JPH0376739B2 - - Google Patents

Info

Publication number
JPH0376739B2
JPH0376739B2 JP58090543A JP9054383A JPH0376739B2 JP H0376739 B2 JPH0376739 B2 JP H0376739B2 JP 58090543 A JP58090543 A JP 58090543A JP 9054383 A JP9054383 A JP 9054383A JP H0376739 B2 JPH0376739 B2 JP H0376739B2
Authority
JP
Japan
Prior art keywords
vinyloxyethyl
mol
ether
group
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58090543A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59216139A (ja
Inventor
Tatatomi Nishikubo
Koji Iizawa
Eiji Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Shingijutsu Kaihatsu Jigyodan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shingijutsu Kaihatsu Jigyodan filed Critical Shingijutsu Kaihatsu Jigyodan
Priority to JP9054383A priority Critical patent/JPS59216139A/ja
Publication of JPS59216139A publication Critical patent/JPS59216139A/ja
Publication of JPH0376739B2 publication Critical patent/JPH0376739B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP9054383A 1983-05-23 1983-05-23 自己増感型感光性樹脂 Granted JPS59216139A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9054383A JPS59216139A (ja) 1983-05-23 1983-05-23 自己増感型感光性樹脂

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9054383A JPS59216139A (ja) 1983-05-23 1983-05-23 自己増感型感光性樹脂

Publications (2)

Publication Number Publication Date
JPS59216139A JPS59216139A (ja) 1984-12-06
JPH0376739B2 true JPH0376739B2 (de) 1991-12-06

Family

ID=14001324

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9054383A Granted JPS59216139A (ja) 1983-05-23 1983-05-23 自己増感型感光性樹脂

Country Status (1)

Country Link
JP (1) JPS59216139A (de)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5067885A (de) * 1973-10-22 1975-06-06
JPS5072988A (de) * 1973-10-29 1975-06-16
JPS5312983A (en) * 1976-07-21 1978-02-06 Konishiroku Photo Ind Photosensitive composition
JPS5415072A (en) * 1977-07-07 1979-02-03 Teijin Ltd High density felt
JPS5764229A (en) * 1980-10-06 1982-04-19 Tatatomi Nishikubo Self-sensitizig type photosensitive material

Also Published As

Publication number Publication date
JPS59216139A (ja) 1984-12-06

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