JPH0399766U - - Google Patents
Info
- Publication number
- JPH0399766U JPH0399766U JP840690U JP840690U JPH0399766U JP H0399766 U JPH0399766 U JP H0399766U JP 840690 U JP840690 U JP 840690U JP 840690 U JP840690 U JP 840690U JP H0399766 U JPH0399766 U JP H0399766U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- metal material
- film
- evaporation source
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 claims description 5
- 230000008020 evaporation Effects 0.000 claims description 5
- 238000007738 vacuum evaporation Methods 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 239000007769 metal material Substances 0.000 claims 3
- 238000007740 vapor deposition Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Description
第１図は、本考案による真空蒸着装置の要部で
ある蒸発源の展開斜視図、第２図ａとｂは前記蒸
発源を備えた真空蒸着装置の側面と上面図、第３
図は、前記真空蒸着装置と従来の真空蒸着装置と
により成膜された金属膜の材料使用量と金属膜の
反射率との関係を示すグラフ、第４図ａとｂは従
来技術による真空蒸着装置の概要を説明するため
の側面と上面図である。
１０……蒸発源、１１……フイラメント線、１
２……セラミツクのパイプ、１３……開口部、１
４……金属線、２０……真空槽、３０……基板。
FIG. 1 is an exploded perspective view of an evaporation source which is a main part of a vacuum evaporation apparatus according to the present invention, FIGS. 2a and b are side and top views of the vacuum evaporation apparatus equipped with the evaporation source, and FIG.
The figure is a graph showing the relationship between the amount of material used and the reflectance of metal films formed by the vacuum evaporation apparatus and the conventional vacuum evaporation apparatus. FIG. 2 is a side view and a top view for explaining the outline of the device. 10... Evaporation source, 11... Filament wire, 1
2... Ceramic pipe, 13... Opening, 1
4...Metal wire, 20...Vacuum chamber, 30...Substrate.
Claims (1)
けて基板を配置し、前記金属材料を加熱、蒸発し
、その蒸気を前記基板の成膜面上に凝着させて金
属膜を形成する真空蒸着装置において、前記蒸発
源が、螺旋状に巻かれたフイラメント線で金属材
料を囲むと共に、少なくとも一端が開口したセラ
ミツクパイプを前記フイラメント線の外側に被せ
てなり、さらに、同セラミツクパイプの開口した
端部が向いた方向に基板を配置したことを特徴と
する真空蒸着装置。 A vacuum in which a substrate is placed with its film-forming surface facing an evaporation source that heats and evaporates a metal material, the metal material is heated and evaporated, and the vapor is deposited on the film-forming surface of the substrate to form a metal film. In the vapor deposition apparatus, the evaporation source is formed by surrounding a metal material with a spirally wound filament wire, and covering the outside of the filament wire with a ceramic pipe having at least one open end, and further including a ceramic pipe having an open end. A vacuum evaporation apparatus characterized in that a substrate is arranged in a direction with its end facing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP840690U JPH0399766U (en) | 1990-01-31 | 1990-01-31 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP840690U JPH0399766U (en) | 1990-01-31 | 1990-01-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0399766U true JPH0399766U (en) | 1991-10-18 |
Family
ID=31512037
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP840690U Pending JPH0399766U (en) | 1990-01-31 | 1990-01-31 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0399766U (en) |
-
1990
- 1990-01-31 JP JP840690U patent/JPH0399766U/ja active Pending