JPH0377652B2 - - Google Patents
Info
- Publication number
- JPH0377652B2 JPH0377652B2 JP59132659A JP13265984A JPH0377652B2 JP H0377652 B2 JPH0377652 B2 JP H0377652B2 JP 59132659 A JP59132659 A JP 59132659A JP 13265984 A JP13265984 A JP 13265984A JP H0377652 B2 JPH0377652 B2 JP H0377652B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- zirconia
- thermal expansion
- alumina
- content
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000000463 material Substances 0.000 claims description 34
- 229910002076 stabilized zirconia Inorganic materials 0.000 claims description 17
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 15
- 238000010304 firing Methods 0.000 claims description 8
- 238000005507 spraying Methods 0.000 claims description 7
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 36
- 239000003381 stabilizer Substances 0.000 description 11
- 239000000292 calcium oxide Substances 0.000 description 9
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 239000000843 powder Substances 0.000 description 7
- 239000003990 capacitor Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 4
- 238000007751 thermal spraying Methods 0.000 description 4
- 230000008602 contraction Effects 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000000395 magnesium oxide Substances 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 3
- 238000007750 plasma spraying Methods 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000009466 transformation Effects 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 2
- 239000003985 ceramic capacitor Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011449 brick Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011819 refractory material Substances 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Ceramic Capacitors (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Description
【発明の詳細な説明】
(1) 産業上の利用分野
この発明は電子部品、例えばセラミツクコンデ
ンサを焼成するに適した焼成用治具の改良に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION (1) Industrial Application Field The present invention relates to an improvement in a firing jig suitable for firing electronic components, such as ceramic capacitors.
(2) 従来の技術
従来、電子部品例えばセラミツクコンデンサを
製造する際には、コンデンサ素地を焼成用治具内
にて1200〜1400℃で焼成する工程があるが、コン
デンサ素地の接触する部分には該コンデンサ素地
との反応が最も少ない材料としてジルコニアが用
いられている。(2) Conventional technology Conventionally, when manufacturing electronic components such as ceramic capacitors, there is a process in which the capacitor base is fired at 1200 to 1400°C in a firing jig. Zirconia is used as the material that least reacts with the capacitor base.
実際の焼成に際して従来は、アルミナ・シリカ
質の治具、具体的には匣鉢にジルコニア板を敷
き、その上に敷粉としてジルコニア粉末を載せて
コンデンサ素地を並べるか、あるいはジルコニア
質の匣鉢にジルコニア粉末敷粉を載せてコンデン
サ素地を並べるのが一般的な方法であつた。 Conventionally, during actual firing, a zirconia plate was laid on an alumina-silica jig, specifically a sagger, and zirconia powder was placed on top of it as a bedding powder and the capacitor base was arranged, or a zirconia sagger was placed on top of the zirconia plate. The common method was to place zirconia powder on top of the capacitor substrates.
(3) 発明が解決しようとする問題点
前者のジルコニア板を敷く方法は、比較的安価
ではあるが、手作業で製品の乗せ降ろしをする場
合は非常に繁雑で多くの手間を要し、また自動化
した場合に製品を取出す際、匣鉢を反転させて焼
成済みのコンデンサ素地を取出そうとすると、ジ
ルコニア板が落下してしまい、オートメーシヨン
化のネツクとなつている。一方、後者の匣鉢全体
をジルコニアとする方法は、ジルコニアが急熱、
急冷の熱衝撃に弱く、比重が大きく、しかも非常
に高価であるという欠点を有するのである。(3) Problems to be solved by the invention Although the former method of laying zirconia plates is relatively inexpensive, it is very complicated and requires a lot of effort when loading and unloading products manually. When taking out the product in an automated system, if you turn the sagger over and try to take out the fired capacitor base, the zirconia plate will fall, which is a bottleneck for automation. On the other hand, in the latter method, where the entire sagger is made of zirconia, zirconia heats up rapidly.
It has the disadvantages of being vulnerable to thermal shock during rapid cooling, having a high specific gravity, and being very expensive.
(4) 問題点を解決するための手段
本発明者らは、上述の欠点を解消するため溶射
に注目した。即ち、一般に広く使用されているア
ルミナ・シリカ質匣鉢を用い、その被焼成物を載
せる側の表面にジルコニア溶射層を形成する方法
である。(4) Means for solving the problems The present inventors focused on thermal spraying in order to solve the above-mentioned drawbacks. That is, this is a method in which a widely used alumina-silica sagger is used and a zirconia sprayed layer is formed on the surface of the sagger on which the object to be fired is placed.
溶射法自体は一般によく知られた方法ではある
が、単にアルミナ・シリカ質材料にジルコニアを
溶射したのみでは加熱・冷却の熱履歴を繰返すう
ちに溶射量が基材から剥離してしまう。 Although the thermal spraying method itself is generally well known, if zirconia is simply thermally sprayed onto an alumina-siliceous material, the amount of thermal spray will peel off from the base material as the thermal history of heating and cooling is repeated.
ジルコニアはよく知られているように、単斜晶
−正方晶−立方晶の結晶変態を持ち、コンデンサ
−素地焼成の温度領域で結晶変態に伴う異常な膨
張・収縮があり、これに伴う溶射層の体積変化の
ため剥離してしまうのである。 As is well known, zirconia has a monoclinic-tetragonal-cubic crystal transformation, and in the temperature range of capacitor base firing, it undergoes abnormal expansion and contraction due to the crystal transformation, and this causes thermal spray layer formation. It peels off due to the change in volume.
この結晶変態に伴う異常な膨張・収縮はカルシ
ウム、マグネシウムあるいはイツトリウム等の酸
化物を加えたジルコニア（安定化ジルコニア）を
用いることにより防止できる。 Abnormal expansion and contraction associated with this crystal transformation can be prevented by using zirconia (stabilized zirconia) to which oxides such as calcium, magnesium, or yttrium are added.
しかし、安定化ジルコニアを溶射したのみでは
やはり剥離は防止することができない。その原因
は基材と溶射層の熱膨張率が一致していないため
である。 However, simply spraying stabilized zirconia cannot prevent peeling. The reason for this is that the thermal expansion coefficients of the base material and the sprayed layer do not match.
本発明者らは熱膨張について種々検討を加えた
結果、基材のアルミナ・シリカ質材料中のAl2O3
含有量と安定化ジルコニア中の安定化剤含有量を
調整することにより、基材と溶射層の熱膨張曲線
をほぼ等しくすることが可能であることを見出し
てこの発明を完成したものである。 As a result of various studies on thermal expansion, the present inventors found that Al 2 O 3 in the alumina/siliceous material of the base material
The present invention was completed by discovering that by adjusting the stabilizer content and the stabilizer content in the stabilized zirconia, it is possible to make the thermal expansion curves of the base material and the thermal sprayed layer approximately equal.
(5) 作用
この発明はアルミナ・シリカ質材料の表面に安
定化ジルコニア溶射層を有することを特徴とする
電子部品焼成用治具である。(5) Function The present invention is a jig for firing electronic parts, which is characterized by having a stabilized zirconia sprayed layer on the surface of an alumina-siliceous material.
基材となるアルミナ・シリカ質材料は通常の耐
火れんがや匣鉢として使用されるものであり、
Al2O3とSiO2とを主成分とし、不可避的不純物は
通常の耐火物の範囲で許される。 The base material is alumina/silica material, which is used for ordinary fire bricks and saggers.
The main components are Al 2 O 3 and SiO 2 , and unavoidable impurities are allowed within the range of ordinary refractories.
一方、安定化ジルコニアは、その安定化剤とし
ては、酸化カルシウム、酸化マグネシウム、酸化
イツトリウムが知られているが、なかでも酸化カ
ルシウムが好ましい。酸化マグネシウムはジルコ
ニアとの固溶体が不安定で高温での使用中中
MgOが固溶体から抜けやすく、一方、酸化イツ
トリウムは価格が高い。これに比較して酸化カル
シウムは固溶体として安定で、高温で比較的拡散
しにくく、しかも安価である。 On the other hand, as stabilizers for stabilized zirconia, calcium oxide, magnesium oxide, and yttrium oxide are known, among which calcium oxide is preferred. Magnesium oxide is unstable as a solid solution with zirconia and becomes unstable during use at high temperatures.
MgO easily escapes from solid solution, while yttrium oxide is expensive. In comparison, calcium oxide is stable as a solid solution, is relatively difficult to diffuse at high temperatures, and is inexpensive.
安定化剤の含有量は、完全な安定化領域でなく
て部分安定化領域であつても、安定化領域に近い
範囲であれば、幾分膨張、収縮は見られるが、使
用可能である。酸化カルシウムではその範囲は４
〜31重量％である。この量が31重量％をこえると
遊離のCaOがあらわれ化学的に不安定となり好ま
しくない。 Even if the content of the stabilizer is not in the complete stabilization region but in the partial stabilization region, as long as it is close to the stabilization region, it can be used, although some expansion or contraction may be observed. For calcium oxide, the range is 4
~31% by weight. If this amount exceeds 31% by weight, free CaO will appear and become chemically unstable, which is not preferable.
安定化ジルコニア中の安定化剤は、高温での使
用中に徐々に拡散して失われ、次第にその含有量
が少なくなるので、ジルコニアの安定化の点では
安定化剤は多いほど好ましい。 The stabilizer in stabilized zirconia is gradually diffused and lost during use at high temperatures, and its content gradually decreases, so in terms of stabilizing zirconia, it is preferable to have as much stabilizer as possible.
通常溶射層は熱応力による歪が内在し、溶射層
の厚み、溶射条件、基材の温度などによつて溶射
層の熱膨張率は異なり、焼結体の熱膨張率の値と
は必ずしも一致しない。また、熱膨張率の値も基
材と溶射層とにおいて全温度範囲で一致するとも
限らない。 Normally, the sprayed layer has inherent distortion due to thermal stress, and the thermal expansion coefficient of the sprayed layer varies depending on the thickness of the sprayed layer, spraying conditions, temperature of the base material, etc., and does not necessarily match the value of the thermal expansion coefficient of the sintered body. do not. Moreover, the value of the coefficient of thermal expansion is not necessarily the same in the entire temperature range between the base material and the sprayed layer.
従つて、以下に述べるような方法で溶射層と基
材の熱膨張を合わせる。 Therefore, the thermal expansion of the sprayed layer and the base material are matched by the method described below.
即ち、予めアルミナ・シリカ質材料のAl2O3含
有量と熱膨張率の関係を求めておく。また安定化
ジルコニアにおいても安定剤の含有量と熱膨張率
との関係を求めておく。そしてまず被焼成物との
関係から、安定化剤の含有量を決め、その含有量
を持つ安定化ジルコニアの熱膨張率と等しい熱膨
張率を持つアルミナ・シリカ質のAl2O3含有量を
決定する。 That is, the relationship between the Al 2 O 3 content and the coefficient of thermal expansion of the alumina-siliceous material is determined in advance. Also, for stabilized zirconia, the relationship between the stabilizer content and the coefficient of thermal expansion is determined. First, the content of the stabilizer is determined in relation to the object to be fired, and the Al 2 O 3 content of the alumina-silica substance, which has a coefficient of thermal expansion equal to that of stabilized zirconia with that content, is determined. decide.
安定化剤の含有量が多い程安定化ジルコニアの
熱膨張率は大きくなるので、アルミナ・シリカ質
材料はアルミナ含有量の多いものを用いる必要が
ある。 The coefficient of thermal expansion of stabilized zirconia increases as the content of the stabilizer increases, so it is necessary to use an alumina-siliceous material with a high content of alumina.
次いで決定されたAl2O3含有量のアルミナ・シ
リカ質および該Al2O3含有量より低いAl2O3含有
量のアルミナ・シリカ質の匣鉢を製造し、安定化
ジルコニアを夫々の匣鉢に溶射する。溶射はジル
コニアの融点から考えてプラズマ溶射が、特に水
プラズマ溶射が好ましい。 Next, alumina-siliceous pots having the determined Al 2 O 3 content and alumina-silica pots having an Al 2 O 3 content lower than the determined Al 2 O 3 content are manufactured, and stabilized zirconia is added to each sagger. Spray on the pot. Considering the melting point of zirconia, plasma spraying is preferable, and water plasma spraying is particularly preferable.
次に、夫々の溶射体の熱膨張曲線と基材のみの
熱膨張曲線とのずれの度合より、該安定化ジルコ
ニアに最も適したアルミナ・シリカ質基材中の
Al2O3含有量が決められる。こうして決定したア
ルミナ・シリカ質基材に溶射して得た溶射体を、
使用温度まで加熱冷却してその剥離の状況を観察
する。剥離が観察される場合は、再びアルミナ・
シリカ質基材中のAl2O3含有量を変化させて基材
の組成を最終的に決定する。 Next, based on the degree of deviation between the thermal expansion curve of each thermal sprayed body and the thermal expansion curve of only the base material, the most suitable alumina-siliceous base material for the stabilized zirconia is determined.
The Al 2 O 3 content is determined. The sprayed body obtained by thermal spraying on the alumina-siliceous base material determined in this way is
The sample is heated and cooled to the operating temperature and observed for peeling. If peeling is observed, apply the alumina again.
The composition of the substrate is finally determined by changing the Al 2 O 3 content in the siliceous substrate.
ジルコニア中の安定化剤の含有量を変えること
が可能ならば、安定化剤の含有量を変えて熱膨張
率を合わせてもよい。 If it is possible to change the content of the stabilizer in zirconia, the coefficient of thermal expansion may be adjusted by changing the content of the stabilizer.
このようにして決まつた組成の基材に安定化ジ
ルコニア粉末を溶射して匣鉢が製造される。 A sagger is manufactured by thermally spraying stabilized zirconia powder onto a base material having a determined composition in this manner.
溶射は通常のセラミツク溶射法で行なわれ、溶
射粉末の粒径は150μ以下を用い、溶射層の厚み
は0.1〜５mmが好ましい。これは0.1mm以下では均
質な溶射層が形成できず、また５mm以下では溶射
層が剥離する恐れがあるためである。 Thermal spraying is carried out by a normal ceramic spraying method, the particle size of the sprayed powder is preferably 150 μm or less, and the thickness of the sprayed layer is preferably 0.1 to 5 mm. This is because if it is less than 0.1 mm, a homogeneous sprayed layer cannot be formed, and if it is less than 5 mm, there is a risk that the sprayed layer will peel off.
この発明の電子部品焼成用治具、例えば匣鉢
は、Al2O3含有量が85重量％以上のアルミナ・シ
リカ質基材上に４〜31重量％のCaOを含有する
CaO安定化ジルコニアを溶射することにより、溶
射条件が種々変化しても、該基材との熱膨張率を
合わせることが可能で、匣鉢使用中の熱履歴を受
けても溶射層が剥離することなく繰返し使用可能
である。 The electronic component firing jig of the present invention, for example, a sagger, contains 4 to 31% by weight of CaO on an alumina-siliceous base material with an Al 2 O 3 content of 85% by weight or more.
By spraying CaO-stabilized zirconia, it is possible to match the thermal expansion coefficient with the base material even if the spraying conditions vary, and the sprayed layer will not peel off even if subjected to thermal history during use of the sagger. Can be used repeatedly without any problems.
(6) 実施例 以下この発明を実施例にて詳細に説明する。(6) Examples This invention will be explained in detail below with reference to Examples.
実施例 １
Al2O390重量％、SuO28重量％、その他残部が
不可避的不純物よりなるアルミナ・シリカ質基材
を170×110×10mmの大きさに切り出し、その表面
にCaO5.1重量％含有の安定化ジルコニア粉末を
水プラズマ溶射装置により0.5mm厚さに溶射した。Example 1 An alumina-siliceous base material consisting of 90% by weight Al 2 O 3 , 8% by weight SuO 2 , and the remainder being unavoidable impurities was cut into a size of 170 x 110 x 10 mm, and 5.1 weight % of CaO was applied to its surface. % stabilized zirconia powder was sprayed to a thickness of 0.5 mm using a water plasma spraying device.
溶射体の1200℃における熱膨張率は0.83％で、
その熱膨張曲線は基材の熱膨張曲線とほぼ一致し
ていた。 The thermal expansion coefficient of the sprayed material at 1200℃ is 0.83%,
Its thermal expansion curve almost matched that of the base material.
実施例 ２
Al2O393重量％、SiO25重量％、その他残部が
不可避的不純物よりなるアルミナ・シリカ質基材
に、溶射粉末をCaO10重量％含有の安定化ジルコ
ニアにした以外は実施例１と同様にして溶射体を
得た。Example 2 Example except that stabilized zirconia containing 10% by weight of CaO was used as the thermal spray powder on an alumina-siliceous base material consisting of 93% by weight of Al 2 O 3 , 5% by weight of SiO 2 , and the remainder being unavoidable impurities. A thermal spray body was obtained in the same manner as in 1.
溶射体の1200℃における熱膨張率は0.88％で、
その熱膨張曲線も基材の熱膨張曲線とほぼ一致し
ていた。 The thermal expansion coefficient of the thermal spray body at 1200℃ is 0.88%,
Its thermal expansion curve also almost matched that of the base material.
比較例 １
Al2O380重量％、SiO218重量％、その他残部が
不可避的不純物よりなるアルミナ・シリカ質基材
を用いたほかは実施例１と同様にして溶射体を得
た。Comparative Example 1 A thermal sprayed body was obtained in the same manner as in Example 1, except that an alumina-siliceous base material consisting of 80% by weight of Al 2 O 3 , 18% by weight of SiO 2 , and the remainder being unavoidable impurities was used.
基材および溶射体の1200℃における熱膨張率
は、夫々0.67％と0.73％で、溶射体の熱膨張曲線
も基材の熱膨張曲線とやや離れていた。 The thermal expansion coefficients of the base material and sprayed body at 1200°C were 0.67% and 0.73%, respectively, and the thermal expansion curve of the sprayed body was also slightly different from that of the base material.
比較例 ２
Al2O396重量％、SiO22重量％、その他残部が
不可避的不純物よりなるアルミナ・シリカ質基材
を用いて、CaOを3.5重量％含有する安定化ジル
コニアを溶射した。Comparative Example 2 Stabilized zirconia containing 3.5% by weight of CaO was thermally sprayed using an alumina-siliceous base material consisting of 96% by weight of Al 2 O 3 , 2% by weight of SiO 2 , and the remainder being unavoidable impurities.
基材および溶射体の1200℃における熱膨張率は
夫々0.92％と0.86％であつた。 The thermal expansion coefficients of the base material and the sprayed body at 1200°C were 0.92% and 0.86%, respectively.
(7) 効果
以上、実施例１、２および比較例１、２の４種
の試料を室温より昇温速度５℃／minで1400℃に
昇温し、４時間保持後室温まで炉冷する操作を繰
返し、基材と溶射層の接着状況を観察した。(7) Effect As described above, the four samples of Examples 1 and 2 and Comparative Examples 1 and 2 were heated from room temperature to 1400°C at a heating rate of 5°C/min, held for 4 hours, and then cooled in a furnace to room temperature. The process was repeated to observe the adhesion between the base material and the sprayed layer.
その結果、比較例１の試料は１回で剥離してし
まい、比較例２の試料は１回目では端に僅か剥離
が認められ、２回目には剥離が次第に進行し、３
回目の熱履歴で約1/3が剥離した。 As a result, the sample of Comparative Example 1 peeled off after the first time, and the sample of Comparative Example 2 showed slight peeling at the edges during the first time, and the peeling gradually progressed during the second time.
Approximately 1/3 of the film peeled off during the second heat cycle.
しかし、実施例１および２のこの発明の試料
は、いずれも５回目を過ぎても剥離はみられず、
熱膨張の調整が剥離防止に効果のあることを示し
ている。 However, in both the samples of the present invention in Examples 1 and 2, no peeling was observed even after the fifth test.
This shows that adjusting thermal expansion is effective in preventing peeling.
Claims (1)
リカ質基材の表面にCaO含有量が４〜31重量％で
ある安定化ジルコニアを溶射して治具を得、該治
具が前記基材の熱膨張とほぼ一致する熱膨張を有
することを特徴とする電子部品焼成用治具。1 A jig is obtained by thermally spraying stabilized zirconia having a CaO content of 4 to 31 wt% on the surface of an alumina-siliceous base material having an Al 2 O 3 content of 85 wt % or more, and the jig is A jig for firing electronic components, characterized by having a thermal expansion that substantially matches that of a base material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59132659A JPS6112017A (en) | 1984-06-26 | 1984-06-26 | Jig for sintering electronic part |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59132659A JPS6112017A (en) | 1984-06-26 | 1984-06-26 | Jig for sintering electronic part |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6112017A JPS6112017A (en) | 1986-01-20 |
| JPH0377652B2 true JPH0377652B2 (en) | 1991-12-11 |
Family
ID=15086489
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59132659A Granted JPS6112017A (en) | 1984-06-26 | 1984-06-26 | Jig for sintering electronic part |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6112017A (en) |
-
1984
- 1984-06-26 JP JP59132659A patent/JPS6112017A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6112017A (en) | 1986-01-20 |
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| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |