JPH039356A - Photosensitive planographic printing plate requiring no dampening water - Google Patents
Photosensitive planographic printing plate requiring no dampening waterInfo
- Publication number
- JPH039356A JPH039356A JP14462989A JP14462989A JPH039356A JP H039356 A JPH039356 A JP H039356A JP 14462989 A JP14462989 A JP 14462989A JP 14462989 A JP14462989 A JP 14462989A JP H039356 A JPH039356 A JP H039356A
- Authority
- JP
- Japan
- Prior art keywords
- diazo
- resin
- printing plate
- silicone rubber
- developer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims description 37
- 229920005989 resin Polymers 0.000 claims abstract description 51
- 239000011347 resin Substances 0.000 claims abstract description 51
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 claims abstract description 30
- 239000011230 binding agent Substances 0.000 claims abstract description 13
- 230000002940 repellent Effects 0.000 claims description 4
- 239000005871 repellent Substances 0.000 claims description 4
- 239000000203 mixture Substances 0.000 abstract description 18
- 239000000463 material Substances 0.000 abstract description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract description 8
- 239000000178 monomer Substances 0.000 abstract description 5
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 abstract description 4
- 229920002379 silicone rubber Polymers 0.000 description 38
- 239000004945 silicone rubber Substances 0.000 description 38
- -1 0-1m+ Chemical compound 0.000 description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 16
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- 239000002244 precipitate Substances 0.000 description 9
- 239000000243 solution Substances 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 239000002253 acid Substances 0.000 description 7
- 239000000975 dye Substances 0.000 description 7
- 239000006087 Silane Coupling Agent Substances 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 125000000217 alkyl group Chemical group 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 6
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 5
- 239000003945 anionic surfactant Substances 0.000 description 5
- 229920001971 elastomer Polymers 0.000 description 5
- 229920001296 polysiloxane Polymers 0.000 description 5
- 239000005060 rubber Substances 0.000 description 5
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical group CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 4
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 235000014113 dietary fatty acids Nutrition 0.000 description 4
- 239000000194 fatty acid Substances 0.000 description 4
- 229930195729 fatty acid Natural products 0.000 description 4
- 229920003986 novolac Polymers 0.000 description 4
- 239000000123 paper Substances 0.000 description 4
- 229920006122 polyamide resin Polymers 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 235000013405 beer Nutrition 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 229920005749 polyurethane resin Polymers 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 159000000000 sodium salts Chemical class 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 150000003871 sulfonates Chemical class 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- 239000011701 zinc Substances 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
- CNPVJWYWYZMPDS-UHFFFAOYSA-N 2-methyldecane Chemical compound CCCCCCCCC(C)C CNPVJWYWYZMPDS-UHFFFAOYSA-N 0.000 description 2
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N 4-hydroxybenzoic acid Chemical compound OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- AMIMRNSIRUDHCM-UHFFFAOYSA-N Isopropylaldehyde Chemical compound CC(C)C=O AMIMRNSIRUDHCM-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- JKRZOJADNVOXPM-UHFFFAOYSA-N Oxalic acid dibutyl ester Chemical compound CCCCOC(=O)C(=O)OCCCC JKRZOJADNVOXPM-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 150000001299 aldehydes Chemical class 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- SESFRYSPDFLNCH-UHFFFAOYSA-N benzyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OCC1=CC=CC=C1 SESFRYSPDFLNCH-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003093 cationic surfactant Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- AOGQPLXWSUTHQB-UHFFFAOYSA-N hexyl acetate Chemical compound CCCCCCOC(C)=O AOGQPLXWSUTHQB-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000003350 kerosene Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000025 natural resin Substances 0.000 description 2
- 239000002736 nonionic surfactant Substances 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 235000019795 sodium metasilicate Nutrition 0.000 description 2
- PNGLEYLFMHGIQO-UHFFFAOYSA-M sodium;3-(n-ethyl-3-methoxyanilino)-2-hydroxypropane-1-sulfonate;dihydrate Chemical compound O.O.[Na+].[O-]S(=O)(=O)CC(O)CN(CC)C1=CC=CC(OC)=C1 PNGLEYLFMHGIQO-UHFFFAOYSA-M 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- 239000011592 zinc chloride Substances 0.000 description 2
- 235000005074 zinc chloride Nutrition 0.000 description 2
- PJMXUSNWBKGQEZ-UHFFFAOYSA-N (4-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(O)C=C1 PJMXUSNWBKGQEZ-UHFFFAOYSA-N 0.000 description 1
- VPGSXIKVUASQIY-UHFFFAOYSA-N 1,2-dibutylnaphthalene Chemical compound C1=CC=CC2=C(CCCC)C(CCCC)=CC=C21 VPGSXIKVUASQIY-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CUOSYYRDANYHTL-UHFFFAOYSA-N 1,4-dioctoxy-1,4-dioxobutane-2-sulfonic acid;sodium Chemical compound [Na].CCCCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCCCC CUOSYYRDANYHTL-UHFFFAOYSA-N 0.000 description 1
- GDXHBFHOEYVPED-UHFFFAOYSA-N 1-(2-butoxyethoxy)butane Chemical compound CCCCOCCOCCCC GDXHBFHOEYVPED-UHFFFAOYSA-N 0.000 description 1
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 1
- RSZXXBTXZJGELH-UHFFFAOYSA-N 2,3,4-tri(propan-2-yl)naphthalene-1-sulfonic acid Chemical compound C1=CC=CC2=C(C(C)C)C(C(C)C)=C(C(C)C)C(S(O)(=O)=O)=C21 RSZXXBTXZJGELH-UHFFFAOYSA-N 0.000 description 1
- IRLYGRLEBKCYPY-UHFFFAOYSA-N 2,5-dimethylbenzenesulfonic acid Chemical compound CC1=CC=C(C)C(S(O)(=O)=O)=C1 IRLYGRLEBKCYPY-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical class CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004254 Ammonium phosphate Substances 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 101100012572 Caenorhabditis elegans fat-2 gene Proteins 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229920000623 Cellulose acetate phthalate Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- KLHYPYAETJWSBK-UHFFFAOYSA-J Cl[Zn](Cl)(Cl)Cl Chemical compound Cl[Zn](Cl)(Cl)Cl KLHYPYAETJWSBK-UHFFFAOYSA-J 0.000 description 1
- IEPRKVQEAMIZSS-UHFFFAOYSA-N Di-Et ester-Fumaric acid Natural products CCOC(=O)C=CC(=O)OCC IEPRKVQEAMIZSS-UHFFFAOYSA-N 0.000 description 1
- IEPRKVQEAMIZSS-WAYWQWQTSA-N Diethyl maleate Chemical compound CCOC(=O)\C=C/C(=O)OCC IEPRKVQEAMIZSS-WAYWQWQTSA-N 0.000 description 1
- DKMROQRQHGEIOW-UHFFFAOYSA-N Diethyl succinate Chemical compound CCOC(=O)CCC(=O)OCC DKMROQRQHGEIOW-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerol Natural products OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
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- 229910052796 boron Inorganic materials 0.000 description 1
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- 239000011575 calcium Substances 0.000 description 1
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- 239000010941 cobalt Substances 0.000 description 1
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- 238000009833 condensation Methods 0.000 description 1
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- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
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- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
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- 150000002430 hydrocarbons Chemical class 0.000 description 1
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- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JJWLVOIRVHMVIS-UHFFFAOYSA-N isopropylamine Chemical compound CC(C)N JJWLVOIRVHMVIS-UHFFFAOYSA-N 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
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- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
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- POVITWJTUUJBNK-UHFFFAOYSA-N n-(4-hydroxyphenyl)prop-2-enamide Chemical compound OC1=CC=C(NC(=O)C=C)C=C1 POVITWJTUUJBNK-UHFFFAOYSA-N 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N n-butyric acid methyl ester Natural products CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
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- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 229960005323 phenoxyethanol Drugs 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
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- 239000010452 phosphate Substances 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
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- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
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- 230000005855 radiation Effects 0.000 description 1
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- 238000007788 roughening Methods 0.000 description 1
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- 230000035807 sensation Effects 0.000 description 1
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- FGDMJJQHQDFUCP-UHFFFAOYSA-M sodium;2-propan-2-ylnaphthalene-1-sulfonate Chemical compound [Na+].C1=CC=CC2=C(S([O-])(=O)=O)C(C(C)C)=CC=C21 FGDMJJQHQDFUCP-UHFFFAOYSA-M 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
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- 239000011593 sulfur Substances 0.000 description 1
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- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- SOBHUZYZLFQYFK-UHFFFAOYSA-K trisodium;hydroxy-[[phosphonatomethyl(phosphonomethyl)amino]methyl]phosphinate Chemical compound [Na+].[Na+].[Na+].OP(O)(=O)CN(CP(O)([O-])=O)CP([O-])([O-])=O SOBHUZYZLFQYFK-UHFFFAOYSA-K 0.000 description 1
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
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Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、湿し水不要の感光性平版印刷版に関し、詳し
くは保存性の優れた湿し水不要の平版印刷版材料が得ら
れ、また水系現像液で現像でき、しかも現像ラチチュー
ドが広がり、網点再現性の良好な印刷版が得られる湿し
水不要の感光性平版印刷版に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a photosensitive lithographic printing plate that does not require dampening water, and more specifically, a lithographic printing plate material that does not require dampening water and has excellent preservability can be obtained. The present invention also relates to a photosensitive lithographic printing plate that can be developed with an aqueous developer, has a wide development latitude, and does not require dampening water, and can provide a printing plate with good halftone dot reproducibility.
[発明の背景]
従来、湿し水不要の感光性平版印刷版(以下、必要に応
じ「版材料」という)としては、支持体上に順に感光層
及びインキ反撥層を塗設したものが知られている。この
版材料を露光・現像することにより湿し水不要の平版印
刷版(以下、必要に応じ「印刷版」という)を得ること
ができる。[Background of the Invention] Conventionally, photosensitive lithographic printing plates (hereinafter referred to as "plate materials" as necessary) that do not require dampening water have been known to have a photosensitive layer and an ink repellent layer coated on a support in this order. It is being By exposing and developing this plate material, a lithographic printing plate that does not require dampening water (hereinafter referred to as "printing plate" as necessary) can be obtained.
このよな版材料は、例えば特公昭55−22781号に
記載されている如く、感光層を現像液を用いて未露光部
(画像部)を溶解し、それに伴なって上層のシリコーン
ゴム層が除去されるものと特公昭54−26923号に
記載されている如く、露光部(非画像部)を光接着によ
って感光層と強固に接着させ、未露光部(画像部)のシ
リコーンゴム層のみを膨潤させる有t’am剤によって
除去させるものとがある。As described in Japanese Patent Publication No. 55-22781, for example, such plate materials are made by dissolving the unexposed areas (image areas) of the photosensitive layer using a developer, and thereby dissolving the upper silicone rubber layer. As described in Japanese Patent Publication No. 54-26923, the exposed area (non-image area) is firmly adhered to the photosensitive layer by photoadhesion, and only the silicone rubber layer in the unexposed area (image area) is removed. Some are removed by swelling agents.
このうち、前者の感光層を溶出させるものは、未露光部
(画像部)の感光層を溶解させ、その上のシリコーンゴ
ム層を強制的に除去して画像を形成するものであるから
、露光部(非画像部)の感光層とその上のシリコーンゴ
ム層との接着力が十分でなければ、現像時にその一部が
はがれ、安定した画像が形成さねない、したがって、通
常この技術においては、シランカップリング剤を感光層
やシリコーンゴム層に添加して感光層とシリコーンゴム
層との接着力を強化することが行われている。Of these, the former, which dissolves the photosensitive layer, dissolves the photosensitive layer in the unexposed area (image area) and forcibly removes the silicone rubber layer above it to form an image. If the adhesive strength between the photosensitive layer in the area (non-image area) and the silicone rubber layer thereon is not sufficient, part of it may peel off during development and a stable image may not be formed. , a silane coupling agent is added to a photosensitive layer or a silicone rubber layer to strengthen the adhesive force between the photosensitive layer and the silicone rubber layer.
しかしながら、シランカップリング剤を添加することに
よっである程度接着力は改善するものの、網点再現性の
良好な印刷版を得るには子方ではないばかりか現像ラチ
チュードの広がりも今一つという問題がある。However, although the adhesion can be improved to some extent by adding a silane coupling agent, it is not enough to obtain a printing plate with good halftone reproducibility, and the development latitude is not wide enough. .
また後者の未露光部(画像部)のシリコーンゴム層のみ
を除去さゼるものにおいては、シリコーンゴム層を膨潤
させる有機溶剤を主体とする現像液、例えば灯油やアイ
ソパーGのような炭化水素溶媒でしか現像することがで
きないので、作業環境ないし公害上の問題を有している
。In addition, in the latter case where only the silicone rubber layer in the unexposed area (image area) is removed, a developer mainly containing an organic solvent that swells the silicone rubber layer, such as a hydrocarbon solvent such as kerosene or Isopar G, is used. Since the process can only be developed using 100% polyurethane, it poses a problem in terms of working environment and pollution.
そこで、本発明者等は、前記の問題点を改良すべく鋭意
研究を続けた結果、感光層におけるバインダー樹脂どジ
アゾ樹脂との比率を特定の重量比とすることにより、露
光部の感光層とシリコーンゴム層との接着力を強化する
ことができ、その結果、水を主体とした水系現像液にて
網点再現性の良好な印刷版を得ることできることを見出
し、本発明を完成するに至った。Therefore, the present inventors continued intensive research in order to improve the above-mentioned problems, and as a result, by setting the ratio of the binder resin and diazo resin in the photosensitive layer to a specific weight ratio, the photosensitive layer in the exposed area They discovered that it is possible to strengthen the adhesive force with the silicone rubber layer, and as a result, it is possible to obtain a printing plate with good halftone reproducibility using an aqueous developer containing mainly water, and have completed the present invention. Ta.
[発明の目的]
したがって、本発明の目的は、保存性の優れた湿し水不
要の感光性平版印刷版が得られ、また水系現像液で現像
で鮒、しかも現像ラヂチュ−1−が広がり、網点再現性
の良好な印刷版が得られる湿し水不要の感光性平版印刷
版を提供することにある。[Object of the Invention] Therefore, the object of the present invention is to obtain a photosensitive lithographic printing plate which has excellent storage stability and does not require dampening water, and which can be developed with an aqueous developer, and furthermore, the development radiation range 1-1 can be expanded. An object of the present invention is to provide a photosensitive lithographic printing plate that does not require dampening water and can provide a printing plate with good halftone dot reproducibility.
[発明の構成]
本発明の前記目的は、支持体上に、順に感光層、インキ
反撥層を有する湿し水不要の感光性平版印刷版において
、該感光層がバインダー樹脂どジアゾ樹脂を含有し、か
つこれらのバインダー樹脂どジアゾ樹脂との重量比が5
0 + 50〜1o:90であることを特徴とする湿し
水不要の感光性平版印刷版によって達成された。[Structure of the Invention] The object of the present invention is to provide a photosensitive lithographic printing plate that does not require dampening water and has a photosensitive layer and an ink repellent layer on a support in that order, wherein the photosensitive layer contains a binder resin or a diazo resin. , and the weight ratio of these binder resins to the diazo resin is 5
This was achieved using a photosensitive lithographic printing plate that does not require dampening water and is characterized by a ratio of 0+50 to 1o:90.
以下、本発明を更に具体的に′説明する。The present invention will be explained in more detail below.
本発明に用いられるジアゾ樹脂は、種々のものを含むが
、好ましくは、p−ジアゾジフェニルアミンとホルムア
ルデヒドとの縮合物で代表されるジアゾ樹脂であって、
水不溶性で有m溶媒可溶性のもので、好ましくは特公昭
47−1167号及び同57−4:3890号公報等に
記載されているような水不溶性かつ通常の有機溶媒可溶
性のものが使用される。特に好ましくは下記の一般式[
I]で示されるジアゾ樹脂である。The diazo resin used in the present invention includes various types, but is preferably a diazo resin typified by a condensate of p-diazodiphenylamine and formaldehyde,
Water-insoluble and solvent-soluble, preferably water-insoluble and ordinary organic solvent-soluble as described in Japanese Patent Publication No. 47-1167 and Japanese Patent Publication No. 57-4:3890, etc. . Particularly preferably, the following general formula [
It is a diazo resin represented by I].
一般式[I]
[式中、RI R2およびR3は、水素原子、アルキ
ル基又はアルコキシ基を示し、R4は水素原子、アルキ
ル基又はフェニル基を示す。General Formula [I] [In the formula, RI R2 and R3 represent a hydrogen atom, an alkyl group, or an alkoxy group, and R4 represents a hydrogen atom, an alkyl group, or a phenyl group.
XはPF8又は BF4を示し、Yは−NH−5−又は
−0−を示す。〕
本発明に用いられるジアゾ樹脂におCプるジアゾモノマ
ーとしては、例えば、4−ジアゾ−ジフェニルアミン、
1−ジアゾ−4−N、N−ジメチルアミノベンゼン、l
−ジアゾ−4−N、N−ジエチルアミノベンゼン、1−
ジアゾ−4−N−エチル−N−ヒドロキシエチルアミノ
ベンゼン、1〜・ジアゾ−4−N−メチル−N−ヒドロ
キシエチルアミノベンゼン、1−ジアゾ−2,5−ジエ
トギシー4−ベンゾイルアミノベンゼン、1−ジアゾ−
4−N〜・ベンジルアミノベンゼン、1−ジアゾ−4−
N、N−ジメチルアミノベンゼン、1−ジアゾ−4−−
Eルホリノベンゼン、l−ジアゾ・−2,5−ジメトキ
シ−4−p−トリルメルカプトベンゼン、l−ジアゾ−
2−エトキシ−4−N、N−ジメチルアミノベンゼン、
p−ジアゾージメヂルアニルン、1−ジアゾ−2,5−
ジブトキシ−4−モルホリノベンゼン、1−ジアゾ−2
,5−チエ1〜キシー4−
ジメトキシ−4−モルホリノベンゼン、1−ジアゾ−2
,5−ジェトキシ−4−p− トリルメルカプ]ベンゼ
ン、1−ジアゾ−4−N−エチル−N−ヒトロキシエヂ
ルアミノベンゼン“、1−ジアゾ−3−エトキシ−4−
N−メチル−N−ベンジルアミノベンゼン、l−ジアゾ
−3−クロロ〜4− N、N−ジエチルアミノベンゼン
、1−ジアゾ−3−メチル−4−ピロリジノベンゼン、
l−ジアゾ−2−クロロ−4−N、N−ジメチルアミノ
−5−メトキシベンゼン、1−ジアゾ−3−メ]・キシ
−4−ピロリジノベンゼン、3−メトキシ−4−ジアゾ
ジフェニルアミン、3−工トキシ−4−ジアゾジフェニ
ルアミン、3−(n−プロポキシ)−4−ジアゾジフェ
ニルアミン、3−(イソプロポキシ)−4−ジアゾジフ
ェニルアミン等が挙げられる。X represents PF8 or BF4, and Y represents -NH-5- or -0-. ] Examples of the diazo monomer added to the diazo resin used in the present invention include 4-diazo-diphenylamine,
1-diazo-4-N,N-dimethylaminobenzene, l
-Diazo-4-N,N-diethylaminobenzene, 1-
Diazo-4-N-ethyl-N-hydroxyethylaminobenzene, 1-diazo-4-N-methyl-N-hydroxyethylaminobenzene, 1-diazo-2,5-diethoxy-4-benzoylaminobenzene, 1- Diazo
4-N-benzylaminobenzene, 1-diazo-4-
N,N-dimethylaminobenzene, 1-diazo-4--
E-ruphorinobenzene, l-diazo-2,5-dimethoxy-4-p-tolylmercaptobenzene, l-diazo-
2-ethoxy-4-N,N-dimethylaminobenzene,
p-Diazodimedylaniline, 1-diazo-2,5-
Dibutoxy-4-morpholinobenzene, 1-diazo-2
,5-thie1-xy4-dimethoxy-4-morpholinobenzene,1-diazo-2
,5-jethoxy-4-p-tolylmercap]benzene, 1-diazo-4-N-ethyl-N-hydroxyedylaminobenzene, 1-diazo-3-ethoxy-4-
N-methyl-N-benzylaminobenzene, l-diazo-3-chloro-4-N,N-diethylaminobenzene, 1-diazo-3-methyl-4-pyrrolidinobenzene,
l-Diazo-2-chloro-4-N, N-dimethylamino-5-methoxybenzene, 1-diazo-3-me]xy-4-pyrrolidinobenzene, 3-methoxy-4-diazodiphenylamine, 3- Examples include hydroxy-4-diazodiphenylamine, 3-(n-propoxy)-4-diazodiphenylamine, and 3-(isopropoxy)-4-diazodiphenylamine.
前記ジアゾモノマーとの縮合剤として用いられるアルデ
ヒドとしては、例えば、ホルムアルデヒド、アセトアル
デヒド、プロピオンアルデヒド、ブチルアルデヒド、イ
ソブチルアルデヒド、またはベンズアルデヒド等が挙げ
られる。Examples of the aldehyde used as a condensing agent with the diazo monomer include formaldehyde, acetaldehyde, propionaldehyde, butyraldehyde, isobutyraldehyde, and benzaldehyde.
更に陰イオンとしては、塩素イオンやテトラクロロ亜鉛
酸等を用いることにより水溶性のジアゾ樹脂を得ること
ができ、また四フッ化ホウ素、六フフ化燐酸、トリイソ
プロピルナフタレンスルホン酸、4.4゛−ビフェニル
ジスルホン酸、2.5−ジメチルベンゼンスルホン酸、
2−二1ヘロベンゼンスルホン酸、2−メトキシ−4−
1ニトロキシ−5−ベンゾイル−ペンセンスルホン酸等
を用いることにより、有機溶剤可溶性のジアゾ樹脂を得
ることができる。特に好ましくは、六フッ化燐酸からな
るジアゾ樹脂が用いられる。Furthermore, water-soluble diazo resins can be obtained by using chloride ions, tetrachlorozinc acid, etc. as anions, and boron tetrafluoride, hexafluorophosphoric acid, triisopropylnaphthalenesulfonic acid, 4.4゛-biphenyldisulfonic acid, 2,5-dimethylbenzenesulfonic acid,
2-21herobenzenesulfonic acid, 2-methoxy-4-
By using 1-nitroxy-5-benzoyl-pensene sulfonic acid or the like, an organic solvent-soluble diazo resin can be obtained. Particularly preferably, a diazo resin made of hexafluorophosphoric acid is used.
ジアゾ樹脂は皮膜形成性樹脂、特に水酸基を1−1゛す
る高分子化合物と混合して使用するのが好ましい。特に
好ましくは、高分子化合物としては、側釦に脂肪族水酸
基を有する千ツマ−1例えば2−ヒドロキシエチルアク
リレート又は2−ヒドロキシエチルアクリレートと他の
共重合し得る千ツマ−との共重合体が挙げられる。The diazo resin is preferably used in combination with a film-forming resin, particularly a polymer compound having 1 to 1 hydroxyl groups. Particularly preferably, the polymer compound is a copolymer having an aliphatic hydroxyl group on the side button, such as 2-hydroxyethyl acrylate or a copolymer of 2-hydroxyethyl acrylate and another copolymerizable copolymer. Can be mentioned.
これら以外にも、必要に応じてポリビニルブチラール樹
脂、ポリウレタン樹脂、ポリアミド樹脂、エポキシ樹脂
、ノボラック樹脂、天然樹脂等を添加してもよい。In addition to these, polyvinyl butyral resins, polyurethane resins, polyamide resins, epoxy resins, novolak resins, natural resins, etc. may be added as necessary.
この他ジアゾニウム塩と併用される結合剤としては種々
の高分子化合物が使用され得るが、好ましくは特開昭5
4−98613号公報に記載されているような芳香族性
水酸基を有する単量体、例えばN−(4−ヒドロキシフ
ェニル)アクリルアミド、N−(4−ヒドロキシフェニ
ル)メタクリルアミド、o+、m+、またはp−ヒドロ
キシスチレン、0−1m+、またはP−ヒドロキシフェ
ニルメタクリlノート等と他の単量体との共重合体、米
国特許第4,123.27B号明細書に記載されている
ようなヒドロキシエチルアクリレート単位またはヒドロ
キシエチルメタクリレート単位を主なる繰り返し単位と
して含むポリマー等が挙げられる。In addition, various polymer compounds can be used as the binder used in combination with the diazonium salt, but preferably,
A monomer having an aromatic hydroxyl group as described in Japanese Patent No. 4-98613, such as N-(4-hydroxyphenyl)acrylamide, N-(4-hydroxyphenyl)methacrylamide, o+, m+, or p - copolymers of hydroxystyrene, 0-1m+, or P-hydroxyphenyl methacrylate with other monomers, hydroxyethyl acrylate as described in U.S. Pat. No. 4,123.27B. Examples include polymers containing hydroxyethyl methacrylate units or hydroxyethyl methacrylate units as main repeating units.
これら以外にも、必要に応じてポリビニルブチラール樹
脂、ポリウレタン樹脂、ポリアミド樹脂、エポキシ樹脂
、ノボラック樹脂、シェラツク、ロジン等の天然樹脂、
ポリビニルアルコール、米国特許第3,751.257
号明細書に記載されているポリアミド樹脂、米国特許第
3.660.097号明細書に記載されている線状ポリ
ウレタン樹脂、ポリビニルアルコールのフタレート化樹
脂、ビスフェノールAとエピクロルヒドリンから縮合さ
れたエポキシ樹脂、酢酸セルロース、セルロースアセテ
ートフタレート等のセルロース類が含有される。In addition to these, natural resins such as polyvinyl butyral resin, polyurethane resin, polyamide resin, epoxy resin, novolac resin, shellac, rosin, etc.
Polyvinyl alcohol, U.S. Patent No. 3,751.257
Polyamide resins described in US Pat. No. 3,660,097, linear polyurethane resins, phthalated polyvinyl alcohol resins, epoxy resins condensed from bisphenol A and epichlorohydrin, Contains celluloses such as cellulose acetate and cellulose acetate phthalate.
アルカリ可溶性樹脂としては、ノボラック樹脂、フェノ
ール性水酸基を有するビニル系重合体、特開昭55−5
7841号公報に記載されている多価フェノールとアル
デヒド又はケトンとの縮合樹脂等が挙げられる。ノボラ
ック樹脂としては、例えばフェノール・ホルムアルデヒ
ド樹脂、クレゾール・ホルムアルデヒド樹脂、特開昭5
5−57841号公報に記載されているようなフェノー
ル・クレゾール・ホルムアルデヒド共重縮合樹脂、特開
昭55−127553号公報に記載されているよりなp
−・置換フェノールとフェノールもしくは、クレゾール
とホルムアルデヒドとの共重縮合樹脂等が挙げられる。Examples of the alkali-soluble resin include novolac resin, vinyl polymer having a phenolic hydroxyl group, and JP-A-55-5
Examples include condensation resins of polyhydric phenols and aldehydes or ketones described in Japanese Patent No. 7841. Examples of novolac resins include phenol/formaldehyde resin, cresol/formaldehyde resin, and JP-A-5
Phenol-cresol-formaldehyde copolycondensation resin as described in Japanese Patent Application Laid-Open No. 55-127553,
Examples include copolycondensation resins of substituted phenol and phenol or cresol and formaldehyde.
本発明に用いられるジアゾ樹脂は、バインダー樹脂と混
合して用いられるが、このバインダー樹Li5とジアン
261月ト1とのj:lS袢7は重量て50 : 50
” 10:90が好まR7、い。バインダ・−樹脂が
10未沼のどきは、バインダー樹脂を添加する利、味が
ないばかりか保存性か悪く、水系現像液による現像が不
十分である。また50を越えるときは、網点再現性か悪
くなる。更にジアゾ樹脂が50未満のときは、網点再現
性が悪くなり、90を赳λるときは、保存性が悪くなる
。The diazo resin used in the present invention is used in a mixture with a binder resin, and the ratio of the binder resin Li5 to the binder resin 7 is 50:50 by weight.
``10:90 is preferable R7.Binder-resin is 10 Minuma Nodoki, which does not have the benefit of adding a binder resin, has no taste, has poor storage stability, and is insufficiently developed with an aqueous developer. When the diazo resin exceeds 50, the halftone dot reproducibility deteriorates.Furthermore, when the diazo resin is less than 50, the halftone reproducibility deteriorates, and when it exceeds 90, the storage stability deteriorates.
バインダー樹月旨とジアソ゛和j月旨との6計の、感〜
汽層の固形分中に占める割合は、好まし・くは80重二
%〜・・1C)01景%であり、更にp了ましくは90
重重量へ−99,5重量%である。A total of 6 sensations with the binder Jugetsuji and the diaso Japanese moonji ~
The proportion of the solid content of the steam layer is preferably 80% to 1C)01%, and more preferably 90% to 1%.
-99.5% by weight to weight.
これらの感光性組成物に゛(」、その他の染着、顔料等
の色素、感脂化剤、可塑剤、清面活性剤などを添加する
ことができる。こわらの添加剤の添加量どしては、感光
層の固形分中に0.1重量%〜2゜0重1%、好オしく
は0.5本玉%〜・10重量%の軌]囲で用いられる。To these photosensitive compositions, other dyes, dyes such as pigments, fat-sensitizing agents, plasticizers, surfactants, etc. can be added. It is used in an amount of 0.1% to 2.0% by weight, preferably 0.5% to .10% by weight, in the solid content of the photosensitive layer.
本発明に用いられるインキ反撥層としては、主と1ノで
シリコーンゴム層が用いられるが、倫・弗素21脂層を
用いることもできる。好ましいシリコーンゴムとしでは
、次のような一般式[1]で示される膀り返し単位をイ
」−する分子量数年・−哉子方〇−)主鎖中または主鎖
の末端に水酸基を+j゛する線状有機ポリシクロキサン
を主成分とするものが好ましい。As the ink repellent layer used in the present invention, a silicone rubber layer is mainly used, but a Lun-Fluorine 21 oil layer can also be used. A preferred silicone rubber has a repeating unit represented by the following general formula [1] with a molecular weight of several years and a hydroxyl group in the main chain or at the end of the main chain. Preferably, the main component is a linear organic polycycloxane.
般式[1]
%式%
ここでnは2以上の整数、Rは炭素数1.=10のアル
キル基、ハロゲン化アルキル基、アルコギシル基、ビニ
ル基、アリール基、シラノール基(011基) であり
、Rの[i0%以上がメチルシ(である・t)のが好ま
しい6なお上記シラノール基(O11基)は主鎖中また
は主鎖の末端のどちらにあってもよいが、末端にあるこ
とが9丁ましい。General formula [1] %Formula% Here, n is an integer of 2 or more, and R is a carbon number of 1. = 10 alkyl group, halogenated alkyl group, alkoxyl group, vinyl group, aryl group, silanol group (011 group), and it is preferable that R [i0% or more is methylcy(t) 6 Note that the above silanol The group (O11 group) may be located either in the main chain or at the end of the main chain, but is preferably located at the end.
本発明に用いられるシランカップリング剤(またはシリ
コ−〉・架橋剤)としては、
Rn5iX、n
(式中、nは1〜3の整数であり、Rはアルギル、アリ
ール、アルケニルまたはこれらの組合された一価の基を
表し、またこれらの基はハロゲン、アミン、ヒドロキシ
、アルコキシ、アリーロキシ、ヂオール筑の官能基を有
していてもよい。The silane coupling agent (or silico crosslinking agent) used in the present invention is Rn5iX,n (wherein, n is an integer of 1 to 3, and R is argyl, aryl, alkenyl, or a combination thereof. In addition, these groups may have a functional group such as halogen, amine, hydroxy, alkoxy, aryloxy, or diol.
2
Xは−01−1、−OR’、−0A c、−o−N−c
り、 −cp、−Br、−In2
等の置換基を表す。ここ千R2、R3は上記のRと同じ
ものを表し、R2、R3はそれぞれ同じであっても異・
)ていてもよい、、またAcはアセチル基を表1°。)
で示されるシラン化合物である。2 X is -01-1, -OR', -0A c, -o-N-c
represents a substituent such as -cp, -Br, -In2, etc. Here, R2 and R3 represent the same thing as R above, and even if R2 and R3 are the same, they are different.
) may also be used, and Ac represents an acetyl group. )
This is a silane compound represented by
本発明においで有用なシリコーンゴムは、この61、う
なシリコ−ヘン・ベースポリマーと、次に挙げるような
シリコーン架橋剤との縮合反応によりて得らねるもので
ある。The silicone rubber useful in the present invention is obtained by the condensation reaction of the silicone base polymer 61 with a silicone crosslinking agent such as those listed below.
(1) R−5t+OR’)s
(2) R−5i+0Ac) s
(3) R−5i(ON−CR’z)sここでRは、一
般式[I〕で示されるポリマーの置換基であるRと同義
であり、R′はメチル基、エヂル基等のアルキル基であ
り、ACはアセ)゛−ル基である。(1) R-5t+OR')s (2) R-5i+0Ac)s (3) R-5i(ON-CR'z)s where R is a substituent of the polymer represented by general formula [I] It has the same meaning as R, R' is an alkyl group such as a methyl group or an ethyl group, and AC is an acetyl group.
本発明に用いらi]るシランカップリング剤の具体例と
しては、
HN[(CH2)3Si(OMe)、]R2、ビニルト
・リエトキジシラン、Cj? (C)12)3Sj (
OMe) 3、CH,5i(0八C)3、R5(CL)
ssI (OMe) 3、ビニルトヘリス(メヂルエ
ヂルケトオキシム)シラン笠が挙げられる。Specific examples of the silane coupling agent used in the present invention include HN[(CH2)3Si(OMe), ]R2, vinylto-rithoxydisilane, Cj? (C)12)3Sj (
OMe) 3, CH, 5i (08C) 3, R5 (CL)
Examples include ssI (OMe) 3 and vinyltohelis (medyl edyl ketoxime) silane cap.
前記のシリコーンゴムは市販品としても入手でさ、例え
ば東芝シリコーン社製YE−3085等が非)ろ。まi
=その他のも用なシリコーンゴムCJ、前述の如きべ・
−ス・ポリマーど、次のよう!ン一般式[1!]で示さ
れイl繰1)返I、・即位を有するシリコーンメイルと
の反応、あるいはRの3%程度がビ、″ニル基であるシ
リコーンのベース・ポリマーとの(d加反応、あるいは
該シリ゛1− ンオ、イル同士の反応によっても得るこ
とがでざる3、
般式 [II コ 1]RHl(
(式中、Rは一般式[1]で示されるポリマーの置換基
であるRど同義てあり、IIは2以上の整数、nはOま
たは1以上の整数である。)このような架橋反応によっ
てシリコーンゴムな得るためには、架橋反応を触媒を用
い°[行う、この触媒としては、錫、亜鉛、コバルト、
鉛、カルシウム、マンガン、等の金属の有機カルボン酸
塩、例えばラウリル酸ジブチルスズ、スズ(II)オク
トエ−L・、1フテン酸コハル15等、あるいは塩化金
酸等が用いられイ・。The silicone rubber mentioned above is also available as a commercial product, such as YE-3085 manufactured by Toshiba Silicone Corporation. Mai
= Other suitable silicone rubber CJ, as mentioned above.
-Su polymer, like this! General formula [1! 1) Reaction with a silicone male having an enzymatic structure, or (d-addition reaction, or It cannot be obtained even by the reaction between silicone 1-yl, 3, and the general formula [II Co 1] (II is an integer of 2 or more, n is O or an integer of 1 or more.) In order to obtain silicone rubber by such a crosslinking reaction, the crosslinking reaction is carried out using a catalyst. are tin, zinc, cobalt,
Organic carboxylic acid salts of metals such as lead, calcium, manganese, etc., such as dibutyltin laurate, tin (II) octoate L., cohal 15 phthenate, etc., or chloroauric acid, etc. are used.
またシリコーンゴム・の強度苓・向上さtト、印刷作業
中に生じる摩擦力に耐え乙シリコーンゴムな得るために
は、充填剤(フィラー)を混合することもできる。予め
フィラーの混合さオ]たシリコーンゴムは、シリコ・−
ンゴムス)ツク1あるいはシリコーンゴムディスバーパ
2」シ′と11.て市販さ、1″ITiす、本発明のよ
うにコーチばングによりシリコーンゴム膜を得ることが
女子まし・い場合1′は、RTVあるいはL T Vシ
リコーンゴムのノ゛イスバージョンが好んで用いらねる
。、i−の、)−うな例と1ノ丁は、トー 1ノシリコ
一ン社f:A、syl Off 23.5RX−ン57
.5ti237等のベーパーコーティング用シリコーン
ゴムディスバージョンがある。In order to improve the strength of the silicone rubber and to make the silicone rubber resistant to the frictional forces generated during printing operations, a filler may be mixed therein. Silicone rubber mixed with filler in advance is silicone rubber.
Rubber rubber) 1 or silicone rubber dispersion 2' If it is not desirable to obtain a silicone rubber film by a coach band as in the present invention, a noise version of RTV or LTV silicone rubber is preferably used. I need., i-,)-una example and 1 no cho are tone 1 no silicon company f: A, syl Off 23.5RX-on 57
.. There are silicone rubber dispersions for vapor coating such as 5ti237.
本発明においては、綜合架橋タイプのシリコーンゴムを
用いることが好ましい。In the present invention, it is preferable to use a synthetically crosslinked silicone rubber.
シリコ・−ンゴム層には、更に接着性を向上さけるため
にアミノ基を有するシランカップリング剤を含有し・て
いることが好ましい。The silicone rubber layer preferably contains a silane coupling agent having an amino group in order to further improve adhesiveness.
好まし、いシランカップリング剤どしては、例えは次の
よ′)なものがある7゜
(a) H2NCH2CH2NH(CH2CH2(OC
H3) 3(b) H2NCE2CH2NH(C1b)
*Si (OCII3) 2 (Cth)(c)IIJ
(CH2)ssi(OEt):i本発明に用いられろシ
リコーンゴム層中には、更じ光増感剤を少見含有させる
ことがでとる。Examples of preferred silane coupling agents include the following:
H3) 3(b) H2NCE2CH2NH(C1b)
*Si (OCII3) 2 (Cth) (c) IIJ
(CH2)ssi(OEt):i The silicone rubber layer used in the present invention may contain a small amount of an additional photosensitizer.
本発明に用いらオ゛【るシリコーンゴム層は、ミ・I)
コーンゴムを適当な溶媒に溶解り、た後、感光層トに塗
布、※乞燥する。The silicone rubber layer used in the present invention is
After dissolving the cone rubber in a suitable solvent, it is applied to the photosensitive layer and dried.
本発明の版材料に用いられる支持体としては、通常の平
版印刷機にヤッ]・で酋るたわみ性と印刷時に加わる荷
重に耐えるものであることが好ましく、例えばアルミニ
ウム、亜鉛、銅、鋼等の金属板、及びクロム、亜鉛、銅
、ニッケル、アルミニウム及び鉄等がメツキまたは蒸着
された金属板、紙、プラスチックフィルム及びガラス板
、樹脂コート・紙、アルミニウム等の金属箔が張られた
紙等が挙げられる。The support used in the plate material of the present invention is preferably one that has the flexibility required by a normal lithographic printing machine and can withstand the load applied during printing, such as aluminum, zinc, copper, steel, etc. metal plates plated or vapor-deposited with chromium, zinc, copper, nickel, aluminum, iron, etc., paper, plastic films and glass plates, resin-coated paper, paper covered with metal foil such as aluminum, etc. can be mentioned.
これらのうち好ましいものは1どルミニウム板である。Preferred among these is monoluminium plate.
上記接着性向上のための支持体自体に対する処理は特に
限定されるものではなく、各種粗面化処理等が含まれる
。The treatment for the support itself to improve the adhesion is not particularly limited, and includes various surface roughening treatments.
また支持体に感光層を被覆する前に、感光層と支持体と
の十分な接着性を得るために、支持体にブライマー層を
設Z、プてもよく、該ブライマー層には例えポリエステ
ル樹脂、塩化ビール・−酢酸ビール共重合体、アクリル
樹脂、塩化ビール樹脂、ポリアミド樹脂、ポリビニルブ
チラール樹脂、エボAシおj脂、アクリレート系共重合
体、酢酸ビニル系共重合体、フェノキシ樹脂、ボリウ1
ノタンオΔ1脂、ポリカーボネート樹脂、ポリアクリロ
ニI−リルブタジエン、ポリ酢酸ビニル等が挙げられる
。In addition, before coating the photosensitive layer on the support, a brimer layer may be provided on the support in order to obtain sufficient adhesion between the photosensitive layer and the support. , beer chloride/beer acetate copolymer, acrylic resin, beer chloride resin, polyamide resin, polyvinyl butyral resin, Evo Ashioj fat, acrylate copolymer, vinyl acetate copolymer, phenoxy resin, Boliu 1
Examples include notanioΔ1 fat, polycarbonate resin, polyacryloni-I-lylbutadiene, polyvinyl acetate, and the like.
また」二記ブライマー層を構成するアソカー剤としては
、例えばシランカップリング*lJ等を用いることがで
き、また有機チタネート等も有効である。Further, as the asocuring agent constituting the brimer layer, for example, silane coupling *lJ, etc. can be used, and organic titanates and the like are also effective.
本発明の版材を構成する各層の厚さは、以丁の通りであ
る。即ち支持体は50−400μm、好ましくは100
□300 μm 、感光層は0.05〜1101I
、好ましくは01〜1.0μm、シリコーンゴム層は0
5〜100μm、好ましくは1 =4μmである4、本
発明において、シリコーンゴム層の上面には必要に応じ
て保i(j層を有し)ていてもよい。The thickness of each layer constituting the plate material of the present invention is as follows. That is, the support has a thickness of 50-400 μm, preferably 100 μm.
□300 μm, photosensitive layer is 0.05-1101I
, preferably 01 to 1.0 μm, and the silicone rubber layer has a thickness of 0
5 to 100 μm, preferably 1 = 4 μm4. In the present invention, the silicone rubber layer may have a layer i (having a layer j) on the upper surface as necessary.
本発明の湿し水不要の版材は、例λは次のようにして製
造される。The plate material of the present invention that does not require dampening water, Example λ, is manufactured as follows.
支持体、1に、リバースロールコータ、エアーナイフコ
ータ、メーヤバーコータ等の通常のコータあるいはホエ
ラーのような回転塗布装置4・用い、感光層を構成すべ
き組成物溶液を塗布乾燥する。A composition solution to form a photosensitive layer is applied to a support 1 using a conventional coater such as a reverse roll coater, an air knife coater, a Meyer bar coater, or a rotary coating device 4 such as a Whaler and is dried.
なお必要に応じて支持体と感光層の間に該感光層と同様
の方法でブライマー層を設番づてた後、上記感光層上に
シリコーンゴム溶液を同様な方法で塗布し、通常100
〜120℃の温度で数分間熱処理して、十分に硬化せし
めてシリコーンゴム層を形成する。必要に応じて該シリ
コーンゴム層上にラミネーターを用いて保護フィルムを
設りることができる。If necessary, after setting and numbering a brimer layer between the support and the photosensitive layer in the same manner as for the photosensitive layer, a silicone rubber solution is applied on the photosensitive layer in the same manner.
Heat treatment at a temperature of ~120°C for several minutes to fully cure and form a silicone rubber layer. If necessary, a protective film can be provided on the silicone rubber layer using a laminator.
次に本発明の湿し水不要の版材料を用いて探し2木不要
の印刷版を製造する方法を説明する。Next, a method for manufacturing a printing plate that does not require two sheets of paper using the plate material that does not require dampening water of the present invention will be described.
原稿であるポジフィルムなポジ型版旧表面に真空密着さ
せ、露光する。この露光用の光源は、紫外線を豊富に発
生する水銀灯、カーボンアーク灯、キセノンランプ、メ
タルハライドランプ、蛍光灯等が用いられる。It is vacuum-adhered to the old surface of the original positive-type plate, which is a positive film, and exposed. As a light source for this exposure, a mercury lamp, a carbon arc lamp, a xenon lamp, a metal halide lamp, a fluorescent lamp, etc., which generate abundant ultraviolet light, are used.
次いでポジフィルムを剥がし、現像液を用いて現像する
。現像液としては湿1ノ水不要の版材の現像液として、
公知のものが利用できるが、好ましくは水系現像液が用
いられる。Next, the positive film is peeled off and developed using a developer. As a developer, it is used as a developer for plate materials that do not require water.
Although any known developer can be used, preferably an aqueous developer is used.
水系現像液とは、水を主成分とする現像液であり、例え
ば特開昭61−275759等公報に記載されているも
ので、水を30重量%以上、好ましくは5031量%〜
98重量%と、有機溶剤、界面活性剤を含む現像液を挙
げることができ、更に好ましくはアルカリ剤を含有する
。The aqueous developer is a developer whose main component is water, such as those described in JP-A No. 61-275759, etc., which contain water in an amount of 30% by weight or more, preferably 5031% by weight or more.
Examples include a developer containing 98% by weight, an organic solvent, and a surfactant, and more preferably an alkali agent.
木を主成分とする現像液に含有する有機溶剤どしては、
例えば脂肪族炭化水素類(ヘキサン、ヘプタン、”アイ
ソパーE、H,G” (エッソ化学社製、脂肪族炭化
水素類の商品名)或はガソリン、灯油等)、芳香族炭化
水素類(トルエン、ギソレン等)、或はハロゲン化炭化
水素類(トリクレン等)に下記の極性溶媒を添加l、・
たものが好適である。Regarding organic solvents contained in developing solutions whose main component is wood,
For example, aliphatic hydrocarbons (hexane, heptane, "Isopar E, H, G" (trade name of aliphatic hydrocarbons manufactured by Esso Chemical Co., Ltd.), gasoline, kerosene, etc.), aromatic hydrocarbons (toluene, Add the following polar solvents to halogenated hydrocarbons (such as trichlene) or halogenated hydrocarbons (such as trichlene).
It is preferable that
アルコール類(メタノール、エタノール、1−ブトキシ
−2−プロパツール、3−メチル−3−メトキシブタノ
ール、ベンジルアルコール等)、エーテル類(メチルセ
ロソルブ、エチルセロソルブ、ブチルセロソルブ、フェ
ニルセロソルブ、メチルカルピトール、エチルカルピト
ール、ブチルカルピトール、ジオキサン、ジエチレング
リコールジブチルエーテル、ジエチレングリコールジブ
チルエーテル、ジエチレングリコールジブチルエーテル
、エチレングリコールジブチルエーテル、プロピ1ノン
グリコール、ジブロビレングリコールブヂルエーテル、
トリプロピレングリコールメチルエーテル、ポリプロピ
レングリコールメチルエーテル等)、ケトン類(アセト
ン、メチルエチルケトン、メチルイソブチルケトン、ジ
イソブチルケトン、4−メチル−1,3−ジオキソラン
−2−オン等)、エステル類(酢酸エチル、酢酸プロピ
ル、酢酸ヘキシル、酪酸メチル、酪酸プロピル、こはく
酸ジエチル、蓚酸ジブチル、マレイン酸ジエチル、安息
香酸ベンジル、メチルセロソルブアセテート、セロソル
ブアセテート、カルピトールアセテート等)等が挙げら
れる。Alcohols (methanol, ethanol, 1-butoxy-2-propatol, 3-methyl-3-methoxybutanol, benzyl alcohol, etc.), ethers (methyl cellosolve, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, methyl carpitol, ethyl carpitol) Toll, butyl carpitol, dioxane, diethylene glycol dibutyl ether, diethylene glycol dibutyl ether, diethylene glycol dibutyl ether, ethylene glycol dibutyl ether, propylene glycol, dibrobylene glycol butyl ether,
tripropylene glycol methyl ether, polypropylene glycol methyl ether, etc.), ketones (acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, 4-methyl-1,3-dioxolan-2-one, etc.), esters (ethyl acetate, acetic acid, etc.) propyl, hexyl acetate, methyl butyrate, propyl butyrate, diethyl succinate, dibutyl oxalate, diethyl maleate, benzyl benzoate, methyl cellosolve acetate, cellosolve acetate, carpitol acetate, etc.).
本発明の現像液に添加きれる界面活性剤としては、アニ
オン界面活性剤、ノニオン界面活性剤、カチオン界面活
性剤及び両性イオン界面活性剤が用いられ、具体的には
以下のものが挙げられる。Examples of the surfactant that can be added to the developer of the present invention include anionic surfactants, nonionic surfactants, cationic surfactants, and amphoteric ionic surfactants, and specifically include the following.
アニオン界面活性剤としては、
(1)高級アルコール硫酸エステル類、(例えばラウリ
ルアルコールサルフェートのナトリウム塩、オクチルア
ルコールサルフェートのアンモニウム塩、ラウリルアル
コールサルフェートのアンモニウム塩、第二ナトリウム
アルキルサルフェート等)
(2)脂肪族アルコールリン酸エステル塩類(例えば、
セチルアルコールリン酸エステルのナトリウム塩等)
(3)アルキルアリールスルホン酸塩類(例えば、ドデ
シルベンゼンスルポン酸ナトリウム塩、イソプロピルナ
フタレンスルホン酸ナトリウム塩、ジナフタレンスルホ
ン酸ナトリウム塩、メタニトロベンゼンスルホン酸ナト
リウム塩等)(4)アルキルアミドスルポン酸塩類
(5)二塩基脂肪族エステルのスルホン酸塩類(例えば
ナトリウムスルホコハク酸ジオクチルエステル、ナF−
リウムスルコハク酸ジヘギシルエスデル等)
(6)アルキルナフタレンスルホン酸塩のホルムアルデ
ヒド縮合物(例えば、ジブチルナフタレンスルホン酸す
l・リウムのホルムアルデヒド縮合物等)が挙げられる
。Examples of anionic surfactants include (1) higher alcohol sulfate esters (e.g. sodium salt of lauryl alcohol sulfate, ammonium salt of octyl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, sulfur sodium alkyl sulfate, etc.) (2) Fat Group alcohol phosphate ester salts (e.g.
(3) Alkylarylsulfonic acid salts (e.g., sodium dodecylbenzenesulfonic acid salt, isopropylnaphthalenesulfonic acid sodium salt, dinaphthalenesulfonic acid sodium salt, metanitrobenzenesulfonic acid sodium salt, etc.) ) (4) Alkylamide sulfonates (5) Sulfonates of dibasic aliphatic esters (e.g. sodium sulfosuccinate dioctyl ester, sodium F-
(6) A formaldehyde condensate of an alkylnaphthalene sulfonate (for example, a formaldehyde condensate of sulfur/lium dibutylnaphthalene sulfonate, etc.).
ノニオン界面活性剤としでは、ポリオキシエチレンアル
キルエーテル、ポリオギシエチレンアルキルフェノール
エーテル、ポリオキシエチレン脂肪酸エステル、ソルビ
タン脂肪酸エステル、ポリオキシエチレンソルビタン脂
肪酸エステル、グリセリン脂肪酸エステル、オキシエチ
レンオキシブロビレンブロックボリマー等が挙げられる
。Examples of nonionic surfactants include polyoxyethylene alkyl ether, polyoxyethylene alkylphenol ether, polyoxyethylene fatty acid ester, sorbitan fatty acid ester, polyoxyethylene sorbitan fatty acid ester, glycerin fatty acid ester, oxyethylene oxybrobylene block polymer, etc. Can be mentioned.
カチオン界面活性剤としては、アルキルアミン塩、第四
級アンモニウム塩、ポリオキシエチレンアルキルアミン
等が挙げられる。Examples of the cationic surfactant include alkylamine salts, quaternary ammonium salts, polyoxyethylene alkylamines, and the like.
両性イオン界面活性剤としては、アルキルベタイン等が
挙げられるが、これらの中でもアニオン界面活性剤が適
している。Examples of amphoteric surfactants include alkyl betaines, and among these, anionic surfactants are suitable.
これらの界面活性剤は、単独でもまたは2種以上を組合
ゼて使用することがで幹る。These surfactants can be used alone or in combination of two or more.
本発明に用いられる界面活性剤の使用fは、0.01重
量%〜60重量%、好ましくは0.1 、IQ量%〜1
0重量%が適当である。The amount f of the surfactant used in the present invention ranges from 0.01% to 60% by weight, preferably from 0.1 to 1% by weight.
0% by weight is suitable.
更に本発明において用いられる界面活性剤は、アルカリ
剤と共に用いることが好ましく、該アルカリ剤としては
、
(1)ケイ酸ナトリウム、ケイ酸カリウム、水酸化カリ
ウム、水酸化ナトリウム、水酸化リヂウム、第二または
第三リン酸ナトリウムまたはアンモニウム塩、メタケイ
酸ナトリウム、炭酸ナトリウム、アンモニア等の無機ア
ルカリ剤、(2)モノ、ジまたはトリメチルアミン、モ
ノ、ジまたはトリエチルアミン、モノまたはジイソプロ
ピルアミン、n−ブチルアミン、モノ、ジまたはトリエ
タノールアミン、モノ、ジまたは)・リイソブロバノー
ルアミン、エチレンイミン、エチレンジイミン等の有機
アミン化合物等が挙げられる。Further, the surfactant used in the present invention is preferably used together with an alkaline agent, and the alkaline agent includes (1) sodium silicate, potassium silicate, potassium hydroxide, sodium hydroxide, lidium hydroxide, or inorganic alkaline agents such as trisodium or ammonium phosphate, sodium metasilicate, sodium carbonate, ammonia, (2) mono, di or trimethylamine, mono, di or triethylamine, mono or diisopropylamine, n-butylamine, mono, Examples include organic amine compounds such as di- or triethanolamine, mono-, di- or )-liisobrobanolamine, ethyleneimine, and ethylenediimine.
アルカリ剤の使用量は、0.05重量%〜20@i%、
好ましくは0.2重量%・−10重量%が適当である。The amount of alkaline agent used is 0.05% by weight to 20@i%,
Preferably, 0.2% by weight to -10% by weight is appropriate.
またクリスタルバイオレット、アストラゾンレット等の
染料を現像液に加えて現像と同時に画像部の染色を行う
こともできる。It is also possible to dye the image area simultaneously with development by adding a dye such as crystal violet or astrazonelet to the developer.
現像は、例えば上記のような現像液を含む現像用パッド
でこすフたり現像液を版面に注いだ後に現像ブラシでこ
する等の方法で行うことができる。Development can be carried out, for example, by rubbing with a developing pad containing a developer as described above, or by pouring a developer onto the printing plate and then rubbing with a developing brush.
上記現像により、未露光部の感光層及びシリコーンゴム
が除去された印刷版、あるいはシリコーンゴム層が除去
され、感光層が露出し、露光部はシリコーンゴム層が残
っている印刷版が得られる。By the above development, a printing plate is obtained in which the photosensitive layer and silicone rubber in the unexposed areas are removed, or a printing plate in which the silicone rubber layer is removed and the photosensitive layer is exposed, and the silicone rubber layer remains in the exposed areas.
[実施例]
以下、本発明を実施例により説明するが、本発明は、こ
れらに限定されるものではない。[Examples] The present invention will be described below with reference to Examples, but the present invention is not limited thereto.
実施例1
[アルミニウム板aの製造]
厚さ0.2mmのアルミニウム板を3%水酸化ナトリウ
ム水溶液に浸漬して脱脂し、水洗した後、塩酸濃度1%
及びホウ酸濃度1%の水溶液中において、温度25℃で
3A/dm’の条件で5分間電解エッヂングを行い、水
洗後、40%硫酸水溶液中において温度30℃で1.5
A/dm’の条件で2分間陽極酸化を行い、水洗し、1
%メタケイ酸ナトリウム水溶液に温度85℃で37秒間
浸漬し、更。Example 1 [Manufacture of aluminum plate a] An aluminum plate with a thickness of 0.2 mm was immersed in a 3% aqueous sodium hydroxide solution to degrease it, washed with water, and then diluted with 1% hydrochloric acid concentration.
In an aqueous solution with a concentration of boric acid of 1%, electrolytic etching was performed at a temperature of 25°C for 5 minutes at a rate of 3A/dm', and after washing with water, etching was performed in an aqueous solution of 40% sulfuric acid at a temperature of 1.5°C at a temperature of 30°C.
Anodize for 2 minutes at A/dm', wash with water,
% sodium metasilicate aqueous solution for 37 seconds at a temperature of 85°C.
に温度90℃の水(poa、5)に25秒間浸漬し、水
洗、乾燥してアルミニウム板aを得た。It was immersed in water (poa, 5) at a temperature of 90° C. for 25 seconds, washed with water, and dried to obtain aluminum plate a.
アルミニウム板aに下記の組成の感光性組成物を塗布し
、100℃で2分間乾燥して厚さ0,5/1fitの感
光層を形成した。A photosensitive composition having the composition shown below was applied to an aluminum plate a and dried at 100° C. for 2 minutes to form a photosensitive layer having a thickness of 0.5/1 fit.
[感光性組成物]
(1)ジアゾ樹脂−165部
(2)2−ヒドロキシエチルメタクリレート、アクリル
ニトリル、メタクリル酸メチル、アクリル酸エチル、ア
クリル酸のモル比が55/10/1015/20の共重
合体 35部(3)ビクトリアピュアブルー
BOH
(保止ケ谷化学(株)製染料) 1部(4)メチルセ
ロソルブ 900部ジアゾ樹脂−1の合成
なお、ジアゾ樹脂−1は以下のようにして合成した。[Photosensitive composition] (1) Diazo resin - 165 parts (2) Copolymer of 2-hydroxyethyl methacrylate, acrylonitrile, methyl methacrylate, ethyl acrylate, and acrylic acid in a molar ratio of 55/10/1015/20 Combined 35 parts (3) Victoria Pure Blue BOH (dye manufactured by Hodogaya Chemical Co., Ltd.) 1 part (4) Methyl cellosolve 900 parts Synthesis of diazo resin-1 Diazo resin-1 was synthesized as follows. did.
p−シアシンフェニルアミン硫酸塩IL5g(50ミリ
モル)を氷冷下で40.9gの濃硫酸に溶解した。この
反応液に1.35 (45ミリ千ル)のバラホルムアル
デヒドをゆっくり反応温度が10℃を赳スないように添
加した。5 g (50 mmol) of p-cyacine phenylamine sulfate IL was dissolved in 40.9 g of concentrated sulfuric acid under ice cooling. To this reaction solution, 1.35 (45 milliliters) of paraformaldehyde was slowly added so that the reaction temperature did not exceed 10°C.
この反応混る物を氷冷下、500m1の、王、り、ノー
ルに鏑下し、生じた沈殿を濾過し・た。エタノール下洗
浄後、この沈殿物をjoomlの純粋に溶解し、この液
に6.8 gの塩化亜鉛を溶解した玲濃厚水溶液を加λ
た。生じた沈殿を濾過した後、エタノールで洗浄し、こ
わを150111純水に溶解した。この液に88のへキ
ザフルオロリン酸アンモニウムを溶解し・た玲濃厚水溶
液を・加えた。生しまた沈殿を濾取し、水洗した後、※
2燥し2てジアゾ樹脂−1を得た。The reaction mixture was poured into 500 ml of alcohol under ice-cooling, and the resulting precipitate was filtered. After washing under ethanol, this precipitate was dissolved in pure jooml, and a concentrated aqueous solution containing 6.8 g of zinc chloride was added to this solution.
Ta. The resulting precipitate was filtered, washed with ethanol, and the resulting precipitate was dissolved in 150111 pure water. A concentrated aqueous solution containing 88 ammonium hexafluorophosphate was added to this solution. After filtering out the precipitate from the fresh raw meat and washing it with water, *
2 to obtain diazo resin-1.
ついで、上記の感光層上に下記のシリコーンゴム組成物
を乾燥ff1ffiて1.53部m’になるようj、で
塗イi’i L、−190℃”rlO分間乾燥し、淫し
水不要の平版印刷版材料なtHだ。Next, apply the following silicone rubber composition on the above photosensitive layer so that it becomes 1.53 parts by drying. This is the lithographic printing plate material.
「シリコーンゴム層組成物コ
両末端に水酸基を有するジメチルポリシロキシン(分子
ff152,000) 100部トリアセ
トキシメヂルシラン 10部ジブチル錫ラうl
/ −1〜 08部アイソパーG(1丁
ツゾ化学製) 900部上記版材刺の上面にポ
ジフィルムを真空布e ;’せた後、光源とl、7てメ
タルハラ(1−ランプを用いて露光した。次に現像液を
用いて現像し・l〜。版材料の表面を現像液を染み込ま
一@−i::バッドて1寮ど3パとにより、未露光部分
の感光層とシリU−〕、ごゴム層が除去さね、網点が良
:r’f +、丁再現された印刷版が得られた。"Silicone rubber layer composition: dimethylpolysiloxine having hydroxyl groups at both ends (molecular weight: 152,000) 100 parts triacetoxymethylsilane 10 parts dibutyltin
/ -1 to 08 parts Isopar G (manufactured by Tsuzo Kagaku Co., Ltd.) 900 parts Next, the surface of the plate material was soaked with the developer, and the unexposed areas of the photosensitive layer and the silicon were separated using three passes. U-], the rubber layer was not removed, and the halftone dots were good: r'f+, a printing plate with excellent reproduction was obtained.
[現像液組成]
エヂレングリコールモノフェニルエーデル5部
バイオ:1.ノA=44B(竹本油脂(株)製アニオン
界面活性剤) 5部ジェタノールアミ
ン 1部木
89部[比較例]
実施例1の感光性組成物を次のように変更した以外は、
実施例1と同様に17て湿し水不要の平版印刷版を得た
。[Developer composition] Ethylene glycol monophenyl ether 5 parts Bio: 1. No A = 44B (anionic surfactant manufactured by Takemoto Yushi Co., Ltd.) 5 parts jetanolamine 1 part wood
89 parts [Comparative example] Except for changing the photosensitive composition of Example 1 as follows,
A lithographic printing plate requiring no dampening water was obtained in the same manner as in Example 1.
[感光性組成物]
(1)ジアゾ樹脂−130部
(2)2−ヒドロキシエチルメタクリ1ノー 1・、ア
クリルニトリル、メタクリル酸メチル、アクリル酸エチ
ル、アクリル酸のモル比が55 / 10 /10 /
5 / 20の共重合体 70部(3)ビ
クトリアピュアブルーBOH
(採土ケ谷化学(株)製染料) 1部(4)メチルセ
ロソルブ 900部ついで、この湿し水不要
の平版印刷版を実施例1で用いた現像液で現像した。得
ら第1た印刷版はシャドウ部の再現性が不良であった。[Photosensitive composition] (1) Diazo resin - 130 parts (2) 2-hydroxyethyl methacrylate 1, acrylonitrile, methyl methacrylate, ethyl acrylate, acrylic acid in a molar ratio of 55/10/10/
5/20 copolymer 70 parts (3) Victoria Pure Blue BOH (dye manufactured by Odogaya Kagaku Co., Ltd.) 1 part (4) Methyl cellosolve 900 parts Next, this lithographic printing plate that did not require dampening water was used in Example 1. It was developed with the developer used in . The first printing plate obtained had poor reproducibility in shadow areas.
実施例2
アルミニウム根aに下記の組成の感光性組成性1つを塗
布し、100℃で2分間乾燥して厚さ05μmの感光層
を形成した。Example 2 A photosensitive composition having the following composition was coated on aluminum root a and dried at 100° C. for 2 minutes to form a photosensitive layer with a thickness of 05 μm.
[感光性組成物コ
(1)ジアゾ樹脂−260部
(2)高分子化合物−140部
(3)ビクトリアピュアブルーBOH
(採土ケ谷化学(株)製染料) 1部(4)メチルセ
ロソルブ 900部このようにして得られた
感光層土ン、:実施例1と同様のシリコーンゴム組成物
を乾燥重量で15g/m’になるように塗布l、・、1
20℃で2分間乾燥l・、湿17水不要の平版印刷版制
料を得た。[Photosensitive composition (1) Diazo resin - 260 parts (2) High molecular compound - 140 parts (3) Victoria Pure Blue BOH (dye manufactured by Odugaya Kagaku Co., Ltd.) 1 part (4) Methyl cellosolve 900 parts The photosensitive layer soil thus obtained was coated with the same silicone rubber composition as in Example 1 to a dry weight of 15 g/m'.
A lithographic printing plate preparation which was dried at 20° C. for 2 minutes and wetted for 17 minutes without the need for water was obtained.
」=記版材料の上面にポジフィルムを真空密着させた後
、光源と1ノでメタルハライドラ〉・ブを用いで露光1
2.た。次じ下記の現像液を用いて現像し・た。現像中
に版材料の表面を現像液を・染み込まゼたバッド°C擦
ることにより、未露光部分の感)1′、層とシリ、゛j
−ンゴム層が除去さ、!1、網点が良好1ご再現された
印刷版か得られた。” = After vacuum-adhering the positive film to the top surface of the printing plate material, it was exposed with a light source and a metal halide driver.
2. Ta. Next, it was developed using the following developer. During development, by rubbing the surface of the plate material with a developer-soaked pad °C, the appearance of unexposed areas can be removed.
-The rubber layer is removed! 1. A printing plate with good halftone dots was obtained.
1]現像沼;組成]
ベンジルアルコール 8部べL/ツ
クスNBL (花、EF−7’ I・ラス7」製アニオ
ン界面活性剤) 5部ジェタノール
アミン 2部水
85部ジ丁
〜fオj1脂−2の合y表
p−ヒドロキシ安息香酸3.5 g (o、n25干ル
)および4−ジアゾ−4′−メトギシジフェニルアミン
硫酸塩22.0g(0,075ミリモル)を水冷−下で
90g(7)漠硫1酸(、゛二溶角すl、・た。この反
応ン夜に2.7gのパラホルムアルデビI・(0,09
モル)をゆっくり添加し、この際反応温度が10℃を赳
えItいよう[、二様、加していっすご。1] Development swamp; Composition] Benzyl alcohol 8 parts BeL/Tux NBL (Anionic surfactant manufactured by Hana, EF-7' I・Las 7) 5 parts Jetanolamine 2 parts Water
85 parts Dicho~fOj1 Fat-2 Synthesis Table p-hydroxybenzoic acid 3.5 g (o, n25 mol) and 4-diazo-4'-methoxydiphenylamine sulfate 22.0 g (0, 0.075 mmol) was added to 90 g (7) of parasulfuric acid (0.075 mmol) under water cooling.
mol) was added slowly, making sure the reaction temperature was 10°C.
その後、2時間氷冷下攪拌を続tまた1、この反応混合
物を氷冷T、1pのエタノールに沼丁し、生1゛;た沈
殿を濾過した。−デタ、I−ルで洗浄後、この沈殿物を
200m1の純水に溶解し、この液に10.58の塩化
亜鉛を溶解したン名濃厚水溶液i・加えjζ。Thereafter, stirring was continued for 2 hours under ice-cooling, and the reaction mixture was poured into ice-cold T. 1 P ethanol, and the fresh precipitate was filtered. After washing with water, dissolve this precipitate in 200 ml of pure water, and add 10.58 g of a concentrated aqueous solution of zinc chloride to this solution.
生1・た沈殿吃・瀦過I5・た後、エタノール【゛洗浄
し11、これを300m11屯水に溶解した。このン夜
に1’1.7):のベギザフルオロリン酸アンモニウム
を溶解1.... IL:玲漠厚水溶治を加えた。生じ
た沈殿を濾取し・、水洗した後、30℃で1昼夜乾燥し
てジアゾ樹脂2を得た。The mixture was washed with ethanol (11) and dissolved in 300 ml of water. Dissolve the ammonium fluorophosphate in 1'1.7): 1. .. .. .. IL: Added Reimu Atsui Soruji. The resulting precipitate was collected by filtration, washed with water, and then dried at 30° C. for one day and night to obtain diazo resin 2.
共重合体の合成例
2、−ヒトロキシエヂルメタクリレ−1−71,5fi
、アクリル酸17.3g1アクリロニ1リル5.3 g
、−Iデルアクリレ−)−5,0g、 メタクリル酸
メチガ10g及びアゾビスイソブヂロ:′:l−リル1
.85 g’1 、T−タノール400mp、に溶解し
、窒素置換した後、70℃〜80℃で8時間加熱したい
反応終了後、反応液を木5pに攪拌下で汀き、生じた白
色d゛、殿を濾取乾燥シ2゛(、親油性高分子11゜合
物1を96g得た。Synthesis example 2 of copolymer, -hydroxydiylmethacryle-1-71,5fi
, 17.3 g of acrylic acid 1 lyl of acrylonitrile 5.3 g
, -Idelacryle-)-5.0g, Methiga methacrylate 10g and azobisisobutylo:':l-lyl 1
.. 85 g'1, dissolved in T-tanol 400 mp, purged with nitrogen, heated at 70°C to 80°C for 8 hours. After completion of the reaction, the reaction solution was poured into a wooden plate with stirring, and the resulting white d' The precipitate was filtered and dried to obtain 96 g of lipophilic polymer 11 compound 1.
I発明の効果]
本発明は、バインダ・−朴j脂・どジアゾ樹址イの比>
IHを50 : 50へ−10890f、:することに
、):す、イス存性の借オ]た版オA料を得ることがで
きると共に水系現像液で現像でき、[、か4′)工υ1
像ラチチュー1.か広がり、網点再現性の良好な湿し水
不要の平版印刷版が得られる。Effects of the invention] The present invention provides the following advantages:
It is possible to obtain a printing plate with an IH of 50: 50 - 10890f, :), which can be developed with an aqueous developer, and can be developed with a water-based developer. υ1
Statue Lachichu 1. A lithographic printing plate with good spread and halftone dot reproducibility and no need for dampening water can be obtained.
出1頻人1 frequent visitor
Claims (1)
不要の感光性平版印刷版において、該感光層がバインダ
ー樹脂とジアゾ樹脂を含有し、かつこれらのバインダー
樹脂とジアゾ樹脂との重量比が50:50〜10:90
であることを特徴とする湿し水不要の感光性平版印刷版
。In a photosensitive lithographic printing plate that does not require dampening water and has a photosensitive layer and an ink repellent layer in this order on a support, the photosensitive layer contains a binder resin and a diazo resin, and the weight of these binder resin and diazo resin is Ratio is 50:50 to 10:90
A photosensitive lithographic printing plate that does not require dampening water.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14462989A JPH039356A (en) | 1989-06-06 | 1989-06-06 | Photosensitive planographic printing plate requiring no dampening water |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14462989A JPH039356A (en) | 1989-06-06 | 1989-06-06 | Photosensitive planographic printing plate requiring no dampening water |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH039356A true JPH039356A (en) | 1991-01-17 |
Family
ID=15366490
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14462989A Pending JPH039356A (en) | 1989-06-06 | 1989-06-06 | Photosensitive planographic printing plate requiring no dampening water |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH039356A (en) |
-
1989
- 1989-06-06 JP JP14462989A patent/JPH039356A/en active Pending
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