JPH0373620B2 - - Google Patents
Info
- Publication number
- JPH0373620B2 JPH0373620B2 JP20188884A JP20188884A JPH0373620B2 JP H0373620 B2 JPH0373620 B2 JP H0373620B2 JP 20188884 A JP20188884 A JP 20188884A JP 20188884 A JP20188884 A JP 20188884A JP H0373620 B2 JPH0373620 B2 JP H0373620B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- softening temperature
- melting
- materials
- hours
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 27
- 229910052802 copper Inorganic materials 0.000 claims description 26
- 239000010949 copper Substances 0.000 claims description 26
- 239000000463 material Substances 0.000 claims description 20
- 238000002844 melting Methods 0.000 claims description 9
- 230000008018 melting Effects 0.000 claims description 9
- 238000005266 casting Methods 0.000 claims description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 description 8
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 7
- 229910052717 sulfur Inorganic materials 0.000 description 7
- 239000011593 sulfur Substances 0.000 description 7
- 238000000137 annealing Methods 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 4
- 229910000881 Cu alloy Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- YCKOAAUKSGOOJH-UHFFFAOYSA-N copper silver Chemical compound [Cu].[Ag].[Ag] YCKOAAUKSGOOJH-UHFFFAOYSA-N 0.000 description 1
- OMZSGWSJDCOLKM-UHFFFAOYSA-N copper(II) sulfide Chemical compound [S-2].[Cu+2] OMZSGWSJDCOLKM-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Conductive Materials (AREA)
Description
〔産業上の利用分野〕
本発明は、軟化温度が低くて加工性に優れた高
導電用銅材料の製造方法に関する。
〔従来の技術〕
周知の如く、銅及び銅合金は導電性に優れ、且
つ良好な加工性を有することから、導電用細線、
プリント配線基板用圧延箔、フラツトケーブル用
銅箔条等多様な用途に用いられている。
従来、これらの用途には無酸素銅、タフピツチ
銅、銅−銀合金等の銅合金が多く用いられてい
る。
近年、省資源化のため上記材料の極細線化、薄
板化が求められている。しかしながら、これら材
料の焼純処理は、例えば極薄板の場合、コイル状
で焼鈍処理を行なおうとすると、焼付き、しわ等
の不良が生じ易く、また、フープ状で連続的に焼
鈍処理を行なおうとすると、傷が付き易い等とい
う多きな困難が伴うので、このようなことが極細
線化、薄板化に対するネツクとなつていた。
この焼鈍処理の際の困難は、焼鈍温度は現状よ
り下げられれば、相当軽減されるので、好まし
い。
以上の点から加工性に優れ、且つ軟化温度の低
い銅材料の開発が望まれていた。
本発明者等は上記の事情に鑑み、導電率が純銅
材料のそれより少くとも低下することなく、軟化
温度が上記材料より大幅に低い銅材料を提供すべ
く、まず、純銅に種々の第二元素を微量添加して
得られる銅合金の中で、第二元素として硼素、バ
ナジウム、クロム、ハフニウム、ジルコニウム、
スカンジウム、イツトリウム、希土類元素および
マグネシウムを極微量添加したものを提案した
(特願昭58−35515号、同58−124115号および同59
−169948号)。また、これらの元素が軟化温度の
低下に有効であるのは、それらが純銅材料中に極
微量存在する不可避不純物である硫黄と化合物を
形成し、硫黄が銅の軟化温度を高める作用を減殺
するためであることを見出し、硫黄を1モルppm
以下に限定した純銅材料も提案した(特願昭59−
50278号)。
〔発明が解決しようとする問題点〕
その後、引続いて、本発明者等は、純銅材料中
に通常10重量ppm程度もしくはそれ以下含有させ
れている硫黄を硫化銅として析出させることがで
きれば、上記のような第二元素を添加することな
く、また硫黄含有量を特に低減させることもな
く、硫黄が銅の軟化温度を高める作用を減殺し得
るのではないかと考え、鋭意研究を行なつた。
〔問題点を解決するための手段〕
その結果、電気銅地金を第二元素を添加するこ
となく溶解鋳造して製造させた、酸素を500重量
ppm以下含有する純銅材料を450〜650℃で20時間
以上熱処理することによつて、前記目的が達成さ
れることを見出したものである。
〔作用〕
以下、本発明を更に説明する。本発明方法にお
いて熱処理する材料を、電気銅地金を第二元素を
添加することなく溶解鋳造して製造された、酸素
を500重量ppm以下含有する純銅材料に限定した
のは、上記以外の純銅材料ではテルル、鉛、ビス
マス、アンチモン、セレン、砒素等が混入して、
この軟化温度が高くなり易いからである。酸素に
ついては500重量ppm以下であれば、本発明の目
的を充分達成することができる。
電気銅地金を溶解鋳造する際、雰囲気、炉材等
から不可避的に混入される不純物は、通常程度で
あれば何ら差し支えない。従つて、溶解鋳造して
製造された純銅材料としては、タフピツチ銅、無
酸素銅も使用することができる。また、このよう
な純銅材料に熱処理する前、適宜機械加工や塑性
加工を与えることもできる。
上記純銅材料を熱処理する際、熱処理温度を
450〜650℃、熱処理時間を20時間以上に限定した
のは、上記熱処理温度範囲外および熱処理時間が
20時間未満では、軟化温度の低下が不十分である
からである。なお、熱処理時間は200時間を越え
ると、軟化温度の低下が飽和すると共に熱的に不
経済であるので、好ましく20〜200時間である。
〔実施例〕
次に本発明の実施例を比較的と共に説明する。
実施例
電気銅(JISH2121)を高周波溶解炉を使用し、
黒鉛ルツボで雰囲気を真空または大気として溶解
した後、この溶解と同一の雰囲気で鋳造して、厚
さ35mm、幅105mm、長さ210mmの鋳塊を製造した。
なお、大気雰囲気での鋳造は、溶解後湯面を黒鉛
系のフラツクスで覆いながら行なつた。得られた
鋳塊中の不純物は第1表のようであつた。
[Industrial Application Field] The present invention relates to a method for producing a highly conductive copper material having a low softening temperature and excellent workability. [Prior Art] As is well known, copper and copper alloys have excellent conductivity and good workability, so they can be used as conductive thin wires,
It is used in a variety of applications, including rolled foil for printed wiring boards and copper foil strips for flat cables. Conventionally, copper alloys such as oxygen-free copper, tough pitch copper, and copper-silver alloys have been widely used in these applications. In recent years, there has been a demand for ultra-thin wires and thinner plates of the above-mentioned materials in order to save resources. However, when annealing these materials, for example, in the case of ultra-thin plates, if annealing is performed in a coil shape, defects such as seizure and wrinkles are likely to occur, and in addition, if annealing is performed continuously in a hoop shape, However, there are many difficulties such as easy scratching, which has been an obstacle to making the wires thinner and thinner. This difficulty in annealing can be considerably alleviated by lowering the annealing temperature from the current level, which is preferable. From the above points, it has been desired to develop a copper material that has excellent workability and a low softening temperature. In view of the above-mentioned circumstances, the present inventors first applied various secondary Among copper alloys obtained by adding small amounts of elements, boron, vanadium, chromium, hafnium, zirconium,
We proposed a product with trace amounts of scandium, yttrium, rare earth elements, and magnesium added (Japanese Patent Application Nos. 58-35515, 58-124115, and 59).
−169948). In addition, these elements are effective in lowering the softening temperature because they form compounds with sulfur, an unavoidable impurity that exists in trace amounts in pure copper materials, and reduce the effect of sulfur on increasing the softening temperature of copper. found that 1 mole ppm of sulfur
We also proposed pure copper materials limited to the following (patent application 1983-
No. 50278). [Problems to be Solved by the Invention] Subsequently, the present inventors realized that if sulfur, which is normally contained in pure copper materials at about 10 ppm by weight or less, can be precipitated as copper sulfide, We conducted extensive research with the idea that it might be possible to reduce the effect of sulfur on increasing the softening temperature of copper without adding a second element or reducing the sulfur content. . [Means for solving the problem] As a result, 500% of oxygen was produced by melting and casting electrolytic copper ingot without adding a second element.
It has been discovered that the above object can be achieved by heat-treating a pure copper material containing ppm or less at 450 to 650°C for 20 hours or more. [Function] The present invention will be further explained below. The materials to be heat-treated in the method of the present invention are limited to pure copper materials containing less than 500 ppm by weight of oxygen, which are produced by melting and casting electrolytic copper ingots without adding a second element. Materials include tellurium, lead, bismuth, antimony, selenium, arsenic, etc.
This is because this softening temperature tends to become high. The object of the present invention can be fully achieved as long as the oxygen content is 500 ppm by weight or less. When melting and casting electrolytic copper ingots, there is no problem with impurities that are inevitably mixed in from the atmosphere, furnace materials, etc., as long as they are at a normal level. Therefore, as the pure copper material produced by melting and casting, tough pitch copper and oxygen-free copper can also be used. Moreover, before heat-treating such a pure copper material, mechanical processing or plastic working can be applied as appropriate. When heat treating the above pure copper material, the heat treatment temperature should be
The heat treatment time was limited to 450 to 650℃ and 20 hours or more because the heat treatment temperature was outside the above heat treatment temperature range and the heat treatment time was
This is because if the time is less than 20 hours, the softening temperature is insufficiently lowered. It should be noted that if the heat treatment time exceeds 200 hours, the reduction in the softening temperature will be saturated and it will be thermally uneconomical, so the heat treatment time is preferably 20 to 200 hours. [Example] Next, an example of the present invention will be described with comparison. Example: Using electrolytic copper (JISH2121) in a high frequency melting furnace,
After melting in a graphite crucible in a vacuum or air atmosphere, the ingot was cast in the same atmosphere as the melting to produce an ingot with a thickness of 35 mm, width of 105 mm, and length of 210 mm.
Note that casting in an atmospheric atmosphere was performed while covering the surface of the melt with graphite flux after melting. The impurities in the obtained ingot were as shown in Table 1.
【表】
(注) 表に掲載以外の元素について
は検出されなかつた。
次に、これらの鋳塊表面を面削して板厚25mmと
した後800℃で熱間圧延し厚さ12mmとして、幅30
mm、長さ80mmの板材を26枚(夫々鋳塊No.から13枚
宛)作成した。これらの板材のうち24枚は、アル
ゴン雰囲気下、400〜700℃、12〜240時間の熱処
理を行なつた後、板厚10mmまで面削して導電率を
測定した。他の2枚の板材は、上記の熱処理を行
なうことなく、板厚10mmまで面削して導電率を測
定した。
これらの板材は、更に、厚さ0.5mmまで冷間圧
延を行なつた後、得られた冷間延材から一辺20mm
の正方形の板片を、裁断して作成し、軟化温度を
測定する試料とした。軟化温度の測定は、40、
80、100、120、140、160、200および240℃に設定
した油浴中に30分間浸漬加熱された試料のピツカ
ーズ硬度を測定することにより行なつた。得られ
た結果を第2表に示す。[Table] (Note) No elements other than those listed in the table were detected.
Next, the surface of these ingots was faceted to a thickness of 25 mm, and then hot rolled at 800℃ to a thickness of 12 mm and a width of 30 mm.
26 sheets (13 sheets each from the ingot No.) with a length of 80 mm and a length of 80 mm were made. Twenty-four of these plates were heat treated in an argon atmosphere at 400 to 700°C for 12 to 240 hours, then face-faced to a thickness of 10 mm and their electrical conductivity was measured. The other two plates were face-milled to a thickness of 10 mm without being subjected to the above heat treatment, and their conductivities were measured. These plates are further cold-rolled to a thickness of 0.5 mm, and then 20 mm on each side are obtained from the obtained cold-rolled materials.
A square plate was cut and used as a sample for measuring the softening temperature. Measurement of softening temperature is 40,
This was done by measuring the Pickers hardness of samples that were immersed and heated in an oil bath set at 80, 100, 120, 140, 160, 200 and 240°C for 30 minutes. The results obtained are shown in Table 2.
以上から明らかなように、本発明によれば、第
二元素を微量添加することなく、また硫黄含有量
を1モルppm以下に抑えることもなく、軟化温度
が従来の純銅材料のそれより大幅に低い加工性に
優れた銅材料を提供しうるものである。
As is clear from the above, according to the present invention, the softening temperature is significantly higher than that of conventional pure copper materials without adding a trace amount of a second element or suppressing the sulfur content to 1 mol ppm or less. This makes it possible to provide a copper material that has low workability and is excellent.
Claims (1)
解鋳造して製造された、酸素を500重量ppm以下
含有する純銅材料を450〜650℃で20時間以上熱処
理することを特徴とする軟化温度の低い高導電用
銅材料の製造方法。1 A softening temperature characterized by heat treating a pure copper material containing 500 weight ppm or less of oxygen at 450 to 650°C for 20 hours or more, which is produced by melting and casting electrolytic copper ingot without adding a second element. A method for manufacturing a copper material for high conductivity with low conductivity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20188884A JPS6179753A (en) | 1984-09-28 | 1984-09-28 | Method for producing high conductivity copper material with low softening temperature |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20188884A JPS6179753A (en) | 1984-09-28 | 1984-09-28 | Method for producing high conductivity copper material with low softening temperature |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6179753A JPS6179753A (en) | 1986-04-23 |
| JPH0373620B2 true JPH0373620B2 (en) | 1991-11-22 |
Family
ID=16448496
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20188884A Granted JPS6179753A (en) | 1984-09-28 | 1984-09-28 | Method for producing high conductivity copper material with low softening temperature |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6179753A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2507743B2 (en) * | 1987-06-10 | 1996-06-19 | 古河電気工業株式会社 | Copper alloy for flexible printing |
| JP2006274382A (en) * | 2005-03-30 | 2006-10-12 | Hitachi Cable Ltd | Copper material manufacturing method and copper material |
| JP2008255418A (en) * | 2007-04-05 | 2008-10-23 | Hitachi Cable Ltd | Copper material manufacturing method and copper material |
-
1984
- 1984-09-28 JP JP20188884A patent/JPS6179753A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6179753A (en) | 1986-04-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |