電電極内にはガス通路のみを設
けることも可能である。
In addition, when a discharge electrode equipped with a through hole is combined with an X-ray extraction window having a triple membrane structure, and when the central axis of the discharge electrode equipped with a through hole is inclined with respect to the normal direction of the X-ray extraction window, The form of the through hole when
It goes without saying that the present invention is not limited to the embodiments shown in FIGS. 10, 11, and 12. Furthermore, it is preferable to provide the gas reservoir 5A and piston 5B inside the discharge electrode for rapid gas injection, but it is preferable to provide them outside the discharge electrode and only the gas passage inside the discharge electrode. It is also possible to provide

これまでX線露光装置を例として説明してきた
が、本発明による真空に通ずる貫通孔を設けた電
極を持つX線発生装置は、X線分析装置、X線顕
微鏡、X線励起による化学反応装置、X線励起を
利用する膜形成装置ならびにX線励起を利用する
エツチング装置に適用してそれら装置の小形化、
反応の促進等に用いることができる。
Although the explanation has been given using an X-ray exposure device as an example, the X-ray generator according to the present invention having an electrode provided with a through hole communicating with a vacuum can be used as an X-ray analyzer, an X-ray microscope, or a chemical reaction device using X-ray excitation. , miniaturization of these devices by applying them to film forming devices that utilize X-ray excitation and etching devices that utilize X-ray excitation;
It can be used to promote reactions, etc.

[発明の効果] 以上説明したように、プラズマを形成させるた
めの1組の放電電極に、一端が両電極の対向面に
開口し、他端が対向面以外の面に開口して真空に
連なる貫通孔を設けることにより、プラズマから
発生するイオンや電子、高温ガス等によるX線取
出し窓の損傷を小さくでき、薄膜のX線取出し窓
が使用できると同時にX線源距離を小さくできる
ため、プラズマから発生するX線を高効率で利用
できる利点があり、また高繰返し速度でX線の発
生を行うことができる。高効率X線取出しにより
スループツトの向上が図れると同時に、X線源径
が径方向取出しに比べ小さいため、プロキシミテ
イ露光でサブミクロン転写が可能である。さら
に、ガス抜き構造の電極では、高密度プラズマが
集中するプラズマ軸方向に金属部がないため、電
極消耗が非常に少ない利点がある。
[Effects of the Invention] As explained above, in a set of discharge electrodes for forming plasma, one end is opened to the opposing surfaces of both electrodes, and the other end is opened to a surface other than the opposing surface and connected to a vacuum. By providing a through hole, damage to the X-ray extraction window due to ions, electrons, high-temperature gas, etc. generated from the plasma can be reduced, and a thin-film X-ray extraction window can be used, while at the same time the distance between the X-ray source and the X-ray source can be shortened. It has the advantage of being able to use the X-rays generated from the X-rays with high efficiency, and X-rays can be generated at a high repetition rate. Highly efficient X-ray extraction improves throughput, and at the same time, since the diameter of the X-ray source is smaller than in radial extraction, submicron transfer is possible with proximity exposure. Furthermore, since there is no metal part in the plasma axis direction where high-density plasma is concentrated in the electrode with a gas venting structure, there is an advantage that the electrode wears out very little.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係るX線発生装置の一実施例
を適用したX線露光装置を示す構造図、第2図は
第1図における上部電極4のX−X線に沿う断面
図、第3図A,Bは貫通孔の効果を説明するため
のイオンによる起電力を示す特性図、第4図はX
線出力比と放電繰返し数の関係を示す線図、第5
図A,Bは1000シヨツト放電後の電極の状態を示
す断面図、第6図は放電電極に設けた貫通孔の他
の形態を示す断面図、第7図は本発明に係るX線
発生装置の他の実施例を適用したX線露光装置を
示す構造図、第8図は電極部の構造の一例を示す
断面図、第9図ないし第12図は、それぞれ本発
明に係るX線発生装置のさらに他の実施例を適用
したX線露光装置を示す構造図で、第9図はガス
注入を下部電極側から行う実施例、第10図は貫
通孔を設けた放電電極と3重窓構造のX線取出し
窓を組合わせた実施例、第11図および第12図
は放電電極の中心軸をX線取出し窓の法線方向と
傾けて設けた実施例である。第13図は従来のX
線発生装置を用いたX線露光装置の構造図、第1
4図はX線がネオンガス中を透過する長さと波長
12AでのX線透過率の関係をネオンガス圧をパ
ラメータとして示した図、第15図は従来のX線
発生装置を用いた他のX線露光装置の構造図、第
16図は第15図に示した従来装置のX線取出し
方向から見たプラズマの形状を示す図、第17図
は第15図に示した従来装置における半影ぼけを
説明する図である。 1……真空容器、2……真空室、4……上部電
極、4A……電極部、4B……電極支持部、4C
……ガス通路、5……高速開閉ガスバルブ、5A
……ガス溜、5B……ピストン、6……下部電
極、6A……電極部、6B……電極支持部、6C
……孔、6E……ガス通路、7……ガス塊、8…
…プラズマ、9……X線、10……粒子群、11
……X線取出し窓、11A……第1の膜、11B
……第2の膜、11C……第3の膜、31……貫
通孔、32……排気装置。
FIG. 1 is a structural diagram showing an X-ray exposure apparatus to which an embodiment of the X-ray generator according to the present invention is applied, and FIG. 2 is a cross-sectional view of the upper electrode 4 in FIG. Figures 3A and B are characteristic diagrams showing the electromotive force caused by ions to explain the effect of through holes, and Figure 4 is
Diagram showing the relationship between linear output ratio and discharge repetition rate, 5th
Figures A and B are cross-sectional views showing the state of the electrode after 1000 shot discharges, Figure 6 is a cross-sectional view showing another form of through hole provided in the discharge electrode, and Figure 7 is an X-ray generator according to the present invention. FIG. 8 is a cross-sectional view showing an example of the structure of an electrode part, and FIGS. 9 to 12 are respectively a structural diagram showing an X-ray exposure apparatus to which another embodiment of the present invention is applied. Fig. 9 is a structural diagram showing an X-ray exposure apparatus to which still another embodiment is applied. Fig. 9 shows an embodiment in which gas is injected from the lower electrode side, and Fig. 10 shows a discharge electrode with a through hole and a triple window structure. FIG. 11 and FIG. 12 are examples in which the central axis of the discharge electrode is inclined with respect to the normal direction of the X-ray extraction window. Figure 13 shows the conventional
Structure diagram of an X-ray exposure device using a ray generator, Part 1
Figure 4 shows the relationship between the length of X-ray transmission through neon gas and the X-ray transmittance at a wavelength of 12A using neon gas pressure as a parameter. A structural diagram of the exposure device, FIG. 16 is a diagram showing the shape of the plasma seen from the X-ray extraction direction of the conventional device shown in FIG. 15, and FIG. 17 is a diagram showing the penumbra blur in the conventional device shown in FIG. 15. FIG. 1... Vacuum container, 2... Vacuum chamber, 4... Upper electrode, 4A... Electrode part, 4B... Electrode support part, 4C
...Gas passage, 5...High speed opening/closing gas valve, 5A
... Gas reservoir, 5B ... Piston, 6 ... Lower electrode, 6A ... Electrode part, 6B ... Electrode support part, 6C
...hole, 6E...gas passage, 7...gas mass, 8...
...Plasma, 9...X-ray, 10...Particle group, 11
...X-ray extraction window, 11A...First membrane, 11B
...Second film, 11C...Third film, 31...Through hole, 32...Exhaust device.

Claims (1)

【特許請求の範囲】 1 真空中でプラズマを形成し、このプラズマか
らX線を発生させ、X線取出し窓から取出すX線
発生装置において、プラズマ形成のための対向す
る1組の電極の一方に放電用ガス注入のためのガ
ス通路が設けられており、前記1組の電極のそれ
ぞれには一端が各電極の対向面に開口し他端がそ
れぞれの電極の該対向面以外の面に開口して真空
に連なる貫通孔が少なくとも1個設けられている
ことを特徴とするX線発生装置。 2 前記貫通孔の前記他端が前記対向面以外の面
の複数個所に開口していることを特徴とする特許
請求の範囲第1項記載のX線発生装置。 3 前記貫通孔の前記他端が排気装置に接続され
ていることを特徴とする特許請求の範囲第1項記
載のX線発生装置。 4 前記X線取出し窓の法線方向と前記一組の電
極の中心軸とを傾け、かつ前記X線取出し窓の中
心位置を形成されるプラズマの軸方向延長線から
ずらして設けたことを特徴とする特許請求の範囲
第1項ないし第3項のいずれかに記載のX線発生
装置。 5 前記X線取出し窓が前記真空室中に設けられ
た第1の膜と、前記真空室とX線取出し室とを隔
てるように設けられた第2の膜と、前記X線取出
し室と使用雰囲気とを隔てるように設けられた第
3の膜とを有することを特徴とする特許請求の範
囲第1項ないし第4項のいずれかに記載のX線発
生装置。
[Claims] 1. In an X-ray generation device that forms plasma in a vacuum, generates X-rays from this plasma, and extracts them from an X-ray extraction window, one of a pair of opposing electrodes for plasma formation is A gas passage for injecting discharge gas is provided, and each of the pair of electrodes has one end open to the opposing surface of each electrode and the other end opened to a surface other than the opposing surface of each electrode. An X-ray generator characterized in that at least one through hole is provided which is connected to a vacuum. 2. The X-ray generator according to claim 1, wherein the other end of the through hole opens at a plurality of locations on a surface other than the opposing surface. 3. The X-ray generator according to claim 1, wherein the other end of the through hole is connected to an exhaust device. 4. The normal direction of the X-ray extraction window and the center axis of the set of electrodes are inclined, and the center position of the X-ray extraction window is shifted from the axial extension line of the plasma to be formed. An X-ray generator according to any one of claims 1 to 3. 5. The X-ray extraction window is used with a first membrane provided in the vacuum chamber, a second membrane provided to separate the vacuum chamber and the X-ray extraction chamber, and the X-ray extraction chamber. The X-ray generator according to any one of claims 1 to 4, further comprising a third film provided to separate the X-ray generator from the atmosphere.
JP61012105A 1985-04-30 1986-01-24 X-ray generating device Granted JPS62172648A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP61012105A JPS62172648A (en) 1986-01-24 1986-01-24 X-ray generating device
EP86105914A EP0201034B1 (en) 1985-04-30 1986-04-29 X-ray source
DE86105914T DE3688946T2 (en) 1985-04-30 1986-04-29 X-ray source.
US06/857,112 US4771447A (en) 1985-04-30 1986-04-29 X-ray source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61012105A JPS62172648A (en) 1986-01-24 1986-01-24 X-ray generating device

Publications (2)

Publication Number Publication Date
JPS62172648A JPS62172648A (en) 1987-07-29
JPH0373101B2 true JPH0373101B2 (en) 1991-11-20

Family

ID=11796285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61012105A Granted JPS62172648A (en) 1985-04-30 1986-01-24 X-ray generating device

Country Status (1)

Country Link
JP (1) JPS62172648A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19962160C2 (en) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Devices for generating extreme ultraviolet and soft X-rays from a gas discharge
JP5503108B2 (en) * 2004-11-29 2014-05-28 コーニンクレッカ フィリップス エヌ ヴェ Method and apparatus for generating radiation in the wavelength range of about 1 nm to about 30 nm and lithographic apparatus
DE102004058500A1 (en) * 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Method and device for operating an electrical discharge device
JP4628122B2 (en) * 2005-02-04 2011-02-09 株式会社小松製作所 Nozzle for extreme ultraviolet light source device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4589123A (en) * 1985-02-27 1986-05-13 Maxwell Laboratories, Inc. System for generating soft X rays

Also Published As

Publication number Publication date
JPS62172648A (en) 1987-07-29

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