JPH038708A - Production of silica feedstock - Google Patents

Production of silica feedstock

Info

Publication number
JPH038708A
JPH038708A JP14327289A JP14327289A JPH038708A JP H038708 A JPH038708 A JP H038708A JP 14327289 A JP14327289 A JP 14327289A JP 14327289 A JP14327289 A JP 14327289A JP H038708 A JPH038708 A JP H038708A
Authority
JP
Japan
Prior art keywords
particles
silicon dioxide
raw material
cristobalite
silica raw
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14327289A
Other languages
Japanese (ja)
Inventor
Hiroaki Imai
宏明 今井
Hiroshi Namikawa
並川 洋
Kunihide Sawamura
澤村 国英
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Oxygen Co Ltd
Taiyo Nippon Sanso Corp
Original Assignee
Japan Oxygen Co Ltd
Nippon Sanso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Oxygen Co Ltd, Nippon Sanso Corp filed Critical Japan Oxygen Co Ltd
Priority to JP14327289A priority Critical patent/JPH038708A/en
Publication of JPH038708A publication Critical patent/JPH038708A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To prepare silica feedstock which can inexpensively and efficiently produce quartz glass of high quality by mixing aggregated fine particles of amorphous SiO2 with crystalline particles of cristobalite and sintering the mixture. CONSTITUTION:Commercially and inexpensively available fine particles of amorphous silica is granulated into aggregated particles of 30 to 500mum particle sizes. The particles and crystalline particles of cristobalite are mixed so that the weight ratio becomes 20/1 to 1/10, heated over 1100 deg.C, sintered and crystallized to give the subject silica feedstock for quartz glass.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、石英ガラスを製造するために使用されるシリ
カ原料の製造方法に関し、安価にかつ容易に製造する方
法に係るものである。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for producing a silica raw material used for producing quartz glass, and relates to a method for producing it inexpensively and easily.

〔従来の技術〕[Conventional technology]

周知のように、透明な石英ガラスは、水晶、珪石、珪砂
等の天然シリカ原料を加熱、溶融して作られる。即ち、
通常は、 ■ 上記シリカ原料粉をアルゴン−酸素プラズマ炎、あ
るいは酸水素炎中に少しづつlj−給し、溶融してガラ
ス化し、これを台の上に堆積させていくベルヌーイ法。
As is well known, transparent quartz glass is made by heating and melting natural silica raw materials such as crystal, silica stone, and silica sand. That is,
Usually, (1) the Bernoulli method is used, in which the silica raw material powder is gradually fed into an argon-oxygen plasma flame or an oxyhydrogen flame, melted and vitrified, and deposited on a table.

■ 上記シリカ原料粉をルツボに入れ、真空加熱炉で溶
融し、ガラス化させる真空溶融法。
■ A vacuum melting method in which the above silica raw material powder is placed in a crucible, melted in a vacuum heating furnace, and vitrified.

のいずれかによっている。It depends on one of the following.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記したように、透明な石英ガラスを11・)るには、
通常天然シリカを原料とするが、天然シリカには、各種
の不純物が含まれており、高純度の石英ガラスを工業的
に生産するためには、精製工程が必要になる。従って、
コストが高くなることは否めず、しかも天然シリカ原料
は、資源枯渇の問題もある。
As mentioned above, in order to make transparent quartz glass,
Natural silica is usually used as a raw material, but natural silica contains various impurities, and a purification process is required to industrially produce high-purity quartz glass. Therefore,
It is undeniable that the cost will be high, and the natural silica raw material also has the problem of resource depletion.

このため、四塩化珪素を酸化することにより、高純度の
石英ガラスを合成する方法がiM案されているが、生産
効率が悪く、コストが高いことが欠点である。
For this reason, iM has proposed a method of synthesizing high-purity quartz glass by oxidizing silicon tetrachloride, but this method has disadvantages of low production efficiency and high cost.

また、一般に市販されている非晶質二酸化珪素粉は、高
純度であるが、0.02um以下の粒子径をもつもので
あるため、これを直接ガラス化しようとしても前記した
常法では、生産効率が悪く、コスト高゛を招くため、工
業的規模での実施に適さないこともよく知られている。
In addition, although commercially available amorphous silicon dioxide powder has a high purity, it has a particle size of 0.02 um or less, so even if you try to directly vitrify it, it will not be possible to produce it using the conventional method described above. It is also well known that it is not suitable for implementation on an industrial scale due to its inefficiency and high cost.

これを解決する手段として、例えば特開昭61−588
22号公報、特開昭61−58823号公報等には、非
晶質二酸化珪素粉を加熱して、クリストバライト結晶相
をもつポーラスな焼結体を作り、これを真空下で加熱、
溶融してガラス化する方法が提案されている。これらの
方法によれば、天然シリカ原料を使用せずに、高純度の
透明石英ガラスを得ることができるが、クリストバライ
ト結晶相をもったポーラスな焼結体を得るために相転移
促進剤を必要とする。また、高純度の石英ガラスを得る
ためには、当然、原料中に添加した相転移促進剤の除去
が必要である。従って、真空溶融法によらざるを得ず、
他のベルヌーイ法等によるガラス製造には適用できない
As a means to solve this problem, for example, Japanese Patent Laid-Open No. 61-588
No. 22, JP-A No. 61-58823, etc. disclose that amorphous silicon dioxide powder is heated to produce a porous sintered body having a cristobalite crystal phase, and this is heated under vacuum.
A method of melting and vitrifying it has been proposed. According to these methods, highly pure transparent quartz glass can be obtained without using natural silica raw materials, but a phase transition accelerator is required to obtain a porous sintered body with a cristobalite crystal phase. shall be. Furthermore, in order to obtain high-purity quartz glass, it is naturally necessary to remove the phase transition accelerator added to the raw materials. Therefore, we have no choice but to use the vacuum melting method,
It cannot be applied to glass manufacturing using other methods such as the Bernoulli method.

そこで本発明は、一般に市販されている安価な非晶質二
酸化珪素を、例えばベルヌーイ法等にも工業的に利用で
きるシリカ原料粉を製造する方法を提1%することを目
的としている。
Therefore, the object of the present invention is to provide a method for producing silica raw material powder that can be used industrially, for example, in the Bernoulli method, using inexpensive amorphous silicon dioxide that is generally commercially available.

〔課題を解決するための手段〕[Means to solve the problem]

上記した目的を達成するために、本発明のシリカ原料の
製造方法は、非晶質二酸化珪素の微粒子を凝集粒子に造
粒した後、これをグリスドパライト結晶粒子と、好まし
くは非晶質二酸化珪素の凝集粒子とクリストバライト結
晶粒子の重量混合比が20:1〜1:10になるように
混合し、1100℃以上に加熱することにより、粒子状
で焼結。
In order to achieve the above object, the method for producing a silica raw material of the present invention involves granulating fine particles of amorphous silicon dioxide into agglomerated particles, and then granulating the particles with grease dopalite crystal particles, preferably amorphous silicon dioxide. The aggregated silicon dioxide particles and cristobalite crystal particles are mixed at a weight mixing ratio of 20:1 to 1:10, and sintered in the form of particles by heating to 1100°C or higher.

結晶化せしめることを特徴とするものである。It is characterized by crystallization.

〔作 用〕[For production]

これにより、非晶質二酸化珪素の凝集粒子間のネッキン
グが防止されるため、ポーラスな所望の粒径をもった焼
結、結晶物が得られる。
This prevents necking between agglomerated particles of amorphous silicon dioxide, so that a sintered and crystalline material having a desired porous particle size can be obtained.

〔実施例〕〔Example〕

以下、本発明に係るシリカ原料の製造法を一実施例に基
づいて説明する。
Hereinafter, a method for producing a silica raw material according to the present invention will be explained based on one example.

非晶質二酸化珪素粉は、通常、粒径0,02ハm以下の
微粉であるが、まずこれを30μm〜500ハm1好ま
しくは50um〜150即の凝集粒子となるように造粒
する。造粒手段は、任意であるが、例えば、イオン交換
水を用いて、二酸化珪素粉:イオン交換水−1:10(
重量比)の割合で懸濁させた後、噴霧乾燥造粒機等で整
粒することにより所望粒径をもつ球状の凝集粒子を得る
ことができる。
Amorphous silicon dioxide powder is usually a fine powder with a particle size of 0.02 μm or less, but it is first granulated into aggregated particles of 30 μm to 500 μm, preferably 50 μm to 150 μm. The granulation means is arbitrary, but for example, using ion exchange water, silicon dioxide powder: ion exchange water - 1:10 (
After suspending the particles at a ratio of (weight ratio), spherical aggregated particles having a desired particle size can be obtained by sizing using a spray drying granulator or the like.

また、クリストバライト結晶粉は、本発明の方法によっ
て得られたものを再利用することが原則であるが、最初
は、この結晶粉を別途用意しなければならない。結晶粉
の作製方法は任意であるが、例えば、上記非晶質二酸化
珪素粉を1500℃以上に加熱し、焼結、結晶化させた
ものをボールミルで粉砕することにより得られた粒径5
0〜100μmのクリストバライト結晶粒子を使用する
ことができる。
In principle, the cristobalite crystal powder obtained by the method of the present invention is reused, but this crystal powder must be prepared separately at first. The method for producing the crystalline powder is arbitrary, but for example, the above-mentioned amorphous silicon dioxide powder is heated to 1500°C or higher, sintered and crystallized, and then ground in a ball mill.
Cristobalite crystal particles of 0 to 100 μm can be used.

このようにして得られた二酸化珪素凝集粒子とクリスト
バライト結晶粒子とを均一に混合する。
The silicon dioxide agglomerated particles and cristobalite crystal particles thus obtained are uniformly mixed.

このときの混合割合は、加熱、焼結の際のネッキング防
止と生産性から、凝集粒子:結晶粒子=20:1〜1:
10の範囲が望ましい。即ち、結晶粒子の混合比が前記
範囲より少ないと、加熱により凝集粒子間の焼結が進行
してネッキングが生じ、粒子状の焼結物が得られ難く、
又、結晶粒子が多いと当然生産性が悪く、実用的ではな
い。
The mixing ratio at this time is agglomerated particles: crystal particles = 20:1 to 1: from the viewpoint of prevention of necking during heating and sintering and productivity.
A range of 10 is desirable. That is, if the mixing ratio of crystal particles is less than the above range, sintering between aggregated particles will proceed due to heating, necking will occur, and it will be difficult to obtain a particulate sintered product.
Moreover, if there are many crystal particles, the productivity will naturally be poor and it is not practical.

このようにして得られた混合物を、例えばルツボ等に充
填し、加熱炉等によりクリストバライト結晶相に焼結す
る。
The mixture thus obtained is filled in, for example, a crucible and sintered into a cristobalite crystal phase using a heating furnace or the like.

このときの加熱温度は、1,100℃以上が望ましい。The heating temperature at this time is preferably 1,100°C or higher.

これは該温度以下であると焼結および結晶化が進行し難
いからである。
This is because sintering and crystallization are difficult to proceed below this temperature.

実験例1 粒径O502um以下の非晶質二酸化珪素粉をイオン交
換水に重量比で1=10の割合で懸濁させた後、噴霧乾
燥造粒機により整粒して50ハm〜1100uの球状で
なる凝集粒子を得た。次いでこれと別途にiすた粒径5
0J1m〜t o o umのクリストバライト結晶粒
子とを重量混合比で1=1の割合で配合し、V字型回転
混合機により10分間混合して均一化した。
Experimental Example 1 After suspending amorphous silicon dioxide powder with a particle size of 502 um or less in ion-exchanged water at a weight ratio of 1=10, the particles were sized using a spray drying granulator to form particles of 50 ham to 1100 um. Agglomerated particles having a spherical shape were obtained. Next, separately from this, i-star particle size 5
Cristobalite crystal particles of 0 J1 m to 1 m to 10 um were blended at a weight mixing ratio of 1=1, and mixed for 10 minutes using a V-shaped rotary mixer to homogenize.

以上により得られた混合粒子をアルミナ製ルツボに充填
した後、加熱炉に入れ、1,200℃で24時間加熱処
理して二酸化珪素粉をクリストバライト結晶相に焼結し
た。得られた焼結物は、粒子状のポーラスなもので、こ
れを原料とし、ベルヌーイ法により高品質の石英ガラス
を製造することができた。
After filling an alumina crucible with the mixed particles obtained above, the mixture was placed in a heating furnace and heat-treated at 1,200° C. for 24 hours to sinter the silicon dioxide powder into a cristobalite crystal phase. The obtained sintered product was porous in the form of particles, and using this as a raw material, high-quality quartz glass could be manufactured by the Bernoulli method.

実験例2 実験例1と同様にして得られた粒径50Um〜100ハ
mの凝集粒子と別途得た1101J〜30μmの結晶粒
子とを重量混合比20:1になるように配合してV字型
回転混合機により30分間混合した。
Experimental Example 2 Agglomerated particles with a particle size of 50 Um to 100 μm obtained in the same manner as Experimental Example 1 and crystal particles of 1101 J to 30 μm obtained separately were mixed at a weight mixing ratio of 20:1 to form a V-shape. Mixed for 30 minutes using a mold rotary mixer.

得られた混合粒子をアルミナ製ルツボに充填した後、加
熱炉に入れ、1,400℃で40時間加熱処理して二酸
化珪素粉をクリストバライト結晶相に焼結することによ
り、ポーラスな結晶粒子を得ることができた。次いでこ
れを実験例1と同様ガラス化したところ、高品質の石英
ガラスが得られた。
After filling the obtained mixed particles into an alumina crucible, they are placed in a heating furnace and heated at 1,400°C for 40 hours to sinter the silicon dioxide powder into a cristobalite crystal phase, thereby obtaining porous crystal particles. I was able to do that. Next, when this was vitrified in the same manner as in Experimental Example 1, high quality quartz glass was obtained.

実験例3 実験例1と同様な凝集粒子と結晶粒子とを重量混合比1
:10になるように配合してV字型回転混合機で10分
間混合した。得られた混合粒子をアルミナ製ルツボに充
填した後、加熱炉に入れ1゜100℃で240時間加熱
処理して二酸化珪素粉をクリストバライト結晶相に焼結
することにより、ポーラスな結晶粒子を得ることができ
た。次いでこれを実験例1と同様にガラス化したところ
、高品質の石英ガラスか得られた。
Experimental Example 3 The same agglomerated particles and crystal particles as in Experimental Example 1 were mixed at a weight mixing ratio of 1.
:10 and mixed for 10 minutes using a V-shaped rotary mixer. After filling the obtained mixed particles into an alumina crucible, the mixture is placed in a heating furnace and heat-treated at 1° 100°C for 240 hours to sinter the silicon dioxide powder into a cristobalite crystal phase, thereby obtaining porous crystal particles. was completed. When this was then vitrified in the same manner as in Experimental Example 1, high quality quartz glass was obtained.

〔発明の効果〕〔Effect of the invention〕

以上のごとく、本発明に係わるシリカ原料の製造方法に
よると、天然の資源によらず、人手容易な非晶質二酸化
珪素を出発原料としているので、安定したシリカ原料の
供給が可能である。また、本発明の方法によって得られ
たシリカ原料は、天然シリカ原料に比較して高純度のも
のであり、これによって高品質の石英ガラスを製造する
ことかできる。
As described above, according to the method for producing a silica raw material according to the present invention, since amorphous silicon dioxide, which is easy to handle, is used as a starting material without relying on natural resources, a stable supply of a silica raw material is possible. In addition, the silica raw material obtained by the method of the present invention has a higher purity than natural silica raw materials, and as a result, high-quality quartz glass can be manufactured.

さらに、本発明によって得られたシリカ原料は、当然ど
のようなガスラ製造法にも適用できるし、生産効率が高
くコストが安価で済む利点がある。
Furthermore, the silica raw material obtained by the present invention can of course be applied to any gas sulfur production method, and has the advantage of high production efficiency and low cost.

これは、高純度の非晶質二酸化珪素を利用し、所望の粒
径で、しかもクリストバライト結晶t11の粉体である
ためである。
This is because highly pure amorphous silicon dioxide is used, the particle size is desired, and the powder is cristobalite crystal t11.

Claims (1)

【特許請求の範囲】 1、非晶質二酸化珪素の微粒子を凝集粒子に造粒したも
のをクリストバライト結晶粒子と混合した後、加熱して
粒子状のクリストバライト結晶相に焼結せしめることを
特徴とするシリカ原料の製造方法。 2、非晶質二酸化珪素の凝集粒子が粒径30μm〜50
0μmに造粒することを特徴とする請求項1記載のシリ
カ原料の製造方法。 3、非晶質二酸化珪素の凝集粒子とクリストバライト結
晶粒子との重量混合比が、20:1〜1:10になるよ
うに混合することを特徴とする請求項1記載のシリカ原
料の製造方法。 4、非晶質二酸化珪素の凝集粒子と、クリストバライト
結晶粒子との混合粒子を1,100℃以上に加熱して焼
結、結晶化せしめることを特徴とする請求項1記載のシ
リカ原料の製造方法。
[Claims] 1. The method is characterized in that fine particles of amorphous silicon dioxide are granulated into agglomerated particles, mixed with cristobalite crystal particles, and then heated to sinter into a particulate cristobalite crystal phase. A method for producing silica raw materials. 2. Agglomerated particles of amorphous silicon dioxide have a particle size of 30 μm to 50 μm.
The method for producing a silica raw material according to claim 1, characterized in that the silica raw material is granulated to a size of 0 μm. 3. The method for producing a silica raw material according to claim 1, wherein the amorphous silicon dioxide aggregate particles and cristobalite crystal particles are mixed in a weight mixing ratio of 20:1 to 1:10. 4. The method for producing a silica raw material according to claim 1, characterized in that mixed particles of aggregated particles of amorphous silicon dioxide and crystalline cristobalite particles are heated to 1,100° C. or higher to sinter and crystallize them. .
JP14327289A 1989-06-06 1989-06-06 Production of silica feedstock Pending JPH038708A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14327289A JPH038708A (en) 1989-06-06 1989-06-06 Production of silica feedstock

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14327289A JPH038708A (en) 1989-06-06 1989-06-06 Production of silica feedstock

Publications (1)

Publication Number Publication Date
JPH038708A true JPH038708A (en) 1991-01-16

Family

ID=15334894

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14327289A Pending JPH038708A (en) 1989-06-06 1989-06-06 Production of silica feedstock

Country Status (1)

Country Link
JP (1) JPH038708A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04219310A (en) * 1990-04-10 1992-08-10 Nitto Chem Ind Co Ltd Method for producing non-sintered cristobalite particles
JPH05193926A (en) * 1992-01-24 1993-08-03 Nitto Chem Ind Co Ltd Production of cristobalite

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04219310A (en) * 1990-04-10 1992-08-10 Nitto Chem Ind Co Ltd Method for producing non-sintered cristobalite particles
US5154905A (en) * 1990-04-10 1992-10-13 Nitto Chemical Industry Co., Ltd. Method for producing unsintered cristobalite particles
JPH05193926A (en) * 1992-01-24 1993-08-03 Nitto Chem Ind Co Ltd Production of cristobalite

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