JPH0379077B2 - - Google Patents
Info
- Publication number
- JPH0379077B2 JPH0379077B2 JP31571587A JP31571587A JPH0379077B2 JP H0379077 B2 JPH0379077 B2 JP H0379077B2 JP 31571587 A JP31571587 A JP 31571587A JP 31571587 A JP31571587 A JP 31571587A JP H0379077 B2 JPH0379077 B2 JP H0379077B2
- Authority
- JP
- Japan
- Prior art keywords
- exchange resin
- water
- type
- pure water
- hco
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Treatment Of Water By Ion Exchange (AREA)
Description
〔産業上の利用分野〕
この発明は原子力発電所の補給水処理用の純水
製造装置、特に加圧水型原子力発電所の2次冷却
水の補給水処理系における純水貯槽の後に設けら
れるアフターポリツシヤとして有用な純水製造装
置に関するものである。
〔従来の技術〕
第1図は加圧水型原子力発電所の冷却水系を示
す系統図である。図において、1は原子炉、2は
蒸気発生器で、両者の間には1次冷却水3が循環
している。蒸気発生器2と復水器4の間には2次
冷却水5が循環し、蒸気発生器2で蒸発した蒸気
はタービン6を通つて復水器4で復水となり、復
水脱塩装置7で脱塩されて蒸気発生器2に循環す
る。2次冷却水系への補給水は、ポリツシヤ付純
水製造装置8で製造された純水9が純水貯槽10
に貯留され、アフターポリツシヤ11において不
純物を除去され、脱気器12で脱気されて復水器
4に供給される。
このような加圧水型原子力発電所の2次冷却水
系では、補給水中の不純物イオンが濃縮されて
種々の障害をもたらすため、それぞれの絶対量の
ほか、各成分の比についても規制されており、
Na0.06ppb以下、Cl0.15ppb以下、Na/Cl(モル
比)0.3〜0.7の水質基準が設けられている。
このような水質基準を達成するために、アフタ
ーポリツシヤ11としてH形の強酸性カチオン交
換樹脂とOH形の強塩基性アニオン交換樹脂との
混床からなる純水製造装置が用いられており、純
水貯槽10等において混入する不純物イオンを除
去して補給水とされている。
〔発明が解決しようとする問題点〕
しかしながら、従来のアフターポリシヤ11と
して用いられる純水製造装置においては、樹脂は
H/OH形で用いられているため、純水貯槽10
で貯留中に大気から混入するCO2でアニオン交換
樹脂が飽和してアニオンがブレークすると、処理
水のCl濃度が高くなり、Na/Clモル比が0.3〜0.7
を満足しなくなる。この種の純水製造装置では、
カチオン交換樹脂とアニオン交換樹脂を分離して
再生すると、両樹脂を完全に分離できないため、
再生後の処理水にNaまたはClが漏出するのは避
けられないので、樹脂は再生することなく、その
まま入れ替えて排棄されている。従つて従来の純
水製造装置では、頻繁に樹脂の入れ替えをしなけ
ればならず、装置規模にもよるが、一般に1月に
1回程度の入れ替えが必要になるという問題点が
あつた。
この発明の目的は上記問題点を解決するため、
長期にわたつて高い処理水質を維持でき、原子力
発電所の補給水処理用として使用可能で、樹脂の
入れ替えを少なくできる純水製造装置を提供する
ことである。
〔問題点を解決するための手段〕
本発明は、強酸性カチオン交換樹脂と強塩基性
アニオン交換樹脂との混床からなる原子力発電所
の補給水処理用の純水製造装置であつて、強酸性
カチオン交換樹脂はその全量に対しNa形を0.2当
量%以下しか含まないH形であり、強塩基性アニ
オン交換樹脂はその全量に対しCl形を0.2当量%
以下しか含まず、かつHCO3形を40〜80当量%含
み、残部はOH形であることを特徴とする純水製
造装置である。
加圧水型原子力発電所の2次冷却水系に供給す
る補給水処理系では、補給水を第1図の復水器4
に供給する前に脱気器12に脱気するため、アフ
ターポリシヤ11ではCO2を除去する必要がな
い。従つてアフターポリツシヤ11として使用す
る純水製造装置では、CO2を除去することなく、
Na+、Cl-等の他の不純物を除去すればよいこと
になる。
イオン交換樹脂は水中のイオンを交換吸着する
が、樹脂が一定量のイオンを交換吸着すると平衡
状態に達して、それ以上同じイオンを吸着しなく
なる。この状態では水中に存在する同種イオンは
イオン交換樹脂に対する負荷にならないが、他の
イオンの交換吸着は行われる。従つて当初からこ
のような平衡状態に達したイオン交換樹脂を使用
すると、特定のイオンを吸着することなく、他の
イオンのみを吸着することができる。
アニオン交換樹脂について見ると、貯留純水
の、その水温におけるHCO3 -の溶解濃度に対し
て平衡状態にあるアニオン交換樹脂組成であれ
ば、水中のHCO3 -はアニオン交換樹脂の負荷と
はならない。
そこで本発明では、強酸性カチオン交換樹脂は
その全量に対しNa形を0.2当量%以下しか含まな
いH形とし、強塩基性アニオン交換樹脂はその全
量に対してCl形を0.2当量%以下しか含まず、か
つHCO3形を40〜80当量%含み、残部はOH形で
ある樹脂組成の強酸性カチオン交換樹脂および強
塩基性アニオン交換樹脂の混床を用いてイオン交
換を行い、純水を製造する。
使用可能なイオン交換樹脂の種類、混合比、通
水条件等は、従来より原子力発電所の2次冷却水
の補給水処理系のアフターポリツシヤとして使用
されていた純水製造装置と同様である。
アニオン交換樹脂中のHCO3形の量は40〜80当
量%であるが、通常の大気と平衡状態に達して炭
酸ガスが溶存している水の処理では、約60当量%
が好ましい。通常の加圧水型原子力発電所の2次
冷却水の補給水処理系では、アニオン交換樹脂組
成がHCO3形60当量%で、残部がOH形の場合に
平衡状態にある。HCO3形が60当量%より小さい
と、貯留純水中のHCO3 -は負荷となり、HCO3形
が60当量%になつて平衡に達する。逆にHCO3形
が60当量%より大きいと、処理水中にHCO3 -を
放出し、HCO3形が60当量%になつて平衡に達す
る。この場合HCO3形のアニオン交換樹脂組成が
40〜80当量%であれば、平衡に達するまでの水質
変化は許容できる。しかしながら後述の比較例2
に示すように、HCO3形を含まず、H/OH形で
採水しながら、補給水中のCO2を吸着し、これに
よりアニオン交換樹脂のHCO3形が60当量%とな
つて平衡状態に達するようにすると、平衡状態に
達するまではNa/Cl比が基準を超えることにな
り、平衡状態に達するまでには時間がかかりすぎ
好ましくない。
HCO3形強塩基性アニオン交換樹脂の調製は、
Cl形が0.2当量%以下のOH形強塩基性アニオン交
換樹脂をカラムにつめ、これにNaHCO3溶液を
通液したのち、純水で押出、洗浄を行う。こうし
て得られたHCO3形強塩基性アニオン交換樹脂
は、Cl形が0.2当量%以下のOH形強塩基性アニオ
ン交換樹脂と前記範囲内の所定の比率で混合し、
さらにNa形が0.2当量%以下のH形強酸性カチオ
ン交換樹脂と混合して混床を形成する。
こうして形成された混床式の純水製造装置は、
加圧水型原子力発電所の補給水処理系のアフター
ポリシヤ11と用いられ、従来のものと同様に純
水貯槽10内の純水を通水してイオン交換を行
い、純水中に含まれるNa+,Cl-等の不純物を除
去する。このときHCO3 -はイオン交換樹脂に吸
着されることなくそのまま漏出するが、脱気器1
2においてCO2として除去される。
〔発明の効果〕
以上の通り、本発明によれば、HCO3形を特定
の割合で含むOH形のアニオン交換樹脂を混床に
用いたので、原水中に炭酸ガスが多量に含まれる
場合では、炭酸ガスを負荷とすることなく、他の
不純物を効率よく吸着することができ、長期間に
わたつて高い処理水質を得ることができ、樹脂の
入れ替えが少なくてすむなどの効果がある。
〔実施例〕
以下、本発明の実施例および比較例について説
明する。各例中、%は当量%である。
実施例 1
加圧水型原子力発電所の2次冷却水の補給水処
理系におけるアフターポリシヤとして、強酸性カ
チオン交換樹脂ダイヤイオンSKNと、強塩基性
アニオン交換樹脂SAN(いずれも三菱化成工業(株)
製、商品名)を容量比で1:1の割合で混合した
混床式純水製造装置を用いて純水を製造した。
このときアニオン交換樹脂をHCO3形として
OH形と混合し、樹脂組成を次のようにして、
H/OH/HCO3形運転した結果を表1に示す。
カチオン交換樹脂組成:Na形0.2%、残部H形
アニオン交換樹脂組成:Cl形0.2%HCO3形40%、
60%または80%、残部OH形
[Industrial Application Field] This invention relates to a pure water production system for treating make-up water in a nuclear power plant, and particularly to an after-purification system installed after a pure water storage tank in a make-up water treatment system for secondary cooling water in a pressurized water type nuclear power plant. The present invention relates to a pure water production device useful as a water purifier. [Prior Art] Fig. 1 is a system diagram showing a cooling water system of a pressurized water nuclear power plant. In the figure, 1 is a nuclear reactor, 2 is a steam generator, and primary cooling water 3 is circulated between the two. Secondary cooling water 5 is circulated between the steam generator 2 and the condenser 4, and the steam evaporated in the steam generator 2 passes through the turbine 6 and becomes condensate in the condenser 4, which is then used in the condensate desalination equipment. It is desalted in step 7 and circulated to the steam generator 2. Make-up water to the secondary cooling water system is purified water 9 produced by a pure water production device 8 with a polisher, which is supplied to a pure water storage tank 10.
It is stored in the after polisher 11 to remove impurities, degassed in the deaerator 12 and supplied to the condenser 4. In the secondary cooling water system of such pressurized water nuclear power plants, impurity ions in make-up water become concentrated and cause various problems, so in addition to the absolute amount of each component, the ratio of each component is also regulated.
Water quality standards have been set for Na of 0.06 ppb or less, Cl of 0.15 ppb or less, and Na/Cl (molar ratio) of 0.3 to 0.7. In order to achieve such water quality standards, a pure water production device consisting of a mixed bed of an H-type strongly acidic cation exchange resin and an OH-type strongly basic anion exchange resin is used as the after polisher 11. , the impurity ions mixed in the pure water storage tank 10 and the like are removed and used as make-up water. [Problems to be Solved by the Invention] However, in the conventional pure water production device used as the after polisher 11, since the resin is used in the H/OH type, the pure water storage tank 10
When the anion exchange resin is saturated with CO 2 mixed in from the atmosphere during storage and the anions break, the Cl concentration of the treated water increases and the Na/Cl molar ratio increases from 0.3 to 0.7.
become dissatisfied with In this type of pure water production equipment,
When cation exchange resin and anion exchange resin are separated and regenerated, both resins cannot be completely separated.
Since it is unavoidable that Na or Cl will leak into the treated water after regeneration, the resin is not regenerated and is replaced and disposed of as is. Therefore, in conventional pure water production equipment, the resin must be replaced frequently, and depending on the scale of the equipment, it is generally necessary to replace the resin about once a month. The purpose of this invention is to solve the above problems.
To provide a pure water production device that can maintain high treated water quality over a long period of time, can be used for makeup water treatment at a nuclear power plant, and can reduce resin replacement. [Means for Solving the Problems] The present invention is a pure water production device for treatment of make-up water in nuclear power plants, which comprises a mixed bed of a strongly acidic cation exchange resin and a strongly basic anion exchange resin. Strongly basic anion exchange resins are H type, which contains less than 0.2 equivalent% of Na form based on the total amount, and strongly basic anion exchange resins contain 0.2 equivalent% of Cl form based on the total amount.
This is a pure water production device characterized by containing only the following and 40 to 80 equivalent percent of HCO 3 form, with the remainder being OH form. In the make-up water treatment system that supplies the secondary cooling water system of a pressurized water nuclear power plant, make-up water is transferred to condenser 4 in Figure 1.
Since the CO 2 is degassed into the deaerator 12 before being supplied to the after polisher 11, there is no need to remove CO2 . Therefore, in the pure water production equipment used as the after polisher 11, CO 2 is not removed.
It is only necessary to remove other impurities such as Na + and Cl - . Ion exchange resin exchanges and adsorbs ions in water, but when the resin exchanges and adsorbs a certain amount of ions, it reaches an equilibrium state and no longer adsorbs the same ions. In this state, the same kind of ions present in the water do not become a load on the ion exchange resin, but other ions are exchanged and adsorbed. Therefore, by using an ion exchange resin that has reached such an equilibrium state from the beginning, it is possible to adsorb only other ions without adsorbing specific ions. Looking at the anion exchange resin, if the anion exchange resin composition is in equilibrium with the dissolved concentration of HCO 3 - at the water temperature of the stored pure water, the HCO 3 - in the water will not be a load on the anion exchange resin. . Therefore, in the present invention, the strongly acidic cation exchange resin is of the H type, which contains only 0.2 equivalent% or less of the Na form relative to its total amount, and the strongly basic anion exchange resin is of the H type, which contains only 0.2 equivalent% or less of the Cl form relative to its total amount. Pure water is produced by performing ion exchange using a mixed bed of a strongly acidic cation exchange resin and a strongly basic anion exchange resin with a resin composition that contains 40 to 80 equivalents of HCO 3 form and the remainder is OH form. do. The types of ion exchange resins that can be used, the mixing ratio, water flow conditions, etc. are the same as in the pure water production equipment that has been used as an after polisher for the make-up water treatment system for secondary cooling water at nuclear power plants. be. The amount of HCO 3 form in anion exchange resins is 40-80 equivalent%, but in the treatment of water that has reached equilibrium with the normal atmosphere and has dissolved carbon dioxide gas, it is about 60 equivalent%.
is preferred. In a typical make-up water treatment system for secondary cooling water in a pressurized water nuclear power plant, an equilibrium state exists when the anion exchange resin composition is 60 equivalent percent of HCO 3 form and the remainder is OH form. When the HCO 3 form is less than 60 equivalent %, HCO 3 - in the stored pure water becomes a load, and equilibrium is reached when the HCO 3 form becomes 60 equivalent %. Conversely, when the HCO 3 form is greater than 60 equivalent %, HCO 3 - is released into the treated water, and equilibrium is reached with the HCO 3 form reaching 60 equivalent %. In this case, the anion exchange resin composition of HCO 3 type is
If it is 40 to 80 equivalent %, changes in water quality until equilibrium is reached can be tolerated. However, Comparative Example 2 described below
As shown in Figure 2, CO 2 in the make-up water is adsorbed while collecting water in H/OH form without containing HCO 3 form, and as a result, the HCO 3 form of the anion exchange resin becomes 60 equivalent% and reaches an equilibrium state. If the Na/Cl ratio is allowed to reach the equilibrium state, the Na/Cl ratio will exceed the standard until the equilibrium state is reached, and it will take too long to reach the equilibrium state, which is not preferable. Preparation of HCO 3 type strongly basic anion exchange resin is as follows:
A column is filled with an OH-type strongly basic anion exchange resin containing 0.2 equivalent% or less of Cl-type, and a NaHCO 3 solution is passed through the column, followed by extrusion and washing with pure water. The HCO 3 type strong basic anion exchange resin thus obtained is mixed with an OH type strong basic anion exchange resin containing Cl type 0.2 equivalent% or less at a predetermined ratio within the above range,
Furthermore, a mixed bed is formed by mixing with an H-type strongly acidic cation exchange resin containing 0.2 equivalent% or less of Na-type. The mixed bed type pure water production equipment thus formed is
It is used as the after-polisher 11 of the make-up water treatment system of pressurized water nuclear power plants, and as with conventional systems, pure water is passed through the pure water storage tank 10 for ion exchange, and the sodium contained in the pure water is removed. Removes impurities such as + and Cl - . At this time, HCO 3 - leaks out as it is without being adsorbed by the ion exchange resin.
2 is removed as CO2 . [Effects of the Invention] As described above, according to the present invention, since an OH type anion exchange resin containing a specific proportion of HCO 3 type is used in the mixed bed, it can be used in cases where a large amount of carbon dioxide gas is contained in the raw water. , other impurities can be efficiently adsorbed without loading carbon dioxide gas, high treated water quality can be obtained over a long period of time, and resin replacement is less necessary. [Examples] Examples and comparative examples of the present invention will be described below. In each example, % is equivalent %. Example 1 A strongly acidic cation exchange resin Diaion SKN and a strongly basic anion exchange resin SAN (both manufactured by Mitsubishi Chemical Industries, Ltd.) were used as after polishers in the make-up water treatment system for secondary cooling water in a pressurized water nuclear power plant.
Pure water was produced using a mixed-bed pure water production apparatus in which the following products were mixed at a volume ratio of 1:1. At this time, the anion exchange resin is HCO 3 type.
Mix with OH type and make the resin composition as follows.
Table 1 shows the results of H/OH/HCO 3 type operation. Cation exchange resin composition: Na type 0.2%, balance H type Anion exchange resin composition: Cl type 0.2% HCO 3 type 40%,
60% or 80%, remainder OH type
【表】
HCO3形40%の場合、採水初期17000B.V.まで
はPH6.5、導電率は0.06μS/cmであつた。HCO3形
80%の場合、採水初期5000B.V.までは導電率は
1.0μS/cmであつた。
比較例 1
実施例1において、樹脂組成を次のようにし
て、H/OH形運転した結果を表2に示す。
カチオン交換樹脂組成:Na形0.2%、残部H形
アニオン交換樹脂組成:Cl形5%、残部OH形[Table] In the case of 40% HCO type 3 , the pH was 6.5 and the conductivity was 0.06 μS/cm up to 17,000 B.V. at the initial stage of water sampling. HCO type 3
In the case of 80%, the conductivity is
It was 1.0μS/cm. Comparative Example 1 Table 2 shows the results of H/OH type operation in Example 1 with the resin composition as follows. Cation exchange resin composition: Na type 0.2%, balance H type Anion exchange resin composition: Cl type 5%, balance OH type
【表】
HCO3ブレーク前は、Na/Clモル比が基準値
の範囲内であるが、その後は外れるため採水不可
となつた。
比較例 2
比較例1において、HCO3ブレーク後に採水可
能とするために、樹脂組成を次のようにし、H/
OH形運転して、HCO3ブレーク後に採水した結
果を表3に示す。
カチオン交換樹脂組成:Na形0.2%、残部H形
アニオン交換樹脂組成:Cl形0.2%、残部OH形[Table] Before the HCO 3 break, the Na/Cl molar ratio was within the standard value range, but after that it was out of range and water could not be sampled. Comparative Example 2 In Comparative Example 1, in order to enable water sampling after the HCO 3 break, the resin composition was changed to the following and H/
Table 3 shows the results of water sampling after HCO 3 break during OH type operation. Cation exchange resin composition: Na type 0.2%, balance H type Anion exchange resin composition: Cl type 0.2%, balance OH type
【表】
以上の結果より、比較例1では処理水水質が基
準値の範囲内であるHCO3飽和前の採水量は
46800B.V.で少なく、比較例2ではそれに相当す
るHCO3ブレーク前の46800B.V.の基準値の範囲
外である。これに対して実施例ではいずれの場合
も当初から基準値内の処理水水質が得られ、採水
量も比較例の6倍の採水量が得られており、長期
にわたつて高い処理水水質が得られることがわか
る。[Table] From the above results, in Comparative Example 1, the amount of water sampled before HCO3 saturation when the treated water quality is within the standard value range is
46,800 B.V., and in Comparative Example 2, it is outside the corresponding standard value of 46,800 B.V. before the HCO 3 break. On the other hand, in all cases in the examples, the quality of the treated water was within the standard values from the beginning, and the amount of water sampled was six times that of the comparative example, indicating that high quality of the treated water was maintained over a long period of time. You can see what you can get.
第1図は加圧水型原子力発電所の冷却水系を示
す系統図である。
1…原子炉、2…蒸気発生器、4…復水器、7
…復水脱塩装置、8…ポリツシヤ付純水製造装
置、10…純水貯槽、11…アフターポリツシ
ヤ、12…脱気器。
FIG. 1 is a system diagram showing the cooling water system of a pressurized water nuclear power plant. 1...Nuclear reactor, 2...Steam generator, 4...Condenser, 7
... condensate desalination device, 8 ... pure water production device with polisher, 10 ... pure water storage tank, 11 ... after polisher, 12 ... deaerator.
Claims (1)
交換樹脂との混床からなる原子力発電所の補給水
処理用の純水製造装置であつて、強酸性カチオン
交換樹脂はその全量に対しNa形を0.2当量%以下
しか含まないH形であり、強塩基性アニオン交換
樹脂はその全量に対しCl形を0.2当量%以下しか
含まず、かつHCO3形を40〜80当量%含み、残部
はOH形であることを特徴とする純水製造装置。 2 HCO3形アニオン交換樹脂が約60当量%であ
る特許請求の範囲第1項記載の純水製造装置。 3 純水製造装置が加圧水型原子力発電所の2次
冷却水の補給水処理系に設けられるアフターポリ
ツシヤとして使用されるものである特許請求の範
囲第1項または第2項記載の純水製造装置。[Scope of Claims] 1. A pure water production device for treatment of make-up water in a nuclear power plant comprising a mixed bed of a strongly acidic cation exchange resin and a strongly basic anion exchange resin, wherein the entire amount of the strongly acidic cation exchange resin is The strongly basic anion exchange resin contains only 0.2 equivalent% or less of the Na form compared to the total weight of the H-form, and contains 40 to 80 equivalent% of the HCO 3 form. A pure water production device characterized in that the remainder is of OH type. 2. The pure water production apparatus according to claim 1, wherein the HCO 3 type anion exchange resin is about 60 equivalent %. 3. The pure water according to claim 1 or 2, wherein the pure water production device is used as an after polisher installed in a make-up water treatment system for secondary cooling water of a pressurized water nuclear power plant. Manufacturing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31571587A JPH01155984A (en) | 1987-12-14 | 1987-12-14 | Pure water production equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31571587A JPH01155984A (en) | 1987-12-14 | 1987-12-14 | Pure water production equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01155984A JPH01155984A (en) | 1989-06-19 |
| JPH0379077B2 true JPH0379077B2 (en) | 1991-12-17 |
Family
ID=18068667
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP31571587A Granted JPH01155984A (en) | 1987-12-14 | 1987-12-14 | Pure water production equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01155984A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5364450B2 (en) * | 2009-06-01 | 2013-12-11 | オルガノ株式会社 | Water treatment device for fuel cell |
| JP6427378B2 (en) * | 2014-10-06 | 2018-11-21 | オルガノ株式会社 | Ammonia dissolved water supply system, ammonia dissolved water supply method, and ion exchange apparatus |
| JP6430772B2 (en) * | 2014-10-06 | 2018-11-28 | オルガノ株式会社 | Carbon dioxide-dissolved water supply system, carbon dioxide-dissolved water supply method, and ion exchange device |
| JP6473311B2 (en) * | 2014-10-06 | 2019-02-20 | オルガノ株式会社 | Conductive aqueous solution manufacturing apparatus, conductive aqueous solution manufacturing method, and ion exchange device |
| EP4592251A1 (en) * | 2024-01-23 | 2025-07-30 | DDP Specialty Electronic Materials US 8, LLC | Ion exchange filters useful for electrochemical systems |
-
1987
- 1987-12-14 JP JP31571587A patent/JPH01155984A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01155984A (en) | 1989-06-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US3618589A (en) | Desalination process by ion exchange | |
| US8861670B2 (en) | Method and apparatus for condensate demineralization | |
| US4853130A (en) | Method for purifying liquids | |
| JP2001215294A (en) | Condensate demineralizer | |
| JPH0379077B2 (en) | ||
| JPH11352283A (en) | Condensate processing method and condensate demineralization device | |
| JP2009281874A (en) | Method and device for condensate demineralization | |
| JP4467488B2 (en) | Condensate demineralization method and condensate demineralization apparatus | |
| JP2003315496A5 (en) | ||
| JP3330483B2 (en) | Condensate desalination equipment | |
| JP2009281873A (en) | Method and device for condensate demineralization | |
| Tiger et al. | Demineralizing solutions by a two-step ion exchange process | |
| JP4691276B2 (en) | Method and apparatus for recovering high purity boron-containing water | |
| DE1920497A1 (en) | Ion exchange solutions with carboxyl cation - and strong basic anion | |
| US4206048A (en) | Process for purification of contaminated water | |
| JPS5522379A (en) | Manufacture of pure water | |
| JP2003053342A (en) | Method and apparatus for removing impurities from boron-containing solution | |
| JP2002126541A (en) | Method for treating boron eluent containing alkali | |
| JP4666984B2 (en) | High purity ion-exchanged water production method and apparatus | |
| JPS6090091A (en) | Silica removing method | |
| RU2163569C1 (en) | Water treatment process | |
| JPH1147744A (en) | Condensate treatment method | |
| JPS6232397A (en) | Method of processing radioactive waste liquor | |
| JPS6235079B2 (en) | ||
| JPH01119345A (en) | Method for decreasing eluate of anion-exchange resin of high basicity |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |